Abstract: A lithographic printing plate has a coating which is imaged by heating an area of the coating with an infrared laser and actinically reacting the coating in the heated area with ultraviolet or visible radiation. The coating can be either positive working or negative working and the coating contains an infrared absorber. The imaging time is reduced since the actinic reaction rate is increased at the elevated temperature.

Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to heat of a composition which comprises a novolac resin, a latent Bronsted acid and optionally a pigment. The composition is rendered preferentially soluble to a developer, in the regions which were heated.

Abstract: A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

Abstract: A photosensitive thick film composition is provided which has superior storage stabilities and can be reliably processed by developing. The photosensitive thick film composition is composed of a photosensitive organic component containing an organic binder having an acidic functional group, such as a carboxyl group, an inorganic component containing a polyvalent metal oxide, such as borosilicate glass, and an alcohol having a plurality of hydroxyl group, such as glucitol.

Abstract: There is described a method of preparing a lithographic plate which comprises coating on a lithographic support having a hydrophilic surface a layer of a radiation sensitive coating, imaging the coating then acting on the plate while on the press with aqueous fount solution to remove the unexposed areas of the coating, to reveal the hydrophilic surface of the plate and to leave an ink receptive image, wherein the radiation sensitive coating comprises a diazo salt of formula (I): wherein R1 is an anion, R2 and R3 represent optional substitution, R4 is —N— and —S— and R5 is a group which, after exposure of the plate renders the residue of the diazo salt oleophilic and fount solution insoluble.

Abstract: A recording material is provided, having, in this sequence, a support, a radiation-sensitive layer and a silicone layer. The radiation-sensitive layer contains, as a radiation-sensitive component, a diazonium salt polycondensation product and, as a binder, a homopolymer of (C1-C12) alkyl vinyl ether units and/or a copolymer including at least 5 mol-% of such units, and being free of aliphatic hydroxyl groups. In a process to produce a printing plate for driographic offset printing, this recording material is exposed imagewise and subsequently developed using water or an aqueous solution.

Abstract: The present invention relates to particular acetal copolymers and radiation-sensitive compositions comprising said copolymers and, inter alia, are excellently suitable for the production of lithographic printing plates. In particular, the invention relates to acetal copolymers containing furylvinylidene, thienylvinylidene or pyrrolylvinylidene.

Abstract: There is described a method of preparing a lithographic plate which comprises coating on a lithographic support having a hydrophilic surface, a layer of a heat sensitive coating, digitally imaging the coating, then processing the plate with water to remove the unexposed areas of the coating to reveal the hydrophilic surface of the plate and to leave an ink receptive image, wherein the heat sensitive coating comprises a diazo salt of formula (I): wherein R1 is an anion, R2 and R3 represent optional substitution, R4 is —N— or —S— and R5 is a group which, after exposure of the plate, renders the residue of the diazo salt oleophilic and fount solution insoluble.

Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.

Abstract: There is described a method of preparing a water-less lithographic printing form using a precursor which includes a support having a coating thereon comprising a diazo salt formed from an aromatic diazonium compound and an abhesive counter anionic moiety, the method comprising heat mode imaging the precursor and processing the imaged percursor on press by the application of printing ink to remove the abhesive products of the imaging so that areas of the precursor which have been imaged are ink-accepting.

Abstract: A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons, and a diazo compound moiety. The diazo compound moiety may be contained in a side chain of the alkali-soluble resin moiety or included in the photosensitive material in separate from the alkali-soluble resin moiety.

Abstract: According to the present invention there is provided an imaging element for making a lithographic printing plate comprising on a support having a hydrophilic surface a photosensitive layer and a thermosensitive layer, said thermosensitive layer being opaque to light for which said photosensitive layer has spectral sensitivity and said thermosensitive layer being capable of rendered transparent upon exposure to laser light characterised in that said thermosensitive layer is soluble or swellable in an aqueous medium.

Abstract: The present invention relates to photoresist solution for phosphor slurry for use in the color cathode ray tube. The photoresist solution of the present invention comprises Diazo or Bisazide photosensitizer; polymer. which is mixed with said Diazo or Bisazide photosensitizer, obtained by polymerization of hydroxy ethyl acrylate base. The photoresist solution of the present invention improves the adhesive strength by using of the Diazo or Bisazide photosensitizer and the polymer, thus the green, blue and red phosphor screen being uniformly formed and the color residue being disappeared. Further, since the photosensitizer not containing heavy metal is used, it does not cause any environmental problem. Also, it can be stored for a long time by using the initiator without hydrochloric acid at the time of polymerization.

Abstract: A process for producing a deionizing resin, which comprises reacting an organic compound having at least one reactive hydroxy group and at least one active chelating site with an organic polymer matrix having at least one reactive --OH or --NH.sub.2 group, and thereby producing a chelated.sub.-- polymer complex, as shown in FIG. II or FIG. IV: ##STR1## Washing the polymer complex with water, followed by washing with a mineral acid solution and then again washing with water and thereby reducing the level of sodium, iron and chromium ions in the polymer complex to less than 100 ppb each.

Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.

Abstract: Polymeric binders for photosensitive compositions exhibiting improved ink acceptance, good developability and wetting, high photosensitivity, good image resolution, and larger printing runs for plates employing such photosensitive compositions.

Abstract: Disclosed herein is a pattern forming process comprising the steps of coating a substrate with a photosensitive resin composition comprising a polyamic compound having, at each terminal thereof, an actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group, a photopolymerization initiator, and a solvent to form a film; subjecting the film to pattering exposure; and then developing the thus-exposed film with an alkaline developer or alkaline aqueous solution.

Abstract: A method for electrophotographically forming a Braun tube's fluorescent layer coats conductive and photoconductive layers on the internal surface of a Braun tube's panel. The photoconductive layer is formed of a water soluble photoconductive liquid including a water soluble binder, allowing a part of the photoconductive layer to be selectively exposed to a visible ray. The photoresist of the above photoconductive liquid is substituted with dye, which can be processed through general exposure and solvent, allowing the fluorescent layer to be formed on a Braun tube under the same conditions as a typical Braun tube production process without darkroom processing.

Abstract: In a chemically amplified positive resist composition comprising an organic solvent, an acid labile group-protected resin and a photoacid generator, a compound having a weight average molecular weight of 100-1,000 and at least two phenolic hydroxyl groups in a molecule wherein the hydrogen atom of the phenolic hydroxyl group is partially replaced by an acid labile group in an overall average proportion of 10-80% is blended as a dissolution controller. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

Abstract: A photosensitive composition comprising (1) a compound having at least one addition-polymerizable ethylenically unsaturated double bond, (2) an acidic vinyl copolymer soluble or swellable in alkaline water, which contains, in its molecule, a vinyl monomer having an aromatic hydroxyl group, as a constituting unit, (3) a photopolymerization initiator, and (4) a diazo resin, wherein the diazo resin is a copolycondensed compound which contains, in its molecule, an aromatic compound having a carboxyl group and/or a hydroxyl group, and an aromatic diazonium compound, as constituting units.

Abstract: A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.

Abstract: A photosensitive mixture which contains a polycondensation product of an aromatic diazonium salt, a water-soluble amphophilic polymeric binder having a mean molecular weight M.sub.w of 5000 to 100,000 and a nonionic surface-active compound having a molecular weight of 150 to 2000 is suitable for the production of printing plates, particularly offset printing plates, which can be developed with pure water and are notable for a rapid ink take-up and long print run.

Abstract: A negative-working image-recording material containing both a substance which absorbs light and generates heat and a diazonium compound having two or more diazohio groups in the molecule and a negative-working lithographic plate for direct platemaking by heat mode writing, the lithographic plate comprising a support having provided on at least one surface a substance which absorbs infrared or near infrared light and generates heat and a diazonium compound having two or more diazonio groups in the molecule.

Abstract: The present invention provides an imaging element comprising on a support a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolysed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin and/or a diazonium salt characterized in that the light sensitive layer comprises at least one diazo resin or diazonium salt containing or being a diazonium salt of p-aminodiphenylamine containing as substituent an alkyl or alkoxy group and the weight percentage of said diazonium salt(s) and/or diazo resin(s) containing or being a diazonium salt of p-aminodiphenylamine containing as substituent an alkyl or alkoxy group versus the total amount of diazo resin and/or diazonium salt ranges from 22 to 40%.

Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Abstract: This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group,R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group,R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 andY is a saturated or unsaturated chain- or ring-shaped spacer group,and photosensitive compositions containing this binder.

Abstract: The present invention relates to a negative-working photosensitive composition comprising a diazonium compound and a polymer binder, said polymer binder being:(1) an AB type, ABA type or BAB type block copolymer of:(i) a block (A) having a unit having the following formula (I): ##STR1## and (ii) a block (B) having a unit (II) which having the following formula and being free from unit (I): ##STR2## or (2) a block copolymer obtained by subjecting to radical polymerization.(i) an azo group-containing polyurethane (C) which contains a unit (C1) having the following formula (III) and a unit (C2) having the following formula (IV) in the molecule and which has a weight-average molecular weight of 2,000-200,000; and(ii) a polymerizable monomer having the following formula (I').--R.sup.7 --NH--CO--O--R.sup.8 --N.dbd.N --R.sup.8 --O--CO--NH--(III)--R.sup.9 --NH--CO--O--R.sup.

Abstract: The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 andR.sup.2, R.sup.3 are hydrogen or methyl andR.sup.4 is alkyl, aralkyl or aryl.

Abstract: A photosensitive composition having a photoreactive component, selected from a diazonium polycondensation product or a free radical polymerizable system of photoinitiators and unsaturated compounds or a hybrid system and a binder formed by reacting a carboxyl group containing a polymer of formulaP--(--X--COOH).sub.n (I),wherein P is a polymer, n is an integer and X is a single bond or a spacer group, with a 2-oxazoline of the formula ##STR1## wherein R is an alkyl-, aryl-, aralkyl-, alkoxy-, aryloxy- or aralkyloxy group and R' and R" are independently a hydrogen, alkyl- or aryl groups.

Abstract: A water soluble diazonium salt composition made by the condensation of diazoaryl amines and aldehydes and precipitated to form a polymeric anionic species having both ZnCl.sub.4.sup.= and HSO.sub.4.sup.- moieties. These composition are blended with suitable binders, colorants and other optional components to produce light sensitive coating compositions. When applied to aluminum substrates, these light sensitive coating compositions form lithographic printing plates that are especially stable under high humidity conditions. Such plates may be developed by either water alone or by water which contains surfactants and/or a small amount of an organic solvent.

Abstract: The present invention provides an imaging element comprising on a support in the order given a coated composition of at least two hydrophilic layers being in water permeable contact with each other and each containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolyzed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that the ratio by weight in the top layer of said package of said hydrophilic (co)polymer or (co)polymer mixture versus said hydrolyzed tetraalkyl orthosilicate (expressed as silicon dioxide) is at least 1.1 and the ratio by weight in an underlying layer of said package of said hydrophilic (co)polymer or (co)polymer mixture versus said hydrolyzed tetraalkyl orthosilicate (expressed as silicon dioxide) is not higher than 0.9.

Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.

Abstract: The present invention provides a lithographic base comprising on a hydrophobic support a packet of subbing layers contiguous to a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolysed tetraalkyl orthosilicate crosslinking agent characterized in that said packet of subbing layers contains as undermost layer a layer comprising, a polymer latex having hydrophilic functionality and as uppermost layer a layer comprising a hydrophilic binder and silica in a weight ratio of the hydrophilic binder to silica of less than 1.

Abstract: A negative-type photosensitive lithographic printing plate having a photosensitive layer comprising upper and lower layers, each layer containing a photosensitive diazo resin, on a support having a hydrophilic surface. The concentration of the diazo resin in the upper layer is not more than 1/3 of the concentration of the diazo resin in the lower layer, the thickness of the upper layer is not less than three times the thickness of the lower layer, and the upper layer contains an oleophilic non-photosensitive resin with a weight average molecular weight ranging from 10,000 to 150,000. The lithographic printing plate has a very short exposure time, may be used with projection exposure systems and allows for the use of known developers and automated developer systems.

Abstract: A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.

Abstract: A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.

Abstract: According to the present invention the storage stability of a diazo based imaging element can be improved by controlling the amount of free water in the imaging element. Thus the present invention provides an imaging element comprising on a support a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolyzed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that the total amount of free water in said imaging element satisfies the following formula (I):FW (g/m.sup.2).ltoreq.0.0043 * WS (g/m.sup.2)+0.46 (g/m.sup.2) (I)wherein FW represents the amount of free water and WS represents the weight of the support of the imaging element.

Abstract: A photosensitive composition comprising (A) an ethylenically unsaturated addition-polymerizable compound, (B) an aqueous alkali-soluble or swelling polymer which is capable of forming a film, (C) a photopolymerization initiator, (D) a negative-working diazo resin, and (E) a component which is soluble in a photosensitive solution, but floats on a surface of a photosensitive layer and is capable of forming an oxygen-intercepting layer during coating and drying is described. A photosensitive lithographic printing plate comprising a support coated with the above-described photosensitive composition and a matting layer provided thereon, wherein the surface of the matting layer has a micro pattern comprising (i) a portion which is coated with a composition comprising a copolymer containing at least one monomer unit having a sulfonic acid group and (ii) a portion which is uncoated with the composition is also descried.

Abstract: A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.

Abstract: A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also provides a method of making microelectronic structures.

Abstract: This invention is an acetal polymer having the following repeating units: ##STR1## where R is an alkyl group of 1 to 10 carbon atoms;Ar.sub.1 is an aromatic group substituted with an aliphatic group containing 3 to 20 carbon atoms or an alkoxy group having 3 to 20 carbon atoms;Ar.sub.2 is a non-substituted aromatic group;A.sub.1 is an acid group;n.sub.1, n.sub.2, n.sub.3, n.sub.4, n.sub.5 represent the molar percents of the respective repeating units and n.sub.1 is 0-20 mole %, preferably 2-10 mole %; n.sub.2 is 2-20 mole %, preferably 5 to 15 mole %; n.sub.3 is 15-85 mole %, preferably 20 to 65 mole %; n.sub.4 is 0 to 40 mole %, preferably 0 to 20 mole %; and n.sub.5 is 5-40 mole %, preferably 20 to 35 mole %. These polymers may be used in photosensitive compositions and lithographic printing plates.

Abstract: Radiation-sensitive polymeric adducts of (1) a sulfonated polyester resin having a plurality of sulfonate groups, (2) a diazonium resin having a plurality of diazonium groups, and (3) a salt of quaternary ammonium or quaternary phosphonium. This invention also provides a radiation-sensitive article comprising a substrate bearing a coating containing a radiation-sensitive adduct.

Abstract: Disclosed is an alkali developable photosensitive resin composition useful for an offset printing plate, which has excellent developability and provides long life of a developer. The photosensitive resin composition comprising:(a) an alkali-soluble type binder resin,(b) a photosensitive substance, and(c) a dye;said binder resin (a) having an ampho-ionic group represented by the formula: ##STR1## [wherein R.sup.1 is H or a C.sub.1-10 alkyl group which optionally has a substituent or a functional group in a chain, R is a substituted or non-substituted C.sub.1-20 alkylene or phenylene group, and A is --COO or --SO.sub.3 ]and/or an ampho-ionic group represented by the formula: ##STR2## [wherein each R.sup.2 is the same or different and respectively indicates a C.sub.1-10 alkyl group which optionally has a substituent or a functional group in a chain, and R and A are as defined above] in a molecule and containing a resin having total acid value of 5 to 150.

Abstract: A PS plate requiring no dampening water comprises a substrate provided thereon with, in order, a light-sensitive resin layer and a silicone rubber layer, wherein the light-sensitive resin layer is formed from a light-sensitive composition which comprises the following components:(i) at least one monomer represented by the following general formula (I): ##STR1## (wherein R.sup.1 represents, for instance, H or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms; a to f each independently represents an integer; R.sup.2 and R.sup.3 each independently represents H or a methyl group); (ii) a photopolymerization initiator; and (iii) a polymeric compound having film-forming ability. The hardening properties of the silicone rubber layer is greatly improved and thus there can be obtained a PS plate exhibiting high sensitivity and hence lithographic printing plates having good printing durability.

Abstract: The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer and a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica, the surface area of the silica being at least 300 m.sup.2 per gram.

Abstract: A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol % of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.

Abstract: A resist material comprises a polysiloxane obtained by hydrolysis and condensation with dehydration of one or more alkoxysilanes having an oxirane ring, or of a mixture of the alkoxysilane(s) having an oxirane ring and one or more alkoxysilanes having no oxirane ring, and an acid generator. The resist material may contain one or more of a spectral sensitizer, an organic polymer having a hydroxyl group or an epoxy compound. Resist patterns are formed by coating an organic polymer on a substrate and then the resist material on the film of the organic polymer to form a two layer resist having a bottom layer of the organic polymer and top layer of the resist material, prebaking, imagewise exposing high radiation, postbaking, and developing the resist with alkaline solutions to remove an unexposed portion of the top layer, and dry etching the bottom layer using the relic of the resist material as a mask. the temperature of the post baking is preferably lower than that of the prebaking.

Abstract: The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer contiguous to a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica and is applied at a solids content of more than 200 mg per m.sup.2 but less than 750 mg per m.sup.2.

Abstract: A precolored, water-developable, photosensitive elements comprising:(A) a support;(B) a colorant-containing layer consisting essentially of(1) a colorant, and(2) a polyvinyl alcohol binder, said binder being about 87-100% hydrolyzed and being of sufficiently high molecular weight to be film-forming; and(C) a photosensitive layer consisting essentially of:(3) a photosensitive, water-soluble, polymeric diazo resin; and(4) a polyvinyl alcohol binder, said binder being about 87-100% hydrolyzed and being of sufficiently high molecular weight to be film-forming; and(D) an adhesive layer;wherein said colorant-containing layer (B) and said photosensitive layer (C) may be combined into a single layer colorant-containing, photosensitive coating (E) which must be in contact with the adhesive layer (D) or alternatively, said colorant-containing layer (B) and said photosensitive layer (C) may be in separate but contiguous layers provided that either layer (B) or (C) must be in contact with the adhesive layer (D), and prov