Contains An Exterior Ethylenic Substituent Bonded Directly Or Indirectly To A Single Carbon Atom Of The Fused Ring System Patents (Class 526/284)
  • Patent number: 10583972
    Abstract: In an embodiment, a polymer includes less than 99.5 percent by weight of units derived from one or more olefin monomers. The polymer also includes greater than 0.5 percent by weight of units derived from one or more blue light absorbing monomers. In another embodiment, a method includes placing a heated parison of a polymer in a mold. The polymer is formed by polymerizing a mixture of one or more olefin monomers and one or more blue light absorbing monomers. The polymer has one or more blue light absorption characteristics. The method includes closing the mold. The method includes injecting gas into the parison to form a container in the mold. The method also includes removing the container from the mold.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: March 10, 2020
    Assignee: International Business Machines Corporation
    Inventors: Brandon M. Kobilka, Joseph Kuczynski, Jacob T. Porter, Jason T. Wertz
  • Patent number: 9890230
    Abstract: Novel tetracyanoanthraquinodimethane polymers and use thereof. The problem addressed was that of providing novel polymers which are preparable with a low level of complexity, with the possibility of controlled influence on the physicochemical properties thereof within wide limits in the course of synthesis, and which are usable as active media in electrical charge storage elements for high storage capacity, long lifetime and stable charging/discharging plateaus. Tetracyanoanthraquinodimethane polymers consisting of an oligomeric or polymeric compound of the general formula I have been found.
    Type: Grant
    Filed: March 6, 2015
    Date of Patent: February 13, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Bernhard Haeupler, Ulrich Schubert, Andreas Wild
  • Patent number: 9856336
    Abstract: Novel tetracyanoanthraquinodimethane polymers and use thereof. The problem addressed was that of providing novel polymers which are preparable with a low level of complexity, with the possibility of controlled influence on the physicochemical properties thereof within wide limits in the course of synthesis, and which are usable as active media in electrical charge storage elements for high storage capacity, long lifetime and stable charging/discharging plateaus. Tetracyanoanthraquinodimethane polymers consisting of an oligomeric or polymeric compound of the general formula I have been found.
    Type: Grant
    Filed: March 6, 2015
    Date of Patent: January 2, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Bernhard Haeupler, Ulrich Schubert, Andreas Wild
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Patent number: 9005874
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: April 14, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Patent number: 8940848
    Abstract: The present invention relates to a branched conjugated diene copolymer which is useful for preparing a rubber composition, having high uniformity of a temperature dependence curve of a viscoelasticity tan ?, for a tire, a rubber composition comprising the copolymer, and a pneumatic tire produced using the rubber composition for a tire. The branched conjugated diene copolymer is composed of monomer components comprising a branched conjugated diene compound represented by a general formula (1): wherein R1 represents an aliphatic hydrocarbon group having 6 to 11 carbon atoms, and an aromatic vinyl compound represented by a general formula (2): wherein R2 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms, and R5 represents a hydrogen atom or the like, and a copolymerization ratio (m) of the aromatic vinyl compound (2) is 45% by mass or more.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: January 27, 2015
    Assignee: Sumitomo Rubber Industries, Ltd.
    Inventor: Kensuke Washizu
  • Publication number: 20150017586
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 3, 2014
    Publication date: January 15, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150010857
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).
    Type: Application
    Filed: September 4, 2014
    Publication date: January 8, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Natsumi YOKOKAWA, Hiroo TAKIZAWA, Hideaki TSUBAKI
  • Patent number: 8912301
    Abstract: The present invention relates to a branched conjugated diene copolymer which is useful for preparing a rubber composition, having high uniformity of a temperature dependence curve of a viscoelasticity tan ?, for a tire, a rubber composition comprising the copolymer, and a pneumatic tire produced using the rubber composition for a tire. The branched conjugated diene copolymer is composed of monomer components comprising a branched conjugated diene compound represented by a general formula (1): wherein R1 represents an aliphatic hydrocarbon group having 6 to 11 carbon atoms, and an aromatic vinyl compound represented by a general formula (2): wherein R2 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms, and R5 represents a hydrogen atom or the like, and a copolymerization ratio (m) of the aromatic vinyl compound (2) is 45% by mass or more.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: December 16, 2014
    Assignee: Sumitomo Rubber Industries, Ltd.
    Inventor: Kensuke Washizu
  • Publication number: 20140314826
    Abstract: The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C?CR?—C(?O)—O—]nR??(I) [H2C?CR?—C(?O)—NH—]nR??(II) wherein n is 1, 2 or 3, R? is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.
    Type: Application
    Filed: May 4, 2012
    Publication date: October 23, 2014
    Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY, THE UNIVERSITY OF NOTTINGHAM
    Inventors: Paul Williams, Morgan Russell Alexander, Martyn Christopher Davies, Robert Langer, Daniel Griffith Anderson
  • Publication number: 20140309394
    Abstract: The invention relates to a polymer composition that includes a branched alkene which is cationically polymerizable as well as a glass-forming comonomer and/or a vinyl comonomer containing benzocyclobutene as the pendant group. The structure of the polymer composition can take various forms: linear random copolymer, linear block copolymer, star random copolymer, star block copolymer, and other hyperbranched polymers. The copolymer composition can undergoes crosslinking at elevated temperatures (preferably above 180° C.).
    Type: Application
    Filed: June 27, 2014
    Publication date: October 16, 2014
    Applicant: INNOLENE LLC
    Inventors: Yonghua Zhou, Leonard Pinchuk
  • Publication number: 20140306157
    Abstract: Subject It is to provide a polymerizable compound having a high polymerization reactivity, a high conversion yield and a high solubility in a liquid crystal composition, a polymerizable composition including the compound, a liquid crystal composite prepared from the composition and a liquid crystal display device containing this composite. Means for Solving the Subject A compound represented by formula (1). In this formula, for example, P1 and P2 are —SCO—CH?CH2; Sp1 and Sp2 are a single bond; ring A1, ring A2, ring A3 and ring A4 are 1,4-phenylene; Z1, Z2 and Z3 are a single bond; and a is 1, and b and c is 0.
    Type: Application
    Filed: April 2, 2014
    Publication date: October 16, 2014
    Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATION
    Inventors: Yasuyuki GOTOH, Masakazu YANO
  • Patent number: 8859185
    Abstract: A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R3 to R8 individually represent a group shown by the following formula (2) or the like. R1 represents a single bond or the like. R2 represents a hydrogen atom or the like.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: October 14, 2014
    Assignee: JSR Corporation
    Inventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
  • Patent number: 8859180
    Abstract: [Task to Be Achieved] To provide a chemically amplified type positive copolymer for semiconductor lithography, which has eliminated the problems of prior art, has a high development contrast, and has excellent resolution in fine-pattern formation; a composition for semiconductor lithography which contains the copolymer; and a process for producing the copolymer. [Means for Achievement] The copolymer for semiconductor lithography according to the present invention is a copolymer which has at least (A) a repeating unit having a structure which has an alkali-soluble group protected by an acid-labile, dissolution-suppressing group, (B) a repeating group having a lactone structure and (C) a repeating group having an alcoholic hydroxyl group and which is characterized by having an acid value of 0.01 mmol/g or less as determined by dissolving the copolymer in a solvent and subjecting the solution to neutralization titration with a solution of an alkali metal hydroxide using Bromothymol Blue as an indicator.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: October 14, 2014
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Tomo Oikawa, Takayoshi Okada, Masaaki Kudo, Takanori Yamagishi
  • Publication number: 20140256896
    Abstract: The present invention relates to a polymerizable composition useful as a liquid crystal device, a display, an optical member, a coloring agent, a security marking, and a laser light emitting member and a thin film obtained from the polymerizable composition. The present invention provides a polymerizable liquid crystal composition having excellent solubility into a solvent, exhibiting good adhesion to a base material, and being capable of realizing a thin film having low haze and no variations and, in addition, provides a thin film having excellent appearance by using the polymerizable liquid crystal composition. The polymerizable liquid crystal composition according to the present invention is used and, thereby, a composition and a thin film having low haze and no variations and, at the same time, having excellent adhesion to a base material can be obtained at a low cost.
    Type: Application
    Filed: November 21, 2012
    Publication date: September 11, 2014
    Inventors: Hidetoshi Nakata, Yasuhiro Kuwana, Hiroshi Hasebe, Kunihiko Kotani, Isa Nishiyama
  • Patent number: 8808960
    Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: August 19, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
  • Publication number: 20140221574
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a polymer represented by the general formula (I).
    Type: Application
    Filed: June 27, 2012
    Publication date: August 7, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Vladimir Grigorievich Chigrinov, Hoi-Sing Kwok, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • Patent number: 8765895
    Abstract: The invention relates to a polymer composition that includes a branched alkene which is cationically polymerizable as well as a glass-forming comonomer and/or a vinyl comonomer containing benzocyclobutene as the pendant group. The structure of the polymer composition can take various forms: linear random copolymer, linear block copolymer, star random copolymer, star block copolymer, and other hyperbranched polymers. The copolymer composition can undergoes crosslinking at elevated temperatures (preferably above 180° C.).
    Type: Grant
    Filed: June 25, 2008
    Date of Patent: July 1, 2014
    Assignee: Innolene LLC
    Inventors: Yonghua Zhou, Leonard Pinchuk
  • Publication number: 20140175348
    Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].
    Type: Application
    Filed: February 28, 2014
    Publication date: June 26, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hidenori TAKAHASHI, Shuichiro OSADA
  • Patent number: 8759463
    Abstract: A cross-linkable resin shaped article which contains a heat curable resin, cross-linking agent, and condensed aromatic polycyclic compound which has a (meth)acryloyloxy group, a cross-linked resin shaped article which is comprised of that cross-linkable resin shaped article which is cross-linked, and a laminate which is obtained by using these are provided. The cross-linkable resin shaped article and cross-linked resin shaped article of the present invention are excellent in heat resistance and further are useful in production of a low linear expansion laminate.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: June 24, 2014
    Assignee: Zeon Corporation
    Inventor: Akihiko Yoshiwara
  • Patent number: 8754179
    Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: June 17, 2014
    Assignee: Cornerstone Research Group, Inc.
    Inventors: Tat Hung Tong, Emily Snyder
  • Publication number: 20140151615
    Abstract: A coloring composition which suppresses color loss of the colored pattern to be formed, and may form a colored pattern which has excellent developability and heat resistance is provided. A colored cured film which suppresses color loss of the colored pattern to be formed, and may form a colored pattern which has excellent developability and heat resistance, a color filter which is provided with the colored pattern, and a manufacturing method thereof are provided. A solid state imaging device which has excellent color loss resistance and heat resistance is provided. A coloring composition of the present invention includes a resin (A) having a dye structure in which a peak area occupied by a component having a molecular weight of 2000 or less is below 10% in respect to a peak area of a total molecular weight distribution of the resin (A) which is measured using gel permeation chromatography.
    Type: Application
    Filed: February 10, 2014
    Publication date: June 5, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Seiichi HITOMI, Yuzo NAGATA, Hiroaki IDEI, Kazuya OOTA, Yousuke MURAKAMI
  • Publication number: 20140154616
    Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.
    Type: Application
    Filed: February 10, 2014
    Publication date: June 5, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Yuzo NAGATA, Hiroaki IDEI, Atsuyasu NOZAKI, Kenta USHIJIMA, Yushi KANEKO, Yousuke MURAKAMI
  • Publication number: 20140142266
    Abstract: The present invention relates to a polymerizable compound represented by a formula (I). The present invention provides a polymerizable compound, a polymerizable composition, a polymer, and an optically anisotropic article that are capable of obtaining an optical film having a low melting point, having excellent solubility, capable of being manufactured at low cost, and capable of uniform polarized light conversion across a broad wavelength region. [In formula: Y1 to Y6 are independently a chemical single bond, —O—, —O—C(?O)—, —C(?O)—O— etc.; G1 and G2 are independently a divalent C1-C20 aliphatic group etc.; Z1 and Z2 are independently C2-C10 alkenyl group that is substituted with a halogen atom etc.; Ax is a C2-C30 organic group that includes at least one aromatic ring selected from a group consisting of an aromatic hydrocarbon ring and an aromatic hetero ring; Ay is a hydrogen atom, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C3-C12 cycloalkyl group etc.; A1 is a trivalent aromatic group etc.
    Type: Application
    Filed: April 27, 2012
    Publication date: May 22, 2014
    Applicant: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Publication number: 20140121345
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).
    Type: Application
    Filed: May 31, 2012
    Publication date: May 1, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • Publication number: 20140083752
    Abstract: A degradable polymeric nanotube (NT) dispersant comprises a multiplicity of NT associative groups that are connected to a polymer backbone by a linking group where there are cleavable groups within the polymer backbone and/or the linking groups such that on a directed change of conditions, bond breaking of the cleavable groups results in residues from the degradable polymeric NT dispersant in a manner where the associative groups are uncoupled from other associative groups, rendering the associative groups monomelic in nature. The degradable polymeric nanotube (NT) dispersant can be combined with carbon NTs to form a NT dispersion that can be deposited to form a NT film, or other structure, by air brushing, electrostatic spraying, ultrasonic spraying, ink-jet printing, roll-to-roll coating, or dip coating. The deposition can render a NT film that is of a uniform thickness or is patterned with various thicknesses.
    Type: Application
    Filed: April 3, 2012
    Publication date: March 27, 2014
    Applicant: University of Florida Research Foundation, Inc.
    Inventors: Ryan M. Walczak, John R. Reynolds, Andrew Gabriel Rinzler, Andrew M. Spring, Svetlana V. Vasilyeva, Pooja Wadhwa
  • Publication number: 20140051807
    Abstract: Methods of forming polymer material from rosin-derived material are provided, along with the resulting polymers. For example, a plurality of functionalized resin acids having a polymerizable functional group via controlled living polymerization can be polymerized into the polymeric material such that each polymer defines a functional end group and the polymeric material has a polydispersity index of about 1 to about 1.5.
    Type: Application
    Filed: October 28, 2013
    Publication date: February 20, 2014
    Inventor: Chuanbing Tang
  • Patent number: 8637624
    Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.
    Type: Grant
    Filed: July 6, 2013
    Date of Patent: January 28, 2014
    Assignee: Rhodia Operations
    Inventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
  • Publication number: 20130341304
    Abstract: A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching.
    Type: Application
    Filed: August 28, 2013
    Publication date: December 26, 2013
    Applicant: JSR CORPORATION
    Inventors: Shin-ya MINEGISHI, Kazuhiko KOMURA, Shin-ya NAKAFUJI, Takanori NAKANO
  • Patent number: 8609321
    Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: December 17, 2013
    Assignee: JSP Corporation
    Inventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
  • Patent number: 8609574
    Abstract: Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.
    Type: Grant
    Filed: April 23, 2009
    Date of Patent: December 17, 2013
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Luis Francisco Martin, Andrew Bell
  • Publication number: 20130331477
    Abstract: An optical component and an electrical board that have a low coefficient of linear expansion and small mold shrinkage, a method for producing the optical component, and a method for producing the electronic board are provided. An optical component includes a polymer having a repeating structural unit represented by general formula (1) where R1 and R2 each independently represent —H or —CH3; m and n each independently represent an integer in the range of 0 to 3; asterisk denotes a dangling bond that bonds to one of Xa and Xb; and —H bonds to the other one of Xa and Xb.
    Type: Application
    Filed: June 5, 2013
    Publication date: December 12, 2013
    Inventors: Ryo Ogawa, Seiji Okada
  • Publication number: 20130288126
    Abstract: A family of carboxylic acid groups containing fluorene/fluorenon copolymers is disclosed as binders of silicon particles in the fabrication of negative electrodes for use with lithium ion batteries. Triethyleneoxide side chains provide improved adhesion to materials such as, graphite, silicon, silicon alloy, tin, tin alloy. These binders enable the use of silicon as an electrode material as they significantly improve the cycle-ability of silicon by preventing electrode degradation over time. In particular, these polymers, which become conductive on first charge, bind to the silicon particles of the electrode, are flexible so as to better accommodate the expansion and contraction of the electrode during charge/discharge, and being conductive promote the flow battery current.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 31, 2013
    Inventors: Gao Liu, Vincent S. Battaglia, Sang-Jae Park
  • Patent number: 8569427
    Abstract: Methods of forming polymer material from rosin-derived material are provided. For example, a plurality of functionalized resin acids having a polymerizable functional group via controlled living polymerization can be polymerized into the polymeric material such that each polymer defines a functional end group and the polymeric material has a polydispersity index of about 1 to about 1.5. The resulting polymers are also described.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: October 29, 2013
    Assignee: University of South Carolina
    Inventor: Chuanbing Tang
  • Patent number: 8557501
    Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: October 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
  • Publication number: 20130267672
    Abstract: A cross-linkable resin shaped article which contains a heat curable resin, cross-linking agent, and condensed aromatic polycyclic compound which has a (meth)acryloyloxy group, a cross-linked resin shaped article which is comprised of that cross-linkable resin shaped article which is cross-linked, and a laminate which is obtained by using these are provided. The cross-linkable resin shaped article and cross-linked resin shaped article of the present invention are excellent in heat resistance and further are useful in production of a low linear expansion laminate.
    Type: Application
    Filed: December 16, 2011
    Publication date: October 10, 2013
    Applicant: ZEON CORPORATION
    Inventor: Akihiko Yoshiwara
  • Publication number: 20130253158
    Abstract: The invention relates to a superabsorbent copolymer comprising a reaction product of a reactive optical brightener comonomer. In another embodiment, the superabsorbent copolymer comprises a reaction product of a first monomer and a reactive optical brightener comonomer. The reactive optical brightener comonomer may be selected from various pyrene optical brighteners listed herein. The invention also relates to superabsorbent copolymer having from about 0.1 to 10,000 ppm of a reactive optical brightener comonomer based on the superabsorbent copolymer.
    Type: Application
    Filed: March 22, 2012
    Publication date: September 26, 2013
    Inventors: Matthias Naumann, James S. Wooten, IV
  • Publication number: 20130236968
    Abstract: The present invention relates to multifunctional polymers represented by the following formula: The invention further provides methods for their preparation and methods for site-specific delivery of nucleic acids by combining them with targeting ligands, endosomolytic ligands and/or PK modulator ligands.
    Type: Application
    Filed: June 20, 2011
    Publication date: September 12, 2013
    Applicant: ALNYLAM PHARMACEUTICALS, INC.
    Inventors: Muthiah Manoharan, Kallanthottathil G. Rajeev
  • Patent number: 8530540
    Abstract: A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: September 10, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama
  • Publication number: 20130222883
    Abstract: There is provided a display particles including: a copolymer having a repeating unit corresponding to a vinyl compound represented by the following Formula (1) and a repeating unit corresponding to a compound with a polar group and an ethylenically unsaturated bond: Ar?H2C?CH2)n??Formula (1) wherein Ar represents an unsubstituted aromatic ring or an aromatic ring substituted with an alkyl group having from 1 to 6 carbon atoms or an aryl group having from 6 to 12 carbon atoms, and n represents an integer of from 1 to 4.
    Type: Application
    Filed: December 18, 2012
    Publication date: August 29, 2013
    Applicants: FUJIFILM CORPORATION, FUJI XEROX CO., LTD.
    Inventors: Fuji Xerox Co., Ltd., Fujifilm Corporation
  • Patent number: 8513133
    Abstract: A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, wherein R3 to R8 individually represent a group shown by the following formula (2) or the like, —O—R1?R2??(2) wherein R1 represents a single bond or the like, and R2 represents a hydrogen atom or the like.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: August 20, 2013
    Assignee: JSR Corporation
    Inventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
  • Patent number: 8470510
    Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
    Type: Grant
    Filed: June 1, 2009
    Date of Patent: June 25, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Arimichi Okumura, Keizo Inoue, Kazuki Okamoto
  • Patent number: 8420753
    Abstract: The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index Materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: April 16, 2013
    Assignee: Key Medical Technologies, Inc.
    Inventors: Khalid Mentak, Anthony Keslinke, Kevin Phan
  • Patent number: 8415424
    Abstract: An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: April 9, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Min-Soo Kim, Hwan-Sung Cheon, Sung-Wook Cho, Seung-Bae Oh, Jee-Yun Song
  • Patent number: 8404797
    Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: March 26, 2013
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
  • Patent number: 8362170
    Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: January 29, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Shuji Hirano, Kaoru Iwato, Hiroshi Saegusa, Yusuke Iizuka
  • Publication number: 20130023637
    Abstract: The present invention is to provide a novel polymerizable chiral compound (chiral agent) having high left-handed helical twisting power, a polymerizable liquid crystal composition comprising the polymerizable chiral compound and a polymerizable liquid crystal compound, a liquid crystal polymer, and an optically anisotropic body.
    Type: Application
    Filed: March 10, 2011
    Publication date: January 24, 2013
    Applicant: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kentaro Tamura, Kumi Okuyama
  • Publication number: 20130012648
    Abstract: The invention provides a colored composition including a dye multimer having an alkali-soluble group as a dye, the dye multimer having a weight-average molecular weight (Mw) of from 5,000 to 20,000 and a dispersity (weight-average molecular weight (Mw)/number-average molecular weight (Mn)) of from 1.00 to 2.50.
    Type: Application
    Filed: March 30, 2011
    Publication date: January 10, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoshihiko Fujie, Masaru Yoshikawa, Shinichi Kanna, Kenta Ushijima
  • Patent number: 8329841
    Abstract: The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cyclic compound having a high glass transition temperature as a main chain, the thermal stability is excellent, and since the mobility of the main chain is relatively high as compared to that of an additional polymer, a photoreactive group can be freely moved in the main chain of the polymer. Accordingly, it is possible to overcome a slow photoreactive rate that is considered a disadvantage of a polymer material used to prepare an alignment film for known liquid crystal display devices.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: December 11, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Hye-Young Jung, Sung-Ho Chun, Heon Kim, Sung-Don Hong, Dong-Woo Yoo
  • Publication number: 20120308927
    Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Application
    Filed: December 2, 2011
    Publication date: December 6, 2012
    Applicants: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, David Richard Wilson, Jibin Sun