Cyclic Alcohol Moiety Patents (Class 560/220)
  • Patent number: 9340484
    Abstract: Process for preparing bicyclic or tricyclic (meth)acrylates by reacting (meth)acrylic acid with a bicyclic or tricyclic hydrocarbon which contains at least one double bond using montmorillonite as catalyst.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: May 17, 2016
    Assignee: EVONIK ROEHM GmbH
    Inventors: Joachim Knebel, Thorben Schuetz, Guenther Graeff, Hedwig Luise Johanna Ohl
  • Patent number: 9309194
    Abstract: The present invention relates to compounds of formula (I) wherein R1 signifies a C1-C15 alkyl moiety or a C2 to C18 alkenyl moiety, to their process of production as well as to their use in organic synthesis, especially as intermediates (building blocks) in the synthesis of vitamin A or ?-carotene or derivatives thereof, or other carotenoids, e.g. canthaxanthin, astaxanthin or zeaxanthin, preferably vitamin A.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: April 12, 2016
    Assignee: DSM IP ASSETS B.V.
    Inventors: Werner Bonrath, Thomas Netscher, Jan Schütz, Bettina Wüstenberg
  • Patent number: 9289366
    Abstract: The present invention relates to novel compounds and their use as fragrance materials.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: March 22, 2016
    Assignee: International Flavors & Fragrances Inc.
    Inventors: Benjamin Amorelli, Edward Mark Arruda, Robert P. Belko, Tingwei Cai, Adam P. Closson, Nicole L. Giffin, Gary J. Mertz, Michael G. Monteleone
  • Patent number: 9040742
    Abstract: The present invention relates to a process of production of a compound, which is useful as an intermediate (building block) in organic synthesis, especially in the synthesis of vitamin A or ?-carotene and derivatives thereof, e.g. canthaxanthin, astaxanthin or zeaxanthin.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: May 26, 2015
    Assignee: DSM IP ASSETS B.V.
    Inventors: Werner Bonrath, Bettina Wuestenberg, Thomas Netscher, Jan Schuetz
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Publication number: 20150057207
    Abstract: The present invention relates to novel compounds and their use as fragrance materials.
    Type: Application
    Filed: August 22, 2014
    Publication date: February 26, 2015
    Inventors: Benjamin Amorelli, Edward Mark Arruda, Robert P. Belko, Tingwei Cai, Adam P. Closson, Nicole L. Giffin, Gary J. Mertz, Michael G. Monteleone
  • Publication number: 20150030638
    Abstract: The present invention broadly relates to the use of certain ingenol derivatives as HIV reactivators of latent HIV virus in viral reservoirs. In another aspect, the present invention relates to an association comprising such ingenol derivatives and antiretroviral agents substantially active against actively replicating virus.
    Type: Application
    Filed: March 1, 2013
    Publication date: January 29, 2015
    Applicant: AMAZÔNIA FITOMEDICAMENTOS LTDA.
    Inventors: Luiz Francisco Pianowski, Amilcar Tanuri
  • Publication number: 20150031910
    Abstract: The present invention relates to a process of production of a compound, which is useful as an intermediate (building block) in organic synthesis, especially in the synthesis of vitamin A or ?-carotene and derivatives thereof, e.g. canthaxanthin, astax-anthin or zeaxanthin.
    Type: Application
    Filed: December 14, 2012
    Publication date: January 29, 2015
    Inventors: Werner Bonrath, Bettina Wuestenberg, Thomas Netscher, Jan Schuetz
  • Publication number: 20150025265
    Abstract: The present invention relates to a novel crystalline form of ingenol mebutate, methods of preparation thereof, and to its use. More specifically, the invention relates to the conversion of amorphous ingenol mebutate (ingenol-3-angelate, PEP005) to a crystalline form, which was characterized by single crystal X-Ray crystallography (XRC), attenuated total reflectance Fourier transform infrared (FTIR-ATR) spectroscopy and Differential Scanning calorimetry (DSC).
    Type: Application
    Filed: February 17, 2014
    Publication date: January 22, 2015
    Applicant: LEO LABORATORIES LIMITED
    Inventor: Steven Martin Ogbourne
  • Publication number: 20150004545
    Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.
    Type: Application
    Filed: September 19, 2014
    Publication date: January 1, 2015
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Norihiko IKEDA, Takanori KAWAKAMI
  • Publication number: 20140378360
    Abstract: The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.
    Type: Application
    Filed: September 12, 2014
    Publication date: December 25, 2014
    Inventors: Hugo Robert Germain DENUTTE, Johan SMETS, An PINTENS, Koen VAN AKEN, Freek Annie Camiel VRIELYNCK
  • Publication number: 20140350100
    Abstract: The present disclosure provides novel glucagon-like peptide-1 (GLP-1) receptor modulators such as compounds of Formula (I) or (II), and pharmaceutically acceptable salts thereof. The present disclosure also provides pharmaceutical compositions, kits, and uses that involve the GLP-1 receptor modulators for regulating blood glucose levels and/or treating diabetes via, e.g., modulating the endogenous signaling pathways mediated by the GLP-1 receptor.
    Type: Application
    Filed: May 27, 2014
    Publication date: November 27, 2014
    Applicants: Academia Sinica
    Inventors: Klim King, Rong-Jie Chein
  • Publication number: 20140322310
    Abstract: Topical gel compositions comprising ingenol-3-angelate, wherein less than 10% of the ingenol-3-angelate degrades when the gel is stored for 2 years at 25° C.
    Type: Application
    Filed: December 12, 2012
    Publication date: October 30, 2014
    Inventors: Per Ola Arvidsson, Edit Farkas, Karsten Petersson, Gert Hoy
  • Publication number: 20140322810
    Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti-adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.
    Type: Application
    Filed: June 24, 2014
    Publication date: October 30, 2014
    Inventors: Pui-Kwong CHAN, May Sung MAK
  • Patent number: 8859804
    Abstract: Disclosed is a method for producing a (meth)acrylate ester wherein a high purity (meth)acrylate ester is obtained with a high yield, with a reduced loss of (meth)acrylic acid anhydride. In the method, (meth)acrylic acid is recovered with a high yield, and the (meth)acrylate ester is purified easily. Specifically disclosed is a method for producing a (meth)acrylate ester which comprises: (1) a step of producing (meth)acrylic acid anhydride by reacting a specific fatty acid anhydride and (meth)acrylic acid, while removing a by-produced fatty acid; (2) a step of obtaining a (meth)acrylate ester by reacting an alcohol and unpurified (meth)acrylic acid anhydride obtained in step (1) preferably at a temperature not less than 90° C.; and (3) a step of recovering (meth)acrylic acid by distillation preferably at a temperature not less than 90° C. The method may also comprise a step of heating or distilling the reaction liquid obtained in step (2) at a temperature not less than 90° C.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: October 14, 2014
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Ryuichi Ansai, Hiroyuki Nogami, Kuniyoshi Ogura
  • Patent number: 8846840
    Abstract: Provided according to the present invention are an adamantyl (meth)acrylate represented by formula (1), having a formazin standard turbidity of less than 1.7 NTU (Nephelometric Turbidity Unit) in methylethylketone or tetrahydrofuran, and also a (meth)acrylic copolymer comprising the adamantyl (meth)acrylate as a repeating unit: (in the formula, R1 represents hydrogen or a methyl group; R2 through R4 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having a carbon number of 1 to 3, an aryl group, an alkoxy group, an aryloxy group, a halogen group, an alkyl halide group, or a hydroxyalkyl group; and n1 represents 0 or 1).
    Type: Grant
    Filed: March 29, 2011
    Date of Patent: September 30, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kikuo Furukawa, Toshiharu Yamashita, Yoshio Nishimura
  • Publication number: 20140235889
    Abstract: Process for preparing bicyclic or tricyclic (meth)acrylates by reacting (meth)acrylic acid with a bicyclic or tricyclic hydrocarbon which contains at least one double bond using montmorillonite as catalyst.
    Type: Application
    Filed: November 20, 2012
    Publication date: August 21, 2014
    Applicant: EVONIK ROEHM GmbH
    Inventor: Hedwig Luise, Johanna Ohl
  • Patent number: 8802350
    Abstract: A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR2R3(OR4), and R2 to R4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R3 and R4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R3 and an oxygen atom bonded to R4.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: August 12, 2014
    Assignee: JSR Corporation
    Inventors: Mitsuo Sato, Masafumi Yoshida
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Patent number: 8790861
    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: July 29, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Mingqi Li, Cheng-Bai Xu
  • Patent number: 8791288
    Abstract: An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: July 29, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeru Watanabe, Koji Hasegawa, Seiichiro Tachibana
  • Patent number: 8791293
    Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
    Type: Grant
    Filed: August 2, 2012
    Date of Patent: July 29, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Kazunori Mori, Satoru Narizuka, Fumihiro Amemiya, Masaki Fujiwara
  • Publication number: 20140199631
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Application
    Filed: December 17, 2013
    Publication date: July 17, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama
  • Publication number: 20140199378
    Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti-adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.
    Type: Application
    Filed: July 13, 2012
    Publication date: July 17, 2014
    Applicant: PACIFIC ARROW LIMITED
    Inventors: Pui-Kwong Chan, May Sung Mak
  • Publication number: 20140186769
    Abstract: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed.
    Type: Application
    Filed: December 10, 2013
    Publication date: July 3, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takaaki Kaiho, Yoshiyuki Utsumi, Jun Iwashita, Masahito Yahagi
  • Publication number: 20140186771
    Abstract: A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R1 is a hydrogen atom, a fluorine atom, or the like. R2 is a hydrogen atom or a monovalent hydrocarbon group. R3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R6 is a monovalent chain hydrocarbon group. R6 is bonded to R3 to form a first alicyclic structure, or R6 is bonded to R5 to form a second alicyclic structure. At least one hydrogen atom of R2, R3, or R4 is optionally substituted with a fluorine atom.
    Type: Application
    Filed: March 7, 2014
    Publication date: July 3, 2014
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Patent number: 8735558
    Abstract: This invention provides methods, processes, compounds and compositions for modulating the gene expression and modulating the secretion, expression, or synthesis of adhesion proteins or their receptors to cure disease, wherein the modulating comprises positive and negative regulating; wherein comprises inhibiting cancer growth, wherein the adhesion proteins or receptors comprise fibronectin, integrins family, Myosin, vitronectin, collagen, laminin, Glycosylation cell surface proteins, polyglycans, cadherin, heparin, tenascin, CD 54, CAM, elastin and FAK; wherein the methods, processes, compounds and compositions are also for anti-angiogenesis; wherein the cancers comprise breast cancer, leukocyte cancer, liver cancer, ovarian cancer, bladder cancer, prostate cancer, skin cancer, bone cancer, brain cancer, leukemia cancer, lung cancer, colon cancer, CNS cancer, melanoma cancer, renal cancer or cervix cancer.
    Type: Grant
    Filed: August 14, 2009
    Date of Patent: May 27, 2014
    Assignee: Pacific Arrow Limited
    Inventors: Pui-Kwong Chan, May Sung Mak
  • Publication number: 20140120326
    Abstract: A polymerizable compound is provided. The polymerizable compound has two or more polymerizable functional groups in a molecule thereof, wherein one of the two or more polymerizable functional groups of the polymerizable compound is an acrylamide group having the below-mentioned formula (1). The polymerizable compound can be preferably used for inkjet ink.
    Type: Application
    Filed: September 17, 2013
    Publication date: May 1, 2014
    Applicant: RICOH COMPANY, LTD.
    Inventors: Mitsunobu Morita, Soh Noguchi, Okitoshi Kimura
  • Patent number: 8653133
    Abstract: The present invention relates to a novel crystalline form of ingenol mebutate, methods of preparation thereof, and to its use. More specifically, the invention relates to the conversion of amorphous ingenol mebutate (ingenol-3-angelate, PEP005) to a crystalline form, which was characterized by single crystal X-Ray crystallography (XRC), attenuated total reflectance Fourier transform infrared (FTIR-ATR) spectroscopy and Differential Scanning calorimetry (DSC).
    Type: Grant
    Filed: April 18, 2011
    Date of Patent: February 18, 2014
    Assignee: LEO Laboratories Limited
    Inventor: Steven Martin Ogbourne
  • Publication number: 20140045123
    Abstract: A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 13, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa
  • Patent number: 8637623
    Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; “A” represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: January 28, 2014
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hiroshi Koyama, Kyuhei Kitao, Akira Eguchi
  • Publication number: 20140024113
    Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.
    Type: Application
    Filed: September 6, 2013
    Publication date: January 23, 2014
    Applicant: PACIFIC ARROW LIMITED
    Inventors: Pui-Kwong CHAN, May Sung Mak
  • Patent number: 8632792
    Abstract: A cooling sensation agent composition with a prolonged cool sensation effect is provided comprising at least one compound selected from the group consisting of aceia or ketal derivatives of 3-(1-menthoxy)propan-1,2-diol represented by Formula (1), single or mixed carbonic esters ol one or two kinds ol alcohols represented by Formula (2), and carboxylic esters represented by Formula (4). A sensory stimulation agoni composition, a flavor or fragrance composition, a beverage or food product, a perfume or cosmetic product, a toiletry product, a daily utensil product or grocery, a fiber, a fiber product, a cloth or a medicine comprising the cooling sensation agent composition; a production method thereof; a cooling processing method of a fiber, fiber product or a cloth, comprising compounding the cooling sensation agent; and new compounds are also provided.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: January 21, 2014
    Assignee: Takasago International Corporation
    Inventors: Kenya Ishida, Takashi Aida, Tetsuya Yamamoto
  • Patent number: 8614197
    Abstract: This invention provides a method for treating cancer by blocking the migration, metastasis of cancer cells, growth of cancers wherein the cancers comprise breast cancer, leukocyte cancer, liver cancer, ovarian cancer, bladder cancer, prostate cancer, skin cancer, bone cancer, brain cancer, leukemia cancer, lung cancer, colon cancer, CNS cancer, melanoma cancer, renal cancer or cervix cancer. This invention provides uses of compositions comprising a triterpenoidal saponin, triterpenoid, triterpenoidal compound or sapongenin, comprising at least two side groups selected from the group consisting of angeloyl groups, tigloyl groups and senecioyl groups, wherein the side groups are attached to carbon 21, 22 or/and 28 of triterpenoidal sapogenin, triterpenoid, triterpenoidal compound or other sapongenin backbones.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: December 24, 2013
    Assignee: Pacific Arrow Limited
    Inventors: Pui-Kwong Chan, May Sung Mak, Yun Wang
  • Patent number: 8609321
    Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: December 17, 2013
    Assignee: JSP Corporation
    Inventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
  • Publication number: 20130324600
    Abstract: The invention relates to compounds of general formula (I) wherein R is (C1-C7)alkyl, (C2-C7)alkenyl or (C2-C7)alkynyl; wherein R is substituted with R1; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for use—alone or in combination with one or more other pharmaceutically active compounds—in therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.
    Type: Application
    Filed: December 22, 2011
    Publication date: December 5, 2013
    Applicant: LEO LABORATORIES LIMITED
    Inventors: Gunnar Grue-Sørensen, Xifu Liang, Thomas Högberg
  • Patent number: 8598292
    Abstract: Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: December 3, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yoshihisa Arai, Takehiko Isobe
  • Publication number: 20130302735
    Abstract: Provided are monomers, polymers, photoresist compositions and coated substrates which find use in the formation of photolithographic patterns by negative tone development. The monomers are of the following general formula (I): wherein: R1 represents hydrogen or methyl. The methods find particular applicability in the manufacture of semiconductor devices.
    Type: Application
    Filed: November 3, 2012
    Publication date: November 14, 2013
    Inventors: Jibin SUN, Young Cheol BAE, Jong Keun PARK, Seung-Hyun LEE, Cecily ANDES
  • Publication number: 20130260315
    Abstract: A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.
    Type: Application
    Filed: May 30, 2013
    Publication date: October 3, 2013
    Inventors: Mitsuo SATO, Takehiko NARUOKA
  • Patent number: 8535871
    Abstract: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.
    Type: Grant
    Filed: December 14, 2011
    Date of Patent: September 17, 2013
    Assignee: JSR Corporation
    Inventors: Yuusuke Asano, Takanori Kawakami
  • Patent number: 8530692
    Abstract: A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: September 10, 2013
    Assignee: JSR Corporation
    Inventors: Nobuji Matsumura, Yuusuke Asano, Hirokazu Sakakibara, Yukio Nishimura, Takehiko Naruoka
  • Publication number: 20130209935
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 15, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: SHIN-ETSU CHEMICAL CO., LTD.
  • Patent number: 8507625
    Abstract: Provided is a Michael addition product prepared from a multifunctional acryl monomer having multiple hydroxyl groups allowing introduction of acryl functional groups, as a Michael acceptor, and a Michael donor. The Michael addition product is a novel multifunctional compound having an oligomer and a photoinitiator moiety in the molecule. Since it can be cured under a standard UV curing condition without having to add a photoinitiator, it is reduced to air pollution or health problem. Therefore the superior physical properties were obtained by cured coatings without surface tackiness. In addition, its hydroxyl groups allow, through isocyanate bonding or introduction of acryl groups, 3-dimensional crosslinking and molecular and compositional design for improving expandability, friction, and reactivity and hydrophilicity for self-adhesion, hardness of cured film, or the like. Consequently, a very useful, multifunctional or water-dispersible coating composition may be prepared.
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: August 13, 2013
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Young Chul Kim, Byung Hoon Lee
  • Patent number: 8501983
    Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: August 6, 2013
    Assignee: Rhodia Operations
    Inventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
  • Publication number: 20130171549
    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
    Type: Application
    Filed: December 21, 2012
    Publication date: July 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventor: Rohm and Haas Electronic Materials LLC
  • Publication number: 20130171429
    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
    Type: Application
    Filed: December 11, 2012
    Publication date: July 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventor: Rohm and Haas Electronic Materials LLC
  • Patent number: 8466310
    Abstract: Disclosed is a process for producing ?-substituted norbornanyl acrylates efficiently on an industrial scale while suppressing the formation of by-products derived from intramolecular cyclization, excessive addition to acrylic acid etc. The ?-substituted norbornanyl acrylates are useful as norbornene resist monomers. In the disclosed process, an ?-substituted acrylic acid is directly reacted with a substituted norbornene in the presence of at least one acid catalyst selected from methanesulfonic acid and camphorsulfonic acid. It is possible in this reaction to suppress the formation of the by-products derived from intramolecular cyclication, excessive addition of the acid to the reaction product etc.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: June 18, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Makoto Matsuura, Ryo Nadano, Takeo Komata
  • Patent number: 8431325
    Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: April 30, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kazuhiko Hashimoto, Koji Ichikawa
  • Patent number: 8420853
    Abstract: Disclosed is tonovel cyclic derivatives having potent inhibiting effect on melanin formation and skin hyper-pigmentation activity with no adverse response to skin. They can be used as the therapeutics for treating and preventing the skin disease caused by over-reproduced melanin.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: April 16, 2013
    Assignees: Wonkisopharm Co., Ltd
    Inventors: Hyunchul Cho, Yonghyun Choi, Jonghan Yhei
  • Patent number: 8420290
    Abstract: An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: April 16, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd
    Inventors: Koji Hasegawa, Masaki Ohashi, Takeshi Kinsho, Tsunehiro Nishi, Masayoshi Sagehashi