Abstract: Describes novel polyfunctional thiiranes. Also described are polymerizable compositions comprising such novel polyfunctional thiiranes, and polymerizates, e.g., optical lenses, prepared therefrom. The described polymerizates may have a refractive index of at least 1.6, and an Abbe number of at least 27.

Abstract: A composition suitable for use in dental medicine and/or dentistry polymerizable by cationic polymerization consists of one or more epoxy compounds, a plasticizer, a catalyst for hardening by ring opening, a catalyst for hardening by light and an accelerator consisting of a non alkaline tertiary amine. At radiation with a light having a wavelength of 340-500 nm the composition hardens practically free of contraction and adhesiveness.

Abstract: Disclosed herein are radiation-curable polymers, a method of preparing radiation-curable polymers and compositions containing radiation-curable polymers. Radiation-curable polymers and compositions containing radiation-curable polymers are useful as coatings and adhesives.

Abstract: An adhesive composition that includes a mixture of a cationically polymerizable component, an acidic component, and an initiator is provided. Preferably, the initiator comprises an iodonium salt, a visible light sensitizer, and an electron donor compound, wherein the initiator has a photoinduced potential greater than or equal to that of N,N-dimethylaniline in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. This adhesive composition is cationically polymerizable and is able to bond to hard tissue and cationic restorative materials upon curing.

Abstract: Disclosed is a novel positive-working chemical-amplification photoresist composition capable of giving an extremely finely patterned resist layer in the manufacturing process of semiconductor devices. The photoresist composition comprises: (A) 100 parts by weight of a copolymeric resin consisting of from 50 to 85% by moles of (a) hydroxyl group-containing styrene units, from 15 to 35% by moles of (b) styrene units and from 2 to 20% by moles of (c) acrylate or methacrylate ester units each having a solubility-reducing group capable of being eliminated in the presence of an acid; and (B) from 1 to 20 parts by weight of a radiation-sensitive acid-generating agent which is an onium salt containing a fluoroalkyl sulfonate ion having 3 to 10 carbon atoms as the anion such as bis(4-tert-butylphenyl) iodonium nonafluorobutane sulfonate.

Abstract: An object of the present invention is to completely cure a resin composition highly capable of screening energy radiation, such as a carbon fiber-reinforced composite material (CFRP), simply by exposing the resin composition to UV radiation in the presence of a specific photopolymerization initiator system (reaction catalyst system) comprising at least two components. To this end, the present invention provides a resin curing method wherein, when a resin composition is exposed to energy radiation typified by UV radiation, another kind of first energy than the energy from an energy radiation source is autogenously generated within the resin, and the same kind of second energy is successively generated by the autogenously generated energy, so that the resin composition is cured by means of the first and second energies, or both the first and second energies and the energy from the energy radiation source, whether or not the resin composition contains a substance capable of screening energy radiation.

Abstract: An epoxy-amine composition includes an epoxy resin, an amine curative and a latent catalyst. The latent catalyst does not cause the instant acceleration of the reaction between epoxides and amines. In the presence of radiation, the latent catalyst generates an active catalyst that accelerates/initiates the cure process of the epoxy-amine composition.

Abstract: By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.

Abstract: The invention relates to primer coating compositions exhibiting very good adhesion properties on a large variety of substrates, in particular plastic substrates such as ophthalmic lenses made of organic glasses and which also impart good impact resistance properties to the thus coated substrates. The invention also concerns substrates coated with these primer coating compositions as well as a method for making such coated substrates.

Abstract: Photoactivatable coating composition comprising at least one photoinitiator and a base-catalysed polymerisable or curable organic material comprising at least one polyisocyanate and at least one compound containing isocyanate reactive groups, wherein the isocyanate reactive groups comprise at least one thiol group and the photoinitiator is a photolatent base. Preference is given to a coating composition wherein the photolatent base is selected from the group of N-substituted 4-(ortho-nitrophenyl) dihydropyridine, a quaternary organo-boron photoinitiator, and an &agr;-amino acetophenone. The composition additionally may comprise an organic acid, a metal complex and/or a metal salt as a cocatalyst and/or a sensitiser selected from the group of thioxanthones, oxazines, rhodamines, and preferably from the group of benzo-phenone and derivatives thereof.

Abstract: The invention discloses methods for making foams by photopolymerizing emulsions comprising a reactive phase and a phase immiscible with the reactive phase components. Foams made from water-in-oil emulsions, including high internal phase emulsion are disclosed. Articles and uses for the foams are also described.

Abstract: A radiation curable adhesive composition which includes:

Abstract: An adhesive containing a) a compound containing at least one vinyl ether group which has a molecular weight of more than 400 and b) a photoinitiator which initiates a polymerization of component A after exposure to light with a wavelength of 100 to 600 nm is useful for the production of a film laminate.

Abstract: A stabilizer for thermally stabilizing an organic borate salt represented by formula (1) is disclosed, comprising a compound having one or two nitrogen-containing 5- or 6-membered heterocyclic ring having a double bond within the ring, a compound having a primary, secondary or tertiary amino group, or a compound having a thiol group. Also disclosed are a photosensitive composition comprising the stabilizer, an organic borate salt and if desired, a sensitizing dye or further a bisimidazole compound; a polymerizable composition comprising the photosensitive composition having added thereto at least one monomer having one or more ethylenically unsaturated bond and if desired, a high molecular polymer or further a pigment; and a colored pattern formed by using the polymerizable composition.

Abstract: The invention disclosed includes a coating composition for siliceous surfaces. The coating includes at least one component from the group consisting of poly(alkoxy)silane, poly(halo)silane, alkoxysilane, halosilane, and mixtures thereof and a catalyst compound which generates a proton to hydrolyze the component when exposed to radiation. Preferably, the catalyst is a photo-acid. The invention also includes a method of coating the optical fiber. The aforementioned coating is applied to an exterior surface of the fiber. A proton is generated to promote the hydrolysis of the component. The invention further includes a method of accelerating adhesion between the exterior surface of the article and the coating. The inventive coating is applied to the surface of the fiber and the coating is exposed to a radiation source.

Abstract: This invention relates to &agr;-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetraaryl- or triarylalkylborate salts which can be photochemically converted into amines, imines or amidines as well as to a process for their preparation. This invention also relates to base-polymerisable or crosslinkable compositions comprising these &agr;-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetra- or triarylalkylborate salts, to a process for carrying out photochemically induced, base-catalysed reactions as well as to their use as photoinitiators for base-catalysed reactions.

Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)—Q−—X2(Z2)—R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S═Z3, S═Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ═O, ═NC≡N, ═C(C≡N)2, ═NS(═Z)2R6 or ═C[S(═Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame. The compounds are useful for producing ion conducting materials or electrolytes, as catalysts and for doping polymers.

Abstract: A method of forming a film laminate uses an adhesive containing at least three components A, B and C. The method includes providing a radiation curable adhesive that contains a) a compound bearing at least one epoxy group, b) a compound with at least three OH groups and a molecular weight below 400 and c) a photoinitiator which initiates a polymerization of components a) and b) after exposure to light with a wavelength of 100 to 600 nm.

Abstract: A lithographic printing plate precursor is disclosed, comprising a support having provided thereon a photosensitive layer containing at least (A) an infrared ray absorbing agent, (B) an onium salt, (C) a radically polymerizable compound, (D) a binder polymer and (E) an organic dye or the precursor thereof capable of undergoing change in color tone upon exposure.

Abstract: This invention relates to a curable coating composition which comprises: (A) a compound represented by the formula wherein in formula (A-I) each R independently is hydrogen or a hydrocarbyl group of 1 to about 8 carbon atoms, and n is a number that is about 4 or higher; and (B) a reactive vinyl or unsaturated monomer or oligomer, provided said reactive vinyl or unsaturated monomer or oligomer is not the same as (A). In one embodiment the inventive composition further comprises (C) a photoinitiator. In one embodiment, the inventive composition further comprises (D) a thermal initiator. In one embodiment, the inventive composition further comprises (E) a latent acid catalyst. The invention also relates to a method of coating a substrate utilizing the foregoing coating composition, as well as to a substrate coated in accordance with foregoing method.

Abstract: Radiation curable adhesive comprising an epoxidized block copolymer, a saturated block copolymer and/or a rosin derived alcohol, and a photoinitiator.

Abstract: The photoacid generator according to the present invention is represented by the general formula (1): wherein R1 and R2 are respectively H, OH or alkyl or alkoxy group of C1-5 and are the same or different, n is an integer from 1 to 3, and Ar1 is a naphthalene unit. The photosensitive resin used in a composition of the invention is represented by the general formula (2): wherein X is a tetravalent aromatic or aliphatic organic radical, Y is a bivalent aromatic or aliphatic organic radical, and R3 and R4 independently are H or a monovalent aliphatic organic protecting group removable by acid.

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: Provided is a positive photoresist composition which comprises (A) a resin which contains a repeating unit represented by formula (I) shown below and a repeating unit represented by formula (II) shown below and whose solubility in an alkaline developing solution increases by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or radiation, wherein R1, R2 and R3 each independently represents an alkyl group, a haloalkyl group, a halogen atom, an alkoxy group, a trialkylsilyl group or a trialkylsilyloxy group; and n represents 0 or 1, wherein M represents an atomic group necessary for forming an alicyclic structure, which may be substituted, together with the connected two carbon atoms (C—C); and R11 and R12 each independently represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group which may be substituted.

Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.

Abstract: A resist film is formed by applying, on a semiconductor substrate, a chemically amplified resist including an acid generator of an onium salt having a halogen atom both in the cation and the anion thereof. The resist film is irradiated with a F2 laser beam with a wavelength of a 157 nm band or an Ar2 laser beam with a wavelength of a 126 nm band for pattern exposure, and the resist film is developed after the pattern exposure, thereby forming a resist pattern.

Abstract: A polymer used in a chemically amplified resist is represented by the following formula: wherein R1, R3 and R5 are each independently selected from the group consisting of —H, and —CH3; R2 is selected from the group consisting of t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; R4 is selected from the group consisting of —H, —CH3, t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; x is an integer ranging from 1 to 4; and wherein l, m, and n are selected such that l/(l+m+n) ranges from 0.1 to 0.5, m/(l+m+n) ranges from 0.01 to 0.5, and (l+m)/(l+m+n) ranges from 0.1 to 0.7.

Abstract: The present invention discloses an ultraviolet light curable mar resistant composition and method for making such a composition that may be used to produce an mar resistant layer. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the active layer after curing.

Abstract: A photo-curing ink composition comprises a photocation-polymerizable substance, a photocation polymerization initiator, and a surfactant having a functional group. The surfactant is selected and the amount thereof is adjusted so that the acid value per 100 g of the ink composition is not more than 150 mg KOH. The surfactant is selected and the amount thereof is adjusted so that the amine value per 100 g of the ink composition is not more than 23 mg KOH. The ink composition is excellent in dispersion performance, storage stability, and curing performance.

Abstract: Blends of epoxy-functional silicone polymers with vinyl ether monomers and alkylphenol compounds plus an effective amount of a suitable iodonium photocatalyst provide a radiation-curable silicone release coating composition.

Abstract: A radiation curable, flexible, paintable composition produced from epoxy compounds and one or more polyol(s) has enhanced durability, thick and thin film adhesion, resistance to mold growth and dimensional changes while reducing solvent emissions. The composition can reduce, if not eliminate, runs and drips during the thermal bake cycles which are associated with using conventional compositions in automotive applications.

Abstract: An Offset Lithographic Printing Process employing low VOC lithographic printing ink formulations containing monomeric diluents, curable by cationic polymerization in the presence of fountain solution and resin rheology modifiers compatible with cationic catalysts.

Abstract: A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the &agr;-position or a halogen atom and a photopolymerization initiator.

Abstract: The present invention provides a polymerizable composition comprising (a) an alicyclic alkane having at least one oxetanyl group and at least one epoxy group within the same molecule and (b) a compound capable of initiating cationic polymerization under irradiation of an active energy ray and/or under heat exhibits high activity in the photo- or heat-cationic ring-opening polymerization exhibiting high activity, e.g., rapid polymerizability, rapid curability, under irradiation of an active energy ray and/or under heat. The present invention also provides a polymerization product thereof.

Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.

Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF2—, wherein R1 is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an un-substituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.

Abstract: A highly reliable ink jet recording head excellent in mechanical strength, weatherability, ink resistance, and adhesion to the substrate is provided. For its production, a cationically polymerized curing product of an epoxy resin having a structural unit expressed by the following formula (I) or (II), is used as a resin material which coats an ink flow path pattern formed from a dissoluble resin on the substrate.

Abstract: Lithographic printing ink formulations compatible with cationic catalysts containing a diluent and rheology modifying resins curable by cationic polymerization in the presence of water or fountain solution.

Abstract: Onium salts of the formula (1) are novel. R1 is C1-10 alkyl or C6-14 aryl, R2 is H or C1-6 alkyl, p is an integer of 1 to 5, q is an integer of 0 to 4, p+q=5, R3 is C1-10 alkyl or C6-14 aryl, M is a sulfur or iodine atom, and “a” is equal to 3 or 2. A chemical amplification type resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and stripping, and improved pattern profile after development.

Abstract: The invention concerns the use of cross-linkable silicone compositions for fast, economical and simple impregnation and/or varnishing of flat joints (e.g. cylinder head gaskets). More precisely it concerns the use of silicone compositions cross-linkable under UV radiation, by cationic process and in the presence of specific phoinitiators selected among onium borates or organometallic complexes, of which the borate counter-anions contain at least a boron bound to at least a substituted phenyl (Me, F). The silicone liquid precursor is a polydimethylsiloxane (PDMS) substituted by cross-linking functional groups, by cationic process (Gfp) under UV of the epoxy of vinyloxy type. These Gfp are present at the rate of 0.15 to 2.0 pr kg of PDMS. The invention also relates to the method for impregnating/varnishing flat joints (e.g. cylinder head gaskets) using the specific PDMS composition+photoinitiator of borate type as well as the treated joints and the composition themselves.

Abstract: In order to offer coatings with improved resistance to solvents which can be prepared by cationic polymerization under irradiation, the choice is made of a composition comprising at least one monomer, oligomer or polymer of general formula (I): in which: A1 is chosen from polyester blocks, polyurethane blocks, hydrocarbon-comprising backbones of mono- or polycarboxylic acid and addition products of a polycarboxylic acid and of a cycloaliphatic diepoxide, m is a number from 1 to 6, R1 is a cycloaliphatic group carrying a hydroxyl group situated in the a position with respect to the oxygen atom to which R1 is bonded, R2 is a second cycloaliphatic group carrying an oxirane group situated at the chain end, and B is chosen from one or more covalent bonds, an oxygen atom and linear, branched or cyclic hydrocarbon-comprising radicals.

Abstract: Onium salts of substituted phenylmethylbenzene-sulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and peeling, and improved pattern profile after development.

Abstract: A composition useful for a thick-film negative resist comprising a mixture of at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin and at least one photoacid generator in a coating solvent, a majority amount of said coating solvent being cyclopentanone.

Abstract: A radiation sensitive mixture essentially consists of

Abstract: A composition useful for a thick-film negative resist comprising a mixture of at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin and at least one photoacid generator in a coating solvent, a majority amount of said coating solvent being cyclopentanone.

Abstract: A composition has a polymeric network that includes a porogen and a photoinitiator. The photoinitiator produces a reactive species upon irradiation, which reacts with the porogen in a degradation reaction that degrades at least some of the porogen. A method of forming a nanoporous polymer has one step in which a plurality of polymeric strands, a photoinitiator, and a porogen are provided. In a subsequent step, at least some of the polymeric strands are crosslinked to form a polymeric network that includes the porogen and the photoinitiator, and in a further step the photoinitiator in the polymeric network is irradiated to generate a reactive species that reacts with the porogen in a degradation reaction to degrade at least some of the porogen.

Abstract: The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.

Abstract: The invention relates to: 4-methylene-1,3-dioxolanes of the general formula (I) 1

Abstract: Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.

Abstract: An Offset Lithographic Printing Process employing low VOC lithographic printing ink formulations containing monomeric diluents, curable by cationic polymerization in the presence of fountain solution and resin rheology modifiers compatible with cationic catalysts.