Abstract: The invention provides a chemical-mechanical polishing pad comprising a polymeric matrix and 0.1-15 wt. % of metal oxide particles. The polymeric matrix has pores, the metal oxide particles are uniformly distributed throughout the pores, and the metal oxide particles have a specific surface area of about 25 m2/g to about 450 m2/g. The invention further provides a method of polishing a substrate with the polishing pad.

Abstract: The surface(s) of a polishing pad for polishing an object has a first portion including hydrophilic material and a second portion including hydrophobic material. The first portion of the polishing surface is located in a first region of the polishing pad and the second portion of the polishing surface is located in a second region of the polishing pad juxtaposed with the first region in the radial direction of the pad. The hydrophilic material may be a polymer resin that contains hydrophilic functional groups having OH and/or ?O at bonding sites of the polymer. The hydrophobic material may be a polymer resin that contains hydrophobic functional groups having H and/or F at bonding sites of the polymer. The polishing pad is manufactured by extruding respective lines of the hydrophilic and hydrophobic materials. The extruders and a backing are moved relative to each other such that the lines form concentric rings of the hydrophilic and hydrophobic materials.

Abstract: A polyurethane adhesive composition, formed by combining a non-blocked urethane prepolymer and a polymeric polyol, is used for preparing a coated abrasive tool. The polyurethane adhesive composition is applied over a substrate to thereby form a polyurethane-adhesive-composition-coated substrate. Curing the polyurethane-adhesive-composition-coated substrate forms a polyurethane-adhesive-coated substrate. An abrasive material is applied over the substrate at a time selected from the group consisting of prior to, after, and simultaneously with, the application of the polyurethane adhesive composition to the substrate, to thereby form the coated abrasive tool. The coated abrasive tool preferably includes a polyurethane adhesive resin coating over the substrate, the resin coating being formed from a polymerization reaction of a non-blocked urethane prepolymer and a phenoxy resin.

Abstract: An abrasive article, such as a structured abrasive article, can be treated by subjecting it to plasma whereby the outer surface can be eroded exposing at least a portion of the abrasive particles dispersed within a cross-linked binder forming the abrasive composites. Depending on the process conditions for the plasma treatment, it is possible to erode only a small portion or substantially all of the cross-linked binder from the outer surface. Thus, the initial cut-rate of the abrasive article can be controlled since it is possible to precisely control the degree, height, or area of the exposed abrasive particles.

Abstract: A coated abrasive article includes a backing and fused alumina-zirconia abrasive grains attached to the backing with a binder. The fused alumina-zirconia abrasive grains include between about 35 wt % and about 45.5 wt % ZrO2+HfO2, between about 43.7 wt % and about 65 wt % Al2O3, less than about 0.8 wt % SiO2 and less than about 10 wt % other oxides. The fused alumina-zirconia abrasive grains simultaneously satisfy both a granulometric and densimetric condition.

Abstract: A polishing sheet suitable for precise polishing is produced by arranging polishing particles as a single particle layer on a base sheet and includes a base sheet and a polishing layer made of polishing particles and a binder resin for fixing the polishing particles that are arranged as a single particle layer. The polishing particles protrude partially from the surface of the binder resin, being covered or not covered with a thin film of the binder resin.

Abstract: A plastic soft composition is formed of soft base material constantly provided with plasticity, porous fine particles for polishing contained in the base material, and the like, and a polishing process and a coating process are performed to a painted surface and the like using the plastic soft composition. The fine particles for polishing are impregnated with a coating agent (a surface protective agent) added with an activator which is emulsified by contact with water, and the coating agent is held in concave portions formed in the fine particles. Both polishing work and coating work are achieved by sliding the plastic soft composition on a painted surface by a palm pressure of a user.

Abstract: The present invention relates to an abrasive tool, of the type suitable to be mounted on a machine tool, comprising at least a bearing structure with abrasive material, the said bearing structure being provided with at least a grid (6) with abrasive material, the grid (6) partially protruding or emerging from a body (7) without abrasive material.

Abstract: In a polishing composition, the concentration of one of either sodium ions or acetate ions is 10 ppb or less, or the concentrations of sodium ions and acetate ions are 10 ppb or less. The polishing composition preferably contains a water soluble polymer such as hydroxyethylcellulose, an alkali such as ammonia, and abrasive grains such as colloidal silica. The polishing composition is mainly used in polishing of the surfaces of semiconductor wafers such as silicon wafers, especially used in finish polishing of the surfaces of such wafers.

Abstract: Described is a color-stable abrasive article that includes a phenolic resin binder; a color stabilizer, a colorant, and abrasive grains. The color stabilizer includes at least one acrylate. The color-stable abrasive article is formed by a method including the steps of blending a resole and a color stabilizer to form a resole composition; contacting a plurality of abrasive particles with the resole composition; and curing the resole composition to produce the color-stable abrasive article. Thus provided are color stabilized phenolic bound abrasives and a method for making such abrasives that resist color change over time and upon exposure to high temperature and maintain the mechanical strength of a phenolic resin.

Abstract: An aspect of the present disclosure relates to a chemical mechanical planarization pad including a first domain and a second continuous domain wherein the first domain includes discrete elements regularly spaced within the second continuous domain. The pad may be formed by forming a plurality of openings for a first domain within a second continuous domain of the pad, wherein the openings are regularly spaced within the second domain, and forming the first domain within the plurality of openings in second continuous domain. In addition, the pad may be used in polishing a substrate with a polishing slurry.

Abstract: A customizable sanding clay kit in accordance with the principles of the invention includes an aggressive flexible sanding composite and a mild flexible sanding composite. The aggressive flexible sanding composite may have a level of coarseness approximately equal to sandpaper grit of between about 600 and about 800, while the mild flexible sanding composite may have a level of coarseness approximately equal to sandpaper grit of between about 2,000 and about 2,500. The invention also includes a method of removing dirt or contamination from a surface, or flattening surface irregularities, which includes kneading together selected amounts of the aggressive flexible sanding composite and the mild flexible sanding composite to achieve a combined flexible sanding composite, and rubbing the combined flexible sanding composite against the surface repeatedly until the dirt or contamination is diminished, or until the surface irregularities are flattened.

Abstract: A flexible sanding composite in accordance with the principles of the invention includes about 10% to about 70% by weight liquid component, such as polybutene and/or oleic acid; about 30% to about 80% by weight abrasive material including calcium carbonate and aluminum oxide; and about 0% to about 5% by weight synthetic rubber. The invention also includes a method of removing dirt or contamination from a surface, or flattening surface irregularities, which includes rubbing the flexible sanding composite against the surface repeatedly until the dirt or contamination is diminished.

Abstract: A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.

Abstract: A polishing slurry for semiconductor planarization containing cerium oxide particles and water, wherein the content of the cerium oxide particles having a diameter of 3 ?m or more is 500 ppm or less (weight ratio) in a solid, preferably 100 ppm or less and it is more preferable that D99 (99% by volume of the whole particles in polishing slurry) of the cerium oxide particles is 1 ?m or less. The polishing slurry can reduce the generation of scratches, and can polish a surface of the semiconductor substrate in the wiring formation process of semiconductor device precisely at a high speed.

Abstract: The invention relates to a structure based on glass fiber coated with a resin composition designed to reinforce bonded abrasive articles, the resin composition being characterized in that it comprises the following constituents in the proportions indicated, expressed in percentage by weight of solid matter: 75 to 98% of a mixture of at least one novolac having a glass transition temperature lower than or equal to 60° C. and at least one novolac having a glass transition temperature above 60° C., 0.5 to 10% of at least one wax, 0 to 3.5% of at least one plasticizing agent. The invention also relates to the resin composition suitable for producing the reinforcing structure and bonded abrasive articles incorporating such a structure, in particular abrasive grinding wheels.

Abstract: A method for improving the mechanical hardness of polymer particles is provided, the method comprising subjecting the polymer particles to a thermal cycle of heating and subsequently cooling. The method is applicable for use with combinations of preferably three monomers, the monomers having hydrophilic and hydrophobic groups in their polymer chain in order to achieve preferential orientation of the polymer chains in a polar solvent after applying the heating cycles of the invention (for example, but not limited to, polymethylmethacrylate and polystyrene based terpolymers and copolymers). Polymeric abrasives used in slurry compositions for polishing copper and their use in a chemical mechanical polishing method are also provided.

Abstract: A bonded abrasive tool includes a bonded abrasive body having a bond matrix material comprising an organic bond material, abrasive grains contained within the bond matrix material, and chopped fiber bundles within the bond matrix material. The tool further has a porosity within the bonded abrasive body, wherein a majority of the porosity comprises pores surrounding the chopped fiber bundles.

Abstract: An abrasive article with improved packing density and mechanical properties and method of making are disclosed. A method of making an abrasive mix with improved processability facilitates improved packing density, resulting in abrasive articles with improved mechanical properties.

Abstract: A macro-porous abrasive article includes a spun lace substrate having a macro-porous structure and a coating. The coating is made of a resin binder and abrasive aggregates. The abrasive aggregates are formed from a composition of abrasive grit particles and a nanoparticle binder. The coating is at least partially embedded in the substrate. A method for making the macro-porous abrasive article includes combining abrasive aggregates of abrasive grit particles and a nanoparticle binder with a resin binder to form a slurry. The slurry is applied to a macro-porous support structure so that the slurry at least partially penetrates the substrate. The resin is then cured to bond the aggregate grains to the substrate.

Abstract: A novel nodular silica sol adapted to use as a polishing material for polishing, for instance, CMP. The nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r?) converted to that of an equivalent sphere computed from an average specific surface area measured by means of the nitrogen absorption method (r/r?, referred to as “association ratio”) in a range from 1.2 to 10, the particle diameter (r?) in a range from 5 to 200 nm, and the specific surface area in a range from 13 to 550 m2/g. The nodular silica particles have heterogeneous forms, and contents of Ca and Mg contained in the nodular silica particles are below 1000 ppm against SiO2 respectively.

Abstract: The present invention relates to a polishing pad having an insulation layer and a method for making the same. The polishing pad includes a bottom layer, an insulation layer, and an abrasive layer. The bottom layer includes a fabric layer wrapped in a high polymer. The insulation layer is disposed on the bottom layer. The abrasive layer is disposed on the insulation layer. The abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells. The insulation layer can prevent the slurry from infiltrating into the bottom layer during the polishing processs to improve the polishing effect and quality.

Abstract: Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protruding out of the solidified organic material layer is provided. The method may include securing a plurality of superabrasive particles in the solidified organic material layer in an arrangement that minimizes mechanical stress impinging on the protruding portion of any individual superabrasive particle when used to abrade a work piece. As an example, the arrangement of the plurality of superabrasive particles may be configured to uniformly distribute frictional forces across substantially each superabrasive particle.

Abstract: The present invention incorporates at least one thermoplastic or elastomeric polymer in abrasive flow machining media either as the sole or as one of the polymeric constituents. The presence of thermoplastic polymer imparts a greater elastomer characteristic (elasticity, compression resistance, increased relaxation times) as contrasted with traditional media. Enhanced elastomeric characteristics enable more uniform abrasive machining. In a particularly preferred embodiment, silicone- or polyorganosiloxane-based medium contains elastic silicone rubber particles dispersed therethrough to achieve increased relaxation times comparable to those attainable with the inclusion of a thermoplastic polymer.

Abstract: Abrasive pads/scrubbers used for cleaning utensils and the like which usually involve rubbing of the pad along with some applied detergent/cleansing agent on the surface to be cleaned. More particularly, the invention is directed to an all purpose abrasive pad obtained of treated white coir which would be user friendly, durable with the loose fibers effectively interlocked and also having glossy, flexible, non-odour and tack free touch abrasive texture. Unlike the conventional synthetic fibers and metallic wool based abrasive pads, the treated white coir abrasive pad is found to be hygienic and free of any odour or be prone to microbes and advantageously durable maintaining its desired shape and texture even after repeated use and applications. The simple natural fibre based abrasive pads having effective lifespan and also safe and hygienic favoring handling conditions in various applications.

Abstract: Described is a color-stable abrasive article that includes a phenolic resin binder; a color stabilizer, a colorant, and abrasive grains. The color stabilizer includes at least one carboxylic acid ester. The color-stable abrasive article is formed by a method including the steps of blending a resole and a color stabilizer to form a resole composition; contacting a plurality of abrasive particles with the resole composition; and curing the resole composition to produce the color-stable abrasive article. Thus provided are color stabilized phenolic bound abrasives and a method for making such abrasives that resist color change over time and upon exposure to high temperature and maintain the mechanical strength of a phenolic resin.

Abstract: Foam for making pads and belts with controlled, reproducible microcellular structure and method of making such foam in a fast and efficient manner. Under constant pressure and temperature, a prepolymer is mixed with the nucleation surfactant in a tank in the presence of a frothing agent metered into the tank by way of a dip tube or sparge. The nitrogen gas is sheared into small bubbles and is drawn off from the headspace of the tank creating a continuous flow of nitrogen. The pressure of the tank may vary from any absolute pressure down to near complete vacuum, thereby all but eliminating the pressure requirement. The froth of the present invention has a more consistent cell structure and increased cell count.

Abstract: The invention relates to aqueous pigment preparations containing (A) at least one organic and/or inorganic pigment, (B) a dispersant of formula (I) or (II), or mixtures of the dispersants of formulas (I) and (II), (C) optionally wetting agents, (D) optionally other surfactants and/or dispersants, (E) optionally one or more organic solvents or one or more hydrotropic substances, (F) optionally other additives used conventionally for the production of aqueous pigment dispersions and (G) water.

Abstract: A method for manufacturing a polishing pad containing substantially spherical cells and having high thickness accuracy includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition from a single discharge port to a substantially central portion in the width direction of a face material A, while feeding the face material A; laminating a face material B on the cell-dispersed urethane composition; then uniformly adjusting the thickness of the cell-dispersed urethane composition by thickness adjusting means; curing the cell-dispersed urethane composition with the thickness adjusted in the preceding step without applying any additional load to the composition so that a polishing sheet including a polyurethane foam is formed; and cutting the polishing sheet.

Abstract: An abrasive slurry, abrasive article, and method is provided for forming an abrasive coating on a surface of a backing. The abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the continuous liquid phase, and a second discontinuous phase of binder precursor particles dispersed in the continuous liquid phase, so that the continuous liquid phase carries the first and second discontinuous phases. A coated abrasive article is formed by coating the abrasive slurry onto the surface of the backing, and then removing the continuous phase.

Abstract: The present invention relates to a brush filament for industrial applications and a brush made with the same. The brush filament comprises a matrix resin, a hydrolytic stabilizer and/or an acid-absorbing agent, and an antioxidant. The brush filament of the invention is suitable for industrial applications, in particular, for grinding, polishing and cleaning of marbles and/or metals after they have been cut.

Abstract: A method of manufacturing polymer-coated particles is useful for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates. First it provides a dispersion of particle cores in a non-aqueous solvent. Then introducing a polymeric precursor into the dispersion to react the polymeric precursor forms a polymer. The polymer coats at least a portion of the surface of the particle cores with the polymer and forms the polymer-coated particles having a solid outer polymeric shell. Substituting the non-aqueous solvent with water forms an aqueous mixture containing the polymer-coated particles. And it forms an aqueous chemical mechanical polishing formulation with the polymer-coated particles without drying the polymer-coated particles.

Abstract: Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.

Abstract: The invention relates to a pigment preparation containing (a) 50-99 percent by weight of at least one pigment, (b) 1 to 50 percent by weight of an additive based on polyalkylene glycols, and (c) 0 to 10 percent by weight of an auxiliary agent from among the group comprising fillers, fire retardants, preservatives, light-stability agents, pigmentary and non-pigmentary dispersing agents, surfactants, antioxidants, foam inhibitors, resins, and antistatic agents, the percentages being in relation to the total weight of the pigment preparation. The additive that is based on polyalkylene glycols corresponds to formula Z?-[-(AO—)n1—B-T-X—Y]m—Z (1), wherein AO represents a C2-C10 alkyleneoxy unit, B represents a C2-C10 alkylene radical, and T represents —NR—, X represents one of the groups (formula), and Y represents a chemical bond or —NR3—.

Abstract: A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuK?1 ray (?=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2? (? is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2? range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2? range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2? range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.

Abstract: A structured abrasive article comprises an at least translucent film backing and an abrasive layer disposed on the backing. The abrasive layer comprises a plurality of shaped abrasive composites. The shaped abrasive composites comprise abrasive particles dispersed in a binder. The abrasive particles consist essentially of ceria particles having an average primary particle size of less than 100 nanometers. The binder comprises a polyether acid and a reaction product of components comprising a carboxylic(meth)acrylate and a poly(meth)acrylate, and, based on a total weight of the abrasive layer, the abrasive particles are present in an amount of at least 70 percent by weight. Methods of making and using the structured abrasive article are also disclosed.

Abstract: Disclosed herein is a diamond tool for cutting a workpiece and a method of manufacturing the same. The diamond tool includes a shank and a segment coupled to the shank. The segment includes a tape having a plurality of inserting sections formed on a surface of the tape, and diamond particles inserted into the inserting sections and bonded to the tape by pressure sintering. The inserting sections are formed in the tape corresponding to desired arrangement locations of the diamond particles. The diamond particles can be arranged in various patterns in the segment, thereby achieving simplification of the process, which allows process automation and reduces manufacturing costs.

Abstract: A water-based cutting fluid includes a water-soluble polymer dissolved in water and ceramic powder dispersed in the water. The cutting fluid further includes water glass. Further, the water-soluble polymer is one selected from a group consisting of polyvinyl alcohol (PVA), cellulose, methyl cellulose, carboxymethyl cellulose (CMC), starch, or a combination thereof.

Abstract: Disclosed is a synthetic grinding stone used for polishing of silicon wafer, which is composed of a structure comprising cerium oxide fine particles as abrasive grain, a resin as a binder, a salt as a filler and a nano diamond as an additive. This synthetic grinding stone is characterized in that the purity of the cerium oxide is not less than 60% by weight, the content of the salt as a filler is not less than 1% but not more than 20%, the volume content of the nano diamond as an additive is not less than 0.1% but less than 20% relative to the total volume of the structure, and the porosity as the volume fraction relative to the total volume of the structure is less than 30%.

Abstract: The invention is a slurry for slicing a silicon ingot, containing a basic material, such as an alkali metal hydroxide, abrasive powder and water, in which the slurry contains the basic material in an amount of from 2 to 6% by mass and glycerin in an amount of from 25 to 55% by mass, based on a total mass of components of the slurry excluding the abrasive powder.

Abstract: A polishing composition contains a compound represented by the general formula (1) below and abrasive grains. In the general formula (1), X represents a residue of polyether polyol (having a polyether chain containing an oxyethylene group in an amount of 20 to 90% by mass) derived from a compound having an active hydrogen atom and an alkylene oxide; m represents an integer of 2 to 8, which is equal to the number of hydroxy groups contained in a single polyether polyol molecule; Y and Z represent a lower alcohol residue to which ethylene oxide or propylene oxide is added by addition polymerization, an alkyl group or an alkylene group, respectively; and n is an integer of 3 or more.

Abstract: In a rotating grinding- or cutting tool, in particular a grinding wheel or grinding roller, on one body, a coating of abrasive material, e.g. cubic boron nitride (CBN) or diamond is applied. The body (2, 12, 22, 32, 42) has two side walls (2a, 12a, 22a, 32a, 42a; 2a, 12a, 22a, 32a, 42a) which are connected to each other on their peripheral region, with the side walls being constructed with fibre-reinforced composite, in particular carbon fibre-, glass fibre- or synthetic fibre-reinforced composite.

Abstract: A superabrasive product, such as a superabrasive tool, includes a superabrasive grain component and a porous continuous phase that includes a thermoplastic polymer component in which the superabrasive grain component is distributed. A superabrasive product precursor to the superabrasive product includes a superabrasive grain component, a bond component and a polymer blowing agent of encapsulated gas. A method of forming a superabrasive product includes combining a superabrasive, a bond component and a polymer blowing agent of encapsulated gas to form, for example, a superabrasive product precursor. The combined superabrasive, bond component and polymer blowing agent of encapsulated gas are heated to a temperature and for a period of time that causes release of at least a portion of the gas from encapsulation within the blowing agent.

Abstract: The present invention provides glass polishing compositions and methods suitable for polishing a glass substrate at a down force of about 110 g/cm2 or less. One preferred polishing composition comprises a particulate cerium oxide abrasive (e.g., about 1 to about 15 percent by weight) suspended in an aqueous carrier containing a polymeric stabilizer, e.g., about 50 to about 1500 ppm of the stabilizer, and optionally, a water soluble inorganic salt. Preferably, the particulate cerium oxide abrasive has a mean particle size in the range of about 0.35 to about 0.9 ?m. Another preferred composition comprises about 1 to about 15 percent by weight of a particulate cerium oxide abrasive characterized by a mean particle size of at least about 0.2 ?m and a purity of at least about 99.9% CeO2, on a weight basis, suspended in an aqueous carrier at a pH at least about 1 unit higher or lower than the isoelectric point (IEP) of the cerium oxide abrasive.

Abstract: A coated abrasive article comprises a fabric backing having a presize layer thereon, and an abrasive layer secured to and contacting the presize layer. The abrasive layer comprises a make layer and abrasive particles. The presize layer comprises, based on a total weight of components a) through f), a reaction product of components comprising: a) from 60 to 90 percent by weight of epoxy resin preparable by reaction of epichlorohydrin with bisphenol A; b) from 5 to 25 percent by weight of polyfunctional (meth)acrylate; c) from 10 percent by weight of aromatic acid-functional free-radically polymerizable material having an acid number up to 300; d) from 5 to 15 percent by weight of dicyandiamide; e) an effective amount of photoinitiator; and f) optionally, an effective amount of epoxy cure catalyst. Methods of making and using the same are also disclosed.

Abstract: A method of forming a coated abrasive article includes providing a composite binder and abrasive grains on a backing. The composite binder includes at least 5 wt % of a particulate filler having an average particle size of less than 100 nm. The method also includes curing the composite binder.

Abstract: Disclosed is a burnishing tape, a method of producing the same and a method of burnishing a magnetic disk with which a surface of the magnetic disk may be smoothed while contamination of a magnetic disk caused by crushed abrasive grains is prevented. A burnishing tape (1) manufactured by the method of manufacturing of the burnishing tape according to an embodiment of the invention is used to burnish the magnetic disk. The method includes: kneading and dispersing abrasive grains (5) and a binder (6) to prepare slurry; applying the slurry on the support (2) to form a coating layer; curing the coating layer to form an abrasive grain layer (3); and forming a liquid lubricant layer (4) on a surface of the abrasive grain layer (3).

Abstract: A coated abrasive article comprises a backing, optionally having at least one of a presize layer, a saturant, and a backsize layer thereon; and an abrasive layer adjacent and secured to the fabric backing. The abrasive layer may comprise a make layer, a size layer, and abrasive particles, or the abrasive particles may be dispersed in a binder. At least one of the make layer or presize layer comprises a reaction product of a binder precursor comprising from 45 to 75 percent by weight of resole phenolic resin, from 5 to 40 percent by weight of polyepoxide, from 1 to 20 percent by weight of polyfunctional (meth)acrylate, and an effective amount of photoinitiator to free-radically B-stage the binder precursor. Methods of making and using the coated abrasive article are also disclosed.

Abstract: A diamond polishing disk and a manufacturing method thereof are described. The method includes the steps as follows. A plurality of diamond particles are disposed in an accommodation unit, and each diamond particle has at least one acute polishing end. Next, a guiding mold is supplied, in which the guiding mold has a plurality of grooves. The guiding mold is pressed on the diamond particles, such that the acute polishing ends of the diamond particles are respectively inserted in the grooves correspondingly. Next, the guiding mold is removed, and then a polymer material is injected into the accommodation unit to cover the diamond particles. The polymer material is hardened. Finally, the accommodation unit is removed, so as to finish manufacturing the diamond polishing disk.

Abstract: There is provided a chemical mechanical polishing (CMP) pad including a core of a polymer shell encapsulating a liquid organic material having one of a boiling point and a decomposition point of 130° C. or more in a polymer matrix, the CMP pad having open pores formed by the core on a polishing surface thereof, and a method of producing the CMP pad. The CMP pad having a high hardness and a high density improves polishing efficiency and flatness of a wafer and maintains a uniform size of the core, thereby producing pads having high polishing efficiency and stable polishing performance.