Display Or Data Processing Devices (epo) Patents (Class 850/10)
  • Patent number: 8220067
    Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: July 10, 2012
    Assignee: Board of Regents of the Nevada System of Higher Education
    Inventors: Jesse D. Adams, Todd A. Sulchek, Stuart C. Feigin
  • Patent number: 8212227
    Abstract: An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: July 3, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada, Yasutsugu Usami
  • Patent number: 8209768
    Abstract: A method of manufacturing an SPM probe having a support element, a cantilever, and a scanning tip on an underside of the cantilever, and having a mark located on the top side of the cantilever opposite the scanning tip. The mark on the top side of the cantilever is located exactly opposite the scanning tip on the underside of the cantilever. This makes it possible to identify the exact position of the scanning tip in the scanning probe microscope from the upward-pointing top side of the cantilever, which significantly simplifies the alignment of the SPM probe. The support element with the cantilever may be prefabricated conventionally and the scanning tip and the mark are then produced on the cantilever in a self-aligning way by means of a particle-beam-induced material deposition based on a gas-induced process.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: June 26, 2012
    Assignee: NanoWorld AG
    Inventors: Thomas Sulzbach, Oliver Krause, Mathieu Burri, Manfred Detterbeck, Bernd Irmer, Christian Penzkofer
  • Patent number: 8196218
    Abstract: An exemplary, highly integrated, SPM-based system for measuring the conductivity and/or force of substance under programmable engaging/stretching processes is described. A sample bias is applied across two electrodes. A substance to be measured is sandwiched between them. A first electrode is first brought relative to a second electrode (engaging) in programmable pathways that can be described as stretching distance versus time curves. The process of engaging the electrodes continues until a certain current reached, a certain force reached and whichever case happens first. The electrodes are then separated (stretching) in programmable pathways that can be described as stretching distance versus time curves. A periodic modulation can be applied to the engaging/stretching process to realize different stretch pathways. The sample bias across the electrodes is kept constant or swept in a programmable shape over time, described as a voltage-versus time curve.
    Type: Grant
    Filed: March 30, 2009
    Date of Patent: June 5, 2012
    Assignee: University of Georgia Research Foundation, Inc.
    Inventors: Bingqian Xu, Fan Chen
  • Patent number: 8178836
    Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: May 15, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
  • Patent number: 8074292
    Abstract: The present invention concerns the enhancing of the mass resolution of wide angle tomographic atom probes. The invention consists of an atom probe also comprising a sample-holding device and a detector which are separated from one another by a distance L and enclosed in a chamber, an “Einzel” type electrostatic lens consisting of three electrodes arranged inside the chamber between the sample and the detector, to which electrical potentials are applied so as to form an electrical field that strongly focuses the beam of ions emitted by the sample under test when the probe is operating. According to the invention, the geometry of the electrodes is defined precisely so as to greatly limit the effects of the spherical aberration that affects the “Einzel” lens on the beam of ions, said spherical aberration being clearly sensitive when the lens is greatly polarized. The invention applies more particularly to the atom probes known as 3D atom probes.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: December 6, 2011
    Assignee: Cameca
    Inventors: Alain Bostel, Mikhail Yavor, Ludovic Renaud, Bernard Deconihout
  • Publication number: 20110296561
    Abstract: A control system (32, 75) is for use with a scanning probe microscope of a type in which measurement data is collected at positions within a scan pattern described as a probe and sample are moved relative to each other. The control system is used in conjunction with a position detection system (34) that measures the position of at least one of the probe and sample such that their relative spatial location (x, y) is determined. Measurement data may then be correlated with empirically-determined spatial locations in constructing an image. The use of empirical location data means that image quality is not limited by the ability of a microscope scanning system to control mechanically the relative location of probe and sample.
    Type: Application
    Filed: February 4, 2010
    Publication date: December 1, 2011
    Applicant: INFINITESIMA LTD
    Inventors: Andrew Humphris, David Catto
  • Publication number: 20110138505
    Abstract: An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.
    Type: Application
    Filed: August 10, 2010
    Publication date: June 9, 2011
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Lin Zhou, Huiwen Liu, Dale Egbert, Peter Gunderson, John Ibele, Kah Choong Loo, Cing Siong Ling
  • Patent number: 7958564
    Abstract: A scanning measurement instrument is capable of simultaneously achieving both higher accuracy and higher speed in autonomous scanning measurement. The instrument includes a path information holding unit for holding information about the path of the center position of a tip of a scanning probe at past tip center positions with respect to the current tip center position during autonomous scanning measurement performed with the scanning probe; a path reference direction setting unit for setting an approximate straight line direction of the path as a path reference direction; a traveling direction setting unit for setting the path reference direction as a traveling direction; a movement control unit for controlling a moving unit such that the scanning probe is moved in the traveling direction; and a normal direction setting unit for setting the normal direction of a measurement surface according to the traveling direction.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: June 7, 2011
    Assignee: Mitutoyo Corporation
    Inventors: Takashi Noda, Hiroshi Kamitani, Naoya Kikuchi
  • Patent number: 7877816
    Abstract: Microscope, in particular a scanning probe microscope, comprising a programmable logic device.
    Type: Grant
    Filed: October 23, 2006
    Date of Patent: January 25, 2011
    Assignee: Witec Wissenschaftliche Instrumente und Technologie GmbH
    Inventors: Peter Spizig, Detlef Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
  • Patent number: 7865966
    Abstract: A method of operating a scanning probe microscope (SPM) includes scanning a sample as a probe of the SPM interacts with a sample, and collecting sample surface data in response to the scanning step. The method identifies a feature of the sample from the sample surface data and automatically performs a zoom-in scan of the feature based on the identifying step. The method operates to quickly identify and confirm the location of features of interest, such as nano-asperities, so as to facilitate performing a directed high resolution image of the feature.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: January 4, 2011
    Assignee: Veeco Metrology Inc.
    Inventors: Chanmin Su, Sergey Belikov
  • Publication number: 20100313311
    Abstract: A microscope, in particular a scanning probe microscope, comprising a programmable logic device.
    Type: Application
    Filed: July 14, 2010
    Publication date: December 9, 2010
    Inventors: Peter Spizig, Detief Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
  • Patent number: 7836757
    Abstract: A phase feedback AFM (atomic force microscope) and method for the phase feedback AFM. A cantilever is driven to oscillate at a constant frequency close to the resonance frequency of the cantilever by a driving signal. The distance between the probe and the sample is controlled such that the phase difference between the driving signal and a cantilever deflection signal indicating deflections of the cantilever is kept constant. The phase feedback AFM has an amplifier-controller for receiving the cantilever deflection signal, the output from an oscillator for driving the cantilever into oscillation, and a signal representing a reference amplitude of oscillation of the cantilever. The phase feedback AFM further includes a feedback circuit which receives the output from the amplifier-controller which controls the cantilever deflection signal to a preset amplitude.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: November 23, 2010
    Assignee: JEOL Ltd.
    Inventor: Shinichi Kitamura
  • Patent number: 7834315
    Abstract: A method for sample examination in a dual-beam FIB calculates a first angle as a function of second, third and fourth angles defined by the geometry of the FIB and the tilt of the specimen stage. A fifth angle is calculated as a function of the stated angles, where the fifth angle is the angle between the long axis of an excised sample and the projection of the axis of the probe shaft onto the X-Y plane. The specimen stage is rotated by the calculated fifth angle, followed by attachment to the probe tip and lift-out. The sample may then be positioned perpendicular to the axis of the FIB electron beam for STEM analysis by rotation of the probe shaft through the first angle.
    Type: Grant
    Filed: March 3, 2008
    Date of Patent: November 16, 2010
    Assignee: Omniprobe, Inc.
    Inventors: Lyudmila Zaykova-Feldman, Thomas M. Moore, Gonzalo Amador, Matthew Hammer
  • Patent number: 7770439
    Abstract: A method and apparatus of scanning a sample with a scanning probe microscope including scanning a surface of the sample according to at least one scan parameter to obtain data corresponding to the surface, and substantially automatically identifying a transition in the surface. Based on the identified transition, the sample is re-scanned. Preferably, the resultant data is amended with data obtained by re-scanning the transition.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: August 10, 2010
    Assignee: Veeco Instruments Inc.
    Inventor: Paul L. Mininni
  • Patent number: 7770232
    Abstract: A scanning probe microscope system capable of identifying an element with atomic scale spatial resolution comprises: an X-ray irradiation means for irradiating a measurement object with high-brilliance monochromatic X-rays having a beam diameter smaller than 1 mm; a probe arranged to oppose to the measurement object; a processing means for detecting and processing a tunneling current through the probe; and a scanning probe microscope having an alignment means for relatively moving the measurement object, the probe, and the incident position of the high-brilliance monochromatic X-rays to the measurement object.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: August 3, 2010
    Assignee: Riken
    Inventors: Akira Saito, Masakazu Aono, Yuji Kuwahara, Jyunpei Maruyama, Ken Manabe
  • Patent number: 7745782
    Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
    Type: Grant
    Filed: February 27, 2008
    Date of Patent: June 29, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
  • Patent number: 7694346
    Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: April 6, 2010
    Assignee: Board of Regents of the Nevada System of Higher Education on behalf of the University of Nevada
    Inventors: Jesse D. Adams, Todd A. Sulchek, Stuart C. Feigin
  • Patent number: 7663103
    Abstract: A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: February 16, 2010
    Assignee: Advantest Corp.
    Inventors: Masayuki Kuribara, Jun Matsumoto
  • Patent number: 7618465
    Abstract: The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby enhancing the sensitivity of devices comprising the near-field antenna, for example, spectroscopes, microscopes or read-write heads.
    Type: Grant
    Filed: November 19, 2005
    Date of Patent: November 17, 2009
    Assignee: Forschungszentrum Julich GmbH
    Inventors: Norbert Klein, Filip Kadlec, Petr Kuźel
  • Patent number: 7588605
    Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.
    Type: Grant
    Filed: August 7, 2007
    Date of Patent: September 15, 2009
    Assignee: SII NanoTechnology Inc.
    Inventor: Norio Ookubo
  • Patent number: 7566888
    Abstract: A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal cavity of the workpiece and is used to redirect the charged particle beam toward the interior surface to treat the interior surface.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: July 28, 2009
    Assignee: TEL Epion Inc.
    Inventor: David Richard Swenson