Polymeric Diazonium Compound Patents (Class 430/175)
  • Patent number: 4851319
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixturea) a polymeric binder;b) a photoinitiator;c) a diazonium salt; andd) a photopolymerizable mixture ofi) a polyfunctional acrylic monomer having from 3 to 6 unsaturated groups; andii) a monofunctional acrylic monomer having 1 unsaturated group.
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: July 25, 1989
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Carlos Tellechea
  • Patent number: 4845009
    Abstract: The present invention relates to a photosensitive composition suitable for the use in the preparation of a photosensitive lithographic plate. The photosensitive composition comprises (1) a polymer having a maleimido group in its side chain and being capable of being photocrosslinked, such as a copolymer of methyl methacrylate/N-[2-(methacryloyloxy)-ethyl]-2,3-dimethylmaleimide/methacryl ic acid=15/65/20 (weight ratio) and (2) a diazo resin such as dodecylbenzenesulfonate of condensate of p-diazodiphenylamine and formaldehyde.
    Type: Grant
    Filed: September 17, 1986
    Date of Patent: July 4, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Masanori Imai
  • Patent number: 4842983
    Abstract: A light-sensitive composition comprising a phenolic resol wherein the ratio of the number of dibenzylic ether linkages to the total number of dibenzylic ether, methylene and methylol linkages linked to phenolic nucleus is 15 mol. % or more and which is obtained by a reaction between a phenol of the formul (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and represent hydrogen, halogen, hydroxyl, nitro, alkyl, alkoxy, phenyl, or substituted phenyl, and an aldehyde or ketone.A light-sensitive composition comprising a condensate of the phenolic resol and an o-quinone diazido sulfonylhalide.A light-sensitive material comprising the above-mentioned composition.A method for making a planographic printing plate from the light-sensitive material, characterized in that burning-in process is carried out at a lower temperature or a shortened time.
    Type: Grant
    Filed: October 14, 1987
    Date of Patent: June 27, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akira Hasegawa
  • Patent number: 4840869
    Abstract: Light sensitive compositions are disclosed which comprise 2-halomethyl-1,3,4,-oxadiazole compounds having a heterocyclic radical in the fifth position containing at least one element selected from the group consisting of oxygen, nitrogen, sulphur, and selenium directly or through a vinyl radical.
    Type: Grant
    Filed: August 10, 1987
    Date of Patent: June 20, 1989
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Noriyasu Kita, Kiyoshi Goto
  • Patent number: 4840868
    Abstract: A photosensitive composition is described, which contains a diazonium salt polycondensation product and a polymeric binder which is soluble or at least swellable in aqueous-alkaline solutions and comprises a reaction product of a trimellitic anhydride, the free carboxyl group of which is esterified with an alcohol containing a urethane group, with a polymer containing hydroxyl groups and having no further functional groups capable of reaction with acid anhydrides. The composition yields an increased print run and has, at the same time, good storability and developability.
    Type: Grant
    Filed: December 21, 1987
    Date of Patent: June 20, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Guenter Hultsch, Gerhard Mack
  • Patent number: 4839254
    Abstract: A photosensitive mixture contains a photosensitive compound and a polymeric binder which s a reaction product of a compound represented by the formula ##STR1## wherein X and Y are the same or different, and each denotes oxygen or sulfur,R.sub.1 and R.sub.2 are the same or different, and each denotes an unsubstituted or substituted alkyl, cycloalkyl or alkoxy radical containing from 1 to 6 carbon atoms; an unsubstituted or substituted aryl or aryloxy radical containing from 6 to 10 carbon atoms; or, together with the phosphorus atom, a 5- or 6-membered heterocyclic ring which is unsubstituted or substituted or which carries a fused benzene ring,with a polymer containing active hydrogen. The novel binders used in the mixture can be easily prepared and yield photosensitive layers of good developability and developer resistance.
    Type: Grant
    Filed: May 8, 1987
    Date of Patent: June 13, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Jerg Kleiner
  • Patent number: 4828958
    Abstract: The photosensitive composite of the present invention is obtained by including a nonsubstitutional or substitutional benzyl radical in the phenol side chain of polyvinylphenol. The photosensitive composites have not only excellent heat resistivity, RIE resistivity, and resolving power but also have a wide tolerance for the variations in the development temperature and developer concentration at the time of development. Therefore, it is possible to obtain resist patterns with fine structure.
    Type: Grant
    Filed: March 9, 1987
    Date of Patent: May 9, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuzi Hayase, Yasunobu Onishi, Rumiko Horiguchi
  • Patent number: 4828959
    Abstract: A light-sensitive mixture that contains a diazonium salt polycondensation product, a polymeric binder and an organic peroxide which has a scorch temperature of at least 100.degree. C. and, above this temperaure, is capable of forming free radicals is especially useful for the preparation of planographic printing plates, the print run of which can be extended by burning-in the exposed and developed plate. The light-sensitive mixture has a long storage life in the dark.
    Type: Grant
    Filed: May 22, 1987
    Date of Patent: May 9, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Dieter Mohr, Guenter Jung
  • Patent number: 4826753
    Abstract: A light-sensitive composition containing a polymerizable compound having at least one ethylenically unsaturated group, and a photopolymerization initiator of general formula (I): ##STR1## wherein Y represents --COOR.sub.1, ##STR2## --R.sub.3 --COOR.sub.1, --R.sub.3 --CONHR.sub.1 or --NHCO--R.sub.4 (wherein R.sub.1 represents a hydrogen atom, an alkyl group, or an aryl group; R.sub.2 represents a hydrogen atom or a methyl group; R.sub.3 represents an alkylene group; R.sub.4 represents an alkyl group, an alkoxy group, an aryl group; and l and m respectively represents integers of 1 to 10.); Ar represents a phenylene, naphthylene or heterocyclic aromatic group; X represents a chlorine atom or a bromine atom; and n represents 1 or 2.The light-sensitive composition has a good stability over time since crystallization of the photopolymerization initiator on the surface of the light-sensitive layer is inhibited.
    Type: Grant
    Filed: September 4, 1987
    Date of Patent: May 2, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuji Higashi, Kouichi Kawamura, Yukio Abe
  • Patent number: 4822713
    Abstract: A light-sensitive composition for use in making a light-sensitive layer of, for instance, a presensitized plate from which a lithographic printing plate is to be prepared, which comprises a fluorine-containing surfactant and is characterized in that the fluorine-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group, Rf, which has 3 to 20 carbon atoms and at least 40% by weight of fluorine atoms and at least three terminal carbon atoms of which are fully fluorinated; and (ii) a poly(oxyalkylene) (meth)acrylate and that Rf group-containing (meth)acrylate monomer unit is present in the copolymer in an amount of from 25 to 70% by weight based on the total weight of the copolymer. The composition provides a light-sensitive layer of a uniform thickness and it provides a lithographic printing plate having acceptable and excellent properties.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: April 18, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nishioka, Masayuki Kamei, Toshihiko Umaba
  • Patent number: 4822719
    Abstract: A radiation-sensitive mixture which contains(A) a polymer comprised of repeat units represented by the formula ##STR1## where R is a hydrogen or a halogen atom, a cyanide group or an alkyl group of 1-4 carbon atoms,R.sup.1, R.sup.2 are identical or different, and eachand R.sup.3 denotes a hydrogen or a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an aryloxy group, an aroyl group or aralkyl group,R.sup.4 is a hydrogen atom or a divalent organic group which is linked to another unit represented by formula (I),X denotes an oxygen atom or one of the groups NR.sup.8, OCH.sub.2 CHOHCH.sub.2 OCO, OCH.sub.2 CH.sub.2 O and OCH.sub.2 CH.sub.2 OCO, where R.sup.
    Type: Grant
    Filed: August 13, 1986
    Date of Patent: April 18, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Arnold Schneller, Ralf Schulze, Ju Sander, Kurt Erbes
  • Patent number: 4822716
    Abstract: The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: April 18, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasunobu Onishi, Shuji Hayase, Rumiko Horiguchi, Akiko Hirao
  • Patent number: 4812384
    Abstract: A diazonium salt polycondensation product which comprises units of(a) a diazonium salt represented by the formula ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 are hydrogen atoms, halogen atoms, alkyl groups or alkoxy groups andX is the anion of an aminoalkanesulfonic acid, and(b) a compound represented by the formulaR.sup.4 --O--CH.sub.2 --R.sup.6 --CH.sub.2 --O--R.sup.5 (II)in whichR.sup.4 and R.sup.5 are hydrogen atoms, alkyl groups or aliphatic acyl radicals andR.sup.6 is the radical of an aromatic hydrocarbon, a phenol, a phenol ether, an aromatic thioether, an aromatic heterocyclic compound or an organic acid amide,and which is suitable as a light-sensitive substance for the preparation of planographic printing plates that can be developed with pure water.
    Type: Grant
    Filed: November 24, 1986
    Date of Patent: March 14, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Werner Franke, Richard Brahm
  • Patent number: 4783390
    Abstract: A multi-color image forming material which is in the form of multiple layers on a support, and having, at least two photosensitive layers, the farthest layer from the support being the uppermost photosensitive layer, the photosensitive layers being formed from a water-soluble resin having photocrosslinking ability with diazo resin, a photosensitive water-soluble, organic solvent insoluble diazo resin, and a water dispersible coloring agent which can produce a color tone, each photosensitive layer having a coloring agent which can produce a different color tone; and at least one intermediate layer, each intermediate layer being positioned between each photosensitive layer and the next adjacent photosensitive layer, the intermediate layer being formed from a hydrophobic, water-resistant, organic solvent softenable resin.
    Type: Grant
    Filed: April 1, 1987
    Date of Patent: November 8, 1988
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Hisashi Mino, Norio Yabe, Takeshi Iijima
  • Patent number: 4777111
    Abstract: This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer.
    Type: Grant
    Filed: March 23, 1987
    Date of Patent: October 11, 1988
    Assignee: Fairmount Chemical Company, Inc.
    Inventors: David B. Blumel, Albert S. Deutsch
  • Patent number: 4774161
    Abstract: The present invention relates to a light-sensitive composition comprising a modified polyvinyl acetal resin having a substituent possessing an acid hydrogen atom introduced into remaining hydroxy groups of a polyvinyl acetal resin in an amount of from 0.1 to 6 milliequivalents as acid content per 1 gram resin, and a diazo resin represented by the formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom, or a substituted or unsubstituted alkyl, alkoxy, hydroxy, carboxyester or carboxy group; R.sub.2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a phenyl group; R.sub.3 represents a hydrogen atom or an alkoxy group having 1 to 3 carbon atoms; R.sub.4 represents an alkyl group having 6 to 18 carbon atoms; n represents an integer not smaller than 2.The presensitized lithographic printing plate using the light-sensitive composition of the present invention can be developed with an alkali developer and the highlight image thereof is tough.
    Type: Grant
    Filed: January 14, 1987
    Date of Patent: September 27, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiyuki Sekiya, Roahiaki Aoai, Kazuo Maemoto, Akihiko Kamiya
  • Patent number: 4751166
    Abstract: This invention relates to negative photosensitized sheet contructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: September 12, 1986
    Date of Patent: June 14, 1988
    Assignee: Hoechst Celanese Corp.
    Inventors: Stephan J. Platzer, Gabor I. Koletar
  • Patent number: 4749639
    Abstract: A photosensitive composition comprising a polymeric diazonium salt, preferably a diazonium salt polycondensation product, and a polymeric binder possessing lateral crosslinking groups represented by the formula --CH.sub.2 --OR, wherein R denotes a hydrogen atom, a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group, can be used to produce printing plates which yield considerably increased print runs after being baked at temperatures of 150.degree. C. to 250.degree. C.
    Type: Grant
    Filed: February 7, 1986
    Date of Patent: June 7, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hans-Dieter Frommeld
  • Patent number: 4746591
    Abstract: A process for preparing a lithographic support, and the printing plate made therefrom, are described, wherein the process comprises the steps of (a) liquid-honing a surface of an aluminum sheet, and (b) electrochemically graining the surface of the aluminum sheet in an electrolyte comprises hydrochloric acid, nitric acid, or a mixture thereof.
    Type: Grant
    Filed: September 4, 1986
    Date of Patent: May 24, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hirokazu Sakaki, Akira Shirai, Akio Uesugi, Tsutomu Kakei
  • Patent number: 4741985
    Abstract: A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.
    Type: Grant
    Filed: June 6, 1986
    Date of Patent: May 3, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kazuo Maemoto, Akihiko Kamiya, Toshiyuki Sekiya
  • Patent number: 4737436
    Abstract: A method of forming an image on a substrate is described which comprises blending a desired coloring pigment, adding the coloring pigment to a water soluble photoresist, coating the substrate with the pigmented photoresist, exposing the photoresist to actinic radiation to harden the parts of the photoresist occupying the desired image area, and removing with a water based solvent the unexposed photoresist.
    Type: Grant
    Filed: November 18, 1985
    Date of Patent: April 12, 1988
    Assignee: Grafmark International Limited
    Inventor: Colin G. Thompson
  • Patent number: 4732840
    Abstract: A light-sensitive composition comprising a phenolic resol wherein the ratio of the number of dibenzylic ether linkages to the total number of dibenzylic ether, methylene and methylol linkages linked to phenolic nucleus is 15 mol. % or more and which is obtained by a reaction between a phenol of the formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and represent hydrogen, halogen, hydroxyl, nitro, alkyl, alkoxy, phenyl, or substituted phenyl, and an aldehyde or ketone.A light-sensitive composition comprising a condensate of the phenolic resol and an o-quinone diazido sulfonylhalide.A light-sensitive material comprising the above-mentioned composition.A method for making a planographic printing plate from the light-sensitive material, characterized in that burning-in process is carried out at a lower temperature or a shortened time.
    Type: Grant
    Filed: March 21, 1986
    Date of Patent: March 22, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akira Hasegawa
  • Patent number: 4731316
    Abstract: A photosensitive composition of this invention comprises:(a) a photosensitive diazo resin represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF.sub.6 or BF.sub.4 and n represents a number of 1 to 200, in which a resin with the number n in the above formula being 5 or more is contained by more than 20 mol %,(b) an oleophilic high molecular weight compound with hydroxyl group and(c) a high molecular weight organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.The photosensitive composition of this invention can provide a photosensitive layer having high sensitivity and being excellent in storage stability and developability as well as excellent in the film strength.
    Type: Grant
    Filed: October 1, 1985
    Date of Patent: March 15, 1988
    Assignees: Mitsubishi Chemical Industries Limited, Konishiroku Photo Industry Co., Ltd.
    Inventors: Hiroshi Tomiyasu, Yoshihiro Maeda, Kiyoshi Goto, Norihito Suzuki
  • Patent number: 4731317
    Abstract: A coated lithographic printing plate comprises a grained, anodized aluminum substrate and coating thereon comprising a diazo resin in admixture with particulate energy absorbing material that will absorb incident radiation and re-radiate it as radiation that will change the diazo resin coating which is imageable with a Crosfield Datrax 760 YAG laser plate maker producing incident radiation of 1/06 microns. The topography of the substrate and the particulate material in the coating trap and convert a substantial portion of the incident laser radiation which passes through the coating without substantially affecting same into radiation that will change the coating.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: March 15, 1988
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Gracia
  • Patent number: 4729935
    Abstract: A process for the production of photographic images utilizing a photographic element comprising a transparent support and a coating on the support comprising a diazonium composition having a light absorbency of about 45% or less, and a colorant composition, said coating having a light transmission of not more than about 0.1%.
    Type: Grant
    Filed: October 18, 1985
    Date of Patent: March 8, 1988
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Major S. Dhillon
  • Patent number: 4724195
    Abstract: Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.
    Type: Grant
    Filed: June 7, 1985
    Date of Patent: February 9, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Werner H. Muller, Arnold Schneller
  • Patent number: 4711830
    Abstract: An image recording material is provided which comprises an electroconductive base plate, a recording layer provided on at least one side of said plate and a photosensitive layer provided on said recording layer. The recording layer may constituted of a electrolytically polymerized film, and the photosensitive layer may constituted of a polymer complex formed from a basic polymer and an acidic polymer. A method for image recording is also provided.
    Type: Grant
    Filed: January 22, 1986
    Date of Patent: December 8, 1987
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiro Haruta, Yoko Kuwae, Satoshi Yuasa, Toshihiko Miyazaki
  • Patent number: 4701399
    Abstract: A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3.The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition.The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.
    Type: Grant
    Filed: February 25, 1985
    Date of Patent: October 20, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Teruo Nagano, Tadao Toyama, Akira Nagashima
  • Patent number: 4692397
    Abstract: A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.
    Type: Grant
    Filed: November 27, 1985
    Date of Patent: September 8, 1987
    Assignee: American Hoechst Corporation
    Inventor: Shuchen Liu
  • Patent number: 4687726
    Abstract: Disclosed are a novel photosensitive recording material and a method for using the recording material in the production of planographic printing plates. The recording material comprises a support and a negative-working photosensitive layer that contains a diazonium salt polycondensation product as the photosensitive compound and, in addition, a colorless inorganic pigment which is insoluble in water and organic solvents and which has an average particle diameter from 1 to 20 .mu.m. The pigment is present in a quantity from 0.01 to 2% by weight, relative to the non-volatile constituents of the layer, and is evenly distributed in the layer. Due to the pigment content, a rough layer surface is formed, which has the effect of reducing the time required for creating a vacuum in a vacuum frame into which the recording material is mounted. The presence of the pigment in the layer also produces an improved tonal rendering in the print obtained.
    Type: Grant
    Filed: May 8, 1985
    Date of Patent: August 18, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gunter Schlogl, Gerhard Mack, Manfred Michel
  • Patent number: 4687727
    Abstract: A light-sensitive planographic printing plate comprising a layer of a photo-polymerizable composition provided on at least one side of a base, wherein said photo-polymerizable composition comprises:(A) a polymer having at least one group represented by the general formula (I) ##STR1## wherein R.sub.1 to R.sub.5 each represent a member selected from the group consisting of a hydrogen atom, a halgen atom, a carboxyl group, a sulfo group, a nitro group, a cyano group, an amido group, an amino group and a substituted or unsubstituted alkyl group, aryl group, alkoxy gruop, aryloxy group, alkylamino group, arylamino group, alkylsulfonyl group and arylsulfonyl group and Z represents an oxygen atom, a sulfur atom, NH or NR, wherein R represents an alkyl group; and a carboxyl group on the side chain;(B) a monomer or oligomer having at least two polymerizable ethylenically unsaturated double bonds;(C) a photo-polymerization initiator, and(D) a diazo resin.
    Type: Grant
    Filed: September 9, 1985
    Date of Patent: August 18, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadao Toyama, Kesanao Kobayashi, Mitsuru Koike, Koji Tamoto
  • Patent number: 4681833
    Abstract: A light-sensitive composition is described, containing: (A) a light-sensitive diazo compound, (B) a combination of Polymer (B-1) and Polymer (B-2), and (C) an epoxy resin. Polymer (B-1) is a polymer having the structural units of the general formulae (i), (ii) and (iii). Polymer (B-2) is a polymer having the structural units of the general formulae (iv), (v) and (vi). ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is an unsubstituted or substituted benzyl group, a lower alkyl group, or a halogen-substituted lower alkyl group, R.sup.3 is a hydrogen atom, a lower alkyl group, or a halogen-substituted lower alkyl group, R.sup.4 is a tert- or iso-butyl group, and R.sup.5 is a lower alkyl group. This composition is a negative-type light-sensitive composition and is used to prepare a lithographic printing plate, for example. This printing plate is superior in lipophilic nature and also in mechanical properties such as abrasion resistance.
    Type: Grant
    Filed: March 7, 1985
    Date of Patent: July 21, 1987
    Assignee: Somar Corporation
    Inventors: Kohtaro Nagasawa, Kunio Morikubo
  • Patent number: 4672021
    Abstract: This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer.
    Type: Grant
    Filed: June 3, 1985
    Date of Patent: June 9, 1987
    Assignee: Fairmount Chemical Company
    Inventors: David B. Blumel, Albert S. Deutsch
  • Patent number: 4666817
    Abstract: A light-sensitive color-proofing sheet is described for producing an image on various substrates. A light-sensitive continuous color layer is releasably attached to a carrier. Overlaying the color layer is a water-insoluble transparent colorless barrier layer. On the opposite surface of the barrier layer is a thermally laminable adhesive layer. Upon lamination of the sheet to a substrate, removal of the carrier and exposure to actinic radiation, the color layer is formed into an image, photomechanically, by removal of the non-image areas.
    Type: Grant
    Filed: December 30, 1985
    Date of Patent: May 19, 1987
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Leonard W. Sachi
  • Patent number: 4661432
    Abstract: A light-sensitive, diazonium group-containing polycondensation product is described which comprises(a) an optionally substituted diphenylamine-dianzonium salt I.(b) a compound corresponding to the formula IIR.sup.4 --O--CH.sub.2 --R.sup.5 (II)whereinR.sup.4 is H, alkyl or acyl, andR.sup.5 is an optionally substituted aromatic radical, and(c) a compound corresponding to the formula IIIR.sup.6 --O--CH.sub.2 --R.sup.8 --CH.sub.2 --O--R.sup.7 (III)whereinR.sup.6 and R.sup.7 are H, alkyl, or acyl andR.sup.8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides,with the radicals resulting from compound II being directing linked to the units of the diazonium salt I.In the production of the polycondensation product, I is first condensed with II and then with III.
    Type: Grant
    Filed: January 23, 1986
    Date of Patent: April 28, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Walter Lutz, Hartmut Steppan
  • Patent number: 4659645
    Abstract: A photosensitive mixture comprised of(a) a diazonium salt polycondensation product comprising recurring units of the formulas A--N.sub.2 X and B, which units are linked by bivalent intermediate members derived from a carbonyl compound which is capable of condensation, wherein the A--N.sub.2 X units are derived from aromatic diazonium compounds that are capable of condensation with formaldehyde, and the B units are derived from compounds which are free from diazonium groups and are also capable of condensation with formaldehyde in a strongly acidic medium;(b) a compound which can be polymerized by a free-radical process;(c) a photopolymerization initiator; and(d) a polymeric binder that is insoluble in water, but soluble in organic solventscan be used in the production of photosensitive printing plates and photoresists.
    Type: Grant
    Filed: July 9, 1985
    Date of Patent: April 21, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Walter Lutz, Hartmut Steppan
  • Patent number: 4650738
    Abstract: This invention relates to negative photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: October 22, 1984
    Date of Patent: March 17, 1987
    Assignee: American Hoechst Corporation
    Inventors: Stephan J. W. Platzer, Gabor I. Koletar
  • Patent number: 4650739
    Abstract: A process for manufacturing materials in the form of sheets, foils or webs comprising chemically, mechanically and/or electrochemically roughened and anodically oxidized aluminum or one of its alloys, wherein the resultant aluminum oxide layers are post-treated with an aqueous solution containing phosphoroxo anions, is performed such that a post-treatment of the aluminum oxide layers is effected by immersion in an aqueous solution containing hexametaphosphate anion. In a preferred embodiment, the aqueous solution is adjusted to a pH of 1 to 5 by addition of an acid. The resulting materials, which have reduced adsorption properties, are preferably employed as support materials for offset printing plates.
    Type: Grant
    Filed: May 15, 1985
    Date of Patent: March 17, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich Simon, Reiner Beutel
  • Patent number: 4631245
    Abstract: Disclosed is a photosensitive composition which comprises a diazonium salt polycondensation product and, as the binder, a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a polymer containing hydroxyl groups, which does not contain any further functional groups which are capable of reaction with acid anhydrides. The composition is suitable for use in the production of printing plates and photoresists. It can be developed with neutral or alkaline aqueous solutions and yields printing plates having a good ink receptivity and producing large print runs.
    Type: Grant
    Filed: February 4, 1985
    Date of Patent: December 23, 1986
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Georg Pawlowski
  • Patent number: 4618561
    Abstract: A record memory medium comprises a recording layer comprising a monomolecular film or monomolecular layer built-up film of a photosensitive organic compound having a hydrophilic moiety and a hydrophobic moiety. The medium can be used for recording/reading-out of information and light recording.
    Type: Grant
    Filed: November 29, 1984
    Date of Patent: October 21, 1986
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirohide Munakata, Yoshinori Tomida, Masahiro Haruta, Yutaka Hirai, Yukuo Nishimura, Takashi Hamamoto
  • Patent number: 4617250
    Abstract: A light-sensitive composition for use with lithographic printing plates is described which comprises (1) a light-sensitive, organic solvent soluble and substantially water-insoluble diazo resin which is the reaction product of a water-soluble, light-sensitive condensate of an aromatic diazonium compound and an organic condensing agent with a halogenated Lewis acid or a salt thereof, (2) a substantially water-insoluble, film forming organic high-molecular weight compound having an acid value of from 10 to 200, (3) a polynuclear aromatic sulfonic acid or a salt thereof, and (4) a salt-forming organic dye compound.
    Type: Grant
    Filed: June 1, 1984
    Date of Patent: October 14, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Eiji Nakakita, Akinobu Koike, Toshiyuki Sekiya, Hiroshi Misu, Nobuyuki Kita
  • Patent number: 4614701
    Abstract: A photocurable resin composition comprising(A) a copolymer composed of, as structural units,(a) 20 to 70% by weight of a hydroxyl group-containing acrylic monomer unit represented by the following formula ##STR1## wherein R.sub.1 and R.sub.2, independently from each other, represent a hydrogen atom, a methyl group or an ethyl group and n is 1, 2 or 3, and(b) 5 to 80% by weight of a nitrogen-containing acrylic monomer unit represented by the following formula ##STR2## wherein R.sub.3 represents a hydrogen atom or a methyl group, X represents 0 or NH, R.sub.4 represents a linear or branched alkylene group having 2 or 3 carbon atoms, R.sub.5, R.sub.6 and R.sub.7, independently from each other, represent a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms and Y.sup..crclbar. represents an anion of an acid, and(B) a diazo compound or an azide compound.
    Type: Grant
    Filed: September 28, 1984
    Date of Patent: September 30, 1986
    Assignee: Sekisui Fine Chemical Co., Ltd.
    Inventors: Hirofumi Mori, Hitoshi Hori
  • Patent number: 4608331
    Abstract: Photopolymeric polyurethanes are provided which have a polymeric backbone including recurring urethane or urea groups or both and which have unsaturated hydrocarbon groups attached to this backbone. These photopolymers are combined with a solvent and have a selected and controlled molecular weight and viscosity. The photopolymeric polyurethane solutions are especially useful in providing plates that have a layer including a photopolymer, particularly plates for printing or photoresists that have a photopolymeric layer over a layer of light sensitive diazonium composition.
    Type: Grant
    Filed: November 16, 1984
    Date of Patent: August 26, 1986
    Assignee: Witco Chemical Corporation
    Inventors: Carl Bernstein, Konstantinos Arvanitis, Luigi Amariti
  • Patent number: 4595648
    Abstract: A radiation sensitive compound contains at least two groups having the structure ##STR1## in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A.sup.- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.
    Type: Grant
    Filed: September 11, 1984
    Date of Patent: June 17, 1986
    Assignee: Vickers Limited
    Inventors: Michael Stanton, Allen P. Gates, Rodney M. Potts
  • Patent number: 4588669
    Abstract: A photosensitive lithographic plate comprising a hydrophilic substrate, a photosensitive diazo resin layer superposed on the substrate, and a layer of a photosensitive polyvinyl acetal resin containing an aromatic azide group in a side chain thereof and having an acid number of 10 to 100 and superposed on the diazo resin layer, and a method for the manufacture of this photosensitive lithographic plate.
    Type: Grant
    Filed: May 9, 1984
    Date of Patent: May 13, 1986
    Assignee: Fuji Chemicals Industrial Co., Ltd.
    Inventor: Takateru Asano
  • Patent number: 4581313
    Abstract: A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.
    Type: Grant
    Filed: December 1, 1983
    Date of Patent: April 8, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Junji Minamizono, Toshiyuki Sekiya
  • Patent number: 4579811
    Abstract: Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.
    Type: Grant
    Filed: December 28, 1983
    Date of Patent: April 1, 1986
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Loni Schell, Werner Frass, Inge Gros
  • Patent number: 4578341
    Abstract: A relief image-forming composition having an acidic pH comprises a photosensitive component and an indicator capable of existing in two states differing in actinic opacity dependent upon pH. A relief image is formed by (1) exposing to light selected areas of a layer of the composition, the indicator being in its state of lower actinic opacity, (2) removing layer material from the exposed areas or from the unexposed areas and (3) shifting the pH in the remaining layer material to a value at which the indicator exists in its state of higher actinic opacity. The resultant image can then be used as an intermediate original in diazotype copying processes.
    Type: Grant
    Filed: August 3, 1984
    Date of Patent: March 25, 1986
    Assignee: Sensitisers (Research) Ltd.
    Inventors: Peter B. Readings, Nandor Mihalik, Robin Taylor
  • Patent number: 4578342
    Abstract: A presensitized lithographic plate is disclosed. The plate is comprised of a support base such as an aluminum support base having an anodized surface having a subbing layer positioned thereon which is coated with a light-sensitive layer. The light-sensitive layer is comprised of a diazo compound and a binder or comprised of a photopolymerizable composition. The subbing layer is comprised of a high molecular compound containing a sulfonic acid group-containing monomer units as recurring units. The subbing layer provides a lithographic plate which has greatly improved shelf life. The subbing layer increases the stability of the lithographic plate such that when the plate is stored it continues to be capable of producing copies which do not have stained background areas even when the plate is stored under adverse temperature and humidity conditions.
    Type: Grant
    Filed: December 2, 1983
    Date of Patent: March 25, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 4576899
    Abstract: A developer is provided for lithographic plates or the like having a layer including a diazonium material, which developer enhances the effectiveness of the photolysis to which the plate had been subjected, with the result that the exposure time needed for the plate is substantially reduced. The developer, which thus enhances the apparent photospeed of the plate, includes an insolubilizing reactant that reacts with diazonium groups of diazonium materials on the plate that were not removed by photolysis during exposure in order to decrease the solubility of the diazonium material.
    Type: Grant
    Filed: May 1, 1984
    Date of Patent: March 18, 1986
    Assignee: Imperial Metal & Chemical Company
    Inventors: Luigi Amariti, Llandro C. Santos