Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Application
Filed:
March 19, 2004
Publication date:
November 18, 2004
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: A fluorosulfonyl group-containing compound having a high polymerization reactivity, a process for its production, a sulfonyl group-containing polymerizable monomer led from the sulfonyl group-containing compound, and a polymer obtainable by polymerizing the sulfonyl group-containing polymerizable monomer, are provided.
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Application
Filed:
March 19, 2004
Publication date:
November 18, 2004
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Application
Filed:
March 15, 2004
Publication date:
November 18, 2004
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Application
Filed:
March 17, 2004
Publication date:
November 18, 2004
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers maybe complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Grant
Filed:
November 12, 2002
Date of Patent:
November 16, 2004
Assignee:
Specialty Fertilizer Products, LLC
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: A process for producing a crosslinkable silyl group-containing polymer which is excellent in oil resistance, heat resistance, weatherability, low staining properties, and compression set characteristics, includes the steps of radically polymerizing a vinyl monomer in the presence of a thiocarbonylthio group-containing compound with a specific structure, and introducing crosslinkable silyl groups. Also provided is a curable composition which contains the polymer and which is easy to handle.
Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I):
The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
Abstract: A polymer represented by the following formula (1):
(Am)p-(Bn)q-(Ck)r (1)
wherein A represents a monomer unit comprising one of a pyrrole, a thiophene, a furan, an indole, a carbazole, a benzothiophene, a dibenzothiophene, a benzofuran, a dibenzofuran, an indolizine, a thienothiophene, a thienopyrrole and an isoindole; B represents a monomer unit comprising one of an imidazole, a pyrazole, a pyridazine, a pyrimidine, a pyrazine, an oxazole, a thiazole, an isooxazole, an isothiazole, a triazole, a tetrazole, an oxadiazole, a thiadiazole, and a condensed ring thereof; C represents a monomer unit having a different structure from the monomer units represented by A and B; m and n each independently represents an integer of 1 or more; k represents an integer of 0 or more; p, q and r each independently denotes a mole fraction (%), p and q represent 1 to 99(%), r represents 0-98(%), the sum of p, q and r is 100(%); and at least one of the monomer units A, B and C comprises as a substituent at least one
Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
Type:
Grant
Filed:
August 21, 2002
Date of Patent:
September 21, 2004
Assignees:
Sumitomo Bakelite Co., Ltd., International Business Machines Corp.
Inventors:
Saikumar Jayaraman, George Martin Benedikt, Larry Funderburk Rhodes, Richard Vicari, Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas Wallow
Abstract: In accordance with the present invention, there are provided novel thermosetting resin compositions which do not require solvent to provide a system having suitable viscosity for convenient handling. Invention compositions have the benefit of undergoing rapid cure. The resulting thermosets are stable to elevated temperatures, are highly flexible, have low moisture uptake and are consequently useful in a variety of applications, e.g., in adhesive applications since they display good adhesion to both the substrate and the device attached thereto.
Type:
Grant
Filed:
August 1, 2002
Date of Patent:
September 14, 2004
Assignee:
Henkel Corporation
Inventors:
Stephen M. Dershem, Dennis B. Patterson, Jose A. Osuna, Jr.
Abstract: A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula:
where R1 is —H, —OSi(CH3)2C(CH3)3 or —OSi(CH3)3; R2 is —H, —OH, —OCOCH3, —OSi(CH3)2C(CH3)3 or —OSi(CH(CH3)2)3; R3 is —H, —OH or —OCOCH3; R4 is —H, —OSi(CH3)2C(CH3)3, —CH2OSi(CH3)2C(CH3)3 or —CH2OSi(CH(CH3)2)3; and at least one of R1, R2, R3 and R4 is a Si-containing group.
Abstract: A radical polymerizable compound comprising a structure represented by the following formula (I), (II) or (III):
wherein the various groups and “n” in the formulas are defined and certain of the defined groups contain a hetero atom and are connected through the hetero atom.
Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
Abstract: The instant invention relates to multifunctional alkoxyamines based on polyalkylpiperidines, polyalkylpiperazinones and polyalkylmorpholinones and their use as polymerization regulatros/initiators. Further subjects of the invention are a polymerizable composition comprising an ethylenically unsaturated monomer or oligomer and the alkoxyamine compound as well as a process for polymerization and a process for preparation of the compounds.
Type:
Application
Filed:
December 30, 2003
Publication date:
August 26, 2004
Inventors:
Andreas Kramer, Andreas Muhlebach, Peter Nesvadba, Marie-Odile Zink, Tobias Hintermann
Abstract: A hydrophilic ethylenically unsaturated macromonomer is disclosed that is prepared by the addition polymerization of addition polymerizable monomers that include monomers that have hydroxyl or amino functional groups, some of which may be subsequently reacted to provide (meth)acryl ethylenic unsaturation. The macromonomers may be used to form intraocular lenses in situ by polymerization of the macromonomers.
Type:
Grant
Filed:
May 31, 2002
Date of Patent:
August 10, 2004
Assignee:
Commonwealth Scientific and Industrial Research
Organization
Inventors:
Anthony Brian Clayton, Timothy Charles Hughes, Peter Agapitos Kambouris, Gordon Francis Meijs
Abstract: Disclosed is an organic anti-reflective film composition suitable for use in submicrolithography, comprising a compound of Formula 13 and a compound of Formula 14. The organic anti-reflective film effectively absorbs the light penetrating through the photoresist film coated on top of the anti-reflective film, thereby greatly reducing the standing wave effect. Use of organic anti-reflective films of the present invention allows patterns to be formed in a well-defined, ultrafine configuration, providing a great contribution to the high integration of semiconductor devices.
wherein b, c, R′, R″, R1, R2, R3, and R4 are those defined herein.
Abstract: The present invention pertains to a process for controlled free radical polymerization or copolymerization of vinyl chloride at a temperature between 40° C. and 95° C., at a pressure between 5 and 30 bar in the presence of a stable free nitroxyl radical.
Type:
Application
Filed:
May 8, 2003
Publication date:
July 15, 2004
Inventors:
Rudolf Pfaendner, Thomas Wannemacher, Dietrich Braun
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Grant
Filed:
May 15, 2003
Date of Patent:
June 29, 2004
Assignee:
Specialty Fertilizer Products, LLC
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Grant
Filed:
June 4, 2003
Date of Patent:
June 22, 2004
Assignee:
Specialty Fertilizer Products, LLC
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Disclosed herein are radiation-curable polymers, a method of preparing radiation-curable polymers and compositions containing radiation-curable polymers. Radiation-curable polymers and compositions containing radiation-curable polymers are useful as coatings and adhesives.
Type:
Grant
Filed:
December 24, 2001
Date of Patent:
June 15, 2004
Assignees:
University of Massachusetts Lowell, Dow Corning Corporation
Inventors:
Rudolf Faust, Savvas Hadjikyriacou, Toshio Suzuki, Maneesh Bahadur
Abstract: Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
Type:
Grant
Filed:
August 16, 2002
Date of Patent:
June 1, 2004
Assignee:
Shin-Etsu Chemical Co., Ltd.
Inventors:
Mutsuo Nakashima, Seiichiro Tachibana, Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi, Jun Hatakeyama
Abstract: The invention comprises a vinylene carbonate (VCA) copolymer having as comonomer chlorotrifluoroethylene (CTFE) or tetrafluoroethylene (TFE). This copolymer is transparent, making possible the preparation of objects acting as guide or conductor for light with wavelengths of visible or near infrared type. Furthermore, it exhibits a glass transition temperature of greater than 60° C. which is appropriate for the preparation of optical fibers.
Type:
Application
Filed:
November 19, 2002
Publication date:
May 20, 2004
Applicant:
Atofina
Inventors:
Bernard Boutevin, Alain Rousseau, Jean-Marc Sage
Abstract: The present invention comprises a transparent and partially fluorinated polymer which comprises three repeat units resulting from industrial monomers which are simple to access and which has a glass transition temperature of greater than 25° C., which polymer makes possible the preparation of articles, in particular of articles acting as guide or conductor for light in the region of the wavelengths of visible or near infrared type. This polymer is of use in the manufacture of optical fiber.
Type:
Application
Filed:
November 19, 2002
Publication date:
May 20, 2004
Applicant:
Atofina
Inventors:
Bernard Boutevin, Alain Rousseau, Jean-Marc Sage
Abstract: The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
Abstract: The present invention provides a protolytically leaving group-containing copolymer having improved characteristics such as increased solubility in alkaline aqueous solution in the presence of a proton, thus finding application with advantage in various uses, and a process for producing the copolymer.
A protolytically leaving group-containing copolymer represented by the following general formula (1):
in the formula, R1, R2 and R3 are the same or different and each represents a protolytically leaving group and a, b and c represent the amounts of existence (mole %) of repeating units (A), (B) and (C), respectively, in the copolymer, which comprises the repeating unit (A) as well as the repeating unit (B) and/or the repeating unit (C) and has a weight average molecular weight of 2000˜30000, said a, b and c satisfying the condition that a is 5 to 30 mole % and (b+c) is 70 to 95 mole %.
Abstract: A polymeric, phosphorus-containing composition made by heating, in the presence of an initiator, preferably a free radical initiator, and optionally in the presence of one or more comonomers, at least one substituted phosphonylated 2,2′-dihydroxyl-1,1′-binaphthalene or at least one substituted 2,2′-dihydroxyl-1,1′-biphenylene.
Type:
Application
Filed:
September 10, 2003
Publication date:
March 18, 2004
Inventors:
Michel R. Gagne, Kenneth G. Moloy, Nora S. Radu, Brian P. Santora, Wilson Tam
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Grant
Filed:
June 4, 2003
Date of Patent:
March 16, 2004
Assignee:
Specialty Fertilizer Products, LLC
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
Type:
Grant
Filed:
March 5, 2001
Date of Patent:
March 9, 2004
Assignee:
Specialty Fertilizer Products, LLC
Inventors:
John Larry Sanders, Grigory Mazo, Jacob Mazo
Abstract: Poly(paraphenylenevinylene) derivatives and their use as electroluminescence materials
Type:
Application
Filed:
June 26, 2003
Publication date:
February 26, 2004
Inventors:
Willi Kreuder, Donald Lupo, Josef Salbeck, Hermann Schenk, Thomas Stehlin, Hans-Heinrich Horhold, Andrea Lux, Annett Teuschel, Martina Wieduwilt
Abstract: Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.
Abstract: The invention provides carbamate-functional resins and coating compositions incorporating said resins that have improved adhesion with respect to subsequently applied films or coatings. More particularly, the invention relates to carbamate-functional addition polymers having at least 250 grams of polymer per carbamate group which are made with less than 35 percent by weight of nonfunctional monomers, preferably with less than 20 percent by weight and most preferably from 0 to less than 10 percent by weight, based on the total weight of the polymer. The invention further provides a method of making a carbamate-functional polymer and carbamate-functional polymers made by the claimed method. Finally, the invention provides a method for improving the adhesion of a first coating composition to a subsequently applied material as well as a method of making a composite comprising a coated substrate, an adhesive composition, and a glass having at least one surface.
Type:
Grant
Filed:
January 21, 2003
Date of Patent:
February 24, 2004
Assignee:
BASF Corporation
Inventors:
Donald H. Campbell, Walter H. Ohrbom, Joseph Borst, Michael A. Gessner, Donald L. St. Aubin, Marvin L. Green, Bruce E. Oermann
Abstract: The invention provides carbamate-functional resins and coating compositions incorporating said resins that have improved adhesion with respect to subsequently applied films or coatings. More particularly, the invention relates to carbamate-functional addition polymers having at least 250 grams of polymer per carbamate group which are made with less than 35 percent by weight of nonfunctional monomers, preferably with less than 20 percent by weight and most preferably from 0 to less than 10 percent by weight, based on the total weight of the polymer. The invention further provides a method of making a carbamate-functional polymer and carbamate-functional polymers made by the claimed method. Finally, the invention provides a method for improving the adhesion of a first coating composition to a subsequently applied material as well as a method of making a composite comprising a coated substrate, an adhesive composition, and a glass having at least one surface.
Type:
Grant
Filed:
January 21, 2003
Date of Patent:
February 24, 2004
Assignee:
BASF Corporation
Inventors:
Donald H. Campbell, Walter H. Ohrbom, Joseph Borst, Michael A. Gessner, Donald L. St. Aubin, Marvin L. Green, Bruce Oermann
Abstract: A high Tg acrylic polymer is provided as well as an epoxy-blend thereof for use as a pressure sensitive adhesive. The high Tg acrylic polymer comprises a copolymer of an alkyl (meth)acrylate monomer whose homopolymer has a Tg>20° C., optionally a C1-30 (meth)acrylate monomer, an nitrogen-containing polar monomer, and a polymerizable epoxy-containing monomer, with the monomers being present in an amount such that the copolymer has a Tg>50° C. When blended with at least one liquid epoxy resin, the resulting mixture exhibits desirable pressure sensitive adhesive properties and may be cured.
Type:
Grant
Filed:
June 8, 2001
Date of Patent:
February 3, 2004
Assignee:
Adhesives Research, Inc.
Inventors:
Robert M. Wigdorski, Michael J. Zajackowski, Kevin J. McKinney
Abstract: A method for the production of glass or plastic laminates is provided comprising applying between opposing faces of glass or plastic substrates a pressure sensitive adhesive comprised of a curable blend of an epoxy resin and a polymer comprised of the polymerization reaction product of an alkyl (meth)acrylate monomer whose homopolymer has a Tg>20° C., optionally a C1-30 (meth)acrylate monomer, a nitrogen-containing polar monomer, and a polymerizable epoxy-containing monomer, with the monomers being present in an amount such that the copolymer has a Tg>50° C., and curing the adhesive.
Type:
Grant
Filed:
March 18, 2003
Date of Patent:
January 27, 2004
Assignee:
Adhesives Research, Inc.
Inventors:
Robert M. Wigdorski, Michael J. Zajaczkowski, Kevin J. McKinney
Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
Abstract: The invention is directed to olefin copolymers composed of nonhydrolyzable monomer units and hydrolyzable monomer units, the latter resulting from copolymerization of monomers containing a linkage that is hydrolytically cleavable in the presence of aqueous base or aqueous acid. Generally, the hydrolyzable monomer units represent a significant fraction of the copolymer, such that upon hydrolysis, a substantial portion of the copolymer is degraded into low molecular weight fragments. Also provided are degradable articles that are at least partially composed of a degradable copolymer in which hydrolyzable monomer units represent at least 20 mole % of the copolymer.
Abstract: A reshapable hair styling composition comprising heterogeneous (meth)acrylic copolymer particles, said particles being the same or different and comprising at least one (meth)acrylic copolymer comprising: (a) units derived from at least one monomer chosen from (meth)acrylate esters of branched and straight chain alkyl alcohols, (b) units derived from at least one monomer chosen from (meth)acrylate esters of saturated and unsaturated cyclic alcohols containing 6 to 20 carbon atoms, (c) optionally units derived from at least one monomer chosen from hydrophilic monomers, and (d) optionally units derived from at least one monomer other than (a), (b), and (c) monomers, wherein said composition provides a reshapable effect.
Type:
Grant
Filed:
June 22, 2001
Date of Patent:
December 23, 2003
Assignee:
L'Oreal, S.A.
Inventors:
Isabelle Rollat, Henri Samain, Olivier Morel
Abstract: Disclosed are a process for synthesizing conductive polymers by gas polymerization and product thereof. The process for synthesizing conductive polymers includes the steps of coating oxidant on a substrate surface in the unit of several microns and drying in a dryer, contacting monomers of a gas phase to cause a polymerization to the surface on the substrate, and cleaning the substrate for removing the non-reacted monomers and the oxidant after the polymerization. The present invention reduces the manufacturing process to 2˜3 steps by using the gas polymerization, thereby decreasing the manufacturing cost to two third or more compared with conventional methods. Moreover, the present invention has an excellent thin film property and can freely adjust the electric conductivity.
Abstract: The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone structure bonded through a spacer, the polymer having a weight average molecular weight of 1,000-500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
Type:
Grant
Filed:
November 8, 2001
Date of Patent:
December 9, 2003
Assignee:
Shin-Etsu Chemical Co., Ltd.
Inventors:
Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
Abstract: This invention relates to thermosetting resin compositions useful for mounting semiconductor devices onto a circuit board, such as chip size or chip scale packages (“CSPs”), ball grid arrays (“BGAs”), land grid arrays (“LGAs”), and the like, each of which having a semiconductor chip, such as large scale integration (“LSI”), on a carrier substrate. The compositions of this invention are reworkable when subjected to appropriate conditions.
Type:
Grant
Filed:
July 31, 2001
Date of Patent:
December 2, 2003
Assignee:
Loctite Corporation
Inventors:
Lawrence N. Crane, Christopher K. Ober, Young Cheol Bae, Shuyan Yu, Jong-Wook Park
Abstract: There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
Abstract: A new class of polymeric corrosion inhibiting compositions incorporating pendant heterocyclic groups which are surprisingly effective copper corrosion inhibitors are disclosed. The polymers form a protective barrier on metallic components to aqueous systems and remain substantive on metallic surfaces over a wide pH range. Moreover, the polymers are resistant to oxidizing biocides, and are substantially impervious to repeated or prolonged exposure to corrosive agents.
Type:
Grant
Filed:
September 4, 2002
Date of Patent:
November 11, 2003
Assignee:
Rohm and Haas Company
Inventors:
Tirthankar Ghosh, William M. Hann, Barry Weinstein
Abstract: This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.
Type:
Grant
Filed:
January 25, 2001
Date of Patent:
November 4, 2003
Assignee:
E. I. du Pont de Nemours and Company
Inventors:
Charles J. Brandenburg, Randal D. King, Larry G. Oien, Peter W. Uhlianuk