Submerged Inlet For Subsurface Contact Patents (Class 96/351)
  • Patent number: 4046071
    Abstract: A printing plate comprising a support, reliefs formed thereon as an image area, and from about 20 to about 4,000/cm.sup.2 small projections thereon in non-image areas, the height of the reliefs being at least 0.05 mm larger than that of the small projections, and a method for making a printing plate which comprises:A. superimposing a photosensitive resin layer having a thickness of at least 0.06 mm on a support, which is at least semi-transparent to actinic light, in intimate contact therewith;B. exposing the resulting assembly to actinic light through an image-bearing transparency from the side of the photosensitive resin layer;C. exposing the assembly to actinic light through a dot-image-bearing transparency having a transparent halftone dot area in a proportion of 1 to 40% from the side of the support to thereby form reliefs on the support, as image areas, and a number of small projections having a height of at least 0.
    Type: Grant
    Filed: September 26, 1975
    Date of Patent: September 6, 1977
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Masayoshi Mizuno, Tadashi Kawamoto, Kiichi Iida
  • Patent number: 4046577
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: July 12, 1976
    Date of Patent: September 6, 1977
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4045317
    Abstract: The invention disclosed is directed to new curable liquid polyene-polythiol compounds containing particular polar groups, at least one unsaturated carbon-to-carbon bond disposed at a terminal position on a main or pendant chain of the molecule and at least one terminally disposed thiol group, with the sum of the unsaturated bonds and thiol groups per polyene-polythiol molecule being at least 3. Upon curing in the presence of a free radical generator such as actinic radiation, the polar polyene-polythiol compounds form solid elastomeric and rigid products which are useful in a variety of applications including coatings, adhesives, sealants and molded articles.
    Type: Grant
    Filed: June 11, 1976
    Date of Patent: August 30, 1977
    Assignee: W. R. Grace & Co.
    Inventor: Donald W. Larsen
  • Patent number: 4045223
    Abstract: The invention provides a method for the preparation of solvent soluble, highly heat-resistant layered structures, using radiation-sensitive, soluble, preliminary polymers. According to the invention, soluble preliminary polymers are used which are prepared in a hexamethyl phosphoric acid triamide solution and which comprise polycondensation products of primary diamines with bicyclo[2.2.2.]octene-7-tetra carboxylic acid-2,3,5,6-diester-bis-acid chlorides wherein the ester groups are in the orthoposition with respect to the acid chloride groups and contain radiation-reactive radicals. Optionally di-ortho-tetracarboxylic acid-diester-bis-acid chlorides and/or di-ortho-tetracarboxylic acid-bis-anhydrides, carrying radiation-reactive ester radicals, can also be used in addition to the bicyclo[2.2.2.]octene-7-tetra carboxylic acid-2,3,5,6-diester-bis-acid chlorides.
    Type: Grant
    Filed: July 24, 1975
    Date of Patent: August 30, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Roland Rubner, Wolfgang Kleeberg, Eberhard Kuhn
  • Patent number: 4045318
    Abstract: This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.
    Type: Grant
    Filed: July 30, 1976
    Date of Patent: August 30, 1977
    Assignee: RCA Corporation
    Inventors: Richard Joseph Himics, Nitin Vithalbhai Desai, Eugene Samuel Poliniak
  • Patent number: 4045231
    Abstract: A photosensitive resin composition for flexographic printing plates comprising styrene-butadiene block copolymer containing 35 - 50% by weight of styrene, at least one liquid prepolymer having a molecular weight of 1,000 - 5,000 selected from the group consisting of polybutadiene and butadiene-styrene copolymer, at least one photopolymerizable monomer containing at least one vinyl group, such as tetraethyleneglycol diacrylate, a photopolymerization initiator such as benzophenone, and a thermopolymerization inhibitor optionally added. This photosensitive resin composition affords relief images suitable for use in flexographic printing.
    Type: Grant
    Filed: February 18, 1976
    Date of Patent: August 30, 1977
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Hiroyuki Toda, Eiichi Otomegawa, Toshimi Aoyama, Hisashi Nakane
  • Patent number: 4043819
    Abstract: Photopolymerizable material for the preparation of stable polymeric images, is provided which is characterized in that it contains, on a carrier, at least one layer composed of1. ethylenically unsaturated monomers which are soluble in water or water-alcohol mixtures and which contain one or more terminal double bonds and at least one polar atom grouping with a lone electron pair,2. a photoinitiator which forms together with an electron donor a photo-redox pair, especially a diazine compound which forms a photo-redox pair with the ethylenically unsaturated monomer (1) or the binder (3a), or with both of them,3. as a matrix for the monomer (1), a swellable reaction product of at least oneA. macromolecular binder which is soluble in water or water-alcohol mixtures and which has at least one polar atom grouping containing a lone electron pair, withB. a hardener, the hardener being different from the monomers of the component (1), and optionally4.
    Type: Grant
    Filed: November 18, 1976
    Date of Patent: August 23, 1977
    Assignee: Ciba-Geigy AG
    Inventor: Niklaus Baumann
  • Patent number: 4042386
    Abstract: A photopolymerizable composition and photosensitive elements produced therefrom are disclosed which include a monomer component, a polymer component and a polymerization initiator activatable by actinic light. The monomer component includes at least one water soluble monofunctional unsaturated ethylenic monomer, and at least one polyfunctional unsaturated ethylenic monomer. The polymer component includes a partially saponified, water-soluble, polyvinyl acetate which is compatible with said monomer components. The ratio, by weight, of polyfunctional monomer to monofunctional monomer is in the range of about 0.2 to about 0.6, and the ratio, by weight, of said monomer component to said polymer component is in the range of about 0.7 to about 1.2.
    Type: Grant
    Filed: June 7, 1976
    Date of Patent: August 16, 1977
    Assignee: Napp Systems
    Inventors: Sakuo Okai, Koichi Kimoto
  • Patent number: 4042613
    Abstract: Novel benzophenone derivatives represented by the general formula R.sub.m.sup.1 --C.sub.6 H.sub.5-m --CO--C.sub.6 H.sub.5-n --R.sub.n.sup.2 where R.sup.1 is a halogen atom, a monovalent C.sub.1-10 hydrocarbon, alkoxy, thioalkoxy, amino, or dialkylamino group, R.sup.2 is an unsubstituted or organosiloxy-substituted organosilyl group, and m and n are each integers from 1 to 5. The benzophenone derivatives are useful as photosensitizers for making photo-curable compositions by blending with photo polymerizable resins, especially photopolymerizable organosilicon resins. Such photo-curable organosilicon resin compositions are further useful for making dry-planographic printing plates comprising non-image areas formed from the polymerized and cured layers of the composition.
    Type: Grant
    Filed: April 21, 1975
    Date of Patent: August 16, 1977
    Assignees: Dai Nippon Printing Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Minoru Takamizawa, Yasushi Yamamoto, Yoshio Inoue, Atsumi Noshiro, Hitoshi Fujii
  • Patent number: 4041191
    Abstract: An electron sensitive resin comprising a random polymer of ethylene glycol methacrylate with triethylene glycol dimethacrylate, randomly crosslinked, and having a degree of polymerization of from 10 to 1000, is described.
    Type: Grant
    Filed: November 6, 1975
    Date of Patent: August 9, 1977
    Inventors: Pierre Leclerc, Jean Claude Dubois
  • Patent number: 4040831
    Abstract: The invention provides a method for the preparation of relief structures of highly heat-resistant polymers, using radiation-sensitive, soluble preliminary polymers in the form of polyaddition or polycondensation products of polyfunctional carbocyclic or heterocyclic compounds containing radiation-sensitive radicals in ester groups bound to said compounds with diamines, diisocyanates, bis-acid chlorides or dicarboxylic acids of cyclic structure. According to the invention, the polyfunctional compounds containing the radiation-sensitive radicals contain, besides carboxyl, carboxylic acid chloride, amino, isocyanate or hydroxyl groups suitable for addition or condensation reactions, partly in ortho or peri-position thereto, radiation-reactive radicals in the ester groups bound to the compounds having an oxyalkylene methacrylate or acrylate structure.
    Type: Grant
    Filed: July 24, 1975
    Date of Patent: August 9, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Roland Rubner, Wolfgang Kleeberg, Eberhard Kuhn
  • Patent number: 4038084
    Abstract: A photo-setting composition essentially consisting of:(A) 100 weight parts of a product prepared by esterifying a maleic anhydride adduct of a liquid polybutadiene with a hydroxyl compound;(B) 10 - 150 weight parts of one or more than one kind of unsaturated compound selected from the group consisting of a hydroxyl compound identified above, a di(meth)acrylate compound and a glycidyl monoester compound; and(C) 0.5 - 10 weight parts of a benzoinether compound.
    Type: Grant
    Filed: March 24, 1976
    Date of Patent: July 26, 1977
    Assignee: UBE Industries, Ltd.
    Inventors: Tsunetomo Nakano, Kazuaki Nishio, Toshikazu Hayashi, Hiroshi Andou
  • Patent number: 4038078
    Abstract: A process for formation of a relief image which comprises exposing a layer of a photosensitive composition in liquid provided on the surface of a support material to light through a negative to make cured the photosensitive composition at the exposed part and eliminating the non-cured photosensitive composition at the non-exposed part by suctioning for development, the photosensitive composition comprising as the essential components only (1) at least one addition polymerizable unsaturated monomer having at least one acryloyl or methacryloyl group per each molecule and a molecular weight of not more than about 1000 per each acryloyl or methacryloyl group and (2) at least one photopolymerization initiator.
    Type: Grant
    Filed: July 28, 1975
    Date of Patent: July 26, 1977
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kiyomi Sakurai, Yasuyuki Takimoto
  • Patent number: 4035189
    Abstract: A resist image, which is excellent in adhesiveness and high in physicochemical strengths, can be obtained by using as a resist material a resin composition having such properties that when it is exposed to actinic rays, a latent image (cure-precursor) is formed therein, and when it is subjected to subsequent heating, only the latent image portion is selectively cured.An example of the above-mentioned resin composition is a latently curable epoxy resin composition composed essentially of (A) an epoxy resin prepolymer and (B) a compound having in the molecule at least two groups represented by the formulas (I) and/or (II), ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are individually a hydrogen atom, an alkyl group or aryl group.
    Type: Grant
    Filed: July 10, 1975
    Date of Patent: July 12, 1977
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Nobuyuki Hayashi, Asao Isobe, Katsushige Tsukada, Ken Ogawa, Masahiro Abo
  • Patent number: 4031271
    Abstract: The invention is directed to alkali-resistant, radiation curable compositions comprisingA. a polyeneAndB. a polythiol of the formula ##STR1## WHERE R is an aliphatic hydrocarbon moiety containing 2-6 carbon atoms, R.sub.2 is an alkylene group containing 2-6 carbon atoms, R.sub.1 is hydrogen or --OH, n is 2-6, and m is 1-2.A photosensitizer is added to the composition when curing is by U. V. radiation. The cured composition is operable as an additive plating resist in the manufacture of electronic circuitry.
    Type: Grant
    Filed: November 17, 1975
    Date of Patent: June 21, 1977
    Assignee: W. R. Grace & Co.
    Inventor: Richard Wayne Bush
  • Patent number: 4029505
    Abstract: Positive polymer images are produced on substrates having applied thereto a layer of photopolymerizable composition containing (1) a non-gaseous ethylenically unsaturated compound capable of polymerization by free-radical initiated chain propagation, (2) a dinitroso compound which is a noninhibitor of free-radical polymerization and is photochemically converted by ultraviolet radiation to an inhibitor of free-radical polymerization, and (3) a photoactivatable organic free-radical generating system.
    Type: Grant
    Filed: May 20, 1976
    Date of Patent: June 14, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: William John Nebe
  • Patent number: 4028204
    Abstract: Compounds containing a benzophenone or a substituted benzophenone moiety are (a) autophotopolymerizable, (b) photopolymerizable in compositions with another photoinitiator, and (c) photoinitiating in compositions with another photopolymerizable material.
    Type: Grant
    Filed: May 12, 1975
    Date of Patent: June 7, 1977
    Assignee: Sun Chemical Corporation
    Inventors: George Rosen, Daniel J. Carlick, Ralph H. Reiter
  • Patent number: 4025346
    Abstract: A printing plate is coated with a composition comprising 20 to 50% saturated halogenated polyester, 10 to 45% polyacrylate, 5 to 15% metal acrylate and an effective amount of photoinitiator. The composition is applied in the form of a dispersion of the components in an inert organic solvent.
    Type: Grant
    Filed: December 31, 1975
    Date of Patent: May 24, 1977
    Assignee: Borden, Inc.
    Inventors: Frederick Edward Petke, John Nicholas Kirch, Michael Edward Gerkin
  • Patent number: 4024293
    Abstract: High sensitivity resist films for lift-off metallization are formed by coating a substrate with at least two layers of polymeric materials, each layer of which is developed by different developers that are mutual exclusive of one another. The resist can operate for lift-off at electron beam exposure equal to or greater than 5.times.10.sup.-.sup.6 coulombs/cm.sup.2.
    Type: Grant
    Filed: December 10, 1975
    Date of Patent: May 17, 1977
    Assignee: International Business Machines Corporation
    Inventor: Michael Hatzakis
  • Patent number: 4023973
    Abstract: A photosensitive composition comprising (1) a maleic anhydride adduct of 1,2-polybutadiene having a molecular weight of 10,000 or higher, (2) at least one photosensitizer and/or at least one photosensitive crosslinking agent, and, if necessary, (3) at least one acrylic monomer. This composition can be developed with water or a polar solvent such as an alcohol, and its layer formed on a support provides a printing plate. When the acrylic monomer is contained, the composition is suitable for use in flexographic printing.
    Type: Grant
    Filed: April 17, 1975
    Date of Patent: May 17, 1977
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Fumitake Imaizumi, Isao Nagaoka, Mitsuo Kurokawa, Koei Komatsu, Yasuyuki Takimoto, Hidefumi Kusuda
  • Patent number: 4022674
    Abstract: Compounds containing a benzophenone or a substituted benzophenone moiety are (a) autophotopolymerizable, (b) photopolymerizable in compositions with another photoinitiator, or (c) photoinitiating in compositions with another photopolymerizable material.
    Type: Grant
    Filed: May 12, 1975
    Date of Patent: May 10, 1977
    Assignee: Sun Chemical Corporation
    Inventor: George Rosen
  • Patent number: 4022927
    Abstract: A method of constructing a relatively thick, self-supporting mask suitable for electron beam projection processes. Thickness is achieved by multiple steps of coating with resist, exposure and development. Either positive or negative resist may be used for second and subsequent coatings. Second and subsequent exposures are directed through the first relatively thin mask formed and through the substrate to eliminate critical alignment of subsequent masks. When desired thickness is achieved an even thicker frame may be fabricated for support purposes and the mask may then be lifted off the substrate on which it had rested during the fabrication steps.When positive resist is employed, the resist remaining after development is baked on to give added structural strength to the mask. This baked resist can be coated with an additional layer of metal by evaporation or sputtering to give greater mechanical strength.
    Type: Grant
    Filed: June 30, 1975
    Date of Patent: May 10, 1977
    Assignee: International Business Machines Corporation
    Inventors: Aloysius T. Pfeiffer, Lubomyr T. Romankiw
  • Patent number: 4019904
    Abstract: The planographic printing plate has ink-receptive and ink-repellent areas provided on its base, the ink-repellent areas being covered with a layer formed by polymerizing and curing a composition which comprise a photopolymerizable organopolysiloxane with maleimido groups. The photopolymerizable organopolysiloxane has easily synthesized. The ink-repellency of the cured organopolysiloxane is excellent. The planographic printing plates can be used without dampening water and have a superior press life.
    Type: Grant
    Filed: March 30, 1976
    Date of Patent: April 26, 1977
    Assignees: Dai Nippon Printing Company Limited, Shin-Etsu Chemical Company Limited
    Inventors: Atsumi Noshiro, Minoru Takamizawa, Yasushi Yamamoto, Yoshio Inoue, Hitoshi Fujii
  • Patent number: 4019972
    Abstract: This invention relates to a photopolymerizable copying composition comprising at least one binder, at least one photoinitiator, and at least one polymerizable, acid amide group-containing acrylic acid derivative or alkyl acrylic acid derivative which is not volatile at 100.degree. C and contains at least two polymerizable groups in the molecule, the polymerizable compound containing at least one compound of the following general formulaA(--X--NH--CO--G).sub.pwherein:A stands for Z(--CO--NH--).sub.2 wherein Z is ##STR1## --O--CH.sub.2 --C.sub.q H.sub.2q --O--, or --O--(CH.sub.2 CH.sub.2 --O--).sub.rWhereinq is a whole number from 1 to 11, andr is a whole number from 1 to 5, or forE--C(--CH.sub.2 --O--CO--NH--).sub.3whereinE is CH.sub.3 --, C.sub.2 H.sub.5 -- or --NH--CO--O--CH.sub.2 --,G stands for ##STR2## or ##STR3## whereinn is 0, 1, or 2,m is a whole number from 1 to 11,k is 0 or a whole number from 1 to 4,R.sub.1 is alkyl with 1 to 3 carbon atoms, or --R.sub.4 or --CH.sub.2 --R.sub.4,R.sub.2 and R.sub.
    Type: Grant
    Filed: December 2, 1974
    Date of Patent: April 26, 1977
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Raimund Josef Faust
  • Patent number: 4018937
    Abstract: Recording medium comprising a film of a polymer of 1-methylvinyl methyl ketone on a support is suitable for recording information with electron beams. This recording medium has high resolution and good sensitivity.
    Type: Grant
    Filed: August 14, 1975
    Date of Patent: April 19, 1977
    Assignee: RCA Corporation
    Inventors: Aaron William Levine, Michael Kaplan
  • Patent number: 4018938
    Abstract: A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.
    Type: Grant
    Filed: June 30, 1975
    Date of Patent: April 19, 1977
    Assignee: International Business Machines Corporation
    Inventors: Ralph Feder, Eberhard A. Spiller
  • Patent number: 4017312
    Abstract: A method of manufacturing an article carrying a relief image intended for printing comprises exposing to an appropriate activating radiation the surface of a receptor material having at least a part of its thickness from the surface thereof formed of a homogeneous mixture of a solid material whose aptitude for softening when heated is modified when it is exposed to said activating radiation, and of at least one substance which releases a gas upon being heated, in such a manner as to transcribe therein a latent image in the form of differences in aptitude for softening and by heating the receptor material to a temperature such that its exposed parts and its non-exposed parts are softened to different degrees, said temperature being at least equal to that at which said substance releases said gas, thereby causing swelling of the exposed parts and the non-exposed parts to different heights thereby forming a relief image based on differential capacity for softening.
    Type: Grant
    Filed: December 19, 1975
    Date of Patent: April 12, 1977
    Assignees: Mitsubishi Plastics Industries, Limited, Battelle Memorial Institute
    Inventors: William Erskine, Raymond Gerber, Francis Mentienne
  • Patent number: 4017371
    Abstract: Novel styrene-allyl alcohol copolymer based solid polyene compositions which when mixed with liquid polythiols can form solid curable polyene-polythiol systems. These solid polyenes, containing at least two reactive carbon-to-carbon unsaturated bonds, are urethane or ester derivatives of styrene-allyl alcohol copolymers. The solid polyenes are prepared by treating the hydroxyl groups of a styrene-allyl alcohol copolymer with a reactive unsaturated isocyanate, e.g., allyl isocyanate or a reactive unsaturated carboxylic acid, e.g., acrylic acid. Upon exposure to a free radical generator, e.g., actinic radiation, the solid polyene-polythiol compositions cure to solid, insoluble, chemically resistant, cross-linked polythioether products. Since the solid polyene-liquid polythiol composition can be cured in a solid state, such a curable system finds particular use in preparation of coatings, imaged surfaces such as photoresists, particularly solder-resistant photoresists, printing plates, etc.
    Type: Grant
    Filed: November 24, 1975
    Date of Patent: April 12, 1977
    Assignee: W. R. Grace & Co.
    Inventor: Charles R. Morgan
  • Patent number: 4012536
    Abstract: Recording medium comprising a film of a polymer of 1-methylvinyl methyl ketone on a support is suitable for recording information with electron beams. This recording medium has high resolution and good sensitivity.
    Type: Grant
    Filed: August 14, 1975
    Date of Patent: March 15, 1977
    Assignee: RCA Corporation
    Inventors: Aaron William Levine, Michael Kaplan
  • Patent number: 4012256
    Abstract: A photopolymerizable composition useful in photo-imaging processes comprises an ethylenically unsaturated polymerizable compound and a photo-initiator comprising a combination of a photoreducible dye and an alkanolamine. The composition is substantially insensitive to visible light when in an acidic pH condition, yet may be made highly sensitive to visible light upon adjustment to a condition of alkaline pH. Imaging materials may be repeatedly sensitized and desensitized by pH adjustment and multiple-spaced exposures made prior to final washoff development processing.
    Type: Grant
    Filed: September 25, 1972
    Date of Patent: March 15, 1977
    Assignee: Keuffel & Esser Company
    Inventor: Steven Levinos
  • Patent number: 4011351
    Abstract: A positive resist image is produced by exposure of a layer of non-crosslinked polymeric material to high energy radiation in a predetermined pattern, the polymeric material containing alkyl methacrylate units and polymerized units of certain other ethylenically unsaturated monomers, followed by removal of the electron degraded material from the exposed areas.
    Type: Grant
    Filed: January 29, 1975
    Date of Patent: March 8, 1977
    Assignee: International Business Machines Corporation
    Inventors: Edward Gipstein, Wayne M. Moreau, Omar U. Need, III
  • Patent number: 4011084
    Abstract: Fluid photo-crosslinkable composition consisting essentially of a photo-initiator and a mixture ofA. a polyurethane obtained by reacting a hydroxyl-containing saturated aliphatic polyester with a polyisocyanate and a monoacrylate or monomethacrylate of a diol, andB. an N-vinyl lactam optionally in admixture with other monomers.These compositions are suitable for the production of high-quality relief printing plates and have a short processing time.
    Type: Grant
    Filed: September 10, 1975
    Date of Patent: March 8, 1977
    Assignee: BASF Aktiengesellschaft
    Inventors: Heinrich Hartmann, Gerhard Hoffmann, Helmut Barzynski, August Lehner, Werner Lenz, Herbert Stutz, Heinz-Ulrich Werther
  • Patent number: 4008138
    Abstract: Compounds containing a benzophenone or a substituted benzophenone moiety are (a) autophotopolymerizable, (b) photopolymerizable in compositions with another photoinitiator, and (c) photoinitiating in compositions with another photopolymerizable material.
    Type: Grant
    Filed: May 20, 1975
    Date of Patent: February 15, 1977
    Assignee: Sun Chemical Corporation
    Inventors: George Rosen, Daniel J. Carlick, Ralph H. Reiter
  • Patent number: 4007209
    Abstract: The invention relates to special acetals of benzoin compounds which act as photoinitiators, and to a technically simple manufacturing process involving the reaction of an appropriate .alpha.- or .beta.-hydroxyketone with an .alpha.,.beta.-olefinically unsaturated ether in the presence of an acid catalyst. The acetals are particularly suitable for use as photoinitiators in the preparation of photopolymer printing plates.
    Type: Grant
    Filed: March 10, 1975
    Date of Patent: February 8, 1977
    Assignee: Badische Anilin- & Soda-Fabrik Aktiengesellschaft
    Inventors: Eckhard Hickmann, Martin Fischer, Otto Volkert, Mong-Jon Jun
  • Patent number: 4006024
    Abstract: A photopolymerizable composition comprising a polyester-polyether block polymer which is useful for preparing relief images and printing plates.
    Type: Grant
    Filed: February 3, 1976
    Date of Patent: February 1, 1977
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Jyoji Ibata, Hidehiko Kobayashi, Kazuo Toyomoto, Kazuhiro Suzuoki, Yoshio Hayashi, Masakazu Kurihara
  • Patent number: 4005437
    Abstract: Recording media comprising a mixture of 4,4'-bis(3-diazo-3,4-dihydro-4-oxo-1-naphthalenesulfonyloxy)benzil and an alkali soluble resin are suitable for recording information with electron beams. These recording media have high sensitivity, high resolving power and can be reproducibly formulated.
    Type: Grant
    Filed: April 18, 1975
    Date of Patent: January 25, 1977
    Assignee: RCA Corporation
    Inventors: Daniel Louis Ross, Lucian Anthony Barton
  • Patent number: 4004998
    Abstract: Compounds containing a benzophenone or a substituted benzophenone moiety are (a) autophotopolymerizable, (b) photopolymerizable in compositions with another photoinitiator, or (c) photoinitiating in compositions with another photopolymerizable material.
    Type: Grant
    Filed: April 25, 1975
    Date of Patent: January 25, 1977
    Assignee: Sun Chemical Corporation
    Inventor: George Rosen
  • Patent number: 4003747
    Abstract: A photosensitive color-forming element comprises a support and a photosensitive color-forming layer carried on the support and containing therein a color-forming coupler, for example, 1-naphthol, 2-naphthol and 2,4-dichloro-1-naphthol, and a photosensitive azido compound of the formula (I) or (II): ##STR1## wherein R.sub.1 represents a hydrogen or halogen atom or an alkyl, alkoxyl, diethylamino or hydroxyl radical R.sub. 2 an alkyl, alkoxyl or hydroxyl radical, and R.sub.3 a hydrogen atom or an alkyl or phenyl radical, and, if necessary, a polymeric material capable of hardening or being insolubilized in solvent when the polymeric material is exposed to radiation rays in the presence of the above azido compound, the above-mentioned azido compound and color-forming coupler being capable of forming a dark color upon exposure to radiation rays, without a color-developing agent.
    Type: Grant
    Filed: September 4, 1975
    Date of Patent: January 18, 1977
    Assignees: Hodogaya Chemical Co., Ltd., Oji Paper Co., Ltd.
    Inventors: Takahiro Tsunoda, Minoru Ozutsumi, Shigeo Maeda, Susumu Suzuka, Hidetoshi Komiya
  • Patent number: 4002478
    Abstract: A method for forming a relief pattern on a substrate which comprises the steps of: (I) allowing a photosensitive sheet to adhere on said substrate, said photosensitive sheet containing a photo-impervious ink layer, releasing layer, pattern forming layer and photosensitive resin layer; (II) radiating actinic rays on said photosensitive sheet to cure an irradiated portion of said photosensitive resin layer; (III) peeling off the upper layers of said photosensitive sheet; and (IV) washing away the un-cured portion of said photosensitive resin layer to produce a fine and decorative relief pattern.
    Type: Grant
    Filed: January 2, 1976
    Date of Patent: January 11, 1977
    Assignee: Kansai Paint Company, Ltd.
    Inventors: Tomoo Kokawa, Yoshikathu Nakao, Kunio Akiyama
  • Patent number: 4001016
    Abstract: Relief or resist images can be produced by means of a photosensitive material including a photosensitive layer with a polymer as defined hereinafter containing vinyl groups capable of being cross-linked upon exposure to actinic light to yield unsoluble cross-linked products at the exposed areas while the polymer in the unexposed areas remain soluble.
    Type: Grant
    Filed: December 9, 1974
    Date of Patent: January 4, 1977
    Assignee: AGFA-Gevaert, A.G.
    Inventors: Hans-Jurgen Rosenkranz, Hans Rudolph, Erich Wolff, Harald VON Rintelen
  • Patent number: 4001017
    Abstract: In photopolymerization, the polymerization process is activated or initiated by radiation, for example in the region of ultraviolet or visible waves. According to the present invention ethylenically unsaturated compounds can now be polymerized advantageously with the aid of a new catalyst system which consists of a diazine compound, preferably a quinoxaline and an electron donor, which together act as a photoredox pair.
    Type: Grant
    Filed: November 29, 1973
    Date of Patent: January 4, 1977
    Assignee: Ciba-Geigy AG
    Inventors: Niklaus Baumann, Hans-Peter Schlunke
  • Patent number: 3998712
    Abstract: Compositions polymerizable by ultraviolet irradiation which contain photopolymerizable monomers possessing at least one polymerizable carbon-carbon multiple bond and monoketals of the formula ##STR1## as photoinitiators. The compositions have a particularly long shelf life and show very little yellowing after curing by irradiation.
    Type: Grant
    Filed: June 29, 1973
    Date of Patent: December 21, 1976
    Assignee: Badische Anilin- & Soda-Fabrik Aktiengesellschaft
    Inventors: Eckhard Hickmann, Martin Fischer, Milan Velic, Otto Volkert
  • Patent number: 3997344
    Abstract: Copolymers of glycidyl acrylate and allyl glycidyl ether and terpolymers derived from addition of glycidyl methacrylate to the polymerizable mixture, having an inherent viscosity within the range of about 0.09 to 0.28 and an epoxy equivalent of at least about 0.64 per 100 g. of polymer are provided which upon admixture with a catalyst which is a radiation-sensitive aryldiazonium salt of a complex halogenide, provides compositions suitable for use in a dry photopolymer positive imaging process. In the process, the polymer which is non-tacky at room temperature, together with the catalyst is applied to a substrate and exposed to an energy source for example, electromagnetic radiation through a transparency or mask. Following exposure, the coating is heated to the softening point of the unexposed portion of the coating and a powder or toner is applied thereto, the toner being adhered to only the tacky, non-exposed area of the coating, resulting in a pigmented image.
    Type: Grant
    Filed: July 5, 1974
    Date of Patent: December 14, 1976
    Assignee: American Can Company
    Inventors: Sheldon Irwin Schlesinger, Ronald J. Boszak
  • Patent number: 3997345
    Abstract: A process for preparing an image plate with continuous gradation having a continuous unevenness which comprises exposing a photosensitive resin plate comprising a supporting material and a layer of a photopolymerizable resin composition being in a solid or liquid state at room temperatures and comprising an addition polymerizable, ethylenically unsaturated compound, a binding agent of polymer and a photopolymerization initiator provided thereon through a film with continuous gradation and subjecting the exposed resin plate to development, characterized in that the exposure is made in such a condition that oxygen or a gas containing oxygen is present between the photopolymerizable resin layer and the film.
    Type: Grant
    Filed: January 10, 1975
    Date of Patent: December 14, 1976
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kiyomi Sakurai, Yutaka Fukushima, Masami Yamaguchi
  • Patent number: 3996121
    Abstract: The products, which are based on polyepoxide, polymerize on exposure to actinic radiation and are useful in the preparation of printing plates for offset printing and of printed circuits, particularly multilayer circuits. They are formed by coupling two molecules of a polyepoxide by means of a dihydric phenol which contains a chalcone or chalcone-like grouping, such as 1,3-bis(p-hydroxyphenyl)prop-1-en-3-one or 1,5-bis(p-hydroxyphenyl) penta-1,4-dien-3-one, so sensitizing the material to the radiation, and then, to achieve polymerizability, ring-opening at least some of the residual epoxide groups so as to incorporate olefinic acyloxy groups (R.sup.6 CH=C(R.sup.5)COO-), such as sorboyl groups.
    Type: Grant
    Filed: February 10, 1975
    Date of Patent: December 7, 1976
    Assignee: Ciba-Geigy Corporation
    Inventors: George Edward Green, Ewald Losert
  • Patent number: 3996393
    Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.
    Type: Grant
    Filed: March 25, 1974
    Date of Patent: December 7, 1976
    Assignee: International Business Machines Corporation
    Inventors: Charles A. Cortellino, Edward Gipstein, William A. Hewett, Duane E. Johnson, Wayne M. Moreau
  • Patent number: 3996052
    Abstract: Photopolymerizable compositions comprising a polymerizable epoxide, vinyl ether, or other acid-catalyzed monomer and a phototropic, alkyl substituted-ortho-nitrobenzene containing compound are provided, which, when exposed to actinic radiation, are polymerized by the radiation produced acidic initiator.
    Type: Grant
    Filed: February 26, 1975
    Date of Patent: December 7, 1976
    Assignee: American Can Company
    Inventor: Sheldon I. Schlesinger
  • Patent number: 3993485
    Abstract: A photopolymerization process is adapted for the production of various optical devices by means of a modified process which serves to increase the index change obtainable in a variable pattern of index of refraction. The process comprises the steps of flowing into place in a supporting structure a mixture of two components of differing reactivity and polarizability, partially polymerizing the mixture, writing a pattern of varying index of refraction in the partially polymerized mixture by further polymerizing it by suitable optical radiation in a corresponding pattern, and fixing the mixture against subsequent changes in polymerization. Typical components used in the process include a mixture of the monomers cyclohexyl methacrylate and N-vinylcarbazole together with benzoin methyl ether as a photosensitive initiator of polymerization, which proceeds by free radical reactions. In the limit of our technique, one of the components can have zero reactivity.
    Type: Grant
    Filed: May 27, 1975
    Date of Patent: November 23, 1976
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Edwin Arthur Chandross, Walter John Tomlinson, III, Heinz Paul Weber
  • Patent number: 3993549
    Abstract: This invention relates to a solid curable composition formed by adding finely divided urea in amounts ranging from 10 to 70 weight percent of the composition to liquid polyene/polythiol curable systems wherein the combined polyene and polythiol contain at least 20 percent by weight of oxyethylene units. The thus formed solid compositions are readily cured by radiation, e.g., high energy ionizing radiation or U. V. radiation in the presence of a photocuring rate accelerator.
    Type: Grant
    Filed: July 12, 1974
    Date of Patent: November 23, 1976
    Assignee: W. R. Grace & Co.
    Inventors: Richard W. Bush, Louis L. Wood
  • Patent number: 3991033
    Abstract: Polyoxymethylene polymers having thermally stable but photochemically sensitive and degradable random linkages ##EQU1## in the chain where n is 0 or 1, R.sup.3 and R.sup.4 are H or lower alkyl and at least one of R.sup.1 and R.sup.2 is a phenyl group with an orthonitro substituent are made by intercalating a polyoxymethylene polymer with the appropriate dioxane or dioxolane. By exposing a film of the polymer to light through a transparency followed by heating or a heated treatment with base, a relief image of the copy on the transparency is obtained.
    Type: Grant
    Filed: January 30, 1975
    Date of Patent: November 9, 1976
    Assignee: E. I. Du Pont de Nemours & Company
    Inventor: Donnie Joe Sam