Ethylenic Unsaturation Within The Side Chain Component Patents (Class 430/287.1)
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Patent number: 8911921Abstract: Compounds of formula (I), (II), and (III), wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl, provided that at least one of R1, R2, R?2 and R??2 carries a specified substituent; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?7, RV, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: April 24, 2008Date of Patent: December 16, 2014Assignee: Ciba CorporationInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Publication number: 20140361415Abstract: New photoresists are provided that comprise preferably as distinct components: a resin, a photoactive component and a phenolic component Preferred photoresists of the invention are can be useful for ion implant lithography protocols.Type: ApplicationFiled: August 25, 2014Publication date: December 11, 2014Inventor: Gerhard Pohlers
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Publication number: 20140356789Abstract: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.Type: ApplicationFiled: May 30, 2014Publication date: December 4, 2014Inventors: Charles Warren Wright, Ralph Rainer Dammel
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Publication number: 20140349223Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.Type: ApplicationFiled: August 5, 2014Publication date: November 27, 2014Applicant: FUJIFILM CORPORATIONInventors: Takeshi KAWABATA, Hideaki TSUBAKI, Hiroo TAKIZAWA
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Patent number: 8895224Abstract: Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L1, Z1, R1, and R21, R22 and R23 in formula (a1-1) and the variables in formulae (a2-1) to (a2-6) are as defined in the specification.Type: GrantFiled: August 26, 2013Date of Patent: November 25, 2014Assignee: FUJIFILM CorporationInventors: Hiroyuki Suzuki, Junya Abe, Takafumi Nakayama, Kohei Takeshita
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Patent number: 8889335Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.Type: GrantFiled: March 8, 2013Date of Patent: November 18, 2014Assignee: JSR CorporationInventor: Ken Maruyama
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Patent number: 8889332Abstract: A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.Type: GrantFiled: June 29, 2011Date of Patent: November 18, 2014Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.Inventors: Frank Y. Xu, Jun Sung Chun, Michael P. C. Watts
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Publication number: 20140308605Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.Type: ApplicationFiled: June 26, 2014Publication date: October 16, 2014Applicant: FUJIFILM CORPORATIONInventors: Junichi ITO, Hidenori TAKAHASHI, Shuhei YAMAGUCHI, Kei YAMAMOTO
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Publication number: 20140255833Abstract: A chemically amplified positive resist composition comprising (A) 100 pbw of a base resin which is normally alkali insoluble or substantially insoluble, (B) 0.05-20 pbw of a photoacid generator, (C) 0.1-50 pbw of a thermal crosslinker, and (D) 50-5,000 pbw of an organic solvent is coated to form a thick film having a high sensitivity and resolution.Type: ApplicationFiled: May 21, 2014Publication date: September 11, 2014Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroyuki YASUDA, Katsuya TAKEMURA, Shohei TAGAMI
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Patent number: 8828629Abstract: A black curable composition for forming a light-shielding color filter of solid-state imaging device is provided, which is capable of forming a pattern at low exposure dose even when containing a high concentration of an inorganic pigment, and preventing pattern defects. Also, a black curable composition for a wafer level lens is provided, which is capable of forming a cured film having excellent light shieldability and excellent in co-formability of both a large pattern and a fine pattern. The composition includes: an inorganic pigment; a copolymer containing a monomer having at least one of an amino group and a nitrogen-containing heterocyclic group, a monomer having at least one group of a carboxyl group, a phosphate group and a sulfonate group, and a macromonomer having a weight average molecular weight from 1,000 to 50,000; a polymerization initiator; a polymerizable compound; and an alkali-soluble resin having an unsaturated double bond.Type: GrantFiled: March 24, 2011Date of Patent: September 9, 2014Assignee: FUJIFILM CorporationInventors: Yushi Kaneko, Makoto Kubota, Kazuto Shimada
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Patent number: 8822126Abstract: The invention provides a resin composition for laser engraving, having a binder polymer containing at least one of a structure unit represented by the following Formula (I) or a structure unit represented by the following Formula (II). In the Formulae, Q represents a partial structure which provides an acid group having an acid dissociation constant pKa of 0 to 20 when it is in the form of -Q-H; R1 to R3 each independently represent a hydrogen atom or a monovalent organic group; and A and B each independently represent a bivalent organic connecting group. The invention further provides a relief printing plate precursor having a relief forming layer containing the resin composition, a method for manufacturing a relief printing plate having crosslinking components of the relief forming layer and laser engraving the relief forming layer, and a relief printing plate formed thereby.Type: GrantFiled: February 19, 2009Date of Patent: September 2, 2014Assignee: FUJIFILM CorporationInventor: Atsushi Sugasaki
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Publication number: 20140242520Abstract: An I-line photoresist composition, having excellent thermal stability at high temperature of 200-250° C., by which fine photoresist patterns form using an acid diffusion layer and a method for forming a fine pattern using the same, comprising: a polymer containing 1-99 mol % of repeating unit selected from a group consisting of 1-99 mol % of repeating unit represented by Formula 1, repeating unit represented by Formula 2, repeating unit represented by Formula 3 and mixture thereof; a photo active compound containing at least two diazonaphtoquinone (DNQ) groups; and an organic solvent. Formulas 1-3 are located in the specification. R* and R** are independently a hydrogen atom or a methyl group. R1 is a hydrogen atom or linear, branch or cyclic hydrocarbonyl group of 3-15 carbon atoms, containing or not containing 1-4 oxygen atoms. R2 is linear, branch or cyclic hydrocarbonyl group of 1-30 carbon atoms, containing or not containing 1-4 oxygen atoms.Type: ApplicationFiled: September 21, 2012Publication date: August 28, 2014Inventors: Jung-Youl Lee, Eu-Jean Jang, Jae-Woo Lee, Jae-Hyun Kim
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Publication number: 20140227637Abstract: A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.Type: ApplicationFiled: April 21, 2014Publication date: August 14, 2014Applicant: FUJIFILM CORPORATIONInventors: Keita KATO, Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi NAKAMURA, Hidenori TAKAHASHI, Kaoru IWATO
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Patent number: 8785087Abstract: The present invention provides a pigment-dispersed composition including at least a polymer compound (A-1) having at least one selected from the structural units represented by the following formulae (1) to (3), a pigment (B) and a solvent (C), and a pigment-dispersed composition including at least a resin (D) having an acid number of 100 mg KOH/g or more, a dispersion resin (A-2) having an acid number of less than 100 mg KOH/g and an unsaturation equivalent of less than 600, a pigment (B), and a solvent (C) [R1 to R20: a hydrogen atom, a monovalent organic group; A1 to A3: an oxygen atom, a sulfur atom, —N(R21)—; G1 to G3: a divalent organic group; X, Z: an oxygen atom, a sulfur atom, —N(R22)—; Y: an oxygen atom, a sulfur atom, a phenylene group, —N(R23)—; and R21 to R23: an alkyl group].Type: GrantFiled: December 27, 2007Date of Patent: July 22, 2014Assignee: FUJIFILM CorporationInventors: Taeko Nakashima, Kazuto Shimada, Shuichi Odagiri
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Patent number: 8765332Abstract: The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of from 6/4 to 3/7 (halogenated copper phthalocyanine pigment/barbituric acid derivative yellow pigment); a colored pattern formed from the green curable composition; a color filter including the colored pattern; a solid-state image sensor including the color filter; and a method of producing the color filter.Type: GrantFiled: March 18, 2009Date of Patent: July 1, 2014Assignee: FUJIFILM CorporationInventors: Hideki Takakuwa, Kazuto Shimada, Toru Fujimori
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Publication number: 20140178806Abstract: As a negative actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in sensitivity, resolution and pattern profile and reduced in line edge roughness (LER), scum and development defect, a negative actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a polymer compound containing (a) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation and (b) a repeating unit having a phenolic hydroxyl group, and (B) a crosslinking agent, is provided.Type: ApplicationFiled: February 28, 2014Publication date: June 26, 2014Applicant: FUJIFILM CorporationInventors: Tomotaka TSUCHIMURA, Takeshi INASAKI
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Patent number: 8758654Abstract: A photosensitive resin composition for a color filter includes (A) a binder resin including a cardo-based resin represented by the following Chemical Formula 1, (B) a photopolymerization initiator represented by the following Chemical Formula 14, (C) a photopolymerizable monomer, (E) a colorant, and (F) a solvent and a color filter using the same.Type: GrantFiled: June 10, 2013Date of Patent: June 24, 2014Assignee: Cheil Industries Inc.Inventor: Kiyoshi Uchikawa
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Publication number: 20140170563Abstract: The invention provides a positive resist composition, wherein a polymer compound having the weight-average molecular weight in the range of 1,000 to 500,000 and comprising a repeating unit having a hydrogen atom in a carboxyl group and/or in a phenolic hydroxy group therein been substituted by an acid-labile group and a repeating unit “a” having a cyclopentadienyl complex shown by the following general formula (1) is used as a base resin therein. There can be a positive resist composition having not only small edge roughness (LER and LWR) while having a higher resolution than conventional positive resist compositions, but also a good pattern form after exposure and an extremely high etching resistance, especially a positive resist composition using a polymer compound suitable as a base resin for a chemically amplifying resist composition; and a patterning process.Type: ApplicationFiled: November 20, 2013Publication date: June 19, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: Jun HATAKEYAMA
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Patent number: 8735026Abstract: A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.Type: GrantFiled: February 17, 2009Date of Patent: May 27, 2014Assignee: FUJIFILM CorporationInventors: Kazuto Shimada, Tomotaka Tsuchimura, Yoichi Maruyama, Toru Fujimori, Yushi Kaneko, Hiroyuki Einaga
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Publication number: 20140141376Abstract: Disclosed herein is a composition comprising a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to crosslink the graft block copolymer; a photoacid generator; and a crosslinking agent.Type: ApplicationFiled: November 19, 2012Publication date: May 22, 2014Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
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Patent number: 8728709Abstract: A lithographic printing plate precursor includes a support and an image-recording layer containing a star polymer, a radical polymerizable compound and a radical polymerization initiator, the star polymer is a star polymer in which a polymer chain is branched from a central skeleton via a sulfide bond and the polymer chain contains an acid group and a crosslinkable group in a side chain of the polymer chain.Type: GrantFiled: February 27, 2012Date of Patent: May 20, 2014Assignee: FUJIFILM CorporationInventor: Hidekazu Oohashi
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Patent number: 8722535Abstract: According to one embodiment, a pattern forming method is disclosed. The method can include forming an insulating layer on a major surface of a substrate. The method can include forming first and second openings on the insulating layer. The first opening has a first length in a first direction along the major surface, and the second opening has a second length longer than the first length in the first direction. The method can include forming a first pattern in the first opening. The method can include forming a second pattern in the second opening. The method can include forming a self-assembled material film contacting the insulating layer, the first pattern and the second pattern. The method can include forming a third pattern with guidance of the second pattern. In addition, the method can include forming a fourth pattern contacting the first pattern based on the third pattern.Type: GrantFiled: February 28, 2013Date of Patent: May 13, 2014Assignee: Kabushiki Kaisha ToshibaInventor: Masafumi Asano
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Patent number: 8715895Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a binder resin including phenol-based resin represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.Type: GrantFiled: August 21, 2012Date of Patent: May 6, 2014Assignee: Cheil Industries Inc.Inventors: Jung-Sik Choi, Chang-Min Lee, Min-Sung Kim, Jin-Woo Park, Myung-Ho Cho
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Publication number: 20140087294Abstract: In a chemically amplified positive resist composition comprising (A) a base resin, (B) a photoacid generator, (C) a thermal crosslinker, and (D) an organic solvent, the base resin is a specific polymer and the crosslinker is a siloxane compound. A coating of the composition is readily developable in aqueous alkaline solution. On heat treatment, it forms a cured resist pattern film of satisfactory profile.Type: ApplicationFiled: September 23, 2013Publication date: March 27, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masashi Iio, Katsuya Takemura, Takashi Miyazaki, Hideyoshi Yanagisawa
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Patent number: 8673540Abstract: The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.Type: GrantFiled: December 3, 2012Date of Patent: March 18, 2014Assignee: Eternal Chemical Co., Ltd.Inventors: Meng-Yen Chou, Chuan-Zong Lee
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Publication number: 20140045121Abstract: A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.Type: ApplicationFiled: February 12, 2013Publication date: February 13, 2014Applicant: SAMSUNG DISPLAY CO., LTD.Inventors: Ki-Beom LEE, Chang-Hoon KIM, Su-Yeon SIM, Sang-Hyn LEE, Hi-Kuk LEE
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Patent number: 8647813Abstract: Disclosed are a photosensitive composition containing an aqueous dispersion and having excellent storage stability, and a photosensitive lithographic printing plate material using the photosensitive composition and being capable of being developed using water, which is advantageous not only in that the photosensitive lithographic printing plate material exhibits high sensitivity and high image quality as well as excellent storage stability, but also in that even when the printing plate material is repeatedly subjected to developing treatment using water, the generation of sludge derived from the photosensitive composition in the developer repeatedly used is suppressed, achieving excellent developing properties.Type: GrantFiled: March 25, 2011Date of Patent: February 11, 2014Assignee: Mitsubishi Paper Mills LimitedInventors: Akira Furukawa, Takahiro Hagihara
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Patent number: 8642234Abstract: A carboxyl group-containing photosensitive resin is obtained by reacting an ?,?-ethylenically unsaturated group-containing monocarboxylic acid (c) with a phenolic compound (a) containing the structure represented by the following general formula (I) and having at least two phenolic hydroxyl groups in its molecule, wherein part or the whole of the phenolic hydroxyl groups being modified into an oxyalkyl group, and further reacting a polybasic acid anhydride (d) with the resultant reaction product; wherein R1 represents either one of a hydrocarbon radical of 1 to 11 carbon atoms, a SO2 group, an oxygen atom and sulfur atom, R2 represents a hydrocarbon radical of 1 to 11 carbon atoms, “a” represents an integer of 0 to 3, “n” represents an integer of 1 to 2, and “m” represents an integer of 1 to 10.Type: GrantFiled: September 13, 2011Date of Patent: February 4, 2014Assignees: Taiyo Holdings Co., Ltd., Showa Denko K.K.Inventors: Nobuhito Ito, Masao Arima, Syouji Nishiguchi, Kouji Ogawa, Masayuki Kobayashi, Atsushi Sakamoto
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Publication number: 20140030655Abstract: A method and a multi-photon photocurable composition are provided that allow for the formation of a three-dimensional microstructure having enhanced imaging resolution. The method involves providing a multi-photon photocurable composition system having an acrylic prepolymer and a multiphotohn photoinitiator system that comprises at least one distyrylbenzene dye or a benzothiazolyl fluorine derivative. The method includes imagewise exposing at least one voxel of the photocurable composition to a dose of electromagnetic energy under conditions effective to photodefinably form at least one solid voxel of a three-dimensional microstructure having a volume, wherein the solid voxel volume varies inversely with the dose.Type: ApplicationFiled: April 17, 2012Publication date: January 30, 2014Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventor: Robert J. DeVoe
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Patent number: 8632952Abstract: Provided are a photosensitive resin composition which is soluble in an alkaline aqueous solution and which has a good propagation loss in a visible light wavelength region, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same. Provided are, to be specific, a photosensitive resin composition comprising (A) a vinyl polymer having at least one chain-polymerizable functional group in a molecule, (B) a polymerizable compound and (C) a polymerization initiator, wherein the component (C) is at least one selected from the group consisting of 2-[2-oxo-2-phenylacetoxyethoxy]ethyl oxyphenylacetate, 2-(2-hydroxyethoxy)ethyl oxyphenylacetate and oligo{2-hyroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]}propanone, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same.Type: GrantFiled: November 17, 2008Date of Patent: January 21, 2014Assignee: Hitachi Chemical Company, Ltd.Inventors: Kouji Suzumura, Tatsuya Makino, Atsushi Takahashi
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Patent number: 8628698Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.Type: GrantFiled: July 23, 2010Date of Patent: January 14, 2014Assignee: Cheil Industries Inc.Inventors: Se-Young Choi, Jae-Hyun Kim, Nam-Gwang Kim, Eui-June Jeong, Sang-Kyun Kim, Kwen-Woo Han, Hyun-Hoo Sung
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Patent number: 8574794Abstract: Disclosed herein is a photosensitive resin composition which exhibits proper optical density and hydrophobicity when it is formed into a light-shielding film, and which is useful in preventing the color mixing or position deviation of color ink when the color ink is charged in a region defined by a light-shielding film.Type: GrantFiled: November 17, 2010Date of Patent: November 5, 2013Assignee: Kolon Industries, Inc.Inventors: Jae Gook Han, Chung Seock Kang, Soo Kang Kim, Young Sung Suh, Kyung Keun Yoon
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Patent number: 8563223Abstract: A photosensitive resin composition which has satisfactory compatibility in dry-film formation, has sensitivity equally to two lights of i-line and h-line, is excellent in resolution and adhesion, and can be developed with an alkaline aqueous solution. Also provided are: a layered photosensitive-resin product including the photosensitive resin composition; a method of forming a resist pattern on a substrate with the layered photosensitive-resin product; and a use of the resist pattern. The photosensitive resin composition comprises: (a) 20-90 mass % thermoplastic copolymer which includes comonomer units derived from an ?,?-unsaturated monomer having a carboxy group and which has an acid equivalent of 100-600 and a weight-average molecular weight of 5,000-500,000; (b) 5-75 mass % addition-polymerizable monomer having at least one ethylenically unsaturated terminal group; (c) 0.01-30 mass % photopolymerization initiator comprising a triarylimidazolyl dimer; and (d) 0.Type: GrantFiled: March 6, 2008Date of Patent: October 22, 2013Assignee: Asahi Kasei E-Materials CorporationInventor: Yosuke Hata
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Patent number: 8557498Abstract: A photosensitive resin composition is used that comprises a photosensitive silicone having a styryl group as a photosensitive group, and a photopolymerization initiator having a specific structure. As a result, a photosensitive resin composition capable of being cured in air by photopolymerization that is preferable for use as a buffer coat material or rewiring layer of an LSI chip, a method for forming a cured relief pattern using this photosensitive resin composition, and a semiconductor device comprising the cured relief pattern are provided.Type: GrantFiled: March 25, 2008Date of Patent: October 15, 2013Assignee: Asahi Kasei E-Materials CorporationInventor: Tomohiro Yorisue
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Patent number: 8551676Abstract: There are provided a pigment-dispersed composition comprising at least a resin having a pendant group containing a nitrogen-containing heterocyclic ring and an ethylenic unsaturated double bond in the main chain skeleton, a pigment, and a solvent, and a curable composition using this, a color filter having a colored pattern formed from the curable composition, and a production method thereof.Type: GrantFiled: March 28, 2008Date of Patent: October 8, 2013Assignee: FUJIFILM CorporationInventors: Taeko Nakashima, Kazuto Shimada
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Publication number: 20130244181Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.Type: ApplicationFiled: May 7, 2013Publication date: September 19, 2013Applicant: Georgia Tech Research CorporationInventors: Paul A. Kohl, Sue Ann Bidstrup-Alllen, Clifford Lee Henderson
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Patent number: 8530139Abstract: Disclosed is a solvent for printing which comprises a first solvent selected from the group consisting of acetone, methyl ethyl ketone, methyl acetate, ethyl acetate, methanol and mixtures thereof, and a second solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), isopropanol, butyl acetate, ethyl-3-ethoxypropionate and mixtures thereof. Further disclosed are a pattern composition for printing comprising the solvent for printing, and a patterning method using the composition. The use of the solvent for printing enables formation of an accurate pattern.Type: GrantFiled: March 19, 2012Date of Patent: September 10, 2013Assignee: LG Display Co., Ltd.Inventors: Hong Suk Yoo, Chul Ho Kim, Jung Jae Lee, Tae Young Oh
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Patent number: 8524425Abstract: Compounds of the formula (I) and (II) M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR?3R?4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or napthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R?2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R?3, R?4, R?3 and R?4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the formula (I) at least two oxime ester groups are present and provided that at least one specified substituent R2 or R?2 is present; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: April 28, 2008Date of Patent: September 3, 2013Assignee: BASF SEInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 8519408Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.Type: GrantFiled: August 30, 2012Date of Patent: August 27, 2013Assignee: Samsung Display Co., Ltd.Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
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Publication number: 20130209754Abstract: This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.Type: ApplicationFiled: February 9, 2012Publication date: August 15, 2013Applicant: AZ ELECTRONIC MATERIALS USA CORP.Inventors: Ruzhi ZHANG, Jihoon KIM, Bharatkumar K. PATEL, Elizabeth WOLFER
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Patent number: 8507178Abstract: The invention relates to use of a diacetylene compound as a color former wherein the diacetylene compound has one of general formulae (I) to (V). The invention also includes methods of imparting color to a material including a compound as defined above, which comprises subjecting the material to irradiation.Type: GrantFiled: July 2, 2009Date of Patent: August 13, 2013Assignee: Datalase, LtdInventors: Anthony N Jarvis, Christopher Anthony Wyres
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Curable composition, color filter and process for production thereof, and solid-state imaging device
Patent number: 8492071Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.Type: GrantFiled: March 27, 2009Date of Patent: July 23, 2013Assignee: FUJIFILM CorporationInventor: Hiroshi Taguchi -
Publication number: 20130183622Abstract: A positive-working lithographic printing plate precursor has an outermost imageable layer that is present at a dry coverage weight of at least 0.7 g/m2 and up to and including 1.6 g/m2 and comprises a primary polymeric binder comprising recurring units of a hydroxyaryl acetal or a hydroxyaryl ester, or recurring units of both a hydroxyaryl acetal and a hydroxyaryl ester. The outermost imageable layer also contains an alkali-soluble secondary vinyl polymer that is not a primary polymeric binder and a non-polymeric polyhydric phenol. These precursors comprise an infrared radiation absorber to make them sensitive and imageable using infrared radiation. After imaging, the precursors can be processed (developed) using an relatively low pH developer such as a silicate- or metasilicate-free developer.Type: ApplicationFiled: January 12, 2012Publication date: July 18, 2013Inventors: Helena Chechik, Larisa Postel, Tanya Kurtser, Marina Rubin, Moshe Levanon
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Publication number: 20130177850Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.Type: ApplicationFiled: March 1, 2013Publication date: July 11, 2013Applicant: FUJIFILM CORPORATIONInventor: FUJIFILM Corporation
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Publication number: 20130171569Abstract: A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of a condensed body, the body being obtained by condensation of one or more kinds of a compound shown by the following general formula (1-1) with one or more kinds of a compound shown by the following general formula (2-3) and an equivalent body thereof, with one or more kinds of a compound shown by the following general formula (2-1), a compound shown by the following general formula (2-2), and an equivalent body thereof; a method for producing a polymer for a resist underlayer film; and a patterning process using the same.Type: ApplicationFiled: December 12, 2012Publication date: July 4, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: SHIN-ETSU CHEMICAL CO., LTD.
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Publication number: 20130129988Abstract: A chemically amplified positive resist composition comprising (A) 100 pbw of a base resin which is normally alkali insoluble or substantially insoluble, (B) 0.05-20 pbw of a photoacid generator, (C) 0.1-50 pbw of a thermal crosslinker, and (D) 50-5,000 pbw of an organic solvent is coated to form a thick film having a high sensitivity and resolution.Type: ApplicationFiled: November 16, 2012Publication date: May 23, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: SHIN-ETSU CHEMICAL CO., LTD.
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Patent number: 8420296Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.Type: GrantFiled: August 26, 2010Date of Patent: April 16, 2013Assignee: Cheil Industries Inc.Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
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Patent number: 8409784Abstract: Disclosed is a photosensitive resin composition which does not contain any halogenated compound or any antimony compound that has a high risk of putting a load on the environment, which exerts good flame retardancy after being cured, and which particularly meets the recent exacting requirements with respect to bending resistance and insulation reliability. Specifically disclosed is a photosensitive resin composition comprising: (A) a (meth)acrylate compound represented by the general formula (1); (B) a polyimide precursor; and (C) a photopolymerization initiator [in the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a hydrogen atom or a univalent organic group; n and m independently represent an integer of 1 to 5; p represents an integer of 0 to 6; q and r independently represent an integer of 0 to 4; and s represent an integer of 0 to 6, provided that the sum of p, q, r and s is 6, and the sum total of p and s may range from 3 to 6 and is preferably 6].Type: GrantFiled: April 23, 2008Date of Patent: April 2, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
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Publication number: 20130078575Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20° C. that is greater than or equal to 3.5 g/l. The use of these infrared radiation absorbing dyes in the imageable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions.Type: ApplicationFiled: September 22, 2011Publication date: March 28, 2013Inventors: Domenico Balbinot, Harald Baumann, Udo Dwars, Mathias Jarek, Christopher D. Simpson
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Patent number: 8399172Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can be developed by a water-soluble resin-containing aqueous solution and a method of lithographic printing that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits an excellent fine line reproducibility in nonimage areas even when printing is performed using ultraviolet-curing ink (UV ink). Also provided is a negative-working lithographic printing plate precursor that exhibits an excellent combination of fine line reproducibility and printing durability and that resists the production of scum during on-press development.Type: GrantFiled: August 28, 2009Date of Patent: March 19, 2013Assignee: FUJIFILM CorporationInventors: Norio Aoshima, Kazuo Maemoto