Abstract: A semiconductor device of the present invention includes a semiconductor layer of a first conductivity type having a cell portion and an outer peripheral portion disposed around the cell portion, formed with a gate trench at a surface side of the cell portion, and a gate electrode buried in the gate trench via a gate insulating film, forming a channel at a portion lateral to the gate trench at ON-time, the outer peripheral portion has a semiconductor surface disposed at a depth position equal to or deeper than a depth of the gate trench, and the semiconductor device further includes a voltage resistant structure having a semiconductor region of a second conductivity type formed in the semiconductor surface of the outer peripheral portion.

Abstract: A semiconductor device includes a semiconductor layer, a Schottky electrode that is formed at a first surface of the semiconductor layer and that forms a Schottky junction Sj between the semiconductor layer and the Schottky electrode, and the Schottky electrode has a first portion that is selectively formed near the first surface of the semiconductor layer in a thickness direction of the Schottky electrode and that is made of Ti containing oxygen. The Schottky electrode may have a second portion that is formed on the first portion and that is made of Ti and N.

Abstract: A support stage includes a base portion, a support portion that is erected at a peripheral edge portion of the base portion and with which one surface of a wafer is to be come into contact, a suction groove that is provided at the support portion and to which a suction force with respect to the one surface is to be given, an ejecting hole that is provided in an inward portion of the base portion and by which a gas is to be ejected toward the one surface, and an exhaust hole that is provided in at least either one of the base portion and the support portion and by which a gas is to be discharged from a space between the base portion, the support portion, and the one surface.

Abstract: A non-volatile storage device includes a memory that stores data in a non-volatile manner, a power supply that generates an internal voltage to feed it to the memory, a controller that controls the memory and the power supply, an A/D converter that performs A/D conversion on the internal voltage, and a fault detector that detects a fault related to data written in the memory based on the output of the A/D converter.

Abstract: A liquid crystal display device includes a pixel array including a plurality of rows of gate lines, a plurality of columns of source lines, a plurality of switches, and a plurality of liquid crystal cells; a gate driver IC connected to the gate lines; a source driver IC connected to the source lines; a timing control IC arranged to control operation timings of the gate driver IC and the source driver IC; and a system power supply IC arranged to supply a power supply voltage to the source driver IC. Each of the timing control IC and the system power supply IC has a function of detecting an abnormality in the gate driver IC and an abnormality in the source driver IC.

Abstract: A semiconductor device includes a conductive support member, a first semiconductor element, and a second semiconductor element. The conductive support member includes a first die pad and a second die pad separated from each other in a first direction. The first die pad and the second die pad overlap each other when viewed along the first direction. The first die pad has a first main surface mounting the first semiconductor element, and a first back surface opposing the first main surface. The second die pad has a second main surface mounting the second semiconductor element, and a second back surface opposing the second main surface. When viewed along a second direction, a distance in the first direction between the first back surface and the second back surface is larger than a distance in the first direction between the first main surface and the second main surface.

Abstract: A switch device includes an output transistor, an overcurrent protection circuit configured to be capable of performing an overcurrent protection operation in which magnitude of target current flowing in the output transistor is limited to a predetermined upper limit current value or less, and a control circuit configured to be capable of controlling a state of the output transistor and capable of changing the upper limit current value among a plurality of current values including a predetermined first current value and a predetermined second current value less than the first current value. The control circuit can limit the magnitude of the target current to the first current value or less in response to the magnitude of the target current reaching the first current value, and then change the upper limit current value to the second current value.

Abstract: A DCO is configured such that, during a period in which a selection signal is asserted, a ring oscillator is formed so as to oscillate at a frequency that corresponds to a control code, and such that, during a period in which the selection signal SEL is negated, an injection edge based on a reference clock can be injected. During the startup period of a PLL circuit, a controller repeats a cycle including (i) a process in which the selection signal is asserted so as to oscillate the DCO, and phase comparison is made between an oscillator clock and the reference clock, and (ii) a process in which the selection signal is negated so as to stop the DCO, and the control code is updated by a binary search based on a result of the phase comparison.

Abstract: A lamp control device comprises a first input terminal, a second input terminal, an output terminal that is configured to be connectable to a lamp via an external switch and outputs a drive current for the lamp, an internal switch provided on a first path connecting the first input terminal and the output terminal, a constant current section provided on a second path connecting the second input terminal and the output terminal, a voltage monitoring section that monitors a voltage applied to the output terminal, and a control section that controls the internal switch on the basis of a monitoring result from the voltage monitoring section.

Abstract: An electronic component includes an insulating layer, a low voltage conductor pattern formed inside the insulating layer, a high voltage conductor pattern formed inside the insulating layer such as to face the low voltage conductor pattern in an up/down direction, and a withstand voltage enhancement structure of conductive property formed inside the insulating layer and along the high voltage conductor pattern such as to protrude further outside than the low voltage conductor pattern in plan view.

Abstract: In a first light emission control device, a clock signal is generated, and after a first driving sequence starts to be performed in which the respective states of light-emitting elements in a first light-emitting element array are sequentially switched synchronously with the clock signal, at a particular time point a characteristic of the clock signal is changed from a first characteristic to a second characteristic. After the change, in a second light emission control device, a second driving sequence is performed in which the respective states of light-emitting elements in a second light-emitting element array are sequentially switched synchronously with the clock signal.

Abstract: A semiconductor module includes a semiconductor device and bus bar. The device includes an insulating substrate, conductive member, switching elements, and first/second input terminals. The substrate has main/back surfaces opposite in a thickness direction, with the conductive member disposed on the main surface. The switching elements are connected to the conductive member. The first input terminal, including a first terminal portion, is connected to the conductive member. The second input terminal, including a second terminal portion overlapping with the first terminal portion in the thickness direction, is connected to the switching elements. The second input terminal is separate from the first input terminal and conductive member in the thickness direction. The bus bar includes first/second terminals. The second terminal, separate from the first terminal in the thickness direction, partially overlaps with the first terminal in the thickness direction.

Abstract: For example, the switching drive device 100 includes a driver 30 configured to drive an N-type semiconductor switch element, a current limiter 50 configured to limit a current fed to a boot capacitor BC1 included in a bootstrap circuit BTC, and a current controller 60 configured to control the operation of the current limiter 50. The current controller 60 is configured to drive the current limiter 50 to limit the current fed to the boot capacitor BC1 when the charge voltage across the boot capacitor BC1 is higher than a threshold value.

Abstract: A semiconductor device includes an interlayer insulating film, and a wiring of an uppermost layer arranged on the interlayer insulating film, wherein the wiring includes a seed layer arranged on the interlayer insulating film and a wiring body portion arranged on the seed layer, wherein a constituent material of the wiring body portion is copper or a copper alloy, and wherein a trench is formed in an upper surface of the interlayer insulating film along an outer edge of the interlayer insulating film in a plan view.

Abstract: An SiC semiconductor device includes an SiC semiconductor chip that has a main surface, an n-type drift region that is formed in a surface layer portion of the main surface and has an impurity concentration adjusted by at least two types of pentavalent elements, and a p-type impurity region that is formed inside the drift region such as to form a pn-junction portion with the drift region.

Abstract: A semiconductor device, includes: a substrate having an obverse surface facing in a thickness direction; a first lead having a loading surface facing a side same as a side the obverse surface faces as to the thickness direction and being fixed on the obverse surface; and a first semiconductor element arranged on the loading surface. A dimension of the substrate in a first direction orthogonal to the thickness direction is larger than a dimension of the substrate in a second direction orthogonal to the thickness direction and the first direction. The first lead includes a first region overlapped with the first semiconductor element as viewed in the thickness direction and a second region separated from the first semiconductor element as viewed in the thickness direction, and at least a part of the second region extends along the second direction.

Abstract: A semiconductor device includes a semiconductor layer having a first surface, an insulating layer formed at the first surface of the semiconductor layer, a Cu conductive layer formed on the insulating layer, the Cu conductive layer made of a metal mainly containing Cu, a second insulating layer formed on the insulating layer, the second insulating layer covering the Cu conductive layer, a Cu pillar extending in a thickness direction in the second insulating layer, the Cu pillar made of a metal mainly containing Cu and electrically connected to the Cu conductive layer, and an intermediate layer formed between the Cu conductive layer and the Cu pillar, the intermediate layer made of a material having a linear expansion coefficient smaller than a linear expansion coefficient of the Cu conductive layer and smaller than a linear expansion coefficient of the Cu pillar.

Abstract: An SiC semiconductor device includes an SiC semiconductor layer including an SiC monocrystal and having a first main surface as a device surface, a second main surface at a side opposite to the first main surface, and a side surface connecting the first main surface and the second main surface, a main surface insulating layer including an insulating material, covering the first main surface of the SiC semiconductor layer, and having an insulating side surface continuous to the side surface of the SiC semiconductor layer, and a boundary modified layer including a first region that is modified to be of a property differing from the SiC monocrystal and a second region that is modified to be of a property differing from the insulating material, and being formed across the side surface of the SiC semiconductor layer and the insulating side surface of the main surface insulating layer.

Abstract: A position detection unit generates a position detection value PFB that indicates the position of a control target. A temperature detection unit generates a temperature detection value that indicates the temperature. A correction unit corrects the position detection value PFB. A controller generates a control instruction value SREF such that the position detection value PFB_CMP subjected to the correction matches a position instruction value PREF that indicates the target position of the control target. A driver unit applies a driving signal that corresponds to the control instruction value SREF to an actuator. The correction unit corrects the position detection value PFB such that the relation between the position detection value PFB and the actual position exhibits linearity that is uniform independent of the temperature.

Abstract: A semiconductor device includes a first die pad, a second die pad, a first semiconductor element, a second semiconductor element, an insulating element, first terminals, second terminals, and a sealing resin. The sealing resin has a top surface, a bottom surface, and a first side surface connected to the top surface and the bottom surface. The first side surface includes a first region connected to the top surface, a second region connected to the bottom surface, and a third region connected to the first region and the second region, the plurality of first terminals being exposed to the third region. A surface roughness of each of the top surface, the bottom surface, the first region, and the second region is larger than a surface roughness of the third region.