Abstract: A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.

Abstract: A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.

Abstract: The present invention provides a green coloring composition for use in a color filter, which can form a green colored film having low incident-angle dependence and improves the color-separation properties of a solid-state imaging device including the colored film; and a colored film, a color filter, and a solid-state imaging device. The green coloring composition for use in a color filter of the present invention is a green coloring composition for use in a color filter, containing a green colorant, a near-infrared absorbent, and a polymerizable compound, in which when the green coloring composition for use in a color filter is used to form a colored film having a film thickness of 0.

Abstract: An optoelectronic element comprises a semiconductor stack comprising an active layer, wherein the semiconductor stack has a first surface and a second surface opposite to the first surface; a first transparent layer on the second surface; a plurality of cavities in the first transparent layer; and a layer on the first transparent layer, wherein the first transparent layer comprises oxide or diamond-like carbon.

Abstract: A liquid crystal display includes: a substrate including a display region and a non-display region, a light leakage preventing layer disposed on the substrate along the non-display region, a step providing layer disposed on the light leakage preventing layer, and a hydrophobic layer disposed on the step providing layer.

Abstract: A monolithic ceramic electronic component includes a ceramic body including a stack of ceramic layers. Inner electrodes are disposed within the ceramic body and include exposed portions at the end surfaces of the ceramic body. A pair of outer electrodes is arranged on the end surfaces of the ceramic body so as to extend from the end surfaces to the main surfaces and side surfaces of the ceramic body. Each of the outer electrodes includes a lower electrode layer provided on the ceramic body, an intermediate electrode layer located on the lower electrode layer and defined by a plated Ni layer, and an upper electrode layer located on the intermediate electrode layer and defined by a plated Pd layer. A thickness of the intermediate electrode layer on the main surfaces and the side surfaces of the ceramic body is larger than a thickness of the intermediate electrode layer on the end surfaces of the ceramic body.

Abstract: A method for producing an electrostatic chuck 10 includes the steps of (a) pouring a ceramic slurry containing a ceramic powder, a solvent, a dispersant, and a gelling agent into a first molding die 31 in which an electrostatic electrode precursor 24 is removably attached to an inner surface of the first molding die 31, gelatinizing the ceramic slurry by causing a chemical reaction of the gelling agent, and then removing the first molding die 31 to prepare an embedded-electrode-containing ceramic molded body 41X in which the electrostatic electrode precursor 24 is embedded in a first ceramic molded body 41; (b) preparing a second ceramic molded body 42; and (c) preparing a stacked calcined body 50 using the embedded-electrode-containing ceramic molded body 41X and the second ceramic molded body 42, and conducting hot-press firing of the stacked calcined body 50.

Abstract: A coloring composition containing a halogenated zinc phthalocyanine pigment, which has excellent viscosity stability, is provided. A cured film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid-state imaging device, and an image display device, each using the coloring composition, are also provided. The colorant composition includes a colorant, a resin, and a pigment derivative, in which the colorant contains a halogenated zinc phthalocyanine pigment, the content of the colorant with respect to the total solid content in the coloring composition is 50% by mass or more, and the content of the Group 2 element ions with respect to the mass of the halogenated zinc phthalocyanine pigment is 30 ppm by mass to 300 ppm by mass.

Abstract: A display device includes: a first panel including a common voltage wire on a first substrate, and a light blocking layer which is on the common voltage wire and exposes a portion of the common voltage wire, a second panel facing the first panel and including a common electrode on a second substrate; and a sealant between the first and second panels and electrically connecting the common electrode of the second panel and the common voltage wire of the first panel to each other. The sealant includes a first sealing portion having a first color and a second sealing portion having a second color different from the first color of the first sealing portion. The second sealing portion overlaps the exposed portion of the common voltage wire of the first panel and electrically connects the common electrode of the second panel to the common voltage wire.

Abstract: Provided are a colored composition which enables the formation of a pattern having excellent heat resistance and excellent solubility in solvents and has inhibited color migration; and a cured film, a color filter, a method for producing a color filter, a solid-state image sensor, and an image display device, each of which uses the colored composition. The colored composition includes a polymer anion having a repeating unit containing a weakly nucleophilic anionic structure, and a dye having a cationic structure, in which the weakly nucleophilic anionic structure represents an anionic structure produced by dissociating an organic acid having a lower pKa value than the pKa value of sulfuric acid.

Abstract: A red photoresist composition capable of emitting infrared light, a method of preparing the red photoresist composition capable of emitting infrared light, a color filter comprising red sub-pixels formed from the red photoresist composition capable of emitting infrared light, and a display device including the color filter. The red photoresist composition capable of emitting infrared light comprises, based on the total weight of the composition, 2% to 20% of a color mixed material, 30% to 90% of a solvent, 2% to 20% of an alkali-soluble resin, 2% to 20% of an ethenoid unsaturated monomer, 0.01% to 1% of photoinitiator, and 0.005% to 0.02% of other additives; wherein the color mixed material includes a colorant and a surface-modified infrared light-emitting material at a weight ratio of 99.95:0.05 to 1:1.

Abstract: A physical information acquisition method in which a corresponding wavelength region of visible light with at least one visible light detection unit coupled to an image signal processing unit is detected, each said visible light detection unit comprising a color filter adapted to transmit the corresponding wavelength region of visible light; a wavelength region of infrared light with at least one infrared light detection unit coupled to the image signal processing unit is detected; and, with the signal processing unit, a first signal received from the at least one visible light detection unit by subtracting a product from said first signal is corrected, said product resulting from multiplication of a second signal received from the at least one infrared light detection unit and a predetermined coefficient factor.

Abstract: The disclosure relates to display technology field, especially relates to a polymer dye and a method for preparing the same, a photoresist composition, a color photoresist, and a display device. The polymer dye is formed by the copolymerization of an acrylated dye represented by General Formula I and an acrylic acid or acrylate represented by General Formula II, in General Formula I, Dye represents a residue of a dye containing an aromatic hydroxyl group or an aromatic amino group, R1, R2, and R3 are each independently selected from a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms; in General Formula II, R4, R5, R6, and R7 are each independently selected from a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms; the mole numbers of the acrylated dye represented by General Formula I and the acrylic acid or acrylate represented by General Formula II are x and y, respectively, and x:y=1:0.05-10; and the weight average molecular weight of the polymer dye is 2000-50000.

Abstract: A method for manufacturing color filter, a color filter, and a display device including the color filter are disclosed. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.

Abstract: In some examples, techniques and architectures for fabricating an image sensor chip having a curved surface include placing a substrate on a first surface of an image sensor chip, wherein the first surface of the image sensor chip is opposite a second surface of the image sensor chip, and wherein the second surface of the image sensor chip includes light sensors to generate electrical signals in response to receiving light. Fabricating also includes modifying a volume of the substrate so as to impart forces on the image sensor chip to produce a curved image sensor chip.

Abstract: A black photosensitive resin composition includes (A) an alkali soluble polyimide-polyamic acid copolymerization resin; (B) a multi-functional monomer; (C) a photopolymerization initiator; (D) a black colorant; and (E) a solvent, a photosensitive resin layer manufactured using the same, and a display device including the photosensitive resin layer.

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract: Provided is a photo-sensitive composition capable of yielding pixels having a high translucency and a large refractive index, with a less amount of development residue in the process of formation. The photo-sensitive resin composition contains an ultraviolet absorber represented by Formula (I); a photo-polymerization initiator; and a polymerizable monomer: wherein each of R1, R2 and R3 independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; one of R4 and R5 represents an electron withdrawing group, and the other of R4 and R5 represents —SO2R6, —CO2R6, —COR6, —CN or —CONR6R7; each of R6 and R7 independently represents a hydrogen atom, alkyl group having 1 to 8 carbon atoms or aryl group.

Abstract: A coloring composition is provided which is less likely to remain on a pattern of other colors as residues and can inhibit occurrence of coating defects. Also provided are a colored pattern, a color filter, a method of producing a color filter, a pattern forming method, a solid-state imaging device, and an image display device, each using the coloring composition. The coloring composition contains a resin (A) having a dye structure, in which in the peak area of the total molecular weight distribution of the resin (A) as measured by gel permeation chromotography, the proportion of the peak area of a component having a molecular weight of 20,000 or more is 10% or less.

Abstract: A display device includes a substrate including a plurality of pixel areas, a thin film transistor positioned on the substrate, a first insulating layer positioned on the thin film transistor, a pixel electrode connected with the thin film transistor and positioned on the first insulating layer, a common electrode positioned on the pixel electrode and spaced apart from the pixel electrode by a microcavity, a second insulating layer positioned on the common electrode, a roof layer positioned on the second insulating layer, a thickness of the roof layer being about 4 ?m to about 50 ?m, an injection hole through the common electrode, the second insulating layer, and the roof layer, the injection hole exposing a part of the microcavity, a liquid crystal layer filling the microcavity, and an overcoat on the roof layer and extending into the injection hole, the overcoat sealing the microcavity.

Abstract: A dual coating and lift-off method for protecting patterned dielectric-metal coatings using a 2-layer lithography process that is exposed and developed to create an undercut and then, after the wafer is coated with a metal/dielectric filter ending with an incomplete final layer, the top lithography layer is lifted off exposing metal layer edges and leaving the bottom lithography layer intact on the wafer such that the final filter layer(s) can be deposited to complete the coating and passivate the exposed metal layer edges is disclosed.

Abstract: An object of the present invention is to provide: a color material dispersion liquid which is able to form a coating film with high luminance, excellent heat resistance and excellent light resistance. Disclosed is a color material dispersion liquid comprising a color material represented by the following general formula (I), a specific dispersant, and a specific solvent, wherein molybdenum and tungsten are contained in a polyoxometalate anion in the color material, and a molar ratio between the molybdenum and the tungsten is 0.4:99.6 to 15:85: (Symbols shown in the general formula (I) are described in the Description.

Abstract: Provided is a color filter array panel. The color filter array panel according to exemplary embodiments of the present invention includes: a substrate; a color filter disposed on the substrate and including a colorant including at least one of a pigment and a dye, and a solid fluorescent material; and a light source unit supplying light to the color filter, in which the solid fluorescent material is an aggregation induced emission enhancement (AIEE) material of which a liquid state is solidified to increase fluorescence efficiency.

Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring a good visibility and a good adhesion property to a hard coat layer, etc., for example, such as various kinds of optical films as members of liquid crystal displays as well as molding films. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film which is produced by applying a coating solution comprising a polyester resin having a naphthalene skeleton, a metal oxide, and two or more kinds of crosslinking agents, thereonto.

Abstract: A solid-state imaging device is provided. The solid-state imaging device includes a semiconductor substrate containing a plurality of image sensors. A color filter including a plurality of color filter segments is disposed above the semiconductor substrate. Each of the color filter segments corresponds to one of the image sensors. Further, a plurality of partitions is disposed between the color filter segments. Each of the partitions is disposed between any two adjacent color filter segments. The partition has a height smaller than the height of the color filter segment, wherein the height of the partition is based on the bottom of the color filter segment to the top of the partition, and the height of the color filter segment is based on the bottom of the color filter segment to the top of the color filter segment.

Abstract: A colored composition for use in electrowetting displays includes a non-polar solvent and a dipyrromethene dye having a solubility in n-hexane of 1% by mass or higher at 25° C. and 0.1 MPa. In a particular embodiment, an electrowetting display device that employs the colored composition exhibits increased responsiveness, and exhibits suppressed backflow at the time of image display.

Abstract: Provided is a photo-sensitive composition capable of yielding pixels having a high translucency and a large refractive index, with a less amount of development residue in the process of formation. The photo-sensitive resin composition contains an ultraviolet absorber represented by Formula (I); a photo-polymerization initiator; and a polymerizable monomer: wherein each of R1, R2 and R3 independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; one of R4 and R5 represents an electron withdrawing group, and the other of R4 and R5 represents —SO2R6, —CO2R6, —COR6, —CN or —CONR6R7; each of R6 and R7 independently represents a hydrogen atom, alkyl group having 1 to 8 carbon atoms or aryl group.

Abstract: To provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape, and also to provide a pattern formation method employing that. A composition for forming a topcoat layer, containing a solvent and a triphenylene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development. The composition may further contain a polymer.

Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.

Abstract: In order to prevent light leakage between adjacent pixels or prevent color mixture, a liquid crystal display device includes: a TFT substrate having a pixel in which a pixel electrode and a TFT are formed; a counter substrate in which a color filter is formed corresponding to the pixel, a black matrix is formed between each of the color filters, and an overcoat film is formed so as to cover the color filter; and a liquid crystal sandwiched between the TFT substrate to the counter substrate. When seen from a direction perpendicular to the main surface of the counter substrate, an insertion material with a refractive index different from the refractive index of the overcoat film is formed in the layer of the overcoat film at a position corresponding to the black matrix. The refractive index of the insertion material is different from the refractive index of the liquid crystal.

Abstract: A composition for a polarization film including a polyolefin component including polypropylene and a polyethylene-polypropylene copolymer; and a dichroic dye.

Abstract: There is provided a dispersion composition containing (A) a metal oxide particle having a primary particle diameter of 1 nm to 100 nm, (B) a polymer compound represented by the specific formula having a weight average molecular weight of 5,000 to 8,000 and an acid value of 70 to 90 mgKOH/g, and (C) a solvent, and a curable composition containing the dispersion composition and (D) a polymerizable compound.

Abstract: There is provided a coloring composition including: a colorant; and a resin, wherein a content of the colorant is 50% by mass or more based on total solids of the coloring composition, and a solid acid number of a resin having a highest solid acid number among all kinds of resins contained in the coloring composition, is 80 mg KOH/g or less.

Abstract: Provided are a colored composition which can maintain good light fastness even when placed under an environment having a low oxygen concentration for a long period of time, a cured film, a color filter, a method for producing a color filter, a solid-state image sensor, and an image display device. The colored composition includes a dye multimer (A) and a solvent (B), in which the dye multimer (A) has a partial structure derived from a xanthene dye having a cationic moiety, and also has an anionic moiety, and the content of water in the colored composition is 0.01% by mass to 3.0% by mass.

Abstract: An imaging system and method having a selected depth of field include an imaging lens for forming images of an object, the imaging lens having chromatic aberration and a color image sensor for receiving the images of the object. The color image sensor has a selected spectral response, the selected spectral response of the color image sensor defining a selected first center wavelength, a selected second center wavelength and a selected third center wavelength, wherein the selected first center wavelength is larger than the selected second center wavelength and the selected second center wavelength is larger than the selected third center wavelength. The selected spectral response defines the depth of field of the imaging system. A difference between the selected first center wavelength and the selected third center wavelength is greater than 150 nm.

Abstract: A polymerizable composition contains (A) a polymerization initiator that is an acetophenone-based compound or an acylphosphine oxide-based compound, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, and (D) an alkali-soluble binder.

Abstract: The present invention disclose a exposure mask for fabricating a color filter, the exposure mask includes a plurality of exposure regions; and a light-shielding region for isolating the plurality of exposure regions, wherein, an edge of each exposure region is provided with multiple first light-shielding patterns spaced apart with each other. The present invention also discloses a fabrication method for a color filter, comprising steps of: (a) providing a lower glass substrate fabricating having an array of thin film transistor (TFT); (b) fabricating a first insulation protection layer on the array of thin film transistor (TFT); and (c) applying a photolithography process to respectively fabricate color filter units to obtain the color filter; wherein, using the above described exposure mask for exposing.

Abstract: A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.

Abstract: There is provided a photosensitive transparent composition for a color filter of a solid-state imaging device, containing (A) a photopolymerization initiator, (B) a polymerizable compound, and (C) an alkali-soluble resin, wherein the cured film obtained from the photosensitive transparent composition has a refractive index of 1.60 to 1.90 for light at a wavelength of 633 nm.

Abstract: A resin coating apparatus includes a display panel disposed on a stage. A plurality of nozzles correspond to the display panel. The nozzles have a plurality of outlets configured to discharge a first resin and a second resin to the display panel. The second resin has different viscosity from the first resin. A connecting member holds the plurality of nozzles. A first supply unit is connected to the nozzles, and the first supply unit is configured to supply the first resin. The second supply unit is connected to the nozzles, and the second supply unit is configured to supply the second resin.

Abstract: A light-emitting element includes a reflective layer; a first transparent layer on the reflective layer; a light-emitting stack having an active layer on the first transparent layer; and a cavity formed in the first transparent layer.

Abstract: A colored radiation-sensitive composition contains (A) a dye multimer, (B) a pigment, (C) a polymerizable compound, (D) a photopolymerization initiator, and (E) a dispersion resin obtained by reacting a polymer, which has a hydroxyl group on one terminal, with an acid anhydride.

Abstract: A colored radiation-sensitive composition for a color filter that includes (A) a pigment, (B) a photopolymerization initiator, and (C) a polymerizable compound, in which the colored radiation-sensitive composition satisfies the following conditions: when a colored radiation-sensitive composition layer is formed from the colored radiation-sensitive composition such that spectral transmittance at 600 nm becomes 30%, the colored radiation-sensitive composition layer includes the following characteristics: (1) spectral transmittance at 400 nm is 20% or less; (2) spectral transmittance at 550 nm is 10% or less; (3) spectral transmittance at 700 nm is 70% or more; (4) a wavelength resulting in 50% spectral transmittance is in a range of from 650 nm to 680 nm; and (5) a film thickness of the colored radiation-sensitive composition layer is in a range of from 0.55 ?m to 1.8 ?m.

Abstract: A liquid crystal display 50 includes: a light source 10; a liquid crystal display panel 213; a wire-grid polarization plate 211, 214 located on at least one of a light-incident side and a light-emission side of the liquid crystal display panel 213, and including a base plate 101 and a plurality of wires 100 arranged in stripes on the base plate 1; a projection lens 23; a cooling part 25 which supplies wind to the liquid crystal display panel 213 and the polarization plate 211, 214 to cool them; and a covering wall 102 which covers end faces of the plurality of wires 100 and ends of a plurality of grooves 108 formed between the plurality of wires 100, at a windward side of the polarization plate 211, 214 in a flow direction of the wind supplied from the cooling part 25.

Abstract: Embodiments of the present invention relate to a semiconductor chip comprising a plurality of contact pads, which are arranged in an edge area on a surface of the semiconductor chip. In a semiconductor area of the semiconductor chip, every contact pad of the plurality of contact pads has an associated pad cell provided, which includes at least one of a driver or a receiver and is configured to drive output signals or receive input signals on its associated contact pad, if the driver or receiver is connected to the contact pad. Additionally, for a contact pad which is used as a supply contact pad, the driver or receiver of the associated pad cell is not connected to the contact pad or any other contact pad for driving output signals or receiving input signals on the same.

Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymeric compound (C), a compound (D) having an ethylenically unsaturated group, a photoinitiator (E) and an organic solvent (F). The photosensitive resin composition according to the present invention can improve voltage holding ratio and developing-resistance of the color filter.

Abstract: Disclosed is a photosensitive resin composition which has excellent concealing properties for appearance defects of a circuit and the like, while having excellent coloring power and resolution that enable the formation of a high-resolution solder resist layer. Specifically disclosed is a photosensitive resin composition which contains a perylene coloring agent, a coloring agent that is in a complementary color relation with the perylene coloring agent, a carboxyl group-containing resin, a compound that contains two or more ethylenically unsaturated groups in each molecule, and a photopolymerization initiator.

Abstract: A method for fabricating a color filter layer, which is applied to an integrated circuit manufacturing process, includes the following steps. Firstly, a substrate is provided, and a groove structure is formed on the substrate. The groove structure includes a plurality of positive photoresist patterns and a plurality of trenches. Then, a first group of color filter patterns is formed in the trenches. The plurality of positive photoresist patterns is removed, so that a portion of a top surface of the substrate is exposed. Then, a second group of color filter patterns is formed on the exposed top surface of the substrate.

Abstract: Provided are: a color filter substrate that can improve the uniformity of thickness of color filters, and a method of manufacturing the color filter substrate. The method of manufacturing a color filter substrate includes: forming a plurality of photoresist films in layers on a transparent substrate; exposing said plurality of photoresist films via a photomask; forming a pattern having an opening by developing the plurality of photoresist films after exposure; and discharging ink into the opening. The photosensitivities of the plurality of photoresist films differ from each other.

Abstract: Display device, including: substrates, color filters having first and second color filters, drain and gate signal lines (of light blocking material), wherein, an overlapping portion adjacent the first and second color filter overlap, is formed on a region with one of the drain or gate signal lines, a first color filter edge is a first taper and a second color filter edge is a second taper, in the overlapping portion, the first taper is closer to the drain or gate signal line than the second taper in the overlapping portion, the first taper angle is 45° or more and 90° or less corresponding to a surface of the drain or gate signal line, the second taper angle is 45° or more and 90° or less corresponding to a surface of the first taper and, the first taper angle is larger than the second taper angle.