Abstract: A transfer device for self-propelling workpiece trolleys of a transport system allows ends of one or more route sections to be continuously or intermittently connected. The ends of the route sections are either connected via transfer sections that are rigid and bent at least in sections, or a transfer section—which can be moved along a straight or curved track curve and supporting one or more workpiece trolleys—can be temporarily arranged before the ends of the route sections, which transfer section can be moved back and forth between the ends via a driveable gear unit. At least one transfer device for a transport and/or processing system is developed, with which the workpiece trolleys are transferred from one route section to another.

Abstract: A system for simultaneously forming multiple flutes in a carbide rotary cutting tool includes a chuck adapted to grasp a green rod member and selectively rotate the green rod member about, and translate the green rod member along, a first axis. The system further includes a mechanism adapted to simultaneously machine multiple flutes in the green rod member as the green rod member is rotated about, and translated along, the first axis.

Abstract: A grinding machine of one embodiment includes an abrasive wheel; a rectangular base including a top wall having a central through hole and an upper shoulder; a mounting member secured to the central through hole; an electric motor including a drive shaft passing through the mounting member to secure to the abrasive wheel; first and third workpiece holding units each including a board secured to the base; an adjustment knob on the board; and an L-shaped seat secured to the board and having a transverse channel, a front curved slot, a rear projection pivotably secured to the board, and a pin secured to the board and disposed in the slot; a second workpiece holding unit secured to the shoulder and including a vertical tunnel; and a fourth workpiece holding unit secured to the shoulder and including a vertical tunnel, an adjustment knob, and a fastening member.

Abstract: Embodiments of the invention comprise a machine adapted for polishing work pieces such as large silicon wafers. A wafer polishing machine in accord with the invention comprises a rotatable platen in a table base, above which is mounted a lid having a head moving assembly with four synchronously rotatable head assemblies. A motor and linkage connected to the head moving assembly imparts reciprocating linear motion to the head assemblies in a selected direction in a plane parallel to an upper surface of the platen. Embodiments of the invention produce a complex relative motion between a surface of a wafer to be polished and the platen. The complex relative motion, resulting from a combination of motions including rotation of the platen, rotation of the head assemblies, and translation of the head moving assembly, improves a uniformity of polish and a rate of polishing compared to wafer polishing machines known in the art.

Abstract: A polishing method, a polishing pad, and a polishing system are described. The polishing pad with a plurality of grooves is provided. The width of each groove is W and the pitch between two adjacent grooves is P. An oscillatory movement distance of a workpiece on the polishing pad is set. The oscillatory movement distance enables any particular point on the workpiece to cross the same number of grooves, when a direction between the particular point and the center of the workpiece is perpendicular to a tangential direction of the grooves. The workpiece is then polished with the oscillatory movement distance, so as to achieve a better polishing uniformity for the surface of the workpiece.

Abstract: A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.

Abstract: A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.

Abstract: An elastic polishing tool that comes into contact with a surface to be polished of a lens and rotates to polish the surface, includes: an elastic polishing body which has a cylindrical shape and whose shape can be changed according to the surface to be polished; and a polishing pad that is adhered to one surface of the elastic polishing body opposite to the surface to be polished of the lens, wherein the polishing pad has a diameter larger than the length of an arc of the elastic polishing body in a cross section including a rotation axis of the elastic polishing tool.

Abstract: An apparatus and associated methods for polishing semiconductor wafers and other workpieces that includes polishing surfaces located at multiple polishing stations. Multiple wafer heads, preferably at least one greater in number than the number of polishing stations, can be loaded with individual wafers. The wafer heads are suspended from a rotatable support, which provides circumferential positioning of the heads relative to the polishing surfaces, and the wafer heads move linearly with respect to the polishing surface, thus providing relative linear motion between the wafer and the polishing station. A load/unload station may be located at a position symmetric with the polishing surfaces. The rotatable support can simultaneously position one of the heads over the load/unload station while the remaining heads are located over polishing stations for wafer polishing so that loading and unloading of wafers can be performed concurrently with wafer polishing.

Abstract: A chemical mechanical polishing (CMP) apparatus and method for polishing semiconductor wafers utilizes multiple wafer carriers to polish a corresponding number of semiconductor wafers on a single polishing pad in parallel. In one embodiment, the wafer carriers are used to transfer semiconductor wafers between one or more wafer transfer stations and the polishing pad. In other embodiments, one or more wafer transfer arms are used to transfer the semiconductor wafers between the wafer transfer station(s) and the wafer carriers. The CMP apparatus is configured to sequentially process semiconductor wafers to increase the throughput of the apparatus. In addition, the components of the CMP apparatus are arranged such that the footprint of the apparatus is minimized.

Abstract: The present invention provides an improved planarization or polishing apparatus for chemical mechanical planarization and other types of polishing such as metal polishing and optical polishing. In an exemplary embodiment, an apparatus for polishing an object comprises a pad having a polishing surface to be placed on a target surface of the object to be polished. A pad drive member is connected to the pad to move the pad relative to the object to change a position of the polishing surface of the pad on the target surface of the object. A drive support is movably coupled with the pad drive member to support the pad drive member for rotation relative to the drive support around a pivot point which is disposed substantially on the target surface of the object during polishing.

Abstract: Vibrating and oscillating rates can be dynamically changed during polishing to achieve an optimal polishing process. A semiconductor device substrate (34) has a first layer with a first film (12) and a second film (10) that overlies the first film (12), where the first film (12) is harder and underlies the second film (10). In one embodiment, the substrate (34) is placed over a first region (66) of a polishing pad (60). The second film (10) is polished at a first vibrating and oscillating rates over the first region (66). An endpoint signal is received when the first film (12) is reached. The substrate (34) is moved to a second region (62) of the polishing pad (60) that is closer to the edge of the pad and has a higher feature density compared to the first region (66). Polishing is performed at a second vibrating and oscillating rates that are different from the first vibrating and oscillating rates to remove the first film (10).

Abstract: Disclosed is a polishing system used for polishing a surface to be polished of an object to be polished by a polishing pad, which is capable of improving uniformity of the surface to be polished of the object to be polished by positively, accurately adjusting a polishing pressure, and a polishing method using the polishing system. Concretely, the surface to be polished of a wafer as the object to be polished is polished by relatively moving, along a plane, a polishing surface of the rotating polishing pad and the surface to be polished of the wafer in slide-contact with each other, and adjusting a pressing force applied from the polishing pad to the wafer in accordance with a polishing pressure previously set depending on a relative-positional relationship between the polishing surface of the polishing pad and the surface to be polished of the wafer.

Abstract: A method and apparatus for polishing hard discs uniformly while minimizing frictional electricity between the discs and polishing materials as well as preventing from frictionally heated deformation. A turntable for placing a disc thereon is freely rotatable without being connected to any motor or other driving force. A polishing material rotates horizontally and polishes the surface of the disc by contacting with the surface. The turntable relatively slides against the surface of the polishing material. A spindle of the polishing material is slightly inclined toward the center of the turntable from a vertical axis of the disc. The turntable is rotated in a direction opposite to the rotating direction of the disc. The rotation of the turntable is induced by the rotation of the polishing material transmitted by the friction between disc and turntable. The disc is substantially electrically connected to the ground during the polishing.

Abstract: A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted against the surface of the wafer. Thus, all abrasive grains on the grinding wheel can act on the whole surface of the wafer.

Abstract: A process for fabricating a semiconductor wafer and an apparatus for chamfering a semiconductor ingot are provided to precisely perform the chamfering together and reduce significantly the cutting and chamfering time. The semiconductor ingot 2 is rotated with respect to the central axis C while the circumferential surface 21 of the rotating ingot 2 is brought in contact with the uneven surface 11 of a grindstone 1. The circumferential surface of the ingot is chamfered in accordance with the uneven surface 11 of the grindstone 1. A wiresaw is used to cut the semiconductor ingot 2 to obtain the sliced wafers 3.

Abstract: An apparatus for loading, chamfering and unloading a ceramic or ceramic/polymer substrate for electronic components. An automatic part loader moves substrates in a row as a unit, using a frangible pin to push the parts. The part loader separates the first of the substrates from the rest, and a load pedestal pushes the first substrate up into a loading/unloading nest. The load pedestal is mounted on rods so that the substrate may move laterally to center itself in the nest. The nest then rotates to load the substrate onto a movable process pedestal. The chamfering apparatus includes a pair of spaced, rotatable cutting spindles for chamfering edges and corners on the substrate.