Abstract: A radiation-sensitive composition includes an initiator composition, a radiation absorbing compound, and a particulate primary polymeric binder that has a backbone comprising multiple urethane moieties and further comprises side chains comprising free radically polymerizable groups attached to the backbone. This primary polymeric binder can be used in place of or in addition to a conventional free radically polymerizable component. This composition can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates.

Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Abstract: The invention provides a curable resin composition having an addition polymerization-based block copolymer (I) and an ethylenic unsaturated compound (II). Also provided is a flexographic plate material using the curable resin composition as its constituent. The flexographic plate material containing the curable resin composition of the present invention, can be cured to form strong and extendable areas and can be used to make flexographic plates that can form a sharp image plate surface even for a fine image. The flexographic plate material of the present invention is particularly useful in printing on cardboards, recycled paper or other paper articles with rough surfaces.

Abstract: A radiation-sensitive composition includes a free-radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing compound, and a polymeric binder. The initiator composition includes a unique polyonium borate comprising a polyvalent onium cation with multiple onium moieties and sufficient organic borate counterions to provide a net neutral charge. The radiation-sensitive composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging infrared radiation, can be imaged at relatively low energy, and can be developed either on-press or off-press.

Abstract: The negative resist composition of the present invention comprises a silsesguioxane resin (A) comprising a constituent unit (a1) represented by the following general formula (I) and a constituent unit (a2) represented by the following general formula (II), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C): wherein R1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, and

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: Photosensitive paste compositions, plasma display panels (PDP) manufactured using the same, and methods of manufacturing the PDPs are provided. In one embodiment, a photosensitive paste composition includes an inorganic component and an organic component, where the organic component includes a cross-linking agent including a monoacrylate, where the monoacrylate is present in an amount ranging from about 50 to about 100 weight % with respect to a total weight of the cross-linking agent. In another embodiment, a PDP is manufactured using the photosensitive paste composition. In yet another embodiment, a method of manufacturing the PDP is provided. The inventive photosensitive paste compositions can fundamentally prevent film twisting, disconnection or detachment by minimizing stress on the patterned film during sintering, thereby minimizing modifications due to shrinkage.

Abstract: A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.

Abstract: The photosensitive resin composition is composed of a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin (A) having an acid value of 150 mgKOH/g or more on a solid basis; the resin (A) being formed of a ((meth)acrylic acid)-based polymer in which a compound represented by formula (1): (wherein R1 represents H or Me; and R2 represents a liner or branched C2-C10 alkylene group) has been added to portions of the carboxylic groups, a photopolymerization initiator (B); and water (C).

Abstract: Disclosed herein are a liquid composition for immersion lithography and a lithography method using the composition. The liquid composition includes at least one nonionic surfactant selected from the group comprising of a polyvinyl alcohol, a pentaerythritol-based compound, a polymer containing an alkylene oxide, and a compound represented by Formula I: wherein R is a linear or branched, substituted C1-C40 alkyl, and n is an integer ranging from 10 to 10,000. The surface tension of the liquid composition is reduced by the nonionic surfactant, thereby solving the problem that the liquid composition is not completely filled or is partially concentrated on a wafer having a fine topology and removing micro bubbles between the photoresist film and the liquid composition.

Abstract: A dye-containing curable composition including a binder and a dye that is soluble in an organic solvent, in which the binder contains a structural unit represented by the following general formula (I) and has a glass transition temperature in a range of 0 to 250° C. In general formula (I), R1 represents a hydrogen atom or a methyl group; R2 represents an oxygen atom, —NH—, or —N(R3—R4)—; R3 represents a substituted or unsubstituted divalent group; and R4 represents a group containing an unsaturated double bond.

Abstract: Provided are a curable resin and a curable resin composition which have alkali-solubility and curability that can freely be adjusted and a high sensitivity, a liquid crystal panel substrate which can maintain an even cell gap, and a liquid crystal panel using the liquid crystal panel substrate to exhibit a superior display quality. A curable resin composition comprising an imide-containing copolymer having a molecular structure wherein a constitutional unit at least the following units are connected: a constitutional unit having a cyclic imide group represented by the formula (1), a constitutional unit having an acid functional group such as a carboxyl group; and a constitutional unit having a photopolymerizing functional group. In a liquid crystal panel substrate (color filter 103), plural spacers (column-shaped spacers 12) are disposed in a non-display region on a substrate 5.

Abstract: The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.

Abstract: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.

Abstract: A topcoat composition. The topcoat composition comprising: a copolymer comprising monomers having the structures: a casting solvent.

Abstract: The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.

Abstract: A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsaturated bond, and a polymerizable composition comprising: (A?) a polyurethane resin having an ethylenically unsaturated bond on a side chain, which is a reaction product of an isocyanate compound and a diol compound including a diol compound represented by the formula (G) defiend herein; (B) a neutrally charged compound capable of generating a radical under light or heat; (C) a compound having an ethylenically unsaturated bond; (D?) a 1,4-benzoquinone derivative; and (E?) a dye having a maximum absorption wavelength in a region of from 350 to 450 nm.

Abstract: The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The photoresist composition further contains b) monomers having a tertiary amino group and a C?C double bond, which form ionic bonds with the remaining hydroxyl groups of the polyimide. The photoresist composition further contains c) a photoinitiator which is also called photosensitizer. The components a) to c) are all dissolved in a solvent.

Abstract: The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid crystal display having the organic layer pattern. In particular, the liquid crystal display photoresist composition comprises an organic polymer resin having an average molecular weight in the range of about 2,000 to about 20,000, a mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM, and a photosensitizer.

Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.

Abstract: A dye-containing curable composition including a binder and a dye that is soluble in an organic solvent, in which the binder contains a structural unit represented by the following general formula (I) and has a glass transition temperature in a range of 0 to 250° C.

Abstract: A polymerizable composition comprising (A) a resin selected from the group consisting of a polyamide resin which is soluble or swells in water or aqueous alkali solutions and a polyester resin which is soluble or swells in water or aqueous alkali solutions, (B) an infrared absorber, (C) a radical polymerization initiator, and (D) a radical-polymerizable compound.

Abstract: A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound. The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1): (wherein R1 represents H or Me; R2 represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X represents m is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).

Abstract: The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C1˜C25 alkyl group with or without an ether group, or a substituted or unsubstituted C4˜C25 hydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.

Abstract: The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or —NR3— in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.

Abstract: An object of the present invention is to provide a photosensitive thermosetting resin composition that has a long shelf life and has excellent normal temperature storage stability, has good solder heat resistance after curing, and according to which high adhesive strength can be maintained. The present invention provides a photosensitive thermosetting resin composition containing a photosensitive prepolymer, a photosensitive monomer, a thermosetting resin, a curing agent, and a polymerization initiator, the photosensitive thermosetting resin composition containing (A) a carboxylic acid-modified bisphenol type epoxy (meth)acrylate as the photosensitive prepolymer.

Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.

Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.

Abstract: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a polymerization initiator, a polymerizable ethylenically unsaturated compound, a polymeric binder, and a sensitizing dye, wherein the polymerization initiator is a biimidazole compound, and the sensitizing dye is represented by formula (1),

Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

Abstract: A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use in the composition; and a flexographic plate obtained by exposing the composition to light. Also provided are: a block copolymer composition containing a three-branched aromatic vinyl/conjugated diene block copolymer obtained with a specific coupling agent; and a composition for photosensitive flexographic plates which comprises an ethylenic compound and a photopolymerization initiator.

Abstract: Disclosed is a process of preparing a planographic printing plate from a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, an image formation layer containing (A) a polymerization initiator selected from a hexaarylbisimidazole compound and a diazo resin, and (B) an alkali soluble resin with an acid value of 5 to 200 having an acryloyl group or a methacryloyl group, the alkali soluble resin being obtained by reacting a vinyl copolymer having a monomer unit derived from acrylic acid or methacrylic acid with an epoxy compound having an acryloyl group or a methacryloyl group in the molecule, and, the process comprising the steps of imagewise exposing the light sensitive planographic printing plate material to ultraviolet laser, and removing an image formation layer at non-exposed portions with an aqueous alkali solution to form an image.

Abstract: The present invention is to provide a pigment dispersion composition for a color filter having the excellent pigment dispersing property and dispersion stability, good developing property and reactivity, and an extremely small residue generation amount after development, a production method capable of stably producing such a pigment dispersion composition, and a color filter for a display having a high transmittance and a low light scattering property. A pigment dispersion composition for a color filter containing at least a pigment, a pigment dispersing agent, a binder resin, a reactive compound, and a solvent, wherein the binder resin is a compound having a pigment adsorbing block containing a pigment adsorbing group and not containing a reactive group, and a reactive block containing a reactive group and not containing a pigment adsorbing group, is provided.

Abstract: The present invention provides a photosensitive composition including a compound that generates a radical by application of light or heat, a polymer having a phenyl group substituted with a vinyl group on the side chain, a monomer having two or more phenyl groups substituted with a vinyl group, an infrared absorbing agent, and a compound having at least one carboxylic acid group and a weight average molecular weight of 3,000 or less. Additionally, the invention provides a planographic printing plate precursor including a substrate and a negative recording layer provided on the substrate and containing the above photosensitive composition.

Abstract: A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each R is independently hydrogen, an inorganic group, an alkyl group, an alkylene group, an aryl group, an arylene group, or non-heterocyclic group-containing organo-functional derivatives of alkyl, alkylene, aryl or arylene groups; and a process for obtaining a colourless, monochrome or multicolour ink jet image comprising the steps of jetting one or more streams of ink droplets having the above-mentioned composition onto an ink-jet ink receiver material, and subjecting the obtained image to radiation curing.

Abstract: A photosensitive colored composition contains a resin, a monomer and a colorant. The resin is a copolymer resin of at least one compound (a) represented by general formula (I) below with at least one other compound (b) having an ethylenically unsaturated double bond: where R1 represents H or CH3, R2 represents an alkylene group having 2 or 3 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms which may contain a benzene ring, and n is an integer of 1 to 15.

Abstract: Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.

Abstract: A wound laminate obtained by laminating a plastic film composed of an aromatic polycarbonate comprising bisphenol A as an aromatic dihydroxy component, and a protective film composed of an aromatic polyester, using an intervening adhesive having a weak adhesive strength of 3-50 gf (0.0294-0.49 N), and winding the laminate. The wound laminate is used as a transparent protective layer (protective film) for an optical disk to fabricate a film surface side-incident optical disk.

Abstract: Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated double bond, (C) a photopolymerization initiator and (D) a melamine resin.

Abstract: A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound (such as an IR-sensitive dye), a polymeric binder comprising a polymer backbone to which is directly or indirectly linked a pendant group comprising a reactive vinyl group, and a primary additive that is a poly(alkylene glycol) or an ether or ester thereof that has a number average molecular weight of from about 200 and up to 4000 and comprises from about 2 to about 50 weight % based on the total composition solids content. This composition can be used to prepare a negative-working imageable element that can be imaged at relatively low energy and developed without a preheat step.

Abstract: Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a functional group that cleaves in the presence of the acid.

Abstract: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

Abstract: The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including both constitutional units having a pendant cyano group attached directly to the hydrophobic backbone, and constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. When the imageable element is imaged and developed, the resulting printing plate may exhibit improved on-press solvent resistance and longer press life.

Abstract: The present invention provides a halogen-free dry film photosensitive resin composition, which comprises (a) 10˜60 wt % of at least two kinds of acrylic resins having unsaturated carboxylic acid monomers as polymerized units; (b) 5˜20 wt % of a photosensitive resin having at least two (meth)acrylate groups; (c) 0.1˜15 wt % of a photoinitiator; and (d) 0.5˜20 wt % of a thermo-curing agent. The resin composition of the invention is suitable for use as a photoresist in the process of producing printed circuit boards. The resin composition of the invention is particularly suitable for use in the surface of printed circuit boards or semiconductor packages as a protective dry film solder mask.

Abstract: A negative-type image recording material comprising a support having a rear surface and an image recording layer disposed on the support, the image recording layer having a front surface and including (A) a radical-generating agent and (B) a radically polymerizable compound, wherein a static friction coefficient between the front surface and the rear surface is less than 0.50. In order to achieve such a specified static friction coefficient, it is preferable that the image recording layer contains (D) a compound represented by the following formula (1): R1—X ??(1) wherein R1 represents an optionally substituted hydrocarbon group having a total of 8 to 32 carbon atoms, and X represents CO—Y—R2, NH—CO—NH—R2, SO2—Y—R2, or Y—R3 in which Y represents O, S, NR4 or a single bond.

Abstract: The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator.

Abstract: A photosensitive composition that includes a compound which generates a radical upon being heated or exposed to light; a polymer having on a side chain thereof a phenyl group substituted by a vinyl group; a monomer having in a molecule thereof at least two phenyl groups each substituted by a vinyl group; an infrared absorbent; and a dye having absorption maximum wavelength in a range from 500 to 700 nm, and an image recording material which has the photosensitive layer disposed on a support.