Plural, Terminal Unsaturation Patents (Class 430/288.1)
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Patent number: 8182979Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.Type: GrantFiled: October 30, 2009Date of Patent: May 22, 2012Assignee: LG Chem, Ltd.Inventors: Keon Woo Lee, Raisa Kharbash, Chang Ho Cho, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
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Patent number: 8178198Abstract: An adhesive sheet includes a substrate and an energy-ray curable adhesive layer formed on the substrate. The energy-ray curable adhesive layer includes an energy-ray curable acrylic copolymer and a urethane acrylate. The energy-ray curable acrylic copolymer is formed by copolymerizing at least one of either a dialkyl(meth)acrylamide that has an alkyl group with carbon number of not more than 4, a phenol EO modified (meth)acrylate that has an ethylene glycol chain with a phenyl group bonded to the ethylene glycol chain, a (meth)acryloyl morpholine, or a (meth)acrylate that has an aceto-acetoxyl group, in total of 1 to 30 weight percent of all monomers to form the energy-ray curable acrylic copolymer. The energy-ray curable acrylic copolymer further includes a side chain with an unsaturated group.Type: GrantFiled: March 28, 2011Date of Patent: May 15, 2012Assignee: Lintec CorporationInventors: Jun Maeda, Masaharu Ito, Keiko Kano, Kazuhiro Takahashi
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Patent number: 8168371Abstract: It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition.Type: GrantFiled: January 18, 2008Date of Patent: May 1, 2012Assignee: Nissan Chemical Industries, Ltd.Inventor: Tadashi Hatanaka
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Patent number: 8168691Abstract: Coating compositions suitable for UV imprint lithographic applications are disclosed that include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; and at least one photoacid generator soluble in a selected one or both of the at least one monofunctional ether compound and the at least one vinyl ether compound, wherein the at least one monofunctional ether compound and the at least one vinyl ether compound are free from fluorine and silicon substituents. Also disclosed are imprint processes.Type: GrantFiled: February 9, 2009Date of Patent: May 1, 2012Assignees: International Business Machines Corporation, JSR CorporationInventors: Frances A. Houle, Taiichi Furukawa
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Patent number: 8158308Abstract: The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein the content of the radical polymerizable monomer with respect to the total solid content of the composition is from about 10 mass % to about 50 mass %, and the content of the binder with respect to the total solid content of the composition is about 20 mass % or less; a color filter formed by using the composition; and a method of producing the color filter. The negative curable composition has excellent developability at high sensitivity and enables formation of a fine rectangular pattern even in a low-binder content formulation.Type: GrantFiled: March 12, 2008Date of Patent: April 17, 2012Assignee: Fujifilm CorporationInventors: Yosuke Murakami, Toru Fujimori
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Patent number: 8151705Abstract: A method for preparing a lithographic printing plate includes treating a lithographic printing plate precursor including a hydrophilic support and an image-forming layer containing the following (i) to (iii) with an aqueous solution having a buffering ability: (i) a binder polymer comprising a repeating unit having a structure represented by the following formula (1); (ii) an ethylenically unsaturated compound; and (iii) a polymerization initiator, P-L-(CO2H)n??(1) wherein P represents a part constituting a main chain skeleton of the polymer, L represents an (n+1) valent connecting group, and n represents an integer of 1 or more.Type: GrantFiled: September 24, 2009Date of Patent: April 10, 2012Assignee: Fujifilm CorporationInventors: Yoshinori Taguchi, Koji Wariishi, Atsushi Sugasaki
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Patent number: 8133656Abstract: An oxime ester compound represented by general formula (I): wherein R1 and R2 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R3 and R4 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; a and b each independently represent 0 to 4; X represents an oxygen atom, a sulfur atom, a selenium atom, CR31R32, CO, NR33, or PR34; R31, R32, R33, and R34 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN.Type: GrantFiled: December 21, 2007Date of Patent: March 13, 2012Assignee: Adeka CorporationInventors: Daisuke Sawamoto, Koichi Kimijima
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Patent number: 8110324Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.Type: GrantFiled: March 20, 2009Date of Patent: February 7, 2012Assignee: Fujifilm CorporationInventors: Toru Fujimori, Yoichi Maruyama, Hiroyuki Einaga, Kazuto Shimada, Tomotaka Tsuchimura, Yushi Kaneko
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Patent number: 8092981Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.Type: GrantFiled: December 29, 2008Date of Patent: January 10, 2012Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yasuhiro Kameyama, Yuuji Mizuho, Jong-Cheol Kim, Se-Jin Choi
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Patent number: 8088548Abstract: Developable bottom antireflective coating compositions are provided.Type: GrantFiled: October 23, 2007Date of Patent: January 3, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Patent number: 8071273Abstract: It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide.Type: GrantFiled: March 27, 2009Date of Patent: December 6, 2011Assignee: Dai Nippon Printing Co., Ltd.Inventor: Katsuya Sakayori
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Patent number: 8053167Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.Type: GrantFiled: November 15, 2007Date of Patent: November 8, 2011Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
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Patent number: 7998652Abstract: A lithographic printing plate precursor comprising: a support; and at least one layer comprising an image-recording layer, the image-recording layer comprising (A) an infrared absorber, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution, wherein at least one of said at least one layer comprises a copolymer having (a1) a unit comprising at least one ethylenically unsaturated bond, and (a2) a unit comprising at least one functional group interacting with a surface of the support. And a lithographic printing method in which the lithographic printing plate precursor is used. The copolymer preferably has a hydrophilic segment. The copolymer preferably is contained in an undercoat layer formed between the support and the image-recording layer.Type: GrantFiled: September 29, 2004Date of Patent: August 16, 2011Assignee: Fujifilm CorporationInventors: Naonori Makino, Toshifumi Inno, Sumiaki Yamasaki
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Patent number: 7978416Abstract: A method for generating spontaneously aligned surface wrinkles utilizes control of local moduli-mismatch and osmotic pressure. The method includes modifying the surface of an elastomeric layer to form a superlayer that is stiffer and/or less absorbent than the elastomeric layer. The elastomeric layer is then swollen with a polymerizable monomer, which causes buckling of the superlayer. The monomer is then polymerized, dimensionally stabilizing the surface buckling. The buckled surfaces generated by the method are useful in a wide variety of end-use applications, including microlenses, microlens arrays, compound microlenses, diffraction gratings, photonic crystals, smart adhesives, mechanical strain sensors, microfluidic devices, and cell culture surfaces.Type: GrantFiled: November 11, 2010Date of Patent: July 12, 2011Assignee: The University of MassachusettsInventors: Alfred J. Crosby, Edwin P. Chan
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Patent number: 7964334Abstract: The present invention provides a curable composition containing at least one species selected from polymerizable monomers represented by the following formulas (I) to (III) and a polymerization initiator, and a planographic printing plate precursor including the same. The curable composition can be cured with high sensitivity due to laser light exposure or the like, and the inhibition of polymerization due to oxygen is controlled. The composition has excellent solubility in a developer or a solvent.Type: GrantFiled: March 26, 2008Date of Patent: June 21, 2011Assignee: FUJIFILM CorporationInventors: Shigefumi Kanchiku, Koji Wariishi
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Patent number: 7951522Abstract: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 ?m on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.Type: GrantFiled: December 29, 2004Date of Patent: May 31, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiki Okui, Koichi Misumi
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Patent number: 7935742Abstract: An ink composition is provided that includes (A) one type of compound (monomer (A)) selected from the group consisting of a difunctional (meth)acrylic acid ester or amide having an alkylene group of 6 to 12 carbons, and a difunctional vinyl ether having an alkylene group of 6 to 12 carbons, (B) a polymerization initiator, and (C) a colorant. There is also provided an inkjet recording method that includes a step (a) of discharging the ink composition onto a recording medium and a step (b) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition. Furthermore, a process for producing a lithographic printing plate is provided that includes a step (a?) of discharging the ink composition onto a hydrophilic support and a step (b?) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition, thus forming a hydrophobic image on the hydrophilic support by curing the ink composition.Type: GrantFiled: February 12, 2007Date of Patent: May 3, 2011Assignee: FUJIFILM CorporationInventor: Seishi Kasai
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Patent number: 7910272Abstract: The present invention provides a dye-containing photosensitive composition that includes at least phthalocyanine, a photosensitive compound, and a transition metal complex of which the molar absorption coefficient ? in a visible light region is less than 5000.Type: GrantFiled: February 2, 2007Date of Patent: March 22, 2011Assignee: FUJIFILM CorporationInventors: Hideki Takakuwa, Yuki Mizukawa
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Patent number: 7851033Abstract: A photo-sensitive adhesive for a flexible liquid crystal display is provided, comprising the following components: an urethane oligomer; a reactive monomer with phenyl group; and a photo-initiator. In an embodiment, the phenyl group of the reactive monomer has a weight ratio of 40 wt %, base on the total weight of the reactive monomer.Type: GrantFiled: April 28, 2008Date of Patent: December 14, 2010Assignee: Industrial Technology Research InstituteInventors: Wen-Pin Chuang, Su-Mei Wei, Kung-Lung Cheng, Shih-Hsien Liu
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Patent number: 7824837Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 22, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Mark O. Neisser, Shuji S Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7820361Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing (A) an initiator compound, (B) a polymerizable compound and (C) a binder, wherein the photosensitive layer or other layer in contact with the support contains as (D) a component different from the component (C), a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond introduced through an ion pair and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support.Type: GrantFiled: August 27, 2007Date of Patent: October 26, 2010Assignee: FUJIFILM CorporationInventors: Tomoya Sasaki, Hidekazu Oohashi
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Patent number: 7811726Abstract: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.Type: GrantFiled: September 29, 2009Date of Patent: October 12, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Se-Ah Kwon, Chul Huh, Jin-Seuk Kim, Byoung-Joo Kim
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Publication number: 20100173247Abstract: The present invention relates to planarization materials and methods of using the same for substrate planarization in photolithography. A planarization layer of a planarization composition is formed on a substrate. The planarization composition contains at least one aromatic monomer and at least one non-aromatic monomer. A substantially flat surface is brought into contact with the planarization layer. The planarization layer is cured by exposing to a first radiation or by baking The substantially flat surface is then removed. A photoresist layer is formed on the planarization layer. The photoresist layer is exposed to a second radiation followed by development to form a relief image in the photoresist layer. The relief image is then transferred into the substrate.Type: ApplicationFiled: January 8, 2009Publication date: July 8, 2010Applicant: International Business Machines CorporationInventors: Sean D. Burns, Colin J. Brodsky, Ryan L. Burns
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Patent number: 7741380Abstract: The invention provides (1) an ink composition including a polymerization initiator and at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, (2) an ink composition including a polymerization initiator, at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, and a monofunctional (meth)acrylic acid ester or amide having an alkylene oxide repeating unit in the molecule, and (3) an ink composition including a polymerization initiator and a monofunctional (meth)acrylic acid ester or amide having a basic group in the molecule; and an ink jet recording method, a method for producing a planographic printing plate and a planographic printing plate produced by the method for producing a planographic printing plate using the above-mentioned ink compositions.Type: GrantFiled: September 27, 2006Date of Patent: June 22, 2010Assignee: FUJIFILM CorporationInventor: Ippei Nakamura
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Patent number: 7662541Abstract: A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.Type: GrantFiled: November 22, 2005Date of Patent: February 16, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Teruhiro Uematsu, Naoya Katsumata
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Publication number: 20100021832Abstract: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.Type: ApplicationFiled: September 29, 2009Publication date: January 28, 2010Inventors: Se-Ah Kwon, Chul Huh, Jin-Seuk Kim, Byoung-Joo Kim
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Patent number: 7648738Abstract: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2? e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1? i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2? for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: November 24, 2003Date of Patent: January 19, 2010Assignee: Ciba Specialty Chemicals CorporationInventors: Junichi Tanabe, Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
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Patent number: 7645545Abstract: A colorant-containing curable composition containing a tetraazaporphyrin compound represented by formula (1), wherein rings A1, A2, A3, and A4 each independently represent a benzene ring or a pyridine ring, at least one of the rings A1, A2, A3, and A4 represents a pyridine ring, R1 and R2 each independently represent a hydrogen atom or an alkyl group provided that R1 and R2 are not hydrogen atoms at the same time, m represents an integer of 1 to 8, and n is an integer of 1 to 4.Type: GrantFiled: April 28, 2006Date of Patent: January 12, 2010Assignee: Fujifilm CorporationInventor: Toru Fujimori
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Patent number: 7645564Abstract: The invention is directed to a process and more particularly, to utilizing polymer solutions to make thick film compositions. In one embodiment the process is directed to the formation of photoimageable thick film compositions for use in photo-patterning methods to make photoimageable electrodes in flat panel display applications, including plasma display panels (PDP). Polymer solutions are obtained by directly polymerizing desired monomers in a desired solvent to form a desired polymer, rather than by dissolving a pre-made polymer in a desired solvent. Other ingredients are added to the polymer solution to directly form thick film pastes, including photoimageable thick film pastes.Type: GrantFiled: March 3, 2006Date of Patent: January 12, 2010Inventors: Haixin Yang, Pedro A. Jimenez, Cherng Y. Wang, Christopher John Roach, John Graeme Pepin, Michael F. Barker, Vincent Wen-Yuan Yeh
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Patent number: 7645563Abstract: The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to a photosensitive resin composition comprising (A) hydrophobic polymers obtained from at least two or more water dispersion latexes, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein the two or more hydrophobic polymers each is present in a fine particle state.Type: GrantFiled: April 7, 2004Date of Patent: January 12, 2010Assignee: Toyo Boseki Kabushiki KaishaInventors: Toru Wada, Tomonori Hiramatsu, Akira Tomita
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Publication number: 20090317604Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.Type: ApplicationFiled: August 27, 2009Publication date: December 24, 2009Applicant: Samsung SDI Co., Ltd.Inventors: Hyea-Weon Shin, Yon-Goo Park, Bong-Gi Kim, Chan-Seok Park, Sung-Mun Ryu
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Patent number: 7615322Abstract: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.Type: GrantFiled: June 22, 2007Date of Patent: November 10, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Se-Ah Kwon, Chul Huh, Jin-Seuk Kim, Byoung-Joo Kim
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Patent number: 7615331Abstract: A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a protective group; a photosensitizing agent; a compound containing a methacryloyl or acryloyl group within a molecule of the compound; and a solvent.Type: GrantFiled: September 7, 2007Date of Patent: November 10, 2009Assignee: FUJIFILM CorporationInventors: Tsukasa Yamanaka, Kenichiro Sato
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Patent number: 7572559Abstract: The invention provides a colorant-containing curable composition including a colorant and a solvent, wherein the colorant includes a compound represented by Formula (I) and/or a tautomer thereof, and the solvent includes at least one selected from the group consisting of cyclohexanone, cyclopentanone, propyleneglycol methyl ether, propyleneglycol methyl ether acetate, a lactate ester, and diacetone alcohol. The invention further provides a color filter manufactured by using the colorant-containing composition and a manufacturing method of the color filter.Type: GrantFiled: August 28, 2006Date of Patent: August 11, 2009Assignee: FUJIFILM CorporationInventor: Katsumi Araki
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Patent number: 7563557Abstract: A polyamide having a structure represented by the chemical formula (1): wherein m and n represent an integer satisfying m?1, n?1, 2?(m+n)?150, 0.3?m/(m+n)?0.9, R1 and R2 represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 represent at least one divalent organic group, and Z represents at least one monovalent organic group selected from mono-substituted amino and imido groups.Type: GrantFiled: July 11, 2005Date of Patent: July 21, 2009Assignee: Asahi Kasei EMD CorporationInventors: Masashi Kimura, Takayuki Kanada, Hiroyuki Hanahata
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Patent number: 7524614Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.Type: GrantFiled: May 26, 2006Date of Patent: April 28, 2009Assignee: Eastman Kodak CompanyInventors: Ting Tao, Scott A. Beckley
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Patent number: 7524605Abstract: An image-recording materials containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having an image-recording layer containing the compound (A), and a lithographic printing method using the lithographic printing plate precursor, are provided.Type: GrantFiled: April 8, 2005Date of Patent: April 28, 2009Assignee: Fujifilm CorporationInventors: Ryuki Kakino, Kazuto Kunita, Hidekazu Oohashi, Yasuhito Oshima
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Patent number: 7507525Abstract: A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate precursor having an undercoat layer comprising (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, and a photosensitive layer containing (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator.Type: GrantFiled: May 3, 2006Date of Patent: March 24, 2009Assignee: FUJIFILM CorporationInventor: Atsushi Sugasaki
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Patent number: 7491487Abstract: A polymerizable composition comprising: a polyurethane resin synthesized by using a compound represented by the following formula (I) as one of starting materials; a photopolymerization or thermal polymerization initiator; and an addition-polymerizable compound having an ethylenically unsaturated bond: wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n is an integer of from 1 to 5.Type: GrantFiled: March 4, 2005Date of Patent: February 17, 2009Assignee: FUJIFILM CorporationInventor: Atsushi Sugasaki
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Patent number: 7476476Abstract: This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.Type: GrantFiled: May 27, 2004Date of Patent: January 13, 2009Assignee: Toray Industries, Inc.Inventor: Mitsuhito Suwa
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Patent number: 7473513Abstract: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.Type: GrantFiled: August 17, 2006Date of Patent: January 6, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Jong Jin Park, Eun Jeong Jeong, Sang Yoon Lee
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Publication number: 20080286693Abstract: Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb or VIa wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH?CH2; h is 2, 3, 4, 5 or 6; R1, when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X? is —X1-A3-X-; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g.Type: ApplicationFiled: December 4, 2007Publication date: November 20, 2008Inventors: Akira Matsumoto, Hitoshi Yamato, Toshikage Asakura, Peter Murer
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Patent number: 7442492Abstract: The present invention provides a planographic printing plate precursor having a support, a photosensitive layer and a protective layer. The photosensitive layer contains at least an infrared absorbing agent, a polymerization initiating agent, a polymerizable compound and a binder polymer having repeating units represented by the following Formula (i). Further, the protective layer contains at least an inorganic lamellar compound. In Formula (i), R1 represents a hydrogen atom or a methyl group; R2 represents a connecting group having two or more types of atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom and having 2 to 82 atoms in total; A represents an oxygen atom or —NR3—, and R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n is an integer of 1 to 5.Type: GrantFiled: August 29, 2005Date of Patent: October 28, 2008Assignee: FUJIFILM CorporationInventor: Takahiro Goto
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Publication number: 20080241742Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.Type: ApplicationFiled: March 24, 2008Publication date: October 2, 2008Applicant: FUJIFILM CORPORATIONInventors: Wataru HOSHINO, Hideaki TSUBAKI, Masahiro YOSHIDOME
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Patent number: 7425405Abstract: A method for making a lithographic printing plate is disclosed which comprises the steps of: (i) providing a negative-working, heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating comprising an image-recording layer which comprises hydrophobic thermoplastic polymer particles and a hydrophilic binder, wherein the hydrophobic thermoplastic polymer particles have an average particle size in the range from 45 nm to 63 nm, and wherein the amount of the hydrophobic thermoplastic polymer particles in the image-recording layer is at least 70% by weight relative to the image-recording layer; (ii) exposing the coating to heat or infrared light, thereby inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; (iii) developing the precursor by applying an aqueous alkaline solution, thereby removing non-exposed areas of the coating from the suType: GrantFiled: June 30, 2005Date of Patent: September 16, 2008Assignee: Agfa Graphics, N.V.Inventors: Joan Vermeersch, Pascal Meeus
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Patent number: 7410746Abstract: The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d).Type: GrantFiled: March 25, 2003Date of Patent: August 12, 2008Assignee: Dai Nippon Printing Co., Ltd.Inventor: Katsuya Sakayori
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Publication number: 20080171271Abstract: Provided is a photosensitive resin composition that is developable with an aqueous alkaline solution and is suitable for the production of a color filter for an image sensor. The composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, colorants and a solvent. As the colorants, a pigment and a dye are used in combination. The use of the composition enables the formation of fine pixels that exhibit excellent color reproduction and contrast. Therefore, the composition can be used to produce a high-resolution color filter for an image sensor.Type: ApplicationFiled: December 27, 2007Publication date: July 17, 2008Applicant: CHEIL INDUSTRIES INC.Inventors: Jae Hyun KIM, Kil Sung LEE, Eui June JEONG, Chang Min LEE, Sung Hyok KIM
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Patent number: 7399575Abstract: A relief printing original plate including a substrate, a photosensitive resin layer thereon that is photosensitive to ultraviolet radiations, and a mask layer thereon having both ultraviolet and non-ultraviolet absorbability, the ultraviolet absorbability being deactivatable in response to receiving non-ultraviolet radiation. A method for producing a relief printing plate by using the original plate is also provided.Type: GrantFiled: September 1, 2004Date of Patent: July 15, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiya Takagi, Takashi Fujimoto
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Patent number: 7396757Abstract: An interconnect structure with improved performance and capacitance by providing air gaps inside the dielectric layer by use of a multi-phase photoresist material. The interconnect features are embedded in a dielectric layer having a columnar air gap structure in a portion of the dielectric layer surrounding the interconnect features. The interconnect features may also be embedded in a dielectric layer having two or more phases with a different dielectric constant created. The interconnect structure is compatible with current back end of line processing.Type: GrantFiled: July 11, 2006Date of Patent: July 8, 2008Assignee: International Business Machines CorporationInventor: Chih-Chao Yang
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Publication number: 20080145788Abstract: Incorporating a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer having a phosphonium cation in photothermographic materials improves image tone in resulting images.Type: ApplicationFiled: December 18, 2006Publication date: June 19, 2008Inventors: Sharon M. Simpson, Kumars Sakizadeh