Patents Assigned to ASML Netherlands
  • System and method for protecting a seed laser in an EUV light source with a Bragg AOM
    Patent number: 8848277
    Abstract: A method and apparatus for protecting the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed in one embodiment, a Bragg AOM is used as a switch on the beam path from the seed laser to other optical components and ultimately to an irradiation site. Power is applied to the Bragg AOM and pulses from the seed laser are thus deflected onto the desired beam path rather than passing straight through the Bragg AOM. Once the pulses have passed through the Bragg AOM, power to the Bragg AOM ceases, so that any reflections from the irradiation site will pass straight through the Bragg AOM and will not be deflected back to the seed laser. Use of the Bragg AOM rather than components previously used results in lower power consumption and better protection for the seed laser.
    Type: Grant
    Filed: January 9, 2013
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Richard L. Sandstrom, Jonathan D. Grava
  • System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
    Patent number: 8847183
    Abstract: A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
    Type: Grant
    Filed: October 23, 2013
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B. V.
    Inventors: William N. Partlo, Igor V. Fomenkov
  • Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
    Patent number: 8848195
    Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
    Type: Grant
    Filed: October 22, 2009
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christian Marinus Leewis, Marcus Adrianus Van De Kerkhof, Karel Diederick Van Der Mast, Peter Clement Paul Vanoppen, Ruben Alvarez Sanchez
  • Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method
    Patent number: 8848164
    Abstract: A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Pieter Jacob Kramer
  • Lithographic apparatus, composite material and manufacturing method
    Patent number: 8848169
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Mark Scholten, Jacob Kleijn, Stephan Christiaan Quintus Libourel, Mark Petrus Ubbink
  • Imprint lithography apparatus
    Patent number: 8845320
    Abstract: An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.
    Type: Grant
    Filed: May 17, 2010
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Catharinus De Schiffart, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen
  • Lithographic apparatus and device manufacturing method
    Patent number: 8848165
    Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
  • Lithographic apparatus and device manufacturing method
    Patent number: 8848162
    Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Catharinus Hubertus Mulkens
  • LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A DEVICE MANUFACTURING METHOD, A METHOD OF CALCULATING SETPOINT DATA AND A COMPUTER PROGRAM
    Publication number: 20140285786
    Abstract: An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.
    Type: Application
    Filed: November 15, 2012
    Publication date: September 25, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Wouter Frans Willem Mulckhuyse
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140285782
    Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
    Type: Application
    Filed: November 14, 2012
    Publication date: September 25, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Arno Jan Bleeker
  • LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM
    Publication number: 20140285785
    Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.
    Type: Application
    Filed: November 6, 2012
    Publication date: September 25, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Arno Jan Bleeker, Erik Roelof Loopstra
  • Level sensor arrangement for lithographic apparatus and device manufacturing method
    Patent number: 8842293
    Abstract: A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: September 23, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Jozef Petrus Henricus Benschop, Ralph Brinkhof, Lukasz Jerzy Macht
  • LASER PRODUCED PLASMA EUV LIGHT SOURCE
    Publication number: 20140264093
    Abstract: Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.
    Type: Application
    Filed: June 2, 2014
    Publication date: September 18, 2014
    Applicants: ASML NETHERLANDS B.V., ASML NETHERLANDS B.V.
    Inventor: Georgiy O. Vaschenko
  • Zone plate
    Patent number: 8836917
    Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
    Type: Grant
    Filed: January 10, 2012
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen
  • Lithographic apparatus having an encoder type position sensor system
    Patent number: 8836913
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Fluid handling structure, a lithographic apparatus and a device manufacturing method
    Patent number: 8836912
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: David Bessems, Erik Henricus Egidius Catharina Eummelen, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van Der Zanden, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops, Paul Willems
  • Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
    Patent number: 8836915
    Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Mulder, Jan Willem Cromwijk, Jimmy Matheus Wilhelmus Van De Winkel, Marjan Leonardus Catharina Hoofman, Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks
  • TUNABLE WAVELENGTH ILLUMINATION SYSTEM
    Publication number: 20140253891
    Abstract: A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.
    Type: Application
    Filed: May 19, 2014
    Publication date: September 11, 2014
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Arie Jeffrey DEN BOEF, Earl William EBERT, JR., Harry SEWELL, Keith William ANDRESEN, Sanjeev Kumar SINGH
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140253890
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 8, 2014
    Publication date: September 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck
    Publication number: 20140253900
    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.
    Type: Application
    Filed: September 19, 2012
    Publication date: September 11, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will