Ion shield plate for plasma processing apparatus

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Description

FIG. 1 is a front, top, and right side perspective view of an ion shield plate for plasma processing apparatus according to the design;

FIG. 2 is a front view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a left side view thereof;

FIG. 7 is a rear view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in box, labeled, “FIG. 9,” in FIG. 8.

The dot-dash line box shown in FIG. 8 defines the enlarged portion view shown in FIG. 9 and forms no part of the claimed design.

Claims

The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.

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Patent History
Patent number: D1008986
Type: Grant
Filed: Oct 25, 2021
Date of Patent: Dec 26, 2023
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventors: Yusuke Nakatani (Tokyo), Kazuumi Tanaka (Tokyo), Masahiro Yamaoka (Tokyo), Yasushi Sonoda (Tokyo), Taku Iwase (Tokyo)
Primary Examiner: David G Muller
Assistant Examiner: Noah Perez
Application Number: 29/789,929