Abstract: The disclosure concerns a resistive memory cell, including a stack of a selector, of a resistive element, and of a layer of phase-change material, the selector having no physical contact with the phase-change material. In one embodiment, the selector is an ovonic threshold switch formed on a conductive track of a metallization level.

Abstract: The disclosure concerns a resistive memory cell, including a stack of a selector, of a resistive element, and of a layer of phase-change material, the selector having no physical contact with the phase-change material. In one embodiment, the selector is an ovonic threshold switch formed on a conductive track of a metallization level.

Abstract: Thyristor semiconductor device comprising an anode region, a first base region and a second base region having opposite types of conductivity, and a cathode region, all superimposed along a vertical axis.

Abstract: An electronic component includes first and second separate semiconductor regions. A third semiconductor region is arranged under and between the first and second semiconductor regions. The first and third semiconductor regions define electrodes of a first diode. The second and third semiconductor regions define electrodes of a second diode. The first diode is an avalanche diode.

Abstract: The present disclosure relates to an array substrate that includes a first metal layer, an insulating layer, and a second metal layer. The first metal layer includes at least one first wire. The first wire has an overlapping section and a connecting section connected to both ends of the overlapping section, and an extending direction of the overlapping section is different from an extending direction of the connecting section. The insulating layer covers the first metal layer, and the region of the insulating layer corresponding to the first wire is a convex ridge protruding in a direction away from the first metal layer. The second metal layer is provided on a side of the insulating layer facing away from the first metal layer and includes at least one second wire that intersects the convex ridge in the area of the convex ridge corresponding to the overlapping section.

Abstract: The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a semiconductor substrate having a n-type doped well (N-well) and a p-type doped well (P-well) disposed side by side; a first fin active region extruded from the N-well of the semiconductor substrate; a second fin active region extruded from the P-well of the semiconductor substrate; a first isolation feature formed on the N-well and the P-well and laterally contacting the first and second fin active regions, the first isolation feature having a first width; and a second isolation feature inserted between the N-well and the P-well, the second isolation feature having a second width less than the first width.

Abstract: To improve the withstand capability of a transistor portion, provided is a semiconductor device including a semiconductor substrate; a transistor portion provided in the semiconductor substrate; and a diode portion provided in the semiconductor substrate and arranged adjacent to the transistor portion in a predetermined arrangement direction. The transistor portion includes a collector region provided in a bottom surface of the semiconductor substrate, at respective ends adjacent to the diode portion; and a first low injection region that is provided on a bottom surface side of the semiconductor substrate farther inward than the respective ends, and has a carrier injection density from the bottom surface side to a top surface side of the semiconductor substrate that is lower than that of the collector region.

Abstract: The SCR-based ESD device has a 4-layered PNPN structure (NPN and PNP junction transistors) disposed in SOI having first and second device wells (N-well and P-well) abut forming a NP junction near a midline. First and second contact regions disposed in device wells are coupled to high and low power sources (I/O pad and ground). Internal isolation regions (shallower STI) extending partially not touching the bottom of surface substrate separate the first and second contact regions. A vertical gate is disposed over the NP junction or over a shallower STI which overlaps the junction and separate the second contact regions in x-direction. One or more horizontal gates separate the second contact regions in y-direction and guide the device wells underneath the shallower STI to outer edges to connect with the first contact regions for body contacts. A process for forming the device is also disclosed and is compatible with CMOS processes.

Abstract: A semiconductor device includes a third electrode between a first semiconductor region and a second electrode, a fourth electrode between the first semiconductor region and the second electrode, a second semiconductor region between the first semiconductor region and the second electrode and between the third electrode and the fourth electrode, a third semiconductor region between the second semiconductor region and the second electrode, a fourth electrode between the first semiconductor region and the second electrode to be electrically connected to the second electrode, and a fifth semiconductor region between the first electrode and the first semiconductor region. A first insulating film is provided between the third electrode and the first semiconductor region, the second semiconductor region, the third semiconductor region and the second electrode.

Abstract: High voltage drain-extended metal-oxide-semiconductor (DEMOS) bipolar switches for electrical overstress protection are provided. In certain configurations herein, an electrical overstress switch embodiment for providing electrical overstress protection, such as electrostatic discharge/electrical overstress (ESD/EOS) protection includes both a DEMOS device and an embedded bipolar device. The switch is implemented to achieve the advantages provided by the combined conduction of DEMOS and bipolar devices. For example, the DEMOS device provides surface conduction at the gate region for relatively fast switch device turn on and low voltage overshoot, while the bipolar device provides high current conduction during stress condition and a high holding voltage characteristics to prevent latch-up in mission critical integrated circuit applications.

Abstract: The present disclosure provides a liquid crystal display apparatus having a reduced area of a dark line occurring when light is transmitted through a pixel region, and excellent transmittance of light and image quality.

Abstract: Disclosed are a pixel unit structure and a display device. The pixel unit structure includes a thin film transistor formed on a substrate, and a first insulating layer, a first transparent electrode layer, a second insulating layer, and a second transparent electrode layer formed in sequence from bottom to top above the thin film transistor. A storage capacitor is formed between the first transparent electrode layer and the second transparent electrode layer.

Abstract: A liquid crystal display panel and a method for manufacturing the same. The liquid crystal display panel includes lower substrate having a first substrate; an upper substrate having a second substrate that is opposite to the first substrate; a liquid crystal layer is disposed between the lower and upper substrates such that liquid crystals are arranged in a first region between the first substrate and the second substrate; and a dam pattern arranged in a second region which surrounds a circumference of the first region as a region between the first substrate and the second substrate, the dam pattern having both a physical barrier function and a chemical barrier function.

Abstract: A method of manufacturing a semiconductor device includes: forming field electrode structures extending in a direction vertical to a first surface in a semiconductor body; forming cell mesas from portions of the semiconductor body between the field electrode structures, including body zones forming first pn junctions with a drift zone; forming gate structures between the field electrode structures and configured to control a current flow through the body zones; and forming auxiliary diode structures with a forward voltage lower than the first pn junctions and electrically connected in parallel with the first pn junctions, wherein semiconducting portions of the auxiliary diode structures are formed in the cell mesas.

Abstract: A photovoltaic element (110) is proposed for conversion of electromagnetic radiation to electrical energy. The photovoltaic element (110) may especially be a dye solar cell (112). The photovoltaic element (110) has at least one first electrode (116), at least one n-semiconductive metal oxide (120), at least one electromagnetic radiation-absorbing dye (122), at least one solid organic p-semiconductor (126) and at least one second electrode (132). The p-semiconductor (126) comprises at least one metal oxide (130).

Abstract: Provision of fabrication, construction, and/or assembly of a memory device including a two-terminal memory portion is described herein. The two-terminal memory device fabrication can provide enhanced capabilities in connection with precisely tuning on-state current over a greater possible range.

Abstract: A method for fabricating an anode-shorted field stop insulated gate bipolar transistor (IGBT) comprises selectively forming first and second semiconductor implant regions of opposite conductivity types. A field stop layer of a second conductivity type can be grown onto or implanted into the substrate. An epitaxial layer can be grown on the substrate or on the field stop layer. One or more insulated gate bipolar transistors (IGBT) component cells are formed within the epitaxial layer.

Abstract: Provision of a super-junction semiconductor device capable of reducing rises in transient on-resistance at the time of repeated switching operation. A super-junction structure is provided that has a striped parallel surface pattern, where a super-junction stripe and a MOS cell 6 stripe are parallel, and a p column Y2 over which no MOS cell 6 stripe is arranged and a p column Y1 over which the MOS cell 6 stripe is arranged are connected at an end.

Abstract: An object of the present invention is to provide a trench gate type IGBT achieving both retention of withstand voltage and lowering of ON-state voltage and to provide a method for manufacturing the trench gate type IGBT. The IGBT according to the present invention is an SJ-RC-IGBT which includes a drift layer having super junction structure, and includes an IGBT area and an FWD area on the rear surface. In the IGBT according to the present invention, a first drift layer has an impurity concentration of 1×1015 atms/cm3 or higher and lower than 2×1016 atms/cm3, and a thickness of 10 ?m or larger and smaller than 50 ?m; and that a buffer layer has an impurity concentration of 1×1015 atms/cm3 or higher and lower than 2×1016 atms/cm3, and a thickness of 2 ?m or larger and smaller than 15 ?m.

Abstract: An electrostatic discharge protection circuit is disclosed. A method of manufacturing a semiconductor structure includes forming a semiconductor controlled rectifier including a first plurality of fingers between an n-well body contact and an anode in an n-well, and a second plurality of fingers between a p-well body contact and a cathode in a p-well.

Abstract: A method for manufacturing a transient voltage suppressing (TVS) array substantially following a manufacturing process for manufacturing a vertical semiconductor power device. The method includes a step of opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate followed by applying a body mask for doping a body region having a second conductivity type between two of the isolation trenches. The method further includes a step of applying an source mask for implanting a plurality of doped regions of the first conductivity type constituting a plurality of diodes wherein the isolation trenches isolating and preventing parasitic PNP or NPN transistor due to a latch-up between the doped regions of different conductivity types.

Abstract: Resistive-switching memory elements having improved switching characteristics are described, including a memory element having a first electrode and a second electrode, a switching layer between the first electrode and the second electrode comprising hafnium oxide and having a first thickness, and a coupling layer between the switching layer and the second electrode, the coupling layer comprising a material including metal titanium and having a second thickness that is less than 25 percent of the first thickness.

Abstract: Techniques for refreshing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a semiconductor memory device including a plurality of memory cells arranged in an array of rows and columns. Each memory cell may include a first region coupled to a source line and a second region coupled to a carrier injection line. Each memory cell may also include a body region capacitively coupled to at least one word line and disposed between the first region and the second region and a decoupling resistor coupled to at least a portion of the body region.

Abstract: A memory cell includes a thyristor having a plurality of alternately doped, vertically superposed semiconductor regions; a vertically oriented access transistor having an access gate; and a control gate operatively laterally adjacent one of the alternately doped, vertically superposed semiconductor regions. The control gate is spaced laterally of the access gate. Other embodiments are disclosed, including methods of forming memory cells and methods of forming a shared doped semiconductor region of a vertically oriented thyristor and a vertically oriented access transistor.

Abstract: A memristor apparatus comprising a plurality of meta-stable switching elements.

Abstract: Provision of fabrication, construction, and/or assembly of a memory device including a two-terminal memory portion is described herein. The two-terminal memory device fabrication can provide enhanced capabilities in connection with precisely tuning on-state current over a greater possible range.

Abstract: A p-type base layer is selectively formed on a surface of an n-type drift layer; an n-type source layer is selectively formed on a surface of the p-type base layer; and a p-type contact layer is formed to be in contact with the selectively-formed n-type source layer. A p-type counter layer is formed to be in contact with the n-type source layer, so as to overlap the p-type contact layer, so as to be separated from an interface where the p-type base layer and the gate oxide film are in contact with each other, and to be shallower than the p-type base layer. Accordingly, switching destruction caused by process defects in an insulated gate semiconductor device is reduced.

Abstract: According to one embodiment, a semiconductor device includes: a first electrode; a second electrode; a first semiconductor layer provided between the first electrode and the second electrode; a second semiconductor layer provided between the first semiconductor layer and the second electrode, and the second semiconductor layer having a lower impurity concentration than the first semiconductor layer; a first semiconductor region provided between part of the second semiconductor layer and the second electrode; a second semiconductor region provided between a portion different from the part of the second semiconductor layer and the second electrode, and the second semiconductor region being in contact with the first semiconductor region; and a third semiconductor region provided between at least part of the first semiconductor region and the second electrode.

Abstract: A semiconductor device provided with a silicon carbide semiconductor substrate, and an ohmic metal layer joined to one surface of the silicon carbide semiconductor substrate in an ohmic contact and composed of a metal material whose silicide formation free energy and carbide formation free energy respectively take negative values. The ohmic metal layer is composed of, for example, a metal material such as molybdenum, titanium, chromium, manganese, zirconium, tantalum, or tungsten.

Abstract: A power semiconductor device may include a first semiconductor region having a first conductivity type, a second semiconductor region having a second conductivity type formed on an upper portion of the first semiconductor region, a third semiconductor region having a first conductivity type formed in an inner portion of an upper portion of the second semiconductor region, a trench gate formed to penetrate from the third semiconductor region to the first semiconductor region and including a first insulating layer formed on a surface thereof, and a second insulating layer formed in a lower portion of the trench gate.

Abstract: A structure includes first and second silicon controlled rectifiers (SCRs) formed in a substrate. The first and the second SCRs each include at least one component commonly shared between the first and the second SCRs.

Abstract: IGBT and diode are formed with optimal electrical characteristics on the same semiconductor substrate. IGBT region and FWD region are provided on the same semiconductor substrate. There are a plurality of trenches at predetermined intervals in the front surface of an n? type semiconductor substrate, and P-type channel regions at predetermined intervals in the longitudinal direction of the trench between neighboring trenches, thereby configuring a MOS gate. The p-type channel region and n? type drift region are alternately disposed in longitudinal direction of the trench in the IGBT region. The p-type channel region and a p? type spacer region are alternately disposed in the longitudinal direction of the trench in the FWD region. Pitch in longitudinal direction of the trench of p-type channel region in the IGBT region is shorter than pitch in longitudinal direction of the trench of p-type channel region in the FWD region.

Abstract: A nanoscale switching device is provided. The device comprises: a first electrode of a nanoscale width; a second electrode of a nanoscale width; an active region disposed between the first and second electrodes, the active region having a non-conducting portion comprising an electronically semiconducting or nominally insulating and a weak ionic conductor switching material capable of carrying a species of dopants and transporting the dopants under an electric field and a source portion that acts as a source or sink for the dopants; and an oxide layer either formed on the first electrode, between the first electrode and the active region or formed on the second electrode, between the second electrode and the active region. A crossbar array comprising a plurality of the nanoscale switching devices is also provided. A process for making at least one nanoscale switching device is further provided.

Abstract: The present invention discloses a transient voltage suppressor (TVS) circuit, and a diode device therefor and a manufacturing method thereof. The TVS circuit is for coupling to a protected circuit to limit amplitude of a transient voltage which is inputted to the protected circuit. The TVS circuit includes a suppressor device and at least a diode device. The diode device is formed in a substrate, which includes: a well formed in the substrate; a separation region formed beneath the upper surface; a anode region and a cathode region, which are formed at two sides of the separation region beneath the upper surface respectively, wherein the anode region and the cathode region are separated by the separation region; and a buried layer, which is formed in the substrate below the well with a higher impurity density and a same conductive type as the well.

Abstract: Electronic device structures including semiconductor ledge layers for surface passivation and methods of manufacturing the same are disclosed. In one embodiment, the electronic device includes a number of semiconductor layers of a desired semiconductor material having alternating doping types. The semiconductor layers include a base layer of a first doping type that includes a highly doped well forming a first contact region of the electronic device and one or more contact layers of a second doping type on the base layer that have been etched to form a second contact region of the electronic device. The etching of the one or more contact layers causes substantial crystalline damage, and thus interface charge, on the surface of the base layer. In order to passivate the surface of the base layer, a semiconductor ledge layer of the semiconductor material is epitaxially grown on at least the surface of the base layer.

Abstract: An electrostatic discharge protection device is disclosed. The electrostatic discharge protection device comprises a N+ well, a P doping region, a first N doping region, a plurality of N sub-doping regions, a first N+ doping region, a first P+ doping region, a second N+ doping region, and a second doping region. The P doping region is disposed in the N+ well. The first N doping region is disposed in the P doping region. The plurality of N sub-doping regions is disposed in parallel in the P doping region. The first N+ doping region is disposed in the first N doping region. The first P+ doping region is disposed in the first N doping region. The second N+ doping region is disposed in the P doping region.

Abstract: Resistive-switching memory elements having improved switching characteristics are described, including a memory element having a first electrode and a second electrode, a switching layer between the first electrode and the second electrode comprising hafnium oxide and having a first thickness, and a coupling layer between the switching layer and the second electrode, the coupling layer comprising a material including metal titanium and having a second thickness that is less than 25 percent of the first thickness.

Abstract: In a semiconductor substrate of a semiconductor device, a drift layer, a body layer, an emitter layer, and a trench gate electrode are formed. When the semiconductor substrate is viewed in a plane manner, the semiconductor substrate is divided into a first region covered with a heat dissipation member, and a second region not covered with the heat dissipation member. A density of trench gate electrodes in the first region is equal to a density of trench gate electrodes in the second region. A value obtained by dividing an effective carrier amount of channel parts formed in the first region by an area of the first region is larger than a value obtained by dividing an effective carrier amount of channel parts formed in the second region by an area of the second region.

Abstract: A semiconductor device and its method of manufacture. In the method, a front surface element structure is formed on a front surface of a semiconductor wafer, for example an SiC wafer. Then, a supporting substrate is bonded to wafer's front surface through an adhesive. The wafer's rear surface is ground and polished to thin it, with the supporting substrate bonded to the wafer. Next a V groove passing through the SiC wafer and reaching the adhesive is formed in the wafer's rear surface, and the wafer is cut into individual chips. An electrode film is formed on the groove's side wall and the chip's rear surface and a Schottky junction is formed between a drift layer, which is the chip, and the film. Then, the film is annealed. A tape is attached to the wafer's rear surface which has been cut into the chips. Then, the supporting substrate peels off from the wafer.

Abstract: A method of forming a memory device. The method provides a semiconductor substrate having a surface region. A first dielectric layer is formed overlying the surface region of the semiconductor substrate. A bottom wiring structure is formed overlying the first dielectric layer and a second dielectric material is formed overlying the top wiring structure. A bottom metal barrier material is formed to provide a metal-to-metal contact with the bottom wiring structure. The method forms a pillar structure by patterning and etching a material stack including the bottom metal barrier material, a contact material, a switching material, a conductive material, and a top barrier material. The pillar structure maintains a metal-to-metal contact with the bottom wiring structure regardless of the alignment of the pillar structure with the bottom wiring structure during etching. A top wiring structure is formed overlying the pillar structure at an angle to the bottom wiring structure.

Abstract: The present disclosure discloses a method for manufacturing a TFT array substrate, comprising: depositing a gate metal layer, a gate insulating layer, a semiconductor layer and a source-drain electrode layer in this order on a base substrate, performing a first photolithograph process to form a common electrode line, a gate line, a gate electrode, a source electrode, a drain electrode and a channel defined between the source electrode and the drain electrode; depositing a passivation layer, performing a second photolithograph process to form a first via hole and a second via hole in the passivation layer; and depositing a pixel electrode layer and a data line layer in this order, perform a third photolithograph process to form a data line connected to the source electrode through the first via hole and a pixel electrode connected to the drain electrode through the second via hole.

Abstract: Embodiments of the invention provide increased ESD protection suitable for high-voltage devices. In one embodiment, an internal DMOS circuit is placed in parallel with a lateral NPN ESD clamp. The clamp has both a high holding voltage, above the operating voltage of the DMOS circuit, and a high maximum current before breakdown. The discharge path of the clamp includes a high-voltage lightly doped well containing a low-voltage higher doped well. The dopant of both wells is the same type, and the interface between the two defines a graded junction. The emitter of the entire circuit is grounded and the collector is coupled to the voltage of the DMOS circuit.

Abstract: Semiconductor devices including a plurality of thyristor-based memory cells, each having a cell size of 4F2, and methods for forming the same are provided. The thyristor-based memory cells each include a thyristor having vertically superposed regions of alternating dopant types, and a control gate. The control gate may be electrically coupled with one or more of the thyristors and may be operably coupled to a voltage source. The thyristor-based memory cells may be formed in an array on a conductive strap, which may function as a cathode or a data line. A system may be formed by integrating the semiconductor devices with one or more memory access devices or conventional logic devices, such as a complementary metal-oxide-semiconductor (CMOS) device.

Abstract: A resistive random access memory cell formed in an integrated circuit includes first and second resistive random access memory devices, each including an anode and a cathode. The anode of the second resistive random access memory device is connected to the anode of the first resistive random access memory device. A programming transistor has a first source/drain terminal connected to a programming potential node, a second source/drain terminal connected to the anodes of the first and second resistive random access memory devices, and a gate connected to a program-enable node.

Abstract: Embodiments of the invention generally relate to memory devices and methods for fabricating such memory devices. In one embodiment, a method for fabricating a resistive switching memory device includes depositing a metallic layer on a lower electrode disposed on a substrate and exposing the metallic layer to an activated oxygen source while heating the substrate to an oxidizing temperature within a range from about 300° C. to about 600° C. and forming a metal oxide layer from an upper portion of the metallic layer during an oxidation process. The lower electrode contains a silicon material and the metallic layer contains hafnium or zirconium. Subsequent to the oxidation process, the method further includes heating the substrate to an annealing temperature within a range from greater than 600° C. to about 850° C. while forming a metal silicide layer from a lower portion of the metallic layer during a silicidation process.

Abstract: A field-effect transistor (FET) and methods for fabricating such. The FET includes a substrate having a crystalline orientation, a source region in the substrate, and a drain region in the substrate. Gate spacers are positioned over the source region and the drain region. The gate spacers include a gate spacer height. A source contact physically and electrically contacts the source region and extends beyond the gate spacer height. A drain contact physically and electrically contacts the drain region and extends beyond the gate spacer height. The source and drain contacts have the same crystalline orientation as the substrate.

Abstract: A method of testing a device includes setting a potential of a cap terminal of the device to a first voltage, setting a potential of a self test plate of the device to a testing voltage, and detecting a first displacement of a proof mass of the device when the cap terminal is set to the first voltage and the self test plate is set to the testing voltage. The method includes setting a potential of the cap terminal of the device to a second voltage, detecting a second displacement of the proof mass of the device when the cap terminal is set to the second voltage and the self test plate is set to the testing voltage, and comparing the first displacement and the second displacement to evaluate an electrical connection between the cap terminal and a cap of the device.

Abstract: One embodiment of the present invention relates to a silicon-controlled-rectifier (SCR). The SCR includes a longitudinal silicon fin extending between an anode and a cathode and including a junction region there between. One or more first transverse fins traverses the longitudinal fin at one or more respective tapping points positioned between the anode and the junction region. Other devices and methods are also disclosed.

Abstract: A semiconductor device and a manufacturing method of the same are provided. The semiconductor device includes a substrate, a first doping region, a first well, a resistor element, and a first, a second, and a third heavily doping regions. The first well and the third heavily doping region are disposed in the first doping region, which is disposed on the substrate. The first heavily doping region and the second heavily doping region, which are separated from each other, are disposed in the first well. The second and the third heavily doping regions are electrically connected via the resistor element. Each of the substrate, the first well, and the second heavily doping region has a first type doping. Each of the first doping region, the first heavily doping region, and the third heavily doping region has a second type doping, complementary to the first type doping.

Abstract: A semiconductor device is formed with extended STI regions. Embodiments include implanting oxygen under STI trenches prior to filling the trenches with oxide and subsequently annealing. An embodiment includes forming a recess in a silicon substrate, implanting oxygen into the silicon substrate below the recess, filling the recess with an oxide, and annealing the oxygen implanted silicon. The annealed oxygen implanted silicon extends the STI region, thereby reducing leakage current between N+ diffusions and N-well and between P+ diffusions and P-well, without causing STI fill holes and other defects.