Abstract: A method of forming a thermally stable cutting element that includes disposing at least a portion of a polycrystalline abrasive body containing a catalyzing material to be leached into a leaching agent; and subjecting the polycrystalline abrasive object to an elevated temperature and pressure is disclosed. Thermally stable cutting elements and systems and other methods for forming thermally stable cutting elements are also disclosed.

Abstract: Abrasive grain powder, in particular intended for machining silicon ingots, such that the granulometric fraction D40-D60 comprises more than 15% and less than 80%, as percentages by volume, of grains having circularity of less than 0.85.

Abstract: Abrasive tools contain abrasive grains oriented in an array according to a non-uniform pattern having an exclusionary zone around each abrasive grain, and the exclusionary zone has a minimum dimension that exceeds the maximum diameter of the desired grit size range for the abrasive grain. Methods for designing such a self-avoiding array of abrasive grain and for transferring such an array to an abrasive tool body are described.

Abstract: Lofty open nonwoven abrasive articles, unitized abrasive wheels, and convolute abrasive wheels include a dipodal aminosilane. Methods of making the abrasive articles are also included.

Abstract: A method of producing a high-density abrasive compact material includes the steps of providing an electrically conductive mixture of a bonding powder material and abrasive particles or grit; compressing the electrically conductive mixture; and subjecting the compressed electrically conductive mixture to one or more high current pulses to form the abrasive compact is provided.

Abstract: A method of processing a polycrystalline diamond material is disclosed. According to the method, a metal-solvent catalyst is leached from a polycrystalline diamond material by exposing at least a portion of the polycrystalline diamond material to a leaching solution. The leaching solution includes water, a complexing agent, and a mineral acid. The complexing agent is configured to inhibit tungsten in the polycrystalline diamond material from oxidizing.

Abstract: Superabrasive elements, methods of fabricating such elements, and applications utilizing such elements. In one embodiment, a superabrasive element includes a mass of polycrystalline diamond including ultra-dispersed diamond grain structures present in an amount greater than zero weight percent and less than about 75 weight percent of the mass of polycrystalline diamond. Various structures and apparatuses that utilize the superabrasive elements, such as polycrystalline diamond compacts (PDCs) and drill bits are disclosed. Methods of manufacture are also disclosed.

Abstract: A polishing pad having a detection window and a method of manufacturing the polishing pad are provided. A dummy detection window is pre-disposed in a mold. A polishing layer precursor is filled into the mold, and then a solidifying process is performed to form a polishing layer, wherein the polishing layer and the dummy detection window are separable completely. The polishing layer and the dummy detection window are separated from each other so as to form a detection opening in the polishing layer. The detection opening can alternatively be formed in a mold having a protrusion structure to replace the dummy detection window. A detection window precursor is filled into the detection opening, and then a solidifying process is performed to form a detection window.

Abstract: Azeotropic or azeotrope-like compositions are disclosed. The azeotropic or azeotrope-like compositions are mixtures of Z-1,1,1,4,4,4-hexafluoro-2-butene, trans-1,2-dichloroethylene and a third component. Also disclosed are compositions where the third component is cyclopentane, methanol, dimethyoxymethane, methyl formate or perfluoro ethyl isopropyl ketone. Also disclosed is a process of preparing a thermoplastic or thermoset foam by using such azeotropic or azeotrope-like compositions as blowing agents. Also disclosed is a process of producing refrigeration by using such azeotropic or azeotrope-like compositions. Also disclosed is a process of using such azeotropic or azeotrope-like compositions as solvents. Also disclosed is a process of producing an aerosol product by using such azeotropic or azeotrope-like compositions. Also disclosed is a process of using such azeotropic or azeotrope-like compositions as heat transfer media.

Abstract: A method for manufacturing a diamond composite, includes: a) mixing diamonds with additives, the mixture comprising at least 50 wt % and less than 95 wt % of diamonds and more than 5 wt % additives; b) forming a work piece from the mixture using a pressure of at least 100 Mpa; c) heating the formed work piece to at least 300° C. for removing possible water and wholly or partially removing additives; d) heating the work piece and controlling the heating temperature and heating time so that a certain desired amount of graphite is created by graphitization of diamonds, wherein the amount of graphite created by graphitization is 3-50 wt % of the amount of diamond; e) infiltrating silicon or silicon alloy into the work piece.

Abstract: An abrasive article includes a binder and abrasive grains. The binder is formed from a formulation including a polymer component, a curing agent, and an acid bonding agent.

Abstract: In a superabrasive grain setting method, a two-dimensionally developed coordinate preparation step is taken, wherein a non-cylindrical area of a mounting surface where a tangential line to the mounting surface in a plane including the axis of the manufacturing mold crosses with the axis of a manufacturing mold is developed into a circular-arc belt-like surface, and a plurality of mounting points are set on the circular-arc belt-like surface in a grid pattern in dependence on mounting positions for superabrasive grains. Then, a rectification step is taken, wherein the grid pattern of the mounting points is rectified in predetermined angular ranges so that the mounting points do not make consecutive point lines in the circumferential direction of the circular-arc belt-like surface. A mounting step is thereafter taken of mounting the superabrasive grains on the mounting surface of the manufacturing mold based on the grid pattern rectified at the rectification step.

Abstract: There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as ?-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4?-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.

Abstract: Methods and systems for evaluating and/or increasing CMP pad dresser performance are provided. In one aspect, for example, a method of identifying overly-aggressive superabrasive particles in a CMP pad dresser can include positioning a CMP pad dresser having a plurality of superabrasive particles on an indicator substrate such that at least a portion of the plurality of superabrasive particles of the CMP pad dresser contact the indicator substrate, and moving the CMP pad dresser across the indicator substrate in a first direction such that the portion of the plurality of superabrasive particles create a first marking pattern on the substrate, wherein the first marking pattern identifies a plurality of working superabrasive particles from among the plurality of superabrasive particles.

Abstract: A drill bit includes a crown defining a central axis. The crown includes at least one segment. The segment includes a planar portion and a plurality of surface features continuous with and extending away from the planar portion. The surface features are discontinuous within the segment with respect to a first arced path defined at a first radial distance from the central axis.

Abstract: A method and system for modifying a drug delivery polymeric substrate for an implantable device, such as a stent, is disclosed.

Abstract: A rapid structuring media cartridge includes a cartridge body, a first binder and first abrasive particles. The cartridge is operable to deposit successive patterned layers including the first binder and first abrasive particles to form an abrasive structure.

Abstract: A method of facilitating abrasive article manufacturing includes providing a rapid tooling system to a consumer and providing a cartridge to the consumer. The cartridge has a cartridge body, a first binder and first abrasive particles. The cartridge is configured to operate as part of the rapid tooling system and is operable to deposit the first binder and the first abrasive particles in successive patterned layers to form an abrasive structure.

Abstract: A sintered polycrystalline composite for cutting tools that includes a plurality of diamond or cubic boron nitride particles; a plurality of nanotube materials; and a refractory or binder material is disclosed. Methods of forming such polycrystalline composites that include integrating or mixing a plurality of nanotube materials with diamond or cubic boron nitride particle and/or refractory or binder particles are also disclosed.

Abstract: The invention concerns a sanding element with a succession of overlapping lamellas (3, 4) comprising sanding grains (9), characterized in that these lamellas (3, 4) are alternately formed of sanding lamellas (3) and compressible lamellas (4), whereby each sanding lamella (3) rests on a compressible lamella (4).

Abstract: A compression molding apparatus and method for the manufacture of abrasive layers for abrasive tooling which provides a compression mold space defined between an inflexible wall surface and a flexible wall surface. The apparatus and method of the present invention is particularly well suited to making annular or hollow cylindrical shaped abrasive layers of novel configurations during a single mold cycle useful for grinding wheel and the like, as well as other shapes such as laps, wherein the flexible wall expanded with fluid pressure provides a highly uniform distribution of pressure against the surface of the mold composition being formed. In an annular configuration, the flexible wall is used to radially direct pressure against a molding composition disposed in an annular configuration wherein the axial length of the annular mold shape formed may be many times greater than priorly obtained by the prior art means.

Abstract: The surface(s) of a polishing pad for polishing an object has a first portion including hydrophilic material and a second portion including hydrophobic material. The first portion of the polishing surface is located in a first region of the polishing pad and the second portion of the polishing surface is located in a second region of the polishing pad juxtaposed with the first region in the radial direction of the pad. The hydrophilic material may be a polymer resin that contains hydrophilic functional groups having OH and/or ?O at bonding sites of the polymer. The hydrophobic material may be a polymer resin that contains hydrophobic functional groups having H and/or F at bonding sites of the polymer. The polishing pad is manufactured by extruding respective lines of the hydrophilic and hydrophobic materials. The extruders and a backing are moved relative to each other such that the lines form concentric rings of the hydrophilic and hydrophobic materials.

Abstract: A tool for grinding an inner diameter even when holders having grindstones are axially connected. A gap enclosed by the inner peripheral surface of a divided tool holder, a draw bar and O-rings is formed in a state in which the draw bar is inserted into a tool holder in which a plurality of divided tool holders are connected in series. A filler is filled into the gap to fix a support bush to the divided tool holder. An adjustment screw of each arm held circumferentially away from each other on the divided tool holder is turned to adjust a distance between a pin and the arm, and the radial projecting amount of each of grindstones is adjusted. The projecting amount is adjusted such that the plurality of grindstones rotate along the same rotational trajectory and the center of the rotational trajectory corresponds to the axis of the draw bar.

Abstract: A composite material consists of a plurality of cores dispersed in a matrix. The cores are formed of ultra-hard material, or the components for making an ultra-hard material. The matrix is formed of the components for making an ultra-hard material of a grade different to that of the cores, and a suitable binder. The ultra-hard material is polycrystalline in nature and is typically PCD or PcBN. The cores are typically provided as granules coated with the components for making an ultra-hard material and the binder. The composite material typically takes on a honeycomb structure of an ultra-hard material and cores within the pores of the honeycomb structure bonded to the honeycomb structure. The pores of the honeycomb structure may be ordered or random.

Abstract: Chemical mechanical polishing pads having a window with an integral identification feature, wherein the window has a polishing face and a nonpolishing face, wherein the integral identification feature is observable through the window, and wherein the integral identification feature identifies the chemical mechanical polishing pad as a type of chemical mechanical polishing pad selected from a plurality of types of chemical mechanical polishing pads. Also provided is a method of making such chemical mechanical polishing pads and for using them to polish a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate.

Abstract: The present invention preferably provides a polishing composition for a hard disk substrate, containing aluminum oxide particles and water, wherein secondary particles of the aluminum oxide particles have a volume-median particle size of from 0.1 to 0.7 ?m, and particles having particle sizes of 1 ?m or more of the aluminum oxide particles are contained in an amount of 0.2% by weight or less of the polishing composition; and a method for manufacturing a hard disk substrate using the polishing composition. By using the polishing composition and the method for manufacturing a substrate of the present invention, for example, a hard disk substrate suitable for high recording density can be provided in high productivity.

Abstract: An improved abrasive disc for use with an angle grinder is disclosed. The grinder is of the type having a threaded spindle. The disc is of the type having: a central portion defining a threaded bore for receiving said spindle; and abrasive material surrounding the central portion. The improvement comprises: a hub defining the threaded bore; an annular element providing the abrasive material, the annular element having a central primary aperture aligned with the threaded bore in the hub to provide access to the bore by said spindle in use; and elements mechanically securing the hub to the annular element, for co-rotation. Apparatus and methods for producing discs are also disclosed.

Abstract: The present invention provides a cerium oxide-based abrasive ensuring high removal rate, less generation of scratches, high-precision polished surface with small surface roughness, and a safe, simple and low-cost production process. Further, the present invention provides a method for producing such an abrasive. The method of the present invention comprises (a) adding a precipitant to an aqueous cerium-containing light rare-earth salt solution to precipitate a light rare-earth salt, thereby obtaining a first slurry containing a light rare-earth salt particle; (b) adding a fluorinating agent to a slurry containing a light rare-earth salt particle to react the light rare-earth salt with the fluorinating agent, thereby obtaining a second slurry containing a light rare-earth fluoride particle; (c) mixing the first slurry and the second slurry to obtain a mixed slurry; and (d) drying and firing the mixed slurry, and a cerium oxide-based abrasive obtained by this method.

Abstract: Provided are azeotropic or azeotrope-like mixtures of 2,3,3,3-tetrafluoropropene (1234yf) and 3,3,3-trifluoropropene (1243zf), as well as methods for producing and using the same.

Abstract: A method of manufacturing polymer-coated particles is useful for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates. First it provides a dispersion of particle cores in a non-aqueous solvent. Then introducing a polymeric precursor into the dispersion to react the polymeric precursor forms a polymer. The polymer coats at least a portion of the surface of the particle cores with the polymer and forms the polymer-coated particles having a solid outer polymeric shell. Substituting the non-aqueous solvent with water forms an aqueous mixture containing the polymer-coated particles. And it forms an aqueous chemical mechanical polishing formulation with the polymer-coated particles without drying the polymer-coated particles.

Abstract: In a method of manufacturing a revolving whetstone comprising a central portion in which a whetstone center hole into which a whetstone driving shaft of a grinder is inserted is arranged and a disk-shaped whetstone body that has an effective whetstone circular portion arranged in the circumferential outside of the central portion as one body, the wall thickness of the central portion is formed thinner than the wall thickness of the effective whetstone circular portion, and a whetstone material for the thinned wall thickness of the central portion is put on the wall thickness surface of the effective whetstone circular portion, and the wall thickness of the effective whetstone circular portion is formed thicker than the wall thickness of the central portion.

Abstract: A polishing pad, a polishing method and a method of forming a polishing pad are provided. The polishing pad includes a polishing layer and a plurality of arc grooves. The arc grooves are disposed in the polishing layer. Each of the arc grooves has two ends, and at least one end thereof has an inclined wall. The angle between the inclined wall of each groove and the surface plane of the polishing layer is less than 90 degree.

Abstract: Osmium, when combined with boron alone, or in combination with rhenium, ruthenium or iron, produces compounds that are ultra-hard and incompressible. These osmium diboride compounds are useful as a substitute to for other super or ultra-hard materials that are used in cutting tools and as abrasives. The osmium diboride compounds have the formula OsxM1-xB2 where M is rhenium, ruthenium or iron and x is from 0.01 to 1, except when x is not 1 and M is rhenium, x is from 0.01 to 0.3.

Abstract: A rotatable abrasive lapper machine platen assembly is attached to a lapper machine frame. The assembly has at least: a) a circular-shaped rotatable horizontal platen having i) a front surface and ii) a back surface; b) the circular platen having a platen radius, a platen outer circumference and a platen outer periphery; c) the circular platen front surface having an outer annular planar portion where the platen-outer-annular planar portion extends radially to the circular platen outer circumference; and d) a flexible abrasive disk secured in conformable flat contact with the circular platen front surface outer annular planar portion wherein the abrasive disk is positioned concentric with the circular platen.

Abstract: An abrasive article comprises a porous abrasive member, a nonwoven filter medium, and a porous attachment fabric. A plurality of openings in the porous abrasive member cooperates with the nonwoven filter medium to allow the flow of particles from an outer abrasive surface of the porous abrasive member to the porous attachment fabric. Methods of making and using the abrasive articles are included.

Abstract: Chemical mechanical polishing pads are provided, wherein the chemical mechanical polishing pads have a polishing layer comprising an interpenetrating network including a continuous non-fugitive phase and a substantially co-continuous fugitive phase. Also provided are methods of making the chemical mechanical polishing pads and for using them to polish substrates.

Abstract: The present invention is directed to an automatic rotation knife sharpener where the crossed sharpening rods are automatically rotated each time a knife is passed down and through the sharpener. The rotation is derived through the means of a spring steel actuator mechanism making contact with the cogwheels of the sharpening rod holders. Magnets retain the sharpening rods in place within the sharpening rod holders. Sharpening rods may be easily removed and stored in troughs on the upper surface of the protective cover. A variety of sharpening rods with different abrasive surfaces can be easily exchanged in the device.

Abstract: The disclosure is directed to a method of forming a structured abrasive article. The method includes coating a backing with an abrasive slurry comprising binder and abrasive grains, partially curing the abrasive slurry and forming a pattern in the partially cured abrasive slurry.

Abstract: An improved method for controlling nucleation sites during superabrasive particle synthesis can provide high quality industrial superabrasive particles with high yield and a narrow size distribution. The synthesis method can include forming a particulate crystal growth layer by mixing a raw material and a catalyst material and then placing the crystalline seeds in a predetermined pattern in the growth layer. Preferably, seeds can be substantially surrounded by catalyst material. The growth precursor can be maintained at a temperature and pressure at which the superabrasive crystal is thermodynamically stable for a time sufficient for a desired degree of growth. The crystalline seeds can be placed in a predetermined pattern using a template, a transfer sheet, vacuum chuck or similar techniques. The superabrasive particles grown using the described methods typically have a high yield of high quality industrial particles and a narrow distribution of particle sizes.

Abstract: A polycrystalline superabrasive composite tool can be produced using high pressure high temperature processes allowing for increased thermal resistance, wear resistance and toughness of abrasive tools, and additionally allowing for increased effective thickness of abrasive tools. A polycrystalline superabrasive compact can include a support substrate and a superabrasive polycrystalline layer having a diffusion bridge embedded therein that includes a carbide former. Additionally, a working layer can be attached adjacent to the superabrasive polycrystalline layer and opposite the support substrate to form a drill bit sandwich segment. The diffusion bridge matrix of the present invention allows for a new welding phase at each interface between the superabrasive polycrystalline layer and support substrate and between the polycrystalline layer and the metal working layer, thus eliminating delamination failure at the interfaces.

Abstract: The present invention provides a polishing composition that can be suitably used in polishing of polysilicon, and a polishing method using the polishing composition. The polishing composition contains abrasive grains and an anionic surfactant having a monooxyethylene group or a polyoxyethylene group and has a pH of 9 to 12. If the anionic surfactant contained in the polishing composition has a polyoxyethylene group, the number of repeating oxyethylene units in the polyoxyethylene group is preferably 2 to 8. The anionic surfactant contained in the polishing composition can be an anionic surfactant that has a phosphate group, a carboxy group, or a sulfo group as well as a monooxyethylene group or a polyoxyethylene group. The content of the anionic surfactant in the polishing composition is preferably 20 to 500 ppm.

Abstract: A method of fabricating a polishing pad for polishing an article is described. The method includes providing a semi-finished polishing pad and then forming a moving track on the surface of the semi-finished polishing pad. The moving track substantially coincides with a polishing track of the article on the polishing pad.

Abstract: The present disclosure relates to a polishing pad including a chemical agent present in an amount sufficient to be released and dissolving into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration and a binder. The pad includes a surface such that as the pad is abraded the surface is renewed exposing at least a portion of the chemical agent.

Abstract: A method is described. The method includes contacting a non-solid material to a non-linear edge of a sheet of polishing material, and causing the non-solid material to solidify to form a window that contacts the non-linear edge of the polishing material.

Abstract: A new industrial thermally stable polycrystalline diamond (TSP) is disclosed and described as a replacement of natural as well as synthetic diamond grit in concrete cutting, grinding, polishing, and surface-set grinding or core bit drilling applications. Conventional diamond is too strong and brittle for self-sharpening and polishing and has a lower thermal stability inferior to the industrial standard for high temperature tool segment bonding. TSP grits can be tailor-made having unique properties as well as an engineered shape of grits over naturally or synthetically produced diamond grits. The TSP grits have a high thermal stability of up to 1200° C. and are self-sharpening. Further, economical production of coarse TSP grit size up to 1-2 mm from 50/60 mesh size in almost any preferred shape such as blocky, round, hexagonal, thin elongated, spherical, needle like, and any desirable tailor-made shaped etc can be realized.

Abstract: Methods of making a superabrasive tool precursor are disclosed, along with such precursors and associated tools. Particularly, methods are disclosed for orienting superabrasive particles in a viscous binding material in order to provide tools based thereupon and having desired performance characteristics.

Abstract: In a superabrasive grain setting method, a two-dimensionally developed coordinate preparation step is taken, wherein a non-cylindrical area of a mounting surface where a tangential line to the mounting surface in a plane including the axis of the manufacturing mold crosses with the axis of a manufacturing mold is developed into a circular-arc belt-like surface, and a plurality of mounting points are set on the circular-arc belt-like surface in a grid pattern in dependence on mounting positions for superabrasive grains. Then, a rectification step is taken, wherein the grid pattern of the mounting points is rectified in predetermined angular ranges so that the mounting points do not make consecutive point lines in the circumferential direction of the circular-arc belt-like surface. A mounting step is thereafter taken of mounting the superabrasive grains on the mounting surface of the manufacturing mold based on the grid pattern rectified at the rectification step.

Abstract: A cerium oxide powder for one-component CMP slurry, which has a specific surface area of 5 m2/g or more, and a ratio of volume fraction of pores with a diameter of 3 nm or more to that of pores with a diameter less than 3 nm of 8:2˜2:8, is disclosed. A method for preparing the same, a one-component CMP slurry comprising the same as an abrasive material, and a method of shallow trench isolation using the one-component CMP slurry are also disclosed. The CMP slurry causes no precipitation of the cerium oxide powder even if it is provided as a one-component CMP slurry, because the CMP slurry uses, as an abrasive material, cerium oxide powder that is obtained via a low-temperature calcination step, optionally a pulverization step, and a high-temperature calcination step and has a high pore fraction and low strength.

Abstract: A composition for removing a photoresist layer and a method for using it are disclosed. The composition comprises a chemical portion which includes water and chemical constituents dissolving or softening the photoresist layer and a mechanical portion which is abrasive particles. Using the composition and the method according to the present invention can decrease the conventional two steps of removing a photoresist layer process to one step, thereby simplifying the procedure, shortening the removing time and reducing the cost. The chemical constituents in the composition according to the present invention are of low toxicity and flammability and the amount used is small, which makes it more friendly with the environment and decreases the expense of disposing the waste.

Abstract: There is provided a method for producing a chemical mechanical polishing pad, the method comprising the steps of (1) producing a sheet-shaped polymer molded article and (2) irradiating the sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy. A chemical mechanical polishing pad produced by the above method has advantages that it is excellent in removal rate and scratches and in-plane uniformity on a polished surface and that it shows a stable removal rate even when polishing a number of objects to be polished successively.