Ethylenic Unsaturation Within The Side Chain Component Patents (Class 430/287.1)
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Patent number: 8048613Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.Type: GrantFiled: October 13, 2008Date of Patent: November 1, 2011Assignee: Taiyo Ink Mfg. Co., Ltd.Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
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Publication number: 20110256482Abstract: Provided herein is a photosensitive resin composition which is patternable and exhibits adhesion even after being crosslinked. The photosensitive resin composition includes a (meth)acryl-based polymer having a carboxyl group and a reactive double bond on a side chain and having a specific acid value and a specific content of reactive double bond, and a photopolymerization initiator.Type: ApplicationFiled: February 25, 2011Publication date: October 20, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventor: Suwa TATSUHIRO
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Patent number: 8034538Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation absorbing compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.Type: GrantFiled: February 13, 2009Date of Patent: October 11, 2011Assignee: Eastman Kodak CompanyInventors: Bernd Strehmel, Harald Baumann, Daniela Lummel
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Patent number: 7998652Abstract: A lithographic printing plate precursor comprising: a support; and at least one layer comprising an image-recording layer, the image-recording layer comprising (A) an infrared absorber, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution, wherein at least one of said at least one layer comprises a copolymer having (a1) a unit comprising at least one ethylenically unsaturated bond, and (a2) a unit comprising at least one functional group interacting with a surface of the support. And a lithographic printing method in which the lithographic printing plate precursor is used. The copolymer preferably has a hydrophilic segment. The copolymer preferably is contained in an undercoat layer formed between the support and the image-recording layer.Type: GrantFiled: September 29, 2004Date of Patent: August 16, 2011Assignee: Fujifilm CorporationInventors: Naonori Makino, Toshifumi Inno, Sumiaki Yamasaki
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Patent number: 7989140Abstract: A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided.Type: GrantFiled: September 17, 2008Date of Patent: August 2, 2011Assignee: FUJIFILM CorporationInventors: Shigefumi Kanchiku, Tomoya Sasaki
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Patent number: 7989141Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.Type: GrantFiled: March 25, 2008Date of Patent: August 2, 2011Assignee: FUJIFILM CorporationInventor: Shuhei Yamaguchi
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Patent number: 7977030Abstract: A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).Type: GrantFiled: June 10, 2008Date of Patent: July 12, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Senzaki, Koichi Misumi, Koji Saito
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Patent number: 7972754Abstract: To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition. A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.Type: GrantFiled: June 13, 2008Date of Patent: July 5, 2011Assignee: Asahi Glass Company, LimitedInventors: Hideyuki Takahashi, Kenji Ishizeki
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Publication number: 20110143282Abstract: It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.Type: ApplicationFiled: December 17, 2010Publication date: June 16, 2011Applicant: Asahi Glass Company, LimitedInventors: Hideyuki TAKAHASHI, Kenji Ishizeki
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Patent number: 7951522Abstract: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 ?m on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.Type: GrantFiled: December 29, 2004Date of Patent: May 31, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiki Okui, Koichi Misumi
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Patent number: 7932340Abstract: The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule.Type: GrantFiled: October 20, 2006Date of Patent: April 26, 2011Assignee: Dai Nippon Printing Co., Ltd.Inventor: Katsuya Sakayori
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Publication number: 20110076621Abstract: A lithographic printing plate precursor includes a support, and an image-recording layer, the image-recording layer contains a urethane resin having a polyalkylene oxide chain represented by the formula (1) as defined herein in a side chain, an infrared absorbing agent, a radical polymerizable compound and a radical polymerization initiator, and an unexposed area of the image-recording layer is capable of being removed with at least one of dampening water and ink.Type: ApplicationFiled: September 29, 2010Publication date: March 31, 2011Inventors: Katsuhiro SHIMONO, Hidekazu Oohashi
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Patent number: 7910286Abstract: (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer. (3) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing an infrared absorber and an iodonium compound.Type: GrantFiled: January 26, 2006Date of Patent: March 22, 2011Assignee: Fujifilm CorporationInventors: Tomoyoshi Mitsumoto, Yasuhito Oshima
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Publication number: 20110059400Abstract: The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I?): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.Type: ApplicationFiled: September 3, 2010Publication date: March 10, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Akira KAMABUCHI, Yuko YAMASHITA
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Publication number: 20110053084Abstract: Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.Type: ApplicationFiled: December 30, 2009Publication date: March 3, 2011Applicant: KOREA KUMHO PETROCHEMICAL CO., LTDInventors: Joo Hyeon Park, Seok Chan Kang, Jung Hwan Cho, Kyung Chul Son
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Publication number: 20110053086Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon groupType: ApplicationFiled: September 1, 2010Publication date: March 3, 2011Applicant: SUMITOMO CHEMICAL COMPANY,LIMITEDInventors: Kazuhiko Hashimoto, Koji Ichikawa
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Patent number: 7892720Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.Type: GrantFiled: September 15, 2008Date of Patent: February 22, 2011Assignee: Asahi Glass Company, LimitedInventors: Takeshi Eriguchi, Hiromasa Yamamoto, Kaori Tsuruoka
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Patent number: 7887994Abstract: Disclosed herein is a photoresist composition suitable for coating onto a large substrate and having improved coating uniformity to prevent occurrence of stains, a coating method thereof, a method of forming an organic film pattern using the same, and a display device fabricated thereby. The present invention thus provides a photoresist composition comprising a polymeric resin with an incorporated polysiloxane resin, a photosensitive compound, and an organic solvent. Accordingly, the photoresist composition can be coated onto a large substrate by a spinless coating method, and thereby coating uniformity can be improved, the occurrence of stains such as cumulous stains and resin streaks can be prevented, and the coating rate and quality of a final product prepared using the photoresist composition can also thereby be enhanced.Type: GrantFiled: February 1, 2008Date of Patent: February 15, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Yeong Beom Lee, Kyung Seop Kim, Jun Young Lee, Sung Wook Kang
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Publication number: 20110014571Abstract: A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.Type: ApplicationFiled: March 26, 2009Publication date: January 20, 2011Applicant: FUJIFILM CORPORATIONInventors: Kei Yamamoto, Akinori Shibuya
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Publication number: 20110003251Abstract: The present invention relates to a positive resist composition and to a pattern forming process using the same. The present invention provides: a positive resist composition having an enhanced etching resistance and an excellent resolution and being capable of providing an excellent pattern profile even at a substrate-side boundary face of resist, in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a pattern forming process utilizing the positive resist composition.Type: ApplicationFiled: May 24, 2010Publication date: January 6, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Akinobu TANAKA, Keiichi MASUNAGA, Daisuke DOMON, Satoshi WATANABE
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Patent number: 7862984Abstract: A radiation-sensitive composition includes a free-radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing compound, and a polymeric binder. The initiator composition includes a unique polyonium borate comprising a polyvalent onium cation with multiple onium moieties and sufficient organic borate counterions to provide a net neutral charge. The radiation-sensitive composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging infrared radiation, can be imaged at relatively low energy, and can be developed either on-press or off-press.Type: GrantFiled: March 28, 2007Date of Patent: January 4, 2011Assignee: Eastman Kodak CompanyInventors: Koji Hayashi, Jianbing Huang
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Patent number: 7858159Abstract: The photocurable composition for a sealant of the present invention includes a compound represented by general formula (1): A1-Y1—B1—Y2-A2??(1) (wherein A1 and A2 each represents, independently, a monovalent group having a cyclic ?-electron conjugated structure; Y1 and Y2 each represents, independently, a divalent group represented by general formula (4); and B1 represents (i) a divalent alicyclic hydrocarbon group, (ii) a divalent aromatic hydrocarbon group, (iii) a divalent heterocyclic group, (iv) a divalent aliphatic hydrocarbon group of 1 to 6 carbon atoms, or (v) a divalent group in which two or more group selected from the group consisting of a divalent alicyclic hydrocarbon group, a divalent aromatic hydrocarbon group, a divalent heterocyclic group, a divalent aliphatic hydrocarbon group of 1 to 6 carbon atoms, a carbonyl group, an ether group, a thioether group, and a SO2 group are linked).Type: GrantFiled: August 30, 2006Date of Patent: December 28, 2010Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Hisayosi Arai, Hiroko Sakurai
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Patent number: 7851128Abstract: A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.Type: GrantFiled: November 29, 2006Date of Patent: December 14, 2010Assignees: Hitachi Chemical Dupont Microsystems Ltd., Hitachi Chemical Dupont Microsystems L.L.C.Inventors: Masataka Nunomura, Masayuki Ooe, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno
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Patent number: 7851033Abstract: A photo-sensitive adhesive for a flexible liquid crystal display is provided, comprising the following components: an urethane oligomer; a reactive monomer with phenyl group; and a photo-initiator. In an embodiment, the phenyl group of the reactive monomer has a weight ratio of 40 wt %, base on the total weight of the reactive monomer.Type: GrantFiled: April 28, 2008Date of Patent: December 14, 2010Assignee: Industrial Technology Research InstituteInventors: Wen-Pin Chuang, Su-Mei Wei, Kung-Lung Cheng, Shih-Hsien Liu
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Publication number: 20100304301Abstract: There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2).Type: ApplicationFiled: May 3, 2010Publication date: December 2, 2010Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
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Publication number: 20100297560Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A?) including a polymeric compound (A1?) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2?) (wherein represents an anion moiety represented by one of general formulas (1) to (5)).Type: ApplicationFiled: May 17, 2010Publication date: November 25, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takehiro SESHIMO, Yoshiyuki UTSUMI, Yoshitaka KOMURO, Takeyoshi MIMURA, Daichi TAKAKI
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Publication number: 20100291484Abstract: There is disclosed a negative resist composition comprising at least (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid, with a crosslinker, (B) an acid generator, and (C) a compound containing a nitrogen as a basic component, and forming a resist film having the film thickness X (nm) of 50 to 100 nm, wherein, in the case that the resist film is formed from the negative resist composition under the film-forming conditions for the pattern formation, a dissolution rate of the resist film into the alkaline developer used in the development treatment for the pattern formation is 0.0333X?1.0 (nm/second) or more and 0.0667X?1.6 (nm/second) or less.Type: ApplicationFiled: April 16, 2010Publication date: November 18, 2010Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
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Patent number: 7829261Abstract: Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs<5, wherein the acidic functional group can be present as a free acid group or in the form of a salt; (c) drying.Type: GrantFiled: August 23, 2005Date of Patent: November 9, 2010Assignee: Kodak Graphic Communications GmbHInventors: Bernd Strehmel, Harald Baumann, Ulrich Fiebag, Tanja Ebhardt, Detlef Pietsch
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Patent number: 7820361Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing (A) an initiator compound, (B) a polymerizable compound and (C) a binder, wherein the photosensitive layer or other layer in contact with the support contains as (D) a component different from the component (C), a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond introduced through an ion pair and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support.Type: GrantFiled: August 27, 2007Date of Patent: October 26, 2010Assignee: FUJIFILM CorporationInventors: Tomoya Sasaki, Hidekazu Oohashi
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Publication number: 20100261103Abstract: Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles obtained by mixing an organic pigment solution and a second solvent, thereby to precipitate the fine particles in the mixed liquid, the organic pigment solution prepared by dissolving the organic pigment and the polymer compound in a first solvent, the second solvent of being served as a poor solvent for the organic pigment and being compatible with the first solvent, in which a compound insoluble in the second solvent is used as the polymer compound, and the organic pigment fine particles are provided with a capability of self-dispersing in a third solvent different from any of the first solvent and the second solvent.Type: ApplicationFiled: October 24, 2008Publication date: October 14, 2010Applicant: FUJIFILM CorporationInventors: Daisuke Sasaki, Hidenori Takahashi, Makoto Ohmoto, Toshitaka Ninomiya, Masato Nakao
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Publication number: 20100242766Abstract: To provide a lithographic printing plate precursor capable of obtaining a plenty of sheets of good printed matters with practical energy dosage, which is excellent in on-press developing property and press life, and capable of reducing pollution of fountain solution, and provide a lithographic printing method. The lithographic printing plate precursor comprises a support having provided thereon an image-recording layer, which lithographic printing plate precursor is mounted on a printing press and imagewise exposed, or mounted on the printing press after imagewise exposure, and then developed by feeding printing ink and/or a fountain solution, wherein at least a part of the unexposed part of the image-recording layer is not dissolved in the printing ink, the fountain solution or both of them, and removed by falling out of film, and the invention provides a lithographic printing method using the same.Type: ApplicationFiled: June 9, 2010Publication date: September 30, 2010Inventors: Koji SONOKAWA, Tomoyoshi MITSUMOTO, Sumiaki YAMASAKI
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Publication number: 20100227275Abstract: To provide a thiopyran derivative, having a structure expressed by the following general formula 1: where X is O or S; R1 is —H, —CH3, C2-4 alkyl group, thioether group, or ketone group; R2 is —H, —CH3, or trifluoromethyl group; and R1 and R2 may be identical to or different from each other.Type: ApplicationFiled: May 19, 2010Publication date: September 9, 2010Applicant: FUJITSU LIMITEDInventor: Koji Nozaki
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Patent number: 7790354Abstract: There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2?CH—COO—R—NCO??(1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).Type: GrantFiled: April 21, 2005Date of Patent: September 7, 2010Assignee: Showa Denko K.K.Inventors: Satoru Ishigaki, Hiroshi Uchida, Yoshio Miyajima, Katsutoshi Morinaka
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Patent number: 7781124Abstract: The present invention provides a hologram recording material which can modulate its refractive index effectively with visible light laser and is excellent also in transparency after this modulation.Type: GrantFiled: April 6, 2006Date of Patent: August 24, 2010Assignee: Nitto Denko CorporationInventor: Yoshihide Kawaguchi
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Patent number: 7771916Abstract: The present invention provides a polymerizable composition comprising (A) a compound represented by the following formula (I), (B) an infrared absorbent, and (C) a compound having at least one addition-polymerizable ethylenically unsaturated bond, and a negative planographic printing plate precursor having a recording layer containing the polymerizable composition. In the formula (I), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom or a monovalent organic group; and X? represents an anion.Type: GrantFiled: July 29, 2005Date of Patent: August 10, 2010Assignee: FUJIFILM CorporationInventors: Yoshinori Taguchi, Kazuhiro Fujimaki
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Patent number: 7763402Abstract: The present invention relates to a photosensitive resin composition, and more particularly, to a photosensitive resin composition for forming an over coating layer of a color filter. The photosensitive resin composition according to the present invention includes a UV absorber. The photosensitive resin composition according to the present invention adjusts line width and height of a pattern without difficulty, forms a linear pattern, provides good transmittance and is adequate to form the over coating layer of the color filter.Type: GrantFiled: August 24, 2007Date of Patent: July 27, 2010Assignee: Dongjin Semichem Co., Ltd.Inventors: Hyun-il Cho, Taeg-sung Jung, Hee-jung Jung, Chan-seok Park
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Patent number: 7763401Abstract: The invention provides a colorant-containing curable negative-type composition containing at least a colorant, a cross-linking agent, and a photosensitive agent and satisfying the following Condition (1) relevant to the mass of the respective components in the case the composition further contains a binder, and satisfying the following Condition (2) relevant to the mass of the respective components in the case the composition does not contain a binder: Condition (1): wherein the mass of the binder >0, 0.45?the mass of the colorant/[the mass of the colorant+the mass of the cross-linking agent+the mass of the photosensitive agent+the mass of the binder]<1.0 and 2<[the mass of the cross-linking agent/the mass of the binder]; and Condition (2): wherein the mass of the binder=0, 0.45?the mass of the colorant/[the mass of the colorant+the mass of the cross-linking agent+the mass of the photosensitive agent]<1.0.Type: GrantFiled: May 11, 2006Date of Patent: July 27, 2010Assignee: FUJIFILM CorporationInventor: Katsumi Araki
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Patent number: 7758930Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.Type: GrantFiled: April 20, 2009Date of Patent: July 20, 2010Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
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Publication number: 20100167208Abstract: The present invention relates to a water soluble photosensitive polyimide polymer, preparation thereof and a photoresist composition containing the same. The water soluble photosensitive polyimide polymer is characterized by having repeat units represented by the following formula (I): the other symbols are defined in the specification].Type: ApplicationFiled: April 10, 2009Publication date: July 1, 2010Inventors: Jen FU WANG, Sheng Yen Wu, An Pang Tu, Kuen Yuan Hwang
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Publication number: 20100167024Abstract: A negative-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer has a polystyrene-reduced weight average molecular weight of 4000 to 200,000, and is obtained by hydrolysis and condensation of at least one hydrolyzable silane compound among compounds shown by RaSi(OR1)4-a, Si(OR2)4 and R3x(R4O)3-xSi—(R7)z—Si(OR5)3-yR6y. “R” represents a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms. “R1” represents a monovalent organic group. “R2” represents a monovalent organic group. “R3” and “R6” individually represent a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms “R4” and “R5” individually represent a monovalent organic group. “R7” represents an oxygen atom, a phenylene group, or a group —(CH2)m—. The content of units derived from the compound RaSi(OR1)4-a is 50 to 100 mol % of the total units forming the polymer.Type: ApplicationFiled: December 24, 2009Publication date: July 1, 2010Applicant: JSR CorporationInventors: Norihiro Natsume, Takanori Kishida, Hayato Namai, Kyoyu Yasuda, Satoshi Dei, Koichi Hasegawa
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Patent number: 7741380Abstract: The invention provides (1) an ink composition including a polymerization initiator and at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, (2) an ink composition including a polymerization initiator, at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, and a monofunctional (meth)acrylic acid ester or amide having an alkylene oxide repeating unit in the molecule, and (3) an ink composition including a polymerization initiator and a monofunctional (meth)acrylic acid ester or amide having a basic group in the molecule; and an ink jet recording method, a method for producing a planographic printing plate and a planographic printing plate produced by the method for producing a planographic printing plate using the above-mentioned ink compositions.Type: GrantFiled: September 27, 2006Date of Patent: June 22, 2010Assignee: FUJIFILM CorporationInventor: Ippei Nakamura
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Patent number: 7740995Abstract: A pyrimidine azo compound represented by the following formula (I), or a tautomer thereof: wherein in formula (I), R1 represents a heterocyclic group, and R2 represents a hydrogen atom or a substituent; R3, R4, R5, R6, R7, and R8 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, an alkylsulphonyl group, an arylsulphonyl group, or a sulfamoyl group; and R3 and R4, R5 and R6; and R7 and R8 may be mutually bonded to form a 5-, 6-, or 7-membered ring.Type: GrantFiled: July 28, 2006Date of Patent: June 22, 2010Assignee: FUJIFILM CorporationInventors: Taeko Aizawa, Yuki Mizukawa, Nobuo Seto
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Patent number: 7736834Abstract: The photosensitive resin composition of the invention comprises (A) a photopolymerizing compound with two or more ethylenic unsaturated bonds in the molecule and (B) a photopolymerization initiator which initiates photopolymerization reaction of the (A) photopolymerizing compound, the photosensitive resin composition being characterized in that the molecule of the (A) photopolymerizing compound further contains a characteristic group with a bond which breaks when the (A) photopolymerizing compound is heated under temperature conditions of 130-250° C.Type: GrantFiled: August 25, 2004Date of Patent: June 15, 2010Assignee: Hitachi Chemical Company, Ltd.Inventors: Masahiro Miyasaka, Toshiki Ito
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Publication number: 20100129616Abstract: Negative-working imageable elements can be imaged and processed on-press to provide lithographic printing plates, especially with sulfuric acid-anodized aluminum substrates. These elements have an imageable layer that contains two different polymeric binders, a first polymeric binder that is present a discrete particles, and a second polymeric binder that comprises pendant ethylenically unsaturated groups.Type: ApplicationFiled: November 21, 2008Publication date: May 27, 2010Inventors: Jeffrey J. Collins, Kevin B. Ray, Kevin D. Wieland
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Publication number: 20100119959Abstract: There are provided a pigment-dispersed composition comprising at least a resin having a pendant group containing a nitrogen-containing heterocyclic ring and an ethylenic unsaturated double bond in the main chain skeleton, a pigment, and a solvent, and a curable composition using this, a color filter having a colored pattern formed from the curable composition, and a production method thereof.Type: ApplicationFiled: March 28, 2008Publication date: May 13, 2010Applicant: Fujifilm CorporationInventors: Taeko Nakashima, Kazuto Shimada
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Publication number: 20100119977Abstract: A photosensitive resin composition which has satisfactory compatibility in dry-film formation, has sensitivity equally to two lights of i-line and h-line, is excellent in resolution and adhesion, and can be developed with an alkaline aqueous solution. Also provided are: a layered photosensitive-resin product including the photosensitive resin composition; a method of forming a resist pattern on a substrate with the layered photosensitive-resin product; and a use of the resist pattern. The photosensitive resin composition comprises: (a) 20-90 mass % thermoplastic copolymer which includes comonomer units derived from an ?,?-unsaturated monomer having a carboxy group and which has an acid equivalent of 100-600 and a weight-average molecular weight of 5,000-500,000; (b) 5-75 mass % addition-polymerizable monomer having at least one ethylenically unsaturated terminal group; (c) 0.01-30 mass % photopolymerization initiator comprising a triarylimidazolyl dimer; and (d) 0.Type: ApplicationFiled: March 6, 2008Publication date: May 13, 2010Inventor: Yosuke Hata
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Publication number: 20100112478Abstract: The present invention provides a highly sensitive photosensitive lithographic printing plate material capable of being used in a CTP system, which allows on-press development and/or development with water and has superior printability.Type: ApplicationFiled: March 21, 2008Publication date: May 6, 2010Applicant: Mitsubishi Paper Mills LimitedInventor: Akira Furukawa
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Publication number: 20100104982Abstract: Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus enabling a correct transfer of the printing resist to the printing plate and substrate.Type: ApplicationFiled: December 29, 2009Publication date: April 29, 2010Inventor: Jin Wuk Kim
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Patent number: 7704676Abstract: A block terpolymer for use in photocurable compositions, flexographic printing plates or hot melt adhesives having a molecular structure according to the general formula: A-I-B-I-A??(1) or (A-I-B)n-X??(2), wherein each A is independently a polymer block of predominantly an aromatic vinyl compound, each I is predominantly isoprene, each B is predominantly butadiene, n is an integer equal to or greater than 2, and X is the residue of a coupling agent, and wherein: (a) the weight ratio of I to B is in a range of 30:70 to 70:30; (b) the aromatic vinyl compound content of the block copolymer is from about 14 to about 45%; (c) the B block has a 1,2-vinyl bond content in the range of from about 20 to about 90 mol %; (d) the A block has an apparent molecular weight in the range of from about 5,000 to about 20,000, and the I and B blocks together have a molecular weight in the range of from about 50,000 to about 200,000; (e) uncoupled triblock, S-I-B in the range of from about 2% to about 60%.Type: GrantFiled: September 4, 2007Date of Patent: April 27, 2010Assignee: Kraton Polymers U.S. LLCInventor: Donn Dubois
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Patent number: 7700264Abstract: A photosensitive resin composition containing an alkali soluble resin, an ethylenically unsaturated compound, a near infrared absorbing dye, a compound containing a halomethyl group and a compound containing an organoboron anion, wherein the alkali soluble resin is an acryl resin having one or more pendant groups in which both terminals of a diol compound have been blocked with isophorone diisocyanates and then (meth)acryloyl has been added. Also provided is an image forming material having a substrate, and a photosensitive layer formed by the photosensitive resin composition on the substrate, as well as an image forming method.Type: GrantFiled: October 31, 2006Date of Patent: April 20, 2010Assignee: Nippon Paint Co., Ltd.Inventor: Hirotoshi Umemoto