Abstract: A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided.

Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.

Abstract: The present invention provides a curable composition containing at least one species selected from polymerizable monomers represented by the following formulas (I) to (III) and a polymerization initiator, and a planographic printing plate precursor including the same. The curable composition can be cured with high sensitivity due to laser light exposure or the like, and the inhibition of polymerization due to oxygen is controlled. The composition has excellent solubility in a developer or a solvent.

Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.

Abstract: The process forms a pattern by applying a resist composition onto a substrate to form a resist film, baking, exposure, post-exposure baking, and development. The resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent. A total amount of amino groups from the quencher and PBG is greater than an amount of acid from PAG. An unexposed region and an over-exposed region are not dissolved in developer whereas only an intermediate exposure dose region is dissolved in developer. Resolution is doubled by splitting a single line into two through single exposure and development.

Abstract: A photo-sensitive adhesive for a flexible liquid crystal display is provided, comprising the following components: an urethane oligomer; a reactive monomer with phenyl group; and a photo-initiator. In an embodiment, the phenyl group of the reactive monomer has a weight ratio of 40 wt %, base on the total weight of the reactive monomer.

Abstract: A hardcoat agent composition comprising a fluorine-containing polyether compound (A) having a perfluoropolyether unit, urethane bond and active energy ray reactive group and a curable compound (B) having equal to or more than 2 active energy ray polymerizing groups in the molecule. An optical information medium having a film substance composed of single or multiple layers containing at least the recording layer 4 or the reflecting layer on the supporting substrate 20, the optical information medium wherein at least either the surface of the supporting substrate 20 or that of the above-mentioned film substance is formed by the hardcoat layer 8 containing a curable substance of the above-mentioned hardcoat agent composition.

Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing a binder polymer containing a positively charged nitrogen atom in at least one of a main chain and a side chain of the binder polymer, a compound containing an ethylenically unsubstituted bond; and a radical polymerization initiator.

Abstract: Negative-working imageable elements have a hydrophilic substrate and a single thermally-sensitive imageable layer. This layer can include an infrared radiation absorbing compound and polymeric particles that coalesce upon thermal imaging. These coalesceable polymeric particles comprise a thermoplastic polymer and a colorant to provide improved visible contrast between exposed and non-exposed regions in the imaged element, such as lithographic printing plates.

Abstract: A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index layer modifies the path of incident radiation during mask image transfer so as to provide steeper shoulder angles in the relief image solid areas.

Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).

Abstract: According to the present invention, there is provided a curable composition, containing a compound (A) having at least one ethylenically unsaturated double bond, a photopolymerization initiator (B), a coloring agent (C), an alkali-soluble resin (D), and a compound (E) having in the molecule a partial structure of urethane, amide or urea.

Abstract: There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2?CH—COO—R—NCO??(1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).

Abstract: [PROBLEMS] To provide a photosensitive resin composition which has excellent photosensitivity and gives a cured product reduced in warpage and excellent in flexing properties, adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, resistance to gold plating, etc. [MEANS FOR SOLVING PROBLEMS] A urethane resin (A) soluble in aqueous alkali solutions and curable with active energy rays which is obtained by reacting a diisocyanate compound (a) with a tetrabasic acid dianhydride (b) to obtain a compound (E), reacting the compound (E) with a hydroxylated compound (c) having an unsaturated group and optionally with a hydroxylated compound (d) other than the compound (c) to obtain a compound (F), and further reacting hydroxy groups of the compound (F) with a diisocyanate compound (e).

Abstract: The present invention provides a polymerizable composition comprising (A) a compound represented by the following formula (I), (B) an infrared absorbent, and (C) a compound having at least one addition-polymerizable ethylenically unsaturated bond, and a negative planographic printing plate precursor having a recording layer containing the polymerizable composition. In the formula (I), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom or a monovalent organic group; and X? represents an anion.

Abstract: The present invention provides a photosensitive resin composition comprising 100 parts by mass of a polyurethane prepolymer having an ethylenically unsaturated group, 10 to 150 parts by mass of an ethylenically unsaturated compound, and 0.01 to 10 parts by mass of a photopolymerization initiator, wherein the ethylenically unsaturated compound comprises 0.1 to 10 parts by mass of a polyfunctional ethylenically unsaturated compound having 6 or more (meth)acryloyl groups in a molecule thereof with respect to 100 parts by mass of the polyurethane prepolymer.

Abstract: Provided are a composition for preparing an electron emission source, including a nano-sized inorganic material and a vehicle, a method for preparing an electron emission source using the composition, an electron emission source including a nano-sized inorganic material and a small amount of a residual carbon, and further, an electron emission device including the electron emission source.

Abstract: A polyurethane resin is synthesized from a compound represented by the following Formula (1), a polymerizable composition includes the polyurethane resin, a planographic printing plate precursor includes a photosensitive layer including the composition, and a method produces a diol compound that can be used as a raw material of the polyurethane resin. In Formula (1), R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, R3 represents a hydrogen atom or an alkyl group, R4 represents a hydrogen atom or an alkyl group, and A represents a divalent or higher linking group, provided that R1 and R2 are not both a single bond.

Abstract: The photosensitive resin composition of the invention comprises (A) a photopolymerizing compound with two or more ethylenic unsaturated bonds in the molecule and (B) a photopolymerization initiator which initiates photopolymerization reaction of the (A) photopolymerizing compound, the photosensitive resin composition being characterized in that the molecule of the (A) photopolymerizing compound further contains a characteristic group with a bond which breaks when the (A) photopolymerizing compound is heated under temperature conditions of 130-250° C.

Abstract: the invention provides a composition having laser engraving properties, comprising a host material and a laser enhancing additive. The host material comprises a material, such as a polymer, modified by a first process, whereby the host material as modified by the first process has increased thermal conductivity as compared to the host material before the first process. The laser enhancing additive comprises a first quantity of at least one of copper potassium iodide (CuKI3), Copper Iodide (CuI), potassium iodide (KI), sodium iodide (NaI), and aluminum iodide (AlI), and a second quantity of at least one substance selected from the group consisting of zinc sulfide (ZnS), barium sulfide (BaS), alkyl sulfonate, and thioester.

Abstract: A photosensitive resin composition containing an alkali soluble resin, an ethylenically unsaturated compound, a near infrared absorbing dye, a compound containing a halomethyl group and a compound containing an organoboron anion, wherein the alkali soluble resin is an acryl resin having one or more pendant groups in which both terminals of a diol compound have been blocked with isophorone diisocyanates and then (meth)acryloyl has been added. Also provided is an image forming material having a substrate, and a photosensitive layer formed by the photosensitive resin composition on the substrate, as well as an image forming method.

Abstract: An alkali-developable photosensitive color composition containing a binder resin, a fluorine-containing copolymer, a photopolymerization initiator, a colorant, and a solvent. A photopolymerizable unsaturated compound is used as the binder resin. The photopolymerizable unsaturated compound is obtained by adding (B) an unsaturated monobasic acid to (A) a polyfunctional epoxy resin to form (C) an epoxy adduct and allowing the epoxy adduct (C) and (D) a polybasic acid anhydride to react with each other.

Abstract: A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.

Abstract: A lithographic printing plate precursor is provided that includes, above a support, a photosensitive layer including (i) a binder polymer, (ii) an ethylenically unsaturated compound, and (iii) a polymerization initiator, the ethylenically unsaturated compound (ii) including a compound represented by Formula (1) below. (In Formula (1), L denotes an (m+n)-valent linking group, the Ds independently denote a group selected from the group consisting of groups represented by Formulae (A) to (D) below, the Rs independently denote a monovalent substituent, m denotes an integer of 1 to 20, and n denotes an integer of 2 to 20.) (In Formulae (A) to (D), X, Y, and Z independently denote an oxygen atom, a sulfur atom, or NR17, R4 to R14 and R17 independently denote a hydrogen atom or a monovalent substituent, R15 denotes a hydrogen atom or a methyl group, R16 denotes a monovalent substituent, and k denotes an integer of 0 to 4.

Abstract: A photosensitive resin composition which is excellent in storage stability required for one-part type compositions and in processability required for dry-film formation and gives a cured product suitable for FPC substrates or suspension substrates for hard-disc which each retains essential properties required for solder resists, such as heat resistance, water resistance, and electrical-insulation reliability, and has flexibility and low polluting property. The composition comprises: a compound which has a carbon-carbon double bond and carboxy group and is obtained by allowing a bisphenol type epoxy compound and an unsaturated monocarboxylic acid to react and then allowing a polybasic acid anhydride to undergo addition reaction with part or all of the secondary hydroxy groups of the reaction product; a urethane (meth)acrylate compound having a structure derived from a polycarbonate polyol structure; another polymerizable compound having a carbon-carbon double bond; and a photopolymerization initiator.

Abstract: The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material. To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000?m2 or more and a maximum height measured from the film surface of 1?m to 7?m residing in the protective film is 50/m2 to 1,000/m2.

Abstract: Positive-working imageable elements can be used to prepare lithographic printing plates. These elements have at least two layers (inner and outer) arranged on a suitable substrate. The inner layer that is closer to the substrate includes one or more polymeric binders that include pendant oxazoline groups and acid groups that are reactive with the oxazoline groups during a post-baking step after development. The resulting imageable elements are more quickly baked in this manner to provide improved run length and resistant to press chemicals.

Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.

Abstract: A polymerizable composition comprising: a polyurethane resin synthesized by using a compound represented by the following formula (I) as one of starting materials; a photopolymerization or thermal polymerization initiator; and an addition-polymerizable compound having an ethylenically unsaturated bond: wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n is an integer of from 1 to 5.

Abstract: Compounds of formula I Y is, for example, C3-C12alkylene, butenylene, butynylene, or C4-C12alkylene interrupted one or more times by non-consecutive —O— or —NR2—; R1 is a reactive group selected from OH, SH, NR3R4, —(CO)—OH, —(CO)—NH2, SO3H, —C(R5)?CR6R7, oxiranyl, —O—(CO)—NH—R8—NCO and —O—(CO)—R9—(CO)—X; R2 is hydrogen, C1-C4alkyl or C2-C4hydroxyalkyl; R3 and R4 are each independently of the other hydrogen, C1-C4alkyl or C2-C4hydroxyalkyl; R5, R6 and R7 are each independently of the others hydrogen or methyl; R8 is, for example, linear or branched C4-C12alkylene, or phenylene; R9 is, for example, linear or branched C1-C16alkylene, —CH?CH—, —CH?CH—CH2—, C6-cycloalkylene, phenylene or naphthylene; and X, X1 and X2 are each independently of the others OH, Cl, OCH3 or OC2H5; are suitable as photoinitiators that can be incorporated in a formulation to be cured.

Abstract: A thermal negative type lithographic printing original plate has a photosensitive layer featuring high sensitivity, excellent reproducibility in FM screening, and excellent print durability and chemical resistance at a minute image portion. A photosensitive composition for the photosensitive layer contains an alkali soluble resin having a monomer unit represented by the formula (I), a silane coupling agent represented by the formula (II), an infrared absorber, a radical polymerizable initiator, and a polymerizable compound having an ethylenic double bond and an amount of the silane coupling agent is from 15 to 40% of the photosensitive composition by mass.

Abstract: Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ?number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2?,4,4?,5?5-hexaarylbiimidazoles, compounds w

Abstract: There is provided a photosensitive resin composition for forming an optical waveguide which has high shape precision and excellent transmission characteristics under high temperature and high humidity. A composition of the present invention contains (A) a polymer having structures represented by the following general formulae (I) and (2) (in the formulae, each of R1 and R2 is independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R3 is an organic group containing a radical-polymerizable reactive group; X is a single bond or a bivalent organic group; and Y is a non-polymerizable organic group), (B) a compound having at least one ethylenic unsaturated group in the molecule thereof, having a molecular weight below 1,000 and having a boiling point of at least 130° C. at 0.1 MPa, and (C) a photoradical polymerization initiator.

Abstract: An objective is to provide a planographic printing plate material exhibiting excellent developability, printing durability, together with excellent oxygen-shielding layer adhesion and moisture dependence after exposure. Disclosed is a planographic printing plate material possessing a support provided thereon, a photosensitive layer, wherein the photosensitive layer comprises (A) at least two binder polymers comprising different glass transition points (Tg) from each other, (B) a polymerizable ethylenic double bond-containing compound, and (C) a photopolymerization initiator.

Abstract: A laser-decomposable resin composition of the invention contains a polyurethane resin having a structure wherein an aromatic group is directly connected to a urethane bond.

Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.

Abstract: A polyurethane resin is synthesized from a compound represented by the following Formula (1), a polymerizable composition includes the polyurethane resin, a planographic printing plate precursor includes a photosensitive layer including the composition, and a method produces a diol compound that can be used as a raw material of the polyurethane resin. In Formula (1), R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, R3 represents a hydrogen atom or an alkyl group, R4 represents a hydrogen atom or an alkyl group, and A represents a divalent or higher linking group, provided that R1 and R2 are not both a single bond.

Abstract: A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate precursor having an undercoat layer comprising (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, and a photosensitive layer containing (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator.

Abstract: A polymerizable composition comprising: a polyurethane resin synthesized by using a compound represented by the following formula (I) as one of starting materials; a photopolymerization or thermal polymerization initiator; and an addition-polymerizable compound having an ethylenically unsaturated bond: wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n is an integer of from 1 to 5.

Abstract: Linear crosslinkable polyurethanes obtained from (a) at least one diisocyanate having 2 to 30 carbon atoms, (b) at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose carbon chain at least one carboxyl group is covalently bonded, and some or all of said carboxyl groups have been esterified with an olefinically unsaturated C3-C8alcohol or with the glycidyl ester of an olefinically unsaturated C3-C8carboxylic acid, and (c) optionally at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose carbon chain at least one carboxyl group is covalently bonded. The polyurethanes are suitable, alone or as a mixture with other reactive components, for thermal and/or photochemical crosslinking in crosslinkable compositions for the production of mouldings, coatings and in particular solder masks.

Abstract: To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing ?-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.

Abstract: A polymerizable composition containing: (A) a polyurethane compound soluble or swellable in water or an aqueous alkali solution which is obtained by reacting at least one diol compound having an unsaturated bond in a main chain and having a molecular weight of 500 or more with at least one polyisocyanate compound; (B) a radical initiator; and (C) a photothermal converting agent, and a polymerizable composition containing: (A?) a polyurethane resin which is soluble or swellable in water or an aqueous alkali solution and has an unsaturated carbon-carbon bond in its side chain; and (B) a radical initiator, wherein the polyurethane resin (A?) is obtained by adding an epoxy compound having an unsaturated carbon-carbon bond to a polyurethane resin having carboxyl group.

Abstract: A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acryloyl groups per molecule whose acid value of less than 10 mg KOH/g, an alkali soluble polymer compound, a photopolymerization initiator and a photopolymerizable compound (D) including in the structure thereof a structural unit represented by the formula (I) gives such a well-balanced properties.

Abstract: A relief printing original plate including a substrate, a photosensitive resin layer thereon that is photosensitive to ultraviolet radiations, and a mask layer thereon having both ultraviolet and non-ultraviolet absorbability, the ultraviolet absorbability being deactivatable in response to receiving non-ultraviolet radiation. A method for producing a relief printing plate by using the original plate is also provided.

Abstract: An interconnect structure with improved performance and capacitance by providing air gaps inside the dielectric layer by use of a multi-phase photoresist material. The interconnect features are embedded in a dielectric layer having a columnar air gap structure in a portion of the dielectric layer surrounding the interconnect features. The interconnect features may also be embedded in a dielectric layer having two or more phases with a different dielectric constant created. The interconnect structure is compatible with current back end of line processing.

Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.

Abstract: A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsaturated bond, and a polymerizable composition comprising: (A?) a polyurethane resin having an ethylenically unsaturated bond on a side chain, which is a reaction product of an isocyanate compound and a diol compound including a diol compound represented by the formula (G) defiend herein; (B) a neutrally charged compound capable of generating a radical under light or heat; (C) a compound having an ethylenically unsaturated bond; (D?) a 1,4-benzoquinone derivative; and (E?) a dye having a maximum absorption wavelength in a region of from 350 to 450 nm.

Abstract: A photosensitive resin composition that excels in sensitivity to actinic energy rays (photosensitivity), is hardenable within a short period of time and can form pattern through development with a diluted aqueous alkali solution and that gives a cured film through thermal curing in the postcuring step, the cured film having satisfactory flexibility and being suitable to a solder mask ink of high insulation excelling in adherence and resistances of gold plating, electroless gold plating and tin plating; and a curing product thereof.

Abstract: A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution. The deactivation of the exposed plate allows the handling of the plate under regular office light or any other light without causing the hardening of the non-exposed areas of the photosensitive layer.

Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination of multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 ?J/cm2, and then developed with an aqueous developer or with ink and/or fountain solution.