Display Or Data Processing Devices (epo) Patents (Class 850/10)
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Patent number: 8347411Abstract: The scanning probe microscope has a primary control loop (7, 11, 12) for keeping the phase and/or amplitude of deflection at constant values as well as a secondary control loop (9) that e.g. keeps the frequency of the cantilever oscillation constant by applying a suitable DC voltage to the probe while, at the same time, a conservative AC excitation is applied thereto. By actively controlling the frequency with the first control loop (7, 11, 12) and subsequently controlling the DC voltage in order to keep the frequency constant, a fast system is created that allows to determine the contact potential difference or a related property of the sample (3) quickly.Type: GrantFiled: July 14, 2006Date of Patent: January 1, 2013Assignee: Specs Zürich GmbHInventors: Dominik Ziegler, Andreas Christian Stemmer, Jorg Rychen
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Patent number: 8296856Abstract: A control system (32, 75) is for use with a scanning probe microscope of a type in which measurement data is collected at positions within a scan pattern described as a probe and sample are moved relative to each other. The control system is used in conjunction with a position detection system (34) that measures the position of at least one of the probe and sample such that their relative spatial location (x, y) is determined. Measurement data may then be correlated with empirically-determined spatial locations in constructing an image. The use of empirical location data means that image quality is not limited by the ability of a microscope scanning system to control mechanically the relative location of probe and sample.Type: GrantFiled: February 4, 2010Date of Patent: October 23, 2012Assignee: Infinitesima Ltd.Inventors: Andrew Humphris, David Catto
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Patent number: 8286261Abstract: A microscope, in particular a scanning probe microscope, comprising a programmable logic device.Type: GrantFiled: July 14, 2010Date of Patent: October 9, 2012Assignee: Witec Wissenchaftliche Instrumente und Technologie GmbHInventors: Peter Spizig, Detief Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
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Patent number: 8276210Abstract: A tomographic atom probe uses electrical pulses applied to an electrode in order to carry out evaporation of the sample being analyzed. In order to produce these electrical pulses, the tomographic atom probe comprises a high-voltage generator connected to an electrode by an electrical connection comprising a chip of semiconductor material. The probe also comprises a light source which can be controlled in order to generate light pulses which are applied to the semiconductor chip. Throughout the illumination, the chip is rendered conductive, which puts the high-voltage generator and the electrode in electrical contact so that a potential step is applied to the latter. The probe also comprises means for applying a voltage step of opposite amplitude to the previous step at the end of a time interval ?t0, so that the electrode finally receives a voltage pulse of duration ?t0.Type: GrantFiled: October 13, 2009Date of Patent: September 25, 2012Assignees: Cameca, CNRSInventors: François Vurpillot, Alain Bostel
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Patent number: 8256018Abstract: Faster and better methods for leveling arrays including software and user interface for instruments. A method comprising: (i) providing at least one array of cantilevers supported by at least one support structure, (ii) providing at least one substrate, (iii) providing at least one instrument to control the position of the array with respect to the substrate, (iv) leveling the array with respect to the substrate, wherein the leveling is performed via a user interface on the instrument which is adapted to have the user input positional information from the motors and piezoelectric extender when at least one cantilever deflects from the substrate. Uniform z-displacements can be achieved.Type: GrantFiled: February 5, 2009Date of Patent: August 28, 2012Assignee: NanoInk, Inc.Inventors: Jason Haaheim, Vadim Val-Khvalabov
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Patent number: 8245316Abstract: The scanning probe microscope applies a sum of an AC voltage (Uac) and a DC voltage (Udc) to its probe. The frequency of the AC voltage (Uac) substantially corresponds to the mechanical oscillation frequency of the probe, but its phase in respect to the mechanical oscillation varies periodically. The phase modulation has a frequency fmod. The microscope measures the frequency (f) or the amplitude (K) of a master signal (S) applied to the probe's actuator, or it measures the phase of the mechanical oscillation of the cantilever in respect to the master signal (S). The spectral component at frequency fmod of the measured signal is fed to a feedback loop controller, which strives to keep it zero by adjusting the DC voltage (Udc), thereby keeping the DC voltage at the contact voltage potential.Type: GrantFiled: December 15, 2006Date of Patent: August 14, 2012Assignee: Specs Zürich GmbHInventor: Jörg Rychen
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Patent number: 8220067Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.Type: GrantFiled: March 29, 2010Date of Patent: July 10, 2012Assignee: Board of Regents of the Nevada System of Higher EducationInventors: Jesse D. Adams, Todd A. Sulchek, Stuart C. Feigin
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Patent number: 8212227Abstract: An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.Type: GrantFiled: April 5, 2010Date of Patent: July 3, 2012Assignee: Hitachi, Ltd.Inventors: Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada, Yasutsugu Usami
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Patent number: 8209768Abstract: A method of manufacturing an SPM probe having a support element, a cantilever, and a scanning tip on an underside of the cantilever, and having a mark located on the top side of the cantilever opposite the scanning tip. The mark on the top side of the cantilever is located exactly opposite the scanning tip on the underside of the cantilever. This makes it possible to identify the exact position of the scanning tip in the scanning probe microscope from the upward-pointing top side of the cantilever, which significantly simplifies the alignment of the SPM probe. The support element with the cantilever may be prefabricated conventionally and the scanning tip and the mark are then produced on the cantilever in a self-aligning way by means of a particle-beam-induced material deposition based on a gas-induced process.Type: GrantFiled: October 9, 2009Date of Patent: June 26, 2012Assignee: NanoWorld AGInventors: Thomas Sulzbach, Oliver Krause, Mathieu Burri, Manfred Detterbeck, Bernd Irmer, Christian Penzkofer
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Patent number: 8196218Abstract: An exemplary, highly integrated, SPM-based system for measuring the conductivity and/or force of substance under programmable engaging/stretching processes is described. A sample bias is applied across two electrodes. A substance to be measured is sandwiched between them. A first electrode is first brought relative to a second electrode (engaging) in programmable pathways that can be described as stretching distance versus time curves. The process of engaging the electrodes continues until a certain current reached, a certain force reached and whichever case happens first. The electrodes are then separated (stretching) in programmable pathways that can be described as stretching distance versus time curves. A periodic modulation can be applied to the engaging/stretching process to realize different stretch pathways. The sample bias across the electrodes is kept constant or swept in a programmable shape over time, described as a voltage-versus time curve.Type: GrantFiled: March 30, 2009Date of Patent: June 5, 2012Assignee: University of Georgia Research Foundation, Inc.Inventors: Bingqian Xu, Fan Chen
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Patent number: 8178836Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.Type: GrantFiled: June 3, 2010Date of Patent: May 15, 2012Assignee: Hitachi High-Technologies CorporationInventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
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Patent number: 8074292Abstract: The present invention concerns the enhancing of the mass resolution of wide angle tomographic atom probes. The invention consists of an atom probe also comprising a sample-holding device and a detector which are separated from one another by a distance L and enclosed in a chamber, an “Einzel” type electrostatic lens consisting of three electrodes arranged inside the chamber between the sample and the detector, to which electrical potentials are applied so as to form an electrical field that strongly focuses the beam of ions emitted by the sample under test when the probe is operating. According to the invention, the geometry of the electrodes is defined precisely so as to greatly limit the effects of the spherical aberration that affects the “Einzel” lens on the beam of ions, said spherical aberration being clearly sensitive when the lens is greatly polarized. The invention applies more particularly to the atom probes known as 3D atom probes.Type: GrantFiled: October 8, 2008Date of Patent: December 6, 2011Assignee: CamecaInventors: Alain Bostel, Mikhail Yavor, Ludovic Renaud, Bernard Deconihout
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Publication number: 20110296561Abstract: A control system (32, 75) is for use with a scanning probe microscope of a type in which measurement data is collected at positions within a scan pattern described as a probe and sample are moved relative to each other. The control system is used in conjunction with a position detection system (34) that measures the position of at least one of the probe and sample such that their relative spatial location (x, y) is determined. Measurement data may then be correlated with empirically-determined spatial locations in constructing an image. The use of empirical location data means that image quality is not limited by the ability of a microscope scanning system to control mechanically the relative location of probe and sample.Type: ApplicationFiled: February 4, 2010Publication date: December 1, 2011Applicant: INFINITESIMA LTDInventors: Andrew Humphris, David Catto
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Publication number: 20110138505Abstract: An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.Type: ApplicationFiled: August 10, 2010Publication date: June 9, 2011Applicant: SEAGATE TECHNOLOGY LLCInventors: Lin Zhou, Huiwen Liu, Dale Egbert, Peter Gunderson, John Ibele, Kah Choong Loo, Cing Siong Ling
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Patent number: 7958564Abstract: A scanning measurement instrument is capable of simultaneously achieving both higher accuracy and higher speed in autonomous scanning measurement. The instrument includes a path information holding unit for holding information about the path of the center position of a tip of a scanning probe at past tip center positions with respect to the current tip center position during autonomous scanning measurement performed with the scanning probe; a path reference direction setting unit for setting an approximate straight line direction of the path as a path reference direction; a traveling direction setting unit for setting the path reference direction as a traveling direction; a movement control unit for controlling a moving unit such that the scanning probe is moved in the traveling direction; and a normal direction setting unit for setting the normal direction of a measurement surface according to the traveling direction.Type: GrantFiled: February 19, 2009Date of Patent: June 7, 2011Assignee: Mitutoyo CorporationInventors: Takashi Noda, Hiroshi Kamitani, Naoya Kikuchi
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Patent number: 7877816Abstract: Microscope, in particular a scanning probe microscope, comprising a programmable logic device.Type: GrantFiled: October 23, 2006Date of Patent: January 25, 2011Assignee: Witec Wissenschaftliche Instrumente und Technologie GmbHInventors: Peter Spizig, Detlef Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
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Patent number: 7865966Abstract: A method of operating a scanning probe microscope (SPM) includes scanning a sample as a probe of the SPM interacts with a sample, and collecting sample surface data in response to the scanning step. The method identifies a feature of the sample from the sample surface data and automatically performs a zoom-in scan of the feature based on the identifying step. The method operates to quickly identify and confirm the location of features of interest, such as nano-asperities, so as to facilitate performing a directed high resolution image of the feature.Type: GrantFiled: September 12, 2008Date of Patent: January 4, 2011Assignee: Veeco Metrology Inc.Inventors: Chanmin Su, Sergey Belikov
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Publication number: 20100313311Abstract: A microscope, in particular a scanning probe microscope, comprising a programmable logic device.Type: ApplicationFiled: July 14, 2010Publication date: December 9, 2010Inventors: Peter Spizig, Detief Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
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Patent number: 7836757Abstract: A phase feedback AFM (atomic force microscope) and method for the phase feedback AFM. A cantilever is driven to oscillate at a constant frequency close to the resonance frequency of the cantilever by a driving signal. The distance between the probe and the sample is controlled such that the phase difference between the driving signal and a cantilever deflection signal indicating deflections of the cantilever is kept constant. The phase feedback AFM has an amplifier-controller for receiving the cantilever deflection signal, the output from an oscillator for driving the cantilever into oscillation, and a signal representing a reference amplitude of oscillation of the cantilever. The phase feedback AFM further includes a feedback circuit which receives the output from the amplifier-controller which controls the cantilever deflection signal to a preset amplitude.Type: GrantFiled: March 19, 2008Date of Patent: November 23, 2010Assignee: JEOL Ltd.Inventor: Shinichi Kitamura
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Patent number: 7834315Abstract: A method for sample examination in a dual-beam FIB calculates a first angle as a function of second, third and fourth angles defined by the geometry of the FIB and the tilt of the specimen stage. A fifth angle is calculated as a function of the stated angles, where the fifth angle is the angle between the long axis of an excised sample and the projection of the axis of the probe shaft onto the X-Y plane. The specimen stage is rotated by the calculated fifth angle, followed by attachment to the probe tip and lift-out. The sample may then be positioned perpendicular to the axis of the FIB electron beam for STEM analysis by rotation of the probe shaft through the first angle.Type: GrantFiled: March 3, 2008Date of Patent: November 16, 2010Assignee: Omniprobe, Inc.Inventors: Lyudmila Zaykova-Feldman, Thomas M. Moore, Gonzalo Amador, Matthew Hammer
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Patent number: 7770439Abstract: A method and apparatus of scanning a sample with a scanning probe microscope including scanning a surface of the sample according to at least one scan parameter to obtain data corresponding to the surface, and substantially automatically identifying a transition in the surface. Based on the identified transition, the sample is re-scanned. Preferably, the resultant data is amended with data obtained by re-scanning the transition.Type: GrantFiled: October 17, 2006Date of Patent: August 10, 2010Assignee: Veeco Instruments Inc.Inventor: Paul L. Mininni
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Patent number: 7770232Abstract: A scanning probe microscope system capable of identifying an element with atomic scale spatial resolution comprises: an X-ray irradiation means for irradiating a measurement object with high-brilliance monochromatic X-rays having a beam diameter smaller than 1 mm; a probe arranged to oppose to the measurement object; a processing means for detecting and processing a tunneling current through the probe; and a scanning probe microscope having an alignment means for relatively moving the measurement object, the probe, and the incident position of the high-brilliance monochromatic X-rays to the measurement object.Type: GrantFiled: March 16, 2006Date of Patent: August 3, 2010Assignee: RikenInventors: Akira Saito, Masakazu Aono, Yuji Kuwahara, Jyunpei Maruyama, Ken Manabe
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Patent number: 7745782Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.Type: GrantFiled: February 27, 2008Date of Patent: June 29, 2010Assignee: Hitachi High-Technologies CorporationInventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
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Patent number: 7694346Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.Type: GrantFiled: September 30, 2005Date of Patent: April 6, 2010Assignee: Board of Regents of the Nevada System of Higher Education on behalf of the University of NevadaInventors: Jesse D. Adams, Todd A. Sulchek, Stuart C. Feigin
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Patent number: 7663103Abstract: A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.Type: GrantFiled: March 23, 2007Date of Patent: February 16, 2010Assignee: Advantest Corp.Inventors: Masayuki Kuribara, Jun Matsumoto
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Patent number: 7618465Abstract: The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby enhancing the sensitivity of devices comprising the near-field antenna, for example, spectroscopes, microscopes or read-write heads.Type: GrantFiled: November 19, 2005Date of Patent: November 17, 2009Assignee: Forschungszentrum Julich GmbHInventors: Norbert Klein, Filip Kadlec, Petr Kuźel
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Patent number: 7588605Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.Type: GrantFiled: August 7, 2007Date of Patent: September 15, 2009Assignee: SII NanoTechnology Inc.Inventor: Norio Ookubo
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Patent number: 7566888Abstract: A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal cavity of the workpiece and is used to redirect the charged particle beam toward the interior surface to treat the interior surface.Type: GrantFiled: May 23, 2007Date of Patent: July 28, 2009Assignee: TEL Epion Inc.Inventor: David Richard Swenson