Plural, Terminal Unsaturation Patents (Class 430/288.1)
  • Patent number: 11124665
    Abstract: The present invention provides energy-curable compositions comprising aminoacrylates produced by the Michael addition reaction of any blend of highly alkoxylated monomers with any blend of mono- and/or bireactive amines. Suitable highly alkoxylated monomers include, but are not limited to, poly(ethylene glycol) diacrylates, poly(propylene glycol) diacrylates, and ethoxylated trimethylolpropane triacrylates. The alkoxylated monomers have a degree of alkoxylation equal to or greater than 2.0 per functional group. The compositions of the present invention further comprise greater than 10% (w/w) of any blend of monomers having molecular weights of less than 1000 Daltons.
    Type: Grant
    Filed: March 14, 2017
    Date of Patent: September 21, 2021
    Assignee: Sun Chemical Corporation
    Inventors: Derek Ronald Illsley, Shaun Lawrence Herlihy, Sean Phillip Francis Mayers
  • Patent number: 11008483
    Abstract: Cure in place pressure sensitive adhesive compositions are described that comprise one or more of a bodying component, a structural diluent, a radical diluent as well as additives such as crosslinkers, external catalysts, photoinitiators and stabilizers/process aids. The bodying component can be acrylic or non-acrylic.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: May 18, 2021
    Assignee: Avery Dennison Corporation
    Inventors: Michael Zajaczkowski, Michael T. Waterman, Kyle R. Heimbach, Eric L. Bartholomew, Brandon S. Miller
  • Patent number: 10829641
    Abstract: Provided is a coloring composition with which a film capable of allowing transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, also provided are a film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid image pickup element, and an infrared sensor in which the coloring composition is used. The coloring composition includes a coloring material that shields light in a visible range; and an infrared absorber. It is preferable that the coloring material that shields light in the visible range includes two or more chromatic colorants and that a combination of the two or more chromatic colorants forms black. Alternatively, it is preferable that the coloring material that shields light in the visible range includes an organic black colorant. It is preferable that the organic black colorant is at least one selected from the group consisting of a perylene compound and a bisbenzofuranone compound.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: November 10, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Masahiro Mori, Kazuya Oota, Kazuto Shimada, Kyohei Arayama, Takuya Tsuruta, Hirotaka Takishita
  • Patent number: 10655027
    Abstract: A free radical radiation curable liquid includes a) a photoinitiator; and b) a monomer or oligomer including an alkali hydrolyzable group. The alkali hydrolyzable group is an oxalate group located in the atomic chain between two free radical polymerizable groups of the monomer or oligomer including the alkali hydrolyzable group.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: May 19, 2020
    Assignee: AGFA GEVAERT NV
    Inventors: Johan Loccufier, Stefaan Smet
  • Patent number: 10561585
    Abstract: A dental adhesive comprises at least one polymerizable monomer, a polymerization initiator, and thermo-expandable particles comprising a shell encapsulating an expansion agent, the dental adhesive being characterized in that the shells of the thermo-expandable particles are made of a copolymer of acrylonitrile and methyl methacrylate.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: February 18, 2020
    Assignee: PRODUITS DENTAIRES PIERRE ROLLAND
    Inventors: Vincent Maurat, Clemence Pigeron
  • Patent number: 10343406
    Abstract: A liquid ejection head has an ejection port forming region which includes liquid ejection energy generating elements arranged on a substrate, liquid supply ports each running through the substrate and having an opening at a surface of the substrate, a liquid path formed on the surface as a space containing the liquid ejection energy generating elements and the liquid supply ports therein, and ejection ports corresponding to the respective liquid ejection energy generating elements. The liquid ejection head is manufactured by forming a liquid path forming layer on the substrate using a dry film resist, forming an ejection port forming layer on the liquid path forming layer, forming a liquid path in the liquid path forming layer and ejection ports in the ejection port forming layer. The substrate has dummy holes each having an opening at a surface of the substrate outside the ejection port forming region.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: July 9, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiji Matsumoto, Jun Yamamuro, Kazuhiro Asai, Koji Sasaki, Kunihito Uohashi, Seiichiro Yaginuma, Ryotaro Murakami, Masahisa Watanabe, Tomohiko Nakano, Keiji Edamatsu, Haruka Nakada, Kenji Fujii
  • Patent number: 10286668
    Abstract: A liquid ejection head has an ejection port forming region which includes liquid ejection energy generating elements arranged on a substrate, liquid supply ports each running through the substrate and having an opening at a surface of the substrate, a liquid path formed on the surface as a space containing the liquid ejection energy generating elements and the liquid supply ports therein, and ejection ports corresponding to the respective liquid ejection energy generating elements. The liquid ejection head is manufactured by forming a liquid path forming layer on the substrate using a dry film resist, forming an ejection port forming layer on the liquid path forming layer, forming a liquid path in the liquid path forming layer and ejection ports in the ejection port forming layer. The substrate has dummy holes each having an opening at a surface of the substrate outside the ejection port forming region.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: May 14, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiji Matsumoto, Jun Yamamuro, Kazuhiro Asai, Koji Sasaki, Kunihito Uohashi, Seiichiro Yaginuma, Ryotaro Murakami, Masahisa Watanabe, Tomohiko Nakano, Keiji Edamatsu, Haruka Nakada, Kenji Fujii
  • Patent number: 10162259
    Abstract: A photoresist composition including a photoresist composition includes a photo-luminescence nanocomposite, a photopolymerizable monomer, a first photopolymerization initiator, a second photopolymerization initiator, a binder resin, and a solvent. The photo-luminescence nanocomposite includes a first quantum dot nanocomposite, a second quantum dot nanocomposite, or a combination thereof. The first quantum dot nanocomposite includes a first quantum dot nanoparticle and a first coating layer surrounding the first quantum dot nanoparticle, the first coating layer including a first inorganic material. The second quantum dot nanocomposite includes a second quantum dot nanoparticle and a second coating layer surrounding the second quantum dot nanoparticle, the second coating layer including a second inorganic material.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: December 25, 2018
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Minki Nam, Kyoungwon Park, Baekhee Lee, Youngmin Kim, Haeil Park
  • Patent number: 10080287
    Abstract: An information handling system circuit board interfaces storage device surface connectors and storage device controllers disposed on opposing sides by coupling a first circuit board portion having a controller press in connector to a second circuit board portion having plural surface connectors. The first and second circuit board portions couple to each other with an adhesive activated by curing. Resistant ink is printed over openings of the first circuit board portion where adhesive is applied in order to prevent the adhesive from flowing into the openings at or before the curing of the adhesive.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: September 18, 2018
    Assignee: Dell Products L.P.
    Inventors: Kevin W. Mundt, Jason D. Adrian
  • Patent number: 9891379
    Abstract: An optical fiber coating composition is provided. The optical fiber coating composition includes a radiation-curable component, a photoinitiator, and an acrylic polymer having at least one benzophenone group.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: February 13, 2018
    Assignee: Corning Incorporated
    Inventors: Dana Craig Bookbinder, Kevin Robert McCarthy, Weijun Niu, David Neal Schissel, Arthur Lawrence Wallace
  • Patent number: 9541833
    Abstract: A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: January 10, 2017
    Assignee: BOE Technology Group Co., Ltd.
    Inventor: Xuelan Wang
  • Patent number: 9499649
    Abstract: The present invention relates to a photoreactive compound for the preparation of a photoalignment material comprising thioether units, wherein the photoreactive compound is comprising at least one ene group and at least one photoalignment group, and further to a composition comprising at least one photoreactive compound and at least one polythiol, the use of this composition for the preparation of photoalignment materials, and their use for the alignment of liquid crystals or liquid crystal polymers, in electro-optical and optical elements, systems and devices.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: November 22, 2016
    Assignee: ROLIC AG
    Inventors: Izabela Bury, Jean-Francois Eckert, Olivier Muller, Hubert Seiberle, Peggy Studer
  • Patent number: 9383644
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: July 5, 2016
    Assignee: HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
    Inventors: Yongqiang Zhang, Ram B. Sharma, Rachael Stuck, Daniel Greene, Rakesh Gupta, Jeffrey D. Fogle
  • Patent number: 9321962
    Abstract: Linearly photopolymerized (LPP) orientation layers for liquid crystals, that is to say liquid crystal orientation layers, are oriented and crosslinked by means of linearly polarized light. The properties of an LPP orientation layer, such as the angle of tilt, surface wetting, voltage holding ratio and anchoring energy, can be adjusted and/or improved by mixing further substances into the starting material for the preparation of the orientation layer.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: April 26, 2016
    Assignee: ROLIC AG
    Inventors: Martin Schadt, Hubert Seiberle, Olivier Muller
  • Patent number: 9298088
    Abstract: A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: March 29, 2016
    Assignee: Orthogonal, Inc.
    Inventors: Douglas Robert Robello, Charles Warren Wright
  • Patent number: 9133090
    Abstract: A novel divinyl ether compound having the formula (I): wherein A indicates a single bond or a double bond which is low in odor, low in volatility, and low in skin irritability, which have low toxicities, which are useful as a starting material for a polymer composition having excellent curability, adhesiveness and transmission in the ultraviolet light region, and further, having a special reactivity alone or with other compounds, and a process for producing the same.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: September 15, 2015
    Assignee: NIPPON CARBIDE INDUSTRIES CO., LTD.
    Inventors: Youichi Fukunishi, Masahiro Murotani
  • Patent number: 9023590
    Abstract: The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: May 5, 2015
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Lu Liu, Jianshe Xue, Guanbao Hui
  • Patent number: 8980506
    Abstract: The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photoinitiator (C), ortho-naphthoquinone diazide sulfonic acid ester (D), a thermal initiator (E) and a solvent (F). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (D) and the thermal initiator (E) can have excellent resolution and development adherence. Moreover, the present invention further provides a spacer or a protective film formed by the aforementioned photosensitive resin composition, as well as a liquid crystal display device (LCD) including the aforementioned spacer or protective film.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: March 17, 2015
    Assignee: Chi Mei Corporation
    Inventors: I-Chun Hsieh, Hao-Wei Liao
  • Patent number: 8951713
    Abstract: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: February 10, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Kwang Han Park, Min Young Lim, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8945815
    Abstract: An embodiment of the invention discloses an alkaline soluble resin and a method for preparing the same. The chemical formula of this alkaline soluble resin is shown in Formula I: wherein a is an integer of 1 to 5, b is an integer of 1 to 5, c is an integer of 1 to 10, d is an integer of 1 to 10, m is an integer of 1 to 30, n is an integer of 1 to 10, R is hydrogen, alkyl, alkoxy or acrylate; the alkaline soluble resin has a weight-average molecular weight of 3,500-35,000. The invention also discloses a light sensible resin composition comprising the alkaline soluble resin, as well as a colored photoresist for color filters comprising the aforementioned light sensible resin composition and a display element comprising this colored photoresist.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: February 3, 2015
    Assignee: Boe Technology Group Co., Ltd.
    Inventors: Shi Shu, Chunmiao Zhou, Jianshe Xue, Jisheng Zhao, Xuelan Wang, Xiaoxiong Tian
  • Patent number: 8900797
    Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: December 2, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Shigemasa Nakasugi, Shinji Miyazaki, Munirathna Padmanaban, Alberto D. Dioses
  • Patent number: 8895224
    Abstract: Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L1, Z1, R1, and R21, R22 and R23 in formula (a1-1) and the variables in formulae (a2-1) to (a2-6) are as defined in the specification.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: November 25, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiroyuki Suzuki, Junya Abe, Takafumi Nakayama, Kohei Takeshita
  • Patent number: 8822112
    Abstract: The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim, Saehee Kim
  • Patent number: 8741508
    Abstract: A colored curable composition including: at least one selected from the group consisting of a compound represented by the following Formula (1a) and a tautomer thereof; and at least one polymerizable compound, wherein R11, R12, R13, R14, R15, and R16 each independently represent a hydrogen atom or a monovalent substituent; and R11 and R12, and R15 and R16 independently may bond to each other in each pair to form a ring.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: June 3, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yoshihiko Fujie, Shinichi Kanna, Kazuya Oota, Yoshiharu Yabuki, Hiroaki Idei, Yasuhiro Ishiwata
  • Patent number: 8735025
    Abstract: Provided is a photosensitive resin composition that is developable with an aqueous alkaline solution and is suitable for the production of a color filter for an image sensor. The composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, colorants and a solvent. As the colorants, a pigment and a dye are used in combination. The use of the composition enables the formation of fine pixels that exhibit excellent color reproduction and contrast. Therefore, the composition can be used to produce a high-resolution color filter for an image sensor.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Jae Hyun Kim, Kil Sung Lee, Eui June Jeong, Chang Min Lee, Sung Hyok Kim
  • Publication number: 20140134542
    Abstract: A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms. This positive-type resist composition has a small influence on organic materials, such as less dissolution and swelling of the organic materials, and can form a resist film on an organic polymer substrate etc. by a wet application process such that the resulting resist film or resist pattern shows high solvent resistance.
    Type: Application
    Filed: June 18, 2012
    Publication date: May 15, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Yoshiharu Terui, Takashi Mori, Haruhiko Komoriya
  • Patent number: 8722311
    Abstract: There is provided a resist composition suitable for forming a microlens which is excellent in transparency, heat resistance, and sensitivity characteristics, excellent in solubility in a developer, and as the result thereof has high resolution. A positive resist composition comprising; a component (A): an alkali-soluble polymer; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; a component (C): a crosslinkable compound of Formula (1): [where R1, R2, and, R3 are independently a C1-6 alkylene group or oxyalkylene group which are optionally branched; and E1, E2, and E3 are independently a group containing a structure of Formula (2) or Formula (3): (where R4 is a hydrogen atom or a methyl group)]; and a component (D): a solvent.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: May 13, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Shojiro Yukawa, Shinya Arase, Toshiaki Takeyama, Yuki Endo, Takeo Moro
  • Publication number: 20140120474
    Abstract: The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.
    Type: Application
    Filed: October 30, 2013
    Publication date: May 1, 2014
    Applicant: BOE Technology Group Co., Ltd.
    Inventors: Lu LIU, Jianshe XUE, Guanbao HUI
  • Patent number: 8697320
    Abstract: Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: April 15, 2014
    Assignees: Cheil Industries Inc., Samsung Electronics Co., Ltd.
    Inventors: Ji-Young Jeong, Min-Kook Chung, Hyun-Yong Cho, Yong-Sik Yoo, Jeong-Woo Lee, Jong-Hwa Lee, Hwan-Sung Cheon, Soo-Young Kim, Young-Ho Kim, Jae-Hyun Kim, Su-Min Park
  • Patent number: 8685502
    Abstract: A liquid crystal display including a first substrate; a second substrate facing the first substrate; a first field generating electrode disposed on the first substrate; a second field generating electrode disposed on the second substrate; and a liquid crystal layer disposed between the first substrate and the second substrate, the liquid crystal layer including a liquid crystal and an alignment assistant, wherein the alignment assistant includes a mesogen and two or more photo-polymerizable groups.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: April 1, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jun-Hyup Lee, Jae-Jin Lyu
  • Patent number: 8673536
    Abstract: The present invention relates to amorphous photosensitive networks. The networks are characterized by good shape memory properties.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: March 18, 2014
    Assignee: Helmholtz-Zentrum Geesthacht Zentrum fuer Material und Kuesten forschung GmbH
    Inventors: Andreas Lendlein, Hong-Yan Jiang, Oliver Jünger
  • Patent number: 8637226
    Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.
    Type: Grant
    Filed: February 8, 2012
    Date of Patent: January 28, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Mieczyslaw H. Mazurek, Raymond P. Johnston, John E. Potts, Marc D. Radcliffe, Kevin R. Schaffer, Audrey A. Sherman, Wendi J. Winkler
  • Patent number: 8632948
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: January 21, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
  • Patent number: 8628698
    Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
    Type: Grant
    Filed: July 23, 2010
    Date of Patent: January 14, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Se-Young Choi, Jae-Hyun Kim, Nam-Gwang Kim, Eui-June Jeong, Sang-Kyun Kim, Kwen-Woo Han, Hyun-Hoo Sung
  • Patent number: 8623589
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: January 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Patent number: 8614037
    Abstract: The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination with (C-2) another radical polymerizable compound other than (C-1).
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: December 24, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Toru Fujimori
  • Patent number: 8574822
    Abstract: A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: November 5, 2013
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Zhen-Dong Zhu, Qun-Qing Li, Li-Hui Zhang, Mo Chen
  • Patent number: 8563222
    Abstract: A lithographic printing plate precursor comprising an image-recording layer, said image-recording layer being photopolymerizable upon exposure to light having a wavelength of from 300 to 500 nm and containing a mixture of sensitizers.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: October 22, 2013
    Assignee: Agfa Graphics NV
    Inventors: Jan Venneman, Peter Hendrikx, Paul Callant, Alexander Williamson
  • Patent number: 8563220
    Abstract: The present invention relates to a printing element having at least one polymer layer which has photoimageable constituents and a chemically functionalized polymer to make the polymer layer either more hydrophobic or hydrophilic. In one embodiment, the printing element comprises two adjacent polymer layers on a substrate in which the photoimaged layer comprises a polymer chemically modified with hydrophobic fluoroalkyl side groups to provide differential wetting with hydrophilic inks.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: October 22, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Gary Delmar Jaycox, Graciela Beatriz Blanchet, Nancy G. Tassi
  • Patent number: 8501393
    Abstract: There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: August 6, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tadashi Hatanaka, Shigeo Kimura, Tomoyuki Enomoto
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Patent number: 8455176
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: June 4, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Patent number: 8420296
    Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
  • Patent number: 8383302
    Abstract: A colored curable composition is provided which has desired transmittance properties, has stability in a state of a chemical solution such as dispersion uniformity or long-term viscosity stability, is excellent in developing properties and is capable of forming a color pattern with high resolving power. The colored curable composition includes (A) a monomer having an alkyleneoxy chain, (B) a binder polymer, (C) a photopolymerization initiator, and (D) Pigment Red 166.
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: February 26, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Publication number: 20130029271
    Abstract: Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.
    Type: Application
    Filed: July 16, 2012
    Publication date: January 31, 2013
    Applicant: LG CHEM, LTD.
    Inventor: Keon Woo Lee
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8288079
    Abstract: A photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer, said (meth)acrylate monomer or oligomer having a cyclic structure, in which the atomic weight of carbon (Mcr) in said cyclic structure and the number of whole carbon atoms (MTOT) in said composition have the relation of Mcr/MTOT>0.1, or the total number (N) of carbon atoms in said cyclic structure, the total number of carbon atoms (Nc) in said composition and the total number of oxygen atoms (No) have the relation of N/(Nc?No)<4, and the composition has a kinetic viscosity of 10 mPa·s or below. This low-viscosity photocurable resin composition has excellent dry etching resistance and is applicable to optical nanoprinting.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: October 16, 2012
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masahiko Ogino, Makoto Kaji, Hanako Yori
  • Patent number: 8263313
    Abstract: The invention provides a photosensitive resin composition that can form resists with excellent adhesiveness for conductive layers and that does not easily produce conductive layer discoloration, as well as a photosensitive film employing the composition. A preferred photosensitive film (1) according to the invention comprises a support (11), resin layer (12) and protective film (13), where the resin layer (12) is composed of a photosensitive resin composition comprising a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a benzotriazole derivative represented by the following general formula (1).
    Type: Grant
    Filed: August 11, 2005
    Date of Patent: September 11, 2012
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Katsutoshi Itagaki, Naoki Sasahara, Takuji Abe, Yoshiki Ajioka
  • Patent number: 8211598
    Abstract: A black photosensitive resin composition, a light-shielding color filter using the composition and its production method are provided, the black photosensitive resin composition including: a black colorant; a compound represented by Formula (I) or (II) as defined in the specification; and a photopolymerization initiator.
    Type: Grant
    Filed: May 12, 2009
    Date of Patent: July 3, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Hiroyuki Einaga, Yoichi Maruyama, Kazuto Shimada, Tomotaka Tsuchimura, Hiroshi Taguchi
  • Patent number: 8182979
    Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: May 22, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Raisa Kharbash, Chang Ho Cho, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee