Polyester Patents (Class 430/285.1)
-
Publication number: 20150086927Abstract: A photoresist composition comprising: a resin which has an acid-labile group; an acid generator; a compound which has a sulfide bond and a mercapto group; and a solvent.Type: ApplicationFiled: September 19, 2014Publication date: March 26, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masako SUGIHARA, Maki KAWAMURA, Maiko GODA
-
Publication number: 20150079508Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.Type: ApplicationFiled: November 21, 2014Publication date: March 19, 2015Applicant: FUJIFILM CORPORATIONInventors: Junichi ITO, Shuhei YAMAGUCHI, Hidenori TAKAHASHI, Kei YAMAMOTO
-
Publication number: 20150079520Abstract: An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.Type: ApplicationFiled: November 14, 2014Publication date: March 19, 2015Applicant: JSR CORPORATIONInventors: Hayato NAMAI, Norihiko IKEDA
-
Patent number: 8980968Abstract: A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,Type: GrantFiled: February 1, 2011Date of Patent: March 17, 2015Assignee: Canon Kabushiki KaishaInventors: Hyo Takahashi, Ken Ikegame, Masako Shimomura
-
Publication number: 20150072292Abstract: Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.Type: ApplicationFiled: September 6, 2013Publication date: March 12, 2015Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
-
Publication number: 20150072291Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.Type: ApplicationFiled: September 6, 2013Publication date: March 12, 2015Applicants: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE TEXAS A&M UNIVERSITY SYSTEMInventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
-
Patent number: 8975005Abstract: A black curable composition for a wafer level lens includes (A) a metal-containing inorganic pigment, (B) a polymerization initiator, and (C) a polymerizable compound. The (A) metal-containing inorganic pigment is preferably titanium black.Type: GrantFiled: September 28, 2010Date of Patent: March 10, 2015Assignee: FUJIFILM CorporationInventor: Kazuto Shimada
-
Publication number: 20150064626Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.Type: ApplicationFiled: July 14, 2014Publication date: March 5, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa
-
Publication number: 20150056555Abstract: A system and method for depositing a photoresist and utilizing the photoresist are provided. In an embodiment a deposition chamber is utilized along with a first precursor material comprising carbon-carbon double bonds and a second precursor material comprising repeating units to deposit the photoresist onto a substrate. The first precursor material is turned into a plasma in a remote plasma chamber prior to being introduced into the deposition chamber. The resulting photoresist comprises a carbon backbone with carbon-carbon double bonds.Type: ApplicationFiled: August 22, 2013Publication date: February 26, 2015Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Keng-Chu Lin, Joung-Wei Liou, Cheng-Han Wu, Ya Hui Chang
-
Publication number: 20150056557Abstract: A chemically amplified positive-type photosensitive resin composition including a compound represented by the following formula (1), having a melting point of 40° C. or lower at 1 atm, a resin whose solubility in alkali increases under the action of an acid, and a photoacid generator. In the formula, R1 represents a hydrogen atom or an organic group; and R2, R3, and R4 independently represent a monovalent hydrocarbon group which may have a substituent, and at least two of R2, R3, and R4 may be bonded to each other to form a cyclic structure.Type: ApplicationFiled: August 14, 2014Publication date: February 26, 2015Inventor: Makiko Irie
-
Publication number: 20150056556Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition includes a binder agent, a first photomonomer, and a photo initiator. The first photomonomer has at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.Type: ApplicationFiled: December 26, 2013Publication date: February 26, 2015Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Hsien-Kuang LIN, Sue-May CHEN, Jauder JENG, Yu-Lin LIU, Su-Huey CHEN
-
Publication number: 20150050595Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) an initiator; (D) a pigment; and (E) a solvent, and a light blocking layer using the same, wherein, in the following Chemical Formula 1, each substituent is the same as defined in the detailed description.Type: ApplicationFiled: April 3, 2014Publication date: February 19, 2015Applicant: Cheil Industries Inc.Inventors: Seung-Hyun KIM, Dong-Hoon WON, Youn-Gi LEE, Chang-Min LEE, Hwan-Sung CHEON, Seung-Jib CHOI, Min-Sung KIM, Tae-Ho KIM
-
Publication number: 20150050586Abstract: A photosensitive conductive paste includes a dicarboxylic acid or an acid anhydride thereof (A); a compound (B) having an acid value of 40 to 200 mg KOH/g; an alicyclic compound (C); a photopolymerization initiator (D); and a conductive filler (E).Type: ApplicationFiled: March 4, 2013Publication date: February 19, 2015Applicant: Toray Industries, Inc.Inventors: Tsukuru Mizuguchi, Satoshi Matsuba, Kazutaka Kusano
-
Patent number: 8956804Abstract: A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.Type: GrantFiled: June 7, 2012Date of Patent: February 17, 2015Assignee: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Sander Frederik Wuister, Roelof Koole, Emiel Peeters
-
Patent number: 8956810Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.Type: GrantFiled: September 12, 2011Date of Patent: February 17, 2015Assignees: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
-
Publication number: 20150044613Abstract: A chemically amplified photosensitive resin composition including a compound represented by formula (1) and/or formula (4), a resin having an acid-dissociative dissolution-controlling group whose solubility in alkali increases under the action of an acid or an alkali-soluble resin, a photoacid generator, and an organic solvent, in which the solid concentration is 40% by mass to 65% by mass. R1, R2, and R3 independently represent a hydrogen atom or an alkyl group, R4 represents a group represented by formula (2) or (3), and R5 and R6 represent a monovalent hydrocarbon group which may have a substituent.Type: ApplicationFiled: August 4, 2014Publication date: February 12, 2015Inventors: Makiko Irie, Shota Katayama
-
Publication number: 20150034886Abstract: A photosensitive resin composition for a color filter includes (A) a dye including a cation moiety represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) an acrylic-based binder resin; and (E) a solvent, and a color filter using the same.Type: ApplicationFiled: December 5, 2013Publication date: February 5, 2015Applicant: CHEIL INDUSTRIES INC.Inventors: Chang-Min LEE, Kwang-Won SEO, Yeon-Soo LEE, Sang-Won CHO, Seung-Jib CHOI, Soo-Young HEO
-
Publication number: 20150030982Abstract: A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.Type: ApplicationFiled: July 18, 2014Publication date: January 29, 2015Inventors: Douglas Robert Robello, Charles Warren Wright
-
Publication number: 20150030981Abstract: A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.Type: ApplicationFiled: July 18, 2014Publication date: January 29, 2015Inventors: Douglas Robert Robello, Charles Warren Wright
-
Patent number: 8940476Abstract: Provided is a pattern forming method that is excellent in resolving power such as pre-bridging dimension, a roughness performance such as line edge roughness, and development time dependency, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition that contains a resin (A) and a compound (B) which has a polymerizable group and generates an acid by being irradiated with actinic rays or radiations; (2) exposing the film; and (3) developing the exposed film using a developer that contains an organic solvent, wherein a pattern formed in this method is a negative pattern.Type: GrantFiled: February 15, 2012Date of Patent: January 27, 2015Assignee: FUJIFILM CorporationInventor: Shuhei Yamaguchi
-
Publication number: 20150017586Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.Type: ApplicationFiled: July 3, 2014Publication date: January 15, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Masayoshi Sagehashi
-
Patent number: 8927195Abstract: A photosensitive composition includes (A) a polyurethane obtained by reacting a diol component including a compound represented by the following Formula (I) with a polyisocyanate component; and (B) a photosensitive component. In Formula (I), A represents a single bond, or a divalent linking group including an atom selected from the group consisting of a carbon atom, a hydrogen atom, and an oxygen atoms; B represents a monovalent organic group; each of R1 to R5 independently represents a hydrogen atom or an alkyl group; m represents an integer from 0 to 3; n represents an integer from 0 to 3; and m+n is not zero.Type: GrantFiled: January 22, 2014Date of Patent: January 6, 2015Assignee: FUJIFILM CorporationInventors: Yoshinori Taguchi, Takashi Aridomi
-
Publication number: 20150004545Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.Type: ApplicationFiled: September 19, 2014Publication date: January 1, 2015Applicant: JSR CORPORATIONInventors: Hayato NAMAI, Norihiko IKEDA, Takanori KAWAKAMI
-
Publication number: 20150004544Abstract: A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.Type: ApplicationFiled: September 15, 2014Publication date: January 1, 2015Applicant: JSR CORPORATIONInventor: Hayato NAMAI
-
Patent number: 8920689Abstract: A photosensitive resin composition for a color filter includes (A) a dye polymer composite including a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as described in the detailed description, (B) an acrylic-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, and a color filter using the same.Type: GrantFiled: March 28, 2013Date of Patent: December 30, 2014Assignee: Cheil Industries Inc.Inventors: Taek-Jin Baek, Seong-Ryong Nam, Won-A Noh, Chang-Min Lee, Sang-Won Cho, Gyu-Seok Han
-
Publication number: 20140374677Abstract: A colored composition including: (A) a phthalocyanine compound having a particular structure, (B) a yellow coloring material, and (C) a solvent.Type: ApplicationFiled: September 5, 2014Publication date: December 25, 2014Applicant: FUJIFILM CORPORATIONInventors: Shuichiro OSADA, Kazumasa MOROZUMI, Yuuichi FUKUSHIGE
-
Publication number: 20140377705Abstract: Disclosed is a lithographic printing plate allowing for high running performance of the developer, wide water window and high printing durability. The lithographic printing plate precursor comprises a photosensitive layer on a support, wherein the photosensitive layer comprises (A) a polymerizable compound, (B) a polymerization initiator, (C) a polyvinyl acetal binder containing at least one kind of repeat units represented by general formula (I-c), general formula (I-b) and general formula (I-a), and (D) an acrylic resin binder.Type: ApplicationFiled: August 25, 2014Publication date: December 25, 2014Applicant: FUJIFILM CorporationInventors: Ichiro KOYAMA, Junya ABE
-
Patent number: 8916334Abstract: The present disclosure provides a micro-composite material used in the fabrication of three-dimensional objects, and associated methods and systems. In one example, a micro-composite material used in the fabrication of a three-dimensional object can comprise micronized polymeric particles; a photocurable curing agent; and a dye present in the micro-composite material in an amount at from 0.0001 wt % to 0.1 wt %, the dye having a ?max between 350 nm and 800 nm.Type: GrantFiled: January 28, 2013Date of Patent: December 23, 2014Assignee: Hewlett-Packard Development Company, L.P.Inventors: Sivapackia Ganapathiappan, Krzysztof Nauka, Hou T. Ng
-
Patent number: 8911647Abstract: Disclosed is a photosensitive resin composition for a color filter including (A) a dye-polymer composite wherein the dye includes a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.Type: GrantFiled: October 30, 2013Date of Patent: December 16, 2014Assignee: Cheil Industries Inc.Inventors: Sang-Won Cho, Won-A Noh, Soo-Young Heo, Han-Chul Hwang, Gyu-Seok Han
-
Publication number: 20140363770Abstract: A negative tone resist composition for solvent developing including: a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid; a photodecomposable quencher (D0) which generates acid having a pKa of 2.0 or more; and a fluorine additive (F) containing a fluorine-containing polymeric compound (f) which has a structural unit (f0-1) represented by general formula (f0-1) shown below or a structural unit (f0-2) represented by general formula (f0-2) shown below. In the formulae, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; and Rf1 represents an aliphatic hydrocarbon group containing a fluorine atom.Type: ApplicationFiled: June 9, 2014Publication date: December 11, 2014Inventors: Tomohiro Oikawa, Rikita Tsunoda, Yusuke Suzuki, Jiro Yokoya
-
Publication number: 20140363758Abstract: There is provided a pattern forming method comprising (A) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin containing a repeating unit having a phenol skeleton and a repeating unit having a group capable of decomposing by the action of an acid to produce an alcoholic hydroxy group; (B) exposing the film; and (C) developing the exposed film by using an organic solvent-containing developer.Type: ApplicationFiled: August 22, 2014Publication date: December 11, 2014Applicant: FUJIFILM CORPORATIONInventors: Wataru NIHASHI, Hiroo TAKIZAWA, Shuji HIRANO
-
Publication number: 20140360395Abstract: A color-forming composition contains (A) a radical generator, (B) a compound represented by the following formula (1) and (C) a binder polymer: wherein, in the formula (1), R1 represents a group which reacts with a radical generated from the radical generator (A) to be released and forms a dye after the release, and T represents a nitrogen-containing hetero ring.Type: ApplicationFiled: August 22, 2014Publication date: December 11, 2014Applicant: FUJIFILM CorporationInventors: Koki NAKAMURA, Akio MIZUNO, Shota SUZUKI
-
Patent number: 8906271Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.Type: GrantFiled: October 16, 2012Date of Patent: December 9, 2014Assignee: Cheil Industries Inc.Inventors: Yeon-Soo Lee, Seong-Ryong Nam, Taek-Jin Baek, Sang-Won Cho, Jae-Hyun Kim, Chang-Min Lee, Gyu-Seok Han
-
Patent number: 8906594Abstract: Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.Type: GrantFiled: June 15, 2012Date of Patent: December 9, 2014Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Chunwei Chen, PingHung Lu, Weihong Liu, Medhat Toukhy, SangChul Kim, SookMee Lai
-
Publication number: 20140356789Abstract: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.Type: ApplicationFiled: May 30, 2014Publication date: December 4, 2014Inventors: Charles Warren Wright, Ralph Rainer Dammel
-
Publication number: 20140356771Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).Type: ApplicationFiled: July 30, 2014Publication date: December 4, 2014Inventors: Shuhei YAMAGUCHI, Hidenori TAKAHASHI, Junichi ITO, Kei YAMAMOTO
-
Publication number: 20140356788Abstract: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having a sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.Type: ApplicationFiled: May 30, 2014Publication date: December 4, 2014Inventors: Charles Warren Wright, Douglas Robert Robello
-
Publication number: 20140349223Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.Type: ApplicationFiled: August 5, 2014Publication date: November 27, 2014Applicant: FUJIFILM CORPORATIONInventors: Takeshi KAWABATA, Hideaki TSUBAKI, Hiroo TAKIZAWA
-
Publication number: 20140349225Abstract: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Applicant: FUJIFILM CORPORATIONInventors: Kei YAMAMOTO, Hidenori TAKAHASHI, Shuhei YAMAGUCHI, Junichi ITO
-
Publication number: 20140349224Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.Type: ApplicationFiled: August 5, 2014Publication date: November 27, 2014Applicant: FUJIFILM CORPORATIONInventors: Hiroo TAKIZAWA, Tomotaka TSUCHIMURA, Takeshi KAWABATA, Takuya TSURUTA
-
Patent number: 8895226Abstract: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/?m or greater with respect to 193-nm incident light.Type: GrantFiled: March 24, 2014Date of Patent: November 25, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Hyun-Woo Kim, Hai-Sub Na, Chil-Hee Chung, Han-Ku Cho
-
Publication number: 20140342290Abstract: The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.Type: ApplicationFiled: May 17, 2013Publication date: November 20, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng WU, SungEun HONG, Yi CAO, Jian YIN, Margareta PAUNESCU, Muthiah THIYAGARAJAN
-
Patent number: 8889332Abstract: A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.Type: GrantFiled: June 29, 2011Date of Patent: November 18, 2014Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Frank Y. Xu, Jun Sung Chun, Michael P. C. Watts
-
Patent number: 8889341Abstract: A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at least one unit of each of the (a), (b), and (c) recurring units, in any order, defined in the disclosure. The (c) recurring units are present in the vinyl alcohol copolymer in an amount of at least 0.5 mol %, based on the total recurring units. These precursors can be used to prepare lithographic printing plates either on-press or off-press after imaging using near-UV, visible, or infrared radiation.Type: GrantFiled: August 22, 2012Date of Patent: November 18, 2014Assignee: Eastman Kodak CompanyInventors: Saija Werner, Harald Baumann, Udo Dwars, Christopher D. Simpson, Axel Draber
-
Patent number: 8889335Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.Type: GrantFiled: March 8, 2013Date of Patent: November 18, 2014Assignee: JSR CorporationInventor: Ken Maruyama
-
Publication number: 20140335454Abstract: A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.Type: ApplicationFiled: July 25, 2014Publication date: November 13, 2014Inventors: Peter Trefonas, III, Phillip Dene Hustad, Cynthia Pierre
-
Publication number: 20140335455Abstract: A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.Type: ApplicationFiled: July 25, 2014Publication date: November 13, 2014Inventors: Peter Trefonas, III, Phillip Dene Hustad, Cynthia Pierre
-
Patent number: 8883398Abstract: The present application relates to a photoactive compound including an oxime ester group and a phosphonate group together, and a photosensitive resin composition comprising the same, the compound of the present application having excellent storage stability and high-temperature process characteristics.Type: GrantFiled: May 22, 2013Date of Patent: November 11, 2014Assignee: LG Chem, Ltd.Inventors: Changho Cho, Sunghyun Kim, Han Soo Kim, Sunhwa Kim, Raisa Kharbash, Jongho Park
-
Publication number: 20140329178Abstract: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):Type: ApplicationFiled: November 14, 2012Publication date: November 6, 2014Applicant: MITSUBISHI GAS CHEMICAL COMPANY,INCInventors: Masatoshi Echigo, Masako Yamakawa
-
Publication number: 20140322652Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C1 to 5 or a halogenated alkyl group of C1 to 5; Ya1 represents a single bond or a divalent linking group; La1 and La2 represents —SO2— or —C(?O)—; Ra1 represents a cyclic group which may have a substituent and the like; n1 and n2 represents 0 or 1; R11 represents a cyclic group of C5 to 30 which may have a substituent; V11 represents a single bond or an alkylene group of C1 to 6; L11 represents an ester bond; Y11 represents an alkylene group of C1 to 5 which may have a fluorine atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m.Type: ApplicationFiled: April 22, 2014Publication date: October 30, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshitaka Komuro, Takaya Maehashi, Takashi Nagamine