Polyester Patents (Class 430/285.1)
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Patent number: 12228859Abstract: Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an orType: GrantFiled: December 19, 2018Date of Patent: February 18, 2025Assignee: Rohm and Haas Electronic Materials LLCInventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSisto, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
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Patent number: 12135502Abstract: A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.Type: GrantFiled: August 8, 2023Date of Patent: November 5, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Siao-Shan Wang, Ching-Yu Chang, Chin-Hsiang Lin
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Patent number: 12092957Abstract: A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded; R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at ?-, ?- and ?-positions of the carbon atom to which R1 and R2 are bonded; and No fluorine atom is bonded to carbon atoms located at ?- and ?-positions of the carbon atom to which R3 is bonded.Type: GrantFiled: October 22, 2021Date of Patent: September 17, 2024Assignee: JSR CORPORATIONInventors: Kazuya Kiriyama, Katsuaki Nishikori, Takuhiro Taniguchi, Ryuichi Nemoto, Ken Maruyama
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Patent number: 12061419Abstract: A planographic printing plate precursor having an image recording layer on a support, and an overcoat layer in this order, in which the overcoat layer includes particles, the overcoat layer is an outermost layer, and an occupation area ratio of the particles in a surface of the overcoat layer is 30% by area or more; and a method of producing a planographic printing plate obtained by using the planographic printing plate precursor.Type: GrantFiled: July 29, 2020Date of Patent: August 13, 2024Assignee: FUJIFILM CorporationInventor: Kenjiro Araki
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Patent number: 12037679Abstract: Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.Type: GrantFiled: December 15, 2021Date of Patent: July 16, 2024Assignee: Applied Materials, Inc.Inventors: Vicknesh Sahmuganathan, Jiteng Gu, Zhongxin Chen, Kian Ping Loh, John Sudijono, Haisen Xu, Sze Chieh Tan, Yuanxing Han, Jiecong Tang, Eswaranand Venkatasubramanian, Abhijit Basu Mallick
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Patent number: 11960207Abstract: Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm.Type: GrantFiled: January 17, 2019Date of Patent: April 16, 2024Assignee: ZEON CORPORATIONInventor: Manabu Hoshino
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Patent number: 11747726Abstract: A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Raf11 and Raf12, and at least one of Raf13 and Raf14 represents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structureType: GrantFiled: June 23, 2020Date of Patent: September 5, 2023Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yuki Fukumura, Tatsuya Fujii, Yoichi Hori
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Patent number: 11693315Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.Type: GrantFiled: April 23, 2021Date of Patent: July 4, 2023Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Eunkyung Lee, Sumin Kim, Hyunwoo Kim, Juhyeon Park, Giyoung Song, Sukkoo Hong, Yoonhyun Kwak, Youngmin Nam, Byunghee Sohn, Sunyoung Lee, Aram Jeon, Sungwon Choi
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Patent number: 11656549Abstract: A resist composition including a resin component (A1) having a structural unit (a01), a structural unit (a02) and a structural unit (a03) derived from compounds represented by general formulae (a01-1), (a02-1) and (a03-1), respectively (W01 represents a polymerizable group-containing group containing no oxygen; W02 represents a polymerizable group-containing group containing oxygen; W03 represents a polymerizable group-containing group which may contain oxygen; Wa01 and Wa02 represent an aromatic hydrocarbon group; Xa03 represents a group which forms an alicyclic hydrocarbon group together with Ya03; Ra00 represents a hydrocarbon group which may have a substituent)Type: GrantFiled: November 2, 2020Date of Patent: May 23, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masahito Yahagi, Yoichi Hori
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Patent number: 11604412Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation.Type: GrantFiled: December 20, 2019Date of Patent: March 14, 2023Assignee: FUJIFILM CorporationInventors: Akihiro Kaneko, Junichi Ito, Takashi Kawashima, Michihiro Ogawa, Tomotaka Tsuchimura
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Patent number: 11548844Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.Type: GrantFiled: May 21, 2019Date of Patent: January 10, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe
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Patent number: 11467489Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).Type: GrantFiled: March 2, 2020Date of Patent: October 11, 2022Assignee: FUJIFILM CorporationInventors: Kazunari Yagi, Takashi Kawashima, Tomotaka Tsuchimura
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Patent number: 11448961Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.Type: GrantFiled: September 5, 2019Date of Patent: September 20, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama, Kenji Yamada
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Patent number: 11440851Abstract: Methods of producing a carbon matrix composite are provided which include preparing a carbon matrix composite precursor comprising at least one carbon-based reinforcement material and a cured thermoset polymer matrix comprising a chemical composition in accordance with Formula I where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. The methods further include heating the carbon matrix composite precursor in air to a first processing temperature of between 300° C. and 500° C. to form a carbon matrix composite intermediate, and heating the carbon matrix composite intermediate in nitrogen to a second processing temperature of between 900° C. to 1650° C. and holding at the second processing temperature for at least 1 hour in an inert gas environment to form the carbon matrix composite.Type: GrantFiled: February 14, 2019Date of Patent: September 13, 2022Assignee: Systima Technologies, Inc.Inventors: Richard D. Hreha, Kristopher K. Aber, Joel P. Brubaker, Kristin M. Cable, Michael D. Rauscher
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Patent number: 11441101Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.Type: GrantFiled: September 22, 2017Date of Patent: September 13, 2022Assignees: TOKYO OHKA KOGYO CO., LTD., TOKYO ELECTRON LIMITEDInventors: Isao Hirano, Kazumasa Wakiya, Shoichi Terada, Junji Nakamura, Takayuki Toshima
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Patent number: 11332376Abstract: Apparatuses and methods to manufacture integrated circuits are described. A method of forming film on a substrate is described. The film is formed on a substrate by exposing a substrate to a diamond-like carbon precursor having an sp3 content of greater than 40 percent. Methods of etching a substrate are described. Electronic devices comprising a diamond-like carbon film are also described.Type: GrantFiled: July 7, 2020Date of Patent: May 17, 2022Assignee: Applied Materials, Inc.Inventors: Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Abhijit Basu Mallick
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Patent number: 11319276Abstract: The invention relates to a method for preparation of diesters from anhydrides of carboxylic acids.Type: GrantFiled: August 15, 2019Date of Patent: May 3, 2022Assignee: Evonik Operations GmbHInventors: Marcel Treskow, Martin Glock, Günther Gräff, Thorben Schütz, Steffen Krill
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Patent number: 11192971Abstract: According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.Type: GrantFiled: September 6, 2019Date of Patent: December 7, 2021Assignee: TOSHIBA MEMORY CORPORATIONInventors: Norikatsu Sasao, Koji Asakawa, Shinobu Sugimura
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Patent number: 11156917Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.Type: GrantFiled: August 21, 2019Date of Patent: October 26, 2021Assignee: FUJIFILM CorporationInventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
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Patent number: 11150554Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).Type: GrantFiled: October 13, 2016Date of Patent: October 19, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
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Patent number: 11117316Abstract: A method of forming a three-dimensional object can be carried out by: (a) providing a carrier and an optically transparent member having a build surface, the carrier and the build surface defining a build region therebetween; (b) filling the build region with a polymerizable liquid, the polymerizable liquid comprising: (i) a polymerizable component; (ii) upconverting particles that are excited by light at a first wavelength and upon excitation emit light at a second wavelength that is shorter than the first wavelength; and (iii) a photoiniator that catalyzes polymerization of the polymerizable component upon excitation by light at the second wavelength; (c) irradiating the build region through the optically transparent member with an excitation light at the first wavelength, and optionally but in some embodiments preferably also advancing the carrier away from the build surface, wherein the excitation light is temporally and/or spatially modulated, to thereby form the three-dimensional object from the polymerType: GrantFiled: November 2, 2017Date of Patent: September 14, 2021Assignee: Carbon, Inc.Inventors: Matthew Panzer, John R. Tumbleston
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Patent number: 11078125Abstract: A cellular material includes a continuous solid phase including an ordered ceramic material, the solid phase having a solid core including the ordered ceramic material. A composition for forming a cellular material includes: a first UV curable pre-ceramic monomer; a second UV curable pre-ceramic monomer; and a photoinitiator. A method of forming at least one ceramic waveguide includes: securing a volume of a composition including a UV curable pre-ceramic monomer; exposing the composition to a light source to form at least one polymer waveguide including a pre-ceramic material; and converting the pre-ceramic material of the polymer waveguide to a ceramic material to form a ceramic waveguide.Type: GrantFiled: March 3, 2016Date of Patent: August 3, 2021Assignee: HRL Laboratories, LLCInventors: Chaoyin Zhou, Zak C. Eckel, Alan J. Jacobsen, William Carter
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Patent number: 11016388Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.Type: GrantFiled: September 30, 2016Date of Patent: May 25, 2021Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Chang-Young Hong, Eui Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim
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Patent number: 10948822Abstract: A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.Type: GrantFiled: June 12, 2018Date of Patent: March 16, 2021Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa, Masahiro Fukushima
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Patent number: 10915022Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):Type: GrantFiled: June 20, 2018Date of Patent: February 9, 2021Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Katsuhiro Komuro, Shingo Fujita, Koji Ichikawa
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Patent number: 10754248Abstract: The present invention provides a sulfonium salt capable of providing a resist composition having few defects in photolithography where a high energy beam is used as a light source, and excellent in lithography performance by controlling acid diffusion.Type: GrantFiled: February 23, 2018Date of Patent: August 25, 2020Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takayuki Fujiwara, Ryo Mitsui, Kazuhiro Katayama
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Patent number: 10723747Abstract: A Formula of a phosphorous fire-retardant hardener having fire-retardant and heat-resistant properties as well as a low-dielectric constant. With a preparation of glass-fiber laminated board, the hardener meets UL-94V fire-retardant requirements and has a dielectric constant 5 of 4.0 (1 GHz).Type: GrantFiled: September 20, 2018Date of Patent: July 28, 2020Assignee: NAN YA PLASTICS CORPORATIONInventors: Cheng-Chung Lee, Chen-Hua Wu
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Patent number: 10691023Abstract: Methods for performing a lithography process are provided. The method for performing a lithography process includes forming a resist layer over a substrate and exposing a portion of the resist layer to form an exposed portion between unexposed portions. The method for performing a lithography process further includes developing the resist layer to remove the exposed portion of the resist layer such that an opening is formed between the unexposed portions and forming a post treatment coating material in the opening and over the unexposed portions of the resist layer. The method for performing a lithography process further includes reacting a portion of the unexposed portions of the resist layer with the post treatment coating material by performing a post treatment process and removing the post treatment coating material.Type: GrantFiled: March 29, 2018Date of Patent: June 23, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin
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Patent number: 10627717Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1) and a constitutional unit (a1) which comprises an acid-decomposable group whose polarity is increased due to an action of an acid, and the constitutional unit (a1) comprises a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-1) and a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-2).Type: GrantFiled: March 16, 2018Date of Patent: April 21, 2020Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Junichi Tsuchiya, Masafumi Fujisaki, Kotaro Endo
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Patent number: 10620535Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.Type: GrantFiled: September 7, 2017Date of Patent: April 14, 2020Assignee: FUJIFILM CorporationInventors: Kazutaka Takahashi, Daisuke Hamada, Shunsuke Kitajima, Hirokazu Kyota, Kaoru Aoyagi, Mitsuji Yoshibayashi
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Patent number: 10599033Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.Type: GrantFiled: December 20, 2017Date of Patent: March 24, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takashi Nishimura, Koji Ichikawa
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Patent number: 10545405Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.Type: GrantFiled: August 24, 2017Date of Patent: January 28, 2020Assignee: FUJIFILM CorporationInventors: Shuhei Yamaguchi, Koutarou Takahashi, Toshiaki Fukuhara, Shuji Hirano
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Patent number: 10520811Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.Type: GrantFiled: February 8, 2018Date of Patent: December 31, 2019Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Masaki Ohashi
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Patent number: 10414918Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.Type: GrantFiled: July 5, 2017Date of Patent: September 17, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
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Patent number: 10377894Abstract: The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.Type: GrantFiled: September 30, 2015Date of Patent: August 13, 2019Assignee: LG Chem, Ltd.Inventors: Jeong Kyu Lee, Je Gwon Lee, In Young Song, Sung Joon Oh, Yeon Joo Kang, Sung Soo Yoon, Jung Keun Kim
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Patent number: 10370508Abstract: Chemical compositions are provided that include at least one of Formula I or Formula II: where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. Composites formed from the chemical composition and at least one reinforcement material are also provided.Type: GrantFiled: June 28, 2017Date of Patent: August 6, 2019Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Joel P. Brubaker, Patrick J. Hood
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Patent number: 10280255Abstract: An aspect of the present disclosure is a bioderived polymer that includes a first repeat unit that includes where n is an integer between 1 and 1000, and R1 is a first hydrocarbon group.Type: GrantFiled: April 25, 2017Date of Patent: May 7, 2019Assignee: Alliance for Sustainable Energy, LLCInventors: Gregg Tyler Beckham, Derek R. Vardon, Nicholas Rorrer, John R. Dorgan
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Patent number: 10227477Abstract: A glass mat includes an assembly of glass fibers, a binder composition and an asphaltic coating. The binder composition includes an organic resin and an adhesion promoter. The glass mat has an at least 2% increase in tear strength as measured using the methods specified in ASTM D3462, compared to an asphaltic coated glass mat having a binder composition without the adhesion promoter. Further provided is an asphalt roofing product including the glass mat and a method of increasing tear strength in an asphalt roofing product.Type: GrantFiled: March 13, 2017Date of Patent: March 12, 2019Assignee: SAINT-GOBAIN ADFORS CANADA, LTD.Inventors: Wayne R. Vliet, Missy R. Miller, Ronald L. Franklin, Jr., Charles G. Herbert, Nancy E. Brown, Fei Wang
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Patent number: 10160721Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—C(?O)—O—, *—O—C(?O)—, *—O—C(?O)—O— or —O—, where * represents a binding site to —C(R1)(R2)— or —C(Q1)(Q2)-, A1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent, R3 represents a hydrogen atom or a methyl group, and Z+ represents an organic cation.Type: GrantFiled: August 30, 2017Date of Patent: December 25, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Isao Yoshida, Koji Ichikawa
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Patent number: 10126650Abstract: A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: GrantFiled: June 24, 2016Date of Patent: November 13, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Kaoru Araki, Koji Ichikawa
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Patent number: 10114287Abstract: The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.Type: GrantFiled: September 15, 2015Date of Patent: October 30, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara
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Patent number: 10115592Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes forming an under layer on a substrate; forming a silicon-containing middle layer on the under layer, wherein the silicon-containing middle layer has a thermal base generator (TBG) composite; forming a photosensitive layer on the silicon-containing middle layer; performing an exposing process to the photosensitive layer; and developing the photosensitive layer, thereby forming a patterned photosensitive layer.Type: GrantFiled: May 15, 2017Date of Patent: October 30, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chen-Yu Liu, Ching-Yu Chang, Chin-Hsiang Lin
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Patent number: 10111328Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).Type: GrantFiled: March 6, 2014Date of Patent: October 23, 2018Assignee: HTACHI CHEMICAL COMPANY, LTD.Inventors: Nobuhito Komuro, Shinya Oosaki, Toshizumi Yoshino, Kuniaki Satou
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Patent number: 10106666Abstract: Provided is a curable silicone resin composition containing an inorganic oxide that may form an optical member having a relatively high refractive index and excellent optical transparency. The curable silicone resin composition may include a first curable silicone resin having a first functional group for surface bonding and a first crosslinkable functional group, a second curable silicone resin having a second functional group for surface bonding and a second crosslinkable functional group, and first and second inorganic oxide particles bonded to the first and second curable silicone resins by the first and second functional groups for surface bonding, respectively. The first and second crosslinkable functional groups may be bonded by applying energy.Type: GrantFiled: December 6, 2016Date of Patent: October 23, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventor: Ryosuke Kamitani
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Post development treatment method and material for shrinking critical dimension of photoresist layer
Patent number: 10036957Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes forming a patterned photoresist on a material layer, applying a first bonding material to a side surface of the patterned photoresist, performing a treatment on the first bonding material to bond the first bonding material to the side surface of the patterned photoresist, wherein the treatment creates a bonding site on the first bonding material configured to bond to a second bonding material, applying the second bonding material to a side surface of the first bonding material, and patterning the material layer by selectively processing a portion of the material layer exposed by the patterned photoresist, the first bonding material, and the second bonding material.Type: GrantFiled: January 29, 2016Date of Patent: July 31, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Siao-Shan Wang, Ching-Yu Chang -
Patent number: 10018913Abstract: Provided are an active-light-sensitive or radiation-sensitive resin composition having high DOF and excellent LWR, a pattern forming method using the composition, and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having a group that decomposes by the action of an acid to generate a polar group, including at least a specific repeating unit (a1) represented by General Formula (1); a repeating unit (b1) having at least one of a lactone structure, a sultone structure, or a carbonate structure; and a repeating unit (b2) having at least one of a lactone structure, a sultone structure, or a carbonate structure, which is different from the repeating unit (b1), the Ohnishi parameter of the repeating unit (b1) is larger than the Ohnishi parameter of the repeating unit (b2), and the difference between both the Ohnishi parameters is 0.85 or more.Type: GrantFiled: January 6, 2017Date of Patent: July 10, 2018Assignee: FUJIFILM CorporationInventors: Akiyoshi Goto, Masafumi Kojima, Michihiro Shirakawa, Keita Kato
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Patent number: 9977329Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.Type: GrantFiled: January 21, 2015Date of Patent: May 22, 2018Assignee: TORAY INDUSTRIES, INC.Inventors: Hirokazu Iimori, Toshiyasu Hibino, Mitsuhito Suwa
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Patent number: 9944738Abstract: A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), wherein Mb+ represents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b), This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity.Type: GrantFiled: July 11, 2016Date of Patent: April 17, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke Domon, Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake
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Patent number: 9908991Abstract: An organic pigment composition that allows a colored item to have good color saturation and high resistance to a change in hue even when subjected to a thermal history for a prolonged period. A color filter includes an organic pigment composition for color filters in a pixel portion. The organic pigment composition for color filters includes an organic pigment (A) having an average primary particle size of 100 nm or less; and a copolymer (B) of a (meth)acrylic acid ester having a phosphate group and another (meth)acrylic acid ester having no phosphate group, the amount of a nonvolatile component of the copolymer (B) being 0.1 to 15 parts relative to 100 parts of the organic pigment (A) on a mass basis.Type: GrantFiled: May 16, 2013Date of Patent: March 6, 2018Assignee: DIC CORPORATIONInventors: Masanori Fujimaki, Mayumi Tokuoka, Akira Kimura, Katsunori Shimada, Kayoko Fukushima, Masaharu Takahashi
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Patent number: 9891522Abstract: The present disclosure provides a sensitive material. The sensitive material comprises a copolymer that includes polymer units including a hydrophobic unit; a hydrophilic unit comprising an acid generator; and a connection unit bonded between the hydrophobic unit and the hydrophilic unit, the connection unit comprising an acid-labile group.Type: GrantFiled: July 29, 2015Date of Patent: February 13, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ya-Ling Cheng, Ching-Yu Chang