Cyclic Alcohol Moiety Patents (Class 560/220)
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Patent number: 11597696Abstract: The present invention is directed to a purification method for purifying a fluorine-containing polymerizable monomer of the formula (1), in which the fluorine-containing polymerizable monomer is purified by distillation in the coexistence of a phenolic compound A such as 6-tert-butyl-2,4-xylenol and a phenolic compound B such as 2,2?-methylene-bis(4-methyl-6-tert-butylphenol). By the combined use of the phenolic compound A and the phenolic compound B, it is possible to significantly suppress polymerization or oligomerization of the fluorine-containing polymerizable monomer even during industrial-production-scale distillation and efficiently purify the fluorine-containing polymerizable monomer by distillation.Type: GrantFiled: September 25, 2018Date of Patent: March 7, 2023Assignee: Central Glass Company, LimitedInventors: Satoru Miyazawa, Yusuke Kuramoto, Asuka Sano, Ryo Nadano, Shinya Akiba, Makoto Kobayashi
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Patent number: 11576759Abstract: What is described is a milling blank having a continuous shade gradient for production of an indirect dental restoration, composed of resin or a resin-based composite. What is also described is a method of producing such a milling blank by mixing two differently coloured pastes with continuous variation of the mixing ratio of the two pastes during the dispensing operation.Type: GrantFiled: February 15, 2019Date of Patent: February 14, 2023Assignee: VOCO GMBHInventors: Daniel Oldenburger, Marie Appelmann, Manfred Thomas Plaumann
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Patent number: 11311357Abstract: A polymerizable dental composite material comprising (i) 70 to 85% by weight of an inorganic filler component comprising at least one dental glass and optionally at least one amorphous metal oxide, (ii) 10 to 30% by weight of a mixture of at least two different urethane (meth)acrylates, (iii) 0.01 to 5% by weight of at least one di-, tri-, tetra- or multi-functional monomer not being a urethane (meth)acrylate, (iv) 0.01 to 10% by weight of at least one initiator, of an initiator system as well as optionally of at least one stabilizer and optionally of at least one pigment, wherein the total composition of the composite material amounts to 100% by weight, as well as a polymerized composite material having a flexural strength of greater than or equal to 200 MPa and an elastic modulus of 15 to 20 GPa for producing indirect dentures.Type: GrantFiled: October 1, 2018Date of Patent: April 26, 2022Assignee: KULZER GMBHInventors: Andreas Utterodt, Kurt Reischl, Nelli Schönhof, Michael Eck, Raif Kocoglu, Jutta Schneider, Caroline Kempka
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Patent number: 11219505Abstract: A polymerisable dental composite material comprising (i) 70 to 85% by weight of an inorganic filler component comprising at least one dental glass and optionally at least one amorphous metal oxide, (ii) 10 to 30% by weight of a mixture of at least two different urethane(meth)acrylates, (iii) 0.01 to 5% by weight of at least one di-, tri-, tetra- or multi-functional monomer not being a urethane(meth)acrylate, (iv) 0.01 to 10% by weight of at least one initiator, of an initiator system and optionally of at least one stabilizer and optionally of at least one pigment, wherein the total composition of the composite material amounts to 100% by weight, as well as a polymerized composite material having a flexural strength of greater than or equal to 200 MPa and an elastic modulus of 15 to 20 GPa for the production of indirect dentures.Type: GrantFiled: October 1, 2018Date of Patent: January 11, 2022Assignee: Kulzer GmbHInventors: Andreas Utterodt, Kurt Reischl, Nelli Schönhof, Michael Eck, Raif Kocoglu, Jutta Schneider, Caroline Kempka
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Patent number: 11198666Abstract: The invention relates to a method for preparing a (meth)acrylic acid ester-based compound, and according to the preparation method, a (meth)acrylic acid ester-based compound can be prepared with high purity and high yield, by easily introducing an acrylic structure into alcohol using a diamine-based compound and acid anhydride.Type: GrantFiled: February 13, 2020Date of Patent: December 14, 2021Inventors: Won Taeck Lim, Ji Eun Kim, Wonmun Choi, Yongjin Kim
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Patent number: 9340484Abstract: Process for preparing bicyclic or tricyclic (meth)acrylates by reacting (meth)acrylic acid with a bicyclic or tricyclic hydrocarbon which contains at least one double bond using montmorillonite as catalyst.Type: GrantFiled: November 20, 2012Date of Patent: May 17, 2016Assignee: EVONIK ROEHM GmbHInventors: Joachim Knebel, Thorben Schuetz, Guenther Graeff, Hedwig Luise Johanna Ohl
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Patent number: 9309194Abstract: The present invention relates to compounds of formula (I) wherein R1 signifies a C1-C15 alkyl moiety or a C2 to C18 alkenyl moiety, to their process of production as well as to their use in organic synthesis, especially as intermediates (building blocks) in the synthesis of vitamin A or ?-carotene or derivatives thereof, or other carotenoids, e.g. canthaxanthin, astaxanthin or zeaxanthin, preferably vitamin A.Type: GrantFiled: June 14, 2012Date of Patent: April 12, 2016Assignee: DSM IP ASSETS B.V.Inventors: Werner Bonrath, Thomas Netscher, Jan Schütz, Bettina Wüstenberg
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Patent number: 9289366Abstract: The present invention relates to novel compounds and their use as fragrance materials.Type: GrantFiled: August 22, 2014Date of Patent: March 22, 2016Assignee: International Flavors & Fragrances Inc.Inventors: Benjamin Amorelli, Edward Mark Arruda, Robert P. Belko, Tingwei Cai, Adam P. Closson, Nicole L. Giffin, Gary J. Mertz, Michael G. Monteleone
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Patent number: 9040742Abstract: The present invention relates to a process of production of a compound, which is useful as an intermediate (building block) in organic synthesis, especially in the synthesis of vitamin A or ?-carotene and derivatives thereof, e.g. canthaxanthin, astaxanthin or zeaxanthin.Type: GrantFiled: December 14, 2012Date of Patent: May 26, 2015Assignee: DSM IP ASSETS B.V.Inventors: Werner Bonrath, Bettina Wuestenberg, Thomas Netscher, Jan Schuetz
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Patent number: 9023581Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).Type: GrantFiled: June 14, 2011Date of Patent: May 5, 2015Assignee: Tokyo Ohka Kogyo Co., LtdInventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
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Publication number: 20150057207Abstract: The present invention relates to novel compounds and their use as fragrance materials.Type: ApplicationFiled: August 22, 2014Publication date: February 26, 2015Inventors: Benjamin Amorelli, Edward Mark Arruda, Robert P. Belko, Tingwei Cai, Adam P. Closson, Nicole L. Giffin, Gary J. Mertz, Michael G. Monteleone
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Publication number: 20150031910Abstract: The present invention relates to a process of production of a compound, which is useful as an intermediate (building block) in organic synthesis, especially in the synthesis of vitamin A or ?-carotene and derivatives thereof, e.g. canthaxanthin, astax-anthin or zeaxanthin.Type: ApplicationFiled: December 14, 2012Publication date: January 29, 2015Inventors: Werner Bonrath, Bettina Wuestenberg, Thomas Netscher, Jan Schuetz
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Publication number: 20150030638Abstract: The present invention broadly relates to the use of certain ingenol derivatives as HIV reactivators of latent HIV virus in viral reservoirs. In another aspect, the present invention relates to an association comprising such ingenol derivatives and antiretroviral agents substantially active against actively replicating virus.Type: ApplicationFiled: March 1, 2013Publication date: January 29, 2015Applicant: AMAZÔNIA FITOMEDICAMENTOS LTDA.Inventors: Luiz Francisco Pianowski, Amilcar Tanuri
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Publication number: 20150025265Abstract: The present invention relates to a novel crystalline form of ingenol mebutate, methods of preparation thereof, and to its use. More specifically, the invention relates to the conversion of amorphous ingenol mebutate (ingenol-3-angelate, PEP005) to a crystalline form, which was characterized by single crystal X-Ray crystallography (XRC), attenuated total reflectance Fourier transform infrared (FTIR-ATR) spectroscopy and Differential Scanning calorimetry (DSC).Type: ApplicationFiled: February 17, 2014Publication date: January 22, 2015Applicant: LEO LABORATORIES LIMITEDInventor: Steven Martin Ogbourne
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Publication number: 20150004545Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.Type: ApplicationFiled: September 19, 2014Publication date: January 1, 2015Applicant: JSR CORPORATIONInventors: Hayato NAMAI, Norihiko IKEDA, Takanori KAWAKAMI
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Publication number: 20140378360Abstract: The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.Type: ApplicationFiled: September 12, 2014Publication date: December 25, 2014Inventors: Hugo Robert Germain DENUTTE, Johan SMETS, An PINTENS, Koen VAN AKEN, Freek Annie Camiel VRIELYNCK
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Publication number: 20140350100Abstract: The present disclosure provides novel glucagon-like peptide-1 (GLP-1) receptor modulators such as compounds of Formula (I) or (II), and pharmaceutically acceptable salts thereof. The present disclosure also provides pharmaceutical compositions, kits, and uses that involve the GLP-1 receptor modulators for regulating blood glucose levels and/or treating diabetes via, e.g., modulating the endogenous signaling pathways mediated by the GLP-1 receptor.Type: ApplicationFiled: May 27, 2014Publication date: November 27, 2014Applicants: Academia SinicaInventors: Klim King, Rong-Jie Chein
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Publication number: 20140322310Abstract: Topical gel compositions comprising ingenol-3-angelate, wherein less than 10% of the ingenol-3-angelate degrades when the gel is stored for 2 years at 25° C.Type: ApplicationFiled: December 12, 2012Publication date: October 30, 2014Inventors: Per Ola Arvidsson, Edit Farkas, Karsten Petersson, Gert Hoy
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Publication number: 20140322810Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti-adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.Type: ApplicationFiled: June 24, 2014Publication date: October 30, 2014Inventors: Pui-Kwong CHAN, May Sung MAK
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Patent number: 8859804Abstract: Disclosed is a method for producing a (meth)acrylate ester wherein a high purity (meth)acrylate ester is obtained with a high yield, with a reduced loss of (meth)acrylic acid anhydride. In the method, (meth)acrylic acid is recovered with a high yield, and the (meth)acrylate ester is purified easily. Specifically disclosed is a method for producing a (meth)acrylate ester which comprises: (1) a step of producing (meth)acrylic acid anhydride by reacting a specific fatty acid anhydride and (meth)acrylic acid, while removing a by-produced fatty acid; (2) a step of obtaining a (meth)acrylate ester by reacting an alcohol and unpurified (meth)acrylic acid anhydride obtained in step (1) preferably at a temperature not less than 90° C.; and (3) a step of recovering (meth)acrylic acid by distillation preferably at a temperature not less than 90° C. The method may also comprise a step of heating or distilling the reaction liquid obtained in step (2) at a temperature not less than 90° C.Type: GrantFiled: February 4, 2010Date of Patent: October 14, 2014Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Ryuichi Ansai, Hiroyuki Nogami, Kuniyoshi Ogura
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Patent number: 8846840Abstract: Provided according to the present invention are an adamantyl (meth)acrylate represented by formula (1), having a formazin standard turbidity of less than 1.7 NTU (Nephelometric Turbidity Unit) in methylethylketone or tetrahydrofuran, and also a (meth)acrylic copolymer comprising the adamantyl (meth)acrylate as a repeating unit: (in the formula, R1 represents hydrogen or a methyl group; R2 through R4 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having a carbon number of 1 to 3, an aryl group, an alkoxy group, an aryloxy group, a halogen group, an alkyl halide group, or a hydroxyalkyl group; and n1 represents 0 or 1).Type: GrantFiled: March 29, 2011Date of Patent: September 30, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Kikuo Furukawa, Toshiharu Yamashita, Yoshio Nishimura
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Publication number: 20140235889Abstract: Process for preparing bicyclic or tricyclic (meth)acrylates by reacting (meth)acrylic acid with a bicyclic or tricyclic hydrocarbon which contains at least one double bond using montmorillonite as catalyst.Type: ApplicationFiled: November 20, 2012Publication date: August 21, 2014Applicant: EVONIK ROEHM GmbHInventor: Hedwig Luise, Johanna Ohl
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Patent number: 8802350Abstract: A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR2R3(OR4), and R2 to R4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R3 and R4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R3 and an oxygen atom bonded to R4.Type: GrantFiled: April 4, 2012Date of Patent: August 12, 2014Assignee: JSR CorporationInventors: Mitsuo Sato, Masafumi Yoshida
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Publication number: 20140212813Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: JSR CORPORATIONInventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
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Patent number: 8791288Abstract: An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.Type: GrantFiled: May 25, 2010Date of Patent: July 29, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeshi Kinsho, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeru Watanabe, Koji Hasegawa, Seiichiro Tachibana
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Patent number: 8791293Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.Type: GrantFiled: August 2, 2012Date of Patent: July 29, 2014Assignee: Central Glass Company, LimitedInventors: Kazunori Mori, Satoru Narizuka, Fumihiro Amemiya, Masaki Fujiwara
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Patent number: 8790861Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.Type: GrantFiled: December 21, 2012Date of Patent: July 29, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Cong Liu, Mingqi Li, Cheng-Bai Xu
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Publication number: 20140199631Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.Type: ApplicationFiled: December 17, 2013Publication date: July 17, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama
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Publication number: 20140199378Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti-adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.Type: ApplicationFiled: July 13, 2012Publication date: July 17, 2014Applicant: PACIFIC ARROW LIMITEDInventors: Pui-Kwong Chan, May Sung Mak
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Publication number: 20140186769Abstract: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed.Type: ApplicationFiled: December 10, 2013Publication date: July 3, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takaaki Kaiho, Yoshiyuki Utsumi, Jun Iwashita, Masahito Yahagi
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Publication number: 20140186771Abstract: A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R1 is a hydrogen atom, a fluorine atom, or the like. R2 is a hydrogen atom or a monovalent hydrocarbon group. R3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R6 is a monovalent chain hydrocarbon group. R6 is bonded to R3 to form a first alicyclic structure, or R6 is bonded to R5 to form a second alicyclic structure. At least one hydrogen atom of R2, R3, or R4 is optionally substituted with a fluorine atom.Type: ApplicationFiled: March 7, 2014Publication date: July 3, 2014Applicant: JSR CORPORATIONInventor: Hayato NAMAI
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Patent number: 8735558Abstract: This invention provides methods, processes, compounds and compositions for modulating the gene expression and modulating the secretion, expression, or synthesis of adhesion proteins or their receptors to cure disease, wherein the modulating comprises positive and negative regulating; wherein comprises inhibiting cancer growth, wherein the adhesion proteins or receptors comprise fibronectin, integrins family, Myosin, vitronectin, collagen, laminin, Glycosylation cell surface proteins, polyglycans, cadherin, heparin, tenascin, CD 54, CAM, elastin and FAK; wherein the methods, processes, compounds and compositions are also for anti-angiogenesis; wherein the cancers comprise breast cancer, leukocyte cancer, liver cancer, ovarian cancer, bladder cancer, prostate cancer, skin cancer, bone cancer, brain cancer, leukemia cancer, lung cancer, colon cancer, CNS cancer, melanoma cancer, renal cancer or cervix cancer.Type: GrantFiled: August 14, 2009Date of Patent: May 27, 2014Assignee: Pacific Arrow LimitedInventors: Pui-Kwong Chan, May Sung Mak
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Publication number: 20140120326Abstract: A polymerizable compound is provided. The polymerizable compound has two or more polymerizable functional groups in a molecule thereof, wherein one of the two or more polymerizable functional groups of the polymerizable compound is an acrylamide group having the below-mentioned formula (1). The polymerizable compound can be preferably used for inkjet ink.Type: ApplicationFiled: September 17, 2013Publication date: May 1, 2014Applicant: RICOH COMPANY, LTD.Inventors: Mitsunobu Morita, Soh Noguchi, Okitoshi Kimura
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Patent number: 8653133Abstract: The present invention relates to a novel crystalline form of ingenol mebutate, methods of preparation thereof, and to its use. More specifically, the invention relates to the conversion of amorphous ingenol mebutate (ingenol-3-angelate, PEP005) to a crystalline form, which was characterized by single crystal X-Ray crystallography (XRC), attenuated total reflectance Fourier transform infrared (FTIR-ATR) spectroscopy and Differential Scanning calorimetry (DSC).Type: GrantFiled: April 18, 2011Date of Patent: February 18, 2014Assignee: LEO Laboratories LimitedInventor: Steven Martin Ogbourne
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Publication number: 20140045123Abstract: A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.Type: ApplicationFiled: August 1, 2013Publication date: February 13, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa
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Patent number: 8637623Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; “A” represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.Type: GrantFiled: February 3, 2009Date of Patent: January 28, 2014Assignee: Daicel Chemical Industries, Ltd.Inventors: Hiroshi Koyama, Kyuhei Kitao, Akira Eguchi
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Publication number: 20140024113Abstract: This invention provides a method of synthesizing new active compounds for pharmaceutical uses including cancer treatment, wherein the cancers comprise breast, leukocytic, liver, ovarian, bladder, prostatic, skin, bone, brain, leukemia, lung, colon, CNS, melanoma, renal, cervical, esophageal, testicular, spleenic, kidney, lymphatic, pancreatic, stomach and thyroid cancers. This invention is an anti adhesion therapy which uses the compound as a mediator or inhibitor of adhesion proteins and angiopoietins. It inhibits excess adhesion and inhibits cell attachment. It modulates angiogenesis. The compounds also use as mediator of cell adhesion receptor, cell circulating, cell moving and inflammatory diseases.Type: ApplicationFiled: September 6, 2013Publication date: January 23, 2014Applicant: PACIFIC ARROW LIMITEDInventors: Pui-Kwong CHAN, May Sung Mak
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Patent number: 8632792Abstract: A cooling sensation agent composition with a prolonged cool sensation effect is provided comprising at least one compound selected from the group consisting of aceia or ketal derivatives of 3-(1-menthoxy)propan-1,2-diol represented by Formula (1), single or mixed carbonic esters ol one or two kinds ol alcohols represented by Formula (2), and carboxylic esters represented by Formula (4). A sensory stimulation agoni composition, a flavor or fragrance composition, a beverage or food product, a perfume or cosmetic product, a toiletry product, a daily utensil product or grocery, a fiber, a fiber product, a cloth or a medicine comprising the cooling sensation agent composition; a production method thereof; a cooling processing method of a fiber, fiber product or a cloth, comprising compounding the cooling sensation agent; and new compounds are also provided.Type: GrantFiled: April 1, 2009Date of Patent: January 21, 2014Assignee: Takasago International CorporationInventors: Kenya Ishida, Takashi Aida, Tetsuya Yamamoto
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Patent number: 8614197Abstract: This invention provides a method for treating cancer by blocking the migration, metastasis of cancer cells, growth of cancers wherein the cancers comprise breast cancer, leukocyte cancer, liver cancer, ovarian cancer, bladder cancer, prostate cancer, skin cancer, bone cancer, brain cancer, leukemia cancer, lung cancer, colon cancer, CNS cancer, melanoma cancer, renal cancer or cervix cancer. This invention provides uses of compositions comprising a triterpenoidal saponin, triterpenoid, triterpenoidal compound or sapongenin, comprising at least two side groups selected from the group consisting of angeloyl groups, tigloyl groups and senecioyl groups, wherein the side groups are attached to carbon 21, 22 or/and 28 of triterpenoidal sapogenin, triterpenoid, triterpenoidal compound or other sapongenin backbones.Type: GrantFiled: March 7, 2007Date of Patent: December 24, 2013Assignee: Pacific Arrow LimitedInventors: Pui-Kwong Chan, May Sung Mak, Yun Wang
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Patent number: 8609321Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.Type: GrantFiled: March 8, 2013Date of Patent: December 17, 2013Assignee: JSP CorporationInventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
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Publication number: 20130324600Abstract: The invention relates to compounds of general formula (I) wherein R is (C1-C7)alkyl, (C2-C7)alkenyl or (C2-C7)alkynyl; wherein R is substituted with R1; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for use—alone or in combination with one or more other pharmaceutically active compounds—in therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.Type: ApplicationFiled: December 22, 2011Publication date: December 5, 2013Applicant: LEO LABORATORIES LIMITEDInventors: Gunnar Grue-Sørensen, Xifu Liang, Thomas Högberg
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Patent number: 8598292Abstract: Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.Type: GrantFiled: February 10, 2010Date of Patent: December 3, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Yoshihisa Arai, Takehiko Isobe
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Publication number: 20130302735Abstract: Provided are monomers, polymers, photoresist compositions and coated substrates which find use in the formation of photolithographic patterns by negative tone development. The monomers are of the following general formula (I): wherein: R1 represents hydrogen or methyl. The methods find particular applicability in the manufacture of semiconductor devices.Type: ApplicationFiled: November 3, 2012Publication date: November 14, 2013Inventors: Jibin SUN, Young Cheol BAE, Jong Keun PARK, Seung-Hyun LEE, Cecily ANDES
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Publication number: 20130260315Abstract: A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.Type: ApplicationFiled: May 30, 2013Publication date: October 3, 2013Inventors: Mitsuo SATO, Takehiko NARUOKA
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Patent number: 8535871Abstract: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.Type: GrantFiled: December 14, 2011Date of Patent: September 17, 2013Assignee: JSR CorporationInventors: Yuusuke Asano, Takanori Kawakami
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Patent number: 8530692Abstract: A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.Type: GrantFiled: August 23, 2011Date of Patent: September 10, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Yuusuke Asano, Hirokazu Sakakibara, Yukio Nishimura, Takehiko Naruoka
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Publication number: 20130209935Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.Type: ApplicationFiled: February 8, 2013Publication date: August 15, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: SHIN-ETSU CHEMICAL CO., LTD.
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Patent number: 8507625Abstract: Provided is a Michael addition product prepared from a multifunctional acryl monomer having multiple hydroxyl groups allowing introduction of acryl functional groups, as a Michael acceptor, and a Michael donor. The Michael addition product is a novel multifunctional compound having an oligomer and a photoinitiator moiety in the molecule. Since it can be cured under a standard UV curing condition without having to add a photoinitiator, it is reduced to air pollution or health problem. Therefore the superior physical properties were obtained by cured coatings without surface tackiness. In addition, its hydroxyl groups allow, through isocyanate bonding or introduction of acryl groups, 3-dimensional crosslinking and molecular and compositional design for improving expandability, friction, and reactivity and hydrophilicity for self-adhesion, hardness of cured film, or the like. Consequently, a very useful, multifunctional or water-dispersible coating composition may be prepared.Type: GrantFiled: September 7, 2010Date of Patent: August 13, 2013Assignee: Korea Research Institute of Chemical TechnologyInventors: Young Chul Kim, Byung Hoon Lee
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Patent number: 8501983Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.Type: GrantFiled: November 7, 2011Date of Patent: August 6, 2013Assignee: Rhodia OperationsInventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
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Publication number: 20130171429Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.Type: ApplicationFiled: December 11, 2012Publication date: July 4, 2013Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventor: Rohm and Haas Electronic Materials LLC