Abstract: Embodiments of silicone hydrogels, ophthalmic lenses made therefrom, and methods of making the same are described. Fully hydrated silicone hydrogels have relatively high water content and oxygen permeability, along with relatively low modulus of elasticity. Embodiments of the silicone hydrogels in substantially dehydrated condition are adapted to lathe cutting at or above room temperature. Variations of the silicone hydrogels include silicon-containing monomers in an amount greater than 25% by weight, a hydrophilic substituted N-vinyl acetamide monomer in an amount greater than 30% by weight, and a hydrophilic non-acetamide monomer in an amount resulting in a hydrophilic substituted N-vinyl acetamide monomer to hydrophilic non-acetamide monomer weight to weight ratio of greater than 2.1 to 1.

Abstract: A composition and a polymer are provided. The composition includes the polymer and a melamine derivative. The polymer has a formula of R is hydrogen, halide, alkyl group, alkoxyl group, haloalkyl group or nitro group. n is 1-5 of integer. x+y+z=1, x>0, y?0, z?0. The melamine derivative includes R1 is hydrogen, CqH2q+1, or m and q independently is 1-10 of integer. R2, R3 and R4 independently is hydrogen, halide, or C1-C54 alkyl group.

Abstract: A copolymer of (meth)acrylic ester represented by a general formula (1) including a following repeating unit A and repeating unit B. In the general formula (1), R1 and R2 each independently represent hydrogen atom or methyl group; R3 represents an alkyl group having 1 to 4 carbon atoms; Y represents an atomic group forming an aromatic ring; x represents 1 to n, n represents the number of fluorine atoms which can be contained in the aromatic ring; and a and b each independently represent an integer of 1 or more.

Abstract: A copolymer is provided which is capable of providing an article surface with sufficient oil repellency against oils having low surface tensions and which places little burden on the environment. Further, a method for producing such a copolymer, an oil repellent composition containing such a copolymer as an effective component, and an article which is excellent in oil repellency against oils having low surface tensions and which contains no material having high environmental burden, are provided. A copolymer comprising the following polymerized units (a), polymerized units (b), polymerized units (c1) and polymerized units (c2), and an oil repellent composition and article containing it.

Abstract: A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of ?1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

Abstract: A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.

Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R1 and R2 each are alkyl, aryl, or alkenyl, which may contain oxygen or sulfur, R3 is fluorine or trifluoromethyl, and m is an integer of 1 to 5.

Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R1 is methylene or ethylene, R2 is alkyl, aryl, or alkenyl, which may contain oxygen or sulfur, R3 is fluorine or trifluoromethyl, and m is an integer of 1 to 4.

Abstract: Disclosed is a fluorine-containing polymer prepared by polymerizing: (I) a polyfluoroalkyl group-containing (meth)acrylate, in the presence of: (II) an isocyanate compound blocked with a pyrazole compound or a malonate ester. A water- and oil-repellent composition containing the fluorine-containing polymer can impart the excellent water- and oil-repellency, and excellent durability thereof to substrates.

Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.

Abstract: A fluoropolymer comprising: (A) repeating unit derived from an S-sulfate monomer having an —S—SO3— group and carbon to carbon double bond; and (B) repeating unit derived from a fluoromonomer having a fluorine atom and carbon to carbon double bond. This fluoropolymer can be a constituent of water/oil repellent agent having excellent water/oil repelling capability, and is stable in air and permits an arbitrary control of crosslinking.

Abstract: A polymer includes a repeating unit shown by a following general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.

Abstract: Provided are a fluorine-containing (meth)acrylic (co)polymer that scarcely generates gas when subjected to molding process, and is capable of supplying a molded body excellent in external appearance and transparency; a fluorine-containing (meth)acrylic resin film thereof; and a fluororesin laminated resin film having the same properties. The (co)polymer is a fluorine-containing (meth)acrylic (co)polymer obtained by polymerizing a monomer component including 100 to 70% by weight of a fluoroalkyl(meth)acrylate monomer, and 0 to 30% by weight of a different monomer copolymerizable therewith by effect of a radical polymerization initiator having a solubility in water of 0.1% or less by weight at 25 C, and having 8 to 14 carbon atoms.

Abstract: The present invention includes crosslinked perfluoroelastomeric compositions and molded articles formed from a cross-linkable perfluoroelastomeric composition having a first curable perfluoropolymer having a cure site monomer and a second perfluoropolymer having a cure site monomer. The molar ratio of the tetrafluoroethylene monomer to perfluoroalkylvinyl ether in one perfluoropolymer is about 0 to 100 to about 65 to 35 in the perfluoropolymer. The molar ratio of the tetrafluoroethylene monomer to the perfluoroalkylvinyl ether monomer in the second polymer is about 65:35 to about 95:5 in the second perfluoropolymer. The composition further includes a curative.

Abstract: A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. RC in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit represented by the formula (1) is preferably a structural unit represented by a n following formula (1-1).

Abstract: Copolymers which are composed of at least 4 monomers, including (meth)acrylate compounds containing perfluoroalkyl groups, are suitable for the treatment of fiber materials. The copolymers are usually used here in the form of aqueous dispersions. The fiber materials are in particular fabrics, for example made of polyolefin. Treatment with the copolymers imparts to them oil- and water-repellent properties and also repellent properties toward low molecular weight alcohols.

Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.

Abstract: To provide a polymerizable fluorine-containing compound useful for producing a treated substrate having a hydrophilic region and a water repellent region, of which the contrast is high on its surface, without requiring a special apparatus, high energy light, or irradiation with light for a long time. A polymerizable fluorine-containing compound, which is a derivative of a polyhydric alcohol and comprises at least one following structure (A) and at least one following structure (B) in its molecule: structure (A): a structure wherein a compound having a fluoroalkyl group and a carboxyl group is bonded to one hydroxyl group of a polyhydric alcohol by an ester linkage, structure (B): a structure wherein a compound having an ethylenic double bond and a carboxyl group is bonded to one hydroxyl group of a polyhydric alcohol by an ester linkage or a structure wherein a compound having an ethylenic double bond and an isocyanate group is bonded to one hydroxyl group of a polyhydric alcohol by a urethane bond.

Abstract: Photopolymers are provided with composites and electronic devices including such photopolymers. Specifically, organic thin film transistors comprising a semiconductor layer, a polymeric layer in contact with the semiconductor layer, a gate electrode, a source electrode and a drain electrode are disclosed, wherein the semiconductor layer comprises an organic semiconductor compound, and the polymeric layer comprises a photocrosslinked product of a photopolymer.

Abstract: The present invention is directed to compositions of a linear polyol and a salt of a crosslinked cation exchange polymer comprising a fluoro group and an acid group. These compositions are useful to bind potassium in the gastrointestinal tract.

Abstract: Disclosed herein are polymeric molds that can be used to make molded articles. The polymeric molds are made from cyclic olefin polymers that may be formed by ring opening metathesis polymerization (ROMP) of a polycyclic monomer having two or more reactive double bonds and a cyclic monomer comprising one reactive double bond. Fluorinated monomers may be used. The polymeric molds may be structured molds in that they have at least one microstructured feature having a dimension of less than about 2 mm, or less than about 500 um. The polymeric molds may also have a plurality of such microstructured features. Also disclosed herein are methods of making the polymeric molds, methods of making molded articles therefrom, and the molded articles.

Abstract: A polymer composition comprising A) a first polymer comprising (a) hydrophobized nanoparticle; (b) C1 to C18, straight, branched, or cyclic alkyl(meth)acrylate; (c) N-methylol(meth)acrylamide or a monomer of formula (I) R—(OCH2CH2)a—O—C(O)—C(R1)?CH2??(I) ?wherein R is hydrogen, C1-C4 alkyl, or —C(O)—C(R1)?CH2, and R1 is H or —CH3; said first polymer in contact with B) a second polymer comprising (d) a fluorinated monomer of formula (II) Rf1-L-X—C(O)—C(R)?CH2??(II) ?wherein Rf1 is a monovalent, partially or fully fluorinated, linear or branched, alkyl radical having 2 to about 100 carbon atoms; optionally interrupted by 1 to about 50 oxygen atoms; wherein the ratio of carbon atoms to oxygen atoms is at least 2:1 and no oxygen atoms are bonded to each other; L is a bond or a linear or branched divalent linking group having 1 to about 20 carbon atoms, said linking group optionally interrupted by 1 to about 4 hetero-radicals selected from the group consisting of —O—, —NR6—, —S—, —SO—, —SO2—, and —N(R6)

Abstract: A stabilized aqueous fluoropolymer dispersion comprising fluoropolymer particles, wherein the dispersion contains less that about 300 ppm fluorosurfactant based on the weight of the dispersion and a cationic surfactant. The cationic surfactant aids in reducing the viscosity of the dispersion and preferred cationic surfactants are volatile in coating or film casting operations involving drying and sintering of the dispersion.

Abstract: A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.

Abstract: A copolymer composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I): CnF2n+1(CH2)x[(CF2CF2)y(CH2CH2)z]m-L-C(O)—C(R)?CH2??(I) wherein R is H, Cl, F or CH3, L is O, S, NH, S—(CH2)rO, S—(CH2)rNH, OC(O)NH—CH2CH2O, NHC(O)NHCH2CH2O, S—(CH2)rOC(O)NHCH2CH2O, or S(CH2)rNHC(O)NHCH2CH2O, and (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of from about 6 to about 18 carbons; or (II) a monomer of formula (II) (R2)2N—R3—O—C(O)—C(R)?CH2??(II) wherein R is H, Cl, F or CH3, each R2 is independently a C1 to C4 alkyl; and R3 is a divalent linear or branched C1 to C4 alkylene; and wherein the nitrogen is from about 40% to 100% salinized; or (iii) a mixture thereof.

Abstract: Disclosed are a copolymer for organic antireflective films containing a repeating unit represented by the following formula (1), a monomer for the copolymer, and an organic antireflective film composition including the copolymer: wherein in the formula (1), R1, R2, R3, A, m and n respectively have the same meanings as defined in the detailed description of the invention. The organic antireflective film composition including the copolymer for organic antireflective films has an increased refractive index and exhibits excellent effects when produced into an antireflective film, and hydrophilicity and hydrophobicity of the coating film produced from the composition can be regulated, so that excellent compatibility with resists can be obtained.

Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.

Abstract: A fluoropolymer composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a fluoroalkyl monomer, or mixture of monomers, (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of from about 6 to about 18 carbons; or (ii) one or more ionizable water solvatable monomers; and (c) from about 0.05% to about 2% non-fluorinated polymerizable nanoparticles.

Abstract: A water- and oil-resistant agent obtained by mixing a fluorine-containing copolymer obtained by copolymerizing (a) a (meth)acrylate monomer (a) having a polyfluoroalkyl group having 1 to 6 carbon atoms, (b) a vinylpyrrolidone monomer, (c) a monomer having an anion-donating group, and (d) a fluorine-free (meth)acrylate monomer with a liquid medium and an acid under heating, can have a decreased residual amount of unreacted vinylpyrrolidone monomer of at most 10 ppm and can afford a superior water- and oil-resistance to a paper. The invention also discloses a method of producing the water- and oil-resistant agent, a paper treatment composition comprising the water- and oil-resistant agent, a method for treating a paper with the treatment composition, and a paper treated with the water- and oil-resistant agent.

Abstract: Disclosed is an optical sheet for use in liquid crystal displays, which is not easily damaged by external impact, thus facilitating handling thereof and decreasing defective rates, resulting in reduced production costs and increased production efficiency. Decreases in the luminance of the optical sheet due to damage can be prevented.

Abstract: Embodiments of the disclosed technology provide an electronic ink microcapsule and a method for producing the same, wherein the electronic ink microcapsule comprises gelatin, polyanion, and an electrophoretic suspension, and the polyanion comprises a hydrolyzate of styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer.

Abstract: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

Abstract: The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract: A resist lower layer film composition, wherein an etching speed is fast, thus an etching time period can be shortened to minimize a film thickness loss of a resist pattern and a deformation of the pattern during etching, therefore, a pattern can be transferred with high accuracy and an excellent pattern can be formed on a substrate is provided. The resist lower layer film composition comprising at least a polymer having a repeating unit represented by the following general formula (1).

Abstract: The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the storage after exposure without increase in the number of treatment steps. A material for forming resist protection films which comprises an alkali-soluble polymer for forming a protective overcoat for a resist film, characterized in that the contact angle of the polymer to water is 90° or above. The polymer is preferably an acrylic polymer which comprises as the essential components constituent units derived from (meth) acrylic acid and constituent units derived from a specific acrylic ester.

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.

Abstract: To provide a water/oil resistant composition which can impart a sufficient water/oil resistance to a base material even though a fluorinated copolymer having an Rf group with at most 6 carbon atoms is used, said water/oil resistance being not substantially influenced by an adjuvant or the pH of dilution water, and which has little odor; an article treated therewith; and processes for their production. A water/oil resistant composition having a fluorinated copolymer dispersed or dissolved in a medium, wherein the fluorinated copolymer is one having one, some or all of amino groups in a fluorinated copolymer comprising structural units based on a monomer (a) having a C1-6 Rf group and structural units based on a monomer (b) having an amino group, converted to form a salt with an organic acid comprising an organic acid having a pKa of from 2.0 to 4.0.

Abstract: Photocurable fluorine compound, compatible with non-fluorine organic compounds, of formula (1), wherein: a is 1-4, b is 0-3, c is 1-4, provided that a+b+c is 3-5; e is 2-8; R1 has formula (2), (C4H8O)f(C3H6O)g(C2H4O)h(CH2O)iR3??(2) wherein f, g, h, and i are independently 0-100, and R1 has an MW of 30-3000, these repeating units may be sequenced at random, and R3 is C1-10 hydrocarbon; R2 is independently H, F, CH3, or CF3; Rf is a perfluoropolyether residue represented by the following formula (3), wherein j, k, l, and m are independently of each other integers of 0 to 50, provided that a molecular weight of Rf is in a range of 200 to 6000, X is F or CF3, and these repeating units may be sequenced at random; Z is a divalent organic group; and d is 0 or 1.

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ?-position.

Abstract: A composition comprises a distribution of telomers of ethylene and at least one fluoroalkyl or perfluoroalkyl halide, the telomers comprising at least one polymethylene segment (—(CH2)n—) and at least one halomethyl group (—CXH2) and optionally comprising at least one non-fluorine heteroatom, and the halogen being selected from iodine and bromine; wherein the distribution has a number average ratio of methylene moieties of the polymethylene segment to the halomethyl groups of at least about 15.

Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further a fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.

Abstract: Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula —C(O)OZ; Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a C1-20 monovalent organic group.

Abstract: Disclosed herein is a method to produce a semi-crystalline fluoro-polymer film. A semi-crystalline fluoro-polymer material is used. The material is compressed to produce the film. During compression, the material is maintained at a temperature below the melting point of the material. The compression step can be cycled to allow cooling of the material between compression stages. Alternative methods are provided for compressing the material with a co-extrusion substrate, extruding the material and utilizing mandrel expansion for the material.

Abstract: Disclosed is a treatment agent for paper comprising a fluorine-containing copolymer having a repeat unit (a) derived from a fluorine-containing monomer represented by general formula (I): CH2?C(—X)—C(?O)—Y—[—CH2)m—Z—]p—(CH2)n-Rf; a repeat unit (b) derived from at least one amino monomer represented by general formula (II-1): or a derivative thereof; and a repeat unit (c) derived from a pyrrolidone monomer represented by general formula (III): The treatment agent for paper provides paper having high oil resistance and high water resistance.

Abstract: A method of making a contact lens comprising the steps of reacting in a mould a polymerisable formulation comprising at least one fluorine-containing silicone monomer at least one non-fluorine-containing silicone monomer and at least one hydrophilic monomer to form a contact lens, subjecting the contact lens to one or more solvent extraction steps to remove impurities, oligomers and unreacted monomers and hydrate the contact lens, wherein all of the solvent extraction steps are undertaken using an aqueous solvent.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1-6 carbon atoms, hydrophilic monomer, and monomer having an anion-donating group, which agent affords a superior water and oil resistance to a paper. The invention also discloses a process for treating a paper by the water and oil resistant agent and a treated paper thereby.

Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer includes a repeating unit (I) shown by the following general formula (1), a fluorine atom in a molecule of the first polymer. The second a polymer includes an acid-labile group, and is insoluble or scarcely soluble in an alkali. R1 represents a hydrogen atom or the like, each of X1 and R2 represents a single bond or the like, R3 represents a hydrogen atom or the like, and R4 represents an acid-labile group.

Abstract: There is provided a material which is free from fading into white due to surface scattering and is useful as a laminated article having excellent adhesion and practical low reflection.