Submerged Inlet For Subsurface Contact Patents (Class 96/351)
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Patent number: 4086210Abstract: Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.Type: GrantFiled: May 10, 1976Date of Patent: April 25, 1978Assignee: Eastman Kodak CompanyInventor: Constantine Chris Petropoulos
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Patent number: 4086090Abstract: The present invention affords a process for forming a pattern having a surface area substantially equal to or smaller than area of apertures of shadow-mask through which beams pass on a photoresist film, which contains an acrylamidediacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound, by exposing said photoresist film to light through a mask having the pattern and then developing the film.The use of said photoresist film for the preparation of a phosphor screen of a color picture tube of a black matrix or black stripe type does not require a special technique such as post-etching of a shadow mask and makes it possible to form a three primary color phosphor pattern having a surface area substantially equal to or smaller than the area of apertures of the shadow mask through which lightbeams pass, without mutual "bridging" between phosphor dots. Thus, an excellent phosphor screen of a color picture tube of a black matrix or black stripe type can be prepared.Type: GrantFiled: September 22, 1975Date of Patent: April 25, 1978Assignee: Hitachi, Ltd.Inventors: Takahiro Kohashi, Motoo Akagi, Yoichi Oba, Saburo Nonogaki, Makoto Tanaka, Tadao Kaneko, Yoshifumi Tomita
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Patent number: 4086093Abstract: A laminated negative acting presensitized planographic printing plate for use in dry planography having(a) a base layer.(b) a silicone rubber layer overlying the base layer, and(c) a photoadhesive layer overlying the silicone rubber layer comprising at least one photopolymerizable unsaturated compound having a boiling point above 100.degree. C and a photoinitiator.Under exposure to light through a negative transparency, the photoadhesive layer polymerizes in the exposed image area and adheres to the underlying silicone rubber layer, while remaining non-adhesive to the underlying silicone rubber layer in the unexposed non-image area.The unexposed photoadhesive layer only is removed to bare the underlying silicone rubber layer which is made an ink-repellent non-image area and the photoadhesive layer remaining in the exposed area is made an ink-receptive image area.Type: GrantFiled: August 11, 1976Date of Patent: April 25, 1978Assignee: Toray Industries, Inc.Inventors: Yuh Ezumi, Masaharu Kobayashi, Takashi Kubota, Yoichi Shimokawa
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Patent number: 4085019Abstract: Novel amides, preferably having a molecular weight in the range 1000 to 10,000, are prepared by acylating, partially or fully, amino groups in poly(ethylene imine) or poly(propylene imine) whereby amino-hydrogen atoms are replaced by groups R.sup.3 CH.dbd.CR.sup.2 CO--, where R.sup.3 denotes an aliphatic, cycloaliphatic, araliphatic, or heterocyclic group containing ethylenic unsaturation in conjugation with the indicated double bond and R.sup.2 denotes a hydrogen, chlorine, or bromine atom, a cyano group, or an alkyl group. Particularly preferred are such amides where R.sup.3 CH.dbd.CR.sup.2 CO-- denotes a sorbyl group and containing additional intramolecular linkages introduced by a difunctional reagent capable of reacting with aliphatic amino groups, such as a diepoxide or a di-isocyanate.The amides may be polymerized by means of actinic radiation and are useful in the preparation of printing plates and printed circuits.Type: GrantFiled: June 19, 1975Date of Patent: April 18, 1978Assignee: Ciba-Geigy CorporationInventor: George Edward Green
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Patent number: 4081276Abstract: A method is described for forming an image or design on the surface of a substrate by treating the substrate with a photoinitiator, such as triphenylsulfonium hexafluoroantimonate. A mask can be placed on the treated substrate which is exposed to radiant energy, resulting in the formation of a cationic polymerization catalyst on the exposed substrate surface. The substrate can then be contacted with a cationically polymerizable organic material, such as an epoxy resin, resulting in the formation of an adherent organic film on the surface of the substrate which has been exposed.Type: GrantFiled: October 18, 1976Date of Patent: March 28, 1978Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 4081282Abstract: A dry system for forming and transferring images is provided. The system comprises a photoactive component comprising a tacky photohardenable layer on a selected carrier sheet and a transfer component comprising a frangible color layer on a selected carrier sheet. The two components are disposed with their photohardenable and color layers in air-free contact with one another and then subjected to irradiation with actinic radiation in accordance with a selected image pattern so as to cause selected portions of the photohardenable layer to harden and fuse to confronting portions of the color layer. Then the two components are separated whereby the fused portions of the color layer are separated from its carrier sheet and transferred to the photoactive component. Thereafter the color layer remaining on the transferable component is coated with a pressure-sensitive adhesive.Type: GrantFiled: November 3, 1975Date of Patent: March 28, 1978Assignee: Seal IncorporatedInventors: Richard E. Merrill, Theodore H. Krueger
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Patent number: 4080274Abstract: Polymerization of polymerizable compositions comprising mixtures of lactones with monomeric or prepolymeric epoxides is effected by mixing such compositions with radiation-sensitive aromatic diazonium salts which decompose upon application of energy such as electromagnetic radiation to release Lewis Acid to initiate polymerization of said monomers.Type: GrantFiled: June 10, 1975Date of Patent: March 21, 1978Assignee: American Can CompanyInventor: Sheldon Irwin Schlesinger
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Patent number: 4078494Abstract: A letter press printing plate is disclosed for wrapping around a drum. The printing surface is formed with a light-sensitive material layer on a metal backing plate with two different levels, the high level representing areas of solid or dark tones of printing and the low level representing areas of light tones of printing. The printing plate overcomes the problem of even transfer of ink from the solid or dark tones of printing areas and the light tones of printing areas. A method of forming the letter press printing plate is also disclosed wherein a photo polymer layer on a backing plate is first exposed to a negative representing areas of solid or dark tones and light tones of printing. The photo polymer layer is then dissolved away to the backing plate in areas where no printing occurs and formed into a two-level printing surface with the areas of solid or dark tones being at a high level and the areas of light tones being at a low level.Type: GrantFiled: February 4, 1976Date of Patent: March 14, 1978Assignee: STANMont, Inc.Inventor: Howard W. Gregory
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Patent number: 4079159Abstract: A novel original plate for producing matrix which has improved strength, mold releasability and dimensional stability during production of matrices consists of a laminated structure of a metal base, a bonding layer, a relief supporting layer and a relief of a photo-polymerized resin, said relief supporting layer comprising a resin similar to that of the relief or having a high affinity with that of the relief.Type: GrantFiled: August 11, 1975Date of Patent: March 14, 1978Assignee: Sumitomo Chemical Company, LimitedInventors: Takezo Sano, Tadanori Inoue
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Patent number: 4078098Abstract: The development of high energy radiation exposed positive acrylate polymer resist layers by organic liquid developers, such as methyl isobutyl ketone, is improved by adding water to the ketone.Type: GrantFiled: May 28, 1974Date of Patent: March 7, 1978Assignee: International Business Machines CorporationInventor: Charles A. Cortellino
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Patent number: 4078102Abstract: Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.Type: GrantFiled: October 29, 1976Date of Patent: March 7, 1978Assignee: International Business Machines CorporationInventors: Diana Jean Bendz, Gerald Andrei Bendz
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Patent number: 4075367Abstract: A method of providing improved adherence of photoresist to a silicon nitride layer on a semiconductor wafer by first preparing a heated solution of trichlorophenylsilane, immersing the nitride coated wafer in the trichlorophenylsilane solution, drying and baking the wafer prior to the application of the photoresist.Type: GrantFiled: March 18, 1976Date of Patent: February 21, 1978Assignee: NCR CorporationInventor: Michael R. Gulett
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Patent number: 4075015Abstract: A light sensitive mass which contains a film former, which consists of 20 to 90 percent by weight of a vinylpyrrolidone-vinyl acetate copolymer or a polyvinyl pyrrolidone or both and 10 to 80 percent by weight of an aryl sulfone amide formaldehyde resin, and at least one sensitizer, the weight ratio of said film former to sensitizer being between 1:1 and 10:1. Usually the light sensitive mass is used as a light sensitive reversal-development layer on a carrier.Type: GrantFiled: August 16, 1976Date of Patent: February 21, 1978Assignee: Swiss Aluminium Ltd.Inventors: Josef Vinkovic, Eugen Werner
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Patent number: 4074008Abstract: Epoxide resins, which polymerize on exposure to actinic radiation, have, per average molecule, at least two photopolymerizable groups and also at least two 1,2-epoxide groups, one or more such epoxide groups being contained in units of formula ##STR1## Photopolymerizable epoxide resins are commonly prepared by introduction of photopolymerizable groups into a molecule of an epoxide resin by reaction with some of the epoxide groups: the modified resin, having a low epoxide group content, usually exhibits poorer adhesion and lower glass transition temperature than would otherwise be the case. In the new resins, secondary hydroxyl groups generated on introduction of the photopolymerizable groups have been converted into glycidyl ether groups, thus they have a higher epoxide content.Type: GrantFiled: August 3, 1976Date of Patent: February 14, 1978Assignee: Ciba-Geigy CorporationInventor: George E. Green
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Patent number: 4072527Abstract: Photopolymerizable elements are provided which comprise: (1) A support, (2) an addition polymerizable photosensitive layer, and (3) a solid, water-permeable, oxygen barrier protective layer, non-strippable as an unsupported film, said layer covering the entire photosensitive layer and being coated from an aqueous solution of a water-soluble macromolecular organic polymer or copolymer, e.g., polyvinyl alcohol, having dispersed therein, finely divided solid particles of a water-insoluble polymer or copolymer selected from acrylic and alkacrylic polymers or copolymers and mixtures thereof, and copolymers of vinyl pyrrolidone and vinyl acetate.Type: GrantFiled: June 3, 1976Date of Patent: February 7, 1978Assignee: E. I. Du Pont de Nemours and CompanyInventor: Roxy N. Fan
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Patent number: 4072528Abstract: Photopolymerizable elements are provided which comprise: (1) A support, (2) an addition polymerizable photosensitive layer, and (3) a solid, water-permeable, oxygen barrier protective layer, nonstrippable as an unsupported film, said layer covering the entire photosensitive layer and being coated from an aqueous solution of a water-soluble macromolecular organic polymer or copolymer, e.g., polyvinyl alcohol, having dispersed therein, finely divided solid particles of a water-insoluble chlorinated vinyl polymer or copolymer.Type: GrantFiled: June 3, 1976Date of Patent: February 7, 1978Assignee: E. I. Du Pont de Nemours and CompanyInventor: Martin D. Bratt
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Patent number: 4072524Abstract: The invention provides mixtures based on resins containing allyl groups and being solid at room temperature, useful for the preparation of thermally stable, photo-crosslinkable layers and foils. According to the invention, such mixtures comprise triallylcyanurate prepolymers and/or triallylcyanurate precopolymers with compounds containing allyloxy and/or allylester groups, and compounds with at least one N-maleimide group, wherein the C.dbd.C double bond of the N-maleimide groups are bonded to hydrogen, hydrogen and chlorine or hydrogen and methyl radicals. Preferably, the N-maleimide C.dbd.C bonds carry hydrogen.Type: GrantFiled: December 3, 1975Date of Patent: February 7, 1978Assignee: Siemens AktiengesellschaftInventors: Wolfgang Kleeberg, Roland Rubner, Wieland Bartel
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Patent number: 4072529Abstract: A negative-working, reversibly gelled composition is disclosed, suitable for use as the photocurable component in a blank for preparation of an article in relief, such as a printing plate. Uncured portions of the composition are removed with an aqueous solution following imagewise modulated exposure of such a blank to actinic radiation. The composition comprises a first organic polymer bearing per molecule, at least one ethylenically unsaturated group which is polymerizable by a free radical source; and a second organic polymer bearing per molecule, at least two Z groups, Z being a primary hydroxyl or a mercapto group, with the proviso that when said first organic polymer bears at least two Z groups per molecule, said second organic polymer may be omitted; said Z groups being reacted by contact with a dialdehyde to produce the reversibly gelled composition.Type: GrantFiled: August 20, 1975Date of Patent: February 7, 1978Assignee: The Dow Chemical CompanyInventors: Clayton W. Hoornstra, Violete L. Stevens
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Patent number: 4069055Abstract: Cationic polymerization of epoxy resin such as epoxy monomers or prepolymers, can be achieved by use of certain radiation sensitive aromatic onium salts of Group Va elements. Curable compositions are provided which can be used as sealants, coating compounds, encapsulants, etc.Type: GrantFiled: December 9, 1975Date of Patent: January 17, 1978Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 4069056Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic amines, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group Va elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.Type: GrantFiled: December 9, 1975Date of Patent: January 17, 1978Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 4065307Abstract: An imaging system comprising providing an imaging member comprising an agglomerable layer in contact with an imagewise hardenable-softenable layer and imagewise hardening said member. An image is developed by imagewise softening said member to cause relative transparentizing in the imagewise softened areas due to an agglomeration of the agglomerable layer in the imagewise softened portions of said member.Type: GrantFiled: March 2, 1973Date of Patent: December 27, 1977Assignee: Xerox CorporationInventor: William L. Goffe
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Patent number: 4064287Abstract: Highly durable coatings are formed by the photopolymerization of screen printing inks containing aryloxyalkyl acrylate monomers or prepolymers, a polymerizable diluent and a free-radical initiating system, such inks having a viscosity of 5,000 to 200,000 centipoises and a thixotropic index of from 1 to 6. The photopolymerizable inks are useful for coating substrates, such as printed circuits, and serve as solder masks and resists for electroless plating, electroplating and etching.Type: GrantFiled: June 1, 1976Date of Patent: December 20, 1977Assignee: Dynachem CorporationInventors: Melvin A. Lipson, Dale W. Knoth, Walter D. Custer, Michael N. Gilano
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Patent number: 4061832Abstract: A positive-working electron resist which comprises a film-forming co-polymer B-D which is cross-linkable by carboxylic acid anhydride groups. The co-polymer B-D is formed from an unsaturated organic compound B and an unsaturated carboxylic acid chloride D. The cross-links are formed by heating a film of the resist in a moist atmosphere, some of the carboxylic acid chloride groups being hydrolysed so as to form carboxylic acid groups, at least some of these carboxylic acid groups reacting with carboxylic acid groups of different molecules of the co-polymer B-D so as to form carboxylic acid anhydride bridge links between these different molecules. The cross-linked material is insoluble in solvents in which the monomers B and D and the co-polymer B-D are normally soluble.Type: GrantFiled: March 19, 1976Date of Patent: December 6, 1977Assignee: U.S. Philips CorporationInventor: Edward D. Roberts
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Patent number: 4061829Abstract: A class of chlorinated or brominated polymeric negative resists for high resolution X-ray or electron lithographic processes is described. Chlorine and bromine atoms have a generally high mass absorption coefficient for X-rays and can be incorporated into the polymer in high weight percents. The chlorinated resists are especially sensitive to the 4.37 Angstrom characteristic X-rays from a Pd target.Type: GrantFiled: April 26, 1976Date of Patent: December 6, 1977Assignee: Bell Telephone Laboratories, IncorporatedInventor: Gary Newton Taylor
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Patent number: 4058443Abstract: A recording material comprising a support having coated thereon a layer of a photopolymerizable composition comprising (a) a chlorinated polyolefin, (b) a monomer having at least one addition-polymerizable unsaturated bond, (c) a photo-polymerization initiator, and (d) a polymeric material having a molecular weight above about 10,000 is described. This recording material is suited for use as a photoresist material, particularly for tenting.Type: GrantFiled: December 29, 1975Date of Patent: November 15, 1977Assignee: Fuji Photo Film Co., Ltd.Inventors: Masataka Murata, Keiji Takeda, Teppei Ikeda
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Patent number: 4058398Abstract: A recording material comprising a support, a layer of a light-sensitive composition on the support, and a transparent film on the layer of the light-sensitive composition wherein the light-sensitive composition comprises (a) a monomer containing at least two addition polymerizable unsaturated bonds and having a boiling point of at least 100.degree. C, (b) polyvinyl butyral, and (c) a photopolymerization initiator represented by the formula: ##STR1## wherein R.sub.1 is an alkyl group which may be substituted or a vinyl-methyl group, R.sub.2 is an alkyl group, aryl group, or thienyl group, and Z is a group of non-metallic atoms required for forming a heterocyclic ring.After the recording material is imagewise exposed to light, the transparent film is peeled off while heating at about 70.degree. to 150.degree. C, whereby a positive or negative image is formed on each of the support and transparent film.Type: GrantFiled: September 29, 1975Date of Patent: November 15, 1977Assignee: Fuji Photo Film Co., Ltd.Inventors: Chiaki Osada, Eiichi Hasegawa, Masataka Murata
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Patent number: 4058401Abstract: Cationic polymerization of epoxy resin materials, such as epoxy monomers or prepolymers, can be achieved by use of certain radiation sensitive aromatic onium salts of Group VIa elements. Curable compositions are provided which can be used as sealants, coating compounds, encapsulants, etc.Type: GrantFiled: December 9, 1975Date of Patent: November 15, 1977Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 4058400Abstract: Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters, cyclic sulfides and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic onium salts of Group VIa elements. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives, etc.Type: GrantFiled: December 9, 1975Date of Patent: November 15, 1977Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 4057431Abstract: A liquid ethylenically unsaturated polurethane composition having no free NCO and a viscosity of 2,000 to 10,000 centipoises at 24.degree. C. dispersible in dilute caustic and capable of being polymerized by actinic light to yield a solid having a Shore A hardness of at least 30. Said composition may contain a diluent and a photosensitizing agent to adjust the viscosity and making the composition more readily utilizable for making printing plates.Type: GrantFiled: September 29, 1975Date of Patent: November 8, 1977Assignee: The Goodyear Tire & Rubber CompanyInventors: Anthony F. Finelli, Shirish Jasani, Columbus Williams, Jr.
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Patent number: 4056393Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.Type: GrantFiled: June 17, 1976Date of Patent: November 1, 1977Assignee: American Can CompanyInventors: Sheldon I. Schlesinger, Veronica Cochran
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Patent number: 4055424Abstract: Microfilm structures of improved contrast are provided by coating a suitable transparent film substrate with an intermediate layer of a silicone elastomer which is abhesive to ink, coating said silicone with a surface layer of a photosensitive polymer which when exposed to activating electromagnetic radiation cross-links and chemically attaches to said silicone elastomer to form oleophilic ink accepting image areas, imagewise exposing said photosensitive polymer, removing the non-exposed, light sensitive polymer to form non-imaged areas of the abhesive silicone elastomer, and selectively inking the oleophilic image areas to form an imaged microfilm structure of improved image density and contrast.Type: GrantFiled: May 7, 1976Date of Patent: October 25, 1977Assignee: Xerox CorporationInventors: Joseph Yung-Chang Chu, Richard Louis Schank
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Patent number: 4055515Abstract: This composition includes 50 to 85% by weight water, 10 to 25% relatively non-volatile inert organic solvent, 0.1 to 5% of a medium foamer detergent and 5 to 15% of a N-alkyl-2-pyrrolidone lubricant.Type: GrantFiled: December 31, 1975Date of Patent: October 25, 1977Assignee: Borden, Inc.Inventor: John Nicholas Kirch
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Patent number: 4054451Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.Type: GrantFiled: June 17, 1976Date of Patent: October 18, 1977Assignee: American Can CompanyInventors: Sheldon I. Schlesinger, Veronica Cochran
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Patent number: 4054635Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.Type: GrantFiled: June 17, 1976Date of Patent: October 18, 1977Assignee: American Can CompanyInventors: Sheldon I. Schlesinger, Veronica Cochran
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Patent number: 4054483Abstract: An improved process for preparing printed circuit boards whereby through-holes are introduced into an element comprising a substrate, a photosensitive resist layer, and a superposed, strippable support. The through-holes are catalyzed prior to removal of the strippable support. After exposure the imaged photoresist is developed, the catalyzed-through-holes are electrolessly plated and the printed circuit is prepared using the developed image. Single sided, two or more layered printed circuit boards with plated-through-holes and interconnections can be prepared by this process.Type: GrantFiled: December 22, 1976Date of Patent: October 18, 1977Assignee: E. I. Du Pont de Nemours and CompanyInventor: Robert William Peiffer
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Patent number: 4054452Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.Type: GrantFiled: June 18, 1976Date of Patent: October 18, 1977Assignee: American Can CompanyInventors: Sheldon I. Schlesinger, Veronica Cochran
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Patent number: 4054479Abstract: Printed circuit boards with plated through-holes are prepared by an electroless plating process using a self-supported, adherent, photohardenable sheet. The self-supported photohardenable sheet preferably is composed of a photopolymerizable material and may be a thick, homogeneous sheet or it may be a sheet reinforced with a foraminous material therein. The self-supported sheet is imagewise exposed to actinic radiation to form an adherent circuit pattern thereon comprising the unexposed areas. Through-holes are introduced into the pad areas of the circuit pattern, powdered catalyst is applied to the adherent pattern and through-holes and the catalytic image is plated in an electroless plating bath. The self-supported sheet may be used without additional catalyzing steps to make single sided, two-sided or multilayered printed circuit boards with plated throughholes and interconnections.Type: GrantFiled: December 22, 1976Date of Patent: October 18, 1977Assignee: E. I. Du Pont de Nemours and CompanyInventor: Robert William Peiffer
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Patent number: 4054454Abstract: Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.Type: GrantFiled: February 20, 1976Date of Patent: October 18, 1977Assignee: RCA CorporationInventors: Richard Joseph Himics, Scott Oliver Graham, Daniel Louis Ross
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Patent number: 4053317Abstract: A light-sensitive composition comprising of1. an N-nitroso compound having the general formula ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, are each a member selected from the group consisting of a monovalent hydrocarbon radical, a monovalent hydrocarbon radical attached to the nitrogen atom of amine through --SO.sub.2 --, and a group of the formula ##STR2## where X is a divalent hydrocarbon radical, and R.sup.3 is a monovalent hydrocarbon radical, which may be the same as R.sup.1 or different therefrom, which R.sup.1, R.sup.2 and R.sup.3 may have substituent groups, and R.sup.1 and R.sup.2 may together form, directly or by being bonded through an oxygen atom or nitrogen atom, a ring;2. a photopolymerization initiator; and3. a compound having a photopolymerizable ethylenic double bond in its molecule.Type: GrantFiled: January 19, 1976Date of Patent: October 11, 1977Assignee: Teijin LimitedInventors: Kiyomi Naka, Michisuke Oe
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Patent number: 4053313Abstract: Image reproduction process utilizing an imagewise exposed photosensitive element comprising a solvent-processable photosensitive layer and a nonphotosensitive elastomeric tonable contiguous layer. Color proofs can be made by the process.Type: GrantFiled: May 13, 1976Date of Patent: October 11, 1977Assignee: E. I. Du Pont de Nemours and CompanyInventor: Roxy N. Fan
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Patent number: 4053415Abstract: A polyester ether containing in its main chain the moiety represented by the formula:--R.sub.2 OArR.sub.3 COO--wherein Ar is an arylene group, R.sub.2 is an alkylene group or an oxaalkylene group, and R.sub.3 is a vinylene group, a butadienylene group or a vinylene or a butadienylene group substituted by one or more groups containing not more than 6 carbon atoms. A light-sensitive composition containing the above polyester ether is also disclosed.Type: GrantFiled: January 9, 1976Date of Patent: October 11, 1977Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
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Patent number: 4052367Abstract: Radiation sensitive polymers comprising:A. from about 1 to 100 mole percent of a polymerized monomer having the formula ##STR1## wherein R is a hydrocarbon group having from 2 to 20 carbon atoms, preferably a bridged hydrocarbon group having from 6 to 10 carbon atoms; andB. from 0 to about 99 mole percent of at least one additional polymerized ethylenically unsaturated monomer are advantageously soluble in organic solvents, possess desirably high glass transition temperatures and are capable of undergoing a photochemical reaction to yield polymers having isocyanate and oxy-substituted cyclopropane moieties which are capable of crosslinking in the presence of active hydrogen-containing compounds. The polymers are useful in radiation sensitive compositions and elements containing same.Type: GrantFiled: October 14, 1975Date of Patent: October 4, 1977Assignee: Eastman Kodak CompanyInventor: John Charles Wilson
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Patent number: 4050936Abstract: An image forming process which comprises image-wise exposing a photosensitive material to light, the photosensitive material comprising a support and a substrate with a photopolymerizable material therebetween, and stripping off the support to leave either exposed areas or non-exposed areas of the photopolymerizable material on the substrate, in which the photopolymerizable material is characterized by comprising at least two different photopolymerizable layers which each comprise one or more addition polymerizable monomers, one or more photopolymerization initiators and one or more binders, which photopolymerizable layers are placed adjacent the support and the substrate, wherein at least one of the ingredients or the ratio of the ingredients of the photopolymerizable layers is different in at least the two different photopolymerizable layers, and the photopolymerizable layers have the relationship of C>A>B and C'>B'>A' or C>B>A and C'>A'>B', wherein:A is the adhesive strength betweenType: GrantFiled: December 29, 1975Date of Patent: September 27, 1977Assignee: Fuji Photo Film Co., Ltd.Inventors: Keiji Takeda, Masataka Murata, Teppei Ikeda
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Patent number: 4050942Abstract: Described are photopolymerizable compositions containingA. an ethylenically unsaturated compound,B. about 3-95% by weight of an organic polymeric binder,C. about 0.1-5% by weight of a nitroso dimer which is a noninhibitor of free-radical polymerization but thermally dissociates to nitroso monomer which is an inhibitor of free-radical polymerization, andD. about 0.1-2% by weight of an organic, radiation-sensitive, free-radical generating system.Positive-working, contour images are formed by applying a layer of this composition to a substrate, imagewise exposing the photopolymerizable layer to actinic radiation through an image-bearing transparency at about 20.degree.-65.degree. C, whereby free-radicals are consumed by nitroso monomer, deactivating the nitroso dimer inhibitor system, reexposing at least the unexposed portion of the photopolymerizable layer to actinic radiation while continuing to maintain the nitroso dimer inhibitor system in the deactivated state, and developing the resulting image.Type: GrantFiled: May 21, 1976Date of Patent: September 27, 1977Assignee: E. I. Du Pont de Nemours and CompanyInventor: George Raymond Nacci
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Patent number: 4050941Abstract: Photohardenable coating compositions containingA. a substantially solid, organic composition comprising a nongaseous, ethylenically unsaturated compound,B. a tetracyanoethane compound, andC. an organic, radiation-sensitive free radical generating system provide high resolution films and coatings such as photoresist coatings on substrates.Type: GrantFiled: December 20, 1976Date of Patent: September 27, 1977Assignee: E. I. Du Pont de Nemours and CompanyInventor: Jose Francisco Pazos
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Patent number: 4051271Abstract: Syndiotactic poly(methyl methacrylate) obtained by radical polymerization mixed with isotactic poly(methyl methacrylate) obtained by anionic polymerization so that the ratio by weight of the syndiotactic component to the isotactic component is from 2:8 to 8:2 and the mixture is dissolved homogeneously in a non-polar solvent such as benzene or toluene. The resist composition thus obtained is applied onto a substrate to form a photosensitive element which is then exposed to electron rays to cause depolymerization of the polymer in the exposed areas and developed with an organic solvent to form an image which is excellent in contrast and resolving power and devoid of pinholes.Type: GrantFiled: March 18, 1976Date of Patent: September 27, 1977Assignee: Director-General of the Agency of Industrial Science and TechnologyInventor: Shoei Fujishige
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Patent number: 4049457Abstract: Photosensitive compositions containing nitrate ester chain polymers, such as nitrocellulose, molecularly intimately admixed with at least one compound having a free basic amine group, preferably a primary amine group, directly attached to an aromatic ring carbon and also containing an organic acid. On suitable exposure to ultraviolet light, such compositions will print out a useful image directly, or, should a much lesser light exposure be preferred, they can be developed and fixed to an image intensified to useful strength by either heat alone, for amines that are sufficiently volatile at ingredient reaction temperatures, or by solvent selective removal of ingredients from unexposed areas, and subsequently intensified either by heat or overall ultraviolet exposure. Exposed areas of such compositions are more resistant both to volatilization of the amines and to solvent removal than the non-exposed areas. High optical density is attainable using very thin coatings, permitting high resolution grainless images.Type: GrantFiled: October 27, 1976Date of Patent: September 20, 1977Assignee: Bard Laboratories, Inc.Inventors: John F. Rice, Albert P. Yundt, Kenneth J. Quast
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Patent number: 4047963Abstract: It has been found that printing elements can be prepared from a water-soluble photopolymer composition comprising (1) a water-soluble thermoplastic ethylene oxide copolymer containing 50-96% ethylene oxide, (2) from about 0.5 to about 25% by weight based on the ethylene oxide copolymer of an ethylenically unsaturated monomer having its unsaturation in the form of at least two ##STR1## groups, wherein R is hydrogen or a C.sub.1 -C.sub.3 alkyl group, and (3) from about 0.1 to about 10% by weight based on the ethylene oxide copolymer of a photoinitiator thermally stable at temperatures up to about 150.degree. C. The above described photopolymer composition can be thermoformed, such as by extrusion or compression molding.Type: GrantFiled: June 17, 1976Date of Patent: September 13, 1977Assignee: Hercules IncorporatedInventor: David A. Simpson
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Patent number: 4048146Abstract: Radiation sensitive polymers comprising:A. from about 1 to 100 mole percent of a polymerized monomer having the formula ##STR1## wherein R is a hydrocarbon group having from 2 to 20 carbon atoms, preferably a bridged hydrocarbon group having from 6 to 10 carbon atoms; andB. from 0 to about 99 mole percent of at least one additional polymerized ethylenically unsaturated monomer are advantageously soluble in organic solvents, possess desirably high glass transition temperatures and are capable of undergoing a photochemical reaction to yield polymers having isocyanate and oxy-substituted cyclopropane moieties which are capable of crosslinking in the presence of active hydrogen-containing compounds. The polymers are useful in radiation sensitive compositions and elements containing same.Type: GrantFiled: December 20, 1976Date of Patent: September 13, 1977Assignee: Eastman Kodak CompanyInventor: John Charles Wilson
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Patent number: 4048035Abstract: A photopolymerizable composition for image formation, which comprises 30 - 95 wt. % of an unsaturated polyester having an acid value of 5 - 100 which is the condensation product of a carboxylic acid component containing more than 40 mole % of a carboxylic acid compound having the formula ##STR1## wherein R.sub.1 represents hydrogen or a C.sub.1-4 lower alkyl with a polyol component containing more than 30 mole % of a polyol having the formula ##STR2## wherein R.sub.2 represents C.sub.2-4 alkylene or a derivative thereof and n is an integer of 2 - 5 and 70 - 5 wt. % of a photopolymerizable unsaturated monomer and a photosensitizer.Type: GrantFiled: December 17, 1975Date of Patent: September 13, 1977Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Fumio Ide, Tsuneo Kodama