Abstract: The present invention provides a non-resonant two-photon absorption recording material containing a non-resonant polymer two-photon absorption compound, and the non-resonant two-photon absorption recording material wherein the main chain of the non-resonant polymer two-photon absorption compound contains at least one member selected from polystyrene, polyacrylate, polymethacrylate, polyester, polyurethane, polyether and polyimide, and also provides an optical information recording medium having a recording layer containing the recording material.

Abstract: The present invention provides a water- and oil-repellent soil-resistant composition comprising (A) a fluorine-containing polymer having repeating units derived from a monomer comprising a fluorine-containing monomer and (B) a silane compound. The water- and oil-repellent soil-resistant composition comprising the fluorine-containing acrylate polymer can impart the excellent water- and oil-repellency and soil resistance to the porous substrate and is free from an organic solvent.

Abstract: The invention relates to a coating composition comprising short chain fluorinated acrylates and to the use of short chain fluorinated acrylates as levelling agents for pigmented and unpigmented coating compositions. The coating composition comprises a) a film forming binder resin, and b) a copolymer made by controlled polymerization or by conventional radical polymerization comprising a monomer (M1x) selected from unsaturated monomers out of the group of (meth)acrylates, styrenic monomers or (meth)acrylamides whereby the copolymer contains at least >30 wt % (meth)acrylates; and a monomer (M2y) selected from C1-C4-fluoralkyl(meth)acrylates; x denotes the total number of monomers M1 within the structural element (M1x): x>5, preferred, 10-1000, most preferred, 10-500; y denotes the total number of monomers M2 within the structural element (M2y): y>1, preferred, 2-20, most preferred 2-10; c) optional other conventional coating components and/or additives.

Abstract: A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent C1-20 organic group, L is a heteroatom or a single bond, A1 and A2 are each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently C1-40 alkylene, C3-40 cycloalkylene, C6-40 arylene, or C7-40 aralkylene, and A1 contains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, X1 is a single bond, —O—, —S—, —C(?O)—O—, —O—C(?O)—, —O—C(?O)—O—, —C(?O)—NR—, —NR—C(?O)—, —NR—C(?O)—NR—, —S(?O)2—O—, —O—S(?O)2—O—, —NR—S(?O)2—, or —S(?O)2—NR, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl or C6-10 aryl, Y? is an anionic group, G+ is a metallic or non-metallic cation, and y is an int

Abstract: Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.

Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

Abstract: A stain remover which comprises a copolymer made from as essential ingredients (a) a polymerizable monomer having a polyfluoroalkyl group with less than 8 carbon atoms and represented by the general formula H2C?CXCOO—Y—Rf and (b) a fluorine-free polymerizable monomer represented by the following general formula: H2C?CXCOO—(RO)n—X. The stain remover is effective in minimizing the amount of an organic solvent to be used. It imparts to a substrate the excellent property of removing stains therefrom and a satisfactory texture.

Abstract: Hydrophobic coating compositions are provided as are processes to coat articles with the compositions. Extremely hydrophobic coatings are provided by the compositions. Compositions that include perfluorohexyl(meth)acrylate and a branched or high Tg monomer are provided as are articles coated with the polymerization product of the composition. Methods are also provided for forming hydrophobic coatings on articles.

Abstract: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.

Abstract: A method to provide acid etch resistance to contacting a calcareous substrate with a copolymer prepared from fluorinated methacrylate, short chain branched (meth)acrylate, and (meth)acrylic acid salt and a treated substrate.

Abstract: Provided are a random wrinkle structure-formable compound, a composition including the same, a film including a random wrinkle structure, a method of forming the film, and an organic light emitting device including the film. A compound according to the present invention is coated and then, a film having a surface structure of random wrinkles may be simply formed through simple ultraviolet (UV) curing or thermosetting. When the film thus formed is used in an organic light emitting device, light generated from the organic light emitting device is scattered on surfaces of the random wrinkles to prevent light guide or total reflection, and thus, light is extracted to the outside. That is, a random structure disposed at the outside of the device performs a light extraction function and consequently, light efficiency of the organic light emitting device may be increased.

Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.

Abstract: The present invention involves a cross-linked carboxylic acid hydrophobically modified copolymer product in which cross-linked carboxylic acid is modified with a non-hydrocarbyl hydrophobe, namely, poly(dimethyl siloxane) or fluoronated alkyl methacrylates.

Abstract: A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

Abstract: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.

Abstract: A polymer comprising recurring units of butyrolactone (meth)acrylate, recurring units having a carboxyl or phenolic group which is substituted with an acid labile group, and recurring units having a phenol group or an adhesive group in the form of 2,2,2-trifluoro-1-hydroxyethyl is quite effective as a base resin for resist. A positive resist composition comprising the polymer is improved in such properties as a contrast of alkali dissolution rate before and after exposure, acid diffusion suppressing effect, resolution, and profile and edge roughness of a pattern after exposure.

Abstract: A water and oil repellent composition having excellent durability, which can impart excellent water and oil repellency to an object, even in a process at low temperatures, and which enables water and oil repellent treatment providing a soft hand. A water and oil repellent composition which comprises, as an essential component, a copolymer containing polymerization units of the following monomer (a) and polymerization units of the following monomer (b): monomer (a): an Rf group-containing monomer which forms a photopolymer having no melting point or a melting point of at most 55° C. attributable to fine crystals derived from the Rf groups and having a glass transition point of at least 20° C. monomer (b): a monomer having no Rf group and having a cross-linkable functional group.

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract: Antifouling composition containing a fluorocopolymer which contains from 30 to 70 mass % of polymerized units (a?) having a C1-6 perfluoroalkyl group, from 20 to 69 mass % of polymerized units (b?) having an alkylene oxide chain and from 1 to 10 mass % of polymerized units (c?) having an amino group, and which has anionic groups at its main chain terminals. Method of making.

Abstract: There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.

Abstract: Disclosed is a fluorine-containing polymer having (A) repeating units derived from a fluorine-containing acrylate monomer, and (B) repeating units derived from an amino group-containing monomer, wherein the fluorine-containing polymer is water-soluble. The fluorine-containing polymer has sufficiently high solubility, and can impart high water repellency, high oil repellency and high soil resistance to a porous substrate.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

Abstract: Disclosed is a fluorine-containing copolymer having sufficient stability in water, which is capable of providing paper with sufficient oil resistance. The fluorine-containing polymer contains, as essential components, (a) a fluorine-containing monomer represented by general formula (I) CH2?C(—X)—C(?O)—Y—[—(CH2)m—Z—]p—(CH2)n—Rf (wherein X represents a hydrogen atom; Y represents —O— or —NH—; Z represents a direct bond, —S— or —SO2—; Rf represents a fluoroalkyl group having 1-6 carbon atoms; m is a number of 1-10; n is a number of 0-10; and p is 0 or 1) and (b) an alkoxy group-containing monomer represented by general formula (II) CH2?C(X?)—C(?O)—O—(RO)q—H (wherein X? represents a hydrogen atom or a methyl group; R represents an alkylene group having 2-4 carbon atoms wherein a part or all of hydrogen atoms may be substituted by a hydroxyl group; and q represent an integer of 1-50). The fluorine-containing polymer does not contain a monomer having an amino group.

Abstract: A phosphoric acid polymer containing a repeating unit represented by the following formula (1): (wherein, R1 represents a hydrogen atom or methyl, group).

Abstract: A process for producing copolymers of (meth)acrylates:(meth)acrylic acid amine complexes useful for hard surfaces having increased performance for stain resistance, oil and water repellency properties.

Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.

Abstract: To provide an antifouling composition which is a fluorine-type antifouling composition using a short chain perfluoroalkyl group and which is excellent in antifouling properties and water/oil repellency and presents good durability against washing. An antifouling composition comprising a fluorocopolymer which comprises from 30 to 65 mass % of polymerized units (a) having a C1-6 perfluoroalkyl group, from 1 to 67 mass % of polymerized units (b1) having —(C2H4O)— and from 3 to 34 mass % of polymerized units (b2) having —(C4H8O)—, wherein the content of —(C2H4O)— is from 20 to 65 mass %, and the content of —(C4H8O)— is from 2 to 13 mass %.

Abstract: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.

Abstract: Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

Abstract: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.

Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Abstract: The present invention provides inks and methods for making colored silicone hydrogel contact lenses. The ink of the invention comprises an actinically-curable binder copolymer comprising fluorine-containing segments and is characterized by having capability to be cured actinically or thermally to form a colored film on a molding surface of a mold or a silicone hydrogel contact lens and by having an increased durability in a solvated state in a silicone-hydrogel lens formulation in relation to a control colored film obtained from a control ink including an actinically-curable fluorine-free binder copolymer. The invention also provides methods for making colored silicone hydrogel contact lenses based on print-on-mold processes for producing colored contact lenses.

Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.

Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

Abstract: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

Abstract: A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.

Abstract: A fluorine-containing polymer comprising a fluoroalkyl alcohol (meth)acrylic acid derivative represented by a general formula, CnF2n+1(CH2CF2)a(CF2CF2)b(CH2CH2)cOCOCR?CH2 (in the formula, R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, preferably 2 to 4, a is an integer of 1 to 4, b is an integer of 0 to 3, and c is an integer of 1 to 3) containing in 5 to 100 wt % as a polymerization unit. A organic solvent solution or aqueous dispersion of the fluorine-containing polymer is effectively used as, for example, a surface-modifying agent such as a water- and oil-repellent or an oil barrier.

Abstract: The present invention is directed to a continuous process for preparing a crosslinked polymer comprising a fluoro group.

Abstract: A polymer containing a repeating unit represented by the following general formula (1) and a repeating unit having an acid-releasable group.

Abstract: Disclosed is (1) a mixture of fluoroalkyl alcohol-unsaturated carboxylic acid derivatives represented by the general formulae: CF3(CF2)n(CH?CF)a(CF2CF2)b(CH2CH2)c OCOCR?CH2 and CF3(CF2)n?1(CF?CH)a CF2(CF2CF2)b(CH2CH2)cOCOCR?CH2, wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 5, a is an integer of 1 to 4, b is an integer of 0 to 3, and c is an integer of 1 to 3; (2) a fluorine-containing polymer containing the mixture as a polymerization unit; and (3) a water- and oil-repellent comprising the fluorine-containing polymer as an active ingredient. The fluoroalkyl alcohol-unsaturated carboxylic acid derivatives are produced by an esterification reaction of a mixture of fluoroalkyl alcohols represented by the general formulae: CF3(CF2)n(CH?CF)a(CF2CF2)b(CH2CH2)cOH and CF3(CF2)n?1(CF?CH)aCF2(CF2CF2)b, (CH2CH2)cOH, with acrylic acid or methacrylic acid.

Abstract: A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed. In Formula 1, the substituents are defined as described in the specification.

Abstract: The present invention relates to the preparation and use of polymer complements to ?-amyloid peptides (A?) for detecting soluble or aggregated A? in fluid samples or for treating a subject having a neurodegenerative disease.

Abstract: Disclosed is a fluorine-containing copolymer comprising a copolymer of a polyfluoroalkyl alcohol(meth)acrylic acid derivative represented by the general formula: CnF2n+1(CH2CF2)a(CF2CF2)b(CH2CH2)cOCOCR?CH2 ??[I] (R: a hydrogen atom or a methyl group, n: an integer of 1 to 6, a: an integer of 1 to 4, b: an integer of 1 to 3, c: an integer of 1 to 3) and a polysiloxane containing a terminal (meth)acryloyloxy group represented by the general formula: (R1: a hydrogen atom or a methyl group, R2: a C1-C6 linear or branched divalent alkylene group, R3: a C1-C30 linear or branched alkyl group, R4 and R5: a hydrogen atom, a methyl group, or a phenyl group, m: an integer of 1 to 200).

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: A composition including at least one first divalent unit represented by formula: Each Rf is independently selected from the group consisting of Rfa—(O)t—CHF—(CF2)n—; [Rfa—(O)t—C(L)H—CF2—O]m—W—; Rfb-O—(CF2)p-; F(CkF2k)—(O—CkF2k)P—O—CF2—; and CF3—O—(CF2)3—(OCF(CF3)—CF2)Z—O-L1-. Each Q is independently selected from the group consisting of a bond, —C(O)—N(R1)—, and —C(O)—O—. Each X is independently selected from the group consisting of alkylene and arylalkylene, wherein alkylene and arylalkylene are each optionally interrupted by at least one ether linkage and optionally terminated by —N(R1)—C(O)— or —O—C(O)—. R and R1 are each independently selected from the group consisting of hydrogen and alkyl having from 1 to 4 carbon atoms. Rfa represents a partially or fully fluorinated alkyl group having from 1 to 10 carbon atoms and optionally interrupted with at least one oxygen atom. Rfb is selected from the group consisting of CF3CFH— and F(CjF2j)-.

Abstract: A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q?5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.

Abstract: A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

Abstract: This invention relates to certain photocrosslinkable fluoropolymers, processes for crosslinking the fluoropolymers using UV radiation, and the photocrosslinked fluoropolymers produced.

Abstract: The present invention comprises a molding composition comprising at least about 70% wt. polypropylene or polypropylene random copolymer; up to about 30 wt. % of a block copolymer composition comprising at least one selectively hydrogenated block copolymer which substantially matches the index of refraction of the polypropylene or polypropylene random copolymer, and up to about 0.70% by wt. of a clarifying agent, wherein the weight % of the total blend is 100%. The present invention also may be a molded article produced from the molding composition. A molded article formed from such a composition at a thickness of 0.125 inches will have a haze of less than about 50% and an instrumented impact toughness of at least 100 inch-lbs at ?20° C. to ?30° C.