Amide Patents (Class 430/283.1)
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Publication number: 20120135349Abstract: A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.Type: ApplicationFiled: November 21, 2011Publication date: May 31, 2012Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Koji Hasegawa
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Publication number: 20120129101Abstract: Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive tone imaging or negative tone imaging. The films formed thereby are useful as self-imageable layers in the manufacture of microelectronic, such as semiconductor, and optoelectronic devices.Type: ApplicationFiled: November 23, 2011Publication date: May 24, 2012Applicants: Promerus LLC, Sumitomo Bakelite Co., Ltd.Inventors: Osamu Onishi, Haruo Ikeda, Larry F. Rhodes, Pramod Kandanarachchi
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Publication number: 20120122033Abstract: A polymer precursor including a part which sequences an unsaturated bond having a ? electron orbit and a single bond alternately is disclosed. The polymer precursor has a first functional group and a second functional group which form a repeating unit constituting a polymer skeleton of an end product by an intramolecular reaction. At least a part of a conjugated state formed by the ? electron orbit in the molecule is disconnected or weakened due to a three-dimensional structure of the molecule and a transmittance with respect to an electromagnetic wave of at least one wavelength selected from the group consisting of 436 nm, 405 nm, 365 nm, 248 nm and 193 nm is improved.Type: ApplicationFiled: November 30, 2011Publication date: May 17, 2012Applicant: DAI NIPPON PRINTING CO., LTD.Inventor: Katsuya SAKAYORI
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Publication number: 20120115085Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.Type: ApplicationFiled: January 9, 2012Publication date: May 10, 2012Applicant: FUJIFILM CORPORATIONInventors: Hiromi KANDA, Shinichi KANNA, Haruki INABE
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Publication number: 20120107744Abstract: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.Type: ApplicationFiled: October 27, 2011Publication date: May 3, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiyuki Utsumi, Akiya Kawaue, Yoshitaka Komuro, Kenichiro Miyashita
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Patent number: 8168370Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.Type: GrantFiled: March 25, 2008Date of Patent: May 1, 2012Assignee: FUJIFILM CorporationInventor: Shuhei Yamaguchi
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Publication number: 20120097435Abstract: Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.Type: ApplicationFiled: April 30, 2010Publication date: April 26, 2012Applicant: PI R&D CO., LTD.Inventors: Toshiyuki Goshima, Maw Soe Win, Sigemasa Segawa, Eika Kyo
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Publication number: 20120100481Abstract: An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 ?3 or more in volume upon irradiation with an actinic ray or radiation, an actinic ray-sensitive or radiation-sensitive composition, including: a solvent; and (1A) a compound which is a low molecular compound having a molecular weight of 500 to 5,000 and containing (Z) one or more groups capable of decomposing upon irradiation with an actinic ray or radiation to produce an acid, (G) one or more acid-decomposable groups and (S) one or more dissolution auxiliary groups, wherein assuming that the number of the functional groups in one molecule of (Z), (G) and (S) is z, q and s, respectively, q/z?2 and s/z?2, and a pattern forming method using the composition are provided.Type: ApplicationFiled: July 28, 2010Publication date: April 26, 2012Applicant: FUJIFILM CORPORATIONInventors: Takayuki Ito, Tomotaka Tsuchimura, Takeshi Kawabata
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Publication number: 20120088191Abstract: A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group.Type: ApplicationFiled: June 3, 2010Publication date: April 12, 2012Applicant: AGFA GRAPHICS NVInventors: Xavier André, Philippe Moriamé, Hubertus Van Aert
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Publication number: 20120077123Abstract: Use of pigments of the formula (I) containing melamine as guest compound and having a dispersion harshness of more than 250 as pigments for colour filters for liquid-crystal displays.Type: ApplicationFiled: December 7, 2011Publication date: March 29, 2012Applicant: LANXESS DEUTSCHLAND GMBHInventors: Ulrich Feldhues, Frank Linke, Ronald Göbel, Dirk Pfuetzenreuter, Udo Herrmann
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Publication number: 20120076996Abstract: Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of those of general formulae (I) and (II) below, (C) a resin containing at least either a fluorine atom or a silicon atom, and (D) a mixed solvent containing a first solvent and a second solvent, at least either the first solvent or the second solvent exhibiting a normal boiling point of 200° C. or higher.Type: ApplicationFiled: September 27, 2011Publication date: March 29, 2012Applicant: FUJIFILM CORPORATIONInventors: Kei YAMAMOTO, Yusuke IIZUKA, Akinori SHIBUYA, Shuhei YAMAGUCHI
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Patent number: 8142983Abstract: A lithographic printing plate precursor is provided that, using laser exposure, exhibits an excellent capacity for plate inspection, an excellent on-press development performance or gum development performance, and an excellent scumming behavior, while maintaining a satisfactory printing durability. There is also provided a method of lithographic printing that uses this lithographic printing plate precursor. The lithographic printing plate precursor comprises an image recording layer having (A) a nonionic polymerization initiator that contains at least two cyclic imide structures, and (B) a compound that has at least one addition-polymerizable ethylenically unsaturated bond.Type: GrantFiled: March 10, 2009Date of Patent: March 27, 2012Assignee: Fujifilm CorporationInventor: Shota Suzuki
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Publication number: 20120058428Abstract: A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator having both a 9-fluorenylmethyloxycarbonyl-substituted amino group and a carboxyl group onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising an alcohol and an optional ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern.Type: ApplicationFiled: September 2, 2011Publication date: March 8, 2012Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Kazuhiro Katayama
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Publication number: 20120058429Abstract: A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q?5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.Type: ApplicationFiled: September 23, 2011Publication date: March 8, 2012Applicant: JSR CORPORATIONInventors: Kota Nishino, Ken Maruyama, Daisuke Shimizu, Toshiyuki Kai
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Publication number: 20120052444Abstract: A polymerizable composition contains: (A) a polymer compound having (a1) a repeating unit having a structure represented by the following formula (a1-1) in a side chain thereof; and (B) a polymerization initiator, and in the formula (a1-1), R11 and R12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, a sulfo group, an alkylsulfonyl group, a arylsulfonyl group, an acyl group, an aryloxycarbonyl group, an alkoxycarbonyl group or a carbamoyl group, R13, R14 and R15 each independently represents a hydrogen atom, an alkyl group or an aryl group, L1 represents a divalent connecting group, Y1 represents a single bond or a divalent connecting group selected from the group consisting of —CO—, —O—, —HN—, a divalent aliphatic group, a divalent aromatic group and a combination of these groups, and * indicates a site connecting to a main chain of the polymer compound.Type: ApplicationFiled: August 30, 2011Publication date: March 1, 2012Inventor: Yu IWAI
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Publication number: 20120045719Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z? represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.Type: ApplicationFiled: November 4, 2011Publication date: February 23, 2012Applicant: JSR CorporationInventors: Ken Maruyama, Kota Nishino, Kazuki Kasahara, Hirokazu Sakakibara
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Publication number: 20120037860Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.Type: ApplicationFiled: September 23, 2011Publication date: February 16, 2012Applicant: FUJIFILM CorporationInventors: Tomoya Sasaki, Toru Fujimori
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Publication number: 20120021357Abstract: A photosensitive insulating resin composition, comprising a polymer, a photosensitizer, and an amide derivative that is expressed by the following general formula (1); (in formula (1), R1 represents a bivalent alkyl group, R2 represents a hydrocarbon group with a carbon number of 1 to 10, and R3 represents a hydrogen atom or an alkyl group with a carbon number of 1 to 4.Type: ApplicationFiled: January 29, 2010Publication date: January 26, 2012Applicant: NEC CORPORATIONInventors: Katsumi Maeda, Shintaro Yamamichi
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Patent number: 8101332Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits excellent on-press developability, nonimage area fine line reproducibility and printing durability and that resists the production of scum during on-press development.Type: GrantFiled: March 27, 2009Date of Patent: January 24, 2012Assignee: Fujifilm CorporationInventors: Norio Aoshima, Yu Iwai
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Publication number: 20120015297Abstract: A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R1 represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R2 represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X? represents an anion.Type: ApplicationFiled: July 7, 2011Publication date: January 19, 2012Applicant: TOKYO OHKA KOGYO.CO., LTD.Inventors: Yoshitaka KOMURO, Yoshiyuki Utsumi
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Publication number: 20120015298Abstract: Disclosed is a photosensitive resin composition capable of displaying satisfactory patterning performance against an alkaline developer and yielding a cured film of a sufficiently low coefficient of linear thermal expansion. The photosensitive resin composition contains a photopolymerization initiator and a polyimide precursor obtained by the reaction of an ester-containing diamine such as 4-aminophenyl 4?-aminobenzoate, a biphenyl-based diamine such as 4,4?-diamino-2,2?-dimethylbiphenyl, and an unsaturated group-containing diamine such as 4,4?-diamino-2,2?-divinylbiphenyl with an acid anhydride such as pyromellitic dianhydride. The content of the structural unit derived from the unsaturated group-containing diamine in the polyimide precursor is 5-60 mol %.Type: ApplicationFiled: March 24, 2010Publication date: January 19, 2012Inventor: Yasuyuki Takao
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Publication number: 20120009522Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.Type: ApplicationFiled: March 30, 2010Publication date: January 12, 2012Applicant: FUJIFILM CORPORATIONInventors: Takayuki Kato, Hiroshi Saegusa, Kaoru Iwato, Shuji Hirano, Yusuke Iizuka, Shuhei Yamaguchi, Akinori Shibuya
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Publication number: 20120003583Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.Type: ApplicationFiled: June 29, 2011Publication date: January 5, 2012Applicant: FUJIFILM CORPORATIONInventors: Tomotaka TSUCHIMURA, Hideaki TSUBAKI, Toshiya TAKAHASHI
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Publication number: 20110315034Abstract: A lithographic printing plate precursor is provided which comprises an aluminum support having a hydrophilic surface and a coating provided thereon, said coating comprising a photopolymerisable composition having a polymerisable compound, a pigment dispersed with a dispersant, a polymerization initiator and a binder, characterized in that the dispersant is a compound free of —COOH, —PO3H2 or —OPO3H2 groups, and the polymerization initiator is a trihalomethyl-aryl sulphone wherein the aryl group is substituted by at least one electron-donating group and wherein the sum of the Hammett constants (sigma) of the substituting groups on said aryl group has a negative value. The printing plate precursor exhibits an excellent daylight stability and shelf-life.Type: ApplicationFiled: October 21, 2009Publication date: December 29, 2011Applicant: AGFA GRAPHICS NVInventors: Kristof Heylen, Alexander Williamson, Johan Loccufier, Sonny Wynants
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Publication number: 20110318542Abstract: There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.Type: ApplicationFiled: December 15, 2009Publication date: December 29, 2011Applicant: Central Glass Company, LimitedInventors: Kazunori Mori, Yuji Hagiwara, Yoshimi Isono, Satoru Narizuka, Kazuhiko Maeda
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Patent number: 8076052Abstract: Single- and multi-layer positive-working imageable elements include a first polymeric binder that is soluble in an alkaline developer upon exposure to imaging radiation and a radiation absorbing compound. The first polymeric binder comprises a backbone to which are attached pendant groups represented by the following Structure (I): wherein R1 and R2 are independently hydrogen or alkyl groups having 1 to 8 carbon atoms or aryl groups having 6 or 10 carbon atoms in the carbocyclic ring, L is a direct bond or a linking group having at least 1 carbon atom and optionally one or more nitrogen, oxygen, and sulfur atoms in the linking chain, and X is oxy, thio, or —NR— wherein R is hydrogen or an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 or 10 carbon atoms in the carbocyclic ring.Type: GrantFiled: January 10, 2008Date of Patent: December 13, 2011Assignee: Eastman Kodak CompanyInventors: Ting Tao, Jayanti Patel, Eric E. Clark
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Patent number: 8076054Abstract: A composition for forming an adhesive layer which results in strong adhesion force between a substrate and a photosensitive resin layer, and which does not cause transfer of the constituting components to the substrate, a relief printing plate using the same, and a method for manufacturing a relief printing plate are provided. The composition of the present invention comprises (a) a carboxyl group-containing polymer, and (b) an oxazoline group-containing polymer. Adhesive layer 20 formed using the composition of the present invention can be preferably used as an adhesive layer that adheres between substrate 10 and photosensitive resin layer 30 in a relief printing plate.Type: GrantFiled: February 19, 2007Date of Patent: December 13, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiaki Katayose, Takaaki Hirai, Syunji Nakazato
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Patent number: 8071273Abstract: It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide.Type: GrantFiled: March 27, 2009Date of Patent: December 6, 2011Assignee: Dai Nippon Printing Co., Ltd.Inventor: Katsuya Sakayori
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Publication number: 20110294069Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.Type: ApplicationFiled: May 31, 2011Publication date: December 1, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Young Cheol Bae, Deyan Wang, Thomas Cardolaccia, Seokho Kang, Rosemary Bell
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Publication number: 20110278049Abstract: The present invention relates to a photosensitive resin composition which is developable with an alkaline aqueous solution and does not need a high temperature for curing and the like, and has all the properties suitable for use in a cover film of a printed circuit board or a laminated body for a semiconductor, and a dry film comprising the same. The photosensitive resin composition comprises (A) a polyamic acid comprising a polymer of at least one diamine compound and at least one acid dianhydride; (B) a photopolymerizable compound having at least one polymerizable ethylenic unsaturated bond in its molecule; and (C) a photoinitiator.Type: ApplicationFiled: July 26, 2011Publication date: November 17, 2011Applicant: LG CHEM, LTD.Inventors: Hee-Jung KIM, You-Jin KYUNG, Kwang-Joo LEE
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Publication number: 20110281218Abstract: It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide.Type: ApplicationFiled: July 25, 2011Publication date: November 17, 2011Applicant: DAI NIPPON PRINTING CO., LTD.Inventor: Katsuya SAKAYORI
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Publication number: 20110281217Abstract: This invention relates to a negative photosensitive insulating resin composition characterized in that the composition comprises an alkali-soluble polymer having at least one repeating constitutional unit represented by the following general formula (1), a cross-linker and a photo-acid generator. The negative photosensitive insulating resin composition provides a film having excellent properties such as heat resistance, mechanical properties and electric properties, and can be alkali-developed to achieve high resolution. (In the formula, R1 represents a hydrogen atom or a methyl group, and R2 to R5 represent, independently each other, a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms.Type: ApplicationFiled: January 14, 2010Publication date: November 17, 2011Inventor: Katsumi Maeda
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Publication number: 20110200939Abstract: The present invention relates to a polyamic acid or polyimide comprising a heat-polymerizable or photo-polymerizable functional group, a photosensitive resin composition comprising the polyamic acid or the polyimide, a photosensitive resin composition being capable of providing a cured film that can be used for patterning at a high resolution and that has an excellent developing property in an alkaline aqueous solution, flexibility, adhesion strength, resistance to welding heat, and pressure cooker test (PCT) resistance, and a dry film prepared from the composition.Type: ApplicationFiled: August 27, 2010Publication date: August 18, 2011Applicant: LG CHEM, LTD.Inventors: Kwang-Joo LEE, You-Jin KYUNG, Joo-Eun KO, Heon-Sik SONG, Jung-Jin SHIM, Hee-Jung KIM
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Patent number: 7989140Abstract: A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided.Type: GrantFiled: September 17, 2008Date of Patent: August 2, 2011Assignee: FUJIFILM CorporationInventors: Shigefumi Kanchiku, Tomoya Sasaki
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Patent number: 7989578Abstract: The present invention relates to a negative photosensitive polyimide polymer having a repeating unit of formula (1) as a polymerized unit: wherein G, Q and P* are as defined in the specification. The polyimide polymer of the present invention is developable in an aqueous alkaline solution, and has the properties associated with an insulating layer and photoresist.Type: GrantFiled: October 30, 2007Date of Patent: August 2, 2011Assignee: Eternal Chemical Co., Ltd.Inventor: Chung-Jen Wu
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Patent number: 7989141Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.Type: GrantFiled: March 25, 2008Date of Patent: August 2, 2011Assignee: FUJIFILM CorporationInventor: Shuhei Yamaguchi
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Patent number: 7964334Abstract: The present invention provides a curable composition containing at least one species selected from polymerizable monomers represented by the following formulas (I) to (III) and a polymerization initiator, and a planographic printing plate precursor including the same. The curable composition can be cured with high sensitivity due to laser light exposure or the like, and the inhibition of polymerization due to oxygen is controlled. The composition has excellent solubility in a developer or a solvent.Type: GrantFiled: March 26, 2008Date of Patent: June 21, 2011Assignee: FUJIFILM CorporationInventors: Shigefumi Kanchiku, Koji Wariishi
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Patent number: 7955776Abstract: Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).Type: GrantFiled: July 3, 2006Date of Patent: June 7, 2011Assignee: Eastman Kodak CompanyInventors: Harald Baumann, Bernd Strehmel, Detlef Pietsch, Udo Dwars, Tanja Ebhardt, Axel Draber
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Publication number: 20110104454Abstract: The present invention provide a composition for forming a layer to be plated, including a solution in which from 1% by mass to 20% by mass of a polymer having a functional group that forms an interaction with a plating catalyst or a precursor thereof and a radical polymerizable group, and a water-insoluble photopolymerization initiator are dissolved in a mixed solvent comprising from 20% by mass to 99% by mass of a water-soluble flammable liquid and water; a method of producing a metal pattern material using the composition for forming a layer to be plated; and a metal pattern material produced by the method.Type: ApplicationFiled: October 25, 2010Publication date: May 5, 2011Applicant: FUJIFILM CORPORATIONInventors: Takatsugu KAWANO, Takeyoshi KANO
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Publication number: 20110076619Abstract: A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid generated by the second film is transferred to the first film.Type: ApplicationFiled: December 8, 2010Publication date: March 31, 2011Applicant: JSR CorporationInventor: Kouji NISHIKAWA
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Publication number: 20110053799Abstract: A method is of producing a microarray substrate that includes a substrate, a partition that is formed on a surface of the substrate, and an area that is positioned over the substrate and defined by the partition. The method includes forming a first film on the substrate using a radiation-sensitive composition. The radiation-sensitive composition includes a coloring agent (A) including at least one of a violet pigment (a2) and a compound (a1) shown by a formula (1) in which each of R1 and R2 represents one of a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms, a perfluoroalkyl group having 1 to 10 carbon atoms, and an amino group having 0 to 5 carbon atoms. The first film is patterned by lithography to form the partition.Type: ApplicationFiled: August 27, 2010Publication date: March 3, 2011Applicant: JSR CorporationInventors: Satoko ABIKO, Hirofumi Goto, Hazuki Takamura, Satoshi Ishikawa
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Patent number: 7869196Abstract: An electronic apparatus to which a portable apparatus is attachable, the electronic apparatus including: a main body portion; a front face portion; and a flexible board connecting the main body portion and the front face portion, and the front face portion is arranged to be capable of being displaced with respect to the main body portion; and a recess portion is defined at the front face portion to be capable of partially accommodating a distorted portion of the flexible board to be distorted when the flexible board is displaced.Type: GrantFiled: December 28, 2006Date of Patent: January 11, 2011Assignee: Fujitsu Ten LimitedInventor: Yuusuke Itoh
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Patent number: 7820361Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing (A) an initiator compound, (B) a polymerizable compound and (C) a binder, wherein the photosensitive layer or other layer in contact with the support contains as (D) a component different from the component (C), a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond introduced through an ion pair and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support.Type: GrantFiled: August 27, 2007Date of Patent: October 26, 2010Assignee: FUJIFILM CorporationInventors: Tomoya Sasaki, Hidekazu Oohashi
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Publication number: 20100248097Abstract: Negative-working imageable elements have a hydrophilic substrate and a single thermally-sensitive imageable layer. This layer can include an infrared radiation absorbing compound and polymeric particles that coalesce upon thermal imaging. These coalesceable polymeric particles comprise a thermoplastic polymer and a colorant to provide improved visible contrast between exposed and non-exposed regions in the imaged element, such as lithographic printing plates.Type: ApplicationFiled: March 27, 2009Publication date: September 30, 2010Inventors: Mathias Jarek, Domenico Balbinot
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Publication number: 20100248095Abstract: A colored curable composition for a color filter includes: (A) a pigment in an amount of from 35 to 70 mass % with respect to the total solid content of the colored curable composition, (B) an amino resin, (C) an alkali-soluble resin, (D) a polymerizable monomer, and (E) a photopolymerization initiator, in which the proportion of (B) the amino resin to (C) the alkali-soluble resin (B/C; mass ratio) is in the range of from 1 to 10.Type: ApplicationFiled: March 18, 2010Publication date: September 30, 2010Applicant: FUJIFILM CORPORATIONInventor: Kaoru AOYAGI
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Publication number: 20100233622Abstract: Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to be etched is formed; coating a composition for a mirror interlayer on the first photoresist pattern to form a mirror interlayer; forming a photoresist layer on the resultant; and forming a second photoresist pattern which is made by a scattered reflection of the mirror-interlayer and positioned between the first photoresist patterns, by exposing the photoresist layer to a light having energy which is lower than a threshold energy (Eth) of the photoresist layer without an exposure mask, and then developing the same.Type: ApplicationFiled: November 13, 2009Publication date: September 16, 2010Applicant: Dongjin Semichem Co., Ltd.Inventors: Jun-Gyeong Lee, Jung-Youl Lee, Jeong-Sik Kim, Eu-Jean Jang, Jae-Woo Lee, Deog-Bae Kim, Jae-Hyun Kim
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Patent number: 7794917Abstract: According to the present invention, there is provided a curable composition, containing a compound (A) having at least one ethylenically unsaturated double bond, a photopolymerization initiator (B), a coloring agent (C), an alkali-soluble resin (D), and a compound (E) having in the molecule a partial structure of urethane, amide or urea.Type: GrantFiled: September 10, 2007Date of Patent: September 14, 2010Assignee: FUJIFILM CorporationInventors: Hisahiro Mori, Taeko Aizawa
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Patent number: 7781148Abstract: Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.Type: GrantFiled: August 1, 2006Date of Patent: August 24, 2010Assignee: Kodak Graphic Communications, GmbHInventors: Celin Savariar-Hauck, Gerhard Hauck, Horst Glatt, Dietmar Frank
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Publication number: 20100190109Abstract: The acid transfer composition of the invention comprises a radiation-sensitive acid generator, a polymer having a nitrogen-containing group and a ketone-based solvent. The composition may comprise further a sensitizer. The pattern forming method of the invention comprises a second resin film formation process in which the acid transfer composition is used to form a second resin film (acid transfer film) on a first resin film containing an acid-dissociable group-containing resin, but not containing a radiation-sensitive acid generator, an exposure process for exposing the second resin film to a light through a mask to generate an acid in the second resin film, an acid transfer process for transferring the acid generated in the second resin film to the first resin film, and a second resin film removing process.Type: ApplicationFiled: January 20, 2010Publication date: July 29, 2010Applicant: JSR CorporationInventor: Kouji NISHIKAWA
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Patent number: 7745984Abstract: Provided are a composition for preparing an electron emission source, including a nano-sized inorganic material and a vehicle, a method for preparing an electron emission source using the composition, an electron emission source including a nano-sized inorganic material and a small amount of a residual carbon, and further, an electron emission device including the electron emission source.Type: GrantFiled: October 18, 2005Date of Patent: June 29, 2010Assignee: Samsung SDI Co., Ltd.Inventors: Hyun-Jee Lee, Chang-Wook Kim