Polymeric Diazonium Compound Patents (Class 430/175)
  • Patent number: 5430130
    Abstract: An photosensitive polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and is adequate as a photosensitive agent for lithographic printing plates and screen printing plates: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: July 4, 1995
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5427887
    Abstract: Disclosed is a light-sensitive composition which comprises(A) a diazo resin and(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.
    Type: Grant
    Filed: August 16, 1993
    Date of Patent: June 27, 1995
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Satoshi Konuma, Toshiyuki Matsumura, Akihisa Murata, Shigeo Tsuji
  • Patent number: 5424165
    Abstract: A light-sensitive composition comprises a diazo resin, a polymeric binder and a low molecular weight organic compound having at least 3 carboxyl groups and free of other functional groups containing elements other than hydrogen and carbon atoms. The composition may further comprise a compound carrying at least one phosphorus atom-containing oxoacid residue and a compound carrying at least one sulfonic acid residue. The light-sensitive composition can easily be developed with an aqueous alkaline developer, can provide a lithographic printing plate having good printing durability and has excellent storage stability. Therefore, the developability and resistance to background contamination thereof are not deteriorated even after storing under high temperature and humidity conditions over a long time period.
    Type: Grant
    Filed: December 14, 1992
    Date of Patent: June 13, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5415971
    Abstract: A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: May 16, 1995
    Assignee: The Chromaline Corporation
    Inventors: Ron Couture, Todd R. Murphy, Toshifumi Komatsu
  • Patent number: 5403694
    Abstract: The present invention provides an imaging element comprising on a support in the order given, a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that an intermediate hydrophilic layer containing an organic compound having one or more cationic groups is provided between said hydrophilic layer and said light-sensitive layer. There is further provided a method for making such an imaging element and a method for making a lithographic printing plate therewith.
    Type: Grant
    Filed: December 10, 1993
    Date of Patent: April 4, 1995
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Joan Vermeersch, Dirk Kokkelenberg, Guido Hauquier
  • Patent number: 5397675
    Abstract: The present invention provides a photosensitive resin composition for lithographic printing, which is developable with an alkali developer and exhibits excellent resolusion and excellent print durability. The photosensitive resin composition comprises (a) an alkali-swellable or alkali-soluble binder resin and (b) an oil-soluble diazo resin, wherein the binder resin has an acid value of 5 to 150 and has in molecules a group represented by ##STR1## wherein R.sup.1 represents a phenyl group which may have a substitution, R.sup.2 and R.sup.3, the same or different, represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sup.4 represents an alkylene group of which a backbone may be interrupted with an oxygen atom, a cycloalkylene group or a combination thereof, and may have thereon an alkyl group, a hydroxyl group, an oxo (.dbd.O) group or a combination thereof, and a and b independently shows 0 or 1.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: March 14, 1995
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Seuji Arimatsu, Katsuji Konishi, Yoshifumi Ichinose, Takakazu Hase
  • Patent number: 5393637
    Abstract: Disclosed is a photosensitive composition used for offset printing, which provides an offset printing plate with excellent durability and developability. The photosensitive composition comprises:(I) a film-forming binder resin,(II) a photosensitive substance, and(III) a microgel having a particle size of 0.01 to2.0 .mu. prepared by emulsion polymerization using a polymeric emulsifier having an Sp value of 9 to 16.
    Type: Grant
    Filed: February 28, 1992
    Date of Patent: February 28, 1995
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Yoshifumi Ichinose, Seiji Arimatsu, Katsuji Konishi, Takakazu Hase
  • Patent number: 5348834
    Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: September 20, 1994
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 5344739
    Abstract: A photosensitive diazo resin-containing photosensitive resin composition for lithographic printing comprising a sensitizing dye having an anion group in a molecule as a counter ion of a diazonium group.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: September 6, 1994
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Osamu Nanba, Edward Lam
  • Patent number: 5340685
    Abstract: A light-sensitive composition comprises a light-sensitive diazo resin, a polymer binder and a fluorine atom-containing surfactant, wherein the polymer binder is a polyurethane resin having acidic hydrogen atom-containing substituents and comprising structural units derived from a diol represented by the following general formula (I); and the fluorine atom-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group which has a carbon atom number of 3 to 20 and a fluorine atom content of not less than 30% by weight and in which at least three terminal carbon atoms are completely fluorinated, with (ii) poly(oxyalkylene) acrylate or poly(oxyalkylene)methacrylate, the copolymer containing the fluoroaliphatic group-containing acrylate or methacrylate units in an amount ranging from 35 to 50% by weight on the basis of the weight of the copolymer and the copolymer having has a molecular weight ranging from 20,000 to 100,000:HO--(CH.sub.2 CH.sub.2 O).sub.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: August 23, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5320928
    Abstract: A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.
    Type: Grant
    Filed: September 5, 1991
    Date of Patent: June 14, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 5316892
    Abstract: A negative-working lithographic printing plate having a radiation-sensitive layer comprising a diazo resin, an acid-substituted ternary acetal polymer and an unsaturated polyester is developed with an aqueous developing composition comprising an organic solvent, an anionic surface active agent, sodium oxalate, sodium nitrate or an alkali metal tetraborate an aliphatic monocarboxylic acid, an aliphatic dicarboxylic acid and sufficient alkaline buffering system to provide an alkaline pH. The method effectively avoids problems of blinding and background sensitivity which are of critical concern in the printing art.
    Type: Grant
    Filed: July 23, 1992
    Date of Patent: May 31, 1994
    Assignee: Eastman Kodak Company
    Inventors: John E. Walls, Gary R. Miller, Raymond W. Ryan, Jr.
  • Patent number: 5310618
    Abstract: A light-sensitive composition comprising either an alkali-soluble resin or radical-polymerizable, unsaturated compound, and a diazonium compound represented by general formula (I) or (II):(S).sub.1 --(L.sup.1).sub.m --(D).sub.n (I)--(L.sup.2 (S)).sub.o --(L.sup.3 (D)).sub.P -- (II)wherein D is a diazonium salt group, S is a light absorbing group, L.sup.1, L.sup.2 and L.sup.3 are connecting groups connecting S and D, provided that S and D are not conjugated by L.sup.1, L.sup.2 and L.sup.3 ; l, m, n, o and p are integers.
    Type: Grant
    Filed: May 24, 1991
    Date of Patent: May 10, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kouichi Kawamura
  • Patent number: 5308735
    Abstract: Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: ##STR1## wherein X.sup.- is a counter anion, Y is a divalent bonding group selected from the group consisting of --NH--, --S-- and --O--, R.sub.1, R.sub.2 and R.sub.3 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R.sub.4 and R.sub.5 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and a phenyl group, 1 and m are integers which satisfy the relation:1+m=2 to 100, 1/m=30 to 99/1 to 70and A is a quaternary ammonium salt-containing group represented by the formula: ##STR2## (wherein B is a straight or branched divalent C.sub.1-10 alkyl group which bonds to an aromatic ring by a group selected from the group consisting of --CH.sub.2 --, --CO--, --O--, --S-- and --N--, and R.sub.6, R.sub.7 and R.sub.8 are groups which are independently selected from the group consisting of hydrogen and a C.sub.
    Type: Grant
    Filed: October 29, 1992
    Date of Patent: May 3, 1994
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Edward Lam, Osamu Nanba
  • Patent number: 5302487
    Abstract: The invention describes a solvent mixture for photohardenable compositions, which includes(a) a first component having(i) a first constituent of(aa) a polar solvent of the formula R-OH, wherein R is a H or alkyl, or(aa') a monoalkylether or an alkylether ester of a glycol and constituent of(ii) a second an organic solvent having a boiling point in the range of from about 60.degree. to 160.degree. C. and comprising an aliphatic ketone, an alkanoic acid alkylester, a hydroxyalkanoic acid alkylester or a cyclic ether,in quantitative proportions selected to form a homogeneous mixture, andb) from about 0.1 to 8% by weight, relative to the total solvent mixture, of another solvent, the boiling point of which is higher than each individual boiling point of the constituents of the first component (a). The solvent mixture is used to obtain coating solutions layers which have a higher photosensitivity than corresponding layers prepared without the addition of component (b).
    Type: Grant
    Filed: May 19, 1992
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Reinhold Arneth, Eberhard Hehl, Werner Frass, Guenter Jung
  • Patent number: 5300397
    Abstract: A light-sensitive composition comprising a diazonium compound and a polymer binder wherein the polymer binder comprises structural units represented by the following formula (I); ##STR1## wherein X represents a single bond, an ester bond or an amide bond; and Y represents a polymer group comprising structural units represented by the following formula (II); ##STR2## where Z represents ##STR3## R.sup.1 and R.sup.3 represent hydrogen atom or methyl group; R.sup.2 and R represent a single bond or a divalent bridging group; and R.sup.5 and R.sup.6 represent hydrogen atom or optionally substituted hydrocarbon group having 1 to 15 carbon atoms; and R.sup.7 represents an optionally substituted hydrocarbon group having 1 to 15 carbon atoms. The present light-sensitive composition exhibits extremely enhanced sensitivity and hence gives sufficient image formation with a short light exposure time.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: April 5, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Keitaro Aoshima
  • Patent number: 5279917
    Abstract: A light-sensitive composition comprises a light-sensitive compound, an alkali soluble resin and a fluorine-containing surfactant. The surfactant is a copolymer of a (poyoxyalkylene)acrylate or (polyoxyalkylene)methacrylate with an acrylate or methacrylate having a fluorine-containing aliphatic group. The copolymer has a weight average molecular weight of 1000 to 6000 and contains the acrylate or methacrylate in an amount of 10 to 25% by weight. The fluorine-containing aliphatic group has 6 to 20 carbon atoms and 30% or more by weight of fluorine atoms.
    Type: Grant
    Filed: May 4, 1992
    Date of Patent: January 18, 1994
    Assignee: Konica Corporation
    Inventors: Yutaka Adachi, Hideyuki Nakai, Takeshi Tanaka
  • Patent number: 5279922
    Abstract: A light-sensitive coating liquid, comprising, as an organic solvent, at least one substance represented by the formulae (I) to (III) shown below: ##STR1## wherein R.sub.1 represents an alkyl group having 1 to 4 carbon atoms, R.sub.2 to R.sub.7 each represent hydrogen atom or an alkyl group having 1 to 3 carbon atoms, with the proviso that at least one of R.sub.2 to R.sub.7 is an alkyl group. The light-sensitive coating liquid of this invention is improved in odor, low in toxicity and yet excellent in storability, and is also suitable for preparation of a light-sensitive lithographic printing plate improved in press life and dye remaining.
    Type: Grant
    Filed: March 4, 1992
    Date of Patent: January 18, 1994
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Yutaka Adachi, Kiyoshi Goto, Koji Fukazawa, Kunitaka Naito, Masaaki Tsuchiyama
  • Patent number: 5278022
    Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub. --Z.sup.+, CO.sub.2 R or SO.sub.3 -Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.
    Type: Grant
    Filed: March 18, 1992
    Date of Patent: January 11, 1994
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: John R. Wade, Robert A. W. Johnstone
  • Patent number: 5278023
    Abstract: Laser-addressable thermal transfer materials for producing color proofs, printing plates, films, printed circuit boards, and other media are disclosed. The materials contain a substrate coated thereon with a propellant layer wherein the propellant layer contains a material capable of producing nitrogen (N.sub.2) gas at a temperature of preferably less than about 300.degree. C.; a radiation absorber; and a thermal mass transfer material. The thermal mass transfer material may be incorporated into the propellant layer or in an additional layer coated onto the propellant layer. The radiation absorber may be employed in one of the above-disclosed layers or in a separate layer in order to achieve localized heating with an electromagnetic energy source, such as a laser. Upon laser induced heating, the transfer material is propelled to the receptor by the rapid expansion of gas.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: January 11, 1994
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Richard E. Bills, William V. Dower, Thomas A. Isberg, Stanley C. Busman, Jeffrey C. Chang, Minyu Li, Hsin-hsin Chou
  • Patent number: 5275907
    Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.
    Type: Grant
    Filed: July 23, 1992
    Date of Patent: January 4, 1994
    Assignee: Eastman Kodak Company
    Inventor: John E. Walls
  • Patent number: 5272035
    Abstract: A light-sensitive composition comprising (a) a diazonium compound, (b) a polyurethane resin having a substituent group with an acidic hydrogen atom, and (c) a compound of the following general formula: ##STR1## wherein X is a single bond, --O--, --CH.sub.2 --, or --CH.sub.2 O--; Y is an alkyl group, a hydroxy group, an alkoxy group, a nitro group or a halogen atom; n is an interger of from 0 to 5; R is a hydrogen atom, an alkyl group, a phenyl group or a substituted phenyl group; and wherein, when n.gtoreq.2, Y may be the same or different.Also disclosed is a photosensitive lithographic printing plate having a support and a light-sensitive layer deposited thereon. The light-sensitive layer comprises the above novel light-sensitive composition.
    Type: Grant
    Filed: May 15, 1991
    Date of Patent: December 21, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5264318
    Abstract: A positive type photosensitive composition developable with water or warm water alone of water-soluble photocrosslinking agent, water-soluble resin and synthetic resin emulsion and further a coloring agent, if necessary.
    Type: Grant
    Filed: January 7, 1992
    Date of Patent: November 23, 1993
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Norio Yabe, Kuniaki Monden, Hisashi Mino
  • Patent number: 5262270
    Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: November 16, 1993
    Assignee: Eastman Kodak Company
    Inventor: John E. Walls
  • Patent number: 5260161
    Abstract: Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: November 9, 1993
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Toshiyuki Matsumura, Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
  • Patent number: 5254431
    Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: October 19, 1993
    Assignee: Vickers plc
    Inventors: Terence Etherington, Victor Kolodziejczyk
  • Patent number: 5250393
    Abstract: A method for preparinq a lithographic printing plate comprising the steps of imagewise exposing, to light, a negative-working presensitized plate for use in making a lithographic printing plate which comprises a substrate provided thereon with a light-sensitive layer comprising an aromatic diazonium compound having at least one member selected from the group consisting of carboxyl groups, phenolic hydroxyl groups, sulfonic acid residues, sulfinic acid residues and phosphorus atom-containing oxyacid residues and developing the imagewise exposed presensitized plate with a developer which comprises an aqueous solution of an alkali metal or ammonium silicate having a ratio: [SiO.sub.2 ]/[M], wherein [SiO.sub.2 ] and [M] represent the molar concentrations of SiO.sub.2 and the alkali metal or ammonia in the developer respectively, ranging from 0.15 to 0.75 and an SiO.sub.2 content ranging from 1.0 to 4.
    Type: Grant
    Filed: December 17, 1991
    Date of Patent: October 5, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, deceased, Keiji Akiyama, Tadao Toyama, Akinobu Koike
  • Patent number: 5242779
    Abstract: A photosensitive mixture is disclosed that contains a photocurable compound, for example, a diazonium salt polycondensation product, or a photocurable combination of compounds, for example, a photopolymerizable mixture, and a polymeric binder, which binder is a graft copolymer with a polyurethane graft backbone onto which chains containing vinyl alcohol units and vinyl acetal units derived from hydroxyaldehydes are grafted. The mixture is suitable for use in the production of printing plates and photoresists, can be developed with purely aqueous solutions, and gives printing plates distinguished by high resistance to mechanical and chemical attacks.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: September 7, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
  • Patent number: 5240808
    Abstract: A light-sensitive composition which comprises at least one polymeric compound having both photocross-linkable groups and functional groups carrying P--OH bonds. The light-sensitive composition can effectively be employed for making lithographic printing plates, IC circuits and photomasks. The light-sensitive composition shows excellent practically acceptable developability with either of an aqueous alkali developer and an aqueous alkaline solution containing or free of organic substances such as organic solvents and/or surfacants. Moreover, when it is used to form PS plates, the resulting lithographic printing plates never cause background contamination and can provide a large number of good printed matters. The composition makes it possible to develop negative working PS plates with developers for positive working PS plates. Therefore, when both positive and negative working PS plates are processed, the use of the composition can save various troubles.
    Type: Grant
    Filed: January 8, 1992
    Date of Patent: August 31, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keitaro Aoshima, Masanori Imai
  • Patent number: 5238772
    Abstract: A photopolymerizable mixture is disclosed which contains:a) a graft copolymer having a polyurethane as the graft backbone, onto chains containing vinyl alcohol units and vinyl acetal units are grafted,b) a free-radically polymerizable compound possessing at least one terminal ethylenically unsaturated group and having a boiling point of more than 100.degree. C. at normal pressure, andc) a compound or a combination of compounds which under the action of actinic light is capable of initiating the polymerization of compound b).The mixture is suitable for use in the production of printing plates and photoresists. It is distinguished by high photospeed and can be developed with aqueous solutions. It yields printing plates producing large print runs.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: August 24, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Karl-Josef Rauterkus, Matthias Kroggel
  • Patent number: 5225309
    Abstract: Disclosed is a light-sensitive litho printing plate comprising:a support, a light-sensitive layer and a silicone rubber layer provided thereon,wherein said light-sensitive layer contains a substance,whereby said substance forms a color during developing or after developing.
    Type: Grant
    Filed: March 19, 1992
    Date of Patent: July 6, 1993
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Norihito Suzuki, Kiyoshi Goto, Hiroshi Tomiyasu, Kazuo Noguchi, Akeo Kasakura
  • Patent number: 5219699
    Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and an acid-substituted ternary acetal polymer which functions as a polymeric binder. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: June 15, 1993
    Assignee: Eastman Kodak Company
    Inventors: John E. Walls, Larry D. LeBoeuf
  • Patent number: 5213941
    Abstract: This invention provides an improved negative-working or positive-working, single sheet color proofing method which can accurately reproduce images by using colored, photosensitive layers on substrates which are then overcoated with partially developable adhesive layers. The final construction is useful in predicting the image quality from a lithographic printing process. The partial removal of the adhesive layers cleans out any background stain which may remain from the incomplete removal of the photosensitive layer.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: May 25, 1993
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5212041
    Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.
    Type: Grant
    Filed: April 2, 1991
    Date of Patent: May 18, 1993
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 5206111
    Abstract: A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.
    Type: Grant
    Filed: January 10, 1991
    Date of Patent: April 27, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Wilharm, Gerhard Buhr, Juergen Fuchs
  • Patent number: 5206349
    Abstract: An aromatic diazo compound having at least two groups of Formula (I) in the molecule.This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method.The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z.sup.1 indicates ##STR2## wherein .phi..sup.1 is arylene or substituted arylene; and -.phi..sup.2 is >C.dbd.O, lower alkyl, lower alkylene, or aryl or substituted aryl.R.sup.1 and R.sup.2 are H, alkyl of C.sub.1 to C.sub.8, or alkyloxy of C.sub.1 to C.sub.8 ; X.sup.- is anion; and R.sup.
    Type: Grant
    Filed: August 5, 1991
    Date of Patent: April 27, 1993
    Assignee: Toyo Gosei Kogy Co., Ltd.
    Inventors: Hirotada Iida, Hajime Arai, Hitoshi Sugiura, Katsuhiko Sugou, Kieko Harada
  • Patent number: 5200291
    Abstract: A polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5y ranges from about 0.80 to about 0.35z ranges from about 0.10 to about 0.25n ranges from about 50 to about 1500R is selected from the group consisting of phenyl and C.sub.1 to C.sub.4 alkyl substituted phenyl;K is selected from the group consisting of ##STR2## --S--, --O--, and --CH.sub.2 --, or is absent; P and P.sub.1 are selected from the group consisting of C.sub.1 to C.sub.4 alkyl, methoxy, ethoxy, butoxy, and H; andP.sub.1 may be the same as P or different.
    Type: Grant
    Filed: April 11, 1991
    Date of Patent: April 6, 1993
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 5187040
    Abstract: A photocurable mixture is disclosed that contains a diazonium salt polycondensation product or an organic azido compound as the photosensitive compound and a high-molecular weight polymer as the binder, the polymer being a graft copolymer with a polyurethane as the graft backbone, onto which chains containing vinyl alcohol units are grafted. The mixture is suitable for use in the production of printing plates and photoresists, which can be developed with aqueous solutions. It yields printing plates having a good ink acceptance and long shelf life that produce large print runs.
    Type: Grant
    Filed: June 21, 1990
    Date of Patent: February 16, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel, Karl-Josef Rauterkus
  • Patent number: 5157018
    Abstract: Polymers comprising perfluoroalkyl groups, reproduction layers containing these polymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing polymers comprise polymers or polycondensates and have, in each case as substituents on different carbon atoms of benzene rings, phenolic OH groups and perfluoroalkyl groups which are optionally attached through intermediate members. In particular, at least 10% of the polymer units carry perfluoroalkyl groups. These polymers are either formed by condensation of substituted phenols (e.g., 4-hydroxybenzoic acid-perfluoroalkyl ester) with an aldehyde, a ketone, or a reactive bismethylene compound or by reacting polymers containing phenolic OH groups (e.g., hydroxypolystyrene) or polycondensates containing reactive OH groups (e.g., phenol-formaldehyde resins) with a perfluoroalkyl group-containing compound (e.g., 2,2-dihydroperfluorodecanoic acid chloride).
    Type: Grant
    Filed: February 10, 1992
    Date of Patent: October 20, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Werner H. Muller
  • Patent number: 5153095
    Abstract: A light-sensitive composition comprises (A) a polymer comprising structural units represented by the following general formula (I): ##STR1## (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl group or an aryl group; and Z represents a bivalent connecting group having at least 3 non-metallic atoms in the main chain); (B) a monomer or an oligomer having at least two polymerizable ethylenically unsaturatred double bonds; and (C) a photopolymerization initiator. The light-sensitive composition has high sensitivity and is excellent in stability of sensitivities such as storage stability, temperature dependency and latent image sensitization.
    Type: Grant
    Filed: July 15, 1991
    Date of Patent: October 6, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kouichi Kawamura, Hiromichi Sano, Masanori Imai
  • Patent number: 5143813
    Abstract: A light-sensitive mixture is described which contains a diazonium salt polycondensation product, a free-radical polymerizable compound having at least one terminal ethylenically unsaturated group and a boiling point at atmospheric pressure above 100.degree. C., a polymerization initiator which forms free radicals under the action of actinic radiation, and, as a first binder, a water-insoluble reaction product which is soluble in organic solvents and in aqueous alkaline solutions, which is a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a hydroxyl-containing synthetic polymer, and which has no further functional groups capable of reacting with acid anhydrides, and, as a further binder, an acid organic polymer having an acid number above 70, preferably a (meth)acrylic acid copolymer. The mixture is useful for producing planographic printing plates which give long print runs, and is notable for a long shelf life at elevated temperature.
    Type: Grant
    Filed: February 1, 1990
    Date of Patent: September 1, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Klaus Joerg
  • Patent number: 5134057
    Abstract: Disclosed is a method of providing a substrate with a layer comprising a polyvinyl base hydrogel and a biochemically active material by photolithograhy, comprising coating the substrate by centrifugal force with an aqueous solution of a photosensitive hydrogel forming polymer, a crosslinking agent and a biochemically active material, drying said coating, exposing the coated substrate through a photomask to ultraviolet radiation and developing said exposed coating, which is characterized by applying to the substrate an aqueous solution comprising as the cross-linking agent a polyazonium compound and glutardialdehyde. Because of this specific combination of cross-linking agents superior properties with respect to the binding of the biochemically active material are obtained.
    Type: Grant
    Filed: October 10, 1989
    Date of Patent: July 28, 1992
    Assignee: 501 PPG Biomedical Systems, Inc.
    Inventors: Martinus H. Kuypers, Gerardus F. J. Steeghs, Egbert Brinkmann
  • Patent number: 5126229
    Abstract: A developer composition comprises an aqueous alkaline solution which contains at least one alkali-soluble mercapto compound and/or thioether compound. The developer composition is excellent in developing properties and provides lithographic printing plates which do not cause background contamination of non-image areas during printing, when it is used in developing PS plates. It can be stored for a long time. The developer composition further makes it possible to develop both negative and positive working PS plates if its pH value is not less than 12.
    Type: Grant
    Filed: May 1, 1990
    Date of Patent: June 30, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiji Akiyama, Hiroshi Misu
  • Patent number: 5122442
    Abstract: The method for forming an image which comprisesI). providing a mesh fabric substrate, andII). coating said substrate with a light sensitive screen printing composition which comprises in admixtureA). at least one substantially water soluble binder resin component comprising an admixture of polyvinyl alcohol and polyvinyl acetate in an amount of from about 33% to about 90% polyvinyl alcohol and from about 10% to about 67% polyvinyl acetate based on the weight of the resin component, in sufficient amount to bind the composition components in a substantially uniform film when the composition is coated on a substrate and dried; andB). a photosensitive component in sufficient amount to substantially, uniformly photosensitize the composition,C).
    Type: Grant
    Filed: July 28, 1989
    Date of Patent: June 16, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Gerald Moskowitz, David M. Brown
  • Patent number: 5112743
    Abstract: Disclosed is a novel diazo resin which has at least one repeating unit represented by the following general formula (I): ##STR1## wherein R.sup.2 represents a hydrogen atom, an alkyl group or an alkoxy group, a hydroxyl group, a carboxy ester group or a carboxyl group: R.sup.1 represents a carboxyl group or a group having at least one carboxyl group; R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group or an alkoxy group; X.sup.31 represents an anion; and Y represents --NH--, --O-- or --S--. The diazo resin is useful for a presensitized plate for use in making a lithographic printing plate when it is incorporated into a light-sensitive layer or an underlayer on a substrate. According to the present invention, a presensitized plate using the diazo resin has excellent properties such as high sensitivity, good adhesion between the substrate and the light-sensitive layer and can thus provide a lithographic printing plate having a high printing durability and free of background contamination.
    Type: Grant
    Filed: May 16, 1990
    Date of Patent: May 12, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akihiko Kamiya, Akinobu Koike, Masanori Imai
  • Patent number: 5104961
    Abstract: Polymers comprising perfluoroalkyl groups, reproduction layers containing these polymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing polymers comprise polymers or polycondensates and have, in each case as substituents on different carbon atoms of benzene rings, phenolic OH groups and perfluoroalkyl groups which are optionally attached through intermediate members. In particular, at least 10% of the polymer units carry perfluoroalkyl groups. These polymers are either formed by condensation of substituted phenols (e.g., 4-hydroxybenzoic acid-perfluoroalkyl ester) with an aldehyde, a ketone, or a reactive bismethylene compound or by reacting polymers containing phenolic OH groups (e.g., hydroxypolystyrene) or polycondensates containing reactive OH groups (e.g., phenol-formaldehyde resins) with a perfluoroalkyl group-containing compound (e.g., 2,2-dihydroperfluorodecanoic acid chloride).
    Type: Grant
    Filed: December 19, 1990
    Date of Patent: April 14, 1992
    Assignee: Hoechst Celanese Corporation
    Inventor: Werner H. Muller
  • Patent number: 5089372
    Abstract: A transfer recording medium is disclosed, comprising a light transmitting support having provided thereon a heat transfer solid ink layer via an interlayer having a photolyzable compound. The recording medium provides a clear and high-quality color image on an image-receiving sheet at high speed and low cost irrespective of surface smoothness of the image-receiving sheet.
    Type: Grant
    Filed: November 20, 1989
    Date of Patent: February 18, 1992
    Assignees: Tomoegawa Paper Co., Ltd., Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiro Kirihata, Chikara Murata, Masahide Tsukamoto, Yutaka Nishimura
  • Patent number: 5084372
    Abstract: A light-sensitive composition for the preparation of printing plates is described, which contains a water-insoluble binder which is soluble in aqueous-alkaline solutions; a light-sensitive component which is an o- or p-quinone diazide, a diazonium salt polycondensation product or a mixture ofa) a compound which eliminates an acid on exposure to light andb) a compound having at least one C--O--C group which can be split by acid; and a thermo-crosslinking compound which is a cyclical acid amide of the general formula: ##STR1## wherein R denotes a hydrogen atom or an alkyl group. The printing plates can be baked at lower temperatures than plates without a crosslinking agent, but nevertheless have a long shelf life.
    Type: Grant
    Filed: January 23, 1991
    Date of Patent: January 28, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Shane Hsieh, Paul Stahlhofen
  • Patent number: 5080996
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: January 28, 1991
    Date of Patent: January 14, 1992
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5080999
    Abstract: A light-sensitive composition which comprises, (a) an ethylenically unsaturated addition polymerizable compound, (b) an alkaline water-soluble or swellable, and film-forming polymer, (c) a photopolymerization initiator, (d) a negative working diazo resin, and (e) at least one compound selected from the group consisting of a higher fatty acid and a higher fatty acid amide which are solid at ordinary temperatures.The light-sensitive composition is hardly influenced by oxygen and is suitable for a presensitized plate from which a printing plate is to be prepared.
    Type: Grant
    Filed: May 28, 1991
    Date of Patent: January 14, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, Mitsuru Koike, Noriaki Watanabe, Nobuyuki Kita, Tatsuji Higashi