From Fused Or Bridged Ring Containing Monomer Patents (Class 526/280)
  • Patent number: 7524912
    Abstract: A polymerizable composition including a late transition metal complex, a non-polar olefin, a polar olefin, and a free radical scavenger, wherein the polymerizable composition is capable of forming a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer, is disclosed. A method of copolymerizing a non-polar olefin with a polar olefin, catalyzed by a late transition metal complex in the presence of a free radical scavenger, to produce a linear poly[(non-polar olefin)-(polar olefin)] substantially free of free radical addition polymer is also disclosed.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: April 28, 2009
    Assignee: Rohm and Haas Company
    Inventors: Brian Leslie Goodall, Thomas Cleveland Kirk, Lester Howard McIntosh, III
  • Patent number: 7504466
    Abstract: A process for preparing crosslinked polymer particles at high solids levels (i.e., >40 wt %). Also provided is a method for predicting whether a selection of reaction conditions for preparing crosslinked polymer particles will exhibit a potential for forming a gel and a method for predicting whether a selection of reaction conditions will or will not result in the formation of a gel.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: March 17, 2009
    Assignee: Rohm and Haas Company
    Inventors: Wayne Devonport, Susan J. Fitzwater, Eric G. Lundquist
  • Publication number: 20090058289
    Abstract: The present invention relates to triaylamines which are substituted by defined groups. These compounds can be used for producing organic electroluminescent devices.
    Type: Application
    Filed: March 3, 2007
    Publication date: March 5, 2009
    Applicant: MERCK PATENT GMBH
    Inventors: Philipp Stoessel, Holger Heil, Arne Buesing
  • Publication number: 20090043064
    Abstract: A metal complex having a structure of the following general formula (1): (wherein, X1 and X2 represent independently a carbon atom or nitrogen atom. Bonds represented by X1C and X2N are a single bond or double bond. M represents a transition metal atom. A dihedral angle defined by a plane containing a structure represented by CX1—X2 and a plane containing a structure represented by X1—X2N is 9° to 16°, and the proportion of the sum of squares of orbital coefficients of the outermost d orbital of the metal atom M, in the highest occupied molecular orbital of the metal complex, occupying with respect to the sum of squares of all atom orbital coefficients, is divided by an energy difference S1?T1 between the lowest excitation singlet energy S1 and the lowest excitation triplet energy T1 of the metal complex, to give a value of 200 to 600%/eV.).
    Type: Application
    Filed: February 21, 2007
    Publication date: February 12, 2009
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, SUMATION CO., LTD.
    Inventors: Nobuhiko Akino, Satoshi Mikami, Chizu Sekine
  • Publication number: 20080248220
    Abstract: A light emitting material comprising a conjugated polymer compound (A) containing an aromatic ring in the main chain and a compound (B) showing light emission from the triplet excited state, wherein an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, calculated by a computational chemical means, is 1.3 eV or more, or an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, experimentally measured, is 2.2 eV or more, in the polymer compound (A), and either the following (Condition 1) or the following (Condition 2) or both of them are satisfied.
    Type: Application
    Filed: September 10, 2004
    Publication date: October 9, 2008
    Inventors: Chizu Sekine, Nobuhiko Akino, Satoshi Mikami
  • Patent number: 7422836
    Abstract: Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: September 9, 2008
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Lawrence Seger, Brian L. Goodall, Lester H. McIntosh, III, Robert J. Duff
  • Publication number: 20080188634
    Abstract: Shape-persistent organic materials, including polymers, with large degrees of interior free volume are described, along with behaviors and phenomena enabled by their unique properties. One class of such a material is built up from triptycene base moieties wherein three benzene rings are bridged together about a [2.2.2] tricyclic ring system. These units can be assembled into discreet molecules and polymers. These materials and/or formulations thereof with liquid crystals or polymers are useful for the complexation of chemicals and/or polymers; they have very low dielectric constants for use as coatings in dielectric circuits, they provide additional ordering mechanisms in liquid crystals, and they display unusual mechanical responses when subjected to electrochemical, chemical, or mechanical stimuli.
    Type: Application
    Filed: July 23, 2007
    Publication date: August 7, 2008
    Applicant: Massachusetts Institute of Technology
    Inventors: Timothy M. Swager, Timothy M. Long, Zhengguo Zhu
  • Patent number: 7408013
    Abstract: The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: August 5, 2008
    Assignee: Commonwealth Scientific and Industrial Research Organization
    Inventors: Andrew Edward Feiring, Michael Fryd, Frank Leonard Schadt, III
  • Patent number: 7393468
    Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.
    Type: Grant
    Filed: February 23, 2005
    Date of Patent: July 1, 2008
    Assignee: Intel Corporation
    Inventors: Daoqiang Lu, Eric J. Li
  • Publication number: 20080145571
    Abstract: A polymer compound comprising a structure of the following formula (1): (wherein, A ring and B ring each independently represent an aromatic hydrocarbon ring optionally having a substituent, and C ring represents an alicyclic hydrocarbon ring containing no condensed aromatic compound and having at least one substituent. The alicyclic hydrocarbon may contain a hetero atom).
    Type: Application
    Filed: December 21, 2005
    Publication date: June 19, 2008
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Shigeya Kobayashi, Satoshi Kobayashi
  • Patent number: 7385018
    Abstract: The present invention involves a hydrogenated copolymer obtained by hydrogenating a copolymer having a softening point falling in a range of 45 to 55° C. determined by a ball & ring method, wherein the hydrogenated copolymer has a softening point of 85 to 95° C. determined by the ball & ring method, and a hot melt adhesive composition comprising this copolymer hydrogenated product. The hydrogenated copolymer of the present invention has a small weight reduction rate in heating and a good hue after heating. The hot melt adhesive composition comprising the same has excellent fluidity in heating and has a small heating loss and a small change in a hue in heating and has excellent heat stability.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: June 10, 2008
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventor: Toshihiro Mine
  • Patent number: 7357973
    Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cycloolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: April 15, 2008
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Kazuyuki Obuchi, Teruhiko Suzuki, Kenji Otoi
  • Patent number: 7351461
    Abstract: An article comprising the compound of Formula (I) wherein X is hydrogen or a radical of Formula (II), R1 independently at each occurrence is a C1-C20 aliphatic radical, a C3-C10 cycloaliphatic radical, or a C3-C10 aromatic radical; R2, R3, R4 and R5 are independently at each occurrence a halogen, a nitro group, a cyano group, a hydroxy group, a C1-C20 aliphatic radical, a C3-C20 cycloaliphatic radical, or a C6-C20 aromatic radical; and “n”, “q”, and “p” are each independently integers having a value of 0 to 3, and “m” is an integer having a value of 0 to 4.
    Type: Grant
    Filed: June 5, 2007
    Date of Patent: April 1, 2008
    Assignee: General Electric Company
    Inventors: Yogendrasinh B. Chauhan, Adil Minoo Dhalla, Rahul R. Khanwelkar, Krishnamoorthy Sivakumar, Kiran Arunkumar Puthamane
  • Patent number: 7339006
    Abstract: The invention discloses an adhesion agent composition comprising at least one C3-C200 olefin compound having at least one metathesis active double bond, wherein the olefin is substituted or unsubstituted; and at least one compatibilizing functionality for interacting with a substrate surface. The substrate surface can be any surface, for example, silicate glasses, silicate minerals, metals, metal alloys, ceramics, natural stones, plastics, carbon, silicon, and semiconductors. The invention also discloses articles of manufacture utilizing these adhesion agents as well as methods for adhering a polyolefin to a substrate surface.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: March 4, 2008
    Assignee: Cymetech, L.L.C.
    Inventors: Michael A. Giardello, Christopher M. Haar
  • Publication number: 20080020289
    Abstract: There is disclosed a polymer comprising: at least, a repeating unit of substitutable hydroxy styrene and a repeating unit of substitutable hydroxy vinylnaphthalene which are represented by the following general formula (1). There can be provided a polymer suitable as a base resin of a positive resist composition, in particular, a chemically amplified positive resist composition that can exhibit higher resolution than conventional positive resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; a positive resist composition and a patterning process that use the polymer.
    Type: Application
    Filed: June 12, 2007
    Publication date: January 24, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takanobu Takeda
  • Publication number: 20080020290
    Abstract: There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.
    Type: Application
    Filed: June 12, 2007
    Publication date: January 24, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takanobu Takeda
  • Patent number: 7312285
    Abstract: The present invention relates to a method for preparing a cyclic olefin polymer by addition polymerization, and more particularly to a method for preparing a norbornene-based addition polymer, which comprises a step of contacting a norbornene-based monomer having an ester or acetyl group with a catalyst system comprising: a Group X transition metal compound; a compound comprising a neutral Group XV electron donor ligand having a cone angle of at least 160°; and a salt capable of offering an anion that can be weakly coordinated to the transition metal, in solvent. The norbornene-based addition polymer having an ester or acetyl group according to the present invention is transparent, has superior adhesivity and a low dielectric constant, and it generates no byproducts when attached to metal. Therefore, it can be used as an optical film, a retardation film, a protection film for a polarizer, POFs (plastic optical fiber), PCBs (printed circuit board), or insulators of electronic devices.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: December 25, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Sung-Ho Chun, Won-Kook Kim, Sung-Cheol Yoon, Tae-Sun Lim, Heon Kim, Kyoung-Hoon Kim
  • Patent number: 7312292
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: December 25, 2007
    Assignee: Promerus LLC
    Inventors: Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Saikumar Jayaraman, Robert John Duff, John-Henry Lipian
  • Patent number: 7312291
    Abstract: A new family of concrete admixture additives can be derived from reacting a mixture of olefins/cyclic olefins-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-olefins/cyclic olefins-maleic anhydride terpolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers. These reactions lead to formation of a kind of carboxylic salt containing polymer, which can be used alone in concrete. Only a small amount of this substance is needed to provide excellent water reduction, high concrete flowability and high early strength.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: December 25, 2007
    Assignee: Taiwan Gwan Chian Industrial Co., Ltd.
    Inventor: Theresa Tsai
  • Patent number: 7291689
    Abstract: The present invention provides norbornene-based copolymers for which one monomer is at least selected from a group consisting of norbornene and dicyclopentadiene, and the other from norbornene-based comonomers of Formula 1 shown below: In Formula 1, R1, R2 and a are defined in this specification. The present invention provides insulating elements for multi-chip packages and antireflection films for the exposure process of semiconductor fabrication using said norbornene-based copolymers. Norbornene-based copolymers according to the present invention have low dielectric constant as well as high thermal stability and excellent solubility to various organic solvents.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: November 6, 2007
    Assignee: Seoul National University Industry Foundation
    Inventors: Jin Kyu Lee, Dong Woo Yoo, Seung Jae Yang, Kook Heon Char, Joo Hyeon Park
  • Patent number: 7285370
    Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: October 23, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Jin-soo Kim
  • Publication number: 20070224436
    Abstract: A film forming composition comprises a compound having a cage structure and a thermally decomposable compound, an insulating film is formed by using the film forming composition and an electronic device comprises the insulating film.
    Type: Application
    Filed: March 22, 2007
    Publication date: September 27, 2007
    Applicant: FUJIFILM Corporation
    Inventor: Hidetoshi Hiraoka
  • Patent number: 7232639
    Abstract: As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: June 19, 2007
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 7220808
    Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.
    Type: Grant
    Filed: February 23, 2004
    Date of Patent: May 22, 2007
    Assignee: Maruzen Petrochemical Co. Ltd.
    Inventors: Takanori Yamagishi, Takahito Mita
  • Patent number: 7186773
    Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
    Type: Grant
    Filed: January 9, 2004
    Date of Patent: March 6, 2007
    Assignee: Daikin Industries, Ltd.
    Inventors: Takayuki Araki, Takuji Ishikawa, Takuji Kume, Akinori Yamamoto
  • Patent number: 7183366
    Abstract: The present invention is generally directed to copolymers of fluorene. It further relates to devices that are made with the copolymers.
    Type: Grant
    Filed: September 14, 2004
    Date of Patent: February 27, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Frank P. Uckert, Howard E. Simmons, III
  • Patent number: 7183365
    Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: February 27, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Frank P. Uckert, Andrew Edward Feiring
  • Patent number: 7173097
    Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst having high activity and good air stability. In one embodiment, the catalyst is free of phosphine ligands. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction. In one embodiment, the olefin-containing substrate may comprise one or more oligomers or polymers having a >20 wt. % linear siloxane (Si—O—Si) backbone tethered and/or end-capped with functional olefin groups, such as cycloalkenyl groups.
    Type: Grant
    Filed: July 15, 2004
    Date of Patent: February 6, 2007
    Assignee: Kerr Corporation
    Inventor: Christos Angeletakis
  • Patent number: 7163993
    Abstract: This invention relates to olefin polymers particularly suited to satisfying the dielectric properties required in electrical device use. The olefin polymers can be prepared by contacting polymerizable olefin monomers with catalyst complexes of Group 3–11 metal cations and noncoordinating or weakly coordinating anion compounds bound directly to the surfaces of finely divided substrate particles or to polymer chains capable of effective suspension or solvation in polymerization solvents or diluents under solution polymerization conditions. Thus, the invention includes polyolefin products prepared by the invention processes, particularly ethylene-containing copolymers, having insignificant levels of mobile, negatively charged particles as detectable by Time of Flight SIMS.
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: January 16, 2007
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventor: Patrick Brant
  • Patent number: 7160969
    Abstract: The invention relates to metathesis oligomers wherein one or more alkoxy ether groups are attached to the oligomer moiety. Also disclosed is a polymerizable composition comprising a catalytically effective amount of a penta- or hexavalent ruthenium or osmium carbene catalyst, the process for preparing the metathesis polymer by applying the reaction conditions of Ring Opening Metathesis Polymerization (=ROMP) to the polymerisable composition; and various technical applications of the metathesis oligomers as antifog agents.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: January 9, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Piero Piccinelli, Manuel Vitali, Alessandro Zedda
  • Patent number: 7157536
    Abstract: A composition that can be used as a component in auto clear coat and primer is disclosed. The composition comprises or is an alkoxylated amine having the formula of (A)[N(R1H)2]p including an isomer or mixture of isomers thereof. Also disclosed is a process, which comprises contacting an amine with an epoxide under a condition sufficient to produce an alkoxylated amine. Further disclosed is a composition that can be used as coating composition and primer, which comprises an alkoxylated amine and an organic polyisocyanate.
    Type: Grant
    Filed: January 19, 2004
    Date of Patent: January 2, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Gia Huynh-Ba, Patrick Henry Corcoran, Carl Brent Douglas, Christian Peter Lenges, John Stuart Coates
  • Patent number: 7148296
    Abstract: A thermoset composition exhibiting reduced water absorption in the cured state includes an olefinically unsaturated monomer and a capped poly(arylene ether) prepared by the reaction of an uncapped poly(arylene ether) with an anhydride capping agent. The capped poly(arylene ether) is isolated and/or purified by methods that reduce the concentrations of polar impurities that contribute to water absorption by the cured composition.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: December 12, 2006
    Assignee: General Electric Company
    Inventors: Kenneth Paul Zarnoch, John Robert Campbell, Amy Rene Freshour, Hua Guo, John Austin Rude, Prameela Susarla, Michael Alan Vallance, Gary William Yeager
  • Patent number: 7119360
    Abstract: Novel pentaphenylenes having the following general formula are described; These polymers generally exhibit blue electroluminescence and are useful in electronic devices.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: October 10, 2006
    Assignee: Max-Plank-Society
    Inventors: Klaus Mullen, Andrew C. Grimsdale, Josemon Jacob
  • Patent number: 7115899
    Abstract: Novel pentaphenylene copolymers which are useful in electronic devices are described.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: October 3, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Frank P. Uckert
  • Patent number: 7115688
    Abstract: The invention provides a method of preparing nanoparticles having at least one polymer shell attached to them, each polymer shell having a selected property or properties. The method comprises attaching initiation monomers to the surfaces of the nanoparticles, contacting the nanoparticles having the initiation monomers attached to them with a transition metal ring-opening metathesis catalyst to activate the initiation monomers, and contacting the nanoparticles with one or more types of propagation monomers of the formula P—L—N under conditions effective so that the monomers are polymerized to form the one or more polymer shells. In the formula P—L—N, N is a cyclic olefin-containing group, P is a moiety which gives each polymer shell a selected property or properties, and L is a bond or linker. The invention also provides polymers formed by polymerizing the propagation monomers.
    Type: Grant
    Filed: November 30, 1999
    Date of Patent: October 3, 2006
    Assignee: Nanosphere, Inc.
    Inventors: Chad A. Mirkin, SonBinh T. Nguyen
  • Patent number: 7105258
    Abstract: There is provided a charge transport material which can easily be coated to form a film, is less likely to be crystallized during or after film formation, has excellent charge transport capability, and high applicability to electronic devices. A charge transport monomer comprising conventional CBP with a specific substituent introduced thereinto is polymerized to prepare a polymer which is brought to a charge transport material comprising this polymer.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: September 12, 2006
    Assignees: Dai Nippon Printing Co., Ltd., Takasago International Corporation
    Inventors: Satoshi Suzuki, Masato Okada, Yoshinobu Kashibuchi, Tohru Kobayashi
  • Patent number: 7060770
    Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium curbene complex catalyst, such as one containing an alkylidene ligand with basicity higher than that of tricyclohexylphosphine (PCy3) and a neutral electron donor ligand with a basicity lower than that of PCy3, whereby the catalyst initiates the metathesis reaction of the composition upon mixing with the substrate. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: June 13, 2006
    Assignee: Kerr Corporation
    Inventor: Christos Angeletakis
  • Patent number: 7060769
    Abstract: A method of controlled curing by a metathesis reaction upon mixing its components, the method including the step of mixing an olefin-containing substrate, a metathesis catalyst, and a reaction control agent. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst, such as one containing an alkylidene ligand with basicity higher than that of tricyclohexylphosphine (PCy3) and a neutral electron donor ligand with a basicity lower than that of PCy3, whereby the catalyst initiates the metathesis reaction of the composition upon mixing with the substrate. The reaction control agent is effective to slow the progress of the metathesis reaction and prevent its completion in the absence of an elevated temperature. The control agent may be a hydrocarbon containing carbon-carbon double bonds and/or triple bonds, or maybe a modified hydrocarbon with one or more Group 14 or 15 atoms.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: June 13, 2006
    Assignee: Kerr Corporation
    Inventor: Christos Angeletakis
  • Patent number: 7037994
    Abstract: Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R1 is a hydrogen atom and R2and R3 individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.
    Type: Grant
    Filed: July 23, 2003
    Date of Patent: May 2, 2006
    Assignee: JSR Corporation
    Inventors: Hikaru Sugita, Keiji Konno, Masato Tanaka, Tsutomu Shimokawa
  • Patent number: 7037974
    Abstract: A poly(?-olefin) copolymer obtained from the polymerization of at least one ?-olefin having from 2 to about 20 carbon atoms and at least one bulky olefin, the process comprising polymerizing the monomers in the presence of hydrogen and a catalytically effective amount of a catalyst comprising the product obtained by combining a metallocene procatalyst with a cocatalyst; lubricant compositions comprising such poly(?-olefin) copolymer; and a method for improving the viscosity index of a lubricant composition using such poly(?-olefin) copolymer.
    Type: Grant
    Filed: February 4, 2004
    Date of Patent: May 2, 2006
    Assignee: Uniroyal Chemical Company, Inc.
    Inventors: Anthony DiMaio, Thomas P. Matan
  • Patent number: 7034095
    Abstract: A bicyclic conjugated diene polymer obtained by polymerizing a monomer (M) comprising at least one kind of bicyclic conjugated diene monomer represented by formula (I), and a bicyclic conjugated diene copolymer obtained by copolymerizing monomer (M) with at least one kind of unsaturated compound other than said monomer: wherein, R1 to R6 are the same or different and are each hydrogen, halogen, or alkyl or halogenated alkyl of 1 to 20 carbon; n and m are each an integer of from 0 to 10; X1, X2, Y1 and Y2 are the same or different from each other and are each hydrogen, halogen or alkyl or halogenated alkyl of 1 to 20 carbon; and, when m or n is 2 or more, each of mX1's, mX2's, nY1's and nY2's are the same or different.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: April 25, 2006
    Assignee: Nippon Petrochemicals Co., Ltd.
    Inventors: Saisuke Watanabe, Teppei Tsujimoto, Shuichi Tajima
  • Patent number: 7033729
    Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: April 25, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae-chang Jung, Keun Kyu Kong, Seok-kyun Kim
  • Patent number: 7022457
    Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: April 4, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: William Brown Farnham, Andrew Edward Feiring, Frank Leonard Schadt, III, Weiming Qiu
  • Patent number: 7019093
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: March 28, 2006
    Assignee: Dow Global Technologies Inc.
    Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
  • Patent number: 7005484
    Abstract: A method for making a polymer or oligomer comprising the steps of making a first monomer comprising a substituted aromatic or heteroaromatic group by providing an aromatic or heteroaromatic group substituted with first and second director groups, performing metalisation at a first position on the aromatic or heteroaromatic group, performing electrophilic substitution so as to provide a first substituent group at the first position, and contacting in a reaction mixture the first monomer with at least two further monomers that independently are the same or different from the first monomer under conditions so as to form a polymer or oligomer, wherein the nature and positions of the first and second director groups regioselect the first position.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: February 28, 2006
    Assignee: Cambridge Display Technology Limited
    Inventors: Andrew B. Holmes, Florence D. Geneste, Rainer E. Martin, Franco Cacialli
  • Patent number: 6989426
    Abstract: The current major way of making nanofibers is electrospinning. However, the minimum fiber diameter is limited to be about 300–500 nm, which is not compliant with the physical definition of nano structures (in the region of 1 to 100 nm). Futher, the productivity is relatively low. This invention provides a method for manufacturing a nano-sized di-block polymer including at least a hard-segment polymer and a soft-segment polymer. First, a sample containing the hard-segment polymer, the soft-segment polymer, and a catalyst is dissolved in a first solvent. Then the dissolved sample is cast on substrate, and then the first solvent to is removed form a dried sample. Finally, the nano-sized di-block polymer is formed by crew-cutting.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: January 24, 2006
    Assignee: The Hong Kong Polytechnic University
    Inventors: Jinlian Hu, Subrata Mondal
  • Patent number: 6977284
    Abstract: It is an object of the present invention to provide a polymerizable composition and a cured resin composition, linear expansion coefficients of which are significantly improved without impairment of the excellent properties such as heat resistance, mechanical strength and the like of norbornene-based resins. The present invention is a polymerizable composition, which comprises a polymerizable substance containing a norbornene-based monomer or oligomer as a main component, a metathesis polymerization catalyst and silica powder, the weight content of the silica powder being larger than the weight content of the polymerizable substance.
    Type: Grant
    Filed: February 17, 2003
    Date of Patent: December 20, 2005
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Takeharu Morita, Nobuhiro Goto, Hiroshi Yoshitani, Hiroshi Hiraike
  • Patent number: 6969751
    Abstract: The present invention relates to a method for preparing homo- and co-polymers having high molecular weights in high yields by polymerizing cyclic olefin compounds using a complex prepared by mixing a nickel salt compound, an organoaluminoxane compound, and at least one fluorine-containing compound.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: November 29, 2005
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Young Chan Jang, Hyun Kyung Sung, Eun Joo Park
  • Patent number: 6960398
    Abstract: A charge transporting material provided by the present invention comprising a compound, a molecular structure of which has at least one repeating unit represented by the following formula (1): wherein, Ar is a non-substituted or substituted arylene group having 6 or more to 60 or less carbon atoms related to a conjugated bond or a non-substituted or substituted heterocyclic group having 4 or more to 60 or less carbon atoms related to a conjugated bond, and wherein, each R may be independently selected from the group consisting of hydrogen atom, alkyl group having 1 to 20 carbon atoms, alkoxyl group having 1 to 20 carbon atoms, alkylthio group having 1 to 20 carbon atoms, alkylsilyl group having 1 to 60 carbon atoms, alkylamino group having 1 to 40 carbon atoms, aryl group having 6 to 60 carbon atoms, aryloxyl group having 6 to 60 carbon atoms, arylalkyl group having 7 to 60 carbon atoms, arylalkoxyl group having 7 to 60 carbon atoms, arylalkenyl group having 8 to 60 carbon atoms, arylamino group having 6
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: November 1, 2005
    Assignee: Dai Nippon Printing Co., Ltd
    Inventors: Junji Kido, Satoshi Suzuki, Kiyoshi Itoh
  • Patent number: 6960637
    Abstract: Polymers comprising repeating units of the formula I: where the variables are defined as follows: a is an integer from 0 to 3, R1, R2, R3 are identical or different and are selected independently from among hydrogen, C1-C20-alkyl, C1-C20-alkyl containing one or more Si, N, P, O or S atoms, C6-C30-aryl, preferably C6-C14-aryl, C4-C14-heteroaryl, —N(C6-C14-aryl)2, and Y1, where Y1 may be identical or different and are selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, O—CH?CH2 and glycidyl, where Y2 is selected from among —CH?CH2, trans- or cis- CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, —O—CH?CH2 and glycidyl, and one or more groups Y1 or Y2 may be crosslinked to one another.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: November 1, 2005
    Assignee: BASF Aktiengesellschaft
    Inventors: Reinhold Schwalm, Yvonne Heischkel, Horst Weiss