Submerged Inlet For Subsurface Contact Patents (Class 96/351)
  • Patent number: 6270559
    Abstract: The upper cylinder with several holes perforated in the base is inserted and bolted to the lower cylinder with several holes perforated in the upper part of the wall of the larger cylinder. A circular damper plate is placed on top of the upper cylinder to prevent splashing of the water. A holding plate accommodating the two cylinders is placed into the heating and air conditioning system, in the spot where the conventional mesh filters are usually placed. Then water and paraffin is poured into the cylinders. The incoming air flows through the water and paraffin bath and traps all dust, dust mites, pollutants, bacteria and particulate matter. A water reservoir maintains the correct water level in the cylinders, by connecting an air pipe as a sensor and a water pipe as a water supply.
    Type: Grant
    Filed: December 15, 1998
    Date of Patent: August 7, 2001
    Inventor: Khossrow Daneshfar
  • Patent number: 6238468
    Abstract: Provided is a quench vessel having a cooling structure in which a combustion gas is forced down and through a cooling liquid a plurality of times.
    Type: Grant
    Filed: March 8, 1999
    Date of Patent: May 29, 2001
    Assignee: Kvaerner Pulping AB
    Inventor: Bengt Nilsson
  • Patent number: 6224656
    Abstract: A cleaner for both dry and wet use capable of sucking not only a solid but also a semisolid and liquid.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: May 1, 2001
    Assignee: Sankyo Rayjac Co., Ltd.
    Inventor: Eiichi Kawamoto
  • Patent number: 6174350
    Abstract: A vacuum cleaner assembly (10) includes a main housing (12) having an inlet (14) and an outlet (16). A motor (17a) is disposed within the main housing (12) for providing motive force to a cooling fan (17b), a blower (17c), and a separator (22). The separator (22) circulates the air and water bath (20) within a water bath pan (36) and provides, in combination with the water bath (20), a primary filter for filtering the air. A second filter assembly (24) is also provided preferably including a high efficiency filter (100 or 100a), or HEPA rated filter, for filtering microscopic dust and dirt particles that escape the separator (22) and water bath (20) and is disposed after both the water bath (20) and the separator (22) for additional filtering of the air. Alternatively, it may be a non-HEPA rated filter (101).
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: January 16, 2001
    Assignee: Rexair, Inc.
    Inventors: Dean Rohn, Steven Ray Selewski, William R. Daws
  • Patent number: 6136204
    Abstract: An automatic control apparatus for effecting the continuous removal of contaminants, such as volatile organic compounds (VOCs) from a process fluid, such as water used to wash print towels or the like. The apparatus includes a pump for circulating wash water from a washer to a treatment tank. A diffuser is provided for air stripping the contaminants from the wash water in the tank. The diffused gas is exhausted through a vent in the tank, and a contaminant emissions concentration sensor detects the composition of VOCs in the exhaust. A controller signals the pump to vary the circulation based on the emissions concentration detected by the sensor. The wash water is continuously recirculated to the washer until a predetermined emissions concentration is reached. A drain in the tank releases the treated wash water to the environment.
    Type: Grant
    Filed: October 21, 1998
    Date of Patent: October 24, 2000
    Assignee: Aramark Uniform and Career Apparel, Inc.
    Inventor: Phillip P. Krejci
  • Patent number: 6132493
    Abstract: An air washer includes an upwardly-open vessel for holding an air washing liquid. An air inlet opening into the upwardly open vessel introduces air to be washed below the upper level of the air washing liquid, and a chamber above the upper level of air washing liquid has inner and outer walls. A fan spaced from the upper level of air washing liquid is positioned within the outer wall of the chamber. The fan pulls an air flow through the inner wall of the chamber and exhausts it to an exhaust path downstream of the fan. Operation of the fan induces air to pass through the inlet and to be washed by the air washing liquid in the vessel and to pass through the chamber to the fan and then to be exhausted through the exhaust path. Air washing liquid entrained as liquid droplets in the cleaned air is propelled outwardly by the fan and centrifugally removed from the cleaned air.
    Type: Grant
    Filed: August 5, 1998
    Date of Patent: October 17, 2000
    Inventor: C. Daniel Church
  • Patent number: 6019826
    Abstract: A vacuum cleaner having a suction path at least partially submerged in a container of water is subdivided into two parts. An upper part supports a suction motor assembly, and a lower part includes a container of water engaged perimetrically by hooking means to the upper part, and a tubular jacket inside the container partially immersed in the water, so that an annular interspace is formed between respective side facing walls. The interspace forms a siphon to allow suction motor means to draw air and/or liquid from the outside. Also included is a perforated separating diaphragm submerged in the water, and a first removable funnel shaped deflector means placed in an almost suspended position inside the tubular jacket above the water level.
    Type: Grant
    Filed: September 9, 1997
    Date of Patent: February 1, 2000
    Assignee: W.S. S.P.A.
    Inventor: Silvano Pietrobon
  • Patent number: 6004379
    Abstract: A scrubbing tower and high pressure settler assembly, and the process for using same to remove particulates from a hot partial oxidation gas stream is disclosed. The scrubbing tower and high pressure settler assembly has a dip tube, a bottom portion, a top portion, and a high pressure settler. The dip tube transports partial oxidation gas from an injection point on the exterior of the scrubbing tower into a volume of water contained in the bottom portion of the scrubbing tower. A blowdown port capable of removing particulate matter is connected to the bottom portion of the assembly. A series of trays is provided in the top portion of the scrubbing tower. The top portion of the scrubbing tower also has inlet ports for receiving water and an outlet port for releasing the scrubbed partial oxidation gas. The use of the high pressure settler facilitates higher particulate settling rates as well as higher scrubbing efficiencies.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: December 21, 1999
    Assignee: Texaco Inc.
    Inventors: Paul S. Wallace, M. Kay Anderson, DeLome D. Fair
  • Patent number: 6001155
    Abstract: A polyphasic pressurized homogenizer for removing substances, particularly contaminants from a gas environment, the homogenizer having a pressurized gas stream drawing gas from the gas environment and a pressurized liquid stream from a liquid source with the homogenizer having a mixing chamber for mixing the gas stream and liquid stream and a contact conduit with a venturi passage connected to the mixing chamber for homogenizing the gas and liquid mixture with the contact conduit discharging the homogenized mixture into a receiver where the substance originally in the gas is entrained in the liquid and separated from the gas.
    Type: Grant
    Filed: March 17, 1997
    Date of Patent: December 14, 1999
    Inventor: John R. Pease
  • Patent number: 5938821
    Abstract: A method of separating tritium oxide from a gas stream containing tritium oxide. The gas stream containing tritium oxide is fed into a container of water having a head space above the water. Bubbling the gas stream containing tritium oxide through the container of water and removing gas from the container head space above the water. Thereafter, the gas from the head space is dried to remove water vapor from the gas, and the water vapor is recycled to the container of water.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: August 17, 1999
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Keith Rule, Geoff Gettelfinger, Paul Kivler
  • Patent number: 5908491
    Abstract: An air cleaner for efficiently providing clean air for a structure is comprised of a housing having an intake port and an exhaust port. At least one air chamber having a liquid reservoir at its base is disposed within the housing. A fan draws air through the intake port and the air passes in turn through each liquid reservoir and then its air chamber and discharges the air through the exhaust port. A switch controls the fan and is turned off whenever the liquid level within the device is improper with the device having a flush valve for discharging exhaust liquid and a liquid fill valve for introduction of liquid.
    Type: Grant
    Filed: December 8, 1997
    Date of Patent: June 1, 1999
    Inventor: Roy Hobbs
  • Patent number: 5888277
    Abstract: Smoky gas in conduit or closed space is disinfected by a box body, a blower which is arranged within said box body, an input openings and two output opening which can be switched alternately, a feedback pipe connected to the input opening, a vaporization device and a water collection tank connected to above two output opening, respectively, wherein the vaporization device is extended outside the box body with a circulation pipe and the water collection tank extended outside the box body with a gas outlet pipe; during its operation, feedback pipe and circulation pipe are connected to distal end of conduit or closed space, the disinfecting gas generated by vaporization device is sent to conduit or closed space with the help of blower; after finishing disinfecting work, the gas in feedback pipe is filtered by water collection tank and the purified gas is discharged to atmosphere.
    Type: Grant
    Filed: September 9, 1997
    Date of Patent: March 30, 1999
    Assignee: Lacidem International Co., Ltd.
    Inventor: Chien-Hung Lin
  • Patent number: 5882378
    Abstract: A process to detect metal impurities in a gas or gas mixture including the steps of directing the gas or gas mixture through non-metallic pipings to a sampling device and sampling the gas or gas mixture for metal impurities detection, wherein the sampling device is close to an inlet and/or outlet of a machine employing the gas or gas mixture as a processing gas, the machine being surrounded by a booth containing a gaseous atmosphere which is continuously circulated in the booth, partially renewing said atmosphere continuously, and exhausting excess atmosphere.
    Type: Grant
    Filed: July 25, 1997
    Date of Patent: March 16, 1999
    Assignee: L'Air Liquide Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude
    Inventors: Kohei Tarutani, Itsuko Suzuki
  • Patent number: 5820657
    Abstract: Method and Apparatus for Percolating Vacuum Cleaning wherein driven by vacuum incoming to the apparatus mixture of air and other substances is directed under the top surface of a liquid, where heavier than air particles remain, but cleaned air particles percolate up to the sucking entrance of the vacuum initiator and then are exhausted from the apparatus.
    Type: Grant
    Filed: February 17, 1998
    Date of Patent: October 13, 1998
    Inventors: Benjamin Driker, Mikhail Rukhlis
  • Patent number: 4299911
    Abstract: A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, .gamma.-rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.
    Type: Grant
    Filed: August 9, 1978
    Date of Patent: November 10, 1981
    Assignee: Somar Manufacturing Co., Ltd.
    Inventors: Hideo Ochi, Yumi Shibata, Kohtaro Nagasawa
  • Patent number: 4201580
    Abstract: Fabrication of fine dimensioned circuits, e.g., VLSI includes at least one lithographic step dependent upon members of a particular category of polymer resists. Such resists, generally negative acting, are characterized by high contrast due to unusually narrow molecular weight distribution of the polymer molecules. This distribution is in turn dependent upon choice of a base polymer which is itself characterized by narrow molecular weight distribution due to "living polymerization" (solution anionic, polymerization). Functionalization of such base polymer is designedly such as to retain narrow distribution. Chlorinated polystyrene is exemplary of the resist category.
    Type: Grant
    Filed: July 24, 1978
    Date of Patent: May 6, 1980
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventor: Eugene D. Feit
  • Patent number: 4197125
    Abstract: A support convenient for preparing a printing plate in situ using a liquid photosensitive resin of an unsaturated polyurethane resin is disclosed. This support consists of a base plate and coated thereon a layer of a composition consisting of a mercapto-containing ester obtained by polycondensing a thiocarboxylic acid or thioalcohol with a polyglycol or polycarboxylic acid or an aromatic tertiary amine and a polymer binder. The support of this invention, which has a broadened base of a sectionally trapezoidal configuration, provides a relief image that is firmly adhered to the support.
    Type: Grant
    Filed: December 28, 1977
    Date of Patent: April 8, 1980
    Assignee: Teijin Limited
    Inventors: Kazumi Ohkawa, Akihiro Horike, Teruo Takahashi, Tadashi Shingu
  • Patent number: 4169732
    Abstract: A photosensitive coating composition comprising reaction products of a monoethylenically unsaturated carboxylic acid and two different epoxy polymers; a polyethylenically unsaturated compound; and photoinitiator; and method of employing the same.
    Type: Grant
    Filed: January 9, 1978
    Date of Patent: October 2, 1979
    Assignee: International Business Machines Corporation
    Inventor: John F. Shipley
  • Patent number: 4169731
    Abstract: A very simple and easy method for preparing dry planographic printing plates having a high printing performance and durability in the absence of dampening water is proposed. The method comprises the steps of (a) coating one surface of substrate which is transparent to ultraviolet light with an uncured photocurable silicone, (b) bringing the thus coated surface into direct contact with a surface of a base plate to form a laminate, (c) providing on the other surface of the substrate an image pattern made of a material which is opaque to ultraviolet light, (d) irradiating the laminate with ultraviolet light from above the image pattern and (e) separating the substrate from the base plate to allow a portion of the photocured silicone coating to transfer to the surface of the base plate, and a portion of the uncured silicone coating to stay in situ on the surface of the substrate.
    Type: Grant
    Filed: January 11, 1978
    Date of Patent: October 2, 1979
    Assignees: Dai Nippon Printing Co. Ltd, Shin-Etsu Chemical Co. Ltd.
    Inventors: Atsumi Noshiro, Hiroyuki Obata, Minoru Takamizawa, Yoshio Inoue
  • Patent number: 4168982
    Abstract: Thermally stable photopolymerizable compositions comprise(i) at least one nongaseous ethylenically unsaturated compound,(ii) a nitroso dimer which is a noninhibitor of free-radical polymerization but thermally dissociates to nitroso monomer which is an inhibitor of free-radical polymerization, and(iii) an organic, radiation-sensitive free-radical generating system.
    Type: Grant
    Filed: December 7, 1977
    Date of Patent: September 25, 1979
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Jose F. Pazos
  • Patent number: 4167415
    Abstract: A photocurable composition comprising a copolymer of maleic acid monoester with .alpha.-olefine compound, a polymerizable ethylenically unsaturated compound having a number average molecular weight of less than 3,000 and a boiling point of more than 100.degree. C. at a normal pressure, and a photosensitizer.
    Type: Grant
    Filed: December 8, 1977
    Date of Patent: September 11, 1979
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Tetsuo Higuchi, Hiroyuki Nakayama
  • Patent number: 4165395
    Abstract: A high aspect ratio structure (with a large height-to-linewidth ratio) is formed on a substrate by means of two resist layers with different kinds of radiation to which they are sensitive, respectively, with an actinic radiation sensitive resist below and an electron sensitive resist above. In addition, a metallic film is shaped by means of exposure of the upper layer of resist to form a metallic mask through which the lower layer of resist is exposed. Exposure may be performed by a "subtractive" technique or an "additive" technique. In the case of the subtractive technique, the substrate is coated by a first actinic resist above which are deposited first a metallic film and then a top layer of electron resist. The top resist layer is exposed and developed and the metal layer is etched so the lower resist can be exposed and developed with the pattern formed in the metal, with the pattern shape originally exposed in the top layer of resist extending down to the substrate.
    Type: Grant
    Filed: June 30, 1977
    Date of Patent: August 21, 1979
    Assignee: International Business Machines Corporation
    Inventor: Tai Hon P. Chang
  • Patent number: 4164422
    Abstract: Letterpress and offset photopolymer printing plates are disclosed having relatively thin water developable photopolymer layers, which, after being developed, have ink-repulsive, non-image areas. Adhesive layers are provided in the disclosed printing plates that are interposed between an ink-repulsive coating contained in the printing plate substrate and the water-developable photopolymer, and provide a balance between satisfactory adhesive and ink-repulsive properties in the resulting plate.
    Type: Grant
    Filed: September 19, 1977
    Date of Patent: August 14, 1979
    Assignee: Napp Systems (USA), Inc.
    Inventors: Sakuo Okai, Koichi Kimoto
  • Patent number: 4162919
    Abstract: Laminates for the manufacture of flexographic printing plates and containing (a) a layer consisting essentially of a photocrosslinkable mixture of a two-block copolymer of from 30 to 95% w/w of a diene hydrocarbon and from 5 to 70% w/w of a styrene monomer or a partially hydrogenated product thereof with a compatible monomer having at least one C--C double bond, said mixture containing a photo-initiator, (b) a non-photocrosslinkable elastomeric underlayer having a Shore A hardness of from 15 to 70 and (c) a non-photocrosslinkable stablizing layer preferably between layers (a) and (b).
    Type: Grant
    Filed: November 16, 1977
    Date of Patent: July 31, 1979
    Assignee: BASF Aktiengesellschaft
    Inventors: Peter Richter, August Wigger, Gerhard Fahrbach, Erhard Seiler, Helmut Barzynski
  • Patent number: 4162162
    Abstract: This invention relates to new photopolymerizable compositions. More particularly, this invention pertains to photopolymerizable compositions containing photodissociable initiators in combination with selected sensitizers derived from aryl ketones and p-dialkylaminoarylaldehydes that absorb in the visible region of the spectrum.
    Type: Grant
    Filed: May 8, 1978
    Date of Patent: July 24, 1979
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Thomas E. Dueber
  • Patent number: 4162274
    Abstract: A crosslinkable, especially photopolymerizable urethane resin soluble in organic solvent, suitable as starting materials for photoresist lacquers and for the production of photopolymer printing plates comprising a reaction product of a polyepoxide having more than one 1,2-epoxide group per molecule with acrylic and/or methacrylic acid so that from 60 to 100 mole % of the 1,2-epoxide groups are converted into .beta.-hydroxy acrylic or methacrylic ester groups; 30 to 90 mole % of said .beta.-hydroxy ester groups having been reacted with an isocyanate and subsequently 10 to 70 mole % of said .beta.-hydroxy ester groups having been converted into acid semiester groups with a cyclic dicarboxylic acid anhydride.
    Type: Grant
    Filed: December 10, 1976
    Date of Patent: July 24, 1979
    Assignee: Bayer Aktiengesellschaft
    Inventor: Hans J. Rosenkranz
  • Patent number: 4161405
    Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group VIa elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.
    Type: Grant
    Filed: August 5, 1977
    Date of Patent: July 17, 1979
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4159202
    Abstract: This invention relates to a photo-cross-linkable polymer containing units each having a 2-pyridone side group. The invention also relates to a photosensitive copying material including the novel photo-cross-linkable polymer.
    Type: Grant
    Filed: May 26, 1977
    Date of Patent: June 26, 1979
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Harald Furrer, Hartmut Steppan, Gerhard Lohaus
  • Patent number: 4158566
    Abstract: The addition of N-methylol acrylamide as an accelerator to casein-based aqueous photoresist compositions reduces the baking temperature required to render the developed resist etch resistant.
    Type: Grant
    Filed: February 13, 1978
    Date of Patent: June 19, 1979
    Assignee: RCA Corporation
    Inventor: Abraham Goldman
  • Patent number: 4157261
    Abstract: In an image forming process which comprises image-wise exposing to light a laminate composed of a substrate, a photosensitive composition layer and a transparent support, superposed in that order, through the support, removing either the exposed portion or the unexposed portion of the photosensitive composition layer together with the support while adhered thereto, peeling off the support to leave the other of the exposed portion or the unexposed portion of the photosensitive composition layer on the substrate, the improvement where the photosensitive composition comprises:(1) a reaction product prepared by the esterification of: (a) at least one of acrylic acid and methacrylic acid, (b) at least one polybasic acid and (c) at least one polyhydric alcohol;(2) a photo-polymerization initiator; and(3) a binder.
    Type: Grant
    Filed: September 20, 1977
    Date of Patent: June 5, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Keiji Takeda
  • Patent number: 4156745
    Abstract: A high speed high contrast electron resist composition comprising a copolymer of polymethylmethacrylate/methacrylic acid having incorporated therein a metal selected from the group consisting of lead, barium, calcium and strontium is disclosed. The metal is present in the range of from about 0.001% to about 10% by weight of the copolymer.
    Type: Grant
    Filed: April 3, 1978
    Date of Patent: May 29, 1979
    Assignee: International Business Machines Corporation
    Inventors: Michael Hatzakis, David J. Webb
  • Patent number: 4156389
    Abstract: Relieved pattern of a resin original pattern plate, which does not exhibit fluidity at transferring temperature and possesses elastic modulus no smaller than 10 kg/cm.sup.2, preferably no smaller than 100 kg/cm.sup.2, is transferred onto thermoplastic resin material having fluidity at the transferring temperature (ASTM D1238, load 21.6 kg) of at least 0.01 dg/min, preferably at least 0.1 dg/min, by pressing the thermoplastic resin material to the original pattern plate under a pressure condition where elastic deformation of the original pattern plate is kept within 10%. The resin original pattern plate is prepared by controlling the photopolymerizable resin composition to adjust its cross-linkability and then photo-polymerizing, whereby the resulting resin original pattern plate possesses an elastic modulus of 10 kg/cm.sup.2 or higher at transferring temperature.
    Type: Grant
    Filed: May 3, 1976
    Date of Patent: May 29, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura
  • Patent number: 4156612
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: November 25, 1977
    Date of Patent: May 29, 1979
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4153741
    Abstract: This invention pertains to an electron beam resist method for forming a surface relief pattern in a poly(olefin sulfone) layer wherein the polymer layer is useful as a sputter etch mask for transferring the surface relief pattern into a metal layer. The surface relief pattern is formed using poly(3-methyl-1-cyclopentene sulfone) as the poly(olefin sulfone) layer and using a mixture of 2-methylcyclohexanone and 2-methylcyclohexanol or a mixture of benzene and 2-methylcyclohexanol as the developer for the poly(3-methyl-1-cyclopentene sulfone) layer.
    Type: Grant
    Filed: July 30, 1976
    Date of Patent: May 8, 1979
    Assignee: RCA Corporation
    Inventors: Eugene S. Poliniak, Nitin V. Desai
  • Patent number: 4152159
    Abstract: A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath.
    Type: Grant
    Filed: April 3, 1978
    Date of Patent: May 1, 1979
    Assignee: Eastman Kodak Company
    Inventors: Robert C. Daly, Ronald H. Engebrecht
  • Patent number: 4150988
    Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic amines, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group Va elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.
    Type: Grant
    Filed: September 30, 1977
    Date of Patent: April 24, 1979
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4150989
    Abstract: Photosensitive polyaldehydes are provided which have the formula: ##STR1## wherein R is a photosensitive end group selected from ##STR2## R.sup.1 is H or n-alkyl of 1-5 carbon atoms, preferably H, R.sup.2 is (a) n-alkanoyl of 1-4 carbon atoms or (b) n-alkanoyl of 1-4 carbon atoms or ##STR3## when R.sup.1 is H, and N IS A POSITIVE INTEGER OF ABOUT 10-4000.The polyaldehydes are prepared by the anionic polymerization of the appropriate aldehyde with an initiating amount of an alkali metal or tetraalkylammonium alkoxide of RO in the above formula.The polyaldehydes are useful in articles and methods of relief imaging and in lithographic plates.
    Type: Grant
    Filed: October 6, 1977
    Date of Patent: April 24, 1979
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: William J. Chambers, Robert P. Foss
  • Patent number: 4150398
    Abstract: In optically producing a reproducible recording of video or other signals, the intensity of at least one laser light beam is modulated by the signals to be recorded while such light beam scans a substantially flat surface on a photo-sensitive recording medium which is photo-reacted to a degree varying substantially linearly in correspondence with the intensity of the light impinging thereon over a predetermined range of light intensities, and the intensity of the light beam and the degree of modulation thereof by the signals are selected to maintain the maximum and minimum intensities of the modulated light beam within such predetermined range so as to form simultaneously on the record medium a tracking path portion and a recorded signal portion which is unified with the latter.
    Type: Grant
    Filed: January 12, 1976
    Date of Patent: April 17, 1979
    Assignee: Sony Corporation
    Inventors: Chiaki Kojima, Hiroshi Ohki, Yuzuru Yanagisawa
  • Patent number: 4148654
    Abstract: Rosinous material is added to photoresist compositions to improve flexiblity, rheology and other physical properties. The rosinous material may be a rosin or a hydrogenated, esterified or neutralized derivative of a rosin. Particular advantages are achieved when the photoresists also contain a polyvinyl alkyl ether.
    Type: Grant
    Filed: July 22, 1976
    Date of Patent: April 10, 1979
    Inventor: Michael J. Oddi
  • Patent number: 4148658
    Abstract: A photopolymerizable composition comprising, as essential components, (A) at least one compound having one or more addition polymerizable ethylenically unsaturated double bonds and (B) a photopolymerization initiator composition comprising (i) a combination of at least one compound (a) and at least one compound (b), (ii) a combination of at least one compound (a) and at least one compound (c) or (iii) a combination of at least one compound (a), at least one compound (b) and at least one compound (c);Wherein compound (a) is a benzoylmethylenebenzothiazolylidenethiazolidone compound selected from the group consisting of 2-benzoylmethylene-5-benzothiazolylidenethiazolidin-4-one and the substituted derivatives thereof represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and X are as defined in the specification; COMPOUND (B) IS A TERTIARY OR POLYAMINE COMPOUND SELECTED FROM THE GROUP CONSISTING OF TERTIARY AMINES REPRESENTED BY THE FOLLOWING GENERAL FORMULA (II): ##STR2## wherein R.
    Type: Grant
    Filed: November 29, 1977
    Date of Patent: April 10, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondoh, Akihiro Matsufuji, Akira Umehara, Akira Sato, Akira Ogawa
  • Patent number: 4148934
    Abstract: This invention is directed to an apparatus and method for secondary curing of a selectively photocured liquid polymer polymeric printing plate by mechanically stripping the selectively photocured printing plate to remove at least substantially all of the uncured liquid composition and placing the stripped printing plate under an inert liquid, in particular water, and exposing it to actinic light.
    Type: Grant
    Filed: December 2, 1977
    Date of Patent: April 10, 1979
    Assignee: W. R. Grace Ltd.
    Inventor: Noel J. Baker
  • Patent number: 4147549
    Abstract: A lithographic printing plate is prepared from a layer of a photopolymerizable composition comprising an oleophilic macromolecular organic binder and a leachable hydrophilic ethylenically unsaturated compound by e posing the layer and then leaching the compound from the unexposed areas by treating with a suitable developing solvent, preferably water, producing an oleophilic surface. A similar plate may be prepared from a composition containing a hydrophilic binder and oleophilic leachable compound by imagewise exposure and solvent leaching producing an oleophilic surface in exposed areas and a hydrophilic surface in unexposed areas.
    Type: Grant
    Filed: June 22, 1977
    Date of Patent: April 3, 1979
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Robert P. Held
  • Patent number: 4147552
    Abstract: 3-Substituted coumarins are efficient sensitizers for light-sensitive unsaturated materials such as unsaturated vesiculators which release a gas upon exposure to radiation, unsaturated monomers and photocrosslinkable unsaturated polymers, and azides such as photocrosslinkable polymeric azides used in photomechanical resists and lithographic plates. Water soluble derivatives can be used for aqueous coatable or aqueous processable systems.
    Type: Grant
    Filed: February 17, 1977
    Date of Patent: April 3, 1979
    Assignee: Eastman Kodak Company
    Inventors: Donald P. Specht, Samir Y. Farid
  • Patent number: 4145216
    Abstract: A dry system for forming and transferring images is provided. The system comprises a photoactive component comprising a tacky photohardenable layer on a selected carrier sheet and a transfer component comprising a frangible color layer on a selected carrier sheet. The two components are disposed with their photohardenable and color layers in air-free contact with one another and then subjected to irradiation with actinic radiation in accordance with a selected image pattern so as to cause selected portions of the photohardenable layer to harden and fuse to confronting portions of the color layer. Then the two components are separated whereby the fused portions of the color layer are separated from its carrier sheet and transferred to the photoactive component. Thereafter the color layer remaining on the transferable component is coated with a pressure-sensitive adhesive.
    Type: Grant
    Filed: September 30, 1977
    Date of Patent: March 20, 1979
    Assignee: Seal Incorporated
    Inventors: Richard E. Merrill, Theodore H. Krueger
  • Patent number: 4144073
    Abstract: Photopolymerizable compositions for the manufacture of relief printing plates, especially relief plates for making mats, comprising an alcohol-soluble linear polyamide, a photoinitiator and a mixture of (a) a diether or triether obtained from 1 mole of an aliphatic diol or triol and from 2 to 3 moles of N-hydroxymethylacrylamide or N-hydroxymethylmethacrylamide and (b) an unsaturated ester-urethane obtained from 1 mole of toluylene diisocyanate and 2 moles of a hydroxyalkyl acrylate or methacrylate, (a) and (b) being mixed in specific ratios.
    Type: Grant
    Filed: October 6, 1977
    Date of Patent: March 13, 1979
    Assignee: BASF Aktiengesellschaft
    Inventors: Bernd Bronstert, Werner Lenz, Heinrich Hartmann, Heinz-Ulrich Werther, Manfred Zuerger
  • Patent number: 4144066
    Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by injecting stain-producing ions, preferably silver and/or copper ions, into a glass substrate from a film by electron bombardment, which also serves to reduce the injected ions to their elemental state and to agglomerate the atoms to colloidal coloration centers. The stained areas of the glass are patterned by carrying out the electron bombardment through a developed photoresist, or by using a focused electron beam moving along a controlled locus.
    Type: Grant
    Filed: November 30, 1977
    Date of Patent: March 13, 1979
    Assignee: PPG Industries, Inc.
    Inventor: Fred M. Ernsberger
  • Patent number: 4143189
    Abstract: A method for applying a liquid photo polymer to a surface such that the photo polymer is uniform and holiday-free, the method comprising obtaining a plastic sponge and impregnating the plastic sponge with a liquid photo polymer comprising a solvent which slowly reacts with the plastic from which the sponge is formed. Thereafter, the sponge is brushed and/or drawn across the surface to deposit the photo polymer thereon, the application of the photo polymer being accomplished before the solvent in the photo polymer substantially disintegrates the sponge.
    Type: Grant
    Filed: May 8, 1974
    Date of Patent: March 6, 1979
    Inventors: Jack L. Woods, Craig P. Woods
  • Patent number: 4141733
    Abstract: Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising methyltriethanol ammonium hydroxide. The developing composition provides the advantage that it is free of metal ions and, accordingly, does not contaminate the surface of the image. It is additionally advantageous in that it provides extended development latitude, increased exposure latitude, improved resist contrast, improved prebake latitude, a low depletion rate and minimal loss of image layer thickness.
    Type: Grant
    Filed: October 25, 1977
    Date of Patent: February 27, 1979
    Assignee: Eastman Kodak Company
    Inventor: John R. Guild
  • Patent number: 4141736
    Abstract: A photosensitive composite sheet material comprising (i) a dimensionally stable substrate, (ii) a water-insoluble coating thereon of a poly-2,5-oxolane homopolymer or copolymer, the copolymer containing repeating units formed from epoxidized dienes and/or anionically polymerizable olefins, and (iii) a layer of photopolymerizable composition on the water-insoluble coating.
    Type: Grant
    Filed: December 5, 1977
    Date of Patent: February 27, 1979
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: George Canty
  • Patent number: 4141731
    Abstract: A video disc master of glass, having a metal surface with microscopic apertures therein representing information, is coated with a photosensitive resist. The resist is uniformly exposed through the glass disc. The unexposed resist is removed. The resulting disc having surface irregularities can be used in a first process to produce "stampers" for embossing replicas and, in a second process, to produce a mold for casting replicas.
    Type: Grant
    Filed: January 2, 1976
    Date of Patent: February 27, 1979
    Assignee: MCA Disco-Vision, Inc.
    Inventor: Manfred H. Jarsen