Abstract: A process for continuously producing a thermoplastic copolymer, in which a copolymer (A) containing unsaturated carboxylic acid alkyl ester units and unsaturated carboxylic acid units is produced and in succession heat-treated to perform intramolecular cyclization reaction by dehydration and/or dealcoholization reaction, for producing a thermoplastic copolymer (B) containing glutaric anhydride units and the unsaturated carboxylic acid alkyl ester units. The obtained copolymer is excellent in heat resistance and colorless transparency and very small in foreign matter content.

Abstract: A pigment dispersion includes a pigment and a block copolymer having ionic aromatic monomers. The pigment dispersions can be used for manufacturing inkjet inks and for the coating of colored layers. A process for preparing the pigment dispersion is also disclosed.

Abstract: Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.

Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.

Abstract: Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.

Abstract: A pigment dispersion includes a pigment with at least one carboxylic acid group and a block copolymer including aromatic monomers having at least one carboxylic acid group or a salt thereof and aromatic monomers having at least one sulfonic acid group or a salt thereof. The pigment dispersions can be used for manufacturing inkjet inks and for the coating of colored layers.

Abstract: This invention provides a thermally curable resin copolymer (A), composed mainly of an ethylenically unsaturated monomer (a-1), which produces an acid via decomposition at 150° C. or more, an ethylenically unsaturated monomer (a-2) containing an epoxy group copolymerizable with the ethylenically unsaturated monomer (a-1), and an ethylenically unsaturated monomer (a-3) having a reactive silyl group; a thermally curable resin composition including the thermally curable resin copolymer; a cured film formed from the composition; and a liquid crystal display including the cured film. The thermally curable resin composition has extended storage stability and can be formed into the cured film having good adhesion to a substrate.

Abstract: To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.

Abstract: The object of the present invention is to provide a composition for conductive materials from which a conductive layer having a high carrier transport ability can be made, a conductive material formed of the composition and having a high carrier transport ability, a conductive layer formed using the conductive material as a main material, an electronic device provided with the conductive layer and having high reliability, and electronic equipment provided with the electronic device.

Abstract: A process for the preparation of vinyl chloride copolymers involves free radical suspension polymerization or emulsion polymerization of a mixture of vinyl chloride, epoxide-containing vinyl monomers and further comonomers copolymerizable therewith, wherein a) from 49.5 to 90% by weight of vinyl chloride, b) from 0.01 to 0.7% by weight of epoxide-containing vinyl monomers and c) from 9.5 to 50% by weight of further comonomers copolymerizable with a) and b) are polymerized, the data in % by weight totaling 100% by weight, and from 0.001 to 0.1% by weight of one or more aliphatic or alicyclic, saturated or unsaturated dicarboxylic acids having 1 to 10 carbon atoms, or aliphatic and alicyclic, saturated and unsaturated hydroxymono-, hydroxydi- and hydroxytricarboxylic acids having 3 to 10 carbon atoms and 1 to 4 hydroxyl groups are added during or after the polymerization, and the vinyl chloride copolymer is isolated as a solid resin.

Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0-1) represented by general formula (a0-1) (wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R8 represents a divalent linking group; and R7 represents an acid dissociable, dissolution inhibiting group) and a structural unit (a0-2) represented by general formula (a0-2) (wherein R3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R4 represents a branched alkyl group of 3 or more carbon atoms; and each of R5 and R6 independently represents an alkyl group, wherein R5 and R6 are mutually bonded to form a ring).

Abstract: Oxymethylene copolymers having a high proportion of terminal alkyl ether groups and having terminal hydroxyalkylene groups are described. These polymers are distinguished by high thermal stability and high hot water resistance.

Abstract: The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by the following general formulas (1) and (1)?, a constituent unit (a2) derived from an (?-lower alkyl)acrylate ester having a lactone-containing monocycle or a polycyclic group, and a constituent unit (a3) which is a constituent unit other than the constituent unit (a1) and the constituent unit (a2) and is derived from an (?-lower alkyl)acrylate ester which has an aliphatic cyclic group-containing non-acid dissociable dissolution inhibiting group and does not have a polar group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of 1 to 5, and m represents 0 or 1.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and developer affinity.

Abstract: Nanoflims useful for filtration are prepared from amphiphilic species and one or more polymeric components. The amphiphilic species or components may be oriented on an interface or surface. A nanofilm may be prepared by coupling one or more of the components. The nanofilm may also be deposited or attached to a substrate.

Abstract: It is an object of the present invention to provide a polymer that is soluble in an organic solvent with a low polarity and has a high hole injecting property without adding a dopant for enhancing a hole injecting property. For that object, the present invention provides a vinyl monomer represented by the following general formula (1). In the formula, X represents any one of an oxygen atom (O) and a sulfur atom (S). Y represents any one of a hydrogen atom, an alkyl group, aryl group, a silyl group having an alkyl group or an aryl group as a substituent.

Abstract: Polymers, polymer precursors, and other materials are described, having at least one heterocycle and being useful for fabrication of proton-exchange membranes (PEMs). In representative examples, the heterocycle is a fluorinated imidazole ring. The heterocycle can be chosen to have a low value of pKa, and may be a triazole ring, other nitrogen-containing heterocycle, or derivative thereof. Polymers and composites were prepared having excellent proton conductivity. Applications of these materials include fuel cells and other ion-conducting applications.

Abstract: A synthetic cell culture surface, prepared from a polymerized blend of at least two (meth)acrylate monomers is provided, which supports the growth of undifferentiated human embryonic stem cells in defined media augmented with fetal bovine serum. The cell culture surface forms a uniform layer over the growth area of a typical cell culture vessel.

Abstract: The invention is to provide a novel polyhydroxyalkanoate having a reactive function group within the molecule and a producing method therefor In a polyhydroxyalkanoate containing a unit having a vinyl group in a side chain, such vinyl group is utilized for deriving a polyhydroxyalkanoate comprising a carboxyl group or a unit having an amide group and a sulfonic acid group.

Abstract: A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula 1, R1 is hydrogen or methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, R3 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR.

Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.

Abstract: The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.

Abstract: The object of the present invention is to provide an optical film excellent in transparency, heat resistance and processability.

Abstract: The invention concerns a method for preparing poly(-hydroxy acids), the polymerization reaction being performed in controlled manner in the presence of a catalytic system including a base, said base being a 5- or 6-membered aromatic heterocycle comprising at least one endocyclic nitrogen atom, provided that when the base is used alone in the catalytic system, it does not represent pyridine, 2-methylpyridine, 2,6-dimethylpyridine or 2-methoxypyridine. The invention also concerns poly(-hydroxy acids) of formula (IV). Finally, the invention concerns the use of a poly(-hydroxy acid), obtainable by the inventive method, for vectoring active principles or for making biomaterials.

Abstract: Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I): (wherein R1 represents a hydrogen atom or a lower alkyl group, and R2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(?-lower alkyl)acrylic ester and a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain hydrophilic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerizable hydrophilic siloxanyl monomers.

Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Abstract: A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group.

Abstract: Copolymers including structural units derived from ?-methylene-?-butyrolactone, styrene, methyl methacrylate and, optionally, acrylonitrile, may be used as protective layers in multilayer articles that include UV sensitive substrate materials. The multilayer articles may also include a silicone hardcoat.

Abstract: The present invention relates to a thermoplastic resin composition which contains a thermoplastic polymer (A) containing a glutaric anhydride-containing component shown in the following general formula (1), where R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and a rubber-containing polymer compound (B), and satisfies the following conditions of (I) and/or (II), (I) a total light transmittance per 2 mm of the thickness of the thermoplastic resin composition is more than 90%, (II) a weight-average molecular weight of a thermoplastic polymer (A) is from 30,000 to 150,000 and a glass transition temperature is at least 130° C. According to the present invention, a thermoplastic composition having high heat resistance, superior mechanical properties, colorless transparency, optical isotropy and moldability, as well as solvent resistance, is provided.

Abstract: The present invention relates to a solid, acid catalyst for the preparation of polytetrahydrofuran, polytetrahydrofuran copolymers, diesters or monoesters of these polymers by polymerization of tetrahydrofuran in the presence of at least one telogen and/or comonomer, which has a BET surface area of at least 160 m2/g and an acid center density of at least 0.05 mmol/g for pKa values of from 1 to 6, to a process for preparing it and to a process for the polymerization of cyclic ethers over this catalyst.

Abstract: Improved methods for preparing polyethylene glycol fumarate) are disclosed. Methods for chemically crosslinking or photocross-linking hydrophilic polyethylene glycol fumarate) with hydrophobic polymers such as poly(propylene fumarate) (PPF) and poly(caprolactone fumarate) (PCLF) to form various hydrogels (FIG. 1) with controllable hydrophilicity are also disclosed. The hydrogels are useful in the fabrication of injectable and in-situ hardening scaffolds for application in skeletal reconstruction. An injectable material including the hydrogels may be useful in controlled drug release.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.

Abstract: The invention is directed to olefin copolymers composed of nonhydrolyzable monomer units and hydrolyzable monomer units, the latter resulting from copolymerization of monomers containing a linkage that is hydrolytically cleavable in the presence of aqueous base or aqueous acid. Generally, the hydrolyzable monomer units represent a significant fraction of the copolymer, such that upon hydrolysis, a substantial portion of the copolymer is degraded into low molecular weight fragments. Also provided are degradable articles that are at least partially composed of a degradable copolymer in which hydrolyzable monomer units represent at least 20 mole % of the copolymer.

Abstract: A polymer containing units represented by the defined formula (1); and a process for producing the polymer, which comprises the step of polymerizing a compound represented by the defined formula (3), the units represented by the formula (1) being polymerized units of the compound represented by the formula (3) such as 2,2-dially-1,3-cyclopentanedione.

Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.

Abstract: The invention is based on the discovery that certain polyester compounds bearing free-radical curable moieties are useful as b-stageable adhesives for the microelectonic packaging industry.

Abstract: A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1 and R2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least one of R1 and R2 is a hydrocarbon group; R1 and R2 may be bonded together to form a ring with an adjacent carbon atom; and each of R3, R4, R5, R6, R7, R8 and R9 is identical to or different from a hydrogen atom or a hydrocarbon group. This polymeric compound has not only high substrate adhesion and high etching resistance but also high solubility for a resist solvent.

Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.

Abstract: The novel copolymer is disclosed. The copolymer comprises 1 to 99 mol % of at least one repetitive unit (P1) of the formula (1) and 99 to 1 mol % of at least one repetitive unit (P2) of the formula (2). In the formulae, R1 to R4 and L1 to L4 respectively represent a hydrogen atom, a deuterium atom, a halogen atom or any substituent; X and Y respectively represent an oxygen atom or sulfur atom, n1 represents any one of integers from 2 to 4, and 1 and m respectively represents the number of repetition of the repetitive unit, provided that at least one of R1 to R4 is not a fluorine atom (F) and at least one of L1 to L4 contains one or more fluorine atoms, any two groups selected from L1 to L4 may form a cyclic structure.

Abstract: A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

Abstract: A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by wherein, R1 is hydrogen or methyl group, and R2 is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.

Abstract: Optical devices fabricated from solvent processible polymers suffer from susceptibility to solvents and morphological changes. A semiconductive polymer capable of luminescence in an optical device is provided. The polymer comprises a luminescent film-forming solvent processible polymer which contains cross-linking so as to increase its molar mass and to resist solvent dissolution, the cross-linking being such that the polymer retains semiconductive and luminescent properties.

Abstract: A thermoplastic polymer containing glutaric anhydride units of the following general formula (1) and having an absorbance at a wavelength of 280 nm of at most 0.5 (the absorbance is a value of the polymer film having a thickness of 100 ?m, measured with a UV-visible spectrophotometer) and a glass transition temperature of not lower than 130° C. has high-level colorless transparency and good heat resistance, moldability and dwell stability. wherein R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group having from 1 to 5 carbon atoms.

Abstract: The invention is to provide a novel polyhydroxyalkanoate having a reactive function group within the molecule and a producing method therefor In a polyhydroxyalkanoate containing a unit having a vinyl group in a side chain, such vinyl group is utilized for deriving a polyhydroxyalkanoate comprising a carboxyl group or a unit having an amide group and a sulfonic acid group.

Abstract: The present invention concerns a process for producing low-viscosity polyisocyanates or secondary products thereof, which carry activated, radiation-curable double bonds and can optionally also cure thermally, and low-viscosity polyisocyanate mixtures or secondary products thereof and their use in coating compounds.

Abstract: The invention provides derivatives of poly(styrene-co-allylalcohol). These materials are useful as thermosetting monomers that can be incorporated into adhesive compositions. In some embodiments, the adhesive compositions are useful in the microelectronic packaging industry.

Abstract: A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein R1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1 and R2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 car

Abstract: A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented by wherein, R is a substituted or non-substituted alky group of C1 to C5.