Contains An Exterior Ethylenic Substituent Bonded Directly Or Indirectly To A Single Carbon Atom Of The Fused Ring System Patents (Class 526/284)
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Patent number: 12173101Abstract: A lens having high quality even after long-term storage can be manufactured using a curable composition containing a compound represented by General Formula A, a compound represented by General Formula B, and a polymerization initiator, in which a ratio of a substance amount of the compound represented by General Formula B to a substance amount of the compound represented by General Formula A is 1 to 25 mol %. In the Formulas, each portion surrounded by a broken line of Ar11, Ar12, and Ar13 represents that each of the portions may form a fused ring; L1 and L2 each represent a single bond, —O—, or the like; Sp1 and Sp2 each represent a single bond or a divalent linking group; Pol1 and Pol2 each represent a polymerizable group; R3 to R6 each represent a substituent; and q, r, v, and w are each an integer of 0 to 4.Type: GrantFiled: February 15, 2022Date of Patent: December 24, 2024Assignee: FUJIFILM CorporationInventors: Takafumi Nakayama, Naoyuki Morooka
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Patent number: 12037490Abstract: A resin composition includes 100 parts by weight of an unsaturated C?C double bond-containing polyphenylene ether resin and 20 parts by weight to 150 parts by weight of a homopolymer of Formula (1). The resin composition is useful for making different articles, including a prepreg, a resin film, a laminate or a printed circuit board, which may achieve excellent multi-layer board thermal resistance, thermal resistance after moisture absorption and rigidity and achieve high glass transition temperature, low dissipation factor, and low Z-axis ratio of thermal expansion.Type: GrantFiled: November 15, 2021Date of Patent: July 16, 2024Assignee: ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD.Inventors: Rongtao Wang, Chenyu Shen, Yan Zhang, Xing He
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Patent number: 11634518Abstract: A resin composition includes 100 parts by weight of a polyolefin and 20 parts by weight to 150 parts by weight of a homopolymer of Formula (1). The resin composition is useful for making different articles, including a prepreg, a resin film, a laminate or a printed circuit board, which may achieve excellent multi-layer board thermal resistance and thermal resistance after moisture absorption and achieve high glass transition temperature, low dissipation factor, and low Z-axis ratio of thermal expansion.Type: GrantFiled: November 15, 2021Date of Patent: April 25, 2023Assignee: ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD.Inventors: Rongtao Wang, Chenyu Shen, Yan Zhang, Xing He
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Patent number: 11626336Abstract: A package that includes a substrate having a first surface; a solder resist layer coupled to the first surface of the substrate; a device located over the solder resist layer such that a portion of the device touches the solder resist layer; and an encapsulation layer located over the solder resist layer such that the encapsulation layer encapsulates the device. The solder resist layer is configured as a seating plane for the device. The device is located over the solder resist layer such that a surface of the device facing the substrate is approximately parallel to the first surface of the substrate. The solder resist layer includes at least one notch. The device is located over the solder resist layer such that at least one corner of the device touches the at least one notch.Type: GrantFiled: October 1, 2019Date of Patent: April 11, 2023Assignee: QUALCOMM IncorporatedInventors: Daniel Garcia, Kinfegebriel Amera Mengistie, Francesco Carrara, Chang-Ho Lee, Ashish Alawani, Mark Kuhlman, John Jong-Hoon Lee, Jeongkeun Kim, Xiaoju Yu, Supatta Niramarnkarn
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Patent number: 11370886Abstract: The invention discloses a polymer with a low dielectric constant and a molecular structure design method capable of reducing the dielectric constant of the polymer. A straight-chain rigid group is introduced into a meta-position of a side group benzene ring or diphenyl chain segment structure by using the designability of a molecular chain side group of a polymer; and a free volume hole with a larger size is formed in the material through loose rotation of the side group benzene ring to inhibit molecular chain deposition, thereby reducing the dielectric constant of the polymer material. The design method is simple, is suitable for a common high-performance polymer material, can be applied to preparation of a low-dielectric polymer material, is suitable for the field of new and high technology industries such as electronics, microelectronics, information and aerospace and is especially suitable for the field of super-large-scale integrated circuits.Type: GrantFiled: February 1, 2018Date of Patent: June 28, 2022Assignee: SUN YAT-SEN UNIVERSITYInventors: Yi Zhang, Chao Qian, Jiarui Xu, Runxin Bei, Siwei Liu, Zhenguo Chi
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Patent number: 10838304Abstract: Semiconductor systems and methods are provided. In an embodiment, a method of film formation includes receiving a substrate, dispensing a priming material on the substrate, and applying an organometallic resist solution over the priming material on the substrate, thereby forming an organometallic resist layer over the priming material. The priming material includes water.Type: GrantFiled: August 13, 2018Date of Patent: November 17, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Chih Ho, An-Ren Zi, Ching-Yu Chang
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Centrally functionalizable living cationic polymer or copolymer and methods of synthesizing the same
Patent number: 10774185Abstract: In various embodiments, the present invention is directed to a centrally-functionalizable living cationic polymer or copolymer having a centrally-substituted tetraene group having the formula wherein each R is selected from the group consisting of a polymer or a copolymer, such as a polyisobutylene polymer or a poly(isobutylene-b-styrene) copolymer.Type: GrantFiled: January 25, 2019Date of Patent: September 15, 2020Assignee: The University of AkronInventors: Joseph P. Kennedy, Turgut Nugay, Nihan Nugay, Tejal J. Deodhar, Susan Dollinger -
Patent number: 10583972Abstract: In an embodiment, a polymer includes less than 99.5 percent by weight of units derived from one or more olefin monomers. The polymer also includes greater than 0.5 percent by weight of units derived from one or more blue light absorbing monomers. In another embodiment, a method includes placing a heated parison of a polymer in a mold. The polymer is formed by polymerizing a mixture of one or more olefin monomers and one or more blue light absorbing monomers. The polymer has one or more blue light absorption characteristics. The method includes closing the mold. The method includes injecting gas into the parison to form a container in the mold. The method also includes removing the container from the mold.Type: GrantFiled: February 15, 2019Date of Patent: March 10, 2020Assignee: International Business Machines CorporationInventors: Brandon M. Kobilka, Joseph Kuczynski, Jacob T. Porter, Jason T. Wertz
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Patent number: 9890230Abstract: Novel tetracyanoanthraquinodimethane polymers and use thereof. The problem addressed was that of providing novel polymers which are preparable with a low level of complexity, with the possibility of controlled influence on the physicochemical properties thereof within wide limits in the course of synthesis, and which are usable as active media in electrical charge storage elements for high storage capacity, long lifetime and stable charging/discharging plateaus. Tetracyanoanthraquinodimethane polymers consisting of an oligomeric or polymeric compound of the general formula I have been found.Type: GrantFiled: March 6, 2015Date of Patent: February 13, 2018Assignee: Evonik Degussa GmbHInventors: Bernhard Haeupler, Ulrich Schubert, Andreas Wild
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Patent number: 9856336Abstract: Novel tetracyanoanthraquinodimethane polymers and use thereof. The problem addressed was that of providing novel polymers which are preparable with a low level of complexity, with the possibility of controlled influence on the physicochemical properties thereof within wide limits in the course of synthesis, and which are usable as active media in electrical charge storage elements for high storage capacity, long lifetime and stable charging/discharging plateaus. Tetracyanoanthraquinodimethane polymers consisting of an oligomeric or polymeric compound of the general formula I have been found.Type: GrantFiled: March 6, 2015Date of Patent: January 2, 2018Assignee: Evonik Degussa GmbHInventors: Bernhard Haeupler, Ulrich Schubert, Andreas Wild
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Patent number: 9017918Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.Type: GrantFiled: June 1, 2011Date of Patent: April 28, 2015Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
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Patent number: 9005874Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic caType: GrantFiled: April 18, 2012Date of Patent: April 14, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
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Patent number: 8940848Abstract: The present invention relates to a branched conjugated diene copolymer which is useful for preparing a rubber composition, having high uniformity of a temperature dependence curve of a viscoelasticity tan ?, for a tire, a rubber composition comprising the copolymer, and a pneumatic tire produced using the rubber composition for a tire. The branched conjugated diene copolymer is composed of monomer components comprising a branched conjugated diene compound represented by a general formula (1): wherein R1 represents an aliphatic hydrocarbon group having 6 to 11 carbon atoms, and an aromatic vinyl compound represented by a general formula (2): wherein R2 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms, and R5 represents a hydrogen atom or the like, and a copolymerization ratio (m) of the aromatic vinyl compound (2) is 45% by mass or more.Type: GrantFiled: September 4, 2013Date of Patent: January 27, 2015Assignee: Sumitomo Rubber Industries, Ltd.Inventor: Kensuke Washizu
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Publication number: 20150017586Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.Type: ApplicationFiled: July 3, 2014Publication date: January 15, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Masayoshi Sagehashi
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Publication number: 20150010857Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).Type: ApplicationFiled: September 4, 2014Publication date: January 8, 2015Applicant: FUJIFILM CORPORATIONInventors: Natsumi YOKOKAWA, Hiroo TAKIZAWA, Hideaki TSUBAKI
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Patent number: 8912301Abstract: The present invention relates to a branched conjugated diene copolymer which is useful for preparing a rubber composition, having high uniformity of a temperature dependence curve of a viscoelasticity tan ?, for a tire, a rubber composition comprising the copolymer, and a pneumatic tire produced using the rubber composition for a tire. The branched conjugated diene copolymer is composed of monomer components comprising a branched conjugated diene compound represented by a general formula (1): wherein R1 represents an aliphatic hydrocarbon group having 6 to 11 carbon atoms, and an aromatic vinyl compound represented by a general formula (2): wherein R2 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms, and R5 represents a hydrogen atom or the like, and a copolymerization ratio (m) of the aromatic vinyl compound (2) is 45% by mass or more.Type: GrantFiled: March 18, 2014Date of Patent: December 16, 2014Assignee: Sumitomo Rubber Industries, Ltd.Inventor: Kensuke Washizu
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Publication number: 20140314826Abstract: The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C?CR?—C(?O)—O—]nR??(I) [H2C?CR?—C(?O)—NH—]nR??(II) wherein n is 1, 2 or 3, R? is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.Type: ApplicationFiled: May 4, 2012Publication date: October 23, 2014Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY, THE UNIVERSITY OF NOTTINGHAMInventors: Paul Williams, Morgan Russell Alexander, Martyn Christopher Davies, Robert Langer, Daniel Griffith Anderson
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Publication number: 20140306157Abstract: Subject It is to provide a polymerizable compound having a high polymerization reactivity, a high conversion yield and a high solubility in a liquid crystal composition, a polymerizable composition including the compound, a liquid crystal composite prepared from the composition and a liquid crystal display device containing this composite. Means for Solving the Subject A compound represented by formula (1). In this formula, for example, P1 and P2 are —SCO—CH?CH2; Sp1 and Sp2 are a single bond; ring A1, ring A2, ring A3 and ring A4 are 1,4-phenylene; Z1, Z2 and Z3 are a single bond; and a is 1, and b and c is 0.Type: ApplicationFiled: April 2, 2014Publication date: October 16, 2014Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATIONInventors: Yasuyuki GOTOH, Masakazu YANO
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Publication number: 20140309394Abstract: The invention relates to a polymer composition that includes a branched alkene which is cationically polymerizable as well as a glass-forming comonomer and/or a vinyl comonomer containing benzocyclobutene as the pendant group. The structure of the polymer composition can take various forms: linear random copolymer, linear block copolymer, star random copolymer, star block copolymer, and other hyperbranched polymers. The copolymer composition can undergoes crosslinking at elevated temperatures (preferably above 180° C.).Type: ApplicationFiled: June 27, 2014Publication date: October 16, 2014Applicant: INNOLENE LLCInventors: Yonghua Zhou, Leonard Pinchuk
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Patent number: 8859180Abstract: [Task to Be Achieved] To provide a chemically amplified type positive copolymer for semiconductor lithography, which has eliminated the problems of prior art, has a high development contrast, and has excellent resolution in fine-pattern formation; a composition for semiconductor lithography which contains the copolymer; and a process for producing the copolymer. [Means for Achievement] The copolymer for semiconductor lithography according to the present invention is a copolymer which has at least (A) a repeating unit having a structure which has an alkali-soluble group protected by an acid-labile, dissolution-suppressing group, (B) a repeating group having a lactone structure and (C) a repeating group having an alcoholic hydroxyl group and which is characterized by having an acid value of 0.01 mmol/g or less as determined by dissolving the copolymer in a solvent and subjecting the solution to neutralization titration with a solution of an alkali metal hydroxide using Bromothymol Blue as an indicator.Type: GrantFiled: October 19, 2007Date of Patent: October 14, 2014Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Tomo Oikawa, Takayoshi Okada, Masaaki Kudo, Takanori Yamagishi
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Patent number: 8859185Abstract: A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R3 to R8 individually represent a group shown by the following formula (2) or the like. R1 represents a single bond or the like. R2 represents a hydrogen atom or the like.Type: GrantFiled: July 22, 2013Date of Patent: October 14, 2014Assignee: JSR CorporationInventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
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Publication number: 20140256896Abstract: The present invention relates to a polymerizable composition useful as a liquid crystal device, a display, an optical member, a coloring agent, a security marking, and a laser light emitting member and a thin film obtained from the polymerizable composition. The present invention provides a polymerizable liquid crystal composition having excellent solubility into a solvent, exhibiting good adhesion to a base material, and being capable of realizing a thin film having low haze and no variations and, in addition, provides a thin film having excellent appearance by using the polymerizable liquid crystal composition. The polymerizable liquid crystal composition according to the present invention is used and, thereby, a composition and a thin film having low haze and no variations and, at the same time, having excellent adhesion to a base material can be obtained at a low cost.Type: ApplicationFiled: November 21, 2012Publication date: September 11, 2014Inventors: Hidetoshi Nakata, Yasuhiro Kuwana, Hiroshi Hasebe, Kunihiko Kotani, Isa Nishiyama
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Patent number: 8808960Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.Type: GrantFiled: March 8, 2010Date of Patent: August 19, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
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Publication number: 20140221574Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a polymer represented by the general formula (I).Type: ApplicationFiled: June 27, 2012Publication date: August 7, 2014Applicant: DIC CORPORATIONInventors: Martin Schadt, Vladimir Grigorievich Chigrinov, Hoi-Sing Kwok, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
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Patent number: 8765895Abstract: The invention relates to a polymer composition that includes a branched alkene which is cationically polymerizable as well as a glass-forming comonomer and/or a vinyl comonomer containing benzocyclobutene as the pendant group. The structure of the polymer composition can take various forms: linear random copolymer, linear block copolymer, star random copolymer, star block copolymer, and other hyperbranched polymers. The copolymer composition can undergoes crosslinking at elevated temperatures (preferably above 180° C.).Type: GrantFiled: June 25, 2008Date of Patent: July 1, 2014Assignee: Innolene LLCInventors: Yonghua Zhou, Leonard Pinchuk
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Publication number: 20140175348Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].Type: ApplicationFiled: February 28, 2014Publication date: June 26, 2014Applicant: FUJIFILM CORPORATIONInventors: Hidenori TAKAHASHI, Shuichiro OSADA
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Patent number: 8759463Abstract: A cross-linkable resin shaped article which contains a heat curable resin, cross-linking agent, and condensed aromatic polycyclic compound which has a (meth)acryloyloxy group, a cross-linked resin shaped article which is comprised of that cross-linkable resin shaped article which is cross-linked, and a laminate which is obtained by using these are provided. The cross-linkable resin shaped article and cross-linked resin shaped article of the present invention are excellent in heat resistance and further are useful in production of a low linear expansion laminate.Type: GrantFiled: December 16, 2011Date of Patent: June 24, 2014Assignee: Zeon CorporationInventor: Akihiko Yoshiwara
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Patent number: 8754179Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.Type: GrantFiled: October 6, 2005Date of Patent: June 17, 2014Assignee: Cornerstone Research Group, Inc.Inventors: Tat Hung Tong, Emily Snyder
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Publication number: 20140151615Abstract: A coloring composition which suppresses color loss of the colored pattern to be formed, and may form a colored pattern which has excellent developability and heat resistance is provided. A colored cured film which suppresses color loss of the colored pattern to be formed, and may form a colored pattern which has excellent developability and heat resistance, a color filter which is provided with the colored pattern, and a manufacturing method thereof are provided. A solid state imaging device which has excellent color loss resistance and heat resistance is provided. A coloring composition of the present invention includes a resin (A) having a dye structure in which a peak area occupied by a component having a molecular weight of 2000 or less is below 10% in respect to a peak area of a total molecular weight distribution of the resin (A) which is measured using gel permeation chromatography.Type: ApplicationFiled: February 10, 2014Publication date: June 5, 2014Applicant: FUJIFILM CorporationInventors: Seiichi HITOMI, Yuzo NAGATA, Hiroaki IDEI, Kazuya OOTA, Yousuke MURAKAMI
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Publication number: 20140154616Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.Type: ApplicationFiled: February 10, 2014Publication date: June 5, 2014Applicant: FUJIFILM CorporationInventors: Yuzo NAGATA, Hiroaki IDEI, Atsuyasu NOZAKI, Kenta USHIJIMA, Yushi KANEKO, Yousuke MURAKAMI
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Publication number: 20140142266Abstract: The present invention relates to a polymerizable compound represented by a formula (I). The present invention provides a polymerizable compound, a polymerizable composition, a polymer, and an optically anisotropic article that are capable of obtaining an optical film having a low melting point, having excellent solubility, capable of being manufactured at low cost, and capable of uniform polarized light conversion across a broad wavelength region. [In formula: Y1 to Y6 are independently a chemical single bond, —O—, —O—C(?O)—, —C(?O)—O— etc.; G1 and G2 are independently a divalent C1-C20 aliphatic group etc.; Z1 and Z2 are independently C2-C10 alkenyl group that is substituted with a halogen atom etc.; Ax is a C2-C30 organic group that includes at least one aromatic ring selected from a group consisting of an aromatic hydrocarbon ring and an aromatic hetero ring; Ay is a hydrogen atom, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C3-C12 cycloalkyl group etc.; A1 is a trivalent aromatic group etc.Type: ApplicationFiled: April 27, 2012Publication date: May 22, 2014Applicant: ZEON CORPORATIONInventors: Kei Sakamoto, Kumi Okuyama
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Publication number: 20140121345Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).Type: ApplicationFiled: May 31, 2012Publication date: May 1, 2014Applicant: DIC CORPORATIONInventors: Martin Schadt, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
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Publication number: 20140083752Abstract: A degradable polymeric nanotube (NT) dispersant comprises a multiplicity of NT associative groups that are connected to a polymer backbone by a linking group where there are cleavable groups within the polymer backbone and/or the linking groups such that on a directed change of conditions, bond breaking of the cleavable groups results in residues from the degradable polymeric NT dispersant in a manner where the associative groups are uncoupled from other associative groups, rendering the associative groups monomelic in nature. The degradable polymeric nanotube (NT) dispersant can be combined with carbon NTs to form a NT dispersion that can be deposited to form a NT film, or other structure, by air brushing, electrostatic spraying, ultrasonic spraying, ink-jet printing, roll-to-roll coating, or dip coating. The deposition can render a NT film that is of a uniform thickness or is patterned with various thicknesses.Type: ApplicationFiled: April 3, 2012Publication date: March 27, 2014Applicant: University of Florida Research Foundation, Inc.Inventors: Ryan M. Walczak, John R. Reynolds, Andrew Gabriel Rinzler, Andrew M. Spring, Svetlana V. Vasilyeva, Pooja Wadhwa
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Publication number: 20140051807Abstract: Methods of forming polymer material from rosin-derived material are provided, along with the resulting polymers. For example, a plurality of functionalized resin acids having a polymerizable functional group via controlled living polymerization can be polymerized into the polymeric material such that each polymer defines a functional end group and the polymeric material has a polydispersity index of about 1 to about 1.5.Type: ApplicationFiled: October 28, 2013Publication date: February 20, 2014Inventor: Chuanbing Tang
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Patent number: 8637624Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.Type: GrantFiled: July 6, 2013Date of Patent: January 28, 2014Assignee: Rhodia OperationsInventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
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Publication number: 20130341304Abstract: A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching.Type: ApplicationFiled: August 28, 2013Publication date: December 26, 2013Applicant: JSR CORPORATIONInventors: Shin-ya MINEGISHI, Kazuhiko KOMURA, Shin-ya NAKAFUJI, Takanori NAKANO
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Patent number: 8609321Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.Type: GrantFiled: March 8, 2013Date of Patent: December 17, 2013Assignee: JSP CorporationInventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
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Patent number: 8609574Abstract: Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.Type: GrantFiled: April 23, 2009Date of Patent: December 17, 2013Assignee: Promerus LLCInventors: Larry F. Rhodes, Luis Francisco Martin, Andrew Bell
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Publication number: 20130331477Abstract: An optical component and an electrical board that have a low coefficient of linear expansion and small mold shrinkage, a method for producing the optical component, and a method for producing the electronic board are provided. An optical component includes a polymer having a repeating structural unit represented by general formula (1) where R1 and R2 each independently represent —H or —CH3; m and n each independently represent an integer in the range of 0 to 3; asterisk denotes a dangling bond that bonds to one of Xa and Xb; and —H bonds to the other one of Xa and Xb.Type: ApplicationFiled: June 5, 2013Publication date: December 12, 2013Inventors: Ryo Ogawa, Seiji Okada
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Publication number: 20130288126Abstract: A family of carboxylic acid groups containing fluorene/fluorenon copolymers is disclosed as binders of silicon particles in the fabrication of negative electrodes for use with lithium ion batteries. Triethyleneoxide side chains provide improved adhesion to materials such as, graphite, silicon, silicon alloy, tin, tin alloy. These binders enable the use of silicon as an electrode material as they significantly improve the cycle-ability of silicon by preventing electrode degradation over time. In particular, these polymers, which become conductive on first charge, bind to the silicon particles of the electrode, are flexible so as to better accommodate the expansion and contraction of the electrode during charge/discharge, and being conductive promote the flow battery current.Type: ApplicationFiled: March 15, 2013Publication date: October 31, 2013Inventors: Gao Liu, Vincent S. Battaglia, Sang-Jae Park
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Patent number: 8569427Abstract: Methods of forming polymer material from rosin-derived material are provided. For example, a plurality of functionalized resin acids having a polymerizable functional group via controlled living polymerization can be polymerized into the polymeric material such that each polymer defines a functional end group and the polymeric material has a polydispersity index of about 1 to about 1.5. The resulting polymers are also described.Type: GrantFiled: October 8, 2010Date of Patent: October 29, 2013Assignee: University of South CarolinaInventor: Chuanbing Tang
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Patent number: 8557501Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.Type: GrantFiled: March 21, 2012Date of Patent: October 15, 2013Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
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Publication number: 20130267672Abstract: A cross-linkable resin shaped article which contains a heat curable resin, cross-linking agent, and condensed aromatic polycyclic compound which has a (meth)acryloyloxy group, a cross-linked resin shaped article which is comprised of that cross-linkable resin shaped article which is cross-linked, and a laminate which is obtained by using these are provided. The cross-linkable resin shaped article and cross-linked resin shaped article of the present invention are excellent in heat resistance and further are useful in production of a low linear expansion laminate.Type: ApplicationFiled: December 16, 2011Publication date: October 10, 2013Applicant: ZEON CORPORATIONInventor: Akihiko Yoshiwara
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Publication number: 20130253158Abstract: The invention relates to a superabsorbent copolymer comprising a reaction product of a reactive optical brightener comonomer. In another embodiment, the superabsorbent copolymer comprises a reaction product of a first monomer and a reactive optical brightener comonomer. The reactive optical brightener comonomer may be selected from various pyrene optical brighteners listed herein. The invention also relates to superabsorbent copolymer having from about 0.1 to 10,000 ppm of a reactive optical brightener comonomer based on the superabsorbent copolymer.Type: ApplicationFiled: March 22, 2012Publication date: September 26, 2013Inventors: Matthias Naumann, James S. Wooten, IV
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Publication number: 20130236968Abstract: The present invention relates to multifunctional polymers represented by the following formula: The invention further provides methods for their preparation and methods for site-specific delivery of nucleic acids by combining them with targeting ligands, endosomolytic ligands and/or PK modulator ligands.Type: ApplicationFiled: June 20, 2011Publication date: September 12, 2013Applicant: ALNYLAM PHARMACEUTICALS, INC.Inventors: Muthiah Manoharan, Kallanthottathil G. Rajeev
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Patent number: 8530540Abstract: A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.Type: GrantFiled: July 7, 2009Date of Patent: September 10, 2013Assignee: FUJIFILM CorporationInventor: Kunihiko Kodama
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Publication number: 20130222883Abstract: There is provided a display particles including: a copolymer having a repeating unit corresponding to a vinyl compound represented by the following Formula (1) and a repeating unit corresponding to a compound with a polar group and an ethylenically unsaturated bond: Ar?H2C?CH2)n??Formula (1) wherein Ar represents an unsubstituted aromatic ring or an aromatic ring substituted with an alkyl group having from 1 to 6 carbon atoms or an aryl group having from 6 to 12 carbon atoms, and n represents an integer of from 1 to 4.Type: ApplicationFiled: December 18, 2012Publication date: August 29, 2013Applicants: FUJIFILM CORPORATION, FUJI XEROX CO., LTD.Inventors: Fuji Xerox Co., Ltd., Fujifilm Corporation
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Patent number: 8513133Abstract: A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, wherein R3 to R8 individually represent a group shown by the following formula (2) or the like, —O—R1?R2??(2) wherein R1 represents a single bond or the like, and R2 represents a hydrogen atom or the like.Type: GrantFiled: August 30, 2011Date of Patent: August 20, 2013Assignee: JSR CorporationInventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
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Patent number: 8470510Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.Type: GrantFiled: June 1, 2009Date of Patent: June 25, 2013Assignee: Daicel Chemical Industries, Ltd.Inventors: Arimichi Okumura, Keizo Inoue, Kazuki Okamoto
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Patent number: 8420753Abstract: The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index Materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.Type: GrantFiled: October 13, 2011Date of Patent: April 16, 2013Assignee: Key Medical Technologies, Inc.Inventors: Khalid Mentak, Anthony Keslinke, Kevin Phan