Patents Represented by Attorney Allston L. Jones
  • Patent number: 6722222
    Abstract: Corkscrew machine including rotatable spiral radius pinion gear mechanically coupled to annular collar and engages inclined gear rack to translate driver up and down carrying freely rotating, helical corkscrew. Crank rotates spiral radius pinion gear to translate driver up and down relative to collar along rotation axis of corkscrew with mechanical advantage increasing as driver approaches collar. A non-rotating collar cam coupled to, translated relative to, driver, receives and follows helix of corkscrew to impart torque rotating the corkscrew when held stationary within annular collar responsive to translation of driver toward and away from annular collar. Biased, releasable collar latch captures and holds collar cam at stationary position within annular collar releasing it to translate upward with driver upon an upward cork pulling stroke of driver relative to collar when bottle is held within annular collar.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: April 20, 2004
    Assignee: Williams-Sonoma, Inc.
    Inventors: Michael J. Dolan, Dominic P. Symons, Sung Kim, Diego G. Andina, Gianpiero Tonetti
  • Patent number: 6708691
    Abstract: A valve for controlling gas flow to ventilator or physiotherapy apparatus, has a body having first and second inlet ports and an outlet port. A shutter plate is rotatable with respect to said body and adapted selectively to interconnect said inlet ports to said outlet port. Said shutter plate is operable on rotation in a single sense to connect alternately said first inlet port to said outlet port and said second inlet port to said outlet port.
    Type: Grant
    Filed: January 10, 2000
    Date of Patent: March 23, 2004
    Inventor: Zamir Hayek
  • Patent number: 6688535
    Abstract: The present invention includes a unique irrigation sprinkler system with a unique sprinkler head design; a unique method of defining the planted area to be served by the sprinkler head; a unique method for determining when that planted area needs to be watered; a unique way of providing even coverage throughout the planted area when being watered; the ability to use one sprinkler head to individually water multiple, non-overlapping planted areas; a unique way of addressing multiple sprinkler heads in the same sprinkler system; and a unique method for remotely determining the integrity of the sprinkler system.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: February 10, 2004
    Inventor: Galen Collins
  • Patent number: 6680774
    Abstract: A method of, and apparatus for, mechanically masking a workpiece to form exposure exclusion regions is disclosed. The apparatus includes a mask that is arranged atop the photosensitive surface of the workpiece. The mask is opaque to the wavelength of radiation that activates the photosensitive workpiece surface. The mask is placed onto the workpiece prior to lithographic exposure of the workpiece so that the photosensitive material (e.g., negative acting photoresist) can be removed from select regions of the workpiece to provide, for example, electrical contact directly to the workpiece upper surface.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: January 20, 2004
    Assignee: Ultratech Stepper, Inc.
    Inventor: Konrad Heinle
  • Patent number: 6675931
    Abstract: A symmetrically loaded, shallow suspension speaker with stiff diaphragm having a minimum dimension that is greater than the diameter of the magnet that drives the diaphragm thus allowing the suspension of the diaphragm to extend nearly to the bottom of the speaker basket on the maximum inward excursion of the voice coil and diaphragm such that the suspension operational depth is not the limiting factor of the overall height of the speaker. The elements of the suspension system are designed to maximize the spacing between the inner and outer portions of the suspension, thus minimizing the possibility of wobble in the speaker. The speaker design maximizes air movement in a given mounting depth with a configuration that optimizes the operation of the moving parts that complements the fixed mechanical structural configuration of the non-moving parts in either an overhung or underhung configuration. The design also accommodates user replacement of the voice coil or cone.
    Type: Grant
    Filed: January 28, 2002
    Date of Patent: January 13, 2004
    Inventor: Joseph Yaacoub Sahyoun
  • Patent number: 6671235
    Abstract: A method of, and apparatus for, defining disk tracks in magnetic recording media. The track-writing apparatus (20) is capable of forming tracks (340) with a track width (TW) and track spaces (350) with a space width (SW) on a magnetic media disk (70) having an upper surface (70S), wherein the disk comprises a magnetic medium with a thermal diffusion length (X). The apparatus comprises, in order along an optical axis (A1), a laser light source (30) capable of providing a pulsed laser light beam (B1), a light pipe (32), and illumination shaping optical system (40) that provides substantially uniform illumination over an exposure region (ER), and a phase plate (60) having a phase grating (210) with a grating period (p), arranged proximate and substantially parallel to the upper surface of the disk so as to form an periodic irradiance distribution (380) at the surface of the disk when the phase plate is illuminated with the exposure region.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: December 30, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Andrew M. Hawryluk, Robert D. Hempstead, David A. Markle
  • Patent number: 6645838
    Abstract: A process for activating a doped region (80) or amorphized doped region (34) in a semiconductor substrate (10). The process includes the steps of doping a region of the semiconductor substrate, wherein the region is crystalline or previously amorphized. The next step is forming a conformal layer (40) atop the upper surface (11) of the substrate. The next step is performing at least one of front-side and backside irradiation of the substrate to activate the doped region. The activation may be achieved by heating the doped region to just below the melting point of the doped region, or by melting the doped region but not the crystalline substrate. An alternative process includes the additional step of forming the doped region (amorphized or unamorphized) within or adjacent a deep dopant region (60) and providing sufficient heat to the deep dopant region through at least one of front-side and backside irradiation so that the doped region is activated through explosive recrystallization.
    Type: Grant
    Filed: April 11, 2002
    Date of Patent: November 11, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Somit Talwar, Yun Wang, Michael O. Thompson
  • Patent number: 6635541
    Abstract: A method of the invention comprises forming a partial absorber layer (PAL) over at least one integrated transistor device formed on a semiconductor substrate, and exposing the PAL to radiant energy. A first portion of the radiant energy passes through the PAL and is absorbed in the source and drain regions adjacent a gate region of the integrated transistor device and in the semiconductor substrate underneath the field isolation regions of the integrated device. A second portion of the radiant energy is absorbed by the PAL and is thermally conducted from the PAL to the source and drain regions. The first and second portions of the radiant energy are sufficient to melt the source and drain regions to anneal the junctions of the integrated device.
    Type: Grant
    Filed: September 11, 2000
    Date of Patent: October 21, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Somit Talwar, Yun Wang, Carol Gelatos
  • Patent number: 6635588
    Abstract: Method for controlling heat transferred to a workpiece (W) process region (30) from laser radiation (10) using a thermally induced reflectivity switch layer (60). A film stack (6) is formed having an absorber layer (50) atop the workpiece with a portion covering the process region. The absorber layer absorbs and converts laser radiation into heat. Reflective switch layer (60) is deposited atop the absorber layer. The reflective switch layer comprises one or more layers, e.g. thermal insulator and reflectivity transition layers. The reflective switch layer covering the process region has a temperature related to the temperature of the process region. Reflectivity of the switch layer changes from a low to a high reflectivity state at a critical temperature of the process region, limiting radiation absorbed by the absorber layer by reflecting incident radiation when switched. This limits the amount of heat transferred to the process region from the absorber layer.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: October 21, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Andrew M. Hawryluk, Somit Talwar, Yun Wang, Michael O. Thompson
  • Patent number: 6626263
    Abstract: A passive radiator and method is disclosed which improves frequency response linearity and greatly reduces the possibility that wobble of a passive radiator which will occur without the displacement limitations of a spider containing speaker structure. Two substantially flat surfaced speaker diaphragms are tied together and supported by two sets of surrounds oriented in opposite directions to reduce the non-linearity in the surround spring rate and improve low frequency sound generation. A vent (pressure relief) system is provided to improve the frequency response and range of motion of the passive speaker system. A progressive surround roll arrangement provides for improved sound quality by utilizing localized position based extension while maintaining the range of maximum travel during resonance.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: September 30, 2003
    Inventor: Joseph Yaacoub Sahyoun
  • Patent number: 6628969
    Abstract: The present invention reduces the number of tuners required by an adaptive array that reduces interference in the selected channel of the received desired signal with signals present outside the selected channel bandpass, where the adaptive array includes antennas for generating wideband input signals, weights for generating weighted wideband input signals, adder to sum the weighted wideband input signals, bandpass filter to remove signals from the adder output signal outside the bandpass of the selected channel, feedback function to generate the feedback signal from the bandpass filter output signal, a weight calculator for each weight which includes correlating the wideband signal coupled from the antenna with the feedback signal to generate the weight value. The bandpass filter removes the signals outside the selected channel bandpass, and the weights adapt to reduce interference in the selected channel bandpass.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: September 30, 2003
    Inventor: Kenneth F. Rilling
  • Patent number: 6617555
    Abstract: An image stabilization apparatus and method for stabilizing the imaging of a high-performance optical system prone to imaging instabilities from thermal effects. Thermal instabilities within the lens, such as convection, can result in image placement errors in a high-performance optical system. The apparatus includes a heating element arranged on the upper surface of the optical system to provide heat to one or more gas-filled spaces in the optical system. An insulating blanket covers a portion of the optical system to uniformize the heating of the optical system and increase efficiency of the apparatus. The gas in the spaces is heated so that the warmer gases reside near the upper portion of the optical system, while the cooler gases reside near the lower portion of the optical system. This creates a stable thermal environment within the lens system, thereby stabilizing the imaging. Optionally, gas can be flowed over the lower surface to keep heat from heating the lower portion of the optical system.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: September 9, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Michael A. Newcomb, Evan R. Mapoles, David P. Gaines, Steve Shannon
  • Patent number: 6617600
    Abstract: A radiation shield device (100) and method, the apparatus comprising either an absorbing shield (130), a scattering shield (200) or an absorbing and scattering shield (300) arranged in a processing tool (50) that irradiates a workpiece (70) with high-irradiance radiation (80) from a light source (78). The processing tool has a tool portion (66) having an irradiance damage threshold (IDT). The radiation shield device is designed to intercept a portion of the high-irradiance radiation that would otherwise be incident the tool portion, and to ensure that radiation exiting the particular shield comprising the radiation shield device and incident the tool portion has an irradiance below the tool portion irradiance damage threshold. The method includes using the radiation shield device in processing a workpiece using a processing tool.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: September 9, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Andrew M. Hawryluk, Joe Gortych, Yu Chue Fong
  • Patent number: 6588028
    Abstract: An inflatable pool includes inflatable first and second annular members, a plurality of inflatable posts, each of which has two ends connected respectively and fixedly to the first and second annular members, a bottom wall having a periphery that is connected sealingly to an inner periphery of the second annular member, and an annular upright side wall unit that abuts against the posts.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: July 8, 2003
    Inventor: Hsin-Tsai Wu
  • Patent number: 6570656
    Abstract: The closed loop embodiment includes a pulsed laser controller to selectively operate a pulsed laser in a lower-power probe mode or a higher power operational mode. In lower-power probe mode, values of eT (total radiation energy flooding ICs on a silicon wafer), er (fraction of eT specularly reflected), es (fraction of eT scattered) and es (fraction of eT transmitted through wafer) are obtained. A value for ea (fraction of eT absorbed wafer) is calculated i.e. ea=eT−(er+es+et), and ea used by pulsed laser controller with pulsed laser in higher power operational mode to adjust pulsed laser fluence over the duration of a pulse to provide flooding radiation energy sufficient to melt an amorphized silicon surface layer beneath radiation-absorbent material, yet insufficient to melt crystalline silicon or ablate radiation-absorbent material. Open loop embodiment substitutes a separate low-power probe laser for operation in lower-power probe mode.
    Type: Grant
    Filed: April 10, 2000
    Date of Patent: May 27, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: James B. Owens, Jr., Somit Talwar, Andrew M. Hawryluk, Yun Wang
  • Patent number: 6564044
    Abstract: The present invention reduces the degradation in performance of one or more radio signals that are co-transmitted with a first radio signal from the same transmitting antenna in the same frequency channel and received by the same antenna due to multipath or other shared interference, where the one or more radio signals can be separated from the first radio signal.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: May 13, 2003
    Inventor: Kenneth F. Rilling
  • Patent number: 6556279
    Abstract: A system and method of compensating for image smear that arises when imaging onto a moving workpiece with a single pulse of radiation. The system includes a mask frame capable of supporting a mask to be imaged. The mask frame is operatively connected to a drive unit and is capable of moving in the mask plane. The mask frame is driven in an oscillatory fashion in the mask plane so that when a pulse of radiation illuminates the mask, the mask image moves in the same direction as the moving workpiece, thereby reducing image smear. The present invention is particularly applicable to single-pulse-exposure systems that utilize pulsed radiation sources having relatively long pulse duration, such as flash-lamps or certain types of lasers.
    Type: Grant
    Filed: August 20, 2001
    Date of Patent: April 29, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Dan Meisburger, David A. Markle
  • Patent number: 6554464
    Abstract: A light tunnel (24) comprising a hollow light tunnel body (30) or a solid light tunnel body (80) having a central axis (A1 or A2), a reflective surface (42 or 84) facing the axis, and an output end (54 or 94) having an edge (60 or 106) with a chamfered surface (120 or 130) formed on the edge. The chamfered surface is designed to alter the reflective properties of the reflective surfaces of the light tunnel body near the output end so as to reduce or eliminate edge ringing from the light tunnel body edge. In the case of a knife-edge (340) placed at the output end of the light tunnel body, knife-edge ringing is eliminated by providing a light source (310) in the form of a laser with a large number of spatial modes (M2>30). The present invention is expected to be most useful in cases where time-averaging or other interference-eliminating means prove impossible or impractical, such as with applications requiring only one or a few high-irradiance light pulses that need to uniformly irradiate a workpiece.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: April 29, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Andrew M. Hawryluk, Yu Chue Fong, David G. Stites, Weijian Wang
  • Patent number: 6534159
    Abstract: An apparatus in accordance with this invention includes an alignment mark that is formed in a substrate. The alignment mark extends across a dice line so that, upon dicing the substrate, the mark is exposed in the substrate's side edge. The mark is formed at a predetermined distance from a position at which a feature is desired to be formed on the substrate's side edge using a mask. Accordingly, the mark is a positional reference that can be used for highly accurate placement of the feature on the side surface of the substrate with the mask. Preferably, the mark is formed of metal or other material enhanced to a size that is readily detectable by an alignment system with which the mark is to be used. The invention also includes methods for making the alignment mark.
    Type: Grant
    Filed: September 10, 1999
    Date of Patent: March 18, 2003
    Assignee: Ultratech Stepper, Inc.
    Inventors: Thomas H Newman, Norbert Kappel
  • Patent number: 6532820
    Abstract: An ultrasonic image process and system for accurately evaluating the quality of a weld using ultrasonic responses and operator entered data to enhance the quality of weld inspection. Ultrasonic responses useful in accurately indicating the actual location of the weldment, detecting the actual component thickness and the location and characteristic of any other relevant ultrasonic reflectors located in or near the weld heat effected zone are input to a composite image of a weldment for the purpose of enhancing the quality and the ease of detecting, evaluating and sizing of weld defects. Through the superposition of ultrasonic image data from additional complimentary sensors and operator inputs based on prior known data, useful images can be formed to improve the decision making in weldment inspection and evaluation.
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: March 18, 2003
    Inventors: Marvin F. Fleming, Jack P. Clark, Robert M. Clark