Abstract: Silicone resin compositions comprising (A) an organopolysiloxane containing at least two aliphatic unsaturated bonds, (B) an organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms in a molecule, (C) a platinum group metal base catalyst, and (D) a mold release agent cure into colorless, transparent, heat resistant parts which can be smoothly released from the mold and used as lenses in LED devices.

Abstract: Fluoride catalyzed rearrangement reactions of polymeric silsesquioxanes [RSiO1.5]n involve reacting at least one silsesquioxane material with a catalytic amount of an organic fluoride at a temperature ranging from about ?50° C. to about 120° C. thereby forming a reaction mixture for a period ranging from 60 minutes to 48 hours. To the reaction mixture, a quenching agent is added to remove fluoride from the reaction mixture. A silsesquioxane cage compound can be isolated from the reaction mixture using a precipitation or other extraction process.

Abstract: An alkyl silane compound represented by the general formula RSi(OL)3 (here, R is an alkyl group, L is H, Si or a group capable of easily changing the OL group into the OH group in a solution or a suspension), a silicon compound represented by the general formula Si(OM)4 (here, M is H, Si or a group capable of easily changing the OM group into the OH group in a solution or a suspension), and water are reacted in a solvent or a dispersion medium. A thermoplastic layered alkyl siloxane with the composition formula represented by the general formula (RSi1+xO2+1.5x+0.5xLz)m (here, R is an alkyl group, L is H, Si or a group capable of easily changing the OL group into the OH group in a solution or a suspension, and 0.5?x?2, 2?m?200, 0?z), which is a thermoplastic inorganic/organic layered composite having good shaping property and dispersing property, capable of transitioning at various temperatures including the vicinity of the room temperature can be provided.

Abstract: The present disclosure relates to a method of preparing polysilazane and a polysilazane solution which can minimize substitution of an Si—H bond of a starting compound by ammonia. Particularly, a method of synthesizing polysilazane using a solution which undergoes phase separation and a method of preparing a polysilazane solution for a wafer are disclosed. The method of preparing polysilazane using halosilane and liquid anhydrous ammonia includes adding liquid anhydrous ammonia to a solvent in a weight ratio of 0.5:1 to 10:1, followed by stirring to prepare a mixture solution, and allowing pseudo-ammonolysis to be carried out by adding halosilane to the mixture solution separated into two phases.

Abstract: A method for preparing polyorganosiloxanes (POS) by a ring-opening polymerization and/or linear, non-linear or cyclic POS redistribution in the presence of a nucleophilic carbene. The initial efficiency of the POS conversion is substantially increased at low temperature, resulting in less residual content of initial POS.

Abstract: This invention relates to a novel polymerization initiator capable of introducing an active amino proton into a polymerization starting terminal without losing polymerization activity, and a novel modified conjugated diene polymer being excellent in the interaction with a filler and capable of improving a low heat buildup of a rubber composition, and more particularly to a polymerization initiator being a diamine compound in which one amino group is protected with a silylating agent and an active proton of the other amino group is replaced with an alkali metal or an alkaline earth metal, and a modified conjugated diene polymer which can be produced by using such a polymerization initiator and is a homopolymer of a conjugated diene compound or a copolymer of a conjugated diene compound and an aromatic vinyl compound and has a residue derived from a diamine compound at its polymerization starting terminal.

Abstract: Organopolysiloxanes having aminoalkyl groups are prepared by (i) reacting (A) linear, cyclic or branched organopolysiloxanes with (B) aminoalkyl silanes having an SiC-bonded hydrocarbon radical comprising basic nitrogen and 2 or 3 hydrolyzable groups, or partial or full hydrolyzates thereof, in the presence of (C) basic catalysts and optionally (D) chain-terminating reagents, at a temperature of at least 60° C., then, after the reaction (i), (ii) deactivating the catalysts (C) and (iii) cooling the product to a temperature below 60° C. before, during or after the deactivation (ii) of the catalysts, with the proviso that the process is performed in at least two successive stirred tanks, the reaction (i) and the cooling (iii) proceeding separately in different stirred tanks.

Abstract: Disclosed herein is an initiator integrated polydimethylsiloxane(iPDMS). The iPDMS is a polydimethylsiloxane undergoing a hydrosilylation reaction. The initiator 10-undecenyl 2-bromo-2-methyl propionate is integrated on the surface of iPDMS by covalent bond. At % is 0.01-1% confirmed by X-ray photoelectron spectroscopy. Disclosed herein is a method for making an initiator integrated polydimethylsiloxane. Prepolymer A, cross-linker B and vinyl-terminated initiator C were mixed below a ratio of 10:1:4-0.01 for 6-24 hours, then the elastomer was formed. And, disclosed herein is functional surface modification of initiator integrated polydimethylsiloxane and its applications for biocompatibility, organic solvent compatibility and heat-sensitive materials.

Abstract: A silicone rubber emulsion composition comprising (A) 100 parts diorganopolysiloxane having at least two silicon-bonded alkenyl groups, (E) 0 to 60 parts reinforcing silica filler, (B) 10 to 250 parts water containing a smectite clay, (C) 0.1 to 15 parts emulsifier, and (D) a cross-linking agent (e.g., an organohydrogenpolysiloxane) in an amount sufficient for cross-linking component (A) and a catalyst (e.g., a platinum-type catalyst). A method for preparing the aforementioned emulsion composition comprising mixing components (A) and (E) with other components in a high-speed stirrer-equipped mixer. A method of manufacturing a silicone rubber comprising either heating and dehydrating the aforementioned emulsion composition.

Abstract: A process for producing a low VOC epoxy silane oligomer which includes the reaction of an epoxy silane with water in a water to silane molar ratio of from 0.1 to 1.5, in which the epoxy silane is the reaction product of an epoxy alkoxy-substituted silane and a diol or a dicarboxylic acid.

Abstract: A process for producing a soluble silicone product is provided. The process includes the steps of chemically reacting a polydialkoxysiloxane with an aliphatic alcohol with or without a catalyst in a reaction mixture, removing produced alcohol from the mixture; recovering the water soluble portion of produced silicone product, purifying the water soluble portion; and recovering hydrophilic material in the water insoluble portion.

Abstract: Provided is a liquid silicone rubber coating agent composition, including: (A) an organopolysiloxane containing at least one alkenyl group bonded to a silicon atom within each molecule, (B) a straight-chain organohydrogenpolysiloxane containing a single silicon atom-bonded hydrogen atom only at each molecular chain terminal, with a viscosity at 25° C. within a range from 0.001 to 1.0 Pa·s, (C) an organohydrogenpolysiloxane containing at least three silicon atom-bonded hydrogen atoms within each molecule, with a viscosity at 25° C. within a range from 0.001 to 10 Pa·s, (D) an addition reaction catalyst, (E) a finely powdered silica with a BET specific surface area of at least 50 m2/g, and (F) an adhesion imparting agent. Also provided is a curtain air bag with a rubber coating layer formed by curing this composition.

Abstract: A method of neutralizing a polysiloxane having acidic residuals is disclosed. The method involves contacting a polysiloxane having acidic residuals with a carbon solid, and separating the carbon solid from the polysiloxane. This invention is particularly useful to neutralize residual acid polymerization catalysts in organopolysiloxanes.

Abstract: An absorbent material formed at least in part of a cross-linked polymer. The absorbent material has a centrifuge retention capacity as determined by a Centrifuge Retention Capacity Test of at least about 20 g/g and a gel bed permeability under load as determined by a Gel Bed Permeability Under Load Test of at least about 300×10?9 cm2 or a free swell gel bed permeability as determined by a Free Swell Gel Bed Permeability Test of at least about 2,500×10?9 cm2. The cross-linked polymer may comprise either at least about 75 weight percent anionic polymer or at least about 75 weight percent cationic polymer. In one embodiment, the cross-linked polymer is surface treated with a water soluble non-cross-linked polymer having a potential for becoming charged opposite that of the cross-linked polymer.

Abstract: A silicone rubber emulsion composition comprising (A) 100 parts diorganopolysiloxane having at least two silicon-bonded alkenyl groups, (E) 0 to 60 parts reinforcing silica filler, (B) 10 to 250 parts water containing a smectite clay, (C) 0.1 to 15 parts emulsifier, and (D) a cross-linking agent (e.g., an organohydrogenpolysiloxane) in an amount sufficient for cross-linking component (A) and a catalyst (e.g., a platinum-type catalyst). A method for preparing the aforementioned emulsion composition comprising mixing components (A) and (E) with other components in a high-speed stirrer-equipped mixer. A method of manufacturing a silicone rubber comprising either heating and dehydrating the aforementioned emulsion composition.

Abstract: A cap layer that enables a photopatternable, spin-on material to be used in the formation of semiconductor device structures at wavelengths that were previously unusable is disclosed. The photopatternable, spin-on material is applied as a layer to a semiconductor substrate. The cap layer and a photoresist layer are each formed over the photopatternable layer. The cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning the photoresist layer. The photopatternable, spin-on material is convertible to a silicon dioxide-based material upon exposure to a second wavelength of radiation.

Abstract: The present invention relates to the use of tocopherol as a co-catalyst in the ring opening polymerisation of cyclic siloxanes. The present invention further relates to a method for manufacturing hydrophilic polysiloxanes, wherein a hydrido-containing cyclic siloxane is reacted with a hydrophilic molecule comprising a carbon-carbon double bond, having the general formula (I) H2C?CH—(CHR)n—O—(CHR1CR2R3)mR4 or (II) H2C?CH—(CHR)n—R5, wherein n is an integer from 0 to 4, m is an integer from 0 to 5, R, R1, R2, R3 and R4 are each independently hydrogen or a C1 to C6 alkyl, R5 is a saturated cyclic hydrocarbon containing carbonyl group, in the presence of a first catalyst to obtain a monomer, and polymerising said monomer in the presence of a second catalyst and tocopherol as a co-catalyst.

Abstract: A silicone emulsion composition for wood treatment is prepared by emulsifying and dispersing (A) an organopolysiloxane, (B) the reaction product of an amino-containing organoxysilane and an acid anhydride, (C) an epoxy-containing organoxysilane, (D) colloidal silica and/or polysilsesquioxane, and (E) a curing catalyst in water to form a silicone emulsion, and adding and mixing (F) a boron compound with the silicone emulsion.

Abstract: A resin composition for encapsulating an optical semiconductor element that comprises components (A), (B) and (C) described below: (A) a branched silicone resin containing 2 to 6 epoxy groups, one or more (R1SiO3/2) units, two or more (R2R3SiO)n structures and 3 or more (R43-xR5xSiO1/2) units per molecule, in an amount of 100 parts by weight, wherein R1, R2, R3, R4 and R5 each represents a hydrogen atom, a hydroxyl group or a monovalent organic group of 1 to 20 carbon atoms which monovalent organic group may or may not contain an oxygen atom, provided that at least two of the R5 groups within each molecule represent an epoxy group and/or an epoxy group-containing non-aromatic group, n represents an integer of 3 to 20, and x represents an integer of 1 to 3, (B) a curing agent, in such an amount that a content of epoxy reactive groups in the component (B) ranges from 0.4 to 1.5 moles per 1 mol of epoxy groups within component (A), and (C) a curing catalyst, in an amount within a range from 0.

Abstract: Provided is a positive resist material, particularly a chemically amplified positive resist material having higher sensitivity, higher resolution, a higher exposure latitude and better process adaptability than conventional positive resist materials, and providing a good pattern profile after exposure, particularly having lessened line edge roughness and exhibiting excellent etching resistance. These materials may contain, preferably an organic solvent and acid generator, more preferably a dissolution inhibitor or a basic compound and/or a surfactant. Provided is a positive resist material comprising a polymer comprising at least one monomer unit selected from a group consisting of a monomer unit (A), a monomer unit (B) and a monomer unit (C) represented by the following formula (1); and having a glass transition temperature (Tg) of 100° C. or greater.

Abstract: An object of the present invention is to provide polycarbosilane which is excellent in solubility in general-purpose organic solvents, and heat resistance, and a method for producing the same. Polycarbosilane of the present invention comprises the following repeated unit [1]. Polycarbosilane may further comprise the following repeated unit [2] and, in that case, a content of the repeated unit [1] is preferably not less than 20 mol % relative to 100 mol % of a total of the repeated unit [1] and the repeated unit [2]. (wherein R1 represents an C1-C6 alkyl group, R2 represents an alkyl group having 2 or more carbon atoms, and R1 and R2 may be the same or different) (wherein Me represents a methyl group).

Abstract: A novel multi-functional linear siloxane compound, a siloxane polymer prepared from the siloxane compound, and a process for forming a dielectric film by using the siloxane polymer. The linear siloxane polymer has enhanced mechanical properties (e.g., modulus), superior thermal stability, a low carbon content and a low hygroscopicity and is prepared by the homopolymerization of the linear siloxane compound or the copolymerization of the linear siloxane compound with another monomer. A dielectric film can be produced by heat-curing a coating solution containing the siloxane polymer which is highly reactive. The siloxane polymer prepared from the siloxane compound not only has satisfactory mechanical properties, thermal stability and crack resistance, but also exhibits a low hygroscopicity and excellent compatibility with pore-forming materials, which leads to a low dielectric constant.

Abstract: A self-adhesive organopolysiloxane composition is provided comprising (A) an organopolysiloxane containing at least two silicon-bonded alkenyl groups, (B) an organohydrogenpolysiloxane containing at least two SiH groups, (C) a hydrosilylation catalyst, and (D) an adhesive component obtained by previously mixing (i) a titanium chelate catalyst and/or a tetraorganoxytitanium and (ii) a silane coupling agent and aging the mixture. The composition cures at room temperature or lower temperature while it is fully adhesive to metal and plastic substrates.

Abstract: A process for condensation between at least one ?SiOH unit and at least one ?SiOR unit is provided. In accordance with the present invention, R=a hydrogen or a C1-C20 hydrocarbon group optionally comprising one or more heteroatoms, and the ?SiOH and ?SiOR units belong to at least one identical or different (organo)silicon compound P. The process is conducted in the presence of an effective amount of at least one catalyst C, comprising a carbene. Compositions are also provided.

Abstract: This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for in-corporating the fluorinated or non-fluorinated functional groups onto silsesquioxane backbone. The silsesquioxane resins of this invention has the general structure (HSiO3/2)a(RSiO3/2)b wherein; R is an acid dissociable group, a has a value of 0.2 to 0.9 and b has a value of 0.1 to 0.8 and 0.9?a+b?1.0.

Abstract: Provided is a silicone composition, including: (A) an organopolysiloxane represented by an average composition formula R1nSiZ[(4?n)/2] (in which, R1 represents a monovalent hydrocarbon group, an alkoxy group or a hydroxyl group, provided that from 5 to 50 mol % of all R1 groups are alkenyl groups, and from 10 to 80 mol % of all R1 groups are aryl groups, Z represents an oxygen atom or a bivalent hydrocarbon group, provided at least 80 mol % of all Z groups are oxygen atoms, and n is a number that satisfies 1=n<2), in which from 5 to 50 mol % of all silicon atoms exist within structures represented by an average formula: —SiR22—X—(SiR22O)1SiR22—X—SiR22O— (in which, R2 represents a monovalent hydrocarbon group, provided that from 10 to 80 mol % of all R2 groups are aryl groups, X represents an oxygen atom or a bivalent hydrocarbon group, and l represents an integer of 3 or greater), (B) an organohydrogenpolysiloxane having at least 2 SiH groups within each molecule, and (C) an addition reaction catalyst.

Abstract: Linear hydroxy endblocked linear polyorganosiloxanes, linear chloro-endblocked polyorganosiloxanes, and mixtures thereof, are redistributed in a process by contacting the linear polyorganosiloxanes, with a diorganodichlorosilane having the formula R?2SiCl2, wherein R? is an alkyl group containing 1-8 carbon atoms; in the presence of an aqueous hydrochloric acid catalyst; to form a redistributed mixture containing cyclic polyorganosiloxanes and chloro-endblocked polyorganosiloxanes. The process generates less amounts of undesired branched siloxane species than processes which utilize an alumina catalyst.

Abstract: The invention relates to a method for processing mixtures which contain HCl, H2O and siloxanes in the presence of packings comprising fluorinated vinyl polymers.

Abstract: A process for producing an epoxy silane oligomer including a reaction glycidoxy silane and/or cycloaliphatic epoxy silane having 2 or 3 alkoxy groups and, optionally, a copolymerizable silane other than glycidoxy and cycloaliphatic epoxy silane, with less than 1.5 equivalents of water in the presence of a catalyst, wherein said water is continuously fed during the reaction.

Abstract: A dental restorative composition comprises a resin composition comprising a low shrinkage, polymerizable oligomer contains units of the structure: AB??(I) wherein A is an organic radical having 1 to about 6 (meth)acrylate groups and 0 to about 5 hydroxy groups; B is an organic radical having 1 to about 5 epoxide groups, and wherein A and B are linked through the reaction of an epoxide and a hydroxy group; and a filler composition comprising a polyhedral silsequioxane and a sol-derived filler. These polymerizable dental composites may be used for a variety of dental materials, treatments, and restorative functions, including crown and bridge materials, fillings, adhesives, sealants, luting agents or cements, denture base materials, orthodontic materials and sealants, and other dental restorative materials.

Abstract: A process for production of an assembly including several silicone elements crosslinked by polyaddition of ?Si—H units onto ?Si-alkenyl (preferably ?Si-vinyl) units, the elements adhering to one another without detracting from their mechanical properties. The process includes: (I) forming (1st coating) a silicone element (i) with a liquid silicone preparation (i) containing polyorganosiloxanes (POS) A with ?Si-vinyl units, (POS) B with ?Si—H units, a platinum catalyst C; (II) crosslinking so that (i) has a surface density SD of unreacted, residual vinyl, per nm2, of 0.0100?SD?0.0040; (III) optionally repeating steps (I) and (II) n times to give n elements (i) that adhere to one another; (IV) forming (2nd coating) a silicone element (ii) with a liquid silicone preparation (ii) of the same type as described above; (v) crosslinking to give crosslinked (ii) that adheres to (i).

Abstract: Provided is a method of producing a high molecular weight organopolysiloxane with a polystyrene equivalent weight average molecular weight of at least 5×104, comprising the steps of producing an organopolysiloxane by subjecting a silane compound having a hydrolyzable group to a first hydrolysis and condensation, and then subjecting that organopolysiloxane to an additional second hydrolysis and condensation. The high molecular weight organopolysiloxane is stable, resistant to gelling, and resistant to cracking even when formed as a thick film. A resin composition comprising the high molecular weight organopolysiloxane and a condensation catalyst is useful for sealing an optical element and for producing an optical semiconductor device.

Abstract: The present invention relates to a stable, preferably well dispersed, more preferably translucent, and even more preferably clear, aqueous fabric color-restoring composition, fabric color-restoring methods, and articles of manufacture that use such fabric color-restoring composition. The fabric color-restoring composition comprises an effective amount of a silicone polymer fabric color-restoring agent, typically the minimum levels of fabric color-storing agent included in the composition are at least about 1.75%, preferably at least about 2.0%, more preferably at least about 2.5%, even more preferably at least about 3.0% and typically maximum levels of fabric color-restoring agent are less than about 10.0%, preferably less than about 7.0%, particularly in the range of about 3.0% to about 6.0%; and optionally, but preferably, an effective amount to increase the coefficient of static friction, of a static friction-increasing agent.

Abstract: Amino alkoxy-modified silsesquioxanes (amino AMS), and/or amino co-AMS compounds that also comprise a mercaptosilane or a blocked mercaptosilane, are excellent adhesives for coating plated or unplated metal wire for adherence of the wire to a rubber stock. The amino AMS and/or the amino/mercaptan co-AMS adhesives can be used with all types of rubber and there is no requirement for the use of special adhesive additives to the rubber vulcanizates, such as, but not limited to, cobalt, resins and high sulfur levels. In particular, the use of amino AMS and/or amino/mercaptan co-AMS compounds as adhesives for bonding wire to rubber also improves the adherence performance of the reinforcements to obtain sufficient bonding that is resistant to degradation over the course of time, especially resistance to thermal aging and/or thermo-oxidizing aging, in particular corrosion in the presence of water.

Abstract: A mixture for forming a coating on a surface includes a metal alkoxide having the chemical formula Si(OR1)4, OR1 being a hydrolysable group, an organoalkoxysilane having the chemical formula R2xSiOR1(4-x), R2 being an epoxy group and x being an integer from 0 to 3 , a silica filler, and an organic acid for promoting hydrolysis and cross-linking the metal alkoxide and the organoaloxysilane. A coating on the surface is formed by depositing the mixture on the surface to form an under layer and depositing an outer layer comprising primarily a radiation activated self-cleaning material on the under layer. The radiation activated self-cleaning material can include titanium dioxide (TiO2) particles at least partially in anatase form.

Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.

Abstract: A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3??(1) RnSiZ4-n??(2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

Abstract: The present invention provides a method for producing polyorganosiloxane particles through the step of hydrolyzing and condensing a silicon compound having a non-hydrolyzable group and a hydrolyzable alkoxyl group bonded to its silicon atom in the presence of a catalyst and thereby forming seed particles of polyorganosiloxane particles to obtain a seed-particles-containing solution and the step of adding a particle-diameter-growing aqueous solution containing the same silicon compound or a hydrolyzate thereof to the above seed-particles-containing solution to grow the above seed particles, the method comprising the step of obtaining the seed-particles-containing solution, in which particles are measured for a particle diameter continuously or at intervals of a constant time period and terminating the reaction at a time when an intended particle diameter is reached.

Abstract: A coating composition comprising a fluorine-containing silicon compound represented by the following formula (1) wherein Z is a linear or branched divalent polyorganosiloxane residue having 1 to 40 siloxane units, R is an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is a hydrolyzable group, Q is a C2-12 divalent connecting group, a is an integer of 2 or 3, b is an integer of from 1 to 10, y is an integer of 1 to 5, and Rf is a group represented by the following formula (2) -Rf1-(Q-W-Q-Rf1)q- ??(2) wherein Rf1 is a perfluoropolyether residue, W is an organopolysiloxane residue having 1 to 40 siloxane units and Q is as defined above and may be the same with or different from each other, and q is an integer of from 0 to 3, and at least one solvent selected from the group consisting of alcohols, esters, ethers, ketones, and perfluoroethers. The coating prepared from the composition is oil-repellent, water-repellent and has water sliding property.

Abstract: A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Ce, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, (D) a cyclic ether-substituted alcohol, and (E) an organic solvent. The silicon-containing film ensures effective pattern formation, effective transfer of a photoresist pattern, and accurate processing of a substrate.

Abstract: A method of making a diluted organopolysiloxane polymer comprising the steps of:— (i) preparing an organopolysiloxane polymer by polymerising cyclic organopolysiloxane monomer(s) in the presence of an organic diluent material, a suitable catalyst and an end-blocking agent; and (ii) Where required quenching the polymerisation process; wherein the diluent material is substantially retained within the resulting diluted organopolysiloxane.

Abstract: A chain end modified polymer comprising the reaction product of a living anionic elastomeric polymer and a silane-sulfide modifier A preferred class of modifiers includes compounds represented by the formula: (RO)x(R)ySi—R?—S—SiR3, wherein Si is silicon; S is sulfur; O is oxygen; x is an integer selected from 1, 2 and 3; y is an integer selected from 0, 1, and 2; x+y=3; R is the same or different and is: (C1-C16) alkyl; and R? is aryl, alkylaryl, or (C1-C16) alkyl. The invention further includes methods for making such chain end modified polymers, their use in preparing vulcanized elastomeric polymer compositions, and articles made from such compositions, including pneumatic tires, tire treads, belts, and the like. The subject compositions exhibit lower Tan ? at 60° C. values, while maintaining good processing characteristics, and a good balance of physical properties, including: abrasion resistance, tensile strength, modulus and elongation at break.

Abstract: Organopolysiloxanes having aminoalkyl groups are prepared by (i) reacting (A) linear, cyclic or branched organopolysiloxanes with (B) aminoalkylsilanes which have an SiC-bonded, basic nitrogen-containing hydrocarbon radical and 2 or 3 hydrolyzable groups, ?or the partial or complete hydrolysis products thereof, optionally in the presence of (C) basic catalysts and/or (D) chain-terminating reagents, and (ii) optionally, after the reaction (i) neutralizing the optionally used basic catalysts (c), with the proviso that compounds (A), (B) and, when used, (D) are reacted continuously in a reaction space whose ratio of length to diameter is equal to or greater than four.

Abstract: Cardanol based dimers are provided. The cardanol dimers are formed by hydrosylylation with silanes. Cardanol based dimers may be further reacted to form epoxy curing agents and epoxies which can be used as anti-fouling coatings on ship hulls and marine structures. The cardanol dimers may also be used to produce friction particles or phenolic resins. Methods of synthesizing the cardanol based dimers, the epoxy curing agents and the epoxies are also provided.

Abstract: A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, (A-2) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of a base catalyst, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Ce, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, (D) a cyclic ether-substituted alcohol, and (E) an organic solvent. The silicon-containing film ensures effective pattern formation, effective transfer of a photoresist pattern, and accurate processing of a substrate.

Abstract: The invention relates to ?-ethoxysilane modified polymers of the average general formula (I): in which R is a mono- to tetravalent polymer radical, not more than a third of the radicals R1, R2, and R3 present in the polymer of the formula (I), independently of one another, are alkyl radicals having 1 to 4 carbon atoms, at least a quarter of the radicals R1, R2, and R3 present in the polymer of the formula (I), independently of one another, are ethoxy radicals, any remaining radicals R1, R2, and R3, independently of one another, are methoxy radicals, and in which n is 1 to 4. The invention further relates to a process for preparing the polymers of the formula (I), and also to their use in adhesives, sealants, and coating materials.

Abstract: The coating film of the invention is obtained by curing an applied film formed by application of a composition containing an organic solvent with a boiling point of 80° C. or higher, wherein the shrinkage ratio of the film thickness from the applied film immediately after application is no greater than 27%.

Abstract: Provided herein according to some embodiments of the present invention are dual-crosslinkable waterborne urethane coating compositions including an ionically-charged urethane having oxidative curable ethylenic unsaturation and self condensing silanol functionality.

Abstract: A polycarbonate-polysiloxane copolymer comprising structural units of the formula: wherein each R1, R2, and R3 is independently the same or different monovalent C1-12 should this be C1-C13 like in the document! hydrocarbon group, G comprises a monovalent C6-1000 poly(oxyalkyl) group, each R4 and R5 taken together is independently the same or different divalent C3-30 hydrocarbon linking group wherein R4 is a C1-28 hydrocarbon and R5 is a C2-29 aliphatic group, a is 0 or greater, and b is one or greater; and structural units of the formula: wherein each R is independently the same or different C6-60 divalent hydrocarbon group, and at least 60% of the R groups comprise aromatic moieties.