Abstract: Polymer materials are described that undergo a 2-level 3 dimensional crosslinking process. During this process, hydrophilic polymers are crosslinked at two levels, the first results in a low level of crosslinking which leads to a toughening of the layer preventing dissolution by the fountain solution but with the layer remaining hydrophilic. The second level of crosslinking is higher and is the result of exposure to a laser diode thermal imaging device. The crosslinking at this second level results in a loss of hydrophilicity and provides instead an oleophilic image capable of accepting and transferring oil based ink. The polymer materials are particularly useful in lithographic printing systems where they may used in articles such as a printing plate comprising a substrate having coated thereon a layer that becomes that becomes less hydrophilic upon exposure to thermal energy (e.g.

Abstract: This invention relates to a photopolymerizable resin composition containing resin component (A) composed of a resin and/or a resin-forming ingredient and a photopolymerization initiator (B) wherein the component (A) comprises an addition-polymerizable compound (A1) having at least two ethylenically unsaturated groups and the photopolymerization initiator (B) comprises a diaminobenzophenone compound (B1), an N-phenylglycine compound (B2), and at least one kind of compound selected from a group of a 3,3′,4,4′-tetra(alkylperoxycarbonyl)benzophenone (B3), 2-methyl-1-[4-(thiomethyl)phenyl]- 2-morpholinopropan-1-one (B4), and a 1,3,5-triazine derivative (B5) containing at least one trihalomethyl group as substituent.

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.

Abstract: This patent describes on-press ink and/or fountain solution development of lithographic plates having on a substrate a thermosensitive layer capable of hardening or solubilization upon exposure to an infrared laser radiation. The plate can be imagewise exposed with an infrared laser and then on-press developed with ink and/or fountain solution by rotating the plate cylinder and engaging ink and/or fountain solution roller. The developed plate can then directly print images to the receiving sheets. The imagewise exposure can be performed off the press or with the plate being mounted on the plate cylinder of a lithographic press.

Abstract: A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the &agr;-position or a halogen atom and a photopolymerization initiator.

Abstract: There is provided an active energy beam curable composition, which is useful for forming a solder resist film for a printed wiring board, which can be developed through an ultraviolet exposure and a dilute alkali aqueous solution, and is excel lent in heat resistance, adhesivity and chemical resistance. There is also proposed a printed wiring board provided with a cured film of such an active energy beam curable composition. This composition is featured in that it comprises not only an active energy beam curable vinyl copolymer modified resin wherein an epoxy compound having an ethylenic unsaturated group is added to a copolymer comprising styrene, (metha)acrylic acid, and, as an optional component, (metha)acrylate; but also an active energy beam curable bisphenol type epoxyacrylate resin.

Abstract: An ultraviolet curable resin composition includes (A) an ultraviolet curable resin, (B) an epoxy compound having at least two epoxy groups in one molecule, (C) a photopolymerization initiator and (D) a diluent. The ultraviolet curable resin (A) is obtained by the steps of polymerizing an ethylenically unsaturated monomer component containing (a) an ethylenically unsaturated monomer having epoxy group and (b) a compound having at least two ethylenically unsaturated groups in one molecule to prepare a copolymer, reacting the copolymer with (c) an ethylenically unsaturated monomer having carboxyl group to prepare a chemical intermediate, and reacting the chemical intermediate with (d) one of saturated and unsaturated polybasic acid anhydrides. This resin composition will be preferably used to prepare a photo solder resist ink developable with diluted alkaline aqueous solution.

Abstract: The photosensitive printing plate of the present invention comprises a substrate, a photosensitive layer formed on the substrate, and mat particles formed on the photosensitive layer, wherein the mat particles contain a copolymer which contains at least one (meth)acrylamides as a unit. The method of producing the photosensitive printing plate of the present invention is a method which comprises the steps of forming a photosensitive layer on a substrate, and coating the photosensitive layer with a solution prepared by dissolving a copolymer containing at least one (meth)acrylamides as a unit in a solvent to form mat particles. The photosensitive printing plate of the present invention has excellent vacuum contact properties and resistance to friction and pressure and is free from tack on the surface when used, avoids problems in developing properties during long storage times, and is superior in terms of solubility in an exhausted developer.

Abstract: An ink for ink-jet recording contains a coloring agent, a polymerizable oligomer, water, and a photopolymerization initiator having a solubility in water of 3 percent by weight or more. Another ink for ink-jet recording contains a coloring agent, a polymerizable oligomer having at least two acryloyl groups and a solubility in water of 10 percent by weight or more, a photopolymerization initiator, and water. The specified polymerizable oligomer or photopolymerization initiator reduces bleeding of the ink on recording media.

Abstract: A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).

Abstract: An image forming material having a support having disposed in an order thereon an acid-crosslinkable layer, which contains a compound that generates an acid by light or heat and a compound crosslinkable by the acid generated and whose alkali solubility is lowered by the crosslinking, and a radical-polymerizable layer, which contains a compound that generates a radical by light or heat and a compound capable of undergoing a radical polymerization and whose alkali solubility is lowered by the polymerization.

Abstract: The invention provides a negative type image recording material containing (A) a compound having at least one group represented by general formula (1) below (where Ar1 represents an arylene group, and R1 represents hydrogen or an alkyl group having 1˜4 carbon atoms, (B) a polymer capable of reacting with compound (A) in the presence of acid, and (C) a compound that generates acid in response to supply of energetic radiation, an electron beam, or heat. The negative type image recording material has excellent sensitivity and enables direct image recording from digital data supplied by a computer or the like.

Abstract: This patent describes an on-press ink and/or fountain solution developable lithographic printing plates having on a substrate a thermosensitive layer capable of hardening upon exposure to an infrared radiation. The plate can be imagewise exposed with an infrared radiation and then on-press developed with ink and/or fountain solution by rotating the plate cylinder and engaging ink and/or fountain solution roller. The developed plate can then directly print images to the receiving sheets. The imagewise exposure can be performed off the press or with the plate being mounted on the plate cylinder of a lithographic press.

Abstract: A lithographic printing plate precursor comprising a support having a hydrophilic surface having provided thereon an image-forming layer containing a hydrophobic high molecular compound having at least either a functional group represented by formula (1) or a functional group represented by formula (2): 1

Abstract: The invention discloses a crosslinked chemical-amplification positive-working photoresist composition of good pattern resolution and storage stability, which is suitable for pattern size diminution by the thermal flow process after development. The composition comprises: (A) a polyhydroxystyrene resin substituted for a part of the hydroxyl hydrogen atoms by acid-dissociable solubility-reducing groups; (B) a radiation-sensitive acid-generating compound; (C) a polyvinyl ether compound as a crosslinking agent; (D) a carboxylic acid; and (E) an amine compound.

Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

Abstract: A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.

Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

Abstract: A photosensitive resin composition characterized by comprising (A) a resin having at least one aprotic onium salt represented by the general formula: —COO−·W+  (1) and/or the general formula: (in each of the above general formulas, W+ represents wherein, Z represents a nitrogen atom or phosphorus atom; Y represents a sulfur atom; R1, R2, R3 and R4 each represents an organic group having 1 to 30 carbon atoms), (B) a compound having two or more vinylether groups in a molecule and (C) a compound which generates an acid upon irradiation with actinic energy rays.

Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1

Abstract: The invention relates to photosensitive compositions containing an alkali-insoluble binder, which i.a. are excellently suitable for preparing thermally developable printing plates.

Abstract: A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.

Abstract: There are disclosed a photosensitive resin composition which comprises

Abstract: An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

Abstract: The invention relates to a photocurable, negative-working mixture and a recording material which is obtained therefrom and which is suitable for the production of elastic relief printing plates. The mixture contains a) an elastomeric binder, b) a free-radical-polymerizable compound which is compatible with the binder and which has at least one terminal, ethylenically unsaturated group and a boiling point at normal pressure of over about 100° C. and c) a compound or a combination of compounds which are capable of initiating the polymerization of the compound (b) on exposure to actinic light. The binder is made up of the segments A, B and C, where A is a hydrophobic soft block having a glass transition temperature Tg of below about −30° C. B is a hydrophobic hard block having a glass transition temperature Tg of over about +30° C. and C is a polar block which is made up of vinyl monomers and/or heterocyclic compounds which can be polymerized by anionic ring opening.

Abstract: The present invention relates to a liquid, radiation-curable composition containing a cationically activated component, a cationic photoinitiator or a mixture of cationic photoinitiators, at least an effective amount of a compound having at least one terminal and/or pendant unsaturated group and at least one hydroxyl group in its molecule. The composition is free of free radical initiator. The compositions described herein are particularly useful in stereolithography process systems for producing three-dimensional articles.

Abstract: A photosensitive composition for short wave exposure use, which comprises (i) a sensitizing dye as a 1,3-dihydro-1-oxo-2H-indene derivative having a specified structure, (ii) an activator compound that generates chemical changes by its interaction with an electronic excitation condition induced by light absorption of the sensitizing dye represented by formula (I) and thereby produces at least any one of radicals, acids and bases and (iii) a compound whose physical or chemical characteristics are changed and maintained by undergoing reaction with at least one of radicals, acids and bases.

Abstract: A composition used to form an acid sensitive antireflective coating (ARC) includes a water soluble resin and a cross-linker. Radiation adsorptive components may be provided as part of the resin or, more preferably, as a separate dye. Being acid sensitive, selected portions of an ARC formed from the composition may be removed by a suitable reversal of the cross-linking followed by a develop step, preferably with an aqueous developer, more preferably de-ionized water. The water soluble resin is preferably hydroxystyrene-sulfonated styrene copolymer, poly(2-isopropenyl-2-oxazoline), or poly(acrylic acid), the cross-inker is preferably an acetal diacid or a water soluble divinyl ether, and the dye is preferably 9-anthracene methanol or a squaric acid derivative.

Abstract: The present invention discloses a process for preparing a water-dispersible photosensitive composition, including the steps of: (a) adding an unsaturated photomonomer and/or a plasticizer to a carboxyl-group bearing acrylic resin solution which contains at least an organic solvent; (b) distilling and removing said organic solvent to form a resin paste; (c) dissolving a photoinitiator and an alkaline into said resin paste; (d: adding deionized water and mixing thoroughly to form an emulsion; and (e) adjusting the viscosity or said emulsion with a water-soluble resin.

Abstract: An infrared-sensitive image forming material with which a plate can be directly formed by an infrared laser. The infrared-sensitive image forming material has a support having disposed thereon a recording layer whose solubility in an aqueous alkaline solution is altered by irradiation with an infrared laser. The recording layer has a binder phase formed of a polymer compound, a dispersion phase that is dispersed in the binder phase, and an infrared absorbent present in either one of the binder phase and the dispersion phase. Within a total incorporated amount of the infrared absorbent in the recording layer, a mass present in the dispersion binder is greater than a mass present in the binder phase. Namely, within the recording layer, the infrared absorbent is localized in the dispersion phase.

Abstract: The present invention related to an azomethine dye precursor represented by the following general formula (1) and the image-forming material and image-forming method using the azomethine dye precursor: wherein Ar represents an aryl group or a heterocyclic group which may each have a substituent; X represents a bivalent group linking a carbon atom and a nitrogen atom; and Cp represent a coupler residue which may or may not form a ring.

Abstract: There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.

Abstract: A radiation curable resin composition comprising (A) a first linear (meth)acryloyl and aromatic group-containing compound, (B) a second branched (meth)acryloyl group-containing compound, (C) a radiation polymerization initiator, and (D) silica particles having a secondary average particle diameter of 0.5 to 5 &mgr;m. The composition is suitable for use as a printable heat-resistant protective coat which is used for information recording media such as thermosensible recording cards and thermosensible photographic printing paper.

Abstract: A pigment-dispersion photo-sensitive coating solution comprising a binder resin, an organic-solvent and a main pigment dispersed in the solvent, wherein the combined area of peaks detected at a relative retention ratio in the range of 0.68 to 0.72 based on a retention time of dibutyl phthalate and peaks detected at a relative retention ratio in the range of 1.06 to 1.10 based on a retention time of dibutyl phthalate is not more than 50% of the total area of all peaks when the pigment is extracted by ethyl acetate and the extracts are analyzed by high-speed liquid chromatography using dibutyl phthalate as internal standard, is provided and use of the coating solution ensures that the colored image of stable quality is formed.

Abstract: Disclosed are photoresist compositions comprising a polymeric backbone and a quaternary heterocyclic pendant group, particularly usefull in the preparation of screen printing and sandblast etching photoresists. The pendant groups comprise furanyl substituted quaternary heterocyclic groups, as seen in the formula: where n ranges from 0 to 4 and Z denotes the atoms necessary to complete a substituted or unsubstituted nitrogen containing heterocyclic ring.

Abstract: Disclosed is a positive resist composition which ensures, on use of an exposure light source of 220 nm or less, high sensitivity, good resolution, sufficiently high resistance against dry etching, satisfactory adhesion to the substrate, and superior developability even with a developer conventionally used for resists (for example, a 2.38% aqueous tetramethylammonium hydroxide solution), the positive resist composition comprising a compound generating an acid on irradiation of an active light ray or radiation, a resin having a polycyclic-type alicyclic group and a carboxyl group, and a compound having at least two groups having a specific structure.

Abstract: An ultraviolet curable coating composition for cationic electrodeposition applicable to metal plated materials which composition comprises 100 weight parts of acrylic resin containing 10 to 70% by weight poly-functional acrylate per se having 3 or more acryloyl groups and 90 to 30% by weight of a resin of molecular weight 2,000-30,000 having a cationic electrodeposition property, and 0.1-10 weight parts of 2 or more species of photopolymerization initiators which absorb ultraviolet radiation in a wavelength range of 300-400 nm, as effective ingredients. The coating composition can readily be deposited electrically on metal materials including plated products and plastic materials provided with electrical conductivity and cured by irradiation of ultraviolet radiation within a short period of time to give a dry coating film which is appreciable in adhesiveness to the plated materials and good in appearance.

Abstract: To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display including the photosensitive paste, by using a photosensitive paste that includes, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.

Abstract: The present invention relates to a recording material having a substrate and a negative-working, radiation-sensitive layer which contains a diazonium salt, metal-free colored pigments dispersed in an organic polymeric binder, transparent spacer pigments having a pore volume of more than 1.0 ml/g and a polymeric binder. The predispersal of the colored pigments is achieved by milling with an organic polymeric binder containing hydroxyl groups, some or all of which have been reacted with a di- or polycarboxylic anhydride so that the binder has an acid number of from 20 to 200. Printing plates in which the printing parts have a clearly visible contrast relative to the substrate can be produced from the recording material.

Abstract: A radiation-sensitive resin composition comprising: (A) a phenol resin, (B) an amino resin, (C) a compound having two or more crosslinking groups in a molecule, and (D) a halomethyl-1,3,5-triazine compound. The composition can form insulating layers exhibiting high resolution, high plating solution resistance, high adhesion to conductor wiring, and developability using an alkaline aqueous solution, producing cured insulating layers with superior solvent resistance, excellent waterproofing characteristics, and high heat resistance. The composition is useful for fabricating multilayered wiring boards.

Abstract: A positive type electrodeposition photoresist composition characterized by neutralizing by a basic compound and dissolving or dispersing in an aqueous medium a composition comprising (A) a polymer having 0.5-10 equivalents of carboxyl group(s) and optionally having more than 1 equivalent of hydroxyphenyl group(s) per kg polymer, or (A′) a polymer having 0.5-10 equivalents of carboxyl group(s) per kg polymer and (A″) a polymer having more than 1 equivalent of hydroxyphenyl group(s) per kg polymer; (B) a compound having at least two vinyl ether groups per molecule; (C) a compound which generates an acid when irradiated with a visible light; and (D) a sensitizing dye, and a process for pattern formation using such a composition are disclosed. Said composition has excellent thermal stability, high resolution and formability of fine image pattern and is useful to positive type photoresist, printing material etc.

Abstract: The present invention relates to a radiation-sensitive resist composition comprising a radiation-sensitive acid generator and a copolymer binder formed by the reaction of (a) an acrylate or methacrylate monomer having a photogenerated acid cleavable substituent and (b) an acrylate or methacrylate monomer having a polar non photoacid cleavable substituent.

Abstract: A photocurable composition containing at least a radical polymerizable unsaturated group-bearing compound, a metal allene compound, a squalilium dye, and N,N-dimethylaniline. The photocurable composition is polymerized and cured by generation of radicals upon receipt of low energy of visible light having long wavelengths or near infrared light.

Abstract: The present invention provides a pigment dispersed color-filter composition containing a binder polymer such as an alkali-soluble block copolymer; a radiation-sensitive compound; and a pigment. The pigment-dispersed color-filter composition which further contains an organic medium, or an organic medium and a carboxylic acid is also provided.