Combined Abrading Patents (Class 451/37)
  • Patent number: 10316218
    Abstract: The present invention provides aqueous CMP polishing compositions comprising a from 0.5 to 30 wt. %, based on the total weight of the composition of a dispersion of a plurality of elongated, bent or nodular silica particles which contain a cationic nitrogen atom, and from 0.001 to 0.5 wt. %, preferably from 10 to 500 ppm, of a cationic copolymer of a diallylamine salt having a cationic amine group, such as a diallylammonium halide, or a diallylalkylamine salt having a cationic amine group, such as a diallylalkylammonium salt, or mixtures of the copolymers, wherein the compositions have a pH of from 1 to 4.5. Preferably, the cationic copolymer of a diallylamine salt having a cationic amine group comprises a copolymer of diallylammonium chloride and sulfur dioxide and the copolymer of the diallylalkylamine salt having a cationic amine group comprises a copolymer of diallylmonomethylammonium halide, e.g. chloride, and sulfur dioxide.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: June 11, 2019
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Naresh Kumar Penta, Julia Kozhukh, David Mosley, Kancharla-Arun K. Reddy, Matthew Van Hanehem
  • Patent number: 9815178
    Abstract: A working chamber system for the surface treatment of workpieces comprises at least one tightly closable work chamber (101), a frame-like workpiece holder (10, 20, 30) which is displaceable on a guide rail between a mounting position outside the work chamber (101) and a working position in the work chamber (101), and a manipulator which, as seen in plan view, is arranged next to a group of parallel guide rails within the work chamber (101). At least one of the workpiece holders (10, 20, 30) has an external frame (11, 21, 31), via which it is guided in the guide rails, and an internal frame (12, 22, 32) which is surrounded by the external frame (11, 21, 31) in a transporting position and which is displaceable into a position outside the main plane of the external frame (11, 21, 31) in the mounting position and/or the working position.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: November 14, 2017
    Assignee: WHEELABRATOR GROUP GMBH
    Inventor: Bernhard Busskamp
  • Patent number: 9556363
    Abstract: A chemical-mechanical polishing composition includes colloidal silica abrasive particles having a chemical compound incorporated therein. The chemical compound may include a nitrogen-containing compound such as an aminosilane or a phosphorus-containing compound. Methods for employing such compositions include applying the composition to a semiconductor substrate to remove at least a portion of at least one of a copper, a copper barrier, and a dielectric layer.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: January 31, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Lin Fu, Steven Grumbine, Jeffrey Dysard, Wei Weng, Lei Liu, Alexei Leonov
  • Patent number: 9321143
    Abstract: A head structure for a lapping assembly including a lapping control feature is disclosed. The lapping control feature includes a raised contact surface elevated from a front surface of the head structure of the lapping assembly. A relative position of the workpiece and raised contact surface are aligned to control workpiece thickness and other lapping parameters. In illustrated embodiments, the relative position of the workpiece and raised contact surface are aligned via an adjustment mechanism on the head structure. In illustrated embodiments, the adjustment mechanism is configured to adjust a position of the workpiece relative to the raised contact surface.
    Type: Grant
    Filed: October 8, 2013
    Date of Patent: April 26, 2016
    Assignee: Seagate Technology LLC
    Inventors: Marc Perry Ronshaugen, Gordon Merle Jones, Robert Edward Chapin
  • Patent number: 9222172
    Abstract: Methods and apparatus relating to aluminum nitride baffles are provided herein. In some embodiments, a baffle for use in semiconductor process chambers may include a body comprising aluminum nitride and a metal oxide binding agent, wherein a ratio of aluminum nitride to metal oxide on a surface of the body is greater than or equal to the ratio within the body. In some embodiments, the body may have a center stem and an outer annulus coupled to and extending radially outwards from a lower portion of the center stem. In some embodiments, a method of fabricating a baffle may include sintering aluminum, nitrogen, and a metal oxide binding agent to form a body of the baffle, the body having excess metal oxide binding agent disposed on a surface thereof; and removing a bulk of the excess metal oxide binding agent from a surface of the body.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: December 29, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Muhammad M. Rasheed, Dmitry Lubomirsky
  • Patent number: 9039485
    Abstract: The method for machining a series of workpieces (21) via at least one machining jet includes the following steps: each workpiece (21) is associated with an identifier for uniquely identifying the workpiece, during the machining of a respective workpiece, the temporal characteristic of the machining jet is detected by at least one sensor (30), the detected temporal characteristic is evaluated so as to obtain at least one comparative value, and for detecting incorrect machining, the at least one comparative value is compared with at least one threshold value.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: May 26, 2015
    Assignee: MICROMACHINING AG
    Inventor: Walter Maurer
  • Patent number: 9022834
    Abstract: The polishing solution for CMP according to the invention comprises abrasive grains, an additive and water, and the polishing solution comprises an organic compound satisfying specified conditions as the additive. The polishing method of the invention is for polishing of a substrate having a silicon oxide film on the surface, and the polishing method comprises a step of polishing the silicon oxide film with a polishing pad while supplying the polishing solution for CMP between the silicon oxide film and the polishing pad.
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: May 5, 2015
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Eiichi Satou, Munehiro Oota, Kanshi Chinone, Shigeru Nobe, Kazuhiro Enomoto, Tadahiro Kimura, Masato Fukasawa, Masanobu Habiro, Yousuke Hoshi
  • Patent number: 8991042
    Abstract: A method for fabricating a semiconductor device includes (a) depositing an insulating film on a semiconductor substrate; (b) forming a recess in the insulating film; (c) depositing a conductive film on the insulating film while filling the recess with the conductive film; and (d) polishing the conductive film. Step (d) includes a first polishing substep of using a first polisher pad conditioned with a first dresser and a second polishing substep of using a second polisher pad conditioned with a second dresser different from the first dresser.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: March 31, 2015
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Manabu Sakamoto, Tetsuya Shirasu, Naoki Idani
  • Patent number: 8986070
    Abstract: A method for trimming two working layers including bonded abrasive applied on mutually facing sides of an upper and a lower working disk of a grinding apparatus configured for simultaneous double-side processing of flat workpiece includes providing at least one trimming apparatus including a trimming disk, a plurality of trimming bodies and an outer toothing. The upper and lower working disks are rotated. The trimming apparatus is moved between the rotating working disks using a rolling apparatus and the outer toothing on cycloidal paths relative to working layers of the working disks. The working layers and the trimming body are brought into contact so as to release abrasive substances from the trimming bodies and so as to effect material removal from the working layers. The direction of the drives of the grinding apparatus is changed at least twice during trimming.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: March 24, 2015
    Assignee: Siltronic AG
    Inventors: Georg Pietsch, Michael Kerstan
  • Patent number: 8974268
    Abstract: A method of preparing an edge-strengthened article comprises polishing of an edge of an article having a first edge strength using magnetorheological finishing, wherein after the polishing the article has a second edge strength and the second edge strength is greater than the first edge strength.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: March 10, 2015
    Assignee: Corning Incorporated
    Inventors: Charles Michael Darcangelo, Steven Edward DeMartino, Joseph Fabian Ellison, Richard A Nasca, Aric Bruce Shorey, David Alan Tammaro, John Christopher Thomas
  • Patent number: 8966939
    Abstract: Disclosed is a method of producing a glass substrate for an information recording medium including a rough polishing step of performing a rough polishing on a glass material containing 0.01 to 2 mass % of cerium oxide; a washing step of washing the glass material after the rough polishing step, so that the cerium content of the glass material surface becomes 0.125 ng/cm2 or less; and a precision polishing step of performing precision polishing on the glass material after the washing step by cyclically using a polishing material containing colloidal silica.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: March 3, 2015
    Assignee: Hoya Corporation
    Inventor: Hazuki Nakae
  • Patent number: 8915769
    Abstract: A method of manufacturing a tubular structure is implemented by housing a tubular base, which has a side circumference surface formed in a bellows-like shape, in a polishing container, causing magnetic particles to flow along a circumferential direction of the tubular base due to action of magnetic poles, and supplying abrasive particles to the polishing container so that the abrasive particles flow along an axial direction of the tubular base, thereby polishing a surface of the tubular base. The method includes: a first polishing step of polishing an exposed surface of the tubular base by causing the magnetic particles and the abrasive particles to flow while an inner surface of the tubular base remains covered; and a second polishing step of polishing an exposed surface of the tubular base by causing the magnetic particles and the abrasive particles to flow while an outer surface of the tubular base remains covered.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: December 23, 2014
    Assignees: Clino Corporation, Kyoei Denko Co., Ltd.
    Inventors: Kazutaka Kamikihara, Kiyoshi Yamauchi, Katsuhiko Komatsu, Shinyou Tanaka
  • Patent number: 8911281
    Abstract: A method for trimming two working layers including bonded abrasive applied on mutually facing sides of an upper and a lower working disk of a grinding apparatus configured for simultaneous double-side processing of flat workpiece includes providing the grinding apparatus including the upper and lower working disks and providing at least one carrier including an outer toothing. The upper and lower working disks are rotated. The carrier is moved between the rotating working disks using a rolling apparatus and the outer toothing on cycloidal paths relative to working layers of the working disks. Loose abrasives are added to a working gap formed between the working layers. A carrier, without workpieces inserted therein, is moved in the working gap so as to effect material removal from the working layers.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: December 16, 2014
    Assignee: Siltronic AG
    Inventors: Georg Pietsch, Michael Kerstan
  • Publication number: 20140345087
    Abstract: An easily installable and preferably antimicrobial cover trim for a push bar of an exit device for a door, as well as a method for increasing fingerprint resistance of metal touch surfaces.
    Type: Application
    Filed: April 23, 2014
    Publication date: November 27, 2014
    Applicant: Triangle Brass Manufacturing Company, Inc.
    Inventors: Martin S. Simon, Reed C. Baumgarten, Vicente Delgadillo
  • Publication number: 20140295209
    Abstract: This invention makes it possible to impart bioactivity to a variety of materials by sandblasting to form pores in the surface thereof.
    Type: Application
    Filed: October 16, 2012
    Publication date: October 2, 2014
    Applicant: Kyoto University
    Inventors: Takeshi Yao, Takeshi Yabutsuka
  • Patent number: 8834230
    Abstract: The present invention is a wafer polishing method including simultaneously polishing both surfaces of a wafer by pressing and rubbing the wafer, while holding the wafer with: a lower turn table having a flat polishing-upper-surface rotationally driven; an upper turn table having a flat polishing-lower-surface rotationally driven, the upper turn table being arranged with facing to the lower turn table; and a carrier having a wafer-holding hole for holding the wafer, wherein the polishing is performed while measuring a thickness of the wafer through a plurality of openings provided between a rotation center and an edge of the upper turn table or the lower turn table, and switching a polishing slurry with a polishing slurry having a different polishing rate during the polishing of the wafer. As a result, there is provided a wafer polishing method that can manufacture a wafer having a high flatness and a high smoothness at high productivity and high yield.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: September 16, 2014
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Daisuke Furukawa, Kazumasa Asai, Takahiro Kida, Tadao Tanaka
  • Patent number: 8827769
    Abstract: There is provided a method of producing a substrate for magnetic recording media which is capable of efficiently removing alumina abrasive grains in the latter polishing step that have been stuck in the former polishing step during polishing of the substrate for magnetic recording media in which a NiP plating film has been formed on the surface of an Al alloy substrate, the method including: a rough polishing step for polishing the surface of a substrate for magnetic recording media, which is prepared by forming a NiP plating film on the surface of an Al alloy substrate, using a first grinder while supplying a polishing liquid containing alumina abrasive grains; and a finish polishing step for polishing the substrate for magnetic recording media following washing, using a second grinder while supplying a polishing liquid containing colloidal silica abrasive grains, wherein supply of the polishing liquid containing alumina abrasive grains is stopped and alumina abrasive grains are removed from the grinder b
    Type: Grant
    Filed: August 15, 2011
    Date of Patent: September 9, 2014
    Assignee: Showa Denko K.K.
    Inventors: Yasuyuki Nakanishi, Hidenori Inada, Katsuhiro Yoshimura
  • Patent number: 8827771
    Abstract: There is provided a polishing composition, containing abrasive grains and an acid represented either by R2—R1—SO3H (wherein R1 is a linear alkylene or hydroxyalkylene group having 1 to 4 carbon atoms, and R2 is a hydroxy group, a carboxy group, or a sulfonic acid group when R1 is the linear alkylene group, or R2 is a carboxy group or a hydroxymethyl group when R1 is the linear hydroxyalkylene group), or by C6H5—R3 (wherein R3 is a sulfonic acid group or a phosphonic acid group). The acid contained in the polishing composition is preferably isethionic acid or benzenesulfonic acid. The polishing composition is mainly used in the application of polishing silicon oxide materials including glass substrates for hard disks, synthetic quartz substrates for photomasks, and low-dielectric-constant films such as silicon dioxide films, BPSG films, PSG films, FSG films, and organosiloxane films of semiconductor devices.
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: September 9, 2014
    Assignee: Fujimi Incorporated
    Inventors: Taira Otsu, Keigo Ohashi
  • Patent number: 8696823
    Abstract: Methods for abrasive cleaning, deburring, providing barrier coatings and sealing leaks in existing pipes, in a single operation, in one pass by intermittent bursts of dry particulates forced and pulled by air throughout the piping system by a generator and a vacuum. Cleaning includes intermittently injecting bursts of abrasive particles into the pressurized gas into the piping system for cleaning pipe interior walls, reducing burrs and interior lips in the pipe interior walls and generating a vacuum suction in the piping system to remove abrasive particles and debris.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: April 15, 2014
    Assignee: Pipe Restoration Technologies, LLC
    Inventors: Larry Gillanders, Steve Williams, John Laborde
  • Patent number: 8647173
    Abstract: A method of polishing a semiconductor wafer using a holding system including a lined cutout the size of the semiconductor wafer that is fixed to a carrier. The method includes holding the semiconductor wafer in the cutout through adhesion of a first side of the semiconductor wafer to a bearing surface in the cutout and polishing a second side of the held semiconductor wafer using a polishing pad that is fixed on a polishing plate while introducing a polishing agent between the second side of the semiconductor wafer and the polishing pad, the polishing pad including fixedly bonded abrasive materials. The carrier is guided during polishing such that a portion of the second side of the semiconductor wafer temporarily projects beyond a lateral edge of a surface of the polishing pad.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: February 11, 2014
    Assignee: Siltronic AG
    Inventors: Juergen Schwandner, Thomas Buschhardt, Roland Koppert
  • Publication number: 20130337724
    Abstract: A transdermal intraosseous device includes a transdermal adapter for an external prosthetic device for a bone of a patient and a bone fixator including a distal portion coupled to the transdermal adapter and a proximal portion for anchoring into the bone. The transdermal adapter includes a dome-shaped portion for transcutaneous implantation and an external shaft extending from the dome-shaped portion. A dermal transition structure is configured to include a controlled roughness gradient from the external shaft to the dome-shaped portion and configured for use in infection control at a dermis layer of the patient.
    Type: Application
    Filed: August 19, 2013
    Publication date: December 19, 2013
    Applicant: BIOMET MANUFACTURING, LLC
    Inventors: Joshua R. PORTER, Troy W. HERSHBERGER
  • Patent number: 8550877
    Abstract: A method includes: charging a polishing material into a polishing apparatus that polishes a surface of a cylindrical film including a resin; alternately and repeatedly performing a surface-roughening operation of causing the polishing material to collide with the surface of the cylindrical film, thereby roughening the surface, and a cylindrical film replacing operation of replacing the cylindrical film on which roughening of the surface has been completed with another cylindrical film on which roughening of the surface has not been completed; replacing the polishing material by partially discharging the polishing material, and charging a new polishing material so that the percentage of the new polishing material with respect to the total amount of the polishing material after the new polishing material is charged becomes 30% by weight or more; and alternately and repeatedly performing the surface-roughening operation and the cylindrical film replacing operation again.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: October 8, 2013
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hiroshi Shibuya, Yoshitake Ogura, Masato Saito
  • Publication number: 20130255418
    Abstract: In forming an actuator, a large end surface of a tapered roller of a tapered roller bearing is shot with minute particles of silicon carbide having a diameter of 0.5 to 100 ?m and having an angle formed by crushing, and such a surface is scraped concavely at a diameter within a range from 0.5 to 100 ?m to form a large number of concavities having a depth of equal to or greater than 1 ?m at a pitch of equal to or less than 200 ?m. The concavities are non-continuous and isolated from each other, and serve as a lubricant puddle. The concavities are formed by scraping and not by plastic deformation, and thus the surface is not hardened.
    Type: Application
    Filed: November 14, 2011
    Publication date: October 3, 2013
    Applicant: NSK Ltd
    Inventors: Masato Kobayashi, Tomoharu Saito, Shinji Fujita, Takanori Tanaka
  • Publication number: 20130225050
    Abstract: An apparatus for lapping a portion of an exterior surface of a housing is described. The apparatus includes at least a lapping tool arranged to execute a lapping operation. The lapping tool takes the form of a lapping pad which includes a conduit through which slurry can be transported for local deposition on the housing during a lapping operation. The apparatus also includes a stage on which a workpiece in the form of a housing is mounted. During the lapping operation, slurry is passed through the slurry conduit in the lapping tool, the lapping tool and the housing are moved in various motions. In this way, a gradual transition region is created between an accessory region and the remainder of the housing.
    Type: Application
    Filed: September 12, 2012
    Publication date: August 29, 2013
    Applicant: Apple Inc.
    Inventors: Collin Chan, Brian Miehm, Simon Lancaster-Larocque, Ryan M. Satcher
  • Patent number: 8517795
    Abstract: A surface-treating process and a forming process in which an inner surface of a vacuum member is mechanically polished in the presence of a liquid medium including no hydrogen atom.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: August 27, 2013
    Assignee: Nomura Plating Co., Ltd.
    Inventors: Kenji Saito, Tamao Higuchi
  • Patent number: 8512102
    Abstract: A sandblasting apparatus includes a chamber defining a cavity, a support assembly received in the cavity, a first and a second sandblasting assemblies. The support assembly includes a number of pairs of elongated support plates for holding a plate-shaped workpiece therebetween. The support plates are moveable along a vertical direction and a first horizontal direction. The first sandblasting assembly is configured for spraying sand downwardly toward the plate-shaped workpiece so as to cut the plate-shaped workpiece into a number of workpiece strips. The second sandblasting assembly is configured for spraying sand toward the workpiece strips along a second horizontal direction perpendicular to the first horizontal direction so as to cut the workpiece strips into workpiece blocks.
    Type: Grant
    Filed: November 25, 2010
    Date of Patent: August 20, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Shao-Kai Pei
  • Patent number: 8500516
    Abstract: A method for polishing a semiconductor wafer having a first side and a second side, the method includes polishing the first side using a Fixed Abrasive Polishing (FAP) with a polishing pad including fixedly bonded abrasives having an average particle size of 0.1-1.0 ?m; applying a cement layer with a thickness of at most 3 ?m to the polished first side; fixing the polished and cemented first side on a carrier plate of a polishing machine; and polishing the second side using a single-side chemical mechanical polishing.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: August 6, 2013
    Assignee: Siltronic AG
    Inventor: Juergen Schwandner
  • Patent number: 8500517
    Abstract: A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 6, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daijitsu Harada, Masaki Takeuchi
  • Patent number: 8469774
    Abstract: The present invention relates to a surface treating method for making an amorphous alloy component. The surface treatment method includes the following steps: an amorphous alloy sheet is provided; the amorphous alloy sheet is fixed into a dry blast machine; and the surface of the amorphous alloy sheet is treated by sandblasting. In the sandblasting step, air pressure is controlled to be in a range from about 1.5 gf/cm2 to 6.0 kgf/cm2 and blasting time is in a range from about 1 second to 60 seconds; the sand used in sandblasting is preferably selected from a group consisting of aluminium oxide, zirconium dioxide and silicon dioxide, and a grain size of the sand is in a range from about 100 ?m to 250 ?m.
    Type: Grant
    Filed: May 10, 2011
    Date of Patent: June 25, 2013
    Assignees: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventors: Yang-Yong Li, Yi-Min Jiang
  • Patent number: 8460065
    Abstract: A sandblasting apparatus for cutting a plate-shaped workpiece into a plurality of separate tablets includes a chamber defining a cavity, a support assembly received in the cavity, a sandblasting assembly for spraying sand toward the workpiece, a first mask located between the sandblasting assembly and the support assembly, a second mask located between the sandblasting assembly and the support assembly, and a mask switching member for selectively placing the first mask or the second mask over the workpiece. The support assembly is configured for supporting the workpiece and the tablets. The first mask cooperates with the sandblasting assembly to remove unwanted portions of the workpiece thus obtaining a tablet network consisting of a plurality of tablets and a plurality of connecting portions interconnected between the tablets. The second mask cooperates with the sandblasting assembly to remove the connecting portions of the tablet network thus obtaining a plurality of separated tablets.
    Type: Grant
    Filed: December 14, 2010
    Date of Patent: June 11, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Shao-Kai Pei
  • Publication number: 20130122786
    Abstract: Provided are a rinsing agent to produce a hard disk substrate free from remaining abrasive grains as well as a pit defect on the surface thereof and a method for production of a hard disk substrate using such a rinsing agent. A rinsing agent of the present invention is rinsing solution containing colloidal silica as abrasive grains. Letting that the colloidal silica abrasive grains have a concentration C and an average grain size R (C and R are represented in weight % and nm, respectively), the concentration C and the average grain size R of the colloidal silica abrasive grains have a relation matching the following Expression (1): 12.2C+18.2 (1).
    Type: Application
    Filed: July 19, 2011
    Publication date: May 16, 2013
    Applicants: KOHAN KOGYO CO., LTD., TOYO KOHAN CO., LTD.
    Inventors: Nobuhiro Iwamoto, Nobuaki Mukai, Kazutaka Arai, Ryuji Kotani
  • Patent number: 8407882
    Abstract: According to one embodiment, a method for manufacturing a thin film magnetic head includes forming on a substrate magnetic head portions having a magnetoresistive element and resistance detection elements for measuring an amount of polishing; slicing the substrate to form at least one row bar; polishing the ABS of each row bar; forming rails on the polished ABS; and cutting each row bar to separate each magnetic head portion. The step of polishing the ABS includes measuring a resistance of each resistance detection element and a resistance of each magnetoresistive element; calculating an offset value between the resistance detection element and the magnetoresistive element; and calculating a final resistance of the resistance detection element by using the calculated offset value. When the resistance of the resistance detection element reaches the final resistance, polishing of the ABS of the row bar is terminated. Other methods are presented as well.
    Type: Grant
    Filed: September 14, 2009
    Date of Patent: April 2, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Takateru Seki, Zhou Wenjun, Kazuo Takeda, Takefumi Kubota
  • Publication number: 20130029099
    Abstract: Disclosed is a method of producing a glass substrate for an information recording medium including a rough polishing step of performing a rough polishing on a glass material containing 0.01 to 2 mass % of cerium oxide; a washing step of washing the glass material after the rough polishing step, so that the cerium content of the glass material surface becomes 0.125 ng/cm2 or less; and a precision polishing step of performing precision polishing on the glass material after the washing step by cyclically using a polishing material containing colloidal silica.
    Type: Application
    Filed: March 10, 2010
    Publication date: January 31, 2013
    Inventor: Hazuki Nakae
  • Patent number: 8328602
    Abstract: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2?Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: December 11, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiko Tamura, Toru Momose, Katsuaki Miyatani, Tetsuya Nakashima
  • Publication number: 20120304451
    Abstract: A method for surface treating a golf club head, includes: (a) forming a depression unit in the golf club head, the depression unit being indented inwardly from an outer surface of the golf club head, the outer surface being divided into a working area and a non-working area, the depression unit being formed in the working area; (b) filling the depression unit with a shielding material and covering the non-working area with a covering material; and (c) sandblasting the golf club head after step (b) and removing subsequently the shielding material from the depression unit and the covering material from the non-working area so as to form the working area into sandblasted and non-sandblasted regions that differ in gloss intensity.
    Type: Application
    Filed: August 13, 2012
    Publication date: December 6, 2012
    Applicant: SRI SPORTS LIMITED
    Inventors: Sharon J. PARK, Daniel J. STONE, Chih-Lung LIU, Chin-Chun TSENG, Jiann-Hsing CHUANG
  • Patent number: 8314028
    Abstract: In a slurry composition and a method of polishing a layer using the slurry composition, the slurry composition includes from about 3 to 20 percent by weight of an abrasive, from about 0.1 to 3 percent by weight of an ionic surfactant, from about 0.01 to 0.1 percent by weight of a nonionic surfactant, from about 0.01 to 1 percent by weight of a polish accelerating agent including an amino acid compound, and a remainder of an aqueous solution including a basic pH-controlling agent and water. The slurry composition including the nonionic surfactant and the polish accelerating agent may be used for speedily polishing a stepped upper portion of a silicon oxide layer, and may also enable a lower portion of the silicon oxide layer to function as a polish stop layer.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: November 20, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gi-Sik Hong, Dong-Jun Lee, Nam-Soo Kim, Kyoung-Moon Kang
  • Patent number: 8292698
    Abstract: An on-line method of cleaning contaminants from at least one interior surface in plasma chambers comprises blasting one or more interior surfaces of a plasma chamber with dry ice to remove contaminants from the one or more surfaces.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: October 23, 2012
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Oana M. Leonte, John E. Daugherty, Tuochuan Huang, Gregory J. Goldspring, Michael C. May
  • Publication number: 20120244388
    Abstract: A process for producing a glass substrate for information recording media, comprising lapping a glass disk made of low alkali aluminosilicate glass that contains no alkali metal oxide or contains alkali metal oxides in a total amount of less than 4 mol %, and subsequently polishing the glass disk by using a slurry that contains cerium oxide abrasives, characterized by cleaning the glass disk by using a cleaning liquid that contains sulfuric acid at a concentration of from 20 mass % to 80 mass % and hydrogen peroxide at a concentration of from 0.5 mass % to 10 mass % at a liquid temperature of from 50° C. to 100° C., and thereafter polishing the main surface of the glass disk, by using a slurry that contains colloidal silica abrasives.
    Type: Application
    Filed: June 6, 2012
    Publication date: September 27, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Tetsuya NAKASHIMA, Katsuaki Miyatani
  • Patent number: 8257146
    Abstract: A process for surface preparation of parts to be coated using Thermal Spray or Cold Spray technologies, which is the result of a step in which the relevant surface is abraded by steel-based abrasive material, and later washing off of any residue thereof.
    Type: Grant
    Filed: November 12, 2007
    Date of Patent: September 4, 2012
    Assignee: Turbocoating S.p.A.
    Inventors: Nelso Antolotti, Andrea Scrivani, Gabriele Rizzi, Dario Russo
  • Patent number: 8251777
    Abstract: The invention is directed to a method of polishing a surface of an object that includes aluminum. The method includes the step of contacting the surface of the object with a soft polishing pad and a polishing composition. The polishing composition includes abrasive particles, an agent that oxidizes aluminum, and a liquid carrier to polish the surface of the object. The polishing composition includes the abrasive particles suspended in the liquid carrier, and is applied at a pH above about 7.
    Type: Grant
    Filed: February 11, 2008
    Date of Patent: August 28, 2012
    Assignee: Cabot Microelectronics Corporation
    Inventors: Kevin Moeggenborg, John Clark, Jeffrey Gilliland, Stanley Lesiak, Susan Wilson, Vlasta Brusic
  • Patent number: 8235769
    Abstract: To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process.
    Type: Grant
    Filed: August 3, 2006
    Date of Patent: August 7, 2012
    Assignees: JTEC Corporation
    Inventor: Yuzo Mori
  • Publication number: 20120196033
    Abstract: A method of manufacturing a glass substrate for a magnetic disk includes a polishing step of polishing a main surface of a glass substrate by sandwiching the glass substrate between a pair of surface plates each having a polishing pad on its surface and by supplying a polishing liquid containing polishing abrasive particles between the glass substrate and the polishing pads. In the polishing step, the polishing liquid and each polishing pad are adjusted so that the friction coefficient falls in a range of 0.02 to 0.05.
    Type: Application
    Filed: January 26, 2012
    Publication date: August 2, 2012
    Applicant: HOYA CORPORATION
    Inventors: Hideo SAKAI, Yoshihiro TAWARA
  • Patent number: 8225486
    Abstract: In a manufacturing process of a head slider, a plurality of head elements are formed on a wafer, each head element comprising: a return pole, a coil, and a main pole. The wafer is cut into respective head elements so that individual head sliders are formed. A ratio of an amplitude of an electrical signal applied to the coil of the write head on the head slider to an amplitude of output from an independent magnetic field sensor not embedded in the head slider is calculated, where the independent magnetic field sensor is disposed near the main pole so as to be opposed to the main pole across the air bearing surface, and where the ratio is calculated while a displacement between the main pole and the magnetic field sensor is swept. A flare point height of the main pole is determined from the calculated amplitude ratio.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: July 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Toshio Takahashi, Akihiro Namba, Masafumi Mochizuki
  • Publication number: 20120184184
    Abstract: The invention relates to a tool for machining hard materials such as metal-matrix or organic-matrix composite materials, comprising a cylindrical sonotrode (22) connected, along the axis (A) of said cylinder, to an assembly vibrating at a predetermined ultrasonic frequency and rotated about said axis, and at least one nozzle (3), on the surface to be machined and at the terminal end (24) of the sonotrode, for ejecting a liquid in which abrasive particles are suspended, said particles being vibrated at said ultrasonic frequency by the sonotrode so as to form a drilling head along the axis (A) of the cylinder, characterized in that the circumference (23) of the sonotrode is covered with particles of a so-called superhard material in order to form a milling head capable of moving in a plane that is substantially perpendicular to said vibratory axis (A).
    Type: Application
    Filed: August 12, 2010
    Publication date: July 19, 2012
    Applicant: SNECMA
    Inventors: Christophe Gerard, Regis Grosbois, Damien Hebuterne, Alexis Perez-Duarte
  • Patent number: 8167685
    Abstract: A method of manufacturing a perpendicular magnetic recording medium and a substrate for the medium are disclosed, in which abnormal protrusions on an underlayer made of a Ni—P alloy are automatically eliminated while maintaining a flat surface with high accuracy on the underlayer, and appropriate texture traces remain to promote magnetization alignment in the vertical direction in a perpendicular magnetic recording medium without adversely affecting the magnetization alignment. In the method, texture processing is carried out on an underlayer made of a Ni—P alloy on a nonmagnetic base plate using a polishing tape while supplying mixed slurry of a surfactant and abrasive grains of polycrystalline diamond, and then, texture polishing is carried out on the underlayer processed by the texture processing, using a polishing tape while supplying slurry containing an abrasive material and an organic acid until the surface of the underlayer is polished to an arithmetic mean roughness Ra of at most 0.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: May 1, 2012
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Shoji Sakaguchi, Hiroyuki Nakamura, Hideki Matsuo
  • Patent number: 8161627
    Abstract: A method in one embodiment includes forming an electric lapping guide layer; forming a write pole; forming a first gap layer over the write pole; masking a portion of the first gap layer for defining a window over the write pole and at least a portion of the electric lapping guide layer; and forming a bump over the write pole in the window. Additional methods and systems are presented.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: April 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian Rene Bonhote, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 8147295
    Abstract: A silicon wafer is polished by applying a polishing solution substantially containing no abrasive grain onto a surface of a polishing pad having a given fixed grain bonded abrasive and then relatively sliding the polishing pad to a silicon wafer to polish the surface of the silicon wafer, wherein a hydroplane layer is formed by the polishing solution supplied between the surface of the silicon wafer and the surface of the polishing pad and a thickness of the hydroplane layer is controlled to change a polishing state of the surface of the silicon wafer.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: April 3, 2012
    Assignee: Sumco Corporation
    Inventors: Takeo Katoh, Ryuichi Tanimoto, Shinichi Ogata, Takeru Takushima, Kazushige Takaishi
  • Patent number: 8142259
    Abstract: A grinding machine includes a holding table adapted to hold a workpiece, a grinding unit operative to grind the workpiece held on the holding piece, and a grinding unit transfer mechanism operative to shift the grinding unit in a direction coming close to or moving away from the workpiece. The grinding unit includes a porous pad having fine pores opposed to the workpiece, a gel-like slurry storing portion provided on the porous pad so as to store a gel-like slurry therein, and a water supply unit to supply water between the porous pad and the workpiece. The porous pad contains relatively larger superabrasives at least at an outer circumferential portion. The fine pores of the porous pad have a diameter greater than that of relatively small superabrasives contained in the gel-like slurry.
    Type: Grant
    Filed: April 13, 2009
    Date of Patent: March 27, 2012
    Assignee: Disco Corporation
    Inventor: Kazuhisa Arai
  • Patent number: 8074331
    Abstract: An apparatus and method of removing scale from the surfaces of processed sheet metal and tubular metal employs a scale removing medium propelled by counter-rotating pairs of wheels positioned in close proximity to the metal surfaces.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: December 13, 2011
    Assignee: The Material Works, Ltd.
    Inventor: Kevin C. Voges
  • Patent number: 8070559
    Abstract: A method of surface grinding a Zr-rich bulk amorphous alloy article includes providing a substrate; providing a first surface grinder for rough surface grinding; and providing a second surface grinder for finish surface grinding. During the rough surface grinding, the rotating speed is in the range from 20 r/min to 30 r/min, the grinding time period is from 3 minutes to 12 minutes, and the grinding pressure is from 1 kg/cm2 to 2 kg/cm2, and a first pump circularly conveys a first lubricant to a first rotating abrasive wheel. During the finish surface grinding, the rotating speed is in the range from 30 r/min to 40 r/min, the grinding time period is from 5 minutes to 7 minutes, and the grinding pressure is from 1 kg/cm2 to 2 kg/cm2, and a second pump circularly conveys a second lubricant to a second rotating abrasive wheel.
    Type: Grant
    Filed: August 11, 2010
    Date of Patent: December 6, 2011
    Assignees: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventors: Yang-Yong Li, Xiao-Bo Yuan, Yi-Min Jiang