Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(CH3)COO(CH2)nPhXCrF2r+i??(I) (in the formula (I), n is an integer of from 0 to 2, Ph is a phenylene group, X is a single bond or a C1-4 alkylene group containing an etheric oxygen atom, and r is an integer of from 2 to 6).

Abstract: A stain resistant, oil and water repellent copolymer comprising a copolymer prepared from fluorinated (meth)acrylate and amine salts of (meth)acrylic acid, and a method of providing stain resistance, oil and water repellency to substrates and a treated substrate.

Abstract: A process for producing copolymers of (meth)acrylates:(meth)acrylic acid amine complexes useful for hard surfaces having increased performance for stain resistance, oil and water repellency properties.

Abstract: A stain resistant, oil and water repellent composition comprising a copolymer prepared from fluorinated methacrylate, carbonate methacrylate, and methacrylic acid or salt thereof, a method of providing stain resistance, oil and water repellency to substrates, and a treated substrate.

Abstract: A fluorine-containing copolymer, containing: chlorotrifluoroethylene monomer units (A); and monomer units (B), which are obtained by polymerizing a monomer selected from the group consisting of (i) a monomer having a formula: CH2?CHCOON(R0)2, wherein each R0 is independently a hydrogen or an alkyl group; (ii) N-vinylcaprolactam; (iii) a monomer having a formula: CH2?CR1CH2OCH2CR2?CH2, wherein R1 and R2 are each independently a hydrogen, a fluorine, or a methyl group; (iv) a monomer having a formula: CH2?CHCH2CH(CH3)—R3, wherein R3 is a linear alkyl group comprising 1 to 7 carbons; and (v) a monomer of methyl 2-fluoroacrylate, wherein a ratio, (A)/((A)+(B)), is from 3 to 99 mol %, a fluorine content of the copolymer is from 15 to 75 mol %, and a molecular weight of the copolymer is from 1,000 to 1,000,000.

Abstract: A compound represented by the following formula (a): CH2?CR1—CONJ-CKR2—(CH2)n—COO-Q1-Rf1??(a) is provided. This compound is capable of forming a polymer having an oil repellency equivalent to polymers containing a polyfluoroalkyl group containing at least 8 carbon atoms, although the polyfluoroalkyl group contains up to 6 carbon atoms. In the formula, R1 is hydrogen atom or methyl group, R2 is hydrogen atom or a group represented by —(CH2)m—COO-Q2-Rf2 (r), n and m are independently an integer of 0 to 4, Rf1 and Rf2 are independently a polyfluoroalkyl group or a polyfluoroether group containing 1 to 6 carbon atoms, Q1 and Q2 are independently single bond or a divalent linkage group, J is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, K is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, and j and k are independently single bond or an alkylene group containing 1 to 3 carbon atoms with the proviso that j and k are not simultaneously single bond.

Abstract: A fluorocopolymer capable of exhibiting excellent water and oil resistance even with its perfluoroalkyl group being a short chain, and a water and oil proofing composition containing it, are provided. A water and oil proofing composition containing a fluorocopolymer (A) comprising from 40 to 98 mass % of polymerized units (a?) having a C1-6 perfluoroalkyl group, from 1 to 50 mass % of polymerized units (b?) having an alkylene oxide and from 1 to 10 mass % of polymerized units (c?) based on a monomer represented by CH2?C(COOH)-Q-COOH (wherein Q is a C1-4 alkylene group, etc.).

Abstract: It is an object to provide a compound that can provide a molded article and a coating film excellent not only in solubility in an organic solvent, but also in miscibility with/dispersibility in a matrix resin, causing no aggregation in a matrix resin, excellent in surface modification property, and having high transparency. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof with a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof in the presence of a polymerization initiator C in a content of 5% by mol or more and 200% by mol or less, based on the total molar amount of the monomer A and the monomer B; and a resin composition comprising the polymer.

Abstract: Fluorinated supramolecular polymers containing at least 5% by weight of covalently bonded fluorine atoms, based on total weight of the polymers are disclosed. The polymers comprise a fluorinated polymer chain and a (self-)complementary unit capable of forming at least three hydrogen bonds being covalently bonded to the fluorinated polymer chain. Also disclosed are materials comprising (a) a fluorinated supramolecular polymer and (b) a non-fluorinated polymer and/or (c) a fluorinated compound, the non-fluorinated polymer being a polymer containing less than 5% by weight of covalently bonded fluorine atoms, based on the total weight of the non-fluorinated polymer, and the fluorinated compound being either a low molecular weight fluorinated compound comprising at least one fluorine atom and having a molecular weight of 34 to 600 amu, or a fluoropolymer containing at least 5% by weight of covalently bonded fluorine atoms and a Mn from about 600 to about 5000.

Abstract: Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

Abstract: A polymer obtainable by free-radical polymerization of one or more oxetane-based macromonomers and optionally one or more further, free-radically polymerizable comonomers, the oxetane-based macromonomer(s) being obtainable by cationic ring-opening polymerization of at least one hydroxyoxetane with a terminally ethylenically unsaturated starter molecule free of allyl groups in a molar ratio (hydroxyoxetane(s):starter molecule) of (100:1) to (1:1) in the presence of at least one suitable catalyst. Processes for preparing the polymer and the use thereof as an additive in coating compositions and plastics.

Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Abstract: A composition and a polymer are provided. The composition includes the polymer and a melamine derivative. The polymer has a formula of R is hydrogen, halide, alkyl group, alkoxyl group, haloalkyl group or nitro group. n is 1-5 of integer. x+y+z=1, x>0, y?0, z?0. The melamine derivative includes R1 is hydrogen, CqH2q+1, or m and q independently is 1-10 of integer. R2, R3 and R4 independently is hydrogen, halide, or C1-C54 alkyl group.

Abstract: The invention relates to compounds represented by Formula (1): wherein Ra is independently halogen, cyano, —CF3, —CF2H, —CFH2, —OCF3, —OCF2H, —N?C?O, —N?C?S or alkyl having a carbon number of approximately 1 to approximately 20; in the alkyl, optional —CH2— may be substituted with —O—, —S—, —SO2—, —CO—, —COO—, —OCO—, —CH?CH—, —CF?CF— or —C?C—, and optional hydrogen may be substituted with halogen; Rb is fluorine or —CF3; A is independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl or bicyclo[2.2.

Abstract: A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the surface and effectively protect the surface from scratches. The solvent-free photocurable resin composition contains a urethane(meth)acrylate oligomer, a trifunctional (meth)acrylic acid ester monomer, a photopolymerization initiator, and a dilution monomer. The dilution monomer contains a fluorine-based (meth)acrylic acid ester monomer having three or more fluorine atoms and a monofunctional or difunctional (meth)acrylic acid ester monomer in amounts of from 10 to 40 wt% and from 10 to 30 wt%, respectively.

Abstract: A water/oil repellent composition which imparts sufficient dynamic water repellency and post-air-drying water repellency to a surface of an article and has a low environmental impact; a method for producing the composition; and a method of treating an article. The water/oil repellent composition contains: a copolymer which has a mass average molecular weight of at least 40,000 and includes structural units based on monomer (a), monomer (b), and monomer (c); and a medium. Monomer (a) is a compound represented by (Z—Y)nX, wherein Z is a C1-6 polyfluoroalkyl group, Y is a bivalent organic group, n is 1 or 2, and X is a polymerizable unsaturated group. Monomer (b) is an olefin, a homopolymer of which has a glass transition temperature of at most 50° C. Monomer (c) is a (meth)acrylate having no polyfluoroalkyl group and having a C12-30 alkyl group.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

Abstract: [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

Abstract: The present invention is directed to fluoro silicone acrylates that are used in reaction either alone or with other monomers to make polymers that can modify the surface of hair skin or pigment. This makes them ideal for incorporation into pigmented products in personal care applications like make up and lipsticks.

Abstract: Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(?O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.

Abstract: The present invention relates to a method of removing and preventing water and condensate blocks in wells by contacting a subterranean formation with a composition comprising a low molecular weight fluorinated copolymer having perfluoro alkyl moieties which are no longer than C6. A fluorinated copolymer of low molecular weight of about 50,000 g/mol and a method of preparing the same are also disclosed.

Abstract: The present invention provides novel polymers obtained by polymerizing a compound of formula (1) which has a highly fluorinated norbornane structure.

Abstract: Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R2 represents a heat-labile protecting group; R3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.

Abstract: Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

Abstract: A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q?5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.

Abstract: The invention provides a fluoropolymer coated film comprising: a polymeric substrate film; and a fluoropolymer coating on the polymeric substrate film, the fluoropolymer coating comprising a vinyl fluoride copolymer comprised of about 40 to about 90 mole % of repeat units derived from vinyl fluoride and about 10 to about 60 mole % of repeat units derived from monomer selected from the group consisting of (a) and (b) below and mixtures thereof, with the proviso that about 0.

Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract: Provided is a surfactant which has a high surface tension reducing ability and a high solubility in a liquid medium, comprising a fluorine-containing copolymer containing, as essential components, a monomer having a fluoroalkyl group having 1 to 7 carbon atoms, a hydrophilic monomer, and a monomer having an ion donor group. Further provided are a coating composition, an ink composition and a photographic emulsion composition, each comprising the surfactant.

Abstract: The present invention relates to a photo-reactive norbornene-based copolymer which has superior miscibility to various organic solvents or additives while exhibiting superior liquid crystal alignment property and can be preferably used to an alignment layer of liquid crystal display device, a method of preparing the same, and an alignment layer including the same.

Abstract: Disclosed are high impact polystyrenes prepared using mixed initiators. The mixed initiators include at least one grafting initiator and one non-grafting initiator. The high impact polystyrenes prepared therewith have a continuous polystyrene phase and dispersed therein particles of rubber predominantly having a honeycomb structure of rubber with polystyrene inclusions.

Abstract: A polymer for forming a resist protection film which is used in a liquid immersion lithography process to protect a photoresist layer, a composition for forming a resist protection film, and a method of forming a pattern of a semiconductor device using the composition are disclosed. The polymer for forming a resist protection film includes a repeating unit represented by Formula 1 below. In Formula 1, R1 is a hydrogen atom (H), a fluorine atom (F), a methyl group (—CH3), a C1-C20 fluoroalkyl group, or a C1-C5 hydroxyalkyl group, R2 is a C1-C10 linear or branched alkylene group or alkylidene group, or a C5-C10 cycloalkylene group or cycloalkylidene group, X is wherein n is an integer of 0 to 5 and * denotes the remaining moiety of Formula 1 after excluding X, and m, the stoichiometric coefficient of X, is 1 or 2.

Abstract: A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol.

Abstract: The invention provides fluorinated polymeric articles formed a composition including a fluoropolymer. The fluoropolymer is formed using a fluorinated monomer that provides the fluoropolymer with most or all of the fluorine atoms not directly covalently attached to an atom of the fluoropolymer backbone. The fluoropolymer can also include a non-fluorinated hydrophilic monomer in a weight amount greater than the fluorinated monomer. The fluoropolymer composition also includes an ultraviolet light (UV)-reactive group capable of covalent bonding to promotes formation of the fluorinated polymeric article. The fluorinated polymeric article can be in the form of a durable lubricious coating on the surface of an implantable medical device. Coatings of the invention exhibit excellent wet/dry lubricity, durability, and controlled swelling.

Abstract: There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.

Abstract: To provide a method for producing a polymer-dispersed polyol which has high compatibility with a polyol for rigid polyurethane foams and is excellent in storage stability and which provides good heat-insulating performance when it is formed into a rigid polyurethane foam. Also a method for producing a polymer-dispersed polyol for rigid polyurethane foams, having polymer particles dispersed in a polyol, which comprises polymerizing a monomer having a polymerizable unsaturated group in a polyol (X), wherein the polyol (X) contains a polyether polyol (Y) having an oxyethylene group content of at least 10 mass %, and the monomer having a polymerizable unsaturated group contains a fluorinated acrylate or a fluorinated methacrylate.

Abstract: Coating compositions are disclosed which include a copolymer prepared from a reaction mixture comprising an ethylenically unsaturated hydrolysable silane, an ethylenically unsaturated polyoxyalkylene, an ethylenically unsaturated fluorinated polyether and an initiator. The coating composition may also include a curable sol-gel dispersion. The coating compositions can be used to prepare hardcoats.

Abstract: Biomedical devices are provided herein which are formed from a polymerization product of a mixture comprising (a) a copolymer which is the reaction product of one or more polymerizable polyhydric alcohols and one or more polymerizable fluorine-containing monomers; and (b) a biomedical device-forming comonomer.

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract: A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

Abstract: A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.

Abstract: A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.

Abstract: A radiation-sensitive resin composition includes a resin and a photoacid generator. The resin includes a polymer including a first repeating unit shown by a following formula (1) and an acid-dissociable group-containing repeating unit, wherein R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 1 to 12 carbon atoms or an alicyclic alkylene group, and m is an integer from 1 to 3.

Abstract: The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.

Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.

Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

Abstract: The invention relates to the field of polymers and olefin polymerization, and more specifically olefin metathesis polymerization. The invention provides regioregular alternating polymers and methods of synthesizing such polymers.

Abstract: A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.