Abstract: A method of producing a brush for carrying out surface roughing, polishing, lapping, and smoothing operations comprises a first molding operation of one or more mixes including one or more moldable synthetic materials so as to obtain a base portion (6; 160) and a plurality of bristle members (3; 130, 130a, 130b) projecting from a surface (6a; 160a) of the base portion (6; 160) and including at least one abrasive material. The invention also relates to a brush tool of synthetic material including one or more abrasive grain material in the bristle members (3; 130, 130a, 130b) thereof.

Abstract: An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate.

Abstract: Disclosed are a cutting wheel composition, and a cutting wheel using the cutting wheel composition. The disclosed composition includes 50 to 85 wt % of abrasive particles, 10 to 25 wt % of binder resin, and balance filler, wherein the binder resin includes a phenolic resin as a first binder resin; and at least one of a (bis)maleimide resin and a cyanate ester resin as a second binder resin. The composition includes at least one of the (bis)maleimide resin and the cyanate ester resin, as well the phenolic resin, as the binder resin, and thereby makes it possible to fabricate a cutting wheel having improved life characteristics through the improvement of heat-resistance and scratch-resistance.

Abstract: The invention provides a plurality of polymeric particles embedded with silicate that include gas-filled polymeric microelements. The gas-filled polymeric microelements have a shell and a density of 5 g/liter to 200 g/liter. The shell having an outer surface and a diameter of 5 ?m to 200 ?m with silicate particles embedded in the polymer. The silicate particles have an average particle size of 0.01 to 3 ?m. The silicate-containing regions are spaced to coat less than 50 percent of the outer surface of the polymeric microelements; and less than 0.1 weight percent total of the polymeric microelements is associated with i) silicate particles having a particle size of greater than 5 ?m; ii) silicate-containing regions covering greater than 50 percent of the outer surface of the polymeric microelements; and iii) polymeric micro elements agglomerated with silicate particles to an average cluster size of greater than 120 ?m.

Abstract: A coated abrasive article comprises an abrasive layer secured to a backing. The abrasive layer comprises abrasive particles secured by at least one binder to a first major surface of the backing. A supersize is disposed on at least a portion of the abrasive layer. The coated abrasive article has a melt flow zone adjacent to an edge of the coated abrasive article, wherein the melt flow zone has a maximum width of less than 100 micrometers, and the melt flow zone has a maximum height of less than 40 micrometers. Methods of using infrared lasers to ablate coated abrasive articles are also disclosed, wherein a laser wavelength is matched to a component of the coated abrasive article.

Abstract: An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient of thermal expansion (CTE) substrate through a metal bond. There is an overall CTE mismatch that ranges from about 0.1 ?m/m-° C. to about 5.0 ?m/m-° C. The overall CTE mismatch is the difference between the CTE mismatch of the abrasive grains and the metal bond and the CTE mismatch of the low CTE substrate and the metal bond.

Abstract: A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to 5000, the chain extender (C) including (C1) a compound shown by the following general formula (1) and (C2) a compound shown by the following general formula (2), the compound (C1) and the compound (C2) having a number average molecular weight of less than 400, and a ratio “M1/(M1+M2)” calculated by using the number of moles (M1) of the compound (C1) and the number of moles (M2) of the compound (C2) being 0.25 to 0.9.

Abstract: Methods of fabricating polishing pads with end-point detection regions for polishing semiconductor substrates using eddy current end-point detection are described.

Abstract: A method of forming a chemical mechanical polishing pad. The method includes polymerizing one or more polymer precursors and forming a chemical-mechanical planarization pad including a surface, forming grooves in the surface defining lands between the grooves, wherein the grooves have a first width, and shrinking the lands from a first land length (L1) at the surface to a second land length (L2) at the surface, wherein the second land length (L2) is less than the first land length (L1) and the grooves have a second width (W2) wherein (W1)?(X)(W2), wherein (X) has a value in the range of 0.01 to 0.75.

Abstract: A surface-modified abrasive grain includes an abrasive grain as a substrate, and a film on the abrasive grain that includes a relatively hydrophilic silane component and a relatively hydrophobic silane component. The film can be a single film layer or multiple film layers, wherein a film layer most proximal to the abrasive grain has a predominately hydrophilic silane component, and a film layer more distal to the abrasive grain includes predominately a relatively hydrophobic silane component. Coated abrasive products and bonded abrasive products include the surface-modified abrasive grains.

Abstract: An abrasive brush includes a securing element and a plurality of abrasive filaments secured to the securing element to form a brush. Each abrasive filament includes a matrix of thermoplastic polymer and a plurality of alumina abrasive particles interspersed throughout at least a portion of the matrix. The abrasive particles comprising a polycrystalline alpha alumina having a fine crystalline microstructure characterized by an alpha alumina average domain size not greater than 500 nm. The alumina abrasive particles further include a pinning agent comprising a dispersed phase in the polycrystalline alpha alumina.

Abstract: A method of making an abrasive article comprising an abrasive disc (1) of non-woven fibres having a central shaft (3) and a hub (2) securing the shaft (3) to the abrasive disc (1). The method comprising forming the hub (3) by injecting molten thermoplastic material into the abrasive disc (1), and allowing the thermoplastic material to cool and solidify such that the shaft (3) is secured to the abrasive disc (1). The invention provides a simple, economical and effective method of securing a shaft to a disc.

Abstract: An abrasive article includes a backing including first and second major surfaces, an abrasive layer disposed over the first major surface, and a back coat layer disposed over the second major surface. The back coat layer includes a polymeric material and a fabric.

Abstract: A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.

Abstract: An abrasive article including a bonded abrasive having a body formed of abrasive grains contained within a bond material, wherein the body grinds a superabrasive workpiece having an average Vickers hardness of at least about 5 GPa at an average specific grinding energy (SGE) of not greater than about 350 J/mm3, at a material removal rate of at least about 8 mm3/sec, and wherein grinding is a centerless grinding operation.

Abstract: An improved resilient sanding block of the type comprising a core having a plurality of exterior surfaces, including a first major surface and a second major surface and side surfaces, and having a layer of abrasive material disposed thereon. The resilient sanding block may have one or more apertures or through holes extending from one major surface to the other major surface and channels formed in at least one of the major surfaces, with the channels in communication with the aperture. When a vacuum source is operatively connected to the aperture, the dust created by sanding will be substantially removed into the vacuum source via the channels and the aperture. A holder for a resilient sanding block is also disclosed, as well as a handle for the holder, which together form a sanding system.

Abstract: A polishing composition and method for polishing polymer-based surfaces that can be rinsed from the polished polymer-based surface using water so as to leave substantially less polishing residue behind as compared to conventional polishing compositions. Polishing compositions according to the invention include abrasive particles and a rinsing agent dispersed in water. Polishing compositions according to the invention can be used to polish all types of polymer-based surfaces including, for example, organic polymer-based ophthalmic substrates and clear-coat automotive finishes.

Abstract: A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulas (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).

Abstract: To provide a linear abrasive brush member, in which filament parts are hardly broken, a substrate part is excellent in deformability, and also, abrasion ability is excellent. A linear abrasive brush member comprising: an embedded core material (9); a rod-shaped substrate part (7) having opposite long-narrow upper and bottom faces; and a plurality of filament parts (8) present on the upper surface along the longitudinal direction; and the substrate part and the filament parts being integrally molded from a resin composition.

Abstract: An apparatus and associated method for constructing an abrading tool having a desired surface texture for a lapping surface of the tool. The abrading tool has a platen defining an external surface and a cavity intersecting the external surface. An adhesive is disposed in the cavity. An abrasive member is adhered at a proximal end thereof to the platen in the cavity by the adhesive so that the abrasive member extends beyond the external surface at a distal end thereof to define the lapping surface.

Abstract: Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a pre-determined coating pattern. All three components are generally in registration with each other, thereby providing a pervasive uncoated area extending across the backing Advantageously, this configuration provides a coated abrasive that displays superior curl-resistance compared with previously disclosed abrasive articles. Moreover, this configuration resists loading, resists de-lamination, has enhanced flexibility, and decreases the quantity of raw materials required to achieve the same level of performance as conventional abrasive articles.

Abstract: Structured fixed abrasive articles including a multiplicity of three-dimensional abrasive composites fixed to the abrasive article, the abrasive composites further including a multiplicity of ceria abrasive particles having a volume mean diameter from 100 to 500 nanometers (nm) in a matrix material, the matrix material further including a polymeric binder and a multiplicity of surface treated ceria filler particles having a volume mean diameter less than 100 nm. Also provided are methods of making and using structured fixed abrasive articles according to the disclosure.

Abstract: A method and apparatus for performing chemical-mechanical planarization (CMP) is disclosed, which in one embodiment includes a CMP tool for polishing a semiconductor wafer. The CMP tool includes a slurry mixture that has slurry beads. The slurry beads are formed of a polymer material. The slurry beads are used to remove summits and non-uniformities on the semiconductor wafer. In some embodiments the CMP tool includes a counter-face that replaces the polishing pad of a conventional CMP tool. In some embodiments the counter-face is made of polycarbonate. In another embodiment a slurry mixture for use with a CMP tool is disclosed. The slurry mixture includes slurry beads, where each of the slurry beads has a diameter of between 0.1 and 1000 microns, or in some embodiments a diameter of between 10 and 50 microns.

Abstract: Abrasive articles, and methods of making abrasive articles that include a supersize coating or component, such as one configured to inhibit the collection of dust and/or swarf on the abrasive coating. The supersize component can be applied to the abrasive coating after converting the abrasive article with a laser or other conversion mechanism, whether non-contact or mechanical contact. In some embodiments, no fresh or exposed abrasive or backing surfaces exist; that is, the supersize component covers all surfaces.

Abstract: The invention provides a polishing pad for chemical-mechanical polishing comprising a polymeric material comprising two or more adjacent regions, wherein the regions have the same polymer formulation and the transition between the regions does not include a structurally distinct boundary. In a first embodiment, a first region and a second adjacent region have a first and second non-zero void volume, respectively, wherein the first void volume is less than the second void volume. In a second embodiment, a first non-porous region is adjacent to a second adjacent porous region, wherein the second region has an average pore size of about 50 ?m or less. In a third embodiment, at least two of an optically transmissive region, a first porous region, and an optional second porous region, are adjacent. The invention further provides methods of polishing a substrate comprising the use of the polishing pads and a method of producing the polishing pads.

Abstract: A bonded abrasive article includes, on a total weight basis: 30 to 37 percent of ceramic-coated blue fused aluminum oxide particles; 30 to 37 percent of non-seeded sol-gel alumina-based abrasive particles, wherein the non-seeded sol-gel alumina-based abrasive particles are composed of crystallites of alpha alumina, magnesium alumina spinel, and rare earth hexagonal aluminate; a phenolic binder that comprises a reaction product of 8 to 12 percent by weight of curable novolac phenolic resin and 2.1 to 5.1 percent by weight of curable resole phenolic resin; 3 to 6 percent by weight of metal fibers having a length of 5 millimeters or less; 8 to 11 percent by weight of cryolite; and 0.1 to 0.3 percent by weight of electrically conductive particles. Methods of making and using the bonded abrasive article are also disclosed.

Abstract: The present invention provides a dental polishing article having excellent polishability, which can polish dental composite resin, porcelain, dental restorative and prosthetic materials and teeth at a low cost, conveniently in a short time. More specifically, the present invention provides a dental polishing article which comprises a polishing portion formed by compounding polishing grains in an elastomer binder, and the polishing portion further comprising spherical resin particles.

Abstract: A coated abrasive disc has a backing comprising a synthetic woven fabric having a first major surface with a presize disposed thereon and a second major surface opposite the first major surface and having a backsize disposed thereon. The presize comprises a reaction product of a curable presize precursor comprising: at least one epoxy resin prepared by reaction of epichlorohydrin with at least one of bisphenol A or bisphenol F, polyfunctional (meth)acrylate, novolac resin, imidazole epoxy cure catalyst, dicyandiamide, and a photoinitiator. A glass woven fabric permeated with an at least partially crosslinked saturant is secured to the second major surface by a thermoplastic laminating adhesive disposed between the second major surface of the synthetic woven fabric and the glass woven fabric. A method of making the same is also disclosed.

Abstract: An abrasive product includes a plurality of abrasive particles and a resin cured with a polythiol group. A method of preparing the abrasive product includes contacting the plurality of abrasive particles with a curable composition that includes a resin and a polythiol group, and curing the curable composition to produce the abrasive product. A method of abrading a work surface includes applying an abrasive product to a work surface in an abrading motion to remove a portion of the work surface. A curable composition includes a formaldehyde resin and a polythiol group. A formaldehyde resin is crosslinked by a polythiol group. A method of crosslinking the formaldehyde resin includes reacting the polythiol group with the formaldehyde resin.

Abstract: An open, lofty nonwoven scouring material comprising natural fibers and a method of making the scouring material is disclosed. The scouring material comprises a three dimensional nonwoven web of entangled fibers comprising natural vegetable fibers and synthetic fibers. Natural vegetable fibers comprise 20 to 80% wt. of the fibers of the web. The synthetic fibers comprise at least first synthetic fibers having a first melting point and second synthetic fibers having a second melting point that is higher than the first melting point. The first synthetic fibers entirely melt and coalesce at mutual contact point of the natural fibers and second synthetic fibers to bond the fibers together and to create voids. The bonded web has a maximum density of 60 kg/m3.

Abstract: The invention provides an isolated, particulate polyoxometalate complex comprising a water-soluble cationic polymer and a polyoxometalate compound ionically bound to the cationic polymer. The polyoxometalate compound can be an isopolyoxometalate compound, such as an isopolytungstate, or a heteropolyoxometalate compound. The invention further provides a chemical-mechanical polishing composition comprising a preformed polyoxometalate abrasive, as well as a method of chemically-mechanically polishing a substrate therewith.

Abstract: The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the polishing pad is 100 parts by mass, polymer matrix (A) includes 1,2-polybutadiene in an amount of at least 60 parts by weight, relative to 100 parts by mass of the polishing pad, component (B) includes the copolymer having a polyether block in an amount of at most 40 parts by weight relative to 100 parts by mass of the polishing pad, and the polishing pads have a surface resistivity of 2.6×107 to 9.9×1013?.

Abstract: A method for chemical-mechanical polishing two adjacent structures of a semiconductor device is provided. The method for mechanical polishing comprising: (a) providing a semiconductor device comprising a recess formed in a surface thereof, a first layer formed over the surface, and a second layer filled with the recess and formed on the first layer; and (b) substantially polishing the first and second layer with a pad and a substantially inhibitor-free slurry, wherein the pad comprising a corrosion inhibitor of the second layer.

Abstract: A method of forming a substantially homogeneous suspension of nanodiamond particles and microdiamond particles is disclosed The method includes disposing a first functional group on a plurality of nanodiamond particles to form derivatized nanodiamond particles, and combining the derivatized nanodiamond particles with a plurality of microdiamond particles and a solvent to form a substantially homogeneous suspension of the derivatized nanodiamond particles and microdiamond particles in the solvent. A method of making an article is also disclosed. The method includes forming a superabrasive polycrystalline diamond compact by combining: a plurality of derivatized nanodiamond particles, a plurality of derivatized microdiamond particles having an average particle size greater than that of the derivatized nanodiamond particles, and a metal solvent-catalyst. The method also includes combining the polycrystalline diamond with a substrate comprising a ceramic.

Abstract: A substantially homogeneous particle mixture is disclosed. The mixture includes a plurality of derivatized nanodiamond particles comprising a plurality of first functional groups. The mixture also includes a plurality of microdiamond particles, wherein the derivatized nanodiamond particles and microdiamond particles comprise a substantially homogeneous particle mixture. The mixture may also include a plurality of third particles comprising nanoparticles not identical to the derivatized nanodiamond particles, or a plurality of microparticles not identical to the microdiamond particles, or a combination thereof, and the derivatized nanodiamond particles, derivatized microdiamond particles and third particles comprise the substantially homogeneous particle mixture.

Abstract: A lapping carrier (110) including a base carrier (112) having first and second major surfaces and at least one aperture for holding a workpiece extending from the first major surface to the second major surface, the aperture circumference defined by a third surface of the base carrier, at least a portion of the first and/or second major surfaces including a polymeric region having at least the following adhesion promoting layers: (a) a primer layer (116) including at least one of a phenolic resin or a novolac resin; (b) a tie layer(115) adjoining the primer layer(116), the tie layer(115) including at least one of an amino-functional epoxy resin or a hydroxyl-functional epoxy resin; and (c) a polymeric layer (114) adjoining the tie layer (115) on a side opposite the primer layer(116), the polymeric layer(116) including an isocyanate-functional polymer. Also described are methods of making and using the carrier.

Abstract: A method of forming a polycrystalline diamond comprises derivatizing a nanodiamond to form functional groups, and combining the derivatized nanodiamond with a microdiamond having an average particle size greater than that of the derivatized nanodiamond, and a metal solvent-catalyst. A polycrystalline diamond compact is prepared by adhering the polycrystalline diamond to a support, and an article such as a cutting tool may be prepared from the polycrystalline diamond compact.

Abstract: A composition for removing a photoresist layer and a method for using it are disclosed. The composition comprises a chemical portion which includes water and chemical constituents dissolving or softening the photoresist layer and a mechanical portion which is abrasive particles. Using the composition and the method according to the present invention can decrease the conventional two steps of removing a photoresist layer process to one step, thereby simplifying the procedure, shortening the removing time and reducing the cost. The chemical constituents in the composition according to the present invention are of low toxicity and flammability and the amount used is small, which makes it more friendly with the environment and decreases the expense of disposing the waste.

Abstract: A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles and a nanoparticle binder. Free abrasive products, bonded abrasive products, and the particulate material also contain aggregates.

Abstract: A structured abrasive article comprises a backing with a topographically structured abrasive layer secured thereto. The topographically structured abrasive layer comprises precisely-shaped abrasive composites. A solid overlayer comprising eroding particles with a Mohs scale hardness of at least 4 and a water-soluble polymer is disposed on at least a portion of the topographically structured abrasive layer. Methods of making and using the structured abrasive articles are also disclosed.

Abstract: This invention relates to methods for plate dressing using slurry charged with abrasives and soft polymeric or metallic micro-nano spheres additives to produce substantially uniform abrasive height. Additionally, methods for plate dressing using slurry charged with abrasives and self-assembled polymers to produce substantially uniform abrasive height are disclosed.

Abstract: The invention provides a composition for slicing a substrate using a wire saw wherein the composition comprises a liquid carrier and an abrasive. The invention further provides methods of slicing a substrate using a wire saw and a composition.

Abstract: The present invention provides an aqueous wiresaw cutting fluid composition that reduces the amount of hydrogen produced during a wiresaw cutting process. The composition is comprised of an aqueous carrier, a particulate abrasive, a thickening agent, and a hydrogen suppression agent.

Abstract: A surface-modified abrasive grain includes an abrasive grain as a substrate, and a film on the abrasive grain that includes a relatively hydrophilic silane component and a relatively hydrophobic silane component. The film can be a single film layer or multiple film layers, wherein a film layer most proximal to the abrasive grain has a predominately hydrophilic silane component, and a film layer more distal to the abrasive grain includes predominately a relatively hydrophobic silane component. Coated abrasive products and bonded abrasive products include the surface-modified abrasive grains.

Abstract: A polishing pad and fabricating method thereof includes a polishing pad body and at least a compressibility-aiding stripe. The compressibility-aiding stripe is buried in the polishing pad body and has a larger compressibility than that of the polishing pad body.

Abstract: A polishing pad with first plural concave portions regularly allocated with prescribed spacing or/and a groove formed on the surface of the polishing pad; and a second concave portion randomly allocated without corresponding to the first plural concave portions or/and the groove formed on the surface of the polishing pad.

Abstract: Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.

Abstract: A flat or center depressed abrasive grinding wheel, comprising an abrasive discoidal element which is associable, substantially coaxially, with the free end of a rotating shaft of a grinder, having at least one substantially central through hole, a first face which can be arranged, in the assembly configuration, so as to be substantially directed toward the grinder and which forms the back of the discoidal element, and a second face, which is opposite to the first face. The discoidal element comprises at least one first layer of a discoidal abrasive mix defined at the first face and at least one second layer of discoidal abrasive mix defined at least one portion of the second face. The first and second layers of abrasive mix are mutually superimposed and jointly associated. The second layer of abrasive mix has an inside diameter that is substantially larger than the diameter of the through hole.

Abstract: This invention provides a painted surface treating composition which includes a dispersion medium and an abrasive dispersing in the dispersion medium, and said abrasive has an average particle diameter of 12-55 ?m and a Mohs' hardness of 5.5-6. A painted surface treating method and a painted surface patching method using this painted surface treating composition are also provided.

Abstract: The invention provides fumed silica comprising aggregates that have an aggregate size and a surface area that satisfy particular formulas relating aggregate size to surface area, as well as aggregates that exhibit particular viscosity, power law exponent index, and/or elastic modulus characteristics when dispersed in liquid media. The invention also provides processes of preparing such fumed silica by combining a silica precursor with a stream of combustible gas, combusting the stream, and producing a stream of combusted gas and fumed silica particles, wherein dopants are introduced, the time/temperature profile, or history, of the stream of combusted gas and fumed silica particles is adjusted to allow for post-quench aggregate growth, and/or additional silica precursor is introduced into the stream of combusted gas.