Patents Assigned to ASML Netherlands
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Publication number: 20240069454Abstract: A method of processing a data set including equispaced and/or non-equispaced data samples is disclosed. The method includes filtering of the data, wherein a kernel defined by a probability density function is convoluted over samples in the data set to perform a weighted average of the samples at a plurality of positions across the data set, and wherein a first order regression is applied to the filtered data to provide a processed data output.Type: ApplicationFiled: February 21, 2022Publication date: February 29, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Cristina CARESIO, Tabitha Wangari KINYANJUI, Andrey Valerievich ROGACHEVSKIY, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymund CENTENO, Jan Arie DEN BOER, Viktor TROGRLIC
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Patent number: 11914307Abstract: The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.Type: GrantFiled: January 28, 2020Date of Patent: February 27, 2024Assignee: ASML Netherlands B.V.Inventors: Bas Johannes Petrus Roset, Johannes Hendrik Everhardus Aldegonda Muijderman, Benjamin Cunnegonda Henricus Smeets
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Patent number: 11914308Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: March 20, 2023Date of Patent: February 27, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Patent number: 11914942Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.Type: GrantFiled: June 5, 2023Date of Patent: February 27, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Chrysostomos Batistakis, Roger Josef Maria Jeurissen, Koen Gerhardus Winkels
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Publication number: 20240060906Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.Type: ApplicationFiled: December 20, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Bart Jacobus Martinus TIEMERSMA, Alexandru ONOSE, Nick VERHEUL, Remco DIRKS
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Publication number: 20240062356Abstract: A method and apparatus for analyzing an input electron microscope image of a first area on a first wafer are disclosed. The method comprises obtaining a plurality of mode images from the input electron microscope image corresponding to a plurality of interpretable modes. The method further comprises evaluating the plurality of mode images, and determining, based on evaluation results, contributions from the plurality of interpretable modes to the input electron microscope image. The method also comprises predicting one or more characteristics in the first area on the first wafer based on the determined contributions. In some embodiments, a method and apparatus for performing an automatic root cause analysis based on an input electron microscope image of a wafer are also disclosed.Type: ApplicationFiled: December 9, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Huina XU, Yana MATSUSHITA, Tanbir HASAN, Ren-Jay KOU, Namita Adrianus GOEL, Hongmei LI, Maxim PISARENCO, Marleen KOOIMAN, Chrysostomos BATISTAKIS, Johannes ONVLEE
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Publication number: 20240061348Abstract: A metrology apparatus for measuring a parameter of interest of a target on a substrate, the metrology apparatus including: m×n detectors, wherein m?1 and n?1; a first frame; and (n?1) second frames; and (m?1)×n intermediate frames, wherein each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.Type: ApplicationFiled: December 16, 2021Publication date: February 22, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Bram Antonius Gerardus LOMANS, Arie Jeffrey DEN BOEF, Hans BUTLER
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Publication number: 20240061351Abstract: An interferometer system includes an optics system configured to allow a first light beam to travel along a measurement path including a target, and a second light beam to travel along a fixed reference path excluding the target; and a signal generator configured to introduce a power-modulated optical signal in the measurement path or the reference path to determine jitter caused by components of the interferometer system downstream of the signal generator.Type: ApplicationFiled: December 12, 2021Publication date: February 22, 2024Applicant: ASML NETHERLANDS B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20240062362Abstract: An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the generator model; and generating by the generator model, based on the defect-free inspection image, a predicted synthetic defect image with a predicted defect that accords with the defect attribute combination.Type: ApplicationFiled: December 8, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Zhe WANG, Liangjiang YU, Lingling PU
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Publication number: 20240061314Abstract: A supercontinuum radiation source including a modulator being operable to modulate pump laser radiation including a train of radiation pulses to provide modulated pump laser radiation, the modulation being such to selectively provide a burst of the pulses; and a hollow-core photonic crystal fiber being operable to receive the modulated pump laser radiation and excite a working medium contained within the hollow-core photonic crystal fiber so as to generate supercontinuum radiation.Type: ApplicationFiled: September 27, 2023Publication date: February 22, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GÖTZ, Patrick Sebastian UEBEL
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Publication number: 20240061353Abstract: A method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus in control of a lithographic exposure process for exposure of an exposure area including at least two topographical levels. The method includes determining a continuous single focus actuation profile for the at least two topographical levels from an objective function including a per-level component operable to optimize a focus metric per topographical level for each of the at least two topographical levels.Type: ApplicationFiled: December 24, 2021Publication date: February 22, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Simon Hendrik Celine VAN GORP, Stephan VAN REENEN
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Publication number: 20240061347Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.Type: ApplicationFiled: December 20, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Alexandru ONOSE, Bart Jacobus Martinus TIEMERSMA, Nick VERHEUL, Remco DIRKS
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Patent number: 11906906Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.Type: GrantFiled: December 29, 2021Date of Patent: February 20, 2024Assignee: ASML Netherlands B.V.Inventors: Sebastianus Adrianus Goorden, Simon Reinald Huisman, Arjan Johannes Anton Beukman
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Patent number: 11906907Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.Type: GrantFiled: November 27, 2018Date of Patent: February 20, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Derk Servatius Gertruda Brouns, Joshua Adams, Aage Bendiksen, Richard Jacobs, Andrew Judge, Veera Venkata Narasimha Narendra Phani Kottapalli, Joseph Harry Lyons, Theodorus Marinus Modderman, Manish Ranjan, Marcus Adrianus Van De Kerkhof, Xugang Xiong
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Patent number: 11908656Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.Type: GrantFiled: October 8, 2021Date of Patent: February 20, 2024Assignee: ASML Netherlands B.V.Inventors: Han Willem Hendrik Severt, Jan-Gerard Cornelis Van Der Toorn, Ronald Van Der Wilk, Allard Eelco Kooiker
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Patent number: 11908591Abstract: A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.Type: GrantFiled: September 13, 2019Date of Patent: February 20, 2024Assignee: ASML Netherlands B.V.Inventors: Pieter Willem Herman De Jager, Antonius Theodorus Anna Maria Derksen
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Publication number: 20240055221Abstract: An improved readout circuit for a charged particle detector and a method for operating the readout circuit are disclosed. An improved circuit comprises an amplifier configured to receive a signal representing an output of a sensor layer and comprising a first input terminal and an output terminal, a capacitor connected between the first input terminal and the output terminal, and a resistor connected in parallel with the capacitor between the first input terminal and the output terminal. The circuit can be configured to operate in a first mode and a second mode. The capacitor can be adjustable using a capacitance value of the capacitor to enable control of a gain of the circuit operating in the first mode and control of a bandwidth of the circuit operating in the second mode.Type: ApplicationFiled: December 13, 2021Publication date: February 15, 2024Applicant: ASML Netherlands B.V.Inventors: Jan Louis SUNDERMEYER, Leonhard Martin KLEIN, Matthias OBERST, Harald Gert Helmut NEUBAUER
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Publication number: 20240054669Abstract: A system, method, and apparatus for determining three-dimensional (3D) information of a structure of a patterned substrate. The 3D information can be determined using one or more models configured to generate 3D information (e.g., depth information) using only a single image of a patterned substrate. In a method, the model is trained by obtaining a pair of stereo images of a structure of a patterned substrate. The model generates, using a first image of the pair of stereo images as input, disparity data between the first image and a second image, the disparity data being indicative of depth information associated with the first image. The disparity data is combined with the second image to generate a reconstructed image corresponding to the first image. Further, one or more model parameters are adjusted based on the disparity data, the reconstructed image, and the first image.Type: ApplicationFiled: November 24, 2021Publication date: February 15, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Tim HOUBEN, Thomas Jarik HUISMAN, Maxim PISARENCO, Scott Anderson MIDDLEBROOKS, Chrysostomos BATISTAKIS, Yu CAO
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Publication number: 20240053532Abstract: A radiation source for generating broadband radiation, the source including an input assembly for providing input radiation and a hollow-core photonic crystal fiber configured to receive and confine the input radiation coupled into the fiber for generating broadband radiation through spectral broadening, wherein the input assembly includes a pump source configured to provide input radiation having an average power of at least 50 W, and wherein the hollow core photonic crystal fiber includes: a hollow core having a diameter of at least 35 ?m; and a cladding region including a plurality of anti-resonant structures surrounding the hollow core, the anti-resonant structures including a wall portion having a wall thickness smaller than half the wavelength of the lower end of a wavelength range of the broadband radiation.Type: ApplicationFiled: December 20, 2021Publication date: February 15, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Patrick Sebastian UEBEL, Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GÖTZ
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Publication number: 20240055219Abstract: Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample are disclosed. In one arrangement, a beam separator diverts away from the primary beam path a beam of secondary electrons emitted from the sample along the primary beam path. A dispersion device is upbeam from the beam separator. The dispersion device compensates for dispersion induced in the primary beam by the beam separator. One or more common power supplies drive both the beam separator and the dispersion device.Type: ApplicationFiled: November 29, 2021Publication date: February 15, 2024Applicant: ASML Netherlands B.V.Inventors: Mans Johan Bertil OSTERBERG, Kenichi KANAI
