Patents Assigned to ASML Netherlands
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140354970
    Abstract: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.
    Type: Application
    Filed: December 20, 2012
    Publication date: December 4, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Arno Jan Bleeker
  • METHOD AND APPARATUS FOR COST FUNCTION BASED SIMULTANEOUS OPC AND SBAR OPTIMIZATION
    Publication number: 20140359543
    Abstract: Described herein is a method for obtaining a preferred layout for a lithographic process, the method comprising: identifying an initial layout including a plurality of features; and reconfiguring the features until a termination condition is satisfied, thereby obtaining the preferred layout; wherein the reconfiguring comprises evaluating a cost function that measures how a lithographic metric is affected by a set of changes to the features for a plurality of lithographic process conditions, and expanding the cost function into a series of terms at least some of which are functions of characteristics of the features.
    Type: Application
    Filed: August 18, 2014
    Publication date: December 4, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Jun TAO, Been-Der Chen, Yen-Wen Lu, Jiangwei Li, Min-Chun Tsai, Dong Mao
  • Lithographic apparatus and device manufacturing method
    Patent number: 8902403
    Abstract: In a solid immersion lithography apparatus, the final element of the projection system is maintained at a distance of less than about 50 nm from the substrate by an actuator system. The final element may be formed as two parts, with a fluid, e.g. a liquid, confined between them. The actuator system may be controlled relative to a reference frame, which may be supported by a bearing. Backscatter detection can be used to determine if the distance between the final element and the substrate is too large. A cleaning device can clean the substrate between exposures.
    Type: Grant
    Filed: May 3, 2011
    Date of Patent: December 2, 2014
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Jozef Petrus Henricus Benschop, Alexander Viktorovych Padiy, Tao Chen
  • Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
    Patent number: 8902399
    Abstract: An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Theodorus Petrus Compen, Joost Jeroen Ottens
  • Method of updating calibration data and a device manufacturing method
    Patent number: 8903156
    Abstract: A method of updating calibration data of a first position detection system adapted to determine the position of an object, is presented. The first position detection system includes a target and a plurality of sensors one of which is mounted on an object and the calibration data including coefficients relating an apparent measured position to an actual position and which can be used to convert an apparent measured position to an actual position thereby to correct for physical imperfections in the first position detection system and enable determination of the actual position from the apparent measured position.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Van De Mast, Engelbertus Antonius Fransiscus Van Der Pasch
  • Apparatus for protecting EUV optical elements
    Patent number: 8901523
    Abstract: Apparatus having a chamber with an interior wall and a region within the chamber from which a contaminating material emanates when the apparatus is in operation. A plurality of vanes is positioned on a portion of the interior wall, each of the vanes having a first surface which is oriented along a direction between the vane and the region and a second surface adjacent the first surface which is oriented to deflect the contaminating material striking the second surface away from the region, the second surfaces being dimensioned and juxtaposed with respect to one another such that the second surfaces substantially prevent the contaminating material from striking the portion of the interior wall. At least part of each of the vanes may be covered with a mesh. The vanes may be heated, and may be heated at least to a melting point of the contaminating material.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander I. Ershov, Jeremy A. Burke
  • Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus
    Patent number: 8902400
    Abstract: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista
  • Lithographic apparatus and device manufacturing method
    Patent number: 8902404
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Martinus Cornelis Maria Verhagen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen
  • Module and method for producing extreme ultraviolet radiation
    Patent number: 8901521
    Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
  • MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS
    Publication number: 20140351773
    Abstract: Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yu CAO, Wenjin SHAO, Ronaldus Johannes Gijsbertus GOOSSENS, Jun YE, James Patrick KOONMEN
  • SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY
    Publication number: 20140346141
    Abstract: A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.
    Type: Application
    Filed: December 18, 2012
    Publication date: November 27, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Aurelie Marie Andree Brizard, Roelof Koole, Emiel Peeters
  • DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD
    Publication number: 20140347641
    Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
    Type: Application
    Filed: January 24, 2013
    Publication date: November 27, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling
  • DROPLET GENERATOR WITH ACTUATOR INDUCED NOZZLE CLEANING
    Publication number: 20140346373
    Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
    Type: Application
    Filed: August 5, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140347642
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • METHOD AND APPARATUS FOR MODEL BASED FLEXIBLE MRC
    Publication number: 20140351772
    Abstract: Described herein is a method of processing a pattern layout for a lithographic process, the method comprising: identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement; and reconfiguring the feature, wherein the reconfigured feature still violates the pattern layout requirement, the reconfiguring including evaluating a cost function that measures a lithographic metric affected by a change to the feature and a parameter characteristic of relaxation of the pattern layout requirement.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Taihui LIU, Been-Der CHEN, Yen-Wen LU
  • Positioning system and a method for positioning a substage with respect to a frame
    Patent number: 8896811
    Abstract: A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Antonius Franciscus Johannes De Groot, Johannes Petrus Martinus Bernardus Vermeulen, Geert-Jan Petrus Naaijkens, Marijn Kessels, Daniël Godfried Emma Hobbelen
  • Lithographic apparatus and device manufacturing method
    Patent number: 8896815
    Abstract: A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventor: Heine Melle Mulder
  • Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method
    Patent number: 8896817
    Abstract: During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when there is a mismatch between the illumination mode used and the acceptance NA of the sensor.
    Type: Grant
    Filed: October 11, 2006
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Bearrach Moest
  • Gradient-based pattern and evaluation point selection
    Patent number: 8898599
    Abstract: Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient.
    Type: Grant
    Filed: May 29, 2013
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Xiaofeng Liu, Rafael C. Howell
  • Lithographic apparatus and device manufacturing method
    Patent number: 8896809
    Abstract: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Diederik Jan Maas