Abstract: the invention provides a composition having laser engraving properties, comprising a host material and a laser enhancing additive. The host material comprises a material, such as a polymer, modified by a first process, whereby the host material as modified by the first process has increased thermal conductivity as compared to the host material before the first process. The laser enhancing additive comprises a first quantity of at least one of copper potassium iodide (CuKI3), Copper Iodide (CuI), potassium iodide (KI), sodium iodide (NaI), and aluminum iodide (AlI), and a second quantity of at least one substance selected from the group consisting of zinc sulfide (ZnS), barium sulfide (BaS), alkyl sulfonate, and thioester.

Abstract: Disclosed is a positive photosensitive resin composition that includes (A) a first polybenzoxazole precursor that includes: a repeating unit of Chemical Formula 1 and a thermally polymerizable functional group at least one terminal end; (B) a second polybenzoxazole precursor that includes a repeating unit of Chemical Formula 3; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent.

Abstract: A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.

Abstract: A lithographic printing plate precursor is provided that includes, above a support, a photosensitive layer including (i) a binder polymer, (ii) an ethylenically unsaturated compound, and (iii) a polymerization initiator, the ethylenically unsaturated compound (ii) including a compound represented by Formula (1) below. (In Formula (1), L denotes an (m+n)-valent linking group, the Ds independently denote a group selected from the group consisting of groups represented by Formulae (A) to (D) below, the Rs independently denote a monovalent substituent, m denotes an integer of 1 to 20, and n denotes an integer of 2 to 20.) (In Formulae (A) to (D), X, Y, and Z independently denote an oxygen atom, a sulfur atom, or NR17, R4 to R14 and R17 independently denote a hydrogen atom or a monovalent substituent, R15 denotes a hydrogen atom or a methyl group, R16 denotes a monovalent substituent, and k denotes an integer of 0 to 4.

Abstract: A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula (I): R1—X ??(I) wherein —X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted or unsubstituted alicyclic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a heterocyclic group; they may have an ether bond in the chain, provided that when —X is —OH, then R1 represents a group other than a hydrogen atom and an aro

Abstract: A photosensitive lithographic printing plate precursor for infrared laser includes in the following order: a support having a hydrophilic surface; a lower layer containing a polymer compound having at least a unit derived from a polymerizable monomer represented by the following formula (I); and an upper layer containing a polymer compound having a group represented by the following formula (II) in a side chain, wherein R1 represents a hydrogen atom or a methyl group, R2 represents a methylene group or an ethylene group, R3 represents a methyl group, and X represents O or NH, wherein Z1, Z2 and Z3 each independently represents a hydrogen atom or a monovalent substituent composed of at least one nonmetallic atom.

Abstract: The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.

Abstract: Disclosed are a positive photosensitive resin composition, a method of forming a pattern using the same, and a semiconductor device having a photoresist pattern obtained by the method. The composition for positive photosensitive resin comprises a polyamide derivative, a photosensitive compound, and at least one additive having a low molecular weight.

Abstract: A heat-sensitive imaging element includes an IR dye, and more particularly a heat-sensitive lithographic printing plate precursor includes the IR dye. A method for making the lithographic printing plate produces a print-out image of high contrast upon exposure to IR-radiation or heating.

Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.

Abstract: Positive-working imageable elements can be used to prepare lithographic printing plates. These elements have at least two layers (inner and outer) arranged on a suitable substrate. The inner layer that is closer to the substrate includes one or more polymeric binders that include pendant oxazoline groups and acid groups that are reactive with the oxazoline groups during a post-baking step after development. The resulting imageable elements are more quickly baked in this manner to provide improved run length and resistant to press chemicals.

Abstract: A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution having a pH of from about 3 to 11. The precursor has a primary polymeric binder that comprises recurring units derived from one or more N-alkoxymethyl(meth)acrylamides, provided that such recurring units are present in the primary polymeric binder in an amount of at least 10% based on the total dry primary polymeric binder weight. In addition, the primary polymeric binder is present in an amount of from about 12 to about 70% based on total imageable layer dry weight. The imaged precursor can be processed off-press or on-press.

Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.

Abstract: Negative-working imageable elements can be imaged and processed with water to provide lithographic printing plates. These imageable elements have imageable layers that contain a particulate polymeric binder having polyetheramine side chains. Rapid processing speeds are also possible using water and optional mechanical rubbing means for processing the imaged element.

Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer.

Abstract: Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R4 comprises a hydrophilic group, a hydrophilic group protected by an acid-cleavable group, a hydrophilic group protected by a base-cleavable group, a cross-linkable group, or combinations thereof, and i represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a photosensitive additive and a solvent, patterning the precursor polymer, and heating the precursor polymer at a thermal processing temperature in a range of from about 180° C. to about 300° C. to convert the precursor polymer into the final polymer.

Abstract: Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.

Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits excellent on-press developability, nonimage area fine line reproducibility and printing durability and that resists the production of scum during on-press development.

Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can be developed by a water-soluble resin-containing aqueous solution and a method of lithographic printing that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits an excellent fine line reproducibility in nonimage areas even when printing is performed using ultraviolet-curing ink (UV ink). Also provided is a negative-working lithographic printing plate precursor that exhibits an excellent combination of fine line reproducibility and printing durability and that resists the production of scum during on-press development.

Abstract: A lithographic printing plate precursor includes, in the following order: a support; an intermediate layer; and an image-forming layer, and the intermediate layer contains a polymer (A) comprising a repeating unit (a1) represented by the formula (I) as defined herein.

Abstract: A laser-decomposable resin composition contains: a compound including at least one structure selected from a carboxyl group and a carboxylic acid anhydride structure and at least one hetero atom selected from N, S and O atoms other than the structure; and a binder polymer.

Abstract: The present invention is directed to coverlay compositions derived from two-layer polyamic acid-based composites having a cover layer and adjacent thereto an adhesive layer wherein the cover layer comprises polyamic acid and other additives allowing the composition to be photosensitive and aqueous base developable, and where the adhesive layer can form a polyimide having a glass transition temperature between 170 and 250° C. The two-layer coverlay compositions of the present invention are used to encapsulate metal circuit traces formed on a flexible printed circuit base substrate. These two-layer compositions are particularity useful due to having an overall in-plane CTE between 10 and 40 ppm/° C. a range that is useful in avoiding unwanted curling of a flexible printed circuit when used as a polyimide-based coverlay material.

Abstract: To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties capable of preventing the formation of deposits during the development. In an infrared-sensitive or heat-sensitive lithographic printing plate precursor, comprising a substrate, a first image recording layer formed on the substrate, and a second image recording layer formed on the first image recording layer, the first image recording layer contains a resin which is soluble or dispersible in an aqueous alkali solution, and the second image recording layer contains a polyurethane which has a substituent having an acidic hydrogen atom.

Abstract: A positive photosensitive resin composition excellent in sensitivity and resolution, characterized by comprising 100 parts by mass of (A) a hydroxypolyamide comprising repeating units represented by the general formula (1), 1 to 50 parts by mass of (B) a photoacid generator, 5 to 20 parts by mass of (C) a carboxylic acid compound having 6 to 18 carbon atoms as represented by the general formula (2), and 0.01 to parts by mass of (D) an alcohol having 4 to 14 carbon atoms as represented by the general formula (3).

Abstract: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern.

Abstract: The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: X—C?C—C?C—Y—(CO)n-QZ wherein X is H or alkyl, Y is a divalent alkylene group, Q is O, S or NR, R is H or alkyl, and Z is alkyl, and n is 0 or 1. The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic substance as defined above; and further comprising the step of irradiating the plastic article to colour at least a region of the plastic article.

Abstract: A polyamide having a structure represented by the chemical formula (1): wherein m and n represent an integer satisfying m?1, n?1, 2?(m+n)?150, 0.3?m/(m+n)?0.9, R1 and R2 represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 represent at least one divalent organic group, and Z represents at least one monovalent organic group selected from mono-substituted amino and imido groups.

Abstract: The present invention relates to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used as a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed wiring board.

Abstract: A lithographic printing plate precursor includes, in the following order: a support; an undercoat layer; and an image-forming layer, the undercoat layer contains a polymer compound having a support-adsorbing group and an acid group, and at least a part of the acid groups is neutralized with a radical polymerizable compound having at least one member selected from the group consisting of a secondary amino group, a tertiary amino group and a hetero ring having a basic nitrogen atom.

Abstract: A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resins and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II, wherein at least one of the aromatic groups Ar1 and Ar2 is an optionally substituted heteroaromatic group;

Abstract: A method and a resist composition. The resist composition includes a polymer having repeating units having a lactone moiety, a thermal base generator capable of generating a base and a photosensitive acid generator. The polymer has the properties of being substantially soluble in a first solvent and becoming substantially insoluble after heating the polymer. The method includes forming a film of a photoresist including a polymer, a thermal base generator capable of releasing a base, a photosensitive acid generator, and a solvent. The film is patternwise imaged. The imaging includes exposing the film to radiation, resulting in producing an acid catalyst. The film is developed in an aqueous base, resulting in removing base-soluble regions and forming a patterned layer. The patterned layer is baked above the temperature, resulting in the thermal base generator releasing a base within the patterned layer and the patterned layer becoming insoluble in the solvent.

Abstract: An object of the present invention is to provide a lithographic printing plate precursor which is less apt to suffer from contamination by ablation in forming an image and having an excellent printing performance through image formation. A lithographic printing plate precursor comprises a base material (I), a photosensitive layer (II) containing a light/heat conversion agent on the base material (I), and a layer (III) covering the photosensitive layer (II), wherein the layer (III) covering the photosensitive layer contains both a water-soluble polymer and a hydrophobic polymer, and contains substantially no light/heat conversion agent is provided. The layer (III) covering the photosensitive layer is preferred to contain the water-soluble polymer and the hydrophobic polymer in a proportion of from 10:90 to 90:10 by mass.

Abstract: This disclosure relates to compositions that include (a) at least one polybenzoxazole precursor polymer; and (b) at least one silicon-containing polymer comprising a moiety of Structure (V): in which R5, R7, Ar5, m1, and m2 are defined in the specification.

Abstract: The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are particularly suitable for use in flexible circuit applications where low curl, low temperature curing, and good adhesion is a significant advantage.

Abstract: A positive resist composition includes: (A) a resin containing a repeating unit represented by formula (I) or (I?) as defined in the specification, of which solubility in an alkali developer increases under an action of an acid; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: and a pattern forming method uses the positive resist composition.

Abstract: The present invention provides a precursor that may provide a lithographic printing plate having an excellent image forming capability and having not only good hydrophilicity in a non-image part but also excellent printing resistance. Specifically, the present invention provides a lithographic printing plate precursor having a photosensitive layer containing a hydrophilic polymer, a crosslinking agent, hydrophobic polymer particles and a photo-thermal converter, wherein the hydrophilic polymer does not substantially contain, in its polymer chain, any of alcoholic hydroxyl groups and carboxyl groups (for example, 1.5% or less by mol of the repeating units of the hydrophilic polymer contain an alcoholic hydroxyl or carboxyl group).

Abstract: A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate precursor having an undercoat layer comprising (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, and a photosensitive layer containing (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator.

Abstract: Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, an image formation layer containing a cyclic ureide moiety-containing phenolic resin in which a phenolic resin has a cyclic ureide moiety through a linkage group, the cyclic ureide moiety being derived from a cyclic ureide and the linkage group being derived from a linkage compound having both a monohalogenated alkyl group and one selected from a vinyl group, a carbonyl group, an ester group and a sulfonic acid ester group.

Abstract: The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents an acid-decomposable group; and R3 to R6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.

Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.

Abstract: The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are particularly suitable for use in flexible circuit applications where low curl, low temperature curing, and good adhesion is a significant advantage.

Abstract: This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.

Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

Abstract: To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing ?-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.

Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

Abstract: A lithographic printing plate precursor capable of forming an image without undergoing alkali development, which comprises a hydrophilic support and a laser-sensitive photopolymerizing layer, wherein the photopolymerizing layer contains a polymer compound having at least one of an ether group, an ester group and an amido group in its molecule, particularly, in its side chain.

Abstract: Described are fluorochemical surfactants derived from nonafluorobutanesulfonyl fluoride that contain polyalkyleneoxy side chains and may be copolymerized with acrylic acid or methacrylic acid to form polyacrylates or polymethacrylates. The surfactants surprisingly lower the surface tension of water and other liquids in the same or similar low values achieved by premier surfactants such as those derived from perfluorooctane sulfonyl fluoride.

Abstract: A resist material includes a polymeric material made of a unit represented by a general formula of the following Chemical Formula; and an acid generator for generating an acid through irradiation with light: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; m?0, n?0, s>0 (whereas excluding m=n=0) and 1?k?3.

Abstract: Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

Abstract: A negative lithographic printing plate precursor includes a support; and a photo-polymerization layer containing a polymer compound having at least one of a sulfonamido group and a cyclic structure derived from maleimide, and further having a hydrophilic group in a molecule thereof