Abstract: Described is a cyclobutene polymer comprising: monomeric units of cyclobutene, said cyclobutene having at least one fused ring system substituted thereon, said polymer comprising not more than 10 mol percent ring-opened units of said cyclobutene; and said polymer having a molecular weight of at least 1,000; said polymer optionally copolymerized with a comonomer to form a copolymer therewith. Compositions thereof and methods of making the same are also described.

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.

Abstract: A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.

Abstract: An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

Abstract: A polyvinyl alcohol type resin, which renders possible preparation of a packaging material having high gas barrier property under a high humidity condition even as a monolayer film, is provided. The polyvinyl alcohol (PVA) type resin of the invention has at least a PVA structural unit and also has an alicyclic structural unit in the main chain. A monolayer film containing this PVA type resin and a laminate containing at least one layer comprising this PVA type resin can be used as a packaging material which shows high gas barrier property even under a high humidity condition.

Abstract: A process for producing packaging composed of thermoformable film composed of thermoplastic polyolefins provides the thermoforming of the film at temperatures in the range from 70 to 170° C., thus giving packaging which has a high heat distortion temperature in the range from 60 to 200° C. and which has a high water-vapor barrier. The thermoformable film comprises an amount in the range from 5 to 100% by weight of COC with a glass transition temperature Tg in the range from 65 to 200° C.

Abstract: A novel optical film is provided that exhibits a wavelength dispersion (a reverse wavelength dispersion) such that the birefringence of the film decreases as the wavelength becomes shorter, at least in the visible light range. The optical film includes a layer formed of a resin (A) having a heteroaromatic group or a molecular structure represented by the following formula (1), (2) or (3): where in the formula (1), n is a natural number in the range of 1 to 4, and R1 and R2 each independently represent a hydrogen atom or a methyl group. The optical film exhibits a wavelength dispersion such that the birefringence of the film decreases as the wavelength becomes shorter, at least in the visible light range.

Abstract: The compound of the present invention is represented by the formula (1). In the formula (1), R1 and R2 are hydrogen, fluorine, chlorine, methyl or ethyl; X1 and X2 are hydrogen, fluorine, methyl or trifluoromethyl; Z1 and Z2 are a single bond, —COO—, —OCO—, —CH?CH—COO—, —OCO—CH?CH—, —CH2CH2—COO—, —OCO—CH2CH2—, —CH2O—, —CONH—, —(CH2)4—, —CH2CH2— or —C?C—; Z3 and Z4 are a single bond or —O—; A1 and A2 are 1,4-cyclohexylene, 1,4-phenylene, 1,3-phenylene, pyridin-2,5-diyl, pyrimidin-2,5-diyl, naphthalen-2,6-diyl or tetrahydronaphtlane-2,6-diyl; and Y1 and Y2 are alkylene having from 2 to 20 carbon atoms.

Abstract: The use of an addition polymer A composed in copolymerized form of 0.1% to 40% by weight of at least one C3 to C30 alkene, 40% to 99.9% by weight of at least one ethylenically unsaturated C3 to C6 monocarboxylic acid, 0% to 50% by weight of at least one ethylenically unsaturated C4 to C12 dicarboxylic acid and/or of the ethylenically unsaturated dicarboxylic monoalkyl esters or dicarboxylic anhydrides obtainable from said acid, and 0% to 30% by weight of at least one other ethylenically unsaturated compound which is copolymerizable with the aforementioned monomers, as a dispersing assistant in free-radically initiated aqueous emulsion or suspension polymerization.

Abstract: A polymer comprising a unit represented by the following formula (1); and a process for producing the polymer comprising the step of polymerizing a diene compound such as 9,9-diallylfluorene in the presence of a polymerization catalyst formed by contacting a nickel compound with an organoaluminum compound and/or a boron compound:

Abstract: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of fluorene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

Abstract: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

Abstract: The present invention relates to electroluminescent polymers which contain structural units of the formula (1) and to the use thereof. The polymers according to the invention exhibit improved efficiency and a longer lifetime, in particular on use in polymeric organic light-emitting diodes.

Abstract: It is an object of the present invention to provide a composition capable of forming an insulating film which is endowed with a low dielectric constant, heat resistance, chemical resistance and a high mechanical strength that enables the insulating film to withstand CMP, and which, when an inorganic insulating film layer is provided thereon as an overlying layer, has a high adherence thereto. The composition for forming an insulating film contains polyphenylene, wherein the polyphenylene in an insulating film formed from the composition has a number of carbon atoms (C) and a number of oxygen atoms (O) which together satisfy a condition O/(C+O)?0.050. With the composition, the above object is attained.

Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

Abstract: The invention relates to a copolymer for a charge transport layer in an optoelectronic device and in particular in a light-emitting diode (LED), having a charge mobility of at least 1.0×1010 m2/V.s, and comprising at least a first and a second monomer, characterized in that the ratio of the solubilities of homopolymers made from the first and the second monomer in a first solvent is more than 10. This copolymer allows a (semi) conductive polymer to be cast to form a first layer and prevents it from being dissolved in the solvent of a subsequently deposited second, e.g. light-emitting layer. The invention further relates to a LED comprising a copolymer according to the invention.

Abstract: Norbornene monomers with fluorene group and polymer material thereof are disclosed. The norbornene monomers with fluorene group are prepared by Diels-Alder reation. The Norbornene monomers containing fluorene groups are highly active for ring-opening-metathesis polymerization (ROMP), and the molecular weight and PDI value of the obtained polymers are controllable.

Abstract: A method of controlling the molecular weight of poly(cyclic)olefin (norbornene-type) polymers and activating the polymerization thereof with a single material is provided. Such method include adding a chain transfer/activating agent to a mixture of monomer(s), catalyst, solvent and an optional cocatalyst and polymerizing the mixture to form a polymer. It is shown that the amount of chain transfer/activating agent in the mixture can serve to control the molecular weight of the resulting polymer, its percent conversion or both, and in some embodiments the optical density of the resulting polymer.

Abstract: A luminescent or charge-transporting polymer which has in the backbone optionally substituted fluorenediyl groups as repeating units and further has a functional side chain comprising at least one functional group selected from the group consisting of a hole-injection/transporting group containing one or more heteroatoms other than nitrogen or two or more nitrogen atoms, an electron-injection/transporting group containing one or more heteroatoms other than nitrogen or two or more nitrogen atoms, and a luminescent group comprising a fused aromatic hydrocarbon or heterocycle, characterized in that the functional group is directly bonded to the saturated carbon atom of any of the fluorenediyl groups or is bonded to any of the fluorenediyl groups through —Rk—X— (Rk represents alkylene and X represents a direct bond or connecting group) at the X.

Abstract: Shear-thinning ethylene/?-olefin and ethylene/?-olefin/diene monomer interpolymers that do not include a traditional branch-inducing monomer such as norbornadiene are prepared at an elevated temperature in an atmosphere that has little or no hydrogen using a constrained geometry complex catalyst and an activating cocatalyst.

Abstract: A polymer compound which is useful as a light emitting material and a charge transporting material and excellent in electron injection property, comprising as a partial structure therein a structure of the following formula (a) is provided: (wherein, a ring A and a ring B represent each independently an aromatic ring or a non-aromatic ring, and at least one of the ring A and the ring B is an aromatic ring. A ring C represents an aromatic ring. Z1 represents an atom selected from a carbon atom, oxygen atom, sulfur atom, nitrogen atom, silicon atom, boron atom, phosphorus atom and selenium atom or a group containing the atom, and Z2 to Z6 represent each independently an atom selected from a carbon atom, silicon atom, nitrogen atom and boron atom or a group containing the atom.).

Abstract: A polymer having a number average molecular weight (Mn) of from 10,000 to 5,000,000, as determined by gel permeation chromatography and reduced to polystyrene, and repeating units represented by the following formula (1): wherein R1 and R2 may be the same with or different from each other and are substituted or unsubstituted alkyl groups having 1 to 12 carbon atoms, a is a number of 0, 1, 2 or a mixture thereof, and b is a number of 0, 1, 2 or a mixture thereof.

Abstract: Polymers comprising repeating units of the formula I where the variables are defined as follows: a is an integer from 0 to 3, R1, R2, R3 are identical or different and are selected independently from among hydrogen, C1-C20-alkyl, C1-C20-alkyl containing one or more Si, N, P, O or S atoms, C6-C30-aryl, preferably C6-C14-aryl, C4-C14-heteroaryl, —N(C6-C14-aryl)2, and Y1, where Y1 may be identical or different and are selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, O—CH?CH2 and glycidyl, where Y2 is selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, —O—CH?CH2 and glycidyl, and one or more groups Y1 or Y2 may be crosslinked to one another.

Abstract: The invention relates to a method for producing a thermoplastic resin, comprising using a composition at least comprising a fluorene-containing dihydroxy compound represented by the following formula (1) and a fluorene-containing hydroxy compound represented by the following formula (2) in an amount of from 0.5 parts by weight to 1.5 parts by weight relative to 100 parts by weight of the fluorene-containing dihydroxy compound of formula (1).

Abstract: The present invention provides a graft polymer and compositions comprising a cyclic olefin polymer characterized by having a glass transition temperature of about 60° C. to 250° C. and a molecular weight of about 400 to 300000, and a fluorocarbon alkyl group grafted on the cyclic olefin polymer.

Abstract: A positive resist composition comprises a polymer comprising repeat units having formula (1) or (2). Herein denotes an aromatic hydrocarbon group, R1 is H, methyl or trifluoromethyl, R2 is H, C1-C12 alkyl or aromatic hydrocarbon group, R3 is C1-C12 alkyl, or R2 and R3 may bond together to form a ring, and a is 1 or 2. When used in the ArF lithography, the resist composition exhibits high resolution. When used in the EB image writing for mask processing, the resist composition exhibits high resolution and sensitivity sufficient to comply with high-accelerating-voltage EB irradiation, and high etch resistance.

Abstract: An olefin polymerization catalyst which includes an organometallic compound of the following Formula 1; aluminoxane; and an organic transition metal compound of the following Formula 2: M1R11R2mR3n or R2mR3nM1R11M1R2mR3n??[Formula 1 ] in Formula 1, M1 is selected from the group consisting of Group 2A, 2B and 3A of the Periodic Table, R1 is cyclic hydrocarbyl group of 5 to 30 carbon atoms, R2 and R3 are independently hydrocarbyl group of 1 to 24 carbon atoms, l is an integer of more than 1, m and n are independently an integer of 0 to 2, l+m+n is equal to the valence of M1, Q is a divalent group; M2R4pXq??[Formula 2 ] in Formula 2, M2 is Ti, Zr or Hf; R4 is cyclic hydrocarbyl group of 5 to 30 carbon atoms, X is halogen atom, p is an integer of 0 or 1, q is an integer of 3 or 4, p+q is equal to the valence of metal M2.

Abstract: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R?, R? and R?? are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.

Abstract: The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Abstract: The invention relates to compositions, polymerizable by ring-opening metathesis, which contain (a) at least one monomer and/or oligomer which is polymerizable by ring-opening metathesis polymerization, (b) at least one filler and (c) at least one initiator for the ring-opening metathesis polymerization. The compositions are characterized in that the initiator is chemically or physically bound to the filler.

Abstract: A composition comprising at least one liquid crystal compound, and at least one polymer is disclosed. The polymer comprises a constitutional unit represented by a following formula (A) and a constitutional unit derived from a monomer having a fluoroaliphatic group(s): wherein Mp represents a trivalent group constituting fully or partially a polymer main chain; L represents a single bond or a divalent linking group; and X represents a substituted or non-substituted aromatic condensed ring group.

Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst having high activity and good air stability. In one embodiment, the catalyst is free of phosphine ligands. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction. In one embodiment, the olefin-containing substrate may comprise one or more oligomers or polymers having a >20 wt. % linear siloxane (Si—O—Si) backbone tethered and/or end-capped with functional olefin groups, such as cycloalkenyl group.

Abstract: A pigment dispersion includes a pigment and a block copolymer having ionic aromatic monomers. The pigment dispersions can be used for manufacturing inkjet inks and for the coating of colored layers. A process for preparing the pigment dispersion is also disclosed.

Abstract: A pigment dispersion includes a pigment with at least one carboxylic acid group and a block copolymer including aromatic monomers having at least one carboxylic acid group or a salt thereof and aromatic monomers having at least one sulfonic acid group or a salt thereof. The pigment dispersions can be used for manufacturing inkjet inks and for the coating of colored layers.

Abstract: The present invention provides conjugates having a degradable linkage and polymeric reagents useful in preparing such conjugates. Methods of making polymeric reagents and conjugates, as well as methods for administering conjugates and compositions, are also provided.

Abstract: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.

Abstract: A cyclic olefin addition copolymer includes a structural unit (1) derived from a cyclic olefin compound with a C4 alkyl substituent group and a structural unit (2) derived from a cyclic olefin compound with a C5-12 alkyl substituent group, and optionally includes a structural unit (3) derived from another cyclic olefin compound. The novel cyclic olefin addition copolymers according to the present invention are excellent in melt-formability, transparency and heat resistance, have low water absorption properties, low dielectric constant and low metal content, and are suitably used in optical parts such as optical films. Processes according to the present invention produce the cyclic olefin addition copolymers at high yield with small amounts of catalysts.

Abstract: A polymer compound having a repeating unit of the following formula (1): (wherein, R1 represents a substituent, Q1 and Q2 represent a group containing a benzocyclobutane structure, a represents an integer of 0 to 3. When there exist a plurality of R1s, these may be the same or different.).

Abstract: The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by the following general formulas (1) and (1)?, a constituent unit (a2) derived from an (?-lower alkyl)acrylate ester having a lactone-containing monocycle or a polycyclic group, and a constituent unit (a3) which is a constituent unit other than the constituent unit (a1) and the constituent unit (a2) and is derived from an (?-lower alkyl)acrylate ester which has an aliphatic cyclic group-containing non-acid dissociable dissolution inhibiting group and does not have a polar group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of 1 to 5, and m represents 0 or 1.

Abstract: The present invention provides a crosslinked propylene-based elastomer having an isotactic propylene triad tacticity of from 65 to 95%, a melting point by DSC equal to or less than 110° C., a heat of fusion of from 5 J/g to 50 J/g, an ultimate tensile strength of 1 MPa or greater, a Die C tear strength of 50 lb/in or greater, and a ratio of Shore A hardness to MFR@230° C. prior to crosslinking of 160 or less, and comprising at least 75 wt % propylene-derived units, at least 5 wt % ethylene-derived units, and from 0.3 to 10 wt % diene-derived units. The present invention also provides elastomeric compositions comprising a crosslinked propylene-based elastomer as described herein and from 0 to 5 parts by weight of carbon black per 100 parts of polymer. The present invention also provides articles such as films, fibers, nonwovens, molded objects, and extruded forms which include any of the inventive compositions described herein.

Abstract: A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.

Abstract: Nanoflims useful for filtration are prepared from amphiphilic species and one or more polymeric components. The amphiphilic species or components may be oriented on an interface or surface. A nanofilm may be prepared by coupling one or more of the components. The nanofilm may also be deposited or attached to a substrate.

Abstract: A film forming composition includes a compound having a cage structure; and a compound having a conjugated diene structure.

Abstract: A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.

Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.

Abstract: The invention relates to copolymers made from monoethylenically unsaturated monomers with acid groups and a further hydrophobic monomer component for the prevention of inorganic and organic deposits in water supply systems. The invention further relates to a method for production of the above.

Abstract: Dental material being polymerizable by ring-opening metathesis polymerization comprising (i) at lest one ruthenium complex bearing at least one N-heterocyclic carbene ligand or precursors which generate a ruthenium complex bearing at least one N-heterocyclic carbene ligand in situ; and (ii) at least one cyclic olefin capable of metathesis.

Abstract: A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.

Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).