Polyester Patents (Class 430/285.1)
  • Patent number: 11467489
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).
    Type: Grant
    Filed: March 2, 2020
    Date of Patent: October 11, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Kazunari Yagi, Takashi Kawashima, Tomotaka Tsuchimura
  • Patent number: 11448961
    Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: September 20, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama, Kenji Yamada
  • Patent number: 11440851
    Abstract: Methods of producing a carbon matrix composite are provided which include preparing a carbon matrix composite precursor comprising at least one carbon-based reinforcement material and a cured thermoset polymer matrix comprising a chemical composition in accordance with Formula I where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. The methods further include heating the carbon matrix composite precursor in air to a first processing temperature of between 300° C. and 500° C. to form a carbon matrix composite intermediate, and heating the carbon matrix composite intermediate in nitrogen to a second processing temperature of between 900° C. to 1650° C. and holding at the second processing temperature for at least 1 hour in an inert gas environment to form the carbon matrix composite.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: September 13, 2022
    Assignee: Systima Technologies, Inc.
    Inventors: Richard D. Hreha, Kristopher K. Aber, Joel P. Brubaker, Kristin M. Cable, Michael D. Rauscher
  • Patent number: 11441101
    Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: September 13, 2022
    Assignees: TOKYO OHKA KOGYO CO., LTD., TOKYO ELECTRON LIMITED
    Inventors: Isao Hirano, Kazumasa Wakiya, Shoichi Terada, Junji Nakamura, Takayuki Toshima
  • Patent number: 11332376
    Abstract: Apparatuses and methods to manufacture integrated circuits are described. A method of forming film on a substrate is described. The film is formed on a substrate by exposing a substrate to a diamond-like carbon precursor having an sp3 content of greater than 40 percent. Methods of etching a substrate are described. Electronic devices comprising a diamond-like carbon film are also described.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: May 17, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Abhijit Basu Mallick
  • Patent number: 11319276
    Abstract: The invention relates to a method for preparation of diesters from anhydrides of carboxylic acids.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: May 3, 2022
    Assignee: Evonik Operations GmbH
    Inventors: Marcel Treskow, Martin Glock, Günther Gräff, Thorben Schütz, Steffen Krill
  • Patent number: 11192971
    Abstract: According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: December 7, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Norikatsu Sasao, Koji Asakawa, Shinobu Sugimura
  • Patent number: 11156917
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: October 26, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
  • Patent number: 11150554
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: October 19, 2021
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
  • Patent number: 11117316
    Abstract: A method of forming a three-dimensional object can be carried out by: (a) providing a carrier and an optically transparent member having a build surface, the carrier and the build surface defining a build region therebetween; (b) filling the build region with a polymerizable liquid, the polymerizable liquid comprising: (i) a polymerizable component; (ii) upconverting particles that are excited by light at a first wavelength and upon excitation emit light at a second wavelength that is shorter than the first wavelength; and (iii) a photoiniator that catalyzes polymerization of the polymerizable component upon excitation by light at the second wavelength; (c) irradiating the build region through the optically transparent member with an excitation light at the first wavelength, and optionally but in some embodiments preferably also advancing the carrier away from the build surface, wherein the excitation light is temporally and/or spatially modulated, to thereby form the three-dimensional object from the polymer
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: September 14, 2021
    Assignee: Carbon, Inc.
    Inventors: Matthew Panzer, John R. Tumbleston
  • Patent number: 11078125
    Abstract: A cellular material includes a continuous solid phase including an ordered ceramic material, the solid phase having a solid core including the ordered ceramic material. A composition for forming a cellular material includes: a first UV curable pre-ceramic monomer; a second UV curable pre-ceramic monomer; and a photoinitiator. A method of forming at least one ceramic waveguide includes: securing a volume of a composition including a UV curable pre-ceramic monomer; exposing the composition to a light source to form at least one polymer waveguide including a pre-ceramic material; and converting the pre-ceramic material of the polymer waveguide to a ceramic material to form a ceramic waveguide.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: August 3, 2021
    Assignee: HRL Laboratories, LLC
    Inventors: Chaoyin Zhou, Zak C. Eckel, Alan J. Jacobsen, William Carter
  • Patent number: 11016388
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: May 25, 2021
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Eui Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim
  • Patent number: 10948822
    Abstract: A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: March 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masahiro Fukushima
  • Patent number: 10915022
    Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: February 9, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Shingo Fujita, Koji Ichikawa
  • Patent number: 10754248
    Abstract: The present invention provides a sulfonium salt capable of providing a resist composition having few defects in photolithography where a high energy beam is used as a light source, and excellent in lithography performance by controlling acid diffusion.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: August 25, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Kazuhiro Katayama
  • Patent number: 10723747
    Abstract: A Formula of a phosphorous fire-retardant hardener having fire-retardant and heat-resistant properties as well as a low-dielectric constant. With a preparation of glass-fiber laminated board, the hardener meets UL-94V fire-retardant requirements and has a dielectric constant 5 of 4.0 (1 GHz).
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: July 28, 2020
    Assignee: NAN YA PLASTICS CORPORATION
    Inventors: Cheng-Chung Lee, Chen-Hua Wu
  • Patent number: 10691023
    Abstract: Methods for performing a lithography process are provided. The method for performing a lithography process includes forming a resist layer over a substrate and exposing a portion of the resist layer to form an exposed portion between unexposed portions. The method for performing a lithography process further includes developing the resist layer to remove the exposed portion of the resist layer such that an opening is formed between the unexposed portions and forming a post treatment coating material in the opening and over the unexposed portions of the resist layer. The method for performing a lithography process further includes reacting a portion of the unexposed portions of the resist layer with the post treatment coating material by performing a post treatment process and removing the post treatment coating material.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: June 23, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin
  • Patent number: 10627717
    Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1) and a constitutional unit (a1) which comprises an acid-decomposable group whose polarity is increased due to an action of an acid, and the constitutional unit (a1) comprises a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-1) and a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-2).
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: April 21, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Junichi Tsuchiya, Masafumi Fujisaki, Kotaro Endo
  • Patent number: 10620535
    Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: April 14, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Daisuke Hamada, Shunsuke Kitajima, Hirokazu Kyota, Kaoru Aoyagi, Mitsuji Yoshibayashi
  • Patent number: 10599033
    Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: March 24, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takashi Nishimura, Koji Ichikawa
  • Patent number: 10545405
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: January 28, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Koutarou Takahashi, Toshiaki Fukuhara, Shuji Hirano
  • Patent number: 10520811
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: December 31, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10414918
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
  • Patent number: 10377894
    Abstract: The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: August 13, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Jeong Kyu Lee, Je Gwon Lee, In Young Song, Sung Joon Oh, Yeon Joo Kang, Sung Soo Yoon, Jung Keun Kim
  • Patent number: 10370508
    Abstract: Chemical compositions are provided that include at least one of Formula I or Formula II: where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. Composites formed from the chemical composition and at least one reinforcement material are also provided.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: August 6, 2019
    Assignee: Jalapeno Holdings, LLC
    Inventors: Richard D. Hreha, Joel P. Brubaker, Patrick J. Hood
  • Patent number: 10280255
    Abstract: An aspect of the present disclosure is a bioderived polymer that includes a first repeat unit that includes where n is an integer between 1 and 1000, and R1 is a first hydrocarbon group.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: May 7, 2019
    Assignee: Alliance for Sustainable Energy, LLC
    Inventors: Gregg Tyler Beckham, Derek R. Vardon, Nicholas Rorrer, John R. Dorgan
  • Patent number: 10227477
    Abstract: A glass mat includes an assembly of glass fibers, a binder composition and an asphaltic coating. The binder composition includes an organic resin and an adhesion promoter. The glass mat has an at least 2% increase in tear strength as measured using the methods specified in ASTM D3462, compared to an asphaltic coated glass mat having a binder composition without the adhesion promoter. Further provided is an asphalt roofing product including the glass mat and a method of increasing tear strength in an asphalt roofing product.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: March 12, 2019
    Assignee: SAINT-GOBAIN ADFORS CANADA, LTD.
    Inventors: Wayne R. Vliet, Missy R. Miller, Ronald L. Franklin, Jr., Charles G. Herbert, Nancy E. Brown, Fei Wang
  • Patent number: 10160721
    Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—C(?O)—O—, *—O—C(?O)—, *—O—C(?O)—O— or —O—, where * represents a binding site to —C(R1)(R2)— or —C(Q1)(Q2)-, A1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent, R3 represents a hydrogen atom or a methyl group, and Z+ represents an organic cation.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: December 25, 2018
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Isao Yoshida, Koji Ichikawa
  • Patent number: 10126650
    Abstract: A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: November 13, 2018
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takayuki Miyagawa, Kaoru Araki, Koji Ichikawa
  • Patent number: 10114287
    Abstract: The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: October 30, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara
  • Patent number: 10115592
    Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes forming an under layer on a substrate; forming a silicon-containing middle layer on the under layer, wherein the silicon-containing middle layer has a thermal base generator (TBG) composite; forming a photosensitive layer on the silicon-containing middle layer; performing an exposing process to the photosensitive layer; and developing the photosensitive layer, thereby forming a patterned photosensitive layer.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: October 30, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chen-Yu Liu, Ching-Yu Chang, Chin-Hsiang Lin
  • Patent number: 10106666
    Abstract: Provided is a curable silicone resin composition containing an inorganic oxide that may form an optical member having a relatively high refractive index and excellent optical transparency. The curable silicone resin composition may include a first curable silicone resin having a first functional group for surface bonding and a first crosslinkable functional group, a second curable silicone resin having a second functional group for surface bonding and a second crosslinkable functional group, and first and second inorganic oxide particles bonded to the first and second curable silicone resins by the first and second functional groups for surface bonding, respectively. The first and second crosslinkable functional groups may be bonded by applying energy.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: October 23, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Ryosuke Kamitani
  • Patent number: 10111328
    Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: October 23, 2018
    Assignee: HTACHI CHEMICAL COMPANY, LTD.
    Inventors: Nobuhito Komuro, Shinya Oosaki, Toshizumi Yoshino, Kuniaki Satou
  • Patent number: 10036957
    Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes forming a patterned photoresist on a material layer, applying a first bonding material to a side surface of the patterned photoresist, performing a treatment on the first bonding material to bond the first bonding material to the side surface of the patterned photoresist, wherein the treatment creates a bonding site on the first bonding material configured to bond to a second bonding material, applying the second bonding material to a side surface of the first bonding material, and patterning the material layer by selectively processing a portion of the material layer exposed by the patterned photoresist, the first bonding material, and the second bonding material.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: July 31, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Siao-Shan Wang, Ching-Yu Chang
  • Patent number: 10018913
    Abstract: Provided are an active-light-sensitive or radiation-sensitive resin composition having high DOF and excellent LWR, a pattern forming method using the composition, and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having a group that decomposes by the action of an acid to generate a polar group, including at least a specific repeating unit (a1) represented by General Formula (1); a repeating unit (b1) having at least one of a lactone structure, a sultone structure, or a carbonate structure; and a repeating unit (b2) having at least one of a lactone structure, a sultone structure, or a carbonate structure, which is different from the repeating unit (b1), the Ohnishi parameter of the repeating unit (b1) is larger than the Ohnishi parameter of the repeating unit (b2), and the difference between both the Ohnishi parameters is 0.85 or more.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: July 10, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Michihiro Shirakawa, Keita Kato
  • Patent number: 9977329
    Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: May 22, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu Iimori, Toshiyasu Hibino, Mitsuhito Suwa
  • Patent number: 9944738
    Abstract: A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), wherein Mb+ represents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b), This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: April 17, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Domon, Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake
  • Patent number: 9908991
    Abstract: An organic pigment composition that allows a colored item to have good color saturation and high resistance to a change in hue even when subjected to a thermal history for a prolonged period. A color filter includes an organic pigment composition for color filters in a pixel portion. The organic pigment composition for color filters includes an organic pigment (A) having an average primary particle size of 100 nm or less; and a copolymer (B) of a (meth)acrylic acid ester having a phosphate group and another (meth)acrylic acid ester having no phosphate group, the amount of a nonvolatile component of the copolymer (B) being 0.1 to 15 parts relative to 100 parts of the organic pigment (A) on a mass basis.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: March 6, 2018
    Assignee: DIC CORPORATION
    Inventors: Masanori Fujimaki, Mayumi Tokuoka, Akira Kimura, Katsunori Shimada, Kayoko Fukushima, Masaharu Takahashi
  • Patent number: 9891522
    Abstract: The present disclosure provides a sensitive material. The sensitive material comprises a copolymer that includes polymer units including a hydrophobic unit; a hydrophilic unit comprising an acid generator; and a connection unit bonded between the hydrophobic unit and the hydrophilic unit, the connection unit comprising an acid-labile group.
    Type: Grant
    Filed: July 29, 2015
    Date of Patent: February 13, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ya-Ling Cheng, Ching-Yu Chang
  • Patent number: 9869933
    Abstract: Methods of trimming a photoresist pattern comprise: (a) providing a semiconductor substrate; (b) forming a photoresist pattern over the semiconductor substrate, wherein the photoresist pattern is formed from a photoresist composition comprising: a first polymer comprising acid labile groups; and a photoacid generator; (c) coating a pattern trimming composition over the photoresist pattern, wherein the pattern trimming composition comprises a second polymer and a solvent system, wherein the solvent system comprises one or more monoether solvents in a combined amount of 50 wt % or more based on the solvent system; (d) heating the coated semiconductor substrate, thereby causing a change in solubility of a surface region of the photoresist pattern in a rinsing agent to be applied; and (e) contacting the photoresist pattern with a rinsing agent to remove the surface region of the photoresist pattern, thereby forming a trimmed photoresist pattern.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: January 16, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin Rowell, Cong Liu, Cheng Bai Xu, Irvinder Kaur, Jong Keun Park
  • Patent number: 9862695
    Abstract: Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where Ra is selected typically from hydrogen and C1-C6 alkyl; R1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C1-C6 alkyl; “A” is selected from C1-C6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C1-C6 divalent organic group.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: January 9, 2018
    Assignees: DAICEL CORPORATION, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroshi Koyama, Masamichi Nishimura, Naoki Yamashita, Yoshitaka Komuro, Tomoyuki Hirano, Yoshiyuki Utsumi
  • Patent number: 9841679
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a partial structure represented by General Formula (X), and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: December 12, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Masafumi Kojima, Akiyoshi Goto, Akinori Shibuya, Keita Kato, Kei Yamamoto
  • Patent number: 9810983
    Abstract: A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: November 7, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
  • Patent number: 9791777
    Abstract: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: October 17, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Michihiro Shirakawa, Keita Kato, Keiyu Ou
  • Patent number: 9690194
    Abstract: A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Ra1 represents a monovalent substituent having a polymerizable group, La1 represents O, S or a methylene group, R1 represents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom, and n represents an integer of 0 to 5).
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: June 27, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Takahiro Dazai, Masatoshi Arai
  • Patent number: 9671692
    Abstract: A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L1 represents a C1-C8 fluorinated alkanediyl group, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L1, and R2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: June 6, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
  • Patent number: 9620363
    Abstract: In lithography, a composition comprising a novolak resin comprising recurring units of hydroxycoumarin is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: April 11, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Kori, Tsutomu Ogihara
  • Patent number: 9581904
    Abstract: Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: February 28, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSisto, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
  • Patent number: 9551931
    Abstract: A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: January 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Akinori Shibuya, Akiyoshi Goto, Michihiro Shirakawa, Kei Yamamoto, Fumihiro Yoshino
  • Patent number: 9541828
    Abstract: The present invention relates to a printing element having at least one polymer layer which has photoimageable constituents and a chemically functionalized polymer to make the polymer layer either more hydrophobic or hydrophilic. In one embodiment, the printing element comprises two adjacent polymer layers on a substrate in which the photoimaged layer comprises a polymer chemically modified with hydrophobic fluoroalkyl side groups to provide differential wetting with hydrophilic inks.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: January 10, 2017
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Gary Delmar Jaycox, Graciela Beatriz Blanchet, Nancy G Tassi