Abstract: Refractory metal powders are dehydrided in a device which includes a preheat chamber for retaining the metal powder fully heated in a hot zone to allow diffusion of hydrogen out of the powder. The powder is cooled in a cooling chamber for a residence time sufficiently short to prevent re-absorption of the hydrogen by the powder. The powder is consolidated by impact on a substrate at the exit of the cooling chamber to build a deposit in solid dense form on the substrate.
Type:
Grant
Filed:
May 23, 2013
Date of Patent:
February 24, 2015
Assignee:
H.C. Starck Inc.
Inventors:
Steven A. Miller, Mark Gaydos, Leonid N. Shekhter, Gokce Gulsoy
Abstract: The invention relates to the production of valve metal powders, in particular, tantalum powders by reduction of a corresponding valve metal compound, for example, K2TaF7, with an alkali metal in the presence of a diluent salt, whereby the reduction is carried out in the presence of a particle diminution agent, preferably, Na2SO4, which is added to the reaction mixture continuously or in aliquots.
Type:
Grant
Filed:
December 9, 2004
Date of Patent:
February 10, 2015
Assignee:
H.C. Starck GmbH
Inventors:
Josua Löffelholz, Frank Behrens, Siegfried Schmieder
Abstract: The invention relates to a process that involves (1) feeding (a) a first valve metal powder component containing valve metal particles and (b) reducing component into a reactor having a hot zone; and (2) subjecting the first valve metal powder component and the reducing component to non-static conditions sufficient to simultaneously (i) agglomerate the first valve metal powder component particles, and (ii) reduce oxygen content in the valve metal powder component particles, and thereby form a second valve metal powder component containing oxygen-reduced valve metal particles, in which the reducing component is selected from the group consisting of magnesium reducing components, calcium reducing components, aluminum reducing components, lithium reducing components, barium reducing components, strontium, reducing components, and combinations thereof.
Type:
Grant
Filed:
June 21, 2005
Date of Patent:
February 10, 2015
Assignee:
H.C. Starck GmbH
Inventors:
Leonid Lanin, Anastasia M. Conlon, Michael J. Albarelli
Abstract: Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the ?(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase ?(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
Type:
Grant
Filed:
November 2, 2010
Date of Patent:
December 16, 2014
Assignee:
H.C. Starck Inc.
Inventors:
Mark E. Gaydos, Prabhat Kumar, Steve Miller, Norman C. Mills, Gary Rozak, Rong-Chein Richard Wu
Abstract: In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and comprising a sputtering-target material is provided, the sputtering-target material (i) comprising a metal, (ii) defining a recessed furrow therein, and (iii) having a first grain size and a first crystalline microstructure. A powder is spray-deposited within the furrow to form a layer therein, the layer (i) comprising the metal, (ii) having a second grain size finer than the first grain size, and (iii) having a second crystalline microstructure more random than the first crystalline microstructure. Spray-depositing the powder within the furrow forms a distinct boundary line between the layer and the sputtering-target material.
Type:
Grant
Filed:
June 18, 2013
Date of Patent:
November 11, 2014
Assignees:
H.C. Starck Inc., H.C. Starck GmbH
Inventors:
Steven A. Miller, Prabhat Kumar, Rong-chein Richard Wu, Shuwei Sun, Stefan Zimmermann, Olaf Schmidt-Park
Abstract: A process for producing a component includes providing a composition comprising hard material particles and a binder metal, and sintering the composition at a sintering temperature of from 1250° C. to 1400° C. for a period of from 3 to 15 minutes. The hard material particles comprise an inner core comprising fused tungsten carbide and an outer shell comprising tungsten carbide. The binder metal is selected from the group consisting of Co, Ni, Fe and alloys comprising at least one metal selected from Co, Ni and Fe.
Abstract: A valve metal powder having a particle shape factor mean value f, as determined by SEM image analysis, of 0.65?f?1, said powder has an average agglomerate particle size D50 value, as determined with a MasterSizer in accordance with ASTM B 822, of 40 to 200 ?m and wherein the valve metal powder is niobium.
Abstract: A method for producing a workpiece comprising a layer of an additive-free silicon nitride includes providing a base body of the workpiece. A layer of a slip comprising a silicon powder is applied to an inside of the base body so as to obtain a coated base body. The coated base body is subjected to a reactive firing under nitrogen so as to convert the silicon powder to the additive-free silicon nitride.
Abstract: A dispersion comprising hard material particles and at least one organic binder and/or at least one plasticizer. The hard material particles comprise an inner core comprising a fused tungsten carbide and an outer shell comprising tungsten carbide.
Abstract: A cermet powder includes a) from 50 to 90 wt-% of at least one hard material, and b) from 10 to 50 wt-% of a matrix metal composition. The wt.-% for a) and b) are based on a total weight of the cermet powder. The matrix metal composition comprises i) from 40 to 75 wt-% of iron and nickel, ii) from 18 to 35 wt-% of chromium, iii) from 3 to 20 wt.-% of molybdenum, and iv) from 0.5 to 4 wt-% of copper. The wt-% for i) to iv) are based in each case on a total weight of the matrix metal composition. A weight ratio of iron to nickel is from 3:1 to 1:3.
Abstract: Process for the production of valve metal powders, in particular niobium and tantalum powder, by reduction of corresponding valve metal oxide powders by means of vaporous reducing metals and/or hydrides thereof, preferably in the presence of an inert carrier gas, wherein the reduction is performed at a vapor partial pressure of the reducing metal/metal hydride of 5 to 110 hPa and an overall pressure of less than 1000 hPa, and tantalum powder obtainable in this way having a high stability of the powder agglomerate particles.
Type:
Grant
Filed:
October 22, 2010
Date of Patent:
August 12, 2014
Assignee:
H. C. Starck GmbH & Co. KG
Inventors:
Helmut Haas, Ulrich Bartmann, Tadashi Komeya, Nobuyuki Sato
Abstract: Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 ?m, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced.
Type:
Grant
Filed:
April 28, 2006
Date of Patent:
August 12, 2014
Assignee:
H. C. Starck GmbH
Inventors:
Stefan Zimmermann, Uwe Papp, Heinrich Kreye, Tobias Schmidt
Abstract: Elemental boron with a boron content of at least 96.8% by weight, an oxygen content of at most 1.6% by weight, a nitrogen content of at most 0.2% by weight, a crystallinity of 30% by weight or less, and a particle size distribution with a d100 value of 9 ?m or less.
Abstract: The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.
Type:
Grant
Filed:
January 16, 2007
Date of Patent:
July 22, 2014
Assignee:
H.C. Starck Inc.
Inventors:
Prabhat Kumar, Charles Wood, Gary Rozak, Steven A. Miller, Glen Zeman, Rong-Chein Richard Wu
Abstract: In various embodiments, protective layers are bonded to a steel layer and connected by a layer of unmelted metal powder produced by cold spray.
Type:
Grant
Filed:
March 21, 2013
Date of Patent:
July 15, 2014
Assignee:
H.C. Starck Inc.
Inventors:
Steven A. Miller, Leonid N. Shekhter, Stefan Zimmermann
Abstract: A process for producing an anode for an electrolytic capacitor includes pressing a tantalum powder around a tantalum wire, a tantalum ribbon, or a tantalum sheet to form a pressed body. The pressed body is sintered to form a porous sintered body. The porous sintered body is cooled to form a cooled porous sintered body. The cooled porous sintered body is treated with at least one oxidant comprising at least one of a gaseous oxidant and a liquid oxidant to form a treated sintered body. The treated sintered body is anodically oxidized in an electrolyte to form a dielectric layer.
Type:
Application
Filed:
August 8, 2012
Publication date:
July 3, 2014
Applicant:
H.C. STARCK GMBH
Inventors:
Helmut Haas, Marcel Hagymasi, Holger Brumm, Christoph Schnitter
Abstract: A process for producing a solid electrolyte capacitor with an anode comprising a sintered fine NbOx powder, where 0.5<x<1.7, includes forming a green anode body. The forming is essentially performed without applying a pressure. The green anode body is sintered so as to provide a sintered anode body. The sintered anode body is electrolytically oxidized so as to provide an electrolytically oxidized anode body. The electrolytically oxidized anode body is provided with a cathode so as to provide the solid electrolyte capacitor.
Abstract: In various embodiments, an electrode has a shaft extending from an electrode head and a cooling passage extending from an open end disposed at an attachment end of the shaft to a closed end disposed within the electrode head.
Abstract: A joined sputtering target comprising a sputtering material is formed by disposing two discrete sputtering-target tiles comprising the sputtering material proximate each other, thereby forming an interface between the tiles, the interface comprising at least one of an interlocking joint therein or a recess in a top surface thereof, and spray-depositing a spray material over at least a portion of the interface, thereby joining the tiles to form the joined sputtering target.
Type:
Grant
Filed:
September 27, 2012
Date of Patent:
May 27, 2014
Assignee:
H.C. Starck Inc.
Inventors:
Scott Jeffrey Volchko, Stefan Zimmermann, Steven A. Miller, Michael Thomas Stawovy
Abstract: A mixed oxide catalyst includes a support material selected from the group comprising aluminum oxide, magnesium oxide, titanium oxide, and mixtures of aluminum oxide, magnesium oxide, and titanium oxide, and a catalyst active component comprising cobalt oxide and molybdenum oxide. The catalyst active component is nanodispersed in the support material.
Type:
Application
Filed:
June 13, 2012
Publication date:
May 22, 2014
Applicant:
H.C. STARCK GMBH
Inventors:
Juliane Meese-Marktscheffel, Armin Olbrich, Matthias Jahn, Stefan Vodegel, Christoph Immisch