Abstract: The present invention provides a thermoplastic acrylic resin of a copolymer comprising 10 to 70% by weight of a repeating unit derived from the particular methacrylate monomer, 5 to 40% by weight of a repeating unit derived from the particular vinyl aromatic monomer, and 20 to 50% by weight of a repeating unit of the particular cyclic acid anhydride, characterized in that a molar ratio (B/A) is within the range of more than 1 to not more than 10, wherein (A) is a content of the repeating unit of the vinyl aromatic monomer and (B) is a content of the repeating unit of the cyclic acid anhydride, and the total amount of remaining monomers to 100 parts by weight of the copolymer is not more than 0.5 part by weight.

Abstract: Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.

Abstract: A porous membrane of vinylidene fluoride resin excellent in hydrophilicity and having a good balance among strength, elongation and water permeation rate, which is thus useful as a microfiltration membrane or a separator of battery. The porous membrane is formed from a copolymer of 100 mols of a vinylidene fluoride monomer and 0.01-10.0 mols of a hydrophilic monomer having at least one species of hydrophilic group selected from epoxy group, hydroxy group, carboxy group, ester group, amide group and acid anhydride group.

Abstract: Disclosed are an acrylate resin included in a chemically amplified photoresist composition for forming a thick film, a chemically amplified photoresist composition including the same, and a photoresist pattern fabricated therefrom. The photoresist composition including the acrylate resin can achieve an improvement of sensitivity without damaging major characteristics such as compatibility (dispersion stability), spreading characteristics, developing characteristics, and resolution. In addition, a thick resist pattern can be formed with such a composition, and the pattern can have excellent sensitivity, developing characteristics, pattern characteristics, crack resistance, and plating resistance.

Abstract: An aspect of the present invention relates to a radiation-curable vinyl chloride copolymer, which comprises a structural unit denoted by general formula (1): wherein, in general formula (1), R1 denotes a hydrogen atom or a methyl group, and L1 denotes a divalent linking group denoted by formula (2), formula (3), or general formula (4): wherein, in general formula (4), R41 denotes a hydrogen atom or a methyl group.

Abstract: Provided are a binder for an electric double layer capacitor electrode which gives an electrode having a high electrode density and a high binding force and which comprises a polymer that can give a polymer film having a tensile stress of 2 MPa or less when the film is elongated at the ratio of 100% and having the elongation at break of 450% or more; a binder composition for an electric double layer capacitor electrode and a slurry composition for an electric double layer capacitor electrode which each comprises the binder; an electrode produced by use of the slurry composition; and an electric double layer capacitor which has the electrode so as to exhibit a large electrostatic capacity and a small internal resistance.

Abstract: A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.

Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.

Abstract: Copolymers are disclosed comprising structural units derived from ?-methylene-?-butyrolactone, styrene, methyl methacrylate and acrylonitrile. The copolymers may be used as protective layers in multilayer articles that include UV sensitive substrate materials. The multilayer articles may also include a silicone hardcoat.

Abstract: Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or the like; R2 to R10 each represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).

Abstract: A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns.

Abstract: Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.

Abstract: Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I): (wherein R1 represents a hydrogen atom or a lower alkyl group, and R2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(?-lower alkyl)acrylic ester and a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

Abstract: Disclosed is a process for the production of a polymer by polymerizing a monomer or monomers in a solvent to give a polymer solution; and bringing the polymer solution into contact with a poor solvent to precipitate the polymer and to remove impurities therefrom, in which the polymer solution is diluted with a solvent before being brought into contact with the poor solvent to precipitate the polymer. The polymerization solvent preferably has a coefficient of viscosity at 20° C. of 1 mPa·s or more. The dilution solvent preferably has a coefficient of viscosity at 20° C. of less than 1 mPa·s. The process enables efficient production of a polymer with good reproducibility in quality, which polymer contains less amounts of residual monomers and is useful as resist polymers, polymers for undercoat films of multilayer resists, polymers for anti-reflection coatings, and polymers for immersion topcoats.

Abstract: An adhesive film comprising a cycloalkanediol modified copolymerized polyester resin film and a thermosetting vinyl ester resin composition layer which is hardened at room temperature on said polyester resin film.

Abstract: A process for continuously producing a thermoplastic copolymer, in which a copolymer (A) containing unsaturated carboxylic acid alkyl ester units and unsaturated carboxylic acid units is produced and in succession heat-treated to perform intramolecular cyclization reaction by dehydration and/or dealcoholization reaction, for producing a thermoplastic copolymer (B) containing glutaric anhydride units and the unsaturated carboxylic acid alkyl ester units. The obtained copolymer is excellent in heat resistance and colorless transparency and very small in foreign matter content.

Abstract: A polymer which has a radical polymerizable unsaturated group in a side chain and can be made a molecular design suitable for the purpose; a curable resin composition containing the polymer, which provides a cured product having high surface hardness after curing and hardly suffering from scratch; the cured product; and an article obtained by laminating the cured product are provided. The polymer (A) of the present invention is obtained by polymerizing, at least, a vinyl monomer represented by the following general formula (1) and a cyclic ether compound represented by the following general formula (2). The polymer (A) of the present invention is preferably obtained by polymerization of 1 wt % or more and 99.9 wt % or less of a vinyl monomer represented by the general formula (1), 0.1 wt % or more and 99 wt % or less of a cyclic ether compound represented by the general formula (2) and 0 wt % or more and 98.9 wt % or less of the other cationic polymerizable monomer.

Abstract: (1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, wherein R1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.

Abstract: Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.

Abstract: In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. According to the invention, in a copolymer for semiconductor lithography, which is obtained by copolymerizing a monomer having a hydroxyl group and a monomer having no hydroxyl group, when a copolymer of which composition of a hydroxyl group-containing repeating unit is controlled is used, the object can be achieved.

Abstract: Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I): (wherein R1 represents a hydrogen atom or a lower alkyl group, and R2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(?-lower alkyl)acrylic ester and a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

Abstract: VDF-based curable fluorelastomers, having a glass transition temperature from ?10° C. to ?35° C., comprising: B) monomer of formula: CF2?CFOCF2OCF3 (a), C) one or more comonomers selected from: tetrafluoroethylene (TFE), per-fluoromethylvinylether (PMVE), perfluoropropene (HFP), and an amount of —COF end groups in the polymer lower than the sensitivity limit of the method which uses the FT-IR spectroscopy described in the present application.

Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Abstract: Ethylenically unsaturated, particularly acrylic, monomers are polymerised using a catalyst system including a manganese carbonyl initiator, an organic halogen reactive substrate and an allylic halide chain termination agent. Desirably the manganese carbonyl initiator is a dimanganese compound, particularly dimanganese decacarbonyl (Mn2(CO)10). The catalysis mechanism appears to involve initiator homolysis, abstraction of halogen from the reactive substrate forming an organic free radical which acts as a chain initiator for polymerisation and eventual reaction of the propagating chain radical with the chain terminating agent. The speed or extent of reaction may be modified by the inclusion of Lewis acids in the reaction mixture. The resulting polymers are telechelic and may have different end groups. The polymers can be reacted further to functionalise them and/or to form block copolymers.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.

Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.

Abstract: A resist copolymer includes a repeating unit having the following Chemical Formula 1, a repeating unit having the following Chemical Formula 2, and a repeating unit having the following Chemical Formula 3:

Abstract: Aqueous binders for fibrous and granular substrates, based on hydrophobically modified polymers.

Abstract: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

Abstract: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of fluorene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

Abstract: The present invention relates to electroluminescent polymers which contain structural units of the formula (1) and to the use thereof. The polymers according to the invention exhibit improved efficiency and a longer lifetime, in particular on use in polymeric organic light-emitting diodes.

Abstract: The object of the present invention is to provide a method for production of a photoresist resin which enables to reduce the amount of solvent used, to remove effectively impurities such as low molecular components and metal components and to prepare easily a resin having a narrow molecular weight distribution. The present invention is a method for production of a photoresist resin by polymerizing a polymerizable compound in the presence of a solvent and the method comprises (1) a resin solution preparation process in which a resin solution containing a photoreist resin is prepared, and (2) a purification process in which the resin solution is purified using a ultrafilter membrane.

Abstract: A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive photosensitive composition comprising (A) a resin having a specific lactone structure in the side chain and being capable of increasing the solubility in an alkali developer by the action of an acid and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition.

Abstract: Disclosed is a copolymer which includes at least monomer units corresponding to a vinyl monomer A containing a blocked isocyanate group and represented by following Formula (1); and monomer units corresponding to a vinyl monomer B containing a cyclic ether group having 3 to 5 members. The copolymer may further include monomer units corresponding to (meth)acrylic alkyl esters, aromatic vinyl compounds, hydroxyl-containing monomers, and/or carboxyl-containing monomers. In the formula, R1 represents hydrogen atom or methyl group; R2 represents a bivalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms; and R3 represents a residue of isocyanate-blocking agent R3H. This copolymer gives a cured article that excels not only in adhesion to substrates but also in resistance to chemicals, especially to alkalis.

Abstract: VDF-based curable fluoroelastomers, having a glass transition temperature lower than ?49° C., preferably lower than ?50° C., and having the following composition, as percent moles: A) from 25% to 50%, preferably from 30% to 45%, of the monomer of formula: CF2?CFOCF2OCF3 (a); B) one or more (per)fluorinated comonomers having at least one unsaturation of ethylene type in amounts from 75% to 50%; preferably from 70% to 55%; said one or more comonomers comprising vinylidene fluoride (VDF) in amounts from 50% to 75% on the total of the monomer moles; the sum of the molar percentages of the monomers being 100%; said fluoroelastomers containing an amount of —COF end groups in the polymer lower than the sensitivity limit of the method reported in the description.

Abstract: VDF curable fluoroelastomers, ionically cured, having a compression set after a time of 24 h (ASTM D 39/B) at ?10° C. lower than 60%, preferably lower than 50% and at ?25° C. lower than 90%, preferably lower than 75%, comprising hexafluoropropene (HFP) in amounts higher than 10% by moles and one vinylether of formula: CF2?CFOCF2OCF3 (a), an amount of —COF and groups in the polymer lower than the sensitivity limit of the method using the FT-IR spectroscopy described in the present application.

Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain cationic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. Such properties include the ability to extract the polymerized medical devices with water. This avoids the use of organic solvents as is typical in the art. The polymer compositions comprise polymerized silicon-containing monomers end-capped with polymerizable cationic hydrophilic groups.

Abstract: A luminescent or charge-transporting polymer which has in the backbone optionally substituted fluorenediyl groups as repeating units and further has a functional side chain comprising at least one functional group selected from the group consisting of a hole-injection/transporting group containing one or more heteroatoms other than nitrogen or two or more nitrogen atoms, an electron-injection/transporting group containing one or more heteroatoms other than nitrogen or two or more nitrogen atoms, and a luminescent group comprising a fused aromatic hydrocarbon or heterocycle, characterized in that the functional group is directly bonded to the saturated carbon atom of any of the fluorenediyl groups or is bonded to any of the fluorenediyl groups through —Rk—X— (Rk represents alkylene and X represents a direct bond or connecting group) at the X.

Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Abstract: An acrylic copolymer with high heat-resistance is provided. The acrylic copolymer includes repeat units of a monomer of Formula (1) and repeat units of a methacrylic monomer derivative: wherein x is 1-3 and y is 0-3. The acrylic copolymer possesses high heat-resistance and low water absorptivity. The invention also provides a method for preparing the acrylic copolymer.

Abstract: A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.

Abstract: The present invention relates to a method of making a ready-to-press agglomerated powder mixture by wet milling a powder mixture containing binder and spray drying said slurry to an agglomerated powder useful for making cutting tools for metal machining, tools for rock drilling and wear parts. If the binder is a baroplastic polymer having a pressure induced transformation from hard to soft well developed agglomerates with good flow properties and good plasticity are obtained. The hard property of the binder is used at normal pressures, during handling of the spray-dried powder and in the green body, whereas the softer properties are used at higher pressures during the pressing of the material when the pressure exceeds from about 10 to about 50 MPa.

Abstract: It is an object of the present invention to provide a polymer that is soluble in an organic solvent with a low polarity and has a high hole injecting property without adding a dopant for enhancing a hole injecting property. For that object, the present invention provides a vinyl monomer represented by the following general formula (1). In the formula, X represents any one of an oxygen atom (O) and a sulfur atom (S). Y represents any one of a hydrogen atom, an alkyl group, aryl group, a silyl group having an alkyl group or an aryl group as a substituent.

Abstract: A polymeric material having improved gas permeability comprises units of fluorinated dioxole. The polymeric material may further comprise units of a hydrophobic monomer, a hydrophilic monomer, or combinations thereof. Such a polymeric material is desirably used to produce medical devices, such as ophthalmic devices that provide increased comfort to a user.

Abstract: Provided is a cured resin of an adamantane derivative having a specific structure, which has excellent optical properties such as transparency and (long-term) light stability, long-term heat resistance, dielectric constant, and mechanical properties, and which can be utilized suitably in the field of electronic and optical materials.

Abstract: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.

Abstract: The invention relates to a compound comprising (a) at least two polymerisable moieties, (b) at least one amino acid residue of an amino acid comprising at least two amine groups of which at least two amine groups have formed a carbamate, a thiocarbamate or a carbamide group, and (c) a biomolecular moiety linked directly or via a spacer to the carboxylic acid moiety of the diamino acid residue or a carboxylic acid to which such moiety can be linked. The invention further relates to a polymer obtainable from such compound.

Abstract: The present invention provides a polymerization-curable composition comprising at least one kind of a cationically polymerizable compound having in the molecule at least one cationically polymerizable functional group selected from the group consisting of an alicyclic epoxy group, a vinylether group and an oxetane group, and at least one kind of a thermally latent polymerization initiator, characterized in that the polymerization-curable composition is allowed to undergo an exothermic polymerization reaction by applying primary thermal energy to a portion of the polymerization-curable composition, and then the entire polymerization-curable composition is polymerization-cured by secondary thermal energy generated as a result of the exothermic polymerization reaction; a method for polymerization-curing thereof; and a polymerization-cured resin composition.

Abstract: The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cyclic compound having a high glass transition temperature as a main chain, the thermal stability is excellent, and since the mobility of the main chain is relatively high as compared to that of an additional polymer, a photoreactive group can be freely moved in the main chain of the polymer. Accordingly, it is possible to overcome a slow photoreactive rate that is considered a disadvantage of a polymer material used to prepare an alignment film for known liquid crystal display devices.

Abstract: A material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance, which material is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, wherein vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.