Submerged Inlet For Subsurface Contact Patents (Class 96/351)
  • Patent number: 4086210
    Abstract: Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.
    Type: Grant
    Filed: May 10, 1976
    Date of Patent: April 25, 1978
    Assignee: Eastman Kodak Company
    Inventor: Constantine Chris Petropoulos
  • Patent number: 4086090
    Abstract: The present invention affords a process for forming a pattern having a surface area substantially equal to or smaller than area of apertures of shadow-mask through which beams pass on a photoresist film, which contains an acrylamidediacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound, by exposing said photoresist film to light through a mask having the pattern and then developing the film.The use of said photoresist film for the preparation of a phosphor screen of a color picture tube of a black matrix or black stripe type does not require a special technique such as post-etching of a shadow mask and makes it possible to form a three primary color phosphor pattern having a surface area substantially equal to or smaller than the area of apertures of the shadow mask through which lightbeams pass, without mutual "bridging" between phosphor dots. Thus, an excellent phosphor screen of a color picture tube of a black matrix or black stripe type can be prepared.
    Type: Grant
    Filed: September 22, 1975
    Date of Patent: April 25, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Takahiro Kohashi, Motoo Akagi, Yoichi Oba, Saburo Nonogaki, Makoto Tanaka, Tadao Kaneko, Yoshifumi Tomita
  • Patent number: 4086093
    Abstract: A laminated negative acting presensitized planographic printing plate for use in dry planography having(a) a base layer.(b) a silicone rubber layer overlying the base layer, and(c) a photoadhesive layer overlying the silicone rubber layer comprising at least one photopolymerizable unsaturated compound having a boiling point above 100.degree. C and a photoinitiator.Under exposure to light through a negative transparency, the photoadhesive layer polymerizes in the exposed image area and adheres to the underlying silicone rubber layer, while remaining non-adhesive to the underlying silicone rubber layer in the unexposed non-image area.The unexposed photoadhesive layer only is removed to bare the underlying silicone rubber layer which is made an ink-repellent non-image area and the photoadhesive layer remaining in the exposed area is made an ink-receptive image area.
    Type: Grant
    Filed: August 11, 1976
    Date of Patent: April 25, 1978
    Assignee: Toray Industries, Inc.
    Inventors: Yuh Ezumi, Masaharu Kobayashi, Takashi Kubota, Yoichi Shimokawa
  • Patent number: 4085019
    Abstract: Novel amides, preferably having a molecular weight in the range 1000 to 10,000, are prepared by acylating, partially or fully, amino groups in poly(ethylene imine) or poly(propylene imine) whereby amino-hydrogen atoms are replaced by groups R.sup.3 CH.dbd.CR.sup.2 CO--, where R.sup.3 denotes an aliphatic, cycloaliphatic, araliphatic, or heterocyclic group containing ethylenic unsaturation in conjugation with the indicated double bond and R.sup.2 denotes a hydrogen, chlorine, or bromine atom, a cyano group, or an alkyl group. Particularly preferred are such amides where R.sup.3 CH.dbd.CR.sup.2 CO-- denotes a sorbyl group and containing additional intramolecular linkages introduced by a difunctional reagent capable of reacting with aliphatic amino groups, such as a diepoxide or a di-isocyanate.The amides may be polymerized by means of actinic radiation and are useful in the preparation of printing plates and printed circuits.
    Type: Grant
    Filed: June 19, 1975
    Date of Patent: April 18, 1978
    Assignee: Ciba-Geigy Corporation
    Inventor: George Edward Green
  • Patent number: 4081276
    Abstract: A method is described for forming an image or design on the surface of a substrate by treating the substrate with a photoinitiator, such as triphenylsulfonium hexafluoroantimonate. A mask can be placed on the treated substrate which is exposed to radiant energy, resulting in the formation of a cationic polymerization catalyst on the exposed substrate surface. The substrate can then be contacted with a cationically polymerizable organic material, such as an epoxy resin, resulting in the formation of an adherent organic film on the surface of the substrate which has been exposed.
    Type: Grant
    Filed: October 18, 1976
    Date of Patent: March 28, 1978
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4081282
    Abstract: A dry system for forming and transferring images is provided. The system comprises a photoactive component comprising a tacky photohardenable layer on a selected carrier sheet and a transfer component comprising a frangible color layer on a selected carrier sheet. The two components are disposed with their photohardenable and color layers in air-free contact with one another and then subjected to irradiation with actinic radiation in accordance with a selected image pattern so as to cause selected portions of the photohardenable layer to harden and fuse to confronting portions of the color layer. Then the two components are separated whereby the fused portions of the color layer are separated from its carrier sheet and transferred to the photoactive component. Thereafter the color layer remaining on the transferable component is coated with a pressure-sensitive adhesive.
    Type: Grant
    Filed: November 3, 1975
    Date of Patent: March 28, 1978
    Assignee: Seal Incorporated
    Inventors: Richard E. Merrill, Theodore H. Krueger
  • Patent number: 4080274
    Abstract: Polymerization of polymerizable compositions comprising mixtures of lactones with monomeric or prepolymeric epoxides is effected by mixing such compositions with radiation-sensitive aromatic diazonium salts which decompose upon application of energy such as electromagnetic radiation to release Lewis Acid to initiate polymerization of said monomers.
    Type: Grant
    Filed: June 10, 1975
    Date of Patent: March 21, 1978
    Assignee: American Can Company
    Inventor: Sheldon Irwin Schlesinger
  • Patent number: 4078494
    Abstract: A letter press printing plate is disclosed for wrapping around a drum. The printing surface is formed with a light-sensitive material layer on a metal backing plate with two different levels, the high level representing areas of solid or dark tones of printing and the low level representing areas of light tones of printing. The printing plate overcomes the problem of even transfer of ink from the solid or dark tones of printing areas and the light tones of printing areas. A method of forming the letter press printing plate is also disclosed wherein a photo polymer layer on a backing plate is first exposed to a negative representing areas of solid or dark tones and light tones of printing. The photo polymer layer is then dissolved away to the backing plate in areas where no printing occurs and formed into a two-level printing surface with the areas of solid or dark tones being at a high level and the areas of light tones being at a low level.
    Type: Grant
    Filed: February 4, 1976
    Date of Patent: March 14, 1978
    Assignee: STANMont, Inc.
    Inventor: Howard W. Gregory
  • Patent number: 4079159
    Abstract: A novel original plate for producing matrix which has improved strength, mold releasability and dimensional stability during production of matrices consists of a laminated structure of a metal base, a bonding layer, a relief supporting layer and a relief of a photo-polymerized resin, said relief supporting layer comprising a resin similar to that of the relief or having a high affinity with that of the relief.
    Type: Grant
    Filed: August 11, 1975
    Date of Patent: March 14, 1978
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue
  • Patent number: 4078098
    Abstract: The development of high energy radiation exposed positive acrylate polymer resist layers by organic liquid developers, such as methyl isobutyl ketone, is improved by adding water to the ketone.
    Type: Grant
    Filed: May 28, 1974
    Date of Patent: March 7, 1978
    Assignee: International Business Machines Corporation
    Inventor: Charles A. Cortellino
  • Patent number: 4078102
    Abstract: Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
    Type: Grant
    Filed: October 29, 1976
    Date of Patent: March 7, 1978
    Assignee: International Business Machines Corporation
    Inventors: Diana Jean Bendz, Gerald Andrei Bendz
  • Patent number: 4075367
    Abstract: A method of providing improved adherence of photoresist to a silicon nitride layer on a semiconductor wafer by first preparing a heated solution of trichlorophenylsilane, immersing the nitride coated wafer in the trichlorophenylsilane solution, drying and baking the wafer prior to the application of the photoresist.
    Type: Grant
    Filed: March 18, 1976
    Date of Patent: February 21, 1978
    Assignee: NCR Corporation
    Inventor: Michael R. Gulett
  • Patent number: 4075015
    Abstract: A light sensitive mass which contains a film former, which consists of 20 to 90 percent by weight of a vinylpyrrolidone-vinyl acetate copolymer or a polyvinyl pyrrolidone or both and 10 to 80 percent by weight of an aryl sulfone amide formaldehyde resin, and at least one sensitizer, the weight ratio of said film former to sensitizer being between 1:1 and 10:1. Usually the light sensitive mass is used as a light sensitive reversal-development layer on a carrier.
    Type: Grant
    Filed: August 16, 1976
    Date of Patent: February 21, 1978
    Assignee: Swiss Aluminium Ltd.
    Inventors: Josef Vinkovic, Eugen Werner
  • Patent number: 4074008
    Abstract: Epoxide resins, which polymerize on exposure to actinic radiation, have, per average molecule, at least two photopolymerizable groups and also at least two 1,2-epoxide groups, one or more such epoxide groups being contained in units of formula ##STR1## Photopolymerizable epoxide resins are commonly prepared by introduction of photopolymerizable groups into a molecule of an epoxide resin by reaction with some of the epoxide groups: the modified resin, having a low epoxide group content, usually exhibits poorer adhesion and lower glass transition temperature than would otherwise be the case. In the new resins, secondary hydroxyl groups generated on introduction of the photopolymerizable groups have been converted into glycidyl ether groups, thus they have a higher epoxide content.
    Type: Grant
    Filed: August 3, 1976
    Date of Patent: February 14, 1978
    Assignee: Ciba-Geigy Corporation
    Inventor: George E. Green
  • Patent number: 4072527
    Abstract: Photopolymerizable elements are provided which comprise: (1) A support, (2) an addition polymerizable photosensitive layer, and (3) a solid, water-permeable, oxygen barrier protective layer, non-strippable as an unsupported film, said layer covering the entire photosensitive layer and being coated from an aqueous solution of a water-soluble macromolecular organic polymer or copolymer, e.g., polyvinyl alcohol, having dispersed therein, finely divided solid particles of a water-insoluble polymer or copolymer selected from acrylic and alkacrylic polymers or copolymers and mixtures thereof, and copolymers of vinyl pyrrolidone and vinyl acetate.
    Type: Grant
    Filed: June 3, 1976
    Date of Patent: February 7, 1978
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Roxy N. Fan
  • Patent number: 4072528
    Abstract: Photopolymerizable elements are provided which comprise: (1) A support, (2) an addition polymerizable photosensitive layer, and (3) a solid, water-permeable, oxygen barrier protective layer, nonstrippable as an unsupported film, said layer covering the entire photosensitive layer and being coated from an aqueous solution of a water-soluble macromolecular organic polymer or copolymer, e.g., polyvinyl alcohol, having dispersed therein, finely divided solid particles of a water-insoluble chlorinated vinyl polymer or copolymer.
    Type: Grant
    Filed: June 3, 1976
    Date of Patent: February 7, 1978
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Martin D. Bratt
  • Patent number: 4072524
    Abstract: The invention provides mixtures based on resins containing allyl groups and being solid at room temperature, useful for the preparation of thermally stable, photo-crosslinkable layers and foils. According to the invention, such mixtures comprise triallylcyanurate prepolymers and/or triallylcyanurate precopolymers with compounds containing allyloxy and/or allylester groups, and compounds with at least one N-maleimide group, wherein the C.dbd.C double bond of the N-maleimide groups are bonded to hydrogen, hydrogen and chlorine or hydrogen and methyl radicals. Preferably, the N-maleimide C.dbd.C bonds carry hydrogen.
    Type: Grant
    Filed: December 3, 1975
    Date of Patent: February 7, 1978
    Assignee: Siemens Aktiengesellschaft
    Inventors: Wolfgang Kleeberg, Roland Rubner, Wieland Bartel
  • Patent number: 4072529
    Abstract: A negative-working, reversibly gelled composition is disclosed, suitable for use as the photocurable component in a blank for preparation of an article in relief, such as a printing plate. Uncured portions of the composition are removed with an aqueous solution following imagewise modulated exposure of such a blank to actinic radiation. The composition comprises a first organic polymer bearing per molecule, at least one ethylenically unsaturated group which is polymerizable by a free radical source; and a second organic polymer bearing per molecule, at least two Z groups, Z being a primary hydroxyl or a mercapto group, with the proviso that when said first organic polymer bears at least two Z groups per molecule, said second organic polymer may be omitted; said Z groups being reacted by contact with a dialdehyde to produce the reversibly gelled composition.
    Type: Grant
    Filed: August 20, 1975
    Date of Patent: February 7, 1978
    Assignee: The Dow Chemical Company
    Inventors: Clayton W. Hoornstra, Violete L. Stevens
  • Patent number: 4069055
    Abstract: Cationic polymerization of epoxy resin such as epoxy monomers or prepolymers, can be achieved by use of certain radiation sensitive aromatic onium salts of Group Va elements. Curable compositions are provided which can be used as sealants, coating compounds, encapsulants, etc.
    Type: Grant
    Filed: December 9, 1975
    Date of Patent: January 17, 1978
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4069056
    Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic amines, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group Va elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.
    Type: Grant
    Filed: December 9, 1975
    Date of Patent: January 17, 1978
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4065307
    Abstract: An imaging system comprising providing an imaging member comprising an agglomerable layer in contact with an imagewise hardenable-softenable layer and imagewise hardening said member. An image is developed by imagewise softening said member to cause relative transparentizing in the imagewise softened areas due to an agglomeration of the agglomerable layer in the imagewise softened portions of said member.
    Type: Grant
    Filed: March 2, 1973
    Date of Patent: December 27, 1977
    Assignee: Xerox Corporation
    Inventor: William L. Goffe
  • Patent number: 4064287
    Abstract: Highly durable coatings are formed by the photopolymerization of screen printing inks containing aryloxyalkyl acrylate monomers or prepolymers, a polymerizable diluent and a free-radical initiating system, such inks having a viscosity of 5,000 to 200,000 centipoises and a thixotropic index of from 1 to 6. The photopolymerizable inks are useful for coating substrates, such as printed circuits, and serve as solder masks and resists for electroless plating, electroplating and etching.
    Type: Grant
    Filed: June 1, 1976
    Date of Patent: December 20, 1977
    Assignee: Dynachem Corporation
    Inventors: Melvin A. Lipson, Dale W. Knoth, Walter D. Custer, Michael N. Gilano
  • Patent number: 4061832
    Abstract: A positive-working electron resist which comprises a film-forming co-polymer B-D which is cross-linkable by carboxylic acid anhydride groups. The co-polymer B-D is formed from an unsaturated organic compound B and an unsaturated carboxylic acid chloride D. The cross-links are formed by heating a film of the resist in a moist atmosphere, some of the carboxylic acid chloride groups being hydrolysed so as to form carboxylic acid groups, at least some of these carboxylic acid groups reacting with carboxylic acid groups of different molecules of the co-polymer B-D so as to form carboxylic acid anhydride bridge links between these different molecules. The cross-linked material is insoluble in solvents in which the monomers B and D and the co-polymer B-D are normally soluble.
    Type: Grant
    Filed: March 19, 1976
    Date of Patent: December 6, 1977
    Assignee: U.S. Philips Corporation
    Inventor: Edward D. Roberts
  • Patent number: 4061829
    Abstract: A class of chlorinated or brominated polymeric negative resists for high resolution X-ray or electron lithographic processes is described. Chlorine and bromine atoms have a generally high mass absorption coefficient for X-rays and can be incorporated into the polymer in high weight percents. The chlorinated resists are especially sensitive to the 4.37 Angstrom characteristic X-rays from a Pd target.
    Type: Grant
    Filed: April 26, 1976
    Date of Patent: December 6, 1977
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventor: Gary Newton Taylor
  • Patent number: 4058443
    Abstract: A recording material comprising a support having coated thereon a layer of a photopolymerizable composition comprising (a) a chlorinated polyolefin, (b) a monomer having at least one addition-polymerizable unsaturated bond, (c) a photo-polymerization initiator, and (d) a polymeric material having a molecular weight above about 10,000 is described. This recording material is suited for use as a photoresist material, particularly for tenting.
    Type: Grant
    Filed: December 29, 1975
    Date of Patent: November 15, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masataka Murata, Keiji Takeda, Teppei Ikeda
  • Patent number: 4058398
    Abstract: A recording material comprising a support, a layer of a light-sensitive composition on the support, and a transparent film on the layer of the light-sensitive composition wherein the light-sensitive composition comprises (a) a monomer containing at least two addition polymerizable unsaturated bonds and having a boiling point of at least 100.degree. C, (b) polyvinyl butyral, and (c) a photopolymerization initiator represented by the formula: ##STR1## wherein R.sub.1 is an alkyl group which may be substituted or a vinyl-methyl group, R.sub.2 is an alkyl group, aryl group, or thienyl group, and Z is a group of non-metallic atoms required for forming a heterocyclic ring.After the recording material is imagewise exposed to light, the transparent film is peeled off while heating at about 70.degree. to 150.degree. C, whereby a positive or negative image is formed on each of the support and transparent film.
    Type: Grant
    Filed: September 29, 1975
    Date of Patent: November 15, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Chiaki Osada, Eiichi Hasegawa, Masataka Murata
  • Patent number: 4058401
    Abstract: Cationic polymerization of epoxy resin materials, such as epoxy monomers or prepolymers, can be achieved by use of certain radiation sensitive aromatic onium salts of Group VIa elements. Curable compositions are provided which can be used as sealants, coating compounds, encapsulants, etc.
    Type: Grant
    Filed: December 9, 1975
    Date of Patent: November 15, 1977
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4058400
    Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group VIa elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.
    Type: Grant
    Filed: December 9, 1975
    Date of Patent: November 15, 1977
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4057431
    Abstract: A liquid ethylenically unsaturated polurethane composition having no free NCO and a viscosity of 2,000 to 10,000 centipoises at 24.degree. C. dispersible in dilute caustic and capable of being polymerized by actinic light to yield a solid having a Shore A hardness of at least 30. Said composition may contain a diluent and a photosensitizing agent to adjust the viscosity and making the composition more readily utilizable for making printing plates.
    Type: Grant
    Filed: September 29, 1975
    Date of Patent: November 8, 1977
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Anthony F. Finelli, Shirish Jasani, Columbus Williams, Jr.
  • Patent number: 4056393
    Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.
    Type: Grant
    Filed: June 17, 1976
    Date of Patent: November 1, 1977
    Assignee: American Can Company
    Inventors: Sheldon I. Schlesinger, Veronica Cochran
  • Patent number: 4055424
    Abstract: Microfilm structures of improved contrast are provided by coating a suitable transparent film substrate with an intermediate layer of a silicone elastomer which is abhesive to ink, coating said silicone with a surface layer of a photosensitive polymer which when exposed to activating electromagnetic radiation cross-links and chemically attaches to said silicone elastomer to form oleophilic ink accepting image areas, imagewise exposing said photosensitive polymer, removing the non-exposed, light sensitive polymer to form non-imaged areas of the abhesive silicone elastomer, and selectively inking the oleophilic image areas to form an imaged microfilm structure of improved image density and contrast.
    Type: Grant
    Filed: May 7, 1976
    Date of Patent: October 25, 1977
    Assignee: Xerox Corporation
    Inventors: Joseph Yung-Chang Chu, Richard Louis Schank
  • Patent number: 4055515
    Abstract: This composition includes 50 to 85% by weight water, 10 to 25% relatively non-volatile inert organic solvent, 0.1 to 5% of a medium foamer detergent and 5 to 15% of a N-alkyl-2-pyrrolidone lubricant.
    Type: Grant
    Filed: December 31, 1975
    Date of Patent: October 25, 1977
    Assignee: Borden, Inc.
    Inventor: John Nicholas Kirch
  • Patent number: 4054451
    Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.
    Type: Grant
    Filed: June 17, 1976
    Date of Patent: October 18, 1977
    Assignee: American Can Company
    Inventors: Sheldon I. Schlesinger, Veronica Cochran
  • Patent number: 4054635
    Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.
    Type: Grant
    Filed: June 17, 1976
    Date of Patent: October 18, 1977
    Assignee: American Can Company
    Inventors: Sheldon I. Schlesinger, Veronica Cochran
  • Patent number: 4054483
    Abstract: An improved process for preparing printed circuit boards whereby through-holes are introduced into an element comprising a substrate, a photosensitive resist layer, and a superposed, strippable support. The through-holes are catalyzed prior to removal of the strippable support. After exposure the imaged photoresist is developed, the catalyzed-through-holes are electrolessly plated and the printed circuit is prepared using the developed image. Single sided, two or more layered printed circuit boards with plated-through-holes and interconnections can be prepared by this process.
    Type: Grant
    Filed: December 22, 1976
    Date of Patent: October 18, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Robert William Peiffer
  • Patent number: 4054452
    Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.
    Type: Grant
    Filed: June 18, 1976
    Date of Patent: October 18, 1977
    Assignee: American Can Company
    Inventors: Sheldon I. Schlesinger, Veronica Cochran
  • Patent number: 4054479
    Abstract: Printed circuit boards with plated through-holes are prepared by an electroless plating process using a self-supported, adherent, photohardenable sheet. The self-supported photohardenable sheet preferably is composed of a photopolymerizable material and may be a thick, homogeneous sheet or it may be a sheet reinforced with a foraminous material therein. The self-supported sheet is imagewise exposed to actinic radiation to form an adherent circuit pattern thereon comprising the unexposed areas. Through-holes are introduced into the pad areas of the circuit pattern, powdered catalyst is applied to the adherent pattern and through-holes and the catalytic image is plated in an electroless plating bath. The self-supported sheet may be used without additional catalyzing steps to make single sided, two-sided or multilayered printed circuit boards with plated throughholes and interconnections.
    Type: Grant
    Filed: December 22, 1976
    Date of Patent: October 18, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Robert William Peiffer
  • Patent number: 4054454
    Abstract: Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
    Type: Grant
    Filed: February 20, 1976
    Date of Patent: October 18, 1977
    Assignee: RCA Corporation
    Inventors: Richard Joseph Himics, Scott Oliver Graham, Daniel Louis Ross
  • Patent number: 4053317
    Abstract: A light-sensitive composition comprising of1. an N-nitroso compound having the general formula ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, are each a member selected from the group consisting of a monovalent hydrocarbon radical, a monovalent hydrocarbon radical attached to the nitrogen atom of amine through --SO.sub.2 --, and a group of the formula ##STR2## where X is a divalent hydrocarbon radical, and R.sup.3 is a monovalent hydrocarbon radical, which may be the same as R.sup.1 or different therefrom, which R.sup.1, R.sup.2 and R.sup.3 may have substituent groups, and R.sup.1 and R.sup.2 may together form, directly or by being bonded through an oxygen atom or nitrogen atom, a ring;2. a photopolymerization initiator; and3. a compound having a photopolymerizable ethylenic double bond in its molecule.
    Type: Grant
    Filed: January 19, 1976
    Date of Patent: October 11, 1977
    Assignee: Teijin Limited
    Inventors: Kiyomi Naka, Michisuke Oe
  • Patent number: 4053313
    Abstract: Image reproduction process utilizing an imagewise exposed photosensitive element comprising a solvent-processable photosensitive layer and a nonphotosensitive elastomeric tonable contiguous layer. Color proofs can be made by the process.
    Type: Grant
    Filed: May 13, 1976
    Date of Patent: October 11, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Roxy N. Fan
  • Patent number: 4053415
    Abstract: A polyester ether containing in its main chain the moiety represented by the formula:--R.sub.2 OArR.sub.3 COO--wherein Ar is an arylene group, R.sub.2 is an alkylene group or an oxaalkylene group, and R.sub.3 is a vinylene group, a butadienylene group or a vinylene or a butadienylene group substituted by one or more groups containing not more than 6 carbon atoms. A light-sensitive composition containing the above polyester ether is also disclosed.
    Type: Grant
    Filed: January 9, 1976
    Date of Patent: October 11, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 4052367
    Abstract: Radiation sensitive polymers comprising:A. from about 1 to 100 mole percent of a polymerized monomer having the formula ##STR1## wherein R is a hydrocarbon group having from 2 to 20 carbon atoms, preferably a bridged hydrocarbon group having from 6 to 10 carbon atoms; andB. from 0 to about 99 mole percent of at least one additional polymerized ethylenically unsaturated monomer are advantageously soluble in organic solvents, possess desirably high glass transition temperatures and are capable of undergoing a photochemical reaction to yield polymers having isocyanate and oxy-substituted cyclopropane moieties which are capable of crosslinking in the presence of active hydrogen-containing compounds. The polymers are useful in radiation sensitive compositions and elements containing same.
    Type: Grant
    Filed: October 14, 1975
    Date of Patent: October 4, 1977
    Assignee: Eastman Kodak Company
    Inventor: John Charles Wilson
  • Patent number: 4050936
    Abstract: An image forming process which comprises image-wise exposing a photosensitive material to light, the photosensitive material comprising a support and a substrate with a photopolymerizable material therebetween, and stripping off the support to leave either exposed areas or non-exposed areas of the photopolymerizable material on the substrate, in which the photopolymerizable material is characterized by comprising at least two different photopolymerizable layers which each comprise one or more addition polymerizable monomers, one or more photopolymerization initiators and one or more binders, which photopolymerizable layers are placed adjacent the support and the substrate, wherein at least one of the ingredients or the ratio of the ingredients of the photopolymerizable layers is different in at least the two different photopolymerizable layers, and the photopolymerizable layers have the relationship of C>A>B and C'>B'>A' or C>B>A and C'>A'>B', wherein:A is the adhesive strength between
    Type: Grant
    Filed: December 29, 1975
    Date of Patent: September 27, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiji Takeda, Masataka Murata, Teppei Ikeda
  • Patent number: 4050942
    Abstract: Described are photopolymerizable compositions containingA. an ethylenically unsaturated compound,B. about 3-95% by weight of an organic polymeric binder,C. about 0.1-5% by weight of a nitroso dimer which is a noninhibitor of free-radical polymerization but thermally dissociates to nitroso monomer which is an inhibitor of free-radical polymerization, andD. about 0.1-2% by weight of an organic, radiation-sensitive, free-radical generating system.Positive-working, contour images are formed by applying a layer of this composition to a substrate, imagewise exposing the photopolymerizable layer to actinic radiation through an image-bearing transparency at about 20.degree.-65.degree. C, whereby free-radicals are consumed by nitroso monomer, deactivating the nitroso dimer inhibitor system, reexposing at least the unexposed portion of the photopolymerizable layer to actinic radiation while continuing to maintain the nitroso dimer inhibitor system in the deactivated state, and developing the resulting image.
    Type: Grant
    Filed: May 21, 1976
    Date of Patent: September 27, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: George Raymond Nacci
  • Patent number: 4050941
    Abstract: Photohardenable coating compositions containingA. a substantially solid, organic composition comprising a nongaseous, ethylenically unsaturated compound,B. a tetracyanoethane compound, andC. an organic, radiation-sensitive free radical generating system provide high resolution films and coatings such as photoresist coatings on substrates.
    Type: Grant
    Filed: December 20, 1976
    Date of Patent: September 27, 1977
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Jose Francisco Pazos
  • Patent number: 4051271
    Abstract: Syndiotactic poly(methyl methacrylate) obtained by radical polymerization mixed with isotactic poly(methyl methacrylate) obtained by anionic polymerization so that the ratio by weight of the syndiotactic component to the isotactic component is from 2:8 to 8:2 and the mixture is dissolved homogeneously in a non-polar solvent such as benzene or toluene. The resist composition thus obtained is applied onto a substrate to form a photosensitive element which is then exposed to electron rays to cause depolymerization of the polymer in the exposed areas and developed with an organic solvent to form an image which is excellent in contrast and resolving power and devoid of pinholes.
    Type: Grant
    Filed: March 18, 1976
    Date of Patent: September 27, 1977
    Assignee: Director-General of the Agency of Industrial Science and Technology
    Inventor: Shoei Fujishige
  • Patent number: 4049457
    Abstract: Photosensitive compositions containing nitrate ester chain polymers, such as nitrocellulose, molecularly intimately admixed with at least one compound having a free basic amine group, preferably a primary amine group, directly attached to an aromatic ring carbon and also containing an organic acid. On suitable exposure to ultraviolet light, such compositions will print out a useful image directly, or, should a much lesser light exposure be preferred, they can be developed and fixed to an image intensified to useful strength by either heat alone, for amines that are sufficiently volatile at ingredient reaction temperatures, or by solvent selective removal of ingredients from unexposed areas, and subsequently intensified either by heat or overall ultraviolet exposure. Exposed areas of such compositions are more resistant both to volatilization of the amines and to solvent removal than the non-exposed areas. High optical density is attainable using very thin coatings, permitting high resolution grainless images.
    Type: Grant
    Filed: October 27, 1976
    Date of Patent: September 20, 1977
    Assignee: Bard Laboratories, Inc.
    Inventors: John F. Rice, Albert P. Yundt, Kenneth J. Quast
  • Patent number: 4047963
    Abstract: It has been found that printing elements can be prepared from a water-soluble photopolymer composition comprising (1) a water-soluble thermoplastic ethylene oxide copolymer containing 50-96% ethylene oxide, (2) from about 0.5 to about 25% by weight based on the ethylene oxide copolymer of an ethylenically unsaturated monomer having its unsaturation in the form of at least two ##STR1## groups, wherein R is hydrogen or a C.sub.1 -C.sub.3 alkyl group, and (3) from about 0.1 to about 10% by weight based on the ethylene oxide copolymer of a photoinitiator thermally stable at temperatures up to about 150.degree. C. The above described photopolymer composition can be thermoformed, such as by extrusion or compression molding.
    Type: Grant
    Filed: June 17, 1976
    Date of Patent: September 13, 1977
    Assignee: Hercules Incorporated
    Inventor: David A. Simpson
  • Patent number: 4048146
    Abstract: Radiation sensitive polymers comprising:A. from about 1 to 100 mole percent of a polymerized monomer having the formula ##STR1## wherein R is a hydrocarbon group having from 2 to 20 carbon atoms, preferably a bridged hydrocarbon group having from 6 to 10 carbon atoms; andB. from 0 to about 99 mole percent of at least one additional polymerized ethylenically unsaturated monomer are advantageously soluble in organic solvents, possess desirably high glass transition temperatures and are capable of undergoing a photochemical reaction to yield polymers having isocyanate and oxy-substituted cyclopropane moieties which are capable of crosslinking in the presence of active hydrogen-containing compounds. The polymers are useful in radiation sensitive compositions and elements containing same.
    Type: Grant
    Filed: December 20, 1976
    Date of Patent: September 13, 1977
    Assignee: Eastman Kodak Company
    Inventor: John Charles Wilson
  • Patent number: 4048035
    Abstract: A photopolymerizable composition for image formation, which comprises 30 - 95 wt. % of an unsaturated polyester having an acid value of 5 - 100 which is the condensation product of a carboxylic acid component containing more than 40 mole % of a carboxylic acid compound having the formula ##STR1## wherein R.sub.1 represents hydrogen or a C.sub.1-4 lower alkyl with a polyol component containing more than 30 mole % of a polyol having the formula ##STR2## wherein R.sub.2 represents C.sub.2-4 alkylene or a derivative thereof and n is an integer of 2 - 5 and 70 - 5 wt. % of a photopolymerizable unsaturated monomer and a photosensitizer.
    Type: Grant
    Filed: December 17, 1975
    Date of Patent: September 13, 1977
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Fumio Ide, Tsuneo Kodama