Patents Assigned to Applied Material
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Patent number: 12160243Abstract: Embodiments disclosed herein include a method of calibrating a tool for converting photonic signals to electrical signals. In an embodiment, the method comprises connecting a calibration module to a calibrated current source, finding a transfer function for a plurality of modes with the calibration module, and storing the transfer functions in a lookup table.Type: GrantFiled: July 11, 2022Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Mikhail Taraboukhine, Oleg Serebryanov, Alexander Goldin, Vilen Nestorov
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Patent number: 12159785Abstract: In one example, a process chamber comprises a lid assembly, a first gas supply, second gas supply, a chamber body, and a substrate support. The lid assembly comprises a gas box, a gas conduit passing through the gas box, a blocker plate, and a showerhead. The gas box comprises a gas distribution plenum, and a distribution plate comprising a plurality of holes aligned with the gas distribution plenum. The blocker plate is coupled to the gas box forming a first plenum. The showerhead is coupled to the blocker plate forming a second plenum. The first gas supply is coupled to the gas distribution plenum, and the second gas supply system is coupled to the gas conduit. The chamber body is coupled to the showerhead, and the substrate support assembly is disposed within an interior volume of the chamber body, and is configured to support a substrate during processing.Type: GrantFiled: September 11, 2023Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Daemian Raj Benjamin Raj, Gregory Eugene Chichkanoff, Shailendra Srivastava, Sai Susmita Addepalli, Nikhil Sudhindrarao Jorapur, Abhigyan Keshri, Allison Yau
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Patent number: 12159797Abstract: Embodiments disclosed herein include a method for determining a temperature error of a pyrometer. In an embodiment, the method comprises measuring a first signal with a first sensor of the pyrometer and measuring a second signal with a second sensor of the pyrometer. In an embodiment, the method further comprises determining a reflectivity of a reflector plate from the first signal and the second signal, and determining the temperature error using the reflectivity.Type: GrantFiled: August 16, 2021Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Wolfgang Aderhold, Samuel Howells, Amritha Rammohan, Huy Q. Nguyen
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Patent number: 12159795Abstract: An enclosure system includes walls including sidewalls and a bottom wall. The enclosure system further includes an enclosure lid configured to removably attach to one or more of the sidewalls. The walls and the enclosure lid at least partially enclose an interior volume of the enclosure system. The enclosure system further includes an upper window disposed in the enclosure lid. The upper window is configured for orientation verification of objects disposed in the interior volume. The enclosure system further includes a radio-frequency identification (RFID) holder coupled to a rear wall. The RFID holder is configured to secure an RFID component. The enclosure system further includes shelves disposed in the interior volume. Each of the shelves is configured to support a corresponding object of the objects.Type: GrantFiled: March 2, 2022Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: John C. Menk, Rachel Sara Stolzman, Douglas R. McAllister
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Patent number: 12158605Abstract: Embodiments described herein provide for methods of forming optical device structures. The methods utilize rotation of a substrate, to have the optical device structures formed thereon, and tunability of etch rates of a patterned resist disposed over the substrate and one of a device layer or the substrate to form the optical device structures without multiple lithographic patterning steps and angled etch steps.Type: GrantFiled: May 13, 2024Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Levent Colak, Ludovic Godet, Andre P. Labonte
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Patent number: 12159802Abstract: The disclosure describes devices, systems, and methods for integrating load locks into a factory interface footprint space. A factory interface for an electronic device manufacturing system can include a load port for receiving a substrate carrier. The load port can include a frame adapted for connecting the load port to a factory interface, the frame comprising a transport opening through which one or more substrates are capable of being transported between the substrate carrier and the factory interface. The load port can also include an actuator coupled to the frame, and a load port door coupled to the actuator and configured to seal the transport opening. The frame height can be greater than the height of the load port door, and less than 2.5 times the height of the load port door.Type: GrantFiled: March 1, 2022Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Srinivas Poshatrahalli Gopalakrishna, Paul B. Reuter, Devendra Channappa Holeyannavar, Douglas B. Baumgarten, Sushant S. Koshti, Arunkumar Ramachandraiah, Narayanan Ramachandran
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Patent number: 12159392Abstract: Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.Type: GrantFiled: September 14, 2020Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Yongan Xu, Chan Juan Xing, Jinxin Fu, Yifei Wang, Ludovic Godet
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Patent number: 12157943Abstract: Methods for selective deposition are described herein. Further, methods for improving selectivity comprising an ammonia plasma pre-clean process are also described. In some embodiments, a silyl amine is used to selectively form a surfactant layer on a dielectric surface. A ruthenium film may then be selectively deposited on a conductive surface. In some embodiments, the ammonia plasma removes oxide contaminations from conductive surfaces without adversely affecting the dielectric surface.Type: GrantFiled: September 3, 2020Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Wenjing Xu, Gang Shen, Yufei Hu, Feng Chen, Tae Hong Ha
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Patent number: 12159796Abstract: Devices, systems, and methods for integrating load locks into a factory interface footprint space. A factory interface for an electronic device manufacturing system can include an interior volume defined by a bottom, a top and a plurality of sides, a load lock disposed within the interior volume of the factory interface, and a factory interface robot disposed within the interior volume of the factory interface, wherein the factory interface robot is configured to transfer substrates between a set of substrate carriers and the load lock.Type: GrantFiled: February 9, 2023Date of Patent: December 3, 2024Assignee: Applied Materials, Inc.Inventors: Jacob Newman, Andrew J. Constant, Michael R. Rice, Paul B. Reuter, Shay Assaf, Sushant S. Koshti
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Publication number: 20240395553Abstract: Semiconductor processing methods and semiconductor structures are provided with improved doping in target regions. Methods include providing a substrate disposed within a semiconductor processing chamber, where one or more undoped target regions are formed on the substrate. Methods include subjecting the one or more undoped target regions to a pre-clean operation, removing at least a portion of any oxide present on the one or more undoped target regions. Methods include contacting the one or more undoped target regions with a gas phase dopant or a radical thereof, doping the one or more target regions.Type: ApplicationFiled: May 9, 2024Publication date: November 28, 2024Applicant: Applied Materials, Inc.Inventors: Zhijun Chen, Fredrick Fishburn, In Soo Jung, Zuoming Zhu
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Publication number: 20240395506Abstract: A microwave plasma impedance transformers comprising a thermal break and methods of use are described. The impedance transformer comprises a housing having a first end and a second end defining a length of the housing. The housing has a channel with channel walls extending through the length from the first end to the second end, and the channel has an opening in the first end of the housing with a first end diameter and an opening in the second end of the housing with a second end diameter. The first end diameter being greater than the second end diameter. The channel acts as a conical impedance transformer.Type: ApplicationFiled: November 9, 2023Publication date: November 28, 2024Applicant: Applied Materials, Inc.Inventors: Kenneth Brian Doering, Xiaokang Yang, Sathya Swaroop Ganta
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Publication number: 20240395500Abstract: A method of stress management in a substrate, using angled ion implantation to introduced anisotropic stress within the substrate.Type: ApplicationFiled: June 28, 2024Publication date: November 28, 2024Applicant: Applied Materials, Inc.Inventor: Frank SINCLAIR
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Patent number: 12154754Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.Type: GrantFiled: June 8, 2022Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: Craig R. Chaney, Graham Wright
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Patent number: 12154753Abstract: An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves as a sink for free electrons and ions. This causes a reduction in plasma density near the protrusion, and may improve the uniformity of the ribbon ion beam that is extracted from the ion source by modifying the beam current near the protrusion. The shape of the protrusion may be modified to achieve the desired uniformity. The protrusion may also be utilized with a cylindrical ion source. In certain embodiments, the protrusion is created by a plurality of mechanically adjustable protrusion elements.Type: GrantFiled: September 13, 2021Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: Jay T. Scheuer, Graham Wright, Peter F. Kurunczi, Alexandre Likhanskii
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Patent number: 12154804Abstract: A method includes identifying a set of wafers, wherein each wafer is associated with a respective start time of a set of start times, determining whether the set of wafers includes an idle wafer, in response to determining that the set of wafers includes an idle wafer that is idle for a duration that exceeds a predefined threshold value, generating a modified set of start times by modifying at least the start time for the idle wafer, and initiating a computer simulation forecasting processing of the set of wafers using a wafer modification chamber and a wafer movement chamber based on the modified set of start times. The computer simulation uses a machine learning model trained based on a first duration to perform a first manufacturing task using the wafer modification chamber and a second duration to perform a second manufacturing task using the wafer movement chamber.Type: GrantFiled: October 25, 2023Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventor: Adrian Rhee
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Patent number: 12154766Abstract: An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as an inert gas, while heating the vaporizer. When operating in a second mode, the ion source may supply a second gas, which may be an organoaluminium gas. When operating in a third mode, the ion source may supply the second gas, while heating the vaporizer. Ions having single charges may be created in the first and second modes, while ions having multiple charges may be created in the third mode.Type: GrantFiled: June 7, 2022Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: Graham Wright, Shardul S. Patel
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Patent number: 12154755Abstract: An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes may be utilized to remove the interaction between the biased extraction plate and the plasma. The cross-section of the arc chamber may be circular or nearly circular to facilitate the rotation of electrons in the chamber. In another embodiment, biased electrodes may be disposed in the chamber on opposite sides of the extraction aperture in the height direction. In some embodiments, only one of the electrodes is biased at a voltage greater than the body of the arc chamber.Type: GrantFiled: December 15, 2021Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: June Young Kim, Jin Young Choi, Yong-Seok Hwang, Kyoung-Jae Chung, Bon-Woong Koo
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Publication number: 20240387151Abstract: An antenna assembly. The antenna assembly may include an antenna, having a loop structure, and a dielectric window, adjacent to the antenna. The antenna assembly may also include a Faraday shield assembly disposed between the antenna and the dielectric window, where the Faraday shield assembly is disposed at least partially around the antenna. The Faraday shield assembly may include a plurality of metallic sections, electrically isolated from one another, where the plurality of metallic sections are arranged into a plurality of shield pairs. As such, a first metallic section and a second metallic section of a given shield pair may be disposed opposite one another and may be electrically connected to one another.Type: ApplicationFiled: May 17, 2023Publication date: November 21, 2024Applicant: Applied Materials, Inc.Inventors: BENJAMIN ALEXANDROVICH, PETER F. KURUNCZI, DAVID MORRELL, ADAM CALKINS
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Publication number: 20240385203Abstract: A positioning system that includes (a) a linear motor that includes a movable magnetic unit and a coil stator, the coil stator includes a group of coil stator segments; wherein the mechanical support unit is mechanically coupled to the movable magnetic unit; (b) a mechanical support element for supporting a sample within a vacuum chamber; (c) a power supply that is configured to independently supply power to different coil stator segments of the coil stator segments to induce a movement of the movable magnetic unit in relation to the coil stator, along a axis; (d) a heat reduction element that is configured to reduce a temperature of the coil stator; and (e) a controller that is configured to control the movement of the movable magnetic unit by controlling the supply of power to the different coil stator segments.Type: ApplicationFiled: May 17, 2023Publication date: November 21, 2024Applicant: Applied Materials Israel Ltd.Inventor: Ronen Hagai
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Patent number: D1052548Type: GrantFiled: June 26, 2023Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: Devi Raghavee Veerappan, Xiaoxiong Yuan, Peiyu Zhang, Borui Xia, Chih-Hsun Hsu
