Abstract: The presently disclosed subject matter provides a pattern measurement method and device for achieving highly accurate measurement in the depth direction of a pattern. The method involves a focused ion beam irradiated to form an inclined surface in a sample area; a field of view of a SEM set to include the boundary between the inclined surface and a sample surface; and an image of the field of view obtained on the basis of a detection signal. Such an acquired image is used to specify a first position, the boundary between inclined surface and non-inclined surface, and a second position, the position of a desired deep hole or deep groove positioned within the inclined surface. The pattern dimension in a height direction is determined on the basis of the distance in the sample surface direction between the first position and second position and the angle of the inclined surface.

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

Abstract: An automated analyzer maintains high processing capacity and dispensation accuracy even when items requiring dilution/pretreatment and general reaction measurement are mixed. A plurality of sample dispensing mechanisms are independently driven and each include a sample collection position, a sample nozzle for collecting the sample, and a washing tank for washing the sample nozzle. The sample dispensing mechanisms are configured to collect the sample from a plurality of sample collection positions and are operated independently to perform sample dispensation into reaction containers on a reaction disc. At least one of the sample dispensing mechanisms is provided for each of a sample requiring dilution/pretreatment and a sample that does not require dilution/pretreatment. The automated analyzer is provided with a control means for causing the respective mechanisms to be operated in a dedicated manner. The sample is dispensed such that no vacancy is created in the reaction containers.

Abstract: A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.

Abstract: In order to provide a pattern-measuring device and a computer program that quantitatively evaluate the effects brought about by the presence of pattern deformations in a circuit, this invention proposes a pattern-measuring device that measures first distances between first edges in pattern data being measured and second edges that correspond to said first edges in a benchmark pattern that corresponds to the pattern being measured. Said pattern-measuring device computes a score for the first edges or the pattern being measured on the basis of the first distances and second distances between the first edges and/or the second edges and third edges that are adjacent to but different from the first and second edges.

Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images.

Abstract: A multicolor detection device includes: a condensing lens array 17 in which a plurality of condensing lenses 18, each of which turns light emitted from each of a plurality of light emitting points 1 individually into parallel light beams, are arranged, the light emitting points being arranged in a light emitting point array; at least one spectroscopic element on which the parallel light beams are incident in parallel, the at least one spectroscopic element being common; and at least one sensor on which light beams spectrally separated by the spectroscopic element are incident in parallel, the at least one sensor being common.

Abstract: A multicolor fluorescence analysis device 11 is for detecting fluorescence emitted, as a result of excitation light irradiation, from a plurality of types of fluorophores included in a sample s, and is provided with an irradiation optical unit 520 for irradiating light emitted from a light source 510 onto a sample s as excitation light, a fluorescence condensation unit 530 having a fluorescence filter 531 that transmits light emitted from the sample s and transmits light of transmission wavelength bands different from the excitation wavelength bands, and a two-dimensional detector 554 that has a plurality of types of transmission filters 556 for transmitting prescribed wavelengths of light and detects the intensity of the light of the prescribed wavelength for each transmission filter 556, and the light emitted from at least two fluorophores from among the plurality of types of fluorophores is detected simultaneously and the fluorophore types are identified accordingly.

Abstract: An automatic analysis apparatus capable of improving detection sensitivity is provided. An optimum photometer between a light-scattering photometer and an absorptiometer based on a concentration range may be decided. A standard solution is measured multiple times at a normal calibration and a calibration curve is created. Calibration curves are individually created for an absorptiometer and a light-scattering photometer from the minimum and maximum measured values of the concentrations of each standard solution. The upper and lower limits of a standard solution concentration are computed from the minimum/maximum calibration curves. Sensitivity may be computed by using calibration parameters. Whether to use a concentration by absorption or a concentration by scattered light is decided based on the computed sensitivity. The computed sensitivities are compared between the concentration by absorption and the concentration by scattered light, and the use of the concentration of a higher sensitivity is decided.

Abstract: In a scheme for analyzing low magnification defect images and determining whether or not a defect detection method using cell comparison is applicable, if a defect detection method using cell comparison cannot be applied and the proportion transitioning to a defect detection method using die comparison increases, throughput may decrease even more than starting out with defect detection by a defect detection method using die comparison. The purpose of present invention is to carry out high precision defect detection with a stable throughput. In the present invention, the defect detection processing mode applied for detecting defects from the defect image is determined using a reference image, and defects are detected from the defect image by the defect detection processing mode that has been determined.

Abstract: The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance.

Abstract: A signal detected by a photomultiplier tube is pre-amplified and converted into a digital signal. A time average value of signal components, each of which has a voltage lower than a predetermined base threshold value, is calculated as a base voltage. A signal that has been subjected to base correction processing is subjected to threshold value processing and to base correction processing in a non-incident state in which light is not incident on the photomultiplier tube. An output signal thereof is subjected to dark current calculation processing; and a light emission signal amount is calculated by subtracting, from the signal component of the detection light obtained by the threshold value processing, a time average value of the signal components of the dark current. As the result, discriminating the dark current pulse from floor noises enhances the accuracy of the base voltage, and thus the accuracy of light detection.

Abstract: A two-dimensional code is attached to a location of a reagent storage unit which is visually recognizable from the outside, and a coordinate position of the two-dimensional code in a coordinate system of the two-dimensional code and coordinate information of an installation position of a reagent bottle are held. After that, an image of the two-dimensional code is captured by a portable terminal so that a coordinate system of an image capture unit of the portable terminal is converted into the coordinate system of the two-dimensional code using AR technology. The coordinate information of the installation position of the reagent bottle in the coordinate system of the two-dimensional code is regarded as positional coordinates in the captured image on the basis of the conversion, thereby ascertaining the position of the reagent bottle on the captured image and displaying the ascertained position on a display unit.

Abstract: Even in a case where a disturbance is applied from an adjacently disposed power supply circuit or the like, in order to realize a reduction in ripple, a high-voltage power supply device is configured to include a drive circuit, a transformer that boosts an output voltage of the drive circuit, a boost circuit that further boosts a voltage boosted by the transformer, a shield that covers the transformer and the boost circuit, a filter circuit that filters, smoothes, and outputs a high voltage output from the boost circuit, and an impedance loop circuit configured by connection of a plurality of impedance elements into a loop shape. A grounding point of the boost circuit, a grounding point of the shield, and a grounding point of the filter circuit are configured to be grounded via the impedance loop circuit, and this is applied to a high-voltage power supply unit that applies a high voltage to an electron gun of a charged particle beam apparatus.

Abstract: The present invention provides a plasma processing method and a plasma processing apparatus. The plasma processing method enables consistent processing by realizing a high selectivity and a high etching rate when etching a laminated film using a boron-containing amorphous carbon film, realizes high throughput including prior and post processes by simplifying a mask forming process, and has shape controllability of vertical processing. In the present invention, in a plasma processing method for forming a mask by plasma-etching a laminated film including an amorphous carbon film containing boron, the boron-containing amorphous carbon film is plasma-etched by using a mixed gas of an oxygen gas, a fluorine-containing gas, a halogen gas, and a silicon tetrafluoride gas, or a mixed gas of an oxygen gas, a fluorine-containing gas, a halogen gas, and a silicon tetrachloride gas.

Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.