Polymeric Diazonium Compound Patents (Class 430/175)
  • Patent number: 5066568
    Abstract: The invention is a method for preparing a photographic element which comprises imagewise exposing a photographic element, and removing the non-image areas thereof by contacting said element with a composition consisting essentially of in admixture:a) from at least about 5% to about 30% by weight of the developer of benzyl alcohol; andb) from about 1% to about 20% by weight of the developer of one of more compound selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; andc) from about 5% to about 40% by weight of the developer of potassium toluene sulfonate; andd) water in sufficient amount of formulate effective developer for imagewise exposed photographic elements.
    Type: Grant
    Filed: September 24, 1990
    Date of Patent: November 19, 1991
    Assignee: Hoehst Celanese Corporation
    Inventors: Shane Hsieh, Wayne A. Mitchell
  • Patent number: 5061591
    Abstract: The present invention relates to an aluminum support for a lithographic plate, whose surface is electrochemically roughened and has the following conditions:a) an arithmetic mean of the pit diameters of the electrolytically etched support is 4 .mu.m or less,b) a difference between an arithmetic mean (D.sub.L) of the maximum pit diameter of the support in the rolling direction and an arithmetic mean (D.sub.LT) of the maximum pit diameter of the support in the direction perpendicular to the rolling direction is larger than 10% of the maximum pit diameter (a larger one of D.sub.L and D.sub.LT),c) the number of pits detected with a surface roughness tester having a profilometer using a stylus having a tip radius of 1 .mu.m is at last 200/mm, andd) an average centerline roughness is 0.2 .mu.m to 1.0 .mu.m.According to the present invention, a lithographic plate having the aluminum support is excellent in both of a printing durability and a stain proofness.
    Type: Grant
    Filed: May 31, 1989
    Date of Patent: October 29, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Haruo Nakanishi, Hirokazu Sakaki
  • Patent number: 5057394
    Abstract: Method of forming a positive-positive type image is disclosed, which is characterized in that a photosensitive layer is formed on a substrate using a composition comprising water-soluble photo-crosslinking agent, water-soluble resin and synthetic resin emulsion and further coloring agent, if necessary, said photosensitive layer is exposed to active rays through manuscript, then this is immersed into warm water of 30.degree. to 60.degree. C. for not less than 3 seconds to allow the exposed area to swell and soften sufficiently with warm water and simultaneously to allow almost all water-soluble photo-crosslinking agent in the nonexposed area to dissolve out into warm water, and successively the swollen and softened exposed area is rubbed out to form an image having no coloring originating from water-soluble photo-crosslinking agent without using the development chemicals except water.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: October 15, 1991
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Norio Yabe, Hideaki Sasaki, Kuniaki Monden
  • Patent number: 5053310
    Abstract: This invention relates to negative photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: July 17, 1990
    Date of Patent: October 1, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5047309
    Abstract: A photosensitive recording material comprising (a) a substrate having a hydrophilic surface, (b) an undercoating layer comprising at least one compound having at least one functional group selected from the group consisting of thiol, thioether and disulfide groups, and (c) a photosensitive layer comprising at least one diazonium compound and a high molecular weight binder compound which is insoluble in water and soluble in aqueous alkaline solution. The resulting developed plate yields no background contamination in printing process.
    Type: Grant
    Filed: June 6, 1989
    Date of Patent: September 10, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akinobu Koike, Keiji Akiyama
  • Patent number: 5045429
    Abstract: A light-sensitive mixture that contains as essential constituents (a) a diazonium salt polycondensation product, (b) a free-radical polymerizable compound, (c) a polymerization initiator which forms free radicals under the action of actinic radiation and (d) a water-insoluble polymeric binder which is soluble in organic solvents and in aqueous alkaline solutions, where the binder is a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a hydroxyl-containing synthetic polymer, is preferably used for preparing planographic printing plates which combine high image resolution and an extended print run.
    Type: Grant
    Filed: July 30, 1990
    Date of Patent: September 3, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gerhard Mack, Georg Pawlowski
  • Patent number: 5017453
    Abstract: The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrogenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.
    Type: Grant
    Filed: January 31, 1989
    Date of Patent: May 21, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasunobu Onishi, Shuji Hayase, Rumiko Horiguchi, Akiko Hirao
  • Patent number: 5009981
    Abstract: A photosensitive composition, comprising a photosensitive diazo compound and a polymeric binder, wherein the diazo compound has a polymerizable unsaturated bond in the molecule.
    Type: Grant
    Filed: September 20, 1990
    Date of Patent: April 23, 1991
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
  • Patent number: 5008174
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: October 21, 1989
    Date of Patent: April 16, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5008175
    Abstract: A light-sensitive composition for the preparation of printing plates is described, which contains a water-insoluble binder which is soluble in aqueous-alkaline solutions; a light-sensitive component which is an o- or p- quinone diazide, a diazonium salt polycondensation product or a mixture of(a) a compound which eliminates an acid on exposure to light and(b) a compound having at least one C--O--C group which can be split by acid; and a thermo-crosslinking compound which is a cyclical acid amide of the general formula: ##STR1## wherein R denotes a hydrogen atom or an alkyl group. The printing plates can be baked at lower temperatures than plates without a crosslinking agent, but nevertheless have a long shelf life.
    Type: Grant
    Filed: February 16, 1990
    Date of Patent: April 16, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Shane Hsieh, Paul Stahlhofen
  • Patent number: 5008362
    Abstract: A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formula I and II:[(A-B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain or silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; and o, p, u and v each denote 0 or 1.
    Type: Grant
    Filed: April 3, 1989
    Date of Patent: April 16, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Wilharm, Gerhard Buhr, Juergen Fuchs
  • Patent number: 5006443
    Abstract: Polymers comprising perfluoralkyl groups, reproduction layers containing these polymers and use thereof for waterless offset printing. The novel perfluoralkyl group-containing polymers comprise polymers or polycondensates and have, in each case as substituents on different carbon atoms of benzene rings, phenolic OH groups and perfluoroalkyl groups which are optionally attached through intermediate members. In particular, at least 10% of the polymer units carry perfluoroalkyl groups. These polymers are either formed by condensation of substituted phenols (e.g., 4-hydroxybenzoic acid-perfluoroalkyl ester) with an aldehyde, a ketone, or a reactive bismethylene compound or by reacting polymers containing phenolic OH groups (e.g., hydroxypolystyrene) or polycondensates containing reactive OH groups (e.g., phenol-formaldehyde resins) with a perfluoroalkyl group-containing compound (e.g., 2,2-dihydroperfluorodecanoic acid chloride).
    Type: Grant
    Filed: January 7, 1988
    Date of Patent: April 9, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Werner H. Muller
  • Patent number: 4994530
    Abstract: Polymeric compounds comprise groups of the formula ##STR1## attached to carbon atoms of a polymer containing hydroxyl and optionally epoxide groups wherein X is ##STR2## The compounds are produced by reacting a starting polymer, which contains hydroxy groups and optionally epoxide groups with a reagent containing a cyclic anhydride group and a further functional group capable of reacting with the hydroxyl (and/or epoxide) groups preferentially to the anhydride group. The compounds are useful as bakeable support resins for radiation sensitive compounds in the production of printing plates.
    Type: Grant
    Filed: November 22, 1989
    Date of Patent: February 19, 1991
    Assignee: E. I. Du Pont de Nemours and Company (Inc.)
    Inventors: Terence Etherington, Victor Kolodziejczyk
  • Patent number: 4988601
    Abstract: A photosensitive resin composition having high heat resistance, sensitivity, and resolution performance, including a novolak resin prepared by condensing 2,5-xylenol with m-cresol and/or p-cresol using a carbonyl compound, a novolak resin prepared by condensing 3,5-xylenol with m-cresol and/or p-cresol, and a photosensitive reagent. In addition, four other types of photosensitive resin compositions are disclosed.
    Type: Grant
    Filed: November 25, 1988
    Date of Patent: January 29, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toru Ushirogouchi, Shuji Hayase, Yasunobu Onishi, Rumiko Horiguchi
  • Patent number: 4987048
    Abstract: An image forming material comprising a support, a coloring material-containing organic polymer layer and a photosensitive resin layer in order in the form of a laminate, wherein the organic polymer of the organic polymer layer comprises a copolymer of an aralkyl (meth)acrylate and (meth)acrylic acid.
    Type: Grant
    Filed: August 7, 1989
    Date of Patent: January 22, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomizo Namiki
  • Patent number: 4985332
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: January 15, 1991
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Albert G. Anderson, Walter R. Hertler, Robert C. Wheland, Yuan Yu G. Chen
  • Patent number: 4983491
    Abstract: A photosensitive composition is described, comprising a diazonium compound and a polyurethane resin having a carboxyl group in its main chain. The composition can be developed with an aqueous alkali developer to provide a lithographic printing plate having a long press life.
    Type: Grant
    Filed: September 22, 1989
    Date of Patent: January 8, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kazuo Maemoto, Akihiko Kamiya
  • Patent number: 4981909
    Abstract: Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.
    Type: Grant
    Filed: September 7, 1988
    Date of Patent: January 1, 1991
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, Scott L. Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman
  • Patent number: 4980263
    Abstract: A light-sensitive composition comprises a diazo resin, a polymeric binder, and at least one compound having at least one structural unit selected from the group consisting of ureido bond, thioureido bond, urethane bond and thiourethane bond. The light-sensitive composition can suitably be used for preparing a presensitized plate for use in making lithographic printing plates and is excellent in developability with an aqueous alkaline developer.
    Type: Grant
    Filed: March 2, 1989
    Date of Patent: December 25, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 4970133
    Abstract: Presensitized imaging element comprising a support and a light-sensitive hyrophilic layer thereon, said light-sensitive hydrophilic layer containing in homogeneously distributed state throughout the entire layer a hydrophilic (co)polymer or (co)polymer mixture, a tetraalkyl orthosilicate crosslinking agent in an amount of at least 0.2 parts by weight per part by weight of hydrophilic (co)polymer or (co)polymer mixture and a low-molecular weight diazonium salt and preferably also (a) substance(s) that increase(s) the mechanical strength and the porosity of the layer, by means of which a lithographic printing plate can be produced by imagewise exposing said imaging element to an ultraviolet radiation source, subsequently bringing it in the presence of an aqueous liquid in contact with a receptor element comprising a receiving layer containing a polyionic mordant for the diazonium salt and separating it from the receiving layer to leave the residual non-exposed diazonium salt on the receiving layer.
    Type: Grant
    Filed: October 13, 1988
    Date of Patent: November 13, 1990
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Joan T. Vermeersch, Paul J. Coppens
  • Patent number: 4963462
    Abstract: This invention relates to positive working color proofing sheet construction which, upon exposure to an actinic radiation source through a screened image, can accuratley reprouce said image. The construction is useful as a color proofing film which can be employed to accurately predict the image quality from a lithographic printing process. The image is produced by forming a composite of a receiver base, diazo or diazide layer, photopolymerizable layer and cover sheet. Upon imagewise exposure, a positive image appears on the receiver base after dry peel apart development.
    Type: Grant
    Filed: January 8, 1990
    Date of Patent: October 16, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Wojciech A. Wilczak
  • Patent number: 4963472
    Abstract: A developing method for printing plates employing waterless offset processes is disclosed. The plates comprise a support coated with a photosensitive layer based on a diazonium salt polycondensation product and a super-imposed ink-repellent, crosslinked silicone elastomer layer, whereby said developer is characterized in that it contains a predominant proportion of compounds of the general formula R--(O--CH.sub.2 --CH.sub.2 --).sub.n --O--R, where R denotes C.sub.m H.sub.2m+1, n denotes an integer from 1 to 25 and m denotes an integer from 1 to 5. The present invention is particularly suitable for developing printing plates where the photosensitive layer comprises a diazonium salt polycondensation product comprising recurrent A--N.sub.
    Type: Grant
    Filed: May 11, 1988
    Date of Patent: October 16, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Schlosser, Joerg Strack
  • Patent number: 4960671
    Abstract: This invention relates to a screen printing stencil composition which comprises (a) a stabilized aqueous dispersion of a water insoluble addition copolymer having units of formulas: A and B where A is preferably a polyvinyl acetate group and B is preferably a polyvinyl n-methylol acrylamide group and B comprises about 3% by weight of the copolymer; (b) a water soluble colloid; and (c) a photosensitizer: The composition is useful in the formation of a screen printing stencil, the composition having both a long stable profile and forming a durable stencil; the composition on exposure through a photographic positive can be developed with water and cross-linked with acid.
    Type: Grant
    Filed: November 22, 1989
    Date of Patent: October 2, 1990
    Inventor: Peter Dickinson
  • Patent number: 4957845
    Abstract: The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which contains a photofading material. The printing plate is safe against fogging to light and can be used under ordinary illumination.
    Type: Grant
    Filed: May 17, 1989
    Date of Patent: September 18, 1990
    Assignee: Toray Industries, Incorporated
    Inventors: Masanao Isono, Ken Kawamura, Masaya Asano, Tetuo Suzuki, Shigeo Abiko
  • Patent number: 4956262
    Abstract: A photosensitive printing plate for waterless offset printing is described which comprises a support, a photosensitive layer and an overlying, printing ink-repellent silicone rubber layer. The photosensitive layer contains a diazonium salt polycondensation product, a compound which can be polymerized by means of free radicals, preferably a (meth)acrylate, a photopolymerization initiator and optionally a binder. The printing plate has higher photosensitivity than corresponding plates whose photosensitive layer contains only a photopolymerizable mixture or only a diazonium salt polycondensation product.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: September 11, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Schlosser, Joachim Gersdorf
  • Patent number: 4956261
    Abstract: A photosensitive recording material with a layer base and a photosensitive layer, which essentially contains a diazonium salt polycondensation product, a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions, a polymerization initiator which forms free radicals when exposed to actinic radiation and a polymerizable ethylenically unsaturated compound containing at least one unsaturated group and having a boiling point at normal pressure of over 100.degree. C., wherein the recording material contains, between the photosensitive layer and the layer base, a photosensitive intermediate layer which essentially contains a diazonium salt polycondensation product and a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions.
    Type: Grant
    Filed: September 6, 1989
    Date of Patent: September 11, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Peter Lehmann
  • Patent number: 4954418
    Abstract: A photoresist film containing a phosphate of a formalin condensate of diazodiphenylamine, 2.5-bis(4'-azide-2'-sulphobenzilidene) cyclopentanone Na, polyvinylalcohol, and polyvinylpyrrolidone is formed on the inner surface of a faceplate. The photoresist film is hardened by light exposure using a point or linear light source, which is essentially a circular light source, via a shadow mask having a large number of apertures. A light absorbing film is formed on this photoresist film. Then the hardened photoresist film and the light absorbing film on top of it are removed using a peeling agent.
    Type: Grant
    Filed: May 31, 1989
    Date of Patent: September 4, 1990
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Norio Koike
  • Patent number: 4950582
    Abstract: A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
    Type: Grant
    Filed: March 31, 1988
    Date of Patent: August 21, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Keitaro Aoshima, Yasuo Okamoto
  • Patent number: 4946373
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a polymeric binder;(b) a photoinitiator;(c) a diazonium salt; and(d) a photopolymerizable mixture of(i) a polyfunctional acrylic monomer having from 3 to 6 unsaturated groups; and(ii) a monofunctional acrylic monomer having 1 unsaturated group.
    Type: Grant
    Filed: June 14, 1989
    Date of Patent: August 7, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Carlos Tellechea
  • Patent number: 4942109
    Abstract: A light-sensitive composition which is developable with an aqueous alkaline solution, comprising (a) at least one light-sensitive resin obtained by adding an active mercaptocarboxylic acid to a part of carbon-carbon unsaturated bonds of a polymer having at least two photodimerizable unsaturated double bonds adjacent to an aromatic nucleus in the main chain thereof and (b) optionally at least one negative-working diazo resin. The light-sensitive composition makes it possible to prepare a light-sensitive plate capable of developing with an aqueous alkaline solution without forming insoluble substances in the developer during the development and the adhesive force between the substrate and the light-sensitive layer of the plate is increased, which in turn substantially improves the printing durability of the lithographic printing plate as a final product.
    Type: Grant
    Filed: September 7, 1988
    Date of Patent: July 17, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeo Koizumi, Nobuyuki Kita
  • Patent number: 4940646
    Abstract: A polyvinyl acetal is described which contains 4 to 40 mol-% vinyl alcohol units, 1 to 20 mol-% vinyl acetate units, 0 to 85 mol-% vinyl acetal units derived from an aldehyde free of OH groups and 1 to 85 mol-% vinyl acetal units derived from an aldehyde containing OH groups. The polymer is suitable as binder for photosensitive mixtures, in particular for the preparation of printing plates and photoresists. The layers obtained therewith can be developed with neutral or weakly alkaline, purely aqueous solutions and produce printing plates with a high print run performance and good ink receptivity.
    Type: Grant
    Filed: December 21, 1987
    Date of Patent: July 10, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Georg Pawlowski
  • Patent number: 4937170
    Abstract: A photographic element formed from a substrate and light sensitive coating on the substrate wherein the coating comprises a mixture of a diazo compound and an aromatic carboxylic coupling agent having phenolic hydroxy groups, in an acidic medium.
    Type: Grant
    Filed: March 1, 1988
    Date of Patent: June 26, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Dieter Mohr
  • Patent number: 4929534
    Abstract: A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone diazide. A copying material produced with the photosensitive mixture has a high photosensitivity and an exceptional developer resistance. The photosensitive mixture is used in reproduction technique, and also in the field of resists.
    Type: Grant
    Filed: August 26, 1988
    Date of Patent: May 29, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Trutz-Ulrich Stephani, Dieter Mohr, Britta Maisel, Werner Frass
  • Patent number: 4929532
    Abstract: The invention relates to negative photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: April 12, 1989
    Date of Patent: May 29, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Thomas A. Dunder
  • Patent number: 4929533
    Abstract: A process is described for producing a presensitized lithographic printing plate by coating onto a surface-roughened aluminum plate a solution having dissolved in a solvent containing at least 10 wt % 1-methoxy-2-propanol a negative-working, light-sensitive composition which contains a light-sensitive diazo resin and a high-molecular weight compound and which is developable with an aqueous alkali developer, and drying the coated solution.
    Type: Grant
    Filed: July 1, 1988
    Date of Patent: May 29, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuo Nishikawa, Hiroshi Misu
  • Patent number: 4920036
    Abstract: A photosensitive recording material employable in a printing art, etc. comprising a support, an intermediate layer, and a photosensitive resin layer which comprises a pigment, superposed in this order, which is characterized in that said pigment has an anionic group and said photosensitive resin layer contains a compound having a cationic group.
    Type: Grant
    Filed: September 7, 1989
    Date of Patent: April 24, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mikio Totsuka, Fumiaki Shinozaki, Yuichi Wakata, Tomizo Namiki
  • Patent number: 4917988
    Abstract: A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:(a) at least 10 wt. % of 1-methoxy-2-propanol,(b) an amino group-free polar solvent having a boiling point under 1 atm of 50.degree. to 100.degree. C. and a dielectric constant at 20.degree. C. of at least 5.5, and(c) 2 to 50 wt. % of methyl lactate,and drying the coated solution.
    Type: Grant
    Filed: February 17, 1988
    Date of Patent: April 17, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeo Koizumi, Nobuo Nishikawa, Nobuyuki Kita
  • Patent number: 4916046
    Abstract: The invention relates to a positive radiation-sensitive mixture containing a compound which forms an acid under the action of actinic radiation, an acid-cleavable compound, and a binder, wherein the acid-cleavable compound comprises a monomeric silylenol ether. The radiation-sensitive mixture described has a better shelf life than the prior art products and a high structural resolution.
    Type: Grant
    Filed: September 13, 1988
    Date of Patent: April 10, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Karl-Friedrich Doessel
  • Patent number: 4914000
    Abstract: A light-sensitive compound having the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of phenyl and C.sub.1 to C.sub.4 alklyl substituted phenyl.--K-- is selected from the group consisting of ##STR2## --S--, --O--, and --CH.sub.2 --, or is absent; R.sub.1 and R.sub.2 are independently selected from the group consisting of C.sub.1 to C.sub.4 alkyl, methoxy, ethoxy, butoxy, and H;X-- is an anion; andR denotes a hydrogen atom or a C.sub.1 to C.sub.4 alkyl group.
    Type: Grant
    Filed: February 3, 1988
    Date of Patent: April 3, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Major S. Dhillon
  • Patent number: 4914039
    Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.
    Type: Grant
    Filed: April 20, 1988
    Date of Patent: April 3, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Stanley F. Wanat
  • Patent number: 4912013
    Abstract: A photosensitive composition principally comprised of a photosensitive diazo resin and a lipophilic high molecular compound, wherein said photosensitive composition further contains a metal complex dye soluble in an organic solvent. Also disclosed is a photosensitive lithographic printing plate employing such a photosensitive composition.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: March 27, 1990
    Assignees: Konishiroku Photo Industry Co., Ltd., Mitsubishi Chemical Industries Limited
    Inventors: Norihito Suzuki, Kiyoshi Goto, Yoshihiro Maeda, Shigeki Shimizu
  • Patent number: 4910119
    Abstract: New polymers comprising repeat units represented by the formula ##STR1## where R is a hydrogen or a halogen atom, a cyanide group or an alkyl group,R1, R2 and R3 are identical or different, and each denotes a hydrogen or a halogen atom, an alkyl group, an alkoxy group or an alkoxycarbonyl group,R4 is a hydrogen atom or a divalent radical,A denotes the atoms required for completing a mononuclear or dinuclear aromatic ring system andm is 2 or 3,are used as binders in positive-working, radiation-sensitive recording materials.
    Type: Grant
    Filed: September 15, 1988
    Date of Patent: March 20, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Arnold Schneller, Juergen Sander
  • Patent number: 4902601
    Abstract: Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
    Type: Grant
    Filed: January 19, 1989
    Date of Patent: February 20, 1990
    Assignee: Vickers PLC
    Inventors: Rodney M. Potts, Michael J. Pratt, Keith M. Fletcher
  • Patent number: 4902602
    Abstract: Light-sensitive compositions comprise a light-sensitive diazo resin, a binder and a compound having a pivaloyl group. Lithographic printing plates prepared by using the light-sensitive compositions of the invention are excellent in ink receptivity.
    Type: Grant
    Filed: April 15, 1988
    Date of Patent: February 20, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Misu, Koichiro Aono, Yoshimasa Aotani
  • Patent number: 4886731
    Abstract: Photopolymeric printing plates wherein an electrochemically etched, anodized and silicated aluminum plate has a plurality of coatings applied thereon and wherein at least one of the coatings include a solvent soluble diazo therein.
    Type: Grant
    Filed: May 10, 1989
    Date of Patent: December 12, 1989
    Assignee: Cookson Graphics Inc.
    Inventors: Maria T. Sypek, Thomas P. Rorke
  • Patent number: 4885225
    Abstract: Particulate organic polymeric beads in the thermal adhesive layer of prepress color proofing elements prevents adhesive blocking without optical interference or reduction in adhesive performance.
    Type: Grant
    Filed: April 29, 1988
    Date of Patent: December 5, 1989
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Michael B. Heller, Leonard W. Sachi, David R. Walbridge
  • Patent number: 4877697
    Abstract: A liquid crystal display having display filter elements in registration with display electrodes. The filters are produced using color proofing films which are imaged to produce a regular pattern of dots. Filter elements are illuminated by electrodes selection to produce changeable images.
    Type: Grant
    Filed: May 26, 1988
    Date of Patent: October 31, 1989
    Assignees: Hoechst Aktiengesellschaft, Hiechst Celanese Corporation
    Inventors: Hansjoerg W. Vollmann, George S. K. Wong, Dennis Bellville
  • Patent number: 4877711
    Abstract: A light-sensitive composition which contains a polyurethane resin having a carbon-carbon unsaturated bond and a carboxyl group. A presensitized plate using the above light-sensitive composition can be developed with an aqueous alkaline developing solution and provides a lithographic printing plate having excellent printing durability.
    Type: Grant
    Filed: May 12, 1987
    Date of Patent: October 31, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kazuo Maemoto, Akihiko Kamiya, Hiroshi Misu
  • Patent number: 4859562
    Abstract: A photosensitive mixture that contains a photosensitive compound, for example, a photoinitiator or a diazo compound, and a reaction product of a polymer containing active hydrogen with an olefinically unsaturated compound represented by the formula ##STR1## wherein X and Y are the same or different and denote oxygen or sulfur,R.sub.1 is an olefinically unsaturated aliphatic radical containing 2 to 8 carbon atoms andR.sub.2 is a saturated aliphatic radical containing 1 to 8 carbon atoms or an aryl radical containing 6 to 10 carbon atoms,is suitable for producing photoresists and printing plates.
    Type: Grant
    Filed: May 8, 1987
    Date of Patent: August 22, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Jerg Kleiner, Thomas Gerdau
  • Patent number: 4857428
    Abstract: A photoresist film containing a phosphate of a formalin condensate of diazodiphenylamine, 2.5-bis (4'-azide-2'- sulphobenzilidene) cyclopentanone Na, polyvinylalcohol, and polyvinylpyrrolidone is formed on the inner surface of a faceplate. The photoresist film is hardened by light exposure using a point or linear light source, which is essentially a circular light source, via a shadow mask having a large number of apertures. A light absorbing film is formed on this photoresist film. Then the hardened photoresist film and the light absorbing film on top of it are removed using a peeling agent.
    Type: Grant
    Filed: January 14, 1988
    Date of Patent: August 15, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Norio Koike