Phosphorus, Sulfur Or Nitrogen In Alcohol Moiety Patents (Class 560/222)
  • Patent number: 9953740
    Abstract: The present invention is to provide a dispersant which has excellent dispersibility and which is able to inhibit the oxidation of dispersed particles. Disclosed is a dispersant comprising a graft copolymer having a constitutional unit represented by the following general formula (I) and a constitutional unit represented by the following general formula (II): (Symbols shown in the general formulae (I) and (II) are as described in the Description.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: April 24, 2018
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yoshinobu Omori, Naonobu Yoshi, Michihiro Ogura, Tomoki Murata, Mikiko Hojo
  • Patent number: 9171655
    Abstract: A solid electrolyte film including a resin having a repeating unit containing a bis(perfluoroalkanesulfonyl)methide moiety. This solid electrolyte film combines high proton conductivity with low methanol permeability for prevention of methanol crossover and can suitably be used for a direct methanol fuel cell.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: October 27, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Katsutoshi Suzuki, Yoshihiko Obara, Toru Tanaka, Haruhiko Komoriya
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Patent number: 9017931
    Abstract: A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a tertiary ester type acid labile group having a plurality of methyl or ethyl groups on alicycle and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, baking, and developing in an organic solvent developer so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high dissolution contrast during organic solvent development and forms a fine hole or trench pattern of dimensional uniformity.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Jun Hatakeyama, Masayoshi Sagehashi, Teppei Adachi
  • Patent number: 9006480
    Abstract: The invention relates a process for producing isocyanates comprising the steps of a) providing an azolide and optionally a solvent, and b) adding an acid at a temperature below about 40 C. The invention also relates to the isocyanate obtainable by such a process.
    Type: Grant
    Filed: April 4, 2011
    Date of Patent: April 14, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Wolf Steiger, Peter Bissinger
  • Publication number: 20150084031
    Abstract: A polymerizable monomer represented by the following formula (1) wherein at least one of Ar1 to Ar3 is substituted by a group represented by the following formula (2) and which is substituted by one or more groups comprising a polymerizable functional group. Ar1 to Ar3 are a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms, Ar6 is a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms and Ar4 and Ar5 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms.
    Type: Application
    Filed: December 2, 2014
    Publication date: March 26, 2015
    Inventors: Mitsuru EIDA, Nobohiro YABUNOUCHI, Yumiko MIZUKI, Masami WATANABE, Akinori YOMOGITA
  • Patent number: 8957243
    Abstract: The present invention provides phosphonium ionic liquids (11) and coatings made therefrom. Highly fluorinated phosphonium ionic liquids based on (11) having been produced exhibiting high thermal stabilities, low melting points and temperature dependent solvent miscibilities. These salts and derivatives of (11) have also been employed in the preparation of superhydrophobic surfaces, indicating that ionic liquids are not only new alternative solvents, but also viable functional materials. All derivatives of (11) form biphasic systems with common laboratory solvents of ranging polarity at room temperature. Based on the solvent miscibility experiments with water and the high fluorine loading, the PILs showed obvious evidence of being hydrophobic. Coatings made with these phosphonium ionic liquids (11), salts and derivatives thereof were superhydrophobic with water contact angles were measured and all of the surfaces were determined to be superhydrophobic with contact angles >150°.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: February 17, 2015
    Assignee: The University of Western Ontario
    Inventors: Paul J. Ragogna, Jocelyn J. Tindale
  • Patent number: 8907122
    Abstract: A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: December 9, 2014
    Assignees: Rohm and Haas Electronic Material LLC, Dow Global Technologies LLC
    Inventors: Suzanne M. Coley, David R. Wilson, Francis J. Timmers
  • Publication number: 20140303397
    Abstract: The present invention provides novel polymerizable monomers having chelating functionality and processes to make them. In particular, the novel monomers are ethylenically unsaturated aminocarboxylates and are prepared by reacting ethylenediamine triacetic acid or its salt with an ethylenically unsaturated monomer. The ethyleneically unsaturated monomer may be a polymerizable vinyl monomer selected from (o-, p-, m-)DVBMO, allyl glycidyl ether, and glycidyl (meth)acrylate.
    Type: Application
    Filed: October 31, 2012
    Publication date: October 9, 2014
    Applicants: ROHM AND HAAS COMPANY, DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Scott Backer, Allen Bulick, Joseph Manna, Cynthia Rand, Jia Xie
  • Patent number: 8853437
    Abstract: An object of the present invention is to provide a compound having a novel structure for overcoming the defects of conventional steroid agents and NSAIDs. It is found that the particular dihydroxy bodies of eicosapentaenoic acid and docosahexaenoic acid, which have not conventionally been known (11,18-dihydroxy eicosapentaenoic acid (11,18-diHEPE), 17,18-dihydroxy eicosapentaenoic acid (17,18-diHEPE) etc.), have activity of inhibiting neutrophil, thereby solving the object. The present invention unexpectedly remarkably inhibits infiltration into a tissue of, and activation of neutrophil found out at acute inflammation. The compound of the present invention is a compound which has not conventionally been known. Therefore, utility as a new therapeutic is provided.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: October 7, 2014
    Assignee: The University of Tokyo
    Inventors: Makoto Arita, Hiroyuki Arai, Yousuke Isobe, Ryo Taguchi
  • Publication number: 20140296364
    Abstract: The invention relates to a dental material which comprises a polymerizable bisphosphonic acid of Formula I: The invention also relates to the use of a polymerizable bisphosphonic acid of Formula I for the preparation of a dental material and in particular for the preparation of an adhesive, cement or composite.
    Type: Application
    Filed: December 6, 2012
    Publication date: October 2, 2014
    Inventors: Norbert Moszner, Yohann Catel, Jörg Angermann, Thorsten Bock, Volker Rheinberger
  • Patent number: 8835671
    Abstract: Zwitterionic crosslinking agents, crosslinked zwitterionic hydrogels prepared from copolymerization of zwitterionic monomers with the zwitterionic crosslinking agent, methods for making crosslinked zwitterionic hydrogels, and devices that include and methods that use the crosslinked zwitterionic hydrogels.
    Type: Grant
    Filed: May 3, 2012
    Date of Patent: September 16, 2014
    Assignee: University of Washington through its Center for Commercialization
    Inventors: Shaoyi Jiang, Hong Xue, Louisa R. Carr
  • Patent number: 8829079
    Abstract: Surface-modified zirconia nanoparticles and methods for making and using the same are provided. The surface-modifiers include non-metallic organic derivatives, comprising at least one hydroxamate functionality, wherein at least some of the non-metallic organic derivatives are attached to at least some of the zirconia nanoparticles.
    Type: Grant
    Filed: January 15, 2010
    Date of Patent: September 9, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Nathan E. Shultz, Guy D. Joly, Michael D. Determan
  • Patent number: 8816124
    Abstract: Disclosed is an energetic reactive plasticizer for a plastic bonded explosive (PBX), and specifically an energetic reactive plasticizer for PBX which has high performance and insensitiveness without a plasticizer leak by being bonded with a polymer binder for a plastic bonded explosive.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: August 26, 2014
    Assignee: Agency for Defense Development
    Inventors: Young Hwan Kwon, Jin Seuk Kim, Bum Jae Lee, In Joo Bae
  • Publication number: 20140186769
    Abstract: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed.
    Type: Application
    Filed: December 10, 2013
    Publication date: July 3, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takaaki Kaiho, Yoshiyuki Utsumi, Jun Iwashita, Masahito Yahagi
  • Patent number: 8741966
    Abstract: The present disclosure relates to lipid compounds of formula (I): wherein: R1 is chosen from a C10-C21 alkyl, a C10-C21 alkenyl having 1-6 double bonds, and a C10-C21 alkynyl having 1-6 triple bonds; R2 and R3 are the same or different and are chosen from hydrogen and a C1-C6 alkyl; X is chosen from O, S, SO, SO2, Si, and Se; n=1 or 3; and P1 is chosen from hydrogen; a C10-C21 alkyl, a C10-C21 alkenyl having 1-6 double bonds, a C10-C21 alkynyl having 1-6 triple bonds, optionally substituted; a group of formula (II) or formula (III), wherein P2, P3, and P4 are chosen from hydrogen, an alkyl, an alkenyl, and an alkynyl, optionally substituted; and a group of formula (IV) or formula (V), wherein P5 is chosen from hydrogen and a C1-C6 alkyl; or a pharmaceutically acceptable salt, complex, or solvate thereof.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: June 3, 2014
    Assignee: Pronova Biopharma Norge AS
    Inventor: Anne Kristin Holmeide
  • Patent number: 8691490
    Abstract: There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R1 represents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and R2 and R3 each represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or R2 and R3 may be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: April 8, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Satoshi Watanabe, Youichi Ohsawa, Keiichi Masunaga, Takeshi Kinsho
  • Publication number: 20140046091
    Abstract: Disclosed is an energetic reactive plasticizer for a plastic bonded explosive (PBX), and specifically an energetic reactive plasticizer for PBX which has high performance and insensitiveness without a plasticizer leak by being bonded with a polymer binder for a plastic bonded explosive.
    Type: Application
    Filed: August 8, 2013
    Publication date: February 13, 2014
    Applicant: Agency For Defense Development
    Inventors: Young Hwan Kwon, Jin Seuk Kim, Bum Jae Lee, In Joo Bae
  • Publication number: 20140017617
    Abstract: A method of producing an ammonium salt compound, including reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and a method of producing a compound, including a step of salt exchange between the ammonium salt compound obtained by the aforementioned production method and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.
    Type: Application
    Filed: July 8, 2013
    Publication date: January 16, 2014
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Publication number: 20130337378
    Abstract: A sulfonium salt comprising (a) a polymerizable substituent, (b) a sulfonium cation, and (c) a sulfonate anion within a common molecule is capable of generating a sulfonic acid in response to high-energy radiation or heat. A resist composition comprising the sulfonium salt as base resin has high resolution and is suited for precise micropatterning by ArF immersion, EB or EUV lithography.
    Type: Application
    Filed: May 30, 2013
    Publication date: December 19, 2013
    Inventors: Masaki Ohashi, Jun Hatakeyama
  • Publication number: 20130310531
    Abstract: Disclosed are terminal-modified difunctional sulfur-containing polymers that are the reaction products of a sulfur-containing diol, an aldehyde or a ketone, and a compound containing a functional group. Compositions comprising the terminal-modified difunctional sulfur-containing polymers useful as sealants are also disclosed.
    Type: Application
    Filed: July 25, 2013
    Publication date: November 21, 2013
    Applicant: PRC-DeSoto International, Inc.
    Inventors: Stephen J. Hobbs, Gregory J. McCollum, Lawrence G. Anderson, Renhe Lin
  • Patent number: 8580486
    Abstract: There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: November 12, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Masashi Nagamori, Satoru Narizuka, Susumu Inoue, Takashi Kume
  • Patent number: 8569537
    Abstract: The present disclosure relates to surface-modified zirconia nanoparticles, methods for making and using the same, and high index of refraction films made therefrom. The provided zirconia nanoparticles are surface modified with ligands that include N-hydroxyurea functionalities. The provided ligands also can contain compatibilizing groups that allow the provided surface-modified zirconia nanoparticles to be incorporated into an organic matrix. High index of refraction films can be made using these organic matrices.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: October 29, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Guy D. Joly, Nathan E. Schultz, Encai Hao
  • Publication number: 20130280305
    Abstract: The present invention provides a cationic lipid, which allow nucleic acids to be easily introduced into cells, represented by formula (I) (wherein: R1 and R2 are, the same or different, alkenyl, etc, and X1 and X2 are hydrogen atoms, or are combined together to form a single bond or alkylene, and X3 is absent or is alkyl, etc, Y is absent or anion, a and b are, the same or different, 0 to 3, and L3 is a single bond, etc, R3 is alkyl, etc, L1 and L2 are —O—, —CO—O— or —O—CO—), a composition comprising the cationic lipid and a nucleic acid, and a method for introducing a nucleic acid into a cell by using the composition comprising the cationic lipid and the nucleic acid, and the like.
    Type: Application
    Filed: November 2, 2012
    Publication date: October 24, 2013
    Inventors: Takeshi KUBOYAMA, Tomohiro ERA, Tomoyuki NAOI, Nobuhiro YAGI
  • Patent number: 8426106
    Abstract: A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of ?1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
    Type: Grant
    Filed: October 12, 2010
    Date of Patent: April 23, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Junji Shigematsu
  • Publication number: 20130075364
    Abstract: Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer.
    Type: Application
    Filed: September 22, 2011
    Publication date: March 28, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Wei Wang, Ko-Bin Kao, Wei-Liang Lin, Jui-Ching Wu, Chia-Hsiang Lin, Ai-Jen Jung
  • Patent number: 8404778
    Abstract: A pre-adhesive syrup polymer composition is described comprising an acid-functional (meth)acrylate copolymer and an aminoalkyl (meth)acryloyl solvent monomer, which when polymerized, provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: March 26, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Belma Erdogan-Haug, Maureen A. Kavanagh, Marie Aloshyna ep Lesuffleur, Larry R. Krepski, Babu N. Gaddam
  • Publication number: 20130046107
    Abstract: The present disclosure relates to surface-modified zirconia nanoparticles, methods for making and using the same, and high index of refraction films made therefrom. The provided zirconia nanoparticles are surface modified with ligands that include N-hydroxyurea functionalities. The provided ligands also can contain compatibilizing groups that allow the provided surface-modified zirconia nanoparticles to be incorporated into an organic matrix. High index of refraction films can be made using these organic matrices.
    Type: Application
    Filed: October 26, 2012
    Publication date: February 21, 2013
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventor: 3M INNOVATIVE PROPERTIES COMP
  • Publication number: 20130023694
    Abstract: The invention relates a process for producing isocyanates comprising the steps of a) providing an azolide and optionally a solvent, and b) adding an acid at a temperature below about 40 C. The invention also relates to the isocyanate obtainable by such a process.
    Type: Application
    Filed: April 4, 2011
    Publication date: January 24, 2013
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Wolf Steiger, Peter Bissinger
  • Publication number: 20120322939
    Abstract: Zwitterionic crosslinking agents, crosslinked zwitterionic hydrogels prepared from copolymerization of zwitterionic monomers with the zwitterionic crosslinking agent, methods for making crosslinked zwitterionic hydrogels, and devices that include and methods that use the crosslinked zwitterionic hydrogels.
    Type: Application
    Filed: May 3, 2012
    Publication date: December 20, 2012
    Applicant: University of Washington through its Center for Commercialization
    Inventors: Shaoyi Jiang, Hong Xue, Wei Yang, Louisa R. Carr
  • Patent number: 8309756
    Abstract: To provide a surface treating agent and a composition for surface treatment capable of forming a coating film excellent in the water/oil repellency, the efficiency for removal of oil-and-fat stains, alkali resistance and heat resistance and having a low coefficient of friction; a method for treating the surface of an article by using the surface treating agent or the composition for surface treatment; an article having surface treatment applied; and a novel fluorinated ether compound useful as a surface treating agent. A surface treating agent comprising a compound represented by the following formula (A): RFO(CF2CF2O)aCF2C(O)N(H)b(-Q-OC(O)C(R)?CH2)2-b??(A) wherein RF is a C1-20 perfluoro monovalent saturated hydrocarbon group or the like; a is an integer of from 1 to 200; b is 0 or 1; Q is a C1-6 alkylene group or the like; and R is a hydrogen atom or a C1-3 alkyl group.
    Type: Grant
    Filed: October 21, 2011
    Date of Patent: November 13, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Daisuke Shirakawa, Yoshiyuki Gozu, Taiki Hoshino
  • Publication number: 20120252980
    Abstract: A pre-adhesive syrup polymer composition is described comprising an acid-functional (meth)acrylate copolymer and an aminoalkyl (meth)acryloyl solvent monomer, which when polymerized, provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles.
    Type: Application
    Filed: June 6, 2012
    Publication date: October 4, 2012
    Inventors: Belma Erdogan-Haug, Maureen A. Kavanagh, Marie Aloshyna ep Lesuffleur, Larry R. Krepski, Babu N. Gaddam
  • Patent number: 8273837
    Abstract: A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: September 25, 2012
    Assignee: JSR Corporation
    Inventors: Tomoki Nagai, Takuma Ebata, Nobuji Matsumura
  • Patent number: 8247597
    Abstract: The invention provides a method of continuously producing high quality quaternized N,N-dialkylaminoethyl (meth)acrylates (DMAEA.MCQ) that has a long shelf life and which is stable in water. The method involves placing starting materials into a continuously stirred tank reactor in the presence of less than 6% water. This low amount of water causes two liquid phases to form and prevents unwanted side reactions. The denser liquid phase contains DMAEA.MCQ and the lighter phase contains the starting materials. Liquid from the denser phase is removed from a position where little of the lighter phase has been mixed in. The removed liquid then has any last traces of the starting materials reacted into DMAEA.MCQ and strips away any starting materials with a gas flow. The resulting liquid is high purity DMAEA.MCQ. Water can then safely be added to ease in the transport and use of the produced DMAEA.MCQ.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: August 21, 2012
    Assignee: Nalco Company
    Inventors: Barbara E. Fair, Peter E. Reed, Leonard M. Ver Vers, Larry E. Brammer, Jr., Charles J. Holada, Cheng-Sung Huang, Kailas B. Sawant
  • Publication number: 20120195901
    Abstract: Compositions and methods for making and using anti-LPA agents, for example, monoclonal antibodies, are described.
    Type: Application
    Filed: April 16, 2012
    Publication date: August 2, 2012
    Inventors: Roger A. SABBADINI, William A. GARLAND, Genevieve HANSEN, James Stephen SWANEY
  • Patent number: 8222340
    Abstract: A pre-adhesive syrup polymer composition is described comprising an acid-functional (meth)acrylate copolymer and an aminoalkyl (meth)acryloyl solvent monomer, which when polymerized, provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: July 17, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Belma Erdogan-Haug, Maureen A. Kavanagh, Marie Aloshyna ep Lesuffleur, Larry R. Krepski, Babu N. Gaddam
  • Patent number: 8222448
    Abstract: Disclosed is a process for producing 2-bromo-2,2-difluoroethanol, which comprises reducing a bromodifluoroacetic acid derivative represented by the formula [1] by using an ate hydride complex as a reducing agent. 2-Bromo-2,2-difluoroethanol thus produced can be used as the starting material to carry out the esterification step, the sulfination step and the oxidation step in this order, thereby producing a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid salt, wherein A represents a substituted or unsubstituted linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, a substituted or unsubstituted aryloxy group having 6 to 15 carbon atoms, a heteroaryloxy group having 4 to 15 carbon atoms, or a halogen atom.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: July 17, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Jonathan Joachim Jodry, Masashi Nagamori, Yuji Hagiwara, Masaki Fujiwara, Satoru Narizuka
  • Patent number: 8217081
    Abstract: A polymerizable biomedical composition includes a quaternary ammonium group bonded at its quaternary sites to respective groups R1, R2, R3, and R4. R1 and R2 each include a vinyl moiety such that the composition is at least bi-functional with respect to polymerization.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: July 10, 2012
    Assignee: The United States of America as represented by the Secretary of Commerce, The National Institute of Standards and Technology
    Inventor: Joseph M. Antonucci
  • Publication number: 20120171616
    Abstract: A compound has formula (I): Q-O-(A)-Z?G+??(I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
    Type: Application
    Filed: December 29, 2011
    Publication date: July 5, 2012
    Inventors: James W. Thackeray, Suzanne M. Coley, Vipul Jain, Owendi Ongayi, James F. Cameron, Paul J. LaBeaume, Ahmad E. Madkour
  • Publication number: 20120172555
    Abstract: A monomer compound has the formula (I): where each R1, R2, and R3 is independently H, F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one of R1, R2, or R3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C2-30 olefin-containing polymerizable group, and G+ is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C2-30 olefin-containing compound. A polymer includes the monomer of formula (I).
    Type: Application
    Filed: December 29, 2011
    Publication date: July 5, 2012
    Inventors: Suzanne M. Coley, David R. Wilson, Francis J. Timmers
  • Publication number: 20120172619
    Abstract: A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
    Type: Application
    Filed: December 29, 2011
    Publication date: July 5, 2012
    Inventors: Suzanne M. Coley, David R. Wilson, Francis J. Timmers
  • Publication number: 20120129103
    Abstract: A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.
    Type: Application
    Filed: November 9, 2011
    Publication date: May 24, 2012
    Inventors: Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama
  • Publication number: 20120125863
    Abstract: Methods are provided for making halide-free quaternary ammonium salt monomers. Polymers prepared from the monomers and methods of using the polymers to clarify raw, untreated water or wastewater are also disclosed.
    Type: Application
    Filed: November 22, 2010
    Publication date: May 24, 2012
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Tamaz Guliashvili, Stephen R. Vasconcellos
  • Publication number: 20120093753
    Abstract: Provided are polyglyceryl compositions comprising one or more polyglyceryl compounds having: (a) a node structure comprising at least three contiguous glyceryl remnant units; (b) one or more cationic groups each linked to the node structure by an independently selected linking group; and (c) one or more hydrophobic moieties each independently (i) linked to the node structure by a linking group, or (ii) constituting a portion of one of the one or more cationic groups, wherein the composition has an average degree of polymerization determined by hydroxyl value testing (DPOH) of from about 3 to about 20. Also provided are polyglyceryl compounds which may compose such compositions, and uses of the polyglyceryl compositions and compounds.
    Type: Application
    Filed: December 20, 2011
    Publication date: April 19, 2012
    Inventors: Michael J. Fevola, Frank C. Sun, Stacey E. York
  • Patent number: 8148571
    Abstract: A novel compound (I) represented by the following formula (1) is provided which is suitable for a dental composition and has a polymerizable group, a carboxyl group and a phosphoric acid group. A method for producing a polymerizable amide is provided, which method can make a condensation reaction of a carboxylic acid with an amine to proceed easily and is excellent in safety: wherein R1, R2 and R3 each independently are a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent; (A) and (B) are each any constituent unit; m is an integer of from 1 to 3; n is an integer of from 1 to 3; R4 is an organic group having 1 to 40 carbon atoms which may have a substituent; R5 is a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, R6 and R7 each independently are a hydrogen atom, a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, or a metal atom.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: April 3, 2012
    Assignee: Kuraray Medical Inc.
    Inventors: Takahiro Sekiguchi, Ai Hinamoto
  • Publication number: 20110315964
    Abstract: A polymerizable monomer represented by the following formula (1) wherein at least one of Ar1 to Ar3 is substituted by a group represented by the following formula (2) and which is substituted by one or more groups comprising a polymerizable functional group. Ar1 to Ar3 are a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms, Ar6 is a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms and Ar4 and Ar5 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms.
    Type: Application
    Filed: March 5, 2010
    Publication date: December 29, 2011
    Inventors: Mitsuru Eida, Nobuhiro Yabunouchi, Yumiko Mizuki, Masami Watanabe, Akinori Yomogita
  • Publication number: 20110256510
    Abstract: Disclosed are compositions and methods of using such compositions for inhibiting matrix metalloproteinase activity in dental tissue. The compositions, methods and uses may prevent degradation of the bonding between restorative materials and dental tissues, thereby increasing durability and longevity of the restorative material-dental tissue bonds. For example, the compositions, methods, and uses of the present invention may be used for treating carious dental tissue such as by the creation of dental fillings, crowns, bridges, among other techniques, as well as the creation of esthetic laminate restorations.
    Type: Application
    Filed: January 11, 2010
    Publication date: October 20, 2011
    Inventors: David Henry Pashley, Franklin Chin-Meng Tay, Milena Cadenaro
  • Publication number: 20110244231
    Abstract: A pre-adhesive syrup polymer composition is described comprising an acid-functional (meth)acrylate copolymer and an aminoalkyl (meth)acryloyl solvent monomer, which when polymerized, provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 6, 2011
    Inventors: Belma Erdogen-Haug, Maureen A. Kavanagh, Marie Aloshyna ep Lesuffleur, Larry R. Krepski, Babu N. Gaddam
  • Publication number: 20110189607
    Abstract: There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R1 represents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and R2 and R3 each represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or R2 and R3 may be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.
    Type: Application
    Filed: January 25, 2011
    Publication date: August 4, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki OHASHI, Satoshi WATANABE, Youichi OHSAWA, Keiichi MASUNAGA, Takeshi KINSHO
  • Publication number: 20110178327
    Abstract: The invention provides a method of continuously producing high quality quaternized N,N-dialkylaminoethyl (meth)acrylates (DMAEA.MCQ) that has a long shelf life and which is stable in water. The method involves placing starting materials into a continuously stirred tank reactor in the presence of less than 6% water. This low amount of water causes two liquid phases to form and prevents unwanted side reactions. The denser liquid phase contains DMAEA.MCQ and the lighter phase contains the starting materials. Liquid from the denser phase is removed from a position where little of the lighter phase has been mixed in. The removed liquid then has any last traces of the starting materials reacted into DMAEA.MCQ and strips away any starting materials with a gas flow. The resulting liquid is high purity DMAEA.MCQ. Water can then safely be added to ease in the transport and use of the produced DMAEA.MCQ.
    Type: Application
    Filed: January 21, 2010
    Publication date: July 21, 2011
    Inventors: Barbara E. Fair, Peter E. Reed, Leonard M. Ver Vers, Larry E. Brammer, JR., Charles J. Holada, Cheng-Sung Huang, Kailas B. Sawant