Abstract: The present invention provides a thin sheet with suppressed strain. The sheet according to the present invention has a thickness from 0.1 to 5 mm and is formed of a plastic that contains at least one resin selected from polyamide resins, polycarbonate resins, cellulose acrylate resins, and acrylic resins. A difference between a maximum value and a minimum value of retardation of the sheet is 3000 nm or less. The sheet according to the present invention can be obtained, for example, by subjecting a plastic containing at least one resin selected from polyamide resins, polycarbonate resins, cellulose acylate resins, and acrylic resins to extrusion molding to obtain a plastic in the form of a sheet, and subjecting the resulting plastic in the form of a sheet to vacuum forming, air-pressure forming, or vacuum air-pressure forming.

Abstract: In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin precursor composition onto a support. Depositing the plurality of composite layers further comprises dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.

Abstract: Embodiments herein generally relate to polishing pads and method of forming polishing pads. In one embodiment, a polishing pad having a polishing surface that is configured to polish a surface of a substrate is provided. The polishing pad includes a polishing layer. At least a portion of the polishing layer comprises a continuous phase of polishing material featuring a plurality of first regions having a first pore-feature density and a plurality of second regions having a second pore-feature density that is different from the first pore-feature density. The plurality of first regions are distributed in a pattern in an X-Y plane of the polishing pad in a side-by-side arrangement with the plurality of second regions and individual portions or ones of the plurality of first regions are interposed between individual portions or ones of the plurality of second regions.

Abstract: A method for laser carving of paint on an outer surface of a vehicle wheel includes a step of priming: priming an outer surface of the wheel to form a painted surface; a step of laser carving: carving the primer from a selected area of the wheel by laser to remove the painted surface from the selected area, the selected area having an exposed area with metallic luster, and a step of fine-polish: polishing the outer surface of the wheel to form a fine-polished area at the exposed area. The painted surface on the wheel can be quickly removed to disclose a selected area with metallic luster, while the wheel is prevented from corrosion so as to reduce manufacturing cost and increase precision.

Abstract: A polishing pad includes a pad layer and one or more polishing structures over an upper surface of the pad layer, where each of the one or more polishing structures has a pre-determined shape and is formed at a pre-determined location of the pad layer, where the one or more polishing structures comprise at least one continuous line shaped segment extending along the upper surface of the pad layer, where each of the one or more polishing structures is a homogeneous material.

Abstract: An abrasive article includes a first plurality of abrasive particles and a second plurality of abrasive particles. The first plurality of abrasive particles differ in at least one of a size, an average weight and a shape from the second plurality of abrasive particles. The first plurality of abrasive particles are spaced from the second plurality of abrasive particles by at least a minimum distance in the x-axis direction, and both the first plurality of abrasive particles and the second plurality of abrasive particles extend in similar paths to one another with respect to the y-axis.

Abstract: A coated abrasive disc includes a disc backing and an abrasive layer disposed thereon. The abrasive layer comprises abrasive elements secured to a major surface of the disc backing by at least one binder material. The abrasive elements are disposed at contiguous intersections of horizontal and vertical lines of a rectangular grid pattern. Each abrasive element has two triangular abrasive platelets, each having respective top and bottom surfaces connected to each other, and separated by, three sidewalls. On a respective basis, one sidewall of the triangular abrasive platelets is disposed facing and proximate to the disc backing. A first portion of the abrasive elements is arranged in alternating first rows wherein the triangular abrasive platelets are disposed lengthwise aligned with the vertical lines. A second portion of the abrasive elements is arranged in alternating second rows wherein the triangular abrasive platelets are disposed lengthwise aligned with the horizontal lines.

Abstract: A substrate cleaning apparatus configured to clean a surface of a substrate having a circular shape by bringing a cleaning member into contact with the surface of the substrate and rotating the substrate and the cleaning member relatively is provided. A contact region of the cleaning member which comes into contact with the surface of the substrate is widened in a radial shape from a center side of the substrate toward a peripheral side thereof.

Abstract: A polishing pad including a damping layer made of a resilient material including expanded semi-rigid polyurethane having a microcell structure, an adhesive layer including a layer of a hook-and-loop fastener adapted to interact and connect to a corresponding layer of the hook-and-loop fastener located at a bottom surface of the working element of the machine tool and a polishing layer including microfiber adapted for polishing a surface of a work piece. The polishing layer includes a fabric having a woven mesh of microfibers that define a back side of the polishing layer. The fabric serves as a barrier to the resilient material of the damping layer such that the resilient material does not reach an active side of the polishing layer comprising the microfibers when the damping layer, adhesive layer and polishing layer are combined, and such that the active side of the polishing layer is free of resilient material of the damping layer.

Abstract: An earth-boring tool having at least one cutting element with a multi-friction cutting face provides for the steering of formation cuttings as the cuttings slide across the cutting face. The multi-friction cutting element includes a diamond table bonded to a substrate of superabrasive material. The diamond table has a cutting face formed thereon with a cutting edge extending along a periphery of the cutting face. The cutting face has a first area having an average surface finish roughness less than an average surface finish roughness of a second area of the cutting face, the two areas separated by a boundary having a proximal end proximate a tool crown and a distal end remote from the tool crown.

Abstract: A polishing method and a polishing film are provided for automatically performing multi-stage batch polishing on an end surface of a workpiece. An end surface of a workpiece and a polishing plate are moved relative to each other while bringing the end surface of the workpiece into contact with a polishing film of the polishing plate. The end surface is moved in a circular motion with a diameter 2 R relative to the polishing film; the center of the circular motion is moved linearly by a distance S on the polishing film; the polishing film is provided with first, second, and third polishing surfaces; and the polishing film is further provided with cleaning surfaces between the polishing surfaces so that the range of the distance S in which one rotation in the circular motion crosses over different polishing surfaces is reduced, or does not cross over different polishing surfaces.

Abstract: Abrasive disk sheet articles having raised islands coated with abrasive have a flexible disk polymer backing. The top flat surfaces of the raised islands are coated with a liquid controlled-thickness slurry mixture of abrasive particles and a polymeric adhesive by use of a magnetic precision-thickness coating-control font sheet having individual open holes that are slightly smaller than the respective raised islands. The magnetic coater font sheet is placed in flat-surfaced contact with the raised island surfaces where each individual font sheet open hole is aligned with a respective island surface. A magnet placed on the non-island surface of the disk polymer backing urges the magnetic coater font sheet into conformal contact with the island surfaces. A squeegee device moved along the font sheet fills and level coats the island tops with a uniform-thickness abrasive slurry mixture. After coating, the font sheet is removed and the abrasive slurry is solidified.

Abstract: A personal-care applicator comprises at least one stem having a proximal end including a handle and a distal end opposite to the proximal end and at least one bristled component attached to the stem, wherein the bristled component comprises a carrier and a plurality of bristles ultrasonically welded to the carrier and outwardly extending therefrom according to a pre-determined pattern, wherein the elongated carrier and the at least first plurality of bristles comprise ultrasonically compatible materials, and wherein the bristles are ultrasonically bonded to the carrier through a direct ultrasonic bond between a surface of the carrier and a lengthwise portion of each of the bristles. Process comprises providing at least one elongated stem having a proximal end and a distal end, providing the at least one bristled component, and attaching the at least one bristled component to the at least first stem.

Abstract: An abrasive article includes a plurality of abrasive particles and the rotational orientation of at least a portion of the abrasive particles about the z-axis varies randomly within a defined range, and the spacing of the abrasive particles along the y-axis varies randomly.

Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

Abstract: A fixed abrasive article having a body including abrasive particles contained within a bond material, the abrasive particles including shaped abrasive particles or elongated abrasive particles having an aspect ratio of length:width of at least 1.1:1, each of the shaped abrasive particles or elongated abrasive particles having a predetermined position or a predetermined three-axis orientation.

Abstract: An abrasive article includes a body having an annular surface including abrasive segments coupled to the annular surface, and the abrasive segments define an abrasive annular region and a percent abrasive surface area of not greater than 24% for the total surface area of the abrasive annular region.

Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

Abstract: Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.

Abstract: An abrasive pad used to abrade the surfaces of glass, ceramic, and metal materials, the abrasive pad being provided with a substrate layer, and an abrasive layer provided on a first surface side of the substrate layer and including an abrasive material, and the abrasive layer having a plurality of base portions arranged mutually separated on the substrate layer, columnar or frustum shaped tip portions arranged mutually separated on the base portions, and a group of grooves containing a plurality of groove portions provided between base portions such that the substrate layer is exposed, with each of the grooves mutually intersecting.

Abstract: Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.

Abstract: CMP pads having novel groove configurations are described. For example, described herein are CMP pads comprising primary grooves, secondary grooves, a groove pattern center, and an optional terminal groove. The CMP pads may be made from polyurethane or poly (urethane-urea), and the grooves produced therein may be made by a method from the group consisting of molding, laser writing, water jet cutting, 3-D printing, thermoforming, vacuum forming, micro-contact printing, hot stamping, and mixtures thereof.

Abstract: Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a coating pattern characterized by a pattern of discrete islands, or features, having an areal density ranging from about 30 features to about 300 features per square centimeter and an average feature diameter ranging from about 0.1 millimeters to about 1.5 millimeters. Optionally, the provided abrasive particles have an average abrasive particle size ranging from about 20 micrometers to about 250 micrometers and the average make layer thickness ranging from 33 percent to 100 percent of the average abrasive particle size. This coating pattern provides that all three components are generally in registration with each other, while also providing a pervasive uncoated area extending across the backing, thereby providing improved cut and finish performance while displaying a resistance to curl in wet environments.

Abstract: A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of layers of the polymer matrix is successively deposited with a 3D printer, each layer of the plurality of layers of polymer matrix being deposited by ejecting a polymer matrix precursor from a nozzle. A plurality of layers of the particles is successively deposited according to the desired distribution with the 3D printer. The polymer matrix precursor is solidified into a polymer matrix having the particles embedded in the desired distribution.

Abstract: A polishing article has a polishing surface and an aperture, the aperture including a first section and a second section. The polishing article includes a projection extending inwardly into the aperture. The polishing article includes a lower portion on a side of the first surface farther from the polishing surface. A window has a first portion positioned in the first section of the aperture and a second portion extending into the second section of the aperture. The window has a second surface substantially parallel to the polishing surface. A first adhesive adheres the first surface of the projection to the second surface of the window to secure the window to the projection and a second adhesive of different material composition than the first adhesive. The second adhesive is positioned laterally between the second portion of the window and the lower portion of the polishing article.

Abstract: The invention provides a polishing pad and a method of using the polishing pad for chemically-mechanically polishing a substrate. The polishing pad comprises at least a grooved region and an exclusion region, wherein the exclusion region is adjacent to the circumference of the polishing pad, and wherein the exclusion region is devoid of grooves.

Abstract: Disclosed herein is sandpaper that includes a first plurality of particles having a first grain size, the first plurality of particles having a first sanding surface covering a first area of the sandpaper. The sandpaper includes a second plurality of particles having a second grain size that is smaller than the first grain size, the second plurality of particles having a second sanding surface covering a second area of the sandpaper. Further, the sandpaper includes a bonding layer having a back surface located opposite the first sanding surface and second sanding surface and a buffer positioned to raise the second plurality of particles such that the first sanding surface and the second sanding surface of the sandpaper are substantially planar.

Abstract: The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior themo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads.

Abstract: Low density polishing pads and methods of fabricating low density polishing pads are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a density of less than 0.5 g/cc and composed of a thermoset polyurethane material. A plurality of closed cell pores is dispersed in the thermoset polyurethane material.

Abstract: An abrasive article having a plurality of abrasive areas arranged in a non-uniform distribution pattern, wherein the pattern is spiral or phyllotactic, such as a spiral lattice, and in particular those patterns described by the Vogel model, such as a sunflower pattern.

Abstract: Polishing pads with apertures are described. Methods of fabricating polishing pads with apertures are also described.

Abstract: A polish pad including a polish region contributing to polishing of a polish object; and a polish layer being disposed in the polish region and including unfoamed segments comprising unfoamed resin and foamed segments comprising resin including independent pores. The unfoamed segments and the foamed segments of the polish layer are made of the same raw resin.

Abstract: A blade sharpening system for log saw machines is provided. An example multiphase grinding wheel has a grinding face with one or more abrasive concentric rings for sharpening the cutting blade of the log saw machine, and one or more padded concentric rings consisting of fiber padding. Sharpening with the multiphase grinding wheel improves cut quality, increases blade life, removes glues and varnishes from the cutting blade, reduces blade deformation, and hones the edge of the cutting blade. A pneumatic tensioning system uses air bladders to apply a dynamically cushioned pressure between the grinding wheels and the cutting blade. The fiber-padded grinding wheels and the air bladder tensioner provide improved sharpness of the cutting blade and longer life for the mechanical components. The padded grinding wheels decrease fire risk, and the tensioner can be operated remotely, decreasing human injuries common with conventional setup actions near the sharp cutting blade.

Abstract: Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a coating pattern characterized by a plurality of discrete islands. The coating pattern has features in which all three components are generally in registration with each other, while providing a pervasive uncoated area extending across the backing. Advantageously, this configuration provides a coated abrasive that displays superior curl-resistance compared with previously disclosed abrasive articles. Moreover, this configuration resists loading, resists de-lamination, has enhanced flexibility, and decreases the quantity of raw materials required to achieve the same level of performance as conventional abrasive articles.

Abstract: An abrasive article for polishing a surface of a workpiece. The abrasive article includes a plurality of polishing islands arranged to interact with a workpiece to maintain a substantially constant contact area. Abrasive features are associated with at least some of the plurality of polishing islands. The abrasive features apply cutting forces to the work piece during motion of the abrasive article relative to the workpiece.

Abstract: Polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are also described.

Abstract: The disclosure is directed to polishing pads with porous polishing elements, and to methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pad includes a multiplicity of polishing elements, at least some of which are porous, each polishing element affixed to a support layer so as to restrict lateral movement of the polishing elements with respect to one or more of the other polishing elements, but remaining moveable in an axis normal to a polishing surface of the polishing elements. In certain embodiments, the polishing pad may include a guide plate positioned to arrange and optionally affix the plurality of polishing elements on the support layer, and additionally, a polishing composition distribution layer. In some embodiments, the pores are distributed throughout substantially the entire porous polishing element. In other embodiments, the pores are distributed substantially at the polishing surface of the elements.

Abstract: A polishing article with a plurality of polishing pads adapted to polish a substrate. Gimbal structures are attached to the polishing pads that permit the polishing pads to move independently along at least a pitch axis and a roll axis. Stems supported by preload flexures apply preloads through dimple structures to the polishing pads. A plurality of stand-offs provide fixed boundary conditions between the preload and the gimbal structures. Recesses allow for the preload flexures to move vertically.

Abstract: A surface treating device includes an open lofty non-woven layer (1) and a woven layer (2). The non-woven layer and woven layer have facing sides (5, 6) which are adhered to each other. A plurality of abrasive segments (3) is adhered to the woven layer on the side (7) of the woven layer (2) which faces away from the non-woven layer (1). Thus, the abrasive segments are held in a stable manner so as to better withstand the frictional forces exerted thereon during service.

Abstract: Polishing pads having a polishing surface with continuous protrusions are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions are also described.

Abstract: A polishing pad includes at least a polishing layer including a groove, on a polishing surface, having side surfaces, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle ? with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle ? with a plane parallel to the polishing surface, the angle ? is larger than 95 degrees, the angle ? is larger than 95 degrees, and the angle ? is smaller than the angle ?, and a bending point depth from the polishing surface to a bending point between the first side surface and the second side surface is more than 0.2 mm and not more than 3.0 mm.

Abstract: A polishing pad and a polishing method for polishing a substrate are described. The polishing pad includes a polishing layer and at least two grooves. The grooves form polishing tracks respectively. The polishing tracks collectively construct an even tracking zone. A better polishing uniformity of a substrate surface is achieved with the even tracking zone.

Abstract: A sanding paper for use with a floor sander having one direction sanding comprising a paper sleeve or belt having a length and a width and a first surface and a second surface joined together and running parallel along the length of the sand paper wherein the first surface is disposed on the sander to apply to the floor first and the second to follow immediately thereafter and wherein the first surface has a grit which is more coarse than the second surface. The sanding paper first grit is a grit between 24-60 and the second grit is between 80 and 120 grit. In place of a middle grit, The intermediate surface between the first surface and second surface and wherein the first surface is between 24 and 40 grit, the intermediate surface between 41 and 80 grit and the third surface between 80 and 120 grit.

Abstract: A tool for the roughing and/or polishing of hard surfaces such as stone, marble or the like, is described. The tool is usable in association with hand-operated machines, such as an angle grinder or the like, for manual treatment of surfaces by an operator. In particular, the tool provides a roughing and/or polishing tool whose flexibility and safety level is extremely high.

Abstract: To provide a nonwoven fabric polishing roll that can reduce the occurrence of polishing defects and carry out uniform polishing.

Abstract: A polishing pad, an apparatus for chemical mechanical polishing of semiconductor wafers and a method of making a device using the same are presented. The apparatus includes a first platform for mounting a semiconductor wafer; a second platform for mounting a polishing pad; a rotator for rotating the wafer against the polishing pad; and a diamond dresser for dressing the polishing pad. The polishing pad has a single groove of a width (w) surrounding the periphery of an undressed portion of the polishing pad thus eliminating contact of the undressed portion with the outer edge of the diamond dresser.

Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, a first type of abrasive particle overlying the tacking layer, a second type of abrasive particle different than the first type of abrasive particles overlying the tacking layer, and a bonding layer overlying at least a portion of one of the first type of abrasive particle and the second type of abrasive particle and the tacking layer.

Abstract: A coated abrasive article having a plurality of formed ceramic abrasive particles each having a surface feature. The plurality of formed ceramic abrasive particles attached to a flexible backing by a make coat comprising a resinous adhesive forming an abrasive layer. The surface feature having a specified z-direction rotational orientation, and the specified z-direction rotational orientation occurs more frequently in the abrasive layer than would occur by a random z-direction rotational orientation of the surface feature.

Abstract: A surface treating device includes an open lofty non-woven layer (1) and a woven layer (2). The non-woven layer and woven layer have facing sides (5, 6) which are adhered to each other. A plurality of abrasive segments (3) is adhered to the woven layer on the side (7) of the woven layer (2) which faces away from the non-woven layer (1). Thus, the abrasive segments are held in a stable manner so as to better withstand the frictional forces exerted thereon during service.

Abstract: An abrasive pad for use on hard surfaces is described. The pad includes a fibrous, non-woven body with an abrasive coating containing diamond particles applied to a first side thereof. A plurality of diamond-impregnated abrasive elements is affixed to the first side. One or more of the abrasive elements are located near an outer edge of the first side of the pad. A resilient reinforcing material is applied to the outer edge of the pad to resist compression of the pad and to maintain adjacent abrasive elements parallel to a surface being worked on. The abrasive elements at least partially recess into the pad body and enable simultaneous contact of the abrasive elements and the pad with the surface being worked on. Thereby, multiple surface-preparation steps, e.g. polishing and burnishing, are completed simultaneously reducing surface-preparation time and eliminating separate surface-preparation steps.