Cyclic Alcohol Moiety Patents (Class 560/220)
  • Publication number: 20030215742
    Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.
    Type: Application
    Filed: April 7, 2003
    Publication date: November 20, 2003
    Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
  • Publication number: 20030158437
    Abstract: A magnesium halide salt of a 2-alkyl-2-adamantanol is reacted with a carboxylic acid halide such as acrylic chloride or the like in the presence of a tertiary amine to produce a 2-alkyl-2-adamantyl ester (the first invention).
    Type: Application
    Filed: January 27, 2003
    Publication date: August 21, 2003
    Inventors: Masao Yamaguchi, Yoshihiro Hirota, Hiromasa Yamamoto
  • Patent number: 6600060
    Abstract: The invention is concerned with esters from conjugated linoleic acid and a food allowable alcohol from the group of terpene alcohols and sesquiterpene alcohols. These esters have good taste and display the health effects from the conjugated linoleic acid (CLA) part and from the food allowable alcohol part of the molecule.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: July 29, 2003
    Assignee: Loders Croklaan BV
    Inventors: Scott Barclay, Krzysztof Piotr Rakowski, Victoria Taran
  • Publication number: 20030139613
    Abstract: An acrylate compound of formula (4): 1
    Type: Application
    Filed: November 26, 2002
    Publication date: July 24, 2003
    Applicant: TOSOH CORPORATION
    Inventors: Shinichi Ishikawa, Hisao Eguchi
  • Publication number: 20030139599
    Abstract: In a process for preparing an ester of an unsaturated carboxylic acid by reacting an ester of the unsaturated carboxylic acid and a C1-C4-alkanol with an alcohol R3OH, where R3 is a C4-C20-alkyl radical, a C5-C7-cycloalkyl radical, a phenyl-C1-C4-alkyl radical or a C2-C12-alkyl radical substituted by at least one NR5R5 group or by from 1 to 3 hydroxyl groups or C1-C4-alkoxyl groups or interrupted by one or more oxygen atoms, where the radicals R5 are, independently of one another, C1-C6-alkyl or together with the nitrogen atom form a 5- to 7-membered heterocyclic ring which may contain a further nitrogen or oxygen atom, in the presence of a transesterification catalyst, the transesterification catalyst used is at least one metal alkanolate containing at least one OR1 group, where R1 is a 2,2,6,6-tetraalkyl-1-oxylpiperidin-4-yl radical.
    Type: Application
    Filed: November 25, 2002
    Publication date: July 24, 2003
    Inventors: Gerhard Nestler, Jurgen Schroder
  • Publication number: 20030135068
    Abstract: There is provided a method for obtaining a target organic compound such as an alkyladamantyl ester efficiently by purifying a crude organic compound which contains, as impurities, sublimable materials which start to sublime at temperatures lower than a boiling point of the target organic compound by use of such a simple method as distillation during its production process, without being adversely affected by adherence of the sublimable materials.
    Type: Application
    Filed: November 22, 2002
    Publication date: July 17, 2003
    Inventors: Hiromasa Yamamoto, Masao Yamaguchi, Hideki Kikuchi
  • Publication number: 20030120106
    Abstract: This invention discloses a process for preparing an 2-alkyl-2-adamantyl ester comprising the steps of combining a solution or suspension of 2-adamantanone and an alkyl halide with lithium metal for reacting them to generate an lithium 2-alkyl-2-adamantyl alcoholate, and then reacting the lithium 2-alkyl-2-adamantyl alcoholate with an acid halide.
    Type: Application
    Filed: November 18, 2002
    Publication date: June 26, 2003
    Inventors: Masao Yamaguchi, Hideki Kikuchi, Yoshihiro Hirota
  • Publication number: 20030120107
    Abstract: There is provided a method for obtaining an alkyladamantyl ester efficiently by distilling and purifying a crude alkyladamantyl ester containing impurities which decompose the alkyladamantyl ester without decomposing the alkyladamantyl ester.
    Type: Application
    Filed: November 22, 2002
    Publication date: June 26, 2003
    Inventors: Hiromasa Yamamoto, Masao Yamaguchi, Yoshihiro Hirota, Takashi Kobayakawa
  • Patent number: 6576787
    Abstract: Hydroxymethyl-group-containing alicyclic compounds that are useful for making photosensitive resins and other functional polymers. Processes for producing the hydroxymethyl-group-containing alicyclic compounds. Polymerizable alicyclic compounds. The alicyclic moieties in all of these compounds may be a polycyclic ring such as a perhydroindene ring, a decalin ring, a perhydrofluorene ring, a perhydroanthracene ring, a perhydrophenanthrene ring, a tricyclo[5.2.1.02.6]decane ring, a perhydroacenaphthene ring, or a perhydrophenalene ring.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: June 10, 2003
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Tatsuya Nakano, Hiroshi Shimojitosyo
  • Patent number: 6559268
    Abstract: A perfluoro group-containing compound are represented by the following formula (I): —Rf— is a perfluoro group; and —A represents —OH or a group: or —CyF2y+1 or —CzF2z−1 and a perfluoro group-containing polymerizable compound represented by the following formula (II): R1—O—CH2—CH(OH)—CH2—O—Rf—B  (II) In Formula (II), —Rf— is a perfluoro group; —B is —OH or —O—CH2—CH(OH)—CH2—O—R2, or —CyF2y+1 or —CzF2z−1; and R1 and R2 each is a dehydroxyl residue of a (meth)acryloyl group-containing compound or a vinyl group-containing compound. The hardened polymer from the compound has water-repellency, oil-repellency and adhering ability.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: May 6, 2003
    Assignee: Kyoeisha Chemcial Co., Ltd.
    Inventors: Junichi Ikeda, Hajimu Kawa
  • Patent number: 6521781
    Abstract: A 2-hydrocarbyl-2-adamantyl acrylate compound represented by the following Formula 6: is produced easily and stably with high yields by reacting a 2-adamantanone compound represented by the following Formula 1: with at least one organometallic compound represented by the following Formula 2 or 3: R1MgX  (2) R1Li  (3) and at least one acrylic compound represented by the following Formula 4 or 5: wherein, R1, R2, R3, X, Y and n in the above formulae being as defined in the disclosure.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: February 18, 2003
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Minoru Kakuda, Yoshihisa Arai, Kikuo Furukawa, Takehiko Isobe
  • Patent number: 6509494
    Abstract: A process is provided for preparing a low odor composition containing a dicyclopentenyl ester including the steps of preparing a distillation mixture containing the dicyclopentenyl ester and from 10 to 10,000 parts per million by weight based on weight of the dicyclopentenyl ester, of a suitable inhibitor; distilling the distillation mixture at a temperature in the range of 140° C. to 250° C.; collecting a first distillation fraction of the dicyclopentenyl ester; and then collecting a second distillation of the dicyclopentenyl ester; wherein the level of dicyclopentenyloxy(meth)acrylate in the second distillation fraction is in the range of 0 to 0.2 weight %, based on the weight of the dicyclopentenyl ester in the second distillation fraction. The second distillation fraction provides a low odor composition of the dicyclopentenyl ester which is useful as a reactive coalescent.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: January 21, 2003
    Assignee: Rohm and Haas Company
    Inventor: William David Weir
  • Publication number: 20030013906
    Abstract: An ester of an &agr;,&bgr;-unsaturated carboxylic acid is prepared by reacting the carboxylic acid with a C6-C12-alkanol, cyclopentanol or cyclohexanol in the presence of an acidic esterification catalyst and of an entraining agent for removing the water of reaction formed in the esterification, by a process in which the entraining agent used is the olefin on which the alkanol is based.
    Type: Application
    Filed: August 5, 2002
    Publication date: January 16, 2003
    Inventors: Reinhard Herzog, Gerhard Nestler, Jurgen Schroder
  • Patent number: 6479696
    Abstract: Isobornyl (meth)acrylate is synthesized by a two-stage one-pot process, wherein isobornyl acetate is converted to isoborneol followed by transesterification with (meth)acrylic acid methyl ester, without isolation of the intermediates or purification of the product.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: November 12, 2002
    Assignee: Roehm GmbH & Co KG
    Inventors: Joachim Knebel, Doris Saal
  • Patent number: 6468487
    Abstract: In the presence of an imide compound (e.g., N-hydroxyphthalimide) shown by the following formula (1): wherein R1 and R2 represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group and a cycloalkyl group, and R1 and R2 may bond together to form a double bond, or an aromatic or non-aromatic ring, and Y is an O or OH, and n denotes 1 to 3; a substrate is allowed to contact with at least one reactant selected from (i) a nitrogen oxide and (ii) a mixture of carbon monoxide and oxygen to be introduced with at least one functional group selected from a nitro group and a carboxyl group. The nitrogen oxide includes, for example, a compound represented by the formula NxOy (e.g., N2O3, NO2). The substrate includes, for example, a compound having a methine carbon atom (e.g., adamantane), a compound having a methyl group or a methylene group at an adjacent moiety of an aromatic ring.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: October 22, 2002
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Satoshi Sakaguchi
  • Patent number: 6458908
    Abstract: A sulfur-containing unsaturated carboxylate compound comprising a sulfur-containing substituent and at least two &agr;,&bgr;-unsaturated carboxylic acid residues, which are each attached to a secondary or tertiary carbon atom via an oxygen atom; a polymerizable composition comprising the sulfur-containing unsaturated carboxylate compound; a cured product prepared by polymerizing the polymerizable composition; an optical component consisting of the cured product; and novel intermediate compounds for preparation of the above carboxylate.
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: October 1, 2002
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masao Imai, Kenichi Sugimoto, Kenichi Fujii, Atsuo Otsuji, Tadashi Ohkuma, Masatoshi Takagi, Rihoko Suzuki, Keisuke Takuma
  • Patent number: 6433215
    Abstract: A novel tricyclodecanyl (meth)acrylate compound and a method of producing the same are provided. The compound is 8-alkyl-8-tricyclodecanyl (meth)acrylate represented by formula (1): wherein R1 is methyl or ethyl and R2 is hydrogen or methyl.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: August 13, 2002
    Assignee: Chem Search Corp.
    Inventor: Hyun-jin Jung
  • Patent number: 6423865
    Abstract: The invention relates to compounds with the general formula Y1—A1—M1—A2—Y2 wherein Y1 and Y2 are different from each other and Y1 is an acrylate or methacrylate residue and Y2 is a vinyl ether, epoxy, or azide residue, A1 and A2 are identical or different residues with the general formula CnH2n in which n is a whole number from 0 to 20 and one or more methylene groups can be replaced by oxygen atoms, and M1 has the general formula —R1—X1—R2—X2—R3—X3—R4— wherein R1, R2, R3, and R4 are identical or different doubly bonded residues from the group —O—, —COO—, —CONH—, —CO—, —S—, —C≡C—, —CH═CH—, —CH═N—, —CH2—, —N═N—, and —N═N(O)—, and R2—X2—R3 can also be a C—C bond, and X1, X2, and X3 are identical or different residues from the group 1,4-phenylene, 1,4-cyclohexylen
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: July 23, 2002
    Assignee: DaimlerChrysler AG
    Inventors: Peter Strohriegl, Katja Strelzyk, Andreas Stohr, Petra Grundig, Michael Gailberger, Fritz Dannenhauer, Anne Barth
  • Patent number: 6410748
    Abstract: A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: June 25, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano, Makoto Nakase
  • Publication number: 20020077499
    Abstract: A 2-hydrocarbyl-2-adamantyl acrylate compound represented by the following Formula 6: 1
    Type: Application
    Filed: December 6, 2001
    Publication date: June 20, 2002
    Inventors: Minoru Kakuda, Yoshihisa Arai, Kikuo Furukawa, Takehiko Isobe
  • Patent number: 6391520
    Abstract: The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R1 represents a hydrogen atom or a methyl group; R2, R3, and R4 are the same or different from each other, each representing a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group, a hydroxylmethyl group, a carboxyl group, a functional group which forms a hydroxyl group, a hydroxymethyl group or a carboxyl group by elimination with an acid; at least one of the substituents R2 to R4 is the functional group defined above; X represents an ester bond or an amide bond; and each of m and n is 0 or 1. The above photoresist resin composition is highly resistant to an etching solution, solubilizable by irradiation with light, and capable of giving minute patterns.
    Type: Grant
    Filed: March 20, 2000
    Date of Patent: May 21, 2002
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Tatsuya Nakano, Yoshinori Funaki
  • Publication number: 20020052306
    Abstract: The present invention relates to (+)− and (−)-2-cyclododecylpropanol and (+)− and (−)-2-cyclododecylpropionic acid, to salts thereof, and to the preparation and use thereof.
    Type: Application
    Filed: May 3, 2001
    Publication date: May 2, 2002
    Inventors: Klaus Ebel, Wolfgang Krause, Ulrich Schafer-Luderssen
  • Publication number: 20020045702
    Abstract: The present invention provides a novel (meth)acrylate ester-based resin composition which, for example, exhibits various good properties such as weather resistance, heat resistance, water resistance, acid resistance, alkali resistance, warm water resistance, impact resistance, flexibility, processability, adhesion, hardness, and elongation when being used for various uses such as coating agents (e.g. for films, plastics, glass, paper, fibers, leather), pressure sensitive adhesives, and adhesives in addition to various paints (e.g. paints for building exteriors, paints for building materials, paints for metals, paints for plastics, heavy anticorrosive paints, waterproof paints for roofs).
    Type: Application
    Filed: August 27, 2001
    Publication date: April 18, 2002
    Inventors: Kazuhiko Nakamura, Yoshiyuki Yokota, Kunio Takahashi, Masaya Yoshida
  • Patent number: 6365771
    Abstract: Decane compound or decene compound shown in the formula [1] below wherein A1 and A2 are independently hydrogen or (meth)acryloyl group or 2-vinyloxyethyl group; and the dotted line is single bond or double bond with the proviso that A1 and A2 are not hydrogen at the same time; and curable resin composition containing said compound therein. The compound are suitable as the photo-monomer for resist raw materials because of high clarity at short wavelength ultraviolet light, dry etching resistance, adhesive property for the substrate and high solubility in alkaline developing solution in addition to high sensitivity and greater resolution; as the monomer for optic raw materials and disk overcoat materials because of high clarity, low birefringence and low water absorption rate; and as the monomer for the coating raw materials such as EB curable coating raw materials because of high reactivity, high wear characteristics and water resistance.
    Type: Grant
    Filed: March 14, 2001
    Date of Patent: April 2, 2002
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideo Suzuki, Takayasu Nihira, Shinichiro Takigawa
  • Publication number: 20020022740
    Abstract: The invention relates to a novel octafluorotricyclodecane derivative represented by the general formula (1), 1
    Type: Application
    Filed: June 19, 2001
    Publication date: February 21, 2002
    Inventors: Satoru Miyazawa, Michitaka Ootani, Kentaro Tsutsumi
  • Patent number: 6344582
    Abstract: An efficient process for producing a high quality 2-adamantyl (meth)acrylate of the formula (I): wherein R1 is hydrogen or methyl and R2 is hydrogen of lower alkyl, by using very common facilities and procedures, which reacting a (meth)acryloyl halide of the formula (II) wherein R1 is as defined above and X is halogen with a 2-adamantanol of the formula (III): wherein R2 is as defined above to form the 2-adamantyl (meth)acrylate of the formula (I), then treating a solution of this product in an organic solvent with active carbon, subsequently removing the active carbon, and thereafter separating a purified 2-adamantyl (meth)acrylate, is provided.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: February 5, 2002
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuharu Kouno, Hiroaki Fujishima
  • Patent number: 6329543
    Abstract: The present invention relates to processes for synthesis of isobornyl (meth)acrylate by reacting camphene with (meth)acrylic acid in the presence of sulfuric acid and at least one compound having inhibiting action. Aqueous sulfuric acid with an acid concentration in the range of 65 to 85 wt % is used. Isobornyl (meth)acrylate can advantageously be distilled from a mixture containing sulfuric acid in the presence of 2,6-di-tert-butyl-&agr;-(dialkylamino)-p-cresol.
    Type: Grant
    Filed: May 3, 2000
    Date of Patent: December 11, 2001
    Assignee: Roehm GmbH & Co KG
    Inventors: Joachim Knebel, Doris Saal
  • Patent number: 6313250
    Abstract: The invention relates to polyfunctionally reactive polymeric substances which contain at least two structural units of the general formulae (I) and/or (II) in the molecule and whose polymer backbone linkages are C—C bonds, ether bonds, urethane bonds, amide bonds, ketone bonds or combinations thereof. The substances are useful as binders for various applications.
    Type: Grant
    Filed: April 6, 1999
    Date of Patent: November 6, 2001
    Assignee: BASF Aktiengesellshaft
    Inventors: Rainer Blum, Lukas Haeussling, Wolfgang Reich
  • Patent number: 6312867
    Abstract: A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: November 6, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Koji Hasegawa, Takeru Watanabe, Osamu Watanabe, Mutsuo Nakashima, Takanobu Takeda, Jun Hatakeyama
  • Patent number: 6271412
    Abstract: This invention provides a compound of the formula (I): wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. The compound of formula (I) can be polymerized or copolymerized to form a photosensitive polymer or copolymer.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: August 7, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
  • Patent number: 6255523
    Abstract: The present invention relates to powder coating compositions which can be cured at low temperatures. The powder coating composition of the invention include a unique combination of a branched oligoester polyol and uretdione crosslinking agent which when cured results in a coating binder with desirable hardness, flexibility, solvent resistance, corrosion resistance, weatherability and gloss.
    Type: Grant
    Filed: September 18, 1998
    Date of Patent: July 3, 2001
    Assignee: McWhorter Technologies, Inc.
    Inventors: Kamlesh Pai Panandiker, John Michael Bronk, Franklin Paul Spitler
  • Patent number: 6235851
    Abstract: A compound shown by the following formula: wherein each of R1a, R2a, R3a and R4a represents a substituent selected from a non-reactive atom, a non-reactive group, a hydroxyl group and an amino group, and at least two members selected from R1a, R2a, R3a and R4a are a hydroxyl group, a carboxyl group or an amino group; is subjected to an esterification reaction or an amidation reaction with a polymerizable unsaturated compound (e.g., an alcohol, a carboxylic acid, an amine) in the presence of a catalyst comprising an element selected from the Group 3 elements, such as a samarium compound, to obtain a polymerizable adamantane derivative having at least one polymerizable unsaturated group in high yield.
    Type: Grant
    Filed: January 11, 1999
    Date of Patent: May 22, 2001
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Naruhisa Hirai
  • Patent number: 6225476
    Abstract: Provided by the invention is a chemical-amplification positive-working photoresist composition used in the fine photolithographic patterning in the manufacturing process of semiconductor devices, which is suitable for the patterning light exposure with ArF excimer laser beams of very short wavelength by virtue of absence of aromatic structure in the ingredients of the composition. The composition comprises, as the film-forming resinous ingredient, an acrylic resin having unique monomeric units represented by the general formula &Brketopenst;CH2—CR1(—CO—O—CR2R3R4)&Brketclosest;, in which R1 is a hydrogen atom or a methyl group, R2 and R3 are each, independently from the other, an alkyl group having 1 to 4 carbon atoms and R4 is an alkoxycarbonyl group or a group derived from a molecule of a lactone compound or ketone compound by removing a hydrogen atom bonded to the carbon atom.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: May 1, 2001
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Kazufumi Sato, Hiroshi Komano
  • Patent number: 6218569
    Abstract: The invented polymerizable alicyclic esters are shown by the following formula (1) or (2): wherein each of ring A, ring B, ring C, ring D, and ring E is a non-aromatic carbon ring, R is a polymerizable unsaturated group, and each of Ra1, Rb1, and Rc1 is, identical to or different from one another, a hydrogen atom, a hydroxyl group which may be protected by a protective group, or an RCO2 group, where R has the same meaning as defined above. Each of the ring A, ring B, ring C, ring D, and ring E is, for example, a cyclopentane ring, a cyclohexane ring, or a bridged ring. R includes, for example, a vinyl group, an isopropenyl group, or an aryl group.
    Type: Grant
    Filed: July 20, 2000
    Date of Patent: April 17, 2001
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Keizo Inoue
  • Patent number: 6175037
    Abstract: An improved process for preparing acrylate esters, methacrylate esters, polyester acrylates or polyester methacrylates by reacting acrylic or methacrylic acid with a monohydroxy containing compound or a polyhydroxy containing compound in the presence of a catalyst and polymerization inhibitor in a reaction vessel, in the presence or absence of a solvent, under microwave energy as a heating source. Advantages of using microwave energy in place of conventional thermal heating include higher temperatures coupled with shorter residence times, reduced production costs, increased capacity, lower energy costs, effective use of raw materials, and solventless processing which is environmentally friendly.
    Type: Grant
    Filed: October 9, 1998
    Date of Patent: January 16, 2001
    Assignee: UCB, S.A.
    Inventor: Harrell Emmett Tweedy
  • Patent number: 6136887
    Abstract: The invention relates to vinylcyclopropane derivatives according to the formula ##STR1## in which A is --[--Y--CO--C(.dbd.CH.sub.2)R.sup.4 ].sub.m or --C(.dbd.CH.sub.2)CO--O--C.sub.1-4 -alkyl, U and X, independently of each other, stand for CO, COO or CONH; Y and Z stand for O or NH or are absent, but Y and Z cannot be absent at the same time; n, m stand for a whole number from 0 to 4, but n and m are not 0 at the same time; R.sup.1 is H, CH.sub.3 or Cl; R.sup.2, R.sup.3 stand for H, a C.sub.1 - to C.sub.10 -alkyl or alkylene radical, which can be interrupted by O, S or NH, for a C.sub.6 - to C.sub.14 -aryl or arylene, C.sub.7 - to C.sub.14 -alkylaryl or alkylarylene or a C.sub.5 - to C.sub.8 -cycloalkyl or cycloalkylene radical; and R.sup.4 is H or a C.sub.1 - to C.sub.10 -alkyl radical, and to processes for their production. The compounds are suitable in particular for the production of adhesives, cements, composites and mouldings.
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: October 24, 2000
    Assignee: Ivoclar AG
    Inventors: Norbert Moszner, Volker Rheinberger, Thomas Voelkel, Urs Karl Fischer
  • Patent number: 6049000
    Abstract: The invention relates to compounds with the general formula Y.sup.1 --A.sup.1 --M.sup.1 --A.sup.2 --Y.sup.2 whereinY.sup.1 and Y.sup.2 are different from each other and Y.sup.1 is an acrylate or methacrylate residue and Y.sup.2 is a vinyl ether, epoxy, or azide residue,A.sup.1 and A.sup.2 are identical or different residues with the general formula C.sub.n H.sub.2n in which n is a whole number from 0 to 20 and one or more methylene groups can be replaced by oxygen atoms, andM.sup.1 has the general formula --R.sup.1 --X.sup.1 --R.sup.2 --X.sup.2 --R.sup.3 --X.sup.3 --R.sup.4 -- whereinR.sup.1, R.sup.2, R.sup.3, and R.sup.4 are identical or different doubly bonded residues from the group --O--, --COO--, --CONH--, --CO--, --S--, --C.tbd.C--, --CH.dbd.CH--, --CH.dbd.N--, --CH.sub.2 --, --N.dbd.N--, and --N.dbd.N(O)--, and R.sup.2 --X.sup.2 --R.sup.3 can also be a C--C bond, andX.sup.1, X.sup.2, and X.sup.
    Type: Grant
    Filed: October 20, 1997
    Date of Patent: April 11, 2000
    Assignee: DaimlerChrysler AG
    Inventors: Peter Strohriegl, Katja Strelzyk, Andreas Stohr, Petra Grundig, Michael Gailberger, Fritz Dannenhauer, Anne Barth
  • Patent number: 5741880
    Abstract: A hydroxy-functional polymer having a number average molecular weight, as determined by gel permeation chromatography, of from about 1800 to about 2700 and which consists essentially of polymerized monomers of 10-40% by weight, based on the total weight of the polymer, styrene; 20-55% by weight isobornyl methacrylate; and 20-55% by weight hydroxypropyl methacrylate; where the total of the monomers equals 100% are disclosed. The polymers are especially useful in combination with polyisocyanates as clearcoats in clearcoat/basecoat coating applications.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: April 21, 1998
    Assignee: The Sherwin-Williams Company
    Inventors: Richard S. Valpey, III, Eugene I. Bzowej
  • Patent number: 5739380
    Abstract: Novel (meth)acrylates containing fluoroalkenyl groups, of the formula (I) ##STR1## in which R represents hydrogen or methyl,n represents an integer from 2 to 6,A represents a (n+1)-valent hydrocarbon radical having 3 to 30 carbon atoms which optionally contains up to 10 oxygen atoms, andR.sup.1.sub.f and R.sup.2.sub.f independently of one another each represent a perfluoroalkyl radical having 1 to 20 carbon atoms, orR.sup.1.sub.f and R.sup.2.sub.f together form a ##STR2## bridge, in which x represents an integer from 1 to 8, andR.sup.3 represents hydrogen, fluorine, chlorine or a perfluoroalkyl radical having 1 to 20 carbon atoms,a process for their preparation, and their use for the preparation of coatings.
    Type: Grant
    Filed: May 16, 1996
    Date of Patent: April 14, 1998
    Assignee: Bayer Aktiengesellschaft
    Inventors: Norbert Lui, Wolfgang Podszun
  • Patent number: 5719314
    Abstract: This process for the preparation of isobornyl (meth)acrylate comprises the reaction of (meth)acrylic acid with camphene in the presence of a solid zirconium-based superacid as catalyst.
    Type: Grant
    Filed: August 16, 1996
    Date of Patent: February 17, 1998
    Assignee: Elf Atochem S.A.
    Inventor: Alain Riondel
  • Patent number: 5672733
    Abstract: This process for the preparation of isobornyl (meth)acrylate by reaction of (meth)acrylic acid with camphene consists in blending the reactants in a blending tank and in placing the mixture in contact with the catalyst in a cartridge which is separate from the blending tank.Single figure.
    Type: Grant
    Filed: December 21, 1995
    Date of Patent: September 30, 1997
    Assignee: Elf Atochem S.A.
    Inventors: Jean-Michel Paul, Gerard Desire
  • Patent number: 5665518
    Abstract: The present invention provides a vinylmonomer represented with the following general formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a dihydric, bridged cyclic hydrocarbon group having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 represents a group to be decomposed by acid or a hydrogen atom, X represents an alkylene group or a coupling group composed of an oxygen-carbon bond, and Y represents an alkylene group or a coupling group composed of a carbon-carbon bond. A photoresist obtained by polymerizing a monomer in accordance with the invention has a high transparency to FUV having a wavelength of at greatest 220 nm, high sensitivity and resolution to FUV, and a high dry etching resistance, and hence is suitable for exposure light such as FUV having a wavelength of at greatest 220 nm and, in particular, ArF excimer laser.
    Type: Grant
    Filed: January 19, 1996
    Date of Patent: September 9, 1997
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa
  • Patent number: 5596127
    Abstract: In a process for preparing terpene esters by reaction of camphene and a low molecular weight carboxylic acid over an acid ion exchanger as catalyst, the reactants are passed from below through the acid ion exchanger located in a column-shaped reactor at such a velocity that the ion exchanger is suspended to uniformly fill the reactor, i.e. gives a pseudofluid suspended bed. In the case of the preparation of isobornyl acetate, a high specific catalyst productivity, a high selectivity of the reaction with formation of small amounts of other esters, a high degree of conversion of the reaction component used in substoichiometric amount and a high total catalyst productivity are achieved.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: January 21, 1997
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Manfred Gscheidmeier, Rudolf Gutmann, Jakob Wiesm uller, Alfred Riedel
  • Patent number: 5593691
    Abstract: New biotenside esters, processes for their preparation and their use as solvents and hydrotropic agents (coemulgators) in the preparation of spontaneously dispersible concentrates containing therapeutic or cosmetic agents are described.
    Type: Grant
    Filed: January 11, 1994
    Date of Patent: January 14, 1997
    Assignee: Marigen S.A.
    Inventors: Carl Eugster, Conrad H. Eugster, Walter Haldemann, Giorgio Rivara
  • Patent number: 5567851
    Abstract: The present invention relates to optically active cyclohexene diol derivatives and optically active cyclohexenone derivatives, and a process for production of these compounds in which a special cyclohexene diol of a starting material is reacted by selectively positioning transesterification in the presence of lipase to obtain an optically active cyclohexene diol derivative and then an optically active cyclohexenone derivative represented by the following formula: ##STR1## According to the present invention, optically active cyclohexene diol derivatives and optically-active cyclohexenone derivatives, which are intermediates for synthesizing physiologically active materials, can be obtained efficiently.
    Type: Grant
    Filed: May 24, 1995
    Date of Patent: October 22, 1996
    Assignee: Chisso Corporation
    Inventors: Seiichi Takano, Kunio Ogasawara
  • Patent number: 5557007
    Abstract: Novel unsaturated polylactone acrylates are produced by the reaction of an unsaturated polylactone, such as that produced in the reaction of a lactone with tetrahydrobenzyl alcohol, and a lower-alkyl acrylate under transesterification conditions. The unsaturated polylactone acrylate product may be subsequently epoxidized to form novel 3,4-epoxy polylactone acrylates.
    Type: Grant
    Filed: September 28, 1990
    Date of Patent: September 17, 1996
    Assignee: Union Carbide Chemicals & Plastics Technology Corporation
    Inventor: James P. Stanley
  • Patent number: 5545399
    Abstract: A composition for topical application to the skin in order to promote the repair of photo-damaged or aged skin and/or to reduce or prevent damaging effects of ultra-violet light on skin and/or to lighten the skin comprising a hydrocalchone of general structure: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, represent H, --OH, --OR or --COR (where R is a C.sub.1-20 alkyl group);R.sub.4, R.sub.5, R.sub.6 and R.sub.7, which may be the same or different, represent H or --COR (where R is as herein before defined).Optional additional ingredients include sunscreens and other skin lightening skin lightening agents, particularly retinol or derivatives thereof.
    Type: Grant
    Filed: October 24, 1994
    Date of Patent: August 13, 1996
    Assignee: Chesebrough-Pond's USA Co.
    Inventors: Caroline M. Lee, Martin R. Green, Giuseppe Prota
  • Patent number: 5510516
    Abstract: An unsaturated (meth) acrylic compound of formula: ##STR1## (X=O, S, NH, NR.sup.3 (R.sup.3 =C.sub.1-12 -alkyl) or O--(CH.sub.2).sub.n (where n=1-16 approximately); R.sup.2 =C.sub.2-20 straight-chain or branched alkyl, monocyclic or polycyclic cycloalkyl or heterocycloalkyl, or alkylaryl hydrocarbon chain, comprising an olefinic double bond in the chain, or at the end of the chain in the case of alkyl or alkylaryl, or an exocyclic or endocyclic olefinic double bond in the case of monocyclic or polycyclic cycloalkyl or heterocycloalkyl; and R.sup.1 =H or C.sub.1-5 -alkyl), is reacted at 10.degree.-60.degree. C. with at least one oxidising compound (hydrogen peroxide) in the presence of at least one catalyst (alkali metal molybdates and tungstates) and in the presence of at least one phase transfer agent and when R.sup.2 =polycyclic cycloalkyl or hetercycloalkyl, an organic peracid or hydrogen peroxide in the presence of at least one heteropolyacid.
    Type: Grant
    Filed: May 4, 1993
    Date of Patent: April 23, 1996
    Assignee: ATOCHEM
    Inventors: Paul Caubere, Yves Fort, Agnes Ortar
  • Patent number: 5380462
    Abstract: Compounds having the Formula: ##STR1## wherein R.sup.1 denotes an alkenyl group;A.sup.1 and A.sup.2 each independently represent 1,4-phenylene, which is unsubstituted or substituted with halogen and in which, when it is unsubstituted, optionally 1 or 2 CH group(s) is/are replaced by nitrogen, or trans-1,4-cyclohexylene or trans-1,3-dioxane-2,5-diyl;Z.sup.1 and Z.sup.2 each independently signify a single covalent bond, --CH.sub.2 CH.sub.2 --, --COO--, --OOC--, --OCH.sub.2 --, --CH.sub.2 O--, --C.dbd.C--, --(CH.sub.2).sub.4 --, --O(CH.sub.2).sub.3 --, --(CH.sub.2).sub.3 O-- or the trans form of --OCH.sub.2 CH.dbd.CH--, --CH.dbd.CHCH.sub.2 O--, --(CH.sub.2).sub.2 CH.dbd.CH-- or --CH.dbd.CH(CH.sub.2).sub.2 --;n is either 0, 1 or 2; andR.sup.2 is halogen, cyano or alkyl with 1 to 12 carbon atoms, which is optionally substituted with fluorine and in which optionally 1 --CH.sub.2 -- group or 2 non-adjacent --CH.sub.2 -- groups is/are replaced by oxygen, --COO--, --OOC--, --CO-- and/or a --CH.sub.2 --CH.sub.
    Type: Grant
    Filed: October 20, 1993
    Date of Patent: January 10, 1995
    Assignee: Hoffmann-La Roche Inc.
    Inventors: Stephen Kelly, Martin Schadt
  • Patent number: 5321044
    Abstract: 15,16-Seco-19-nor progestins are provided which display elevated progestational activity with a minimum of ancillary hormonal activity. Processes for the preparation of the novel progestins are provided as are methods of use. A preferred method of use is in the suppression of ovulation in the human female.
    Type: Grant
    Filed: May 4, 1992
    Date of Patent: June 14, 1994
    Assignee: SRI International
    Inventors: Richard H. Peters, Masato Tanabe